JPH02794A - Production of complex of nickel group metal having silicon-transition metal bond - Google Patents
Production of complex of nickel group metal having silicon-transition metal bondInfo
- Publication number
- JPH02794A JPH02794A JP63254508A JP25450888A JPH02794A JP H02794 A JPH02794 A JP H02794A JP 63254508 A JP63254508 A JP 63254508A JP 25450888 A JP25450888 A JP 25450888A JP H02794 A JPH02794 A JP H02794A
- Authority
- JP
- Japan
- Prior art keywords
- transition metal
- silicon
- complex
- platinum
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title description 5
- 229910052751 metal Inorganic materials 0.000 title description 2
- 239000002184 metal Substances 0.000 title description 2
- -1 nickel group transition metal Chemical class 0.000 claims abstract description 23
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 10
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 abstract description 18
- 125000005843 halogen group Chemical group 0.000 abstract description 6
- 239000005055 methyl trichlorosilane Substances 0.000 abstract description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 abstract description 3
- DYQNWGKJOFYBID-UHFFFAOYSA-N platinum;triethylphosphane Chemical compound [Pt].CCP(CC)CC.CCP(CC)CC.CCP(CC)CC.CCP(CC)CC DYQNWGKJOFYBID-UHFFFAOYSA-N 0.000 abstract description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 2
- 125000003118 aryl group Chemical group 0.000 abstract description 2
- 125000000753 cycloalkyl group Chemical group 0.000 abstract description 2
- KFBKRCXOTTUAFS-UHFFFAOYSA-N nickel;triphenylphosphane Chemical compound [Ni].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 KFBKRCXOTTUAFS-UHFFFAOYSA-N 0.000 abstract description 2
- 239000005049 silicon tetrachloride Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 44
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 43
- 229910052697 platinum Inorganic materials 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 19
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 16
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 14
- 239000000243 solution Substances 0.000 description 12
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 230000003595 spectral effect Effects 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 150000003624 transition metals Chemical class 0.000 description 8
- 239000007983 Tris buffer Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- HASCQPSFPAKVEK-UHFFFAOYSA-N dimethyl(phenyl)phosphine Chemical compound CP(C)C1=CC=CC=C1 HASCQPSFPAKVEK-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 150000003003 phosphines Chemical group 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- GMPRTAUUMQDBAC-UHFFFAOYSA-N [SiH3].[Hg] Chemical compound [SiH3].[Hg] GMPRTAUUMQDBAC-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- DNKYMRIVXIQCFO-UHFFFAOYSA-N benzene pentane Chemical compound CCCCC.CCCCC.C1=CC=CC=C1 DNKYMRIVXIQCFO-UHFFFAOYSA-N 0.000 description 2
- CBOXQJGHYXSYFT-UHFFFAOYSA-N bromo-dimethyl-phenylsilane Chemical compound C[Si](C)(Br)C1=CC=CC=C1 CBOXQJGHYXSYFT-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- HEYOIUWMSWPHEM-UHFFFAOYSA-N iodo-dimethyl-trimethylsilylsilane Chemical compound C[Si](C)(C)[Si](C)(C)I HEYOIUWMSWPHEM-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- UKSZBOKPHAQOMP-SVLSSHOZSA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 UKSZBOKPHAQOMP-SVLSSHOZSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical class [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- RGVOWOYASHMOCQ-UHFFFAOYSA-N [Pt].C1CCC=CC=CC1 Chemical compound [Pt].C1CCC=CC=CC1 RGVOWOYASHMOCQ-UHFFFAOYSA-N 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000005133 alkynyloxy group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000002102 aryl alkyloxo group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- MLSWRAMUWWNBQG-UHFFFAOYSA-N bromo-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Br)(C)C1=CC=CC=C1 MLSWRAMUWWNBQG-UHFFFAOYSA-N 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- XSDCTSITJJJDPY-UHFFFAOYSA-N chloro-ethenyl-dimethylsilane Chemical compound C[Si](C)(Cl)C=C XSDCTSITJJJDPY-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- WUOIAOOSKMHJOV-UHFFFAOYSA-N ethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CC)C1=CC=CC=C1 WUOIAOOSKMHJOV-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000006464 oxidative addition reaction Methods 0.000 description 1
- UIRRQIANMRREBL-UHFFFAOYSA-N platinum;triethylphosphane Chemical compound [Pt].CCP(CC)CC UIRRQIANMRREBL-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910021350 transition metal silicide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ケイ素−遷移金属結合を有するニッケル族遷
移金属錯体を製造する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing a nickel group transition metal complex having a silicon-transition metal bond.
