JPH0274596A - Bismuth germanate single crystal and its manufacturing method - Google Patents

Bismuth germanate single crystal and its manufacturing method

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Publication number
JPH0274596A
JPH0274596A JP22785988A JP22785988A JPH0274596A JP H0274596 A JPH0274596 A JP H0274596A JP 22785988 A JP22785988 A JP 22785988A JP 22785988 A JP22785988 A JP 22785988A JP H0274596 A JPH0274596 A JP H0274596A
Authority
JP
Japan
Prior art keywords
single crystal
geo2
bismuth
crystal
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22785988A
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Japanese (ja)
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JP2622165B2 (en
Inventor
Shinji Makikawa
新二 牧川
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Priority to JP63227859A priority Critical patent/JP2622165B2/en
Publication of JPH0274596A publication Critical patent/JPH0274596A/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To prevent the generation of voids on the taking-up of the subject single crystal to contrive the improvement of the quality thereof by using GeO2 of a low temperature type containing that of a high temperature type in a content of <= a specific value in a method for producing the single crystal wherein the single crystal is taken up from the melted liquid of a mixture of Bi2O3 and GeO2 or a sintered product thereof. CONSTITUTION:A bismuth germanate single crystal (referred to as BGO) is obtained by Czochralski method from a melted mixture prepared by melting the powders of Bi2O3 and GeO2 or from the melted liquid of a mixed sintered product prepared by sintering the mixture of the Bi2O3 and the GeO2. In the method the GeO2 comprises essentially a low temperature type GeO2 wherein the content of a high temperature type GeO2 contained in the GeO2 is <=10wt.%. The generation of voids during the growth of the crystal is reduced, thereby providing the colorless and transparent BGO having a high light transmittance, containing no light-scattering substance and having a good quality.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はゲルマニウム酸ビスマス単結晶およびその製造
方法、特には光学用、γ線シンチレータ用として有用と
される弐B l 4 Ge3o1□で示されるゲルマニ
ウム酸ビスマス単結晶およびその製造方法に関するもの
である。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a bismuth germanate single crystal and a method for producing the same, particularly for bismuth germanate, which is useful for optics and γ-ray scintillators. The present invention relates to a bismuth germanate single crystal and a method for producing the same.

[従来の技術] 式B i 4 Ge30+zで示されるゲルマニウム酸
ビスマス単結晶は光学用、γ線シンチレータ用として使
用されており、このものは酸化ビスマス(Bi203)
、二酸化ゲルマニウム(G e Os)粉の溶融体から
のチョクラルスキー法による単結晶引き上げ法によって
製造されている。しかし、このチョクラルスキー法によ
る単結晶育成法ではその結晶成長過程において成長中の
結晶の固液界面における温度のゆらぎおよび不純物の蓄
積による結晶成長速度のゆらぎが起り、これによって結
晶中に取り込まれる液体が凝固する際に固体と液体との
密度差等の原因によるボイドが帯状に発生し、これが結
晶中に取り込まれるためにこの空隙が光の散乱体となり
、得られる単結晶体の結晶品質を低下させると共に結晶
化歩留りを低下させるという不利がある。
[Prior Art] A bismuth germanate single crystal represented by the formula B i 4 Ge30+z is used for optics and γ-ray scintillators, and this crystal is similar to bismuth oxide (Bi203).
, produced by a single crystal pulling method using the Czochralski method from a melt of germanium dioxide (G e Os) powder. However, in the single crystal growth method using the Czochralski method, fluctuations in temperature at the solid-liquid interface of the growing crystal and fluctuations in the crystal growth rate occur due to the accumulation of impurities during the crystal growth process, which causes impurities to be incorporated into the crystal. When a liquid solidifies, band-like voids are generated due to density differences between the solid and liquid, and as these are incorporated into the crystal, these voids act as light scatterers, affecting the crystal quality of the resulting single crystal. This has the disadvantage of lowering the crystallization yield as well as lowering the crystallization yield.

