JPH0263533U - - Google Patents

Info

Publication number
JPH0263533U
JPH0263533U JP14355588U JP14355588U JPH0263533U JP H0263533 U JPH0263533 U JP H0263533U JP 14355588 U JP14355588 U JP 14355588U JP 14355588 U JP14355588 U JP 14355588U JP H0263533 U JPH0263533 U JP H0263533U
Authority
JP
Japan
Prior art keywords
gas blowing
processing chamber
vapor phase
phase growth
growth apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14355588U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14355588U priority Critical patent/JPH0263533U/ja
Publication of JPH0263533U publication Critical patent/JPH0263533U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の第1の実施例の縦断面図、第
2図は本考案の第2の実施例の縦断面積、第3図
は従来の気相成長装置の縦断面図である。 1…ガス流量コントロールボツクス、2…ガス
吹き出し板、3…ウエハー、4…処理室の壁、5
…多孔質の板、6…排気装置、7…処理室、8…
ウエハー保持台、9…多孔室の板。
FIG. 1 is a vertical cross-sectional view of a first embodiment of the present invention, FIG. 2 is a vertical cross-sectional area of a second embodiment of the present invention, and FIG. 3 is a vertical cross-sectional view of a conventional vapor phase growth apparatus. 1...Gas flow control box, 2...Gas blowing plate, 3...Wafer, 4...Wall of processing chamber, 5
... Porous plate, 6... Exhaust device, 7... Processing chamber, 8...
Wafer holding stand, 9...Plate of porous chamber.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 原料ガス吹き出し部を備え、かつ、不活性ガス
吹き出し孔を多数有する部材を内壁面に備え、さ
らにウエハー保持台を内包している処理室を少く
とも具備することを特徴とする気相成長装置。
What is claimed is: 1. A vapor phase growth apparatus comprising: a member having a raw material gas blowing section and a large number of inert gas blowing holes on an inner wall surface; and at least a processing chamber containing a wafer holding table.
JP14355588U 1988-11-01 1988-11-01 Pending JPH0263533U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14355588U JPH0263533U (en) 1988-11-01 1988-11-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14355588U JPH0263533U (en) 1988-11-01 1988-11-01

Publications (1)

Publication Number Publication Date
JPH0263533U true JPH0263533U (en) 1990-05-11

Family

ID=31410481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14355588U Pending JPH0263533U (en) 1988-11-01 1988-11-01

Country Status (1)

Country Link
JP (1) JPH0263533U (en)

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