ケイ素−遷移金属結合を有する錯体は、化学気相反応や
蒸着によって、デバイスに使われる遷移金属シリサイド
を製造する原料として、用いられている。Complexes having silicon-transition metal bonds are used as raw materials for producing transition metal silicides used in devices by chemical vapor phase reactions or vapor deposition.
従来、ケイ素−遷移金属結合を有する錯体は。 Conventionally, complexes with silicon-transition metal bonds.
以下のような方法で製造されていた。It was manufactured in the following way.
(1)ハロシランと遷移金属アニオンの反応。(1) Reaction between halosilane and transition metal anion.
(2)シリルアルカリ金属と遷移金属ハロゲン化物の反
応。(2) Reaction between silyl alkali metal and transition metal halide.
(3)シリル水銀と遷移金属錯体の反応。(3) Reaction of silylmercury and transition metal complex.
(4)ヒドロシランの低原子価遷移金属錯体への酸化的
付加。(4) Oxidative addition of hydrosilane to low-valent transition metal complexes.
(5)ヒドロシランと遷移金属ハロゲン化物からの脱ハ
ロゲン化水素反応。(5) Dehydrohalogenation reaction between hydrosilane and transition metal halide.
しかしながら、前記方法では、それぞれに問題点があり
、(1)の方法では、遷移金属成分がアニオンを形成す
るものでなければならず、そのため遷移金属と配位子の
種類・構造が限定される。(2)の方法では、アルカリ
金属を使用するため、操作上の危険が伴い、また、アル
カリ金属と反応し得る置換基を有するシリル遷移金属錯
体は、原理的に製造できない、(3)の方法では、シリ
ル水銀製造の段階でアルカリ金属を使用する上に、毒性
の高い水銀を使用するため、その工業的利用は、著しく
制約される。またケイ素上の置換基もメチル基に限定さ
れる。(4)の方法では、種々のケイ素−遷移金属錯体
を製造できるが、通常入手容易なハロシランを、高価な
水素化アルミニウムリチウムなどで還元し、ヒドロシラ
ンとしてから反応に供する必要があり、工程が複雑であ
る。また、(5)の方法も、ヒドロシランを用いるため
、(4)と同様の問題点を有する上に、塩基共存下で反
応を行うため、塩基と反応し得る置換基を有するシリル
遷移金属錯体は、原理的に製造できない、また、ケイ素
上の置換基や配位子の種類も特定のものに限定される。However, each of the above methods has its own problems. In method (1), the transition metal component must form an anion, which limits the types and structures of the transition metal and the ligand. . Method (2) uses an alkali metal, which poses operational risks, and method (3) in which silyl transition metal complexes having substituents that can react with alkali metals cannot be produced in principle. However, since alkali metals and highly toxic mercury are used in the production stage of silylmercury, its industrial use is severely restricted. Substituents on silicon are also limited to methyl groups. Method (4) allows the production of various silicon-transition metal complexes, but the process is complicated because it requires reducing commonly available halosilane with expensive lithium aluminum hydride to form hydrosilane and then subjecting it to the reaction. It is. In addition, since method (5) uses hydrosilane, it has the same problems as (4), and because the reaction is carried out in the presence of a base, silyl transition metal complexes having substituents that can react with bases are , cannot be produced in principle, and the types of substituents and ligands on silicon are also limited to specific ones.
本発明者らは、これらの問題点を解決するべく鋭意研究
を重ねた結果、ハロシランが低原子価金属錯体と容易に
反応する事実を見出し1本発明に到達した。The present inventors have conducted intensive research to solve these problems, and as a result, they have discovered the fact that halosilanes easily react with low-valent metal complexes, and have arrived at the present invention.
本発明は、ケイ素−遷移金属結合を生成させるための全
く新規な方法を開発し、ケイ素−遷移金属結合を有する
錯体を提供しようとするものである。The present invention seeks to develop a completely new method for producing silicon-transition metal bonds and to provide complexes having silicon-transition metal bonds.
本発明者らは、前記目的を達成すべく鋭意研究を重ねた
結果、ケイ素−ハロゲン原子結合を有するケイ素化合物
に、特定のニッケル族金属錯体を反応させることにより
、ケイ素−遷移金属結合を有する化合物が得られること
を見出し、本発明を完成するに到った。As a result of extensive research to achieve the above object, the present inventors have discovered that by reacting a specific nickel group metal complex with a silicon compound having a silicon-halogen atom bond, a compound having a silicon-transition metal bond can be produced. The present invention has been completed based on the discovery that the following can be obtained.