そのため、このようなボイドの発生を防止する方法も各
種提案されており、これについては例えば引上げ時の種
結晶の回転数を40〜60rpmとして成長結晶の直径
りと結晶の固液界面の凸出高Hとの比H/Dを−0,2
〜0.2の範囲となるようにし固液界面の平坦化を画っ
てボイドの発生量を少なくするという方法も知られてい
る(特公昭58−49517号公報参照)が、これには
直径の大きい長尺の単結晶を成長させることができない
という不利があり、このボイドの発生は完全には解決さ
れていない。
Therefore, various methods have been proposed to prevent the occurrence of such voids, such as increasing the diameter of the growing crystal and protruding the solid-liquid interface of the crystal by setting the rotation speed of the seed crystal at 40 to 60 rpm during pulling. The ratio H/D with high H is -0,2
There is also a known method of flattening the solid-liquid interface to reduce the amount of voids within the range of ~0.2 (see Japanese Patent Publication No. 58-49517). It has the disadvantage that it is not possible to grow a long single crystal with a large size, and the occurrence of voids has not been completely solved.

[発明の構成] 本発明はこのような不利を解決したゲルマニウム酸ビス
マス単結晶(以下BGOと略記する)およびその製造方
法に関するもので、これは酸化ビスマスと二酸化ゲルマ
ニウムとの混合融液または酸化ビスマスと二酸化ゲルマ
ニウムとの混合焼成体の融体から単結晶を引上げるに当
たり、この二酸化ゲルマニウムを本質的に低温型酸化ゲ
ルマニウムよりなるものとし、高温型酸化ゲルマニウム
の量を10重量%以下としたものとし、これと酸化ビス
マスとの混合融液または酸化ビスマスとこの二酸化ゲル
マニウムとの混合焼成体の融液にゲルマニウム酸ビスマ
ス単結晶(Bi、Ge。
[Structure of the Invention] The present invention relates to a bismuth germanate single crystal (hereinafter abbreviated as BGO) that solves these disadvantages, and a method for producing the same. When pulling a single crystal from the melt of a mixed fired body of germanium dioxide and germanium dioxide, the germanium dioxide should essentially consist of low-temperature germanium oxide, and the amount of high-temperature germanium oxide should be 10% by weight or less. A bismuth germanate single crystal (Bi, Ge) is added to a mixed melt of bismuth oxide and bismuth oxide or a mixed fired product of bismuth oxide and germanium dioxide.

012)の種結晶を浸し、これを回転させながら弓き上
げて単結晶棒を得ることを特徴とするものである。
The method is characterized in that a seed crystal of 012) is immersed and then raised while rotating to obtain a single crystal rod.

すなわち、本発明者らはB i 4 Ge* 012の
チョクラルスキー法による単結晶引上げ時におけるボイ
ドの発生を防止する方法について種々検討した結果、酸
化ビスマス(BizOi)、二酸化ゲルマニウム(Ge
O□)粉末を溶融して得られるこれらの混合融体または
酸化ビスマス粉末と二酸化ゲルマニウム粉末とを混合し
、これを700〜1.000℃に焼成して得た混合焼成
体の融液からチョクラルスキー法でBGOを得る方法お
いて、この二酸化ゲルマニウムを本質的に低温型酸化ゲ
ルマニウムからなるものとし、これに含有されている高
温型酸化ゲルマニウムの量を10重量%以下とすれば結
晶成長中におけるボイドの発生が少なくなるので、光の
透過率が高く、散乱体を含まない品度のよいBGOを得
ることができることを見出すと共に、ここに得られたB
GOは、本質的に弐B ia Ge3012で示される
ものが主成分で、これが70重量%以上からなり、弐B
i12GeO□0で示されるものが3.0重量%以下と
なるので、無色透明でボイドの少ないものが得られるこ
とを確認して本発明を完成させた。
That is, the present inventors investigated various ways to prevent the generation of voids during pulling of a single crystal of B i 4 Ge* 012 using the Czochralski method.
O□) From the mixed melt obtained by melting the powders or from the melt of the mixed fired body obtained by mixing bismuth oxide powder and germanium dioxide powder and firing this at 700 to 1.000 ° C. In the method for obtaining BGO using the Ralski method, if the germanium dioxide is essentially composed of low-temperature germanium oxide and the amount of high-temperature germanium oxide contained therein is 10% by weight or less, crystal growth is possible. We have discovered that it is possible to obtain high-quality BGO that has high light transmittance and does not contain scatterers because the occurrence of voids in the BGO is reduced.
GO is essentially composed of 2B ia Ge3012 as its main component, which constitutes 70% by weight or more.
Since the content of i12GeO□0 is 3.0% by weight or less, the present invention was completed by confirming that a colorless and transparent material with few voids could be obtained.

