JPH0277596A - Method for plating copper or copper alloy - Google Patents

Method for plating copper or copper alloy

Info

Publication number
JPH0277596A
JPH0277596A JP22643888A JP22643888A JPH0277596A JP H0277596 A JPH0277596 A JP H0277596A JP 22643888 A JP22643888 A JP 22643888A JP 22643888 A JP22643888 A JP 22643888A JP H0277596 A JPH0277596 A JP H0277596A
Authority
JP
Japan
Prior art keywords
copper
sulfuric acid
pickling
plating
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22643888A
Other languages
Japanese (ja)
Inventor
Kazuhiko Fukamachi
一彦 深町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP22643888A priority Critical patent/JPH0277596A/en
Publication of JPH0277596A publication Critical patent/JPH0277596A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To easily activate the surface of a Cu material and to obtain a high quality plated material by successively subjecting the Cu material to degreasing, pickling with a sulfuric acid soln. contg. Cu ions and electroplating. CONSTITUTION:A Cu or Cu alloy material is degreased, immersed in a pickling soln. contg. 5-40g/l Cu ions and 30-300g/l sulfuric acid, taken out and washed. The surface-activated material is immediately electroplated with a metal such as Ni, Cu, Sn, Au or Ag. This plated Cu or Cu alloy product has satisfactory wettability with solder at the time of soldering.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、銅または銅合金にニッケル、銅、錫、金、銀
等の金属を電気めっきする場合の前処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a pretreatment method for electroplating copper or a copper alloy with a metal such as nickel, copper, tin, gold, or silver.

[従来の技術] 銅または銅合金の板、条あるいはプレス品などはその形
状により、連続式ライン、ラック式ライン、バレル式ラ
インなどの方式により電気めっきが施される。これらの
ラインではめっきの前処理として、前工程で材料に付着
した圧延油、プレス油などの油性の汚れを落すためアル
カリ性の溶液を用い脱脂処理するのが通例である。そし
て、その後水洗され、さらに酸性溶液により活性化処理
される。この酸による活性化処理は、通常、硫酸あるい
は塩酸を主体とする水溶液で行う。また、材料表面の酸
化皮膜の程度が著しい場合や、表面肌がめっきに適さな
い(粗さが大きすぎる場合など)ときなどには、硫酸、
過酸化水素系研磨液やキリンス液などを用いて材料の化
学研磨処理を行うのが通例である。
[Prior Art] Copper or copper alloy plates, strips, pressed products, etc. are electroplated using a continuous line, a rack line, a barrel line, or the like, depending on their shape. In these lines, as a pretreatment for plating, it is customary to perform a degreasing process using an alkaline solution to remove oily stains such as rolling oil and press oil that adhered to the material in the previous process. Then, it is washed with water and further activated with an acidic solution. This acid activation treatment is usually performed with an aqueous solution containing sulfuric acid or hydrochloric acid as a main component. In addition, when the degree of oxidation film on the material surface is significant, or when the surface texture is not suitable for plating (such as when the roughness is too large), sulfuric acid,
It is customary to chemically polish the material using a hydrogen peroxide polishing solution, Kirin's solution, or the like.

[発明が解決しようとする課題] ところが化学研磨処理は、めっき前処理として材料表面
の調整作用は優れているものの、コスト高であり、管理
面でも繁雑である。
[Problems to be Solved by the Invention] However, although chemical polishing treatment has an excellent material surface conditioning effect as a pre-plating treatment, it is expensive and complicated in terms of management.

[課題を解決するための手段] 本発明は銅または銅合金材料を脱脂後、銅イオンを5〜
40g/I 、硫酸を30〜300g/I含む酸洗液で
酸洗した後、電気めっきすることを特徴とする銅または
銅合金のめっき方法である。
[Means for Solving the Problems] The present invention provides copper or copper alloy materials with copper ions after degreasing.
This is a method for plating copper or copper alloy, which comprises electroplating after pickling with a pickling solution containing 40 g/I and 30 to 300 g/I of sulfuric acid.

本発明における酸洗処理は、硫酸中に銅イオンを添加し
たことにより、材料の酸化皮膜などの陰間作用が硫酸単
独の場合より極めて強くなっている。ただし、銅イオン
濃度が5g/ 1未満では活性化作用が十分ではなく 
、40g/l程度になると活性化作用が飽和する。硫酸
濃度も30g/I以上で活性作用が強くなり、300g
/Iで飽和し、それを越える濃度での使用は不経済であ
る。
In the pickling treatment of the present invention, copper ions are added to the sulfuric acid, so that the effect on the oxidized film of the material is much stronger than in the case of sulfuric acid alone. However, if the copper ion concentration is less than 5g/1, the activation effect will not be sufficient.
, the activation effect is saturated at about 40 g/l. The active effect becomes stronger when the sulfuric acid concentration exceeds 30g/I, and 300g
/I, and use at concentrations exceeding this is uneconomical.