すなわち1本発明によれば、ケイ素−ハロゲン原子結合
を有するケイ素化合物に、少なくとも2分子のホスフィ
ンを配位した0価のニッケル族遷移金属錯体を反応させ
ることを特徴とするSL−M(M:ニッケル族遷移金属
)結合を有するニッケル族遷移金属錯体の製造方法が提
供される。That is, according to the present invention, SL-M (M: A method for producing a nickel group transition metal complex having a nickel group transition metal (nickel group transition metal) bond is provided.
本発明における反応は次の式で表わされる。The reaction in the present invention is represented by the following formula.
一3i−X + MLnL’n’
■
→ −5iMXL2
前記式中、旧よニッケル族遷移金属、Xはハロゲン原子
、Lはホスフィン、L′はホスフィン以外の2または4
電子供与配位子、nは2以上の整数、n′は0,1また
は2を示す、 L、L’は配位結合性のため、 MLn
L’n′の形式酸化数はOである。また、阿とXとの結
合及び阿とSiとの結合は共有結合であるため一5iM
XL。-3i-X + MLnL'n' ■ → -5iMXL2 In the above formula, a nickel group transition metal, X is a halogen atom, L is a phosphine, and L' is 2 or 4 other than phosphine.
Electron donating ligand, n is an integer of 2 or more, n' is 0, 1 or 2, L and L' are coordinate bonds, so MLn
The formal oxidation number of L'n' is O. Also, since the bond between A and X and the bond between A and Si are covalent bonds, -5iM
XL.
の形式酸化数は2である。The formal oxidation number of is 2.
本発明で用いるケイ素化合物は、少くとも1個の5L−
X(X:ハロゲン原子)結合を有するも゛のであり1例
えば、次の一般式で表わすものを用いることができる。The silicon compound used in the present invention has at least one 5L-
It has an X (X: halogen atom) bond, and for example, those represented by the following general formula can be used.
1?1
前記式中、R1、R2及びR3は、アルキル基、シクロ
アルキル基、アリール基、アラルキル基、アルケニル基
、アルキニル基、アルコキシ基、シクロアルコキシ基、
アリーロキシ基、アラルキロキシ基、アルケニロキシ基
、アルキニロキシ基、シリル基又はハロゲン原子を表わ
す、Xはハロゲン原子を表わす。1?1 In the above formula, R1, R2 and R3 are an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkenyl group, an alkynyl group, an alkoxy group, a cycloalkoxy group,
represents an aryloxy group, an aralkyloxy group, an alkenyloxy group, an alkynyloxy group, a silyl group or a halogen atom; X represents a halogen atom;
本発明の方法に用いるケイ素化合物を例示すれば、四塩
化ケイ素、メチルトリクロロシラン、ジメチルジクロロ
シラン、トリメチルブロモシラン。Examples of silicon compounds used in the method of the present invention include silicon tetrachloride, methyltrichlorosilane, dimethyldichlorosilane, and trimethylbromosilane.
ジメチルフェニルブロモシラン、メチルジフェニルブロ
モシラン、ベンジルジメチルブロモシラン、トリメチル
ヨードシラン、ビニルジメチルクロロシラン、ヨードペ
ンタメチルジシランなどをあげることができる。Examples include dimethylphenylbromosilane, methyldiphenylbromosilane, benzyldimethylbromosilane, trimethyliodosilane, vinyldimethylchlorosilane, and iodopentamethyldisilane.
本発明の方法に用いる0価のニッケル族遷移金属錯体は
、ニッケル、パラジウム、白金の錯体であり、錯体を構
成する配位子は、有機基で置換されたホスフィン類だけ
でもよいが、これらホスフィン類に加えて、オレフィン
、ジエン、−酸化炭素などの2または4電子供与配位子
があってもよい。The zero-valent nickel group transition metal complex used in the method of the present invention is a complex of nickel, palladium, and platinum, and the ligands constituting the complex may be only phosphines substituted with organic groups, but these phosphines In addition to the above, there may also be two- or four-electron donating ligands such as olefins, dienes, carbon oxides, etc.