以下にさらにこれを詳述する。This will be explained in further detail below.

本発明は上記したように酸化ビスマスと二酸化ゲルマニ
ウムの混合融体また酸化ビスマスと二酸化ゲルマニウム
との混合焼成体の融液からチョクラルスキー法でBGO
を引上げるものであるが、この方法は基本的には公知の
方法に準じて行えばよい。
As described above, the present invention uses BGO from a melt of a mixed melt of bismuth oxide and germanium dioxide or a mixed sintered body of bismuth oxide and germanium dioxide using the Czochralski method.
Basically, this method can be carried out according to a known method.

したがって、本発明の方法において出発原料とされる酸
化ビスマス(Bi203)、二酸化ゲルマニウム(Ge
Oz)はできるだけ高純度のものとすることがよく、し
たがってこれらは純度が99.99%以上のものとする
ことが好ましいが、これらはチョクラルスキー法による
単結晶引上げのために平均粒径が50μm以下に粉砕し
た酸化ビスマス(BizOs)と二酸化ゲルマニウム(
GeOz)とを当量宛混合してから1,050℃以上に
加熱して混合融液とすればよく、これらは酸化ビスマス
と二酸化ゲルマニウムとを混合したのち700〜1.0
00℃で焼成して混合焼成体としてからl、050℃以
上に加熱して融液としてもよい。なお、この融液からB
GOを引上げるために使用される種結晶は従来法で得ら
れたBGOの単結晶から切り出した5mmX5mm程度
のものとすればよい。
Therefore, bismuth oxide (Bi203), germanium dioxide (Ge
Oz) should be as pure as possible, and therefore preferably have a purity of 99.99% or higher; Bismuth oxide (BizOs) and germanium dioxide (pulverized to 50 μm or less)
GeOz) may be mixed in equivalent amounts and heated to 1,050°C or higher to form a mixed melt.
It may be fired at 00°C to form a mixed fired body, and then heated to 050°C or higher to form a melt. In addition, from this melt, B
The seed crystal used for pulling GO may be about 5 mm x 5 mm cut from a single crystal of BGO obtained by a conventional method.

しかし、本発明の方法ではここに使用される二酸化ゲル
マニウムを本質的に低温型ゲルマニウムからなるものと
し、高温型ゲルマニウムの含有量が10重量%以下のも
のとするこ、とが必要とされる。すなわち、この酸化ゲ
ルマニウムは熱転移点が1,033℃のものであるが、
これには融点が1,116℃で結晶構造がセキエイ型(
3□)であり水溶性である低温型のものと、融点が1゜
086℃で結晶構造がルチル型(64)であり、水に不
溶性である高温型の2種類があることが知られており、
通常これらは混在しているのであるが、本発明者らの実
験によれば二酸化ゲルマニウムを酸化ビスマスと共に融
解し、この融液からBGoを引上げるときに、この二酸
化ゲルマニウムを高温型の酸化ゲルマニウムが多量に含
まれているものとするとボイドが発生するが、これを低
温型の酸化ゲルマニウムを主体とするものとするとボイ
ドの発生することがないことが見出されたので、ここに
使用する二酸化ゲルマニウムは本質的に低温型酸化ゲル
マニウムからなるものとし、高温型酸化ゲルマニウムの
量は10重量%以下のものとすることが必要とされ、事
実これによれば単結晶引上げ時におけるボイドの発生が
少なくなるので品質のよいBGOを容易に得ることがで
きるという有利性が与えられる。
However, the method of the present invention requires that the germanium dioxide used here essentially consist of low-temperature germanium, and that the content of high-temperature germanium is 10% by weight or less. In other words, this germanium oxide has a thermal transition point of 1,033°C,
It has a melting point of 1,116°C and a red-eye crystal structure (
It is known that there are two types: a low-temperature type that is 3□) and water-soluble, and a high-temperature type that has a melting point of 1°086°C and a rutile crystal structure (64) and is insoluble in water. Ori,
Normally, these elements are mixed together, but according to experiments conducted by the present inventors, when germanium dioxide is melted together with bismuth oxide and BGo is pulled from this melt, germanium dioxide is mixed with high-temperature germanium oxide. If it is contained in a large amount, voids will occur, but it has been found that if it is made mainly of low-temperature germanium oxide, no voids will occur, so the germanium dioxide used here must consist essentially of low-temperature germanium oxide, and the amount of high-temperature germanium oxide must be 10% by weight or less; in fact, this reduces the occurrence of voids during single crystal pulling. Therefore, the advantage is that BGO of good quality can be easily obtained.