銅イオンと硫酸の比は、銅イオンの溶解度以下の範囲で
適宜選択する。温度、時間については特に制限はないが
、温度は高いほうが活性化作用が強い。
The ratio of copper ions to sulfuric acid is appropriately selected within a range equal to or less than the solubility of copper ions. There are no particular restrictions on temperature and time, but the higher the temperature, the stronger the activation effect.

[実施例] 次に実施例並びに比較例について述べる。[Example] Next, examples and comparative examples will be described.

実施例 厚さ 0.311I11のりん青銅(Cu−8vL%S
n−〇、1 vL%P)板をN a OH100g/l
、界面活性剤10g/lよりなる脱脂液に2分浸漬後水
洗した。
Example thickness 0.311I11 phosphor bronze (Cu-8vL%S
n-〇, 1 vL%P) plate with Na OH 100g/l
The sample was immersed in a degreasing solution containing 10 g/l of surfactant for 2 minutes and then washed with water.

さらにCu’°aog/l 、H2S O4100g/
lの組成の酸洗液に20秒浸漬後水洗した。直ちに硫酸
浴(S n ’ ” 30g/l 、H2S04100
g/l、界面活性剤10g/1I11.光沢剤5g/I
 )を用いて、2μmの錫を電気めっきした。この錫め
っき品をMILSTD−202E−208Cに定められ
たはんだ付試験に供したところ良好なぬれ性を示した。
Furthermore, Cu'°aog/l, H2S O4100g/
The sample was immersed in a pickling solution having a composition of 1 for 20 seconds and then washed with water. Immediately put in a sulfuric acid bath (S n ''' 30g/l, H2S04100
g/l, surfactant 10g/1I11. Brightener 5g/I
) was used to electroplate 2 μm of tin. When this tin-plated product was subjected to a soldering test specified in MILSTD-202E-208C, it showed good wettability.

比較例 酸6し液をH2S O4100g/Iとした他は実施例
と同様に錫めっき品を作り、同じくはんだ付試験に供し
たところ、はんだ浸漬面の一部にはんだのはじきが認め
られた。
Comparative Example When a tin-plated product was prepared in the same manner as in the example except that the acid solution was 100 g/I of H2SO4 and subjected to the same soldering test, solder repellency was observed on a part of the solder-immersed surface.

[発明の効果] 本発明によると、銅または銅合金のめつき前処理におい
て、硫酸等の通常の酸洗では活性化できないような材料
表面を化学研磨処理よりも低コストで、かつ、容品に活
性化でき、良好な品質のめっき材を得ることができる。
[Effects of the Invention] According to the present invention, in the pre-plating treatment of copper or copper alloy, the surface of the material that cannot be activated by ordinary pickling with sulfuric acid etc. can be treated at a lower cost than by chemical polishing treatment, and at a lower cost than the chemical polishing treatment. can be activated to obtain a plating material of good quality.

Claims (1)

【特許請求の範囲】[Claims] 銅または銅合金材料を脱脂後、銅イオンを5〜40g/
l、硫酸を30〜300g/l含む酸洗液で酸洗した後
、電気めっきすることを特徴とする銅または銅合金のめ
っき方法。
After degreasing copper or copper alloy material, add 5 to 40 g of copper ions/
1. A method for plating copper or copper alloy, which comprises electroplating after pickling with a pickling solution containing 30 to 300 g/l of sulfuric acid.
JP22643888A 1988-09-12 1988-09-12 Method for plating copper or copper alloy Pending JPH0277596A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22643888A JPH0277596A (en) 1988-09-12 1988-09-12 Method for plating copper or copper alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22643888A JPH0277596A (en) 1988-09-12 1988-09-12 Method for plating copper or copper alloy

Publications (1)

Publication Number Publication Date
JPH0277596A true JPH0277596A (en) 1990-03-16

Family

ID=16845114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22643888A Pending JPH0277596A (en) 1988-09-12 1988-09-12 Method for plating copper or copper alloy

Country Status (1)

Country Link
JP (1) JPH0277596A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100576385B1 (en) * 2005-12-07 2006-05-03 이이근 Manufacturing method of rolled copper laminate
JP2009057624A (en) * 2007-09-03 2009-03-19 Meltex Inc Chemical abrasive and metal plating method using copper or copper alloy pre-plated using the chemical abrasive

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100576385B1 (en) * 2005-12-07 2006-05-03 이이근 Manufacturing method of rolled copper laminate
WO2007066867A1 (en) * 2005-12-07 2007-06-14 Ye Kun Lee Method of manufacturing heavy clad material (hcm) using anchor-treated cold-rolled copper foil
JP2009057624A (en) * 2007-09-03 2009-03-19 Meltex Inc Chemical abrasive and metal plating method using copper or copper alloy pre-plated using the chemical abrasive

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