前記ホスフィン類を例示すれば、トリメチルホスフィン
、トリエチルホスフィン、トリブチルホスフィン、ジメ
チルフェニルホスフィン、エチルジフェニルホスフィン
、トリフェニルホスフィンなどがあげられる。従って、
前記O価遷移金属錯体を例示すれば、テトラキス(トリ
エチルホスフイン)白金、トリス(トリエチルホスフィ
ン)白金、テトラキス(トリメチルホスフィン)白金、
ビス(トリブチルホスフィン)ジカルボニル白金、ビス
(トリメチルホスフィン)エチレン白金、テトラキス(
トリメチルホスフィン)パラジウム、テトラキス(トリ
エチルホスフィン)パラジウム、テトラキス(トリフェ
ニルホスフィン)ニッケルなどがあげられる。Examples of the phosphines include trimethylphosphine, triethylphosphine, tributylphosphine, dimethylphenylphosphine, ethyldiphenylphosphine, and triphenylphosphine. Therefore,
Examples of the O-valent transition metal complexes include tetrakis(triethylphosphine)platinum, tris(triethylphosphine)platinum, tetrakis(trimethylphosphine)platinum,
Bis(tributylphosphine)dicarbonylplatinum, bis(trimethylphosphine)ethyleneplatinum, tetrakis(
Examples include trimethylphosphine)palladium, tetrakis(triethylphosphine)palladium, and tetrakis(triphenylphosphine)nickel.
これらの0価ニッケル族遷移金属錯体は錯体として仕込
む方法ばかりでなく、前記ホスフィン配位子の共存下で
これら錯体を与えるテトラカルボニルニッケル、ビス(
ジベンジリデンアセトン)パラジウム、ビス(1,5−
シクロオクタジエン)白金などの0価ニッケル族遷移金
属錯体と前記ホスフィン配位子とを、それぞれ反応系中
に加える方法によっても1本反応に供することができる
。These zero-valent nickel group transition metal complexes can be prepared not only as complexes but also by tetracarbonyl nickel, bis(
dibenzylideneacetone) palladium, bis(1,5-
A single complex of a zero-valent nickel group transition metal complex such as platinum (cyclooctadiene) and the above-mentioned phosphine ligand can be added to the reaction system.
反応に供されるケイ素化合物の0価ニッケル族遷移金属
錯体に対するモル比は、任意に選ぶことができるが、0
価ニッケル族遷移金属錯体に関する収率を考慮すれば、
1以上が好ましい。The molar ratio of the silicon compound to the zero-valent nickel group transition metal complex to be subjected to the reaction can be arbitrarily selected;
Considering the yield for valent nickel group transition metal complexes,
1 or more is preferable.
本発明は、−80℃〜300℃、好ましくは、0℃〜2
00℃の反応温度において実施される。The present invention can be carried out from -80°C to 300°C, preferably from 0°C to 2°C.
It is carried out at a reaction temperature of 0.000C.
本発明の方法は、溶媒の有無にかかわらず実施できるが
、溶媒を用いる場合は、アルコール、第1級または第2
級アミン、カルボン酸などの、原料として用いるケイ素
化合物または0価ニッケル族遷移金属錯体と反応し得る
ものを除いて、通常用いられる溶媒、すなわち、ベンゼ
ン、トルエン、キシレン、ヘキサン、デカリンなどの炭
化水素溶媒を用いることができる。The method of the present invention can be carried out with or without a solvent, but if a solvent is used, alcohol, primary or secondary
Commonly used solvents, i.e., hydrocarbons such as benzene, toluene, xylene, hexane, decalin, etc., except those that can react with silicon compounds or zero-valent nickel group transition metal complexes used as raw materials, such as grade amines and carboxylic acids. A solvent can be used.
反応混合物からの生成物の分離精製は、一般的には過剰
のケイ素化合物を留去後、再結晶することにより容易に
達せられる。Separation and purification of the product from the reaction mixture is generally easily accomplished by distilling off excess silicon compounds and then recrystallizing the product.
本発明により、ハロゲン原子を有する広範なケイ素化合
物を直接遷移金属錯体と反応させることにより、極めて
容易にケイ素−遷移金属結合を有する種々の錯体が提供
される。According to the present invention, various complexes having a silicon-transition metal bond can be provided very easily by directly reacting a wide range of silicon compounds having a halogen atom with a transition metal complex.
本発明を実施例により更に詳細に説明する。 The present invention will be explained in more detail with reference to Examples.
実施例1
トリス(トリエチルホスフィン)白金0.43mmol
。Example 1 Tris(triethylphosphine)platinum 0.43 mmol
.