また、本発明の方法で得られるBGOは式B i 4 
Ge30+zで示されるゲルマニウム酸ビスマスを主成
分とするものであるが、ここに使用する二酸化ゲルマニ
ウムを高温型酸化ゲルマニウムを多量に含有するものと
するとこのときに得られるBGOはボイドが多量に発生
するとともに、式Bi+zGeO□。で示されるゲルマ
ニウム酸ビスマスを含有するものとなり、これによって
黄色や赤色などの着色を呈するようになるので、この点
からも二酸化ゲルマニウムは低温型酸化ゲルマニウムを
主成分とするものとすることがよい。
Moreover, BGO obtained by the method of the present invention has the formula B i 4
The main component is bismuth germanate represented by Ge30+z, but if the germanium dioxide used here contains a large amount of high-temperature germanium oxide, the resulting BGO will have a large amount of voids and , formula Bi+zGeO□. It contains bismuth germanate shown by, and this gives it a yellow or red color, so from this point of view as well, germanium dioxide is preferably one whose main component is low-temperature germanium oxide.

つぎに本発明の実施例をあげるが、例中で使用した二酸
化ゲルマニウム中における高温型酸化ゲルマニウムの含
有率は下記の方法による測定値を示したものであり、得
られたBGO結晶の評価方法は下記による結果を示した
ものである。
Next, examples of the present invention will be given. The content of high-temperature germanium oxide in the germanium dioxide used in the examples is the value measured by the following method, and the evaluation method for the obtained BGO crystals is The results are shown below.

(G e O2中の高温型G e OZ量の測定法)二
酸化ゲルマニウム(GeOz)を濃塩酸に加熱溶融する
と低温型酸化ゲルマニウムは溶解し、高温型酸化ゲルマ
ニウムは不溶解残渣となるので、Q e O2を濃塩酸
に加熱溶融し、そのときの不溶解残渣の重量を求め、処
理前の重量との比(%)を求めた。
(Method for measuring the amount of high-temperature G e OZ in G e O2) When germanium dioxide (GeOz) is heated and melted in concentrated hydrochloric acid, the low-temperature germanium oxide dissolves and the high-temperature germanium oxide becomes an undissolved residue, so Q e O2 was heated and melted in concentrated hydrochloric acid, the weight of the undissolved residue at that time was determined, and the ratio (%) to the weight before treatment was determined.

(BGO残渣の評価法) 30、OO×30.0OX50.00mmの製品ブロッ
クが何個切り出させるかによって評価するが、この場合
ボイド状介在物が30.0Ox30.00mmの面内の
半分以上はないこととした。
(Evaluation method of BGO residue) 30.Evaluation is based on how many product blocks of OO x 30.0 OX 50.00 mm are cut out, but in this case, there are no void-like inclusions in more than half of the 30.0 OX 30.00 mm plane. I decided to do so.

また、この評価は第1表に示した。なお、表中の結晶評
価は外観の状態とボイドの量より評価した。
Moreover, this evaluation is shown in Table 1. In addition, the crystal evaluation in the table was evaluated based on the state of appearance and the amount of voids.

実施例1〜5.比較例1 平均粒径が50μmである純度99.999%の酸化ビ
スマス(Bi203)と、高温型酸化ゲルマニウムの含
有量が第1表に示した量である6種類の二酸化ゲルマニ
ウム(GeOz)とをBGOが32kgとなる量で混合
し、これを直径200mm、深さ200mmの白金るつ
ぼに装入し、高周波誘導加熱を用いて1,070’Cに
加熱して溶融させた。
Examples 1-5. Comparative Example 1 Bismuth oxide (Bi203) with a purity of 99.999% and an average particle size of 50 μm and six types of germanium dioxide (GeOz) with high-temperature germanium oxide contents shown in Table 1 were used. BGO was mixed in an amount of 32 kg, placed in a platinum crucible with a diameter of 200 mm and a depth of 200 mm, and heated to 1,070'C using high frequency induction heating to melt it.