トリメチルブロモシラン4当量をベンゼン0.9−中、
90℃で4時間加熱することにtrans−トリメチル
シリル(ブロモ)ビス(トリエチルホスフィン)白金が
得られた。NMRから収率は93%であった。4 equivalents of trimethylbromosilane in 0.9-benzene,
Trans-trimethylsilyl(bromo)bis(triethylphosphine)platinum was obtained by heating at 90°C for 4 hours. The yield was 93% based on NMR.
反応液を濃縮し、ペンタンから再結晶すると、39%の
収率で淡黄色針状結晶が得られた。このものは文献に未
収載の新規化合物であり、その物性値。The reaction solution was concentrated and recrystallized from pentane to obtain pale yellow needle crystals with a yield of 39%. This is a new compound that has not been described in the literature, and its physical properties.
スペクトルデータなとは、以下のとおりであった。The spectral data was as follows.
融点:58〜60℃、I R:1236.1038.8
40.768.742、618■−1”H−NMR:δ
2.56〜1.84(12H1m)、1.45〜1.0
2(18H,m)、0.83.0.69.0.55(1
:4:1)(9H1各々s、 J(”’Pt−5i−C
−’H)=25.2Hz)ppm−
元素分析値 C15H3iBrP2PtSi計算値
C: 30.82%、 H; 6.73%実測値
C; 30.80%、 H; 6.80%実施例2
テトラキス(トリエチルホスフィン)白金0.14mm
ol、トリメチルブロモシラン3.8当量をベンゼン0
.3−中、90℃で19.5時間加熱後、実施例1と同
様に処理した。 trans−トリメチルシリル(ブロ
モ)ビス(トリエチルホスフィン)白金の収率は90%
であった。Melting point: 58-60°C, IR: 1236.1038.8
40.768.742, 618■-1"H-NMR: δ
2.56-1.84 (12H1m), 1.45-1.0
2 (18H, m), 0.83.0.69.0.55 (1
:4:1) (9H1 each s, J(”'Pt-5i-C
-'H)=25.2Hz)ppm- Elemental analysis value C15H3iBrP2PtSi calculated value
C: 30.82%, H: 6.73% actual value
C: 30.80%, H: 6.80% Example 2 Tetrakis (triethylphosphine) platinum 0.14 mm
ol, 3.8 equivalents of trimethylbromosilane in benzene 0
.. After heating at 90° C. for 19.5 hours in Example 3-3, the sample was treated in the same manner as in Example 1. The yield of trans-trimethylsilyl(bromo)bis(triethylphosphine)platinum is 90%.
Met.
実施例3
トリス(トリエチルホスフィン)白金0.17mm+o
l。Example 3 Tris(triethylphosphine)platinum 0.17mm+o
l.
トリメチルヨードシラン3.7当量をベンゼン0.3m
1l中、90℃で1時間加熱することにより、’H−N
MRでは、はぼ定量的に、トリメチルシリル(ヨード)
ビス(トリエチルホスフィン)白金が得られた0反応液
を濃縮して得られる固体をペンタンから再結晶して淡黄
色針状結晶を得た。このものは文献に未収載の新規化合
物であり、その物性値、スペクトルデータなとでは以下
のとおりであった。3.7 equivalents of trimethyliodosilane and 0.3 m of benzene
'H-N
In MR, trimethylsilyl (iodo) can be detected almost quantitatively.
The solid obtained by concentrating the 0 reaction solution in which bis(triethylphosphine)platinum was obtained was recrystallized from pentane to obtain pale yellow needle crystals. This compound is a new compound that has not been described in any literature, and its physical properties and spectral data are as follows.