ついでこの混合融液に5mmX5mmのB 14Ges
O+□の種結晶を浸漬し、0.5〜3mm/時の速度で
引上げて結晶径110mmのB 14G e 3012
の単結晶棒(12,5kg)を引上げ、得られた単結晶
の結晶評価をしたところ、第1表に併記したとおりの結
果が得られた。
Next, 5 mm x 5 mm of B 14 Ges was added to this mixed melt.
B 14G e 3012 with a crystal diameter of 110 mm is immersed in an O+□ seed crystal and pulled up at a speed of 0.5 to 3 mm/hour.
When a single crystal rod (12.5 kg) was pulled up and the obtained single crystal was evaluated, the results shown in Table 1 were obtained.

また、X線回折の結果、実施例1〜5のサンプルはいず
れもBi4Ge3012が主成分で3. 0%以下の微
量の8112G e O□。が見出されたが、比較例1
のサンプルはB ia Ge3012中にB i 12
G e O20が5%以上存在していることが判った・
Moreover, as a result of X-ray diffraction, the samples of Examples 1 to 5 all had Bi4Ge3012 as the main component. A trace amount of 8112G e O□ below 0%. was found, but Comparative Example 1
The sample of B i 12 in B ia Ge3012
It was found that 5% or more of G e O20 was present.

Claims (1)

【特許請求の範囲】 1、酸化ビスマスと二酸化ゲルマニウムとの混合融液、
または酸化ビスマスと二酸化ゲルマニウムとの混合焼成
体の融液から単結晶を引上げるに当り、この二酸化ゲル
マニウムを本質的に低温型酸化ゲルマニウムよりなるも
のとして高温型酸化ゲルマニウムの量が10重量%以下
のものとし、これと酸化ビスマスとの混合融体またはそ
の混合焼成体の融液から引き上げて単結晶を得ることを
特徴とするゲルマニウム酸ビスマス単結晶の製造方法。 2、ゲルマニウム酸ビスマス単結晶が主としてBi_4
Ge_3O_1_270重量%より成り、Bi_1_2
GeO_2_0が3.0重量%以下であることを特徴と
するゲルマニウム酸ビスマス単結晶。
[Claims] 1. A mixed melt of bismuth oxide and germanium dioxide;
Alternatively, when pulling a single crystal from a melt of a fired mixed body of bismuth oxide and germanium dioxide, the germanium dioxide is essentially composed of low-temperature germanium oxide, and the amount of high-temperature germanium oxide is 10% by weight or less. A method for producing a bismuth germanate single crystal, characterized in that the single crystal is obtained by pulling it from a mixed melt of bismuth germanate and bismuth oxide or from a melt of a mixed sintered product thereof. 2. Bismuth germanate single crystal is mainly Bi_4
Consists of Ge_3O_1_270% by weight, Bi_1_2
A bismuth germanate single crystal characterized in that GeO_2_0 is 3.0% by weight or less.
JP63227859A 1988-09-12 1988-09-12 Method for producing bismuth germanate single crystal Expired - Lifetime JP2622165B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63227859A JP2622165B2 (en) 1988-09-12 1988-09-12 Method for producing bismuth germanate single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63227859A JP2622165B2 (en) 1988-09-12 1988-09-12 Method for producing bismuth germanate single crystal

Publications (2)

Publication Number Publication Date
JPH0274596A true JPH0274596A (en) 1990-03-14
JP2622165B2 JP2622165B2 (en) 1997-06-18

Family

ID=16867484

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Country Status (1)

Country Link
JP (1) JP2622165B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849517A (en) * 1981-09-19 1983-03-23 Honda Motor Co Ltd Motor cycle
JPS5933560A (en) * 1982-08-19 1984-02-23 Fujitsu Ltd Automatic retrieval system of failed information file

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849517A (en) * 1981-09-19 1983-03-23 Honda Motor Co Ltd Motor cycle
JPS5933560A (en) * 1982-08-19 1984-02-23 Fujitsu Ltd Automatic retrieval system of failed information file

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Publication number Publication date
JP2622165B2 (en) 1997-06-18

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