融点ニア9〜80℃、IR:1234.1038.83
8.760゜720、61111an−’、 ” H
−N M R: δ 2.61−1.98(12H1
鳳)、1.47−0.97(18H,m)、 0.78
.0.65.0.52(1:4:1)(9)1、 各々
3、J(”’Pt−5i−C−″H)= 23.4Hz
)ppm実施例4
テトラキス(トリメチルホスフィン)白金0.30mm
01.トリメチルブロモシラン3.8当量をベンゼン0
゜4mQ中、120℃で18時間加熱することにより1
8 NMRでは50%の収率で、トリメチルシリル(
ブロモ)ビス(トリメチルホスフィン)白金が得られた
。反応液を濃縮し、ベンゼンで抽出した後、ベンゼン溶
液にペンタンを加えることにより淡黄色固体を得た。こ
のものは文献に未収載の新規化合物であり、そのスペク
トルデータは以下のとおりであった。Melting point near 9-80℃, IR: 1234.1038.83
8.760°720, 61111an-', ”H
-NMR: δ 2.61-1.98 (12H1
Otori), 1.47-0.97 (18H, m), 0.78
.. 0.65.0.52 (1:4:1) (9) 1, 3 each, J("'Pt-5i-C-"H) = 23.4Hz
)ppm Example 4 Tetrakis(trimethylphosphine)platinum 0.30mm
01. 3.8 equivalents of trimethylbromosilane and 0 equivalents of benzene
1 by heating at 120℃ for 18 hours in ゜4mQ
8 NMR shows that trimethylsilyl (
Bromo)bis(trimethylphosphine)platinum was obtained. The reaction solution was concentrated and extracted with benzene, and then pentane was added to the benzene solution to obtain a pale yellow solid. This compound is a new compound that has not been described in any literature, and its spectral data are as follows.
1H−NMR:δ L、41(18H,br s)、0
.78.0.63.0.48(1:4: l) (9H
1各々s、 J(”’Pt−3i−C−1H)= 27
.0Hz)ppm
実施例5
テトラキス(トリメチルホスフィン)白金0.23mm
ol、トリメチルヨードシラン3.5当量をベンゼン0
.3d中、90℃で1時間加熱することにより、 1H
−NMRでは90%の収率で、トリメチルシリル(ヨー
ド)ビス(トリメチルホスフィン)白金が得られた0反
応液を濃縮し、ベンゼンで抽出した後、ベンゼン溶液を
濃縮することにより淡黄色固体を得た。このものは文献
に未収載の新規化合物であり、そのスペクトルデータは
以下のとおりであった。1H-NMR: δ L, 41 (18H, br s), 0
.. 78.0.63.0.48 (1:4: l) (9H
1 each s, J(”'Pt-3i-C-1H) = 27
.. 0Hz) ppm Example 5 Tetrakis(trimethylphosphine)platinum 0.23mm
ol, 3.5 equivalents of trimethyliodosilane to benzene 0
.. 1H by heating at 90℃ for 1 hour in 3d
- According to NMR, trimethylsilyl(iodo)bis(trimethylphosphine)platinum was obtained with a yield of 90%.The reaction solution was concentrated, extracted with benzene, and the benzene solution was concentrated to obtain a pale yellow solid. . This compound is a new compound that has not been described in any literature, and its spectral data are as follows.
1H−NMR:δ 1.63(18H,br s)、0
.76、0.61.0.46(1:4:1)(9H1各
々s、 J(”5Pt−5L−C−18)=27.0H
z)”P−NMRニー15.8ppm(J(”P−1g
SPt)=2791Hz)実施例6
テトラキス(ジメチルフェニルホスフィン)白金0.0
8mmol、 トリメチルヨードシラン3.3当量を
ベンゼン0.25越中、120℃で13時間加熱するこ
とにより、’H−NMRでは78%の収率でトリメチル
シリル(ヨード)ビス(ジメチルフェニルホスフィン)
白金が得られた。反応液を′a縮し、ベンゼン−ペンタ
ン(v/v=1:1)で抽出した後、抽出液を濃縮する
ことにより淡黄色固体を得た。このものは5文献に未収
載の新規化合物であり、そのスペクトルデータは以下の
とおりであった。1H-NMR: δ 1.63 (18H, br s), 0
.. 76, 0.61.0.46 (1:4:1) (9H1 each s, J ("5Pt-5L-C-18) = 27.0H
z)"P-NMR knee 15.8ppm (J("P-1g
SPt)=2791Hz) Example 6 Tetrakis(dimethylphenylphosphine)platinum 0.0
By heating 8 mmol, 3.3 equivalents of trimethyliodosilane in 0.25% of benzene at 120°C for 13 hours, trimethylsilyl(iodo)bis(dimethylphenylphosphine) was obtained with a yield of 78% according to 'H-NMR.
Obtained platinum. The reaction solution was condensed, extracted with benzene-pentane (v/v=1:1), and the extract was concentrated to obtain a pale yellow solid. This compound is a new compound that has not been described in 5 literatures, and its spectral data are as follows.
1H−NMR:δ 8.02−7.19(IOH,m)
、1.90(12H1br s)、0.46.0.33
.0.20(1:4:1)(9H1各々s、 J(”5
Pt−5i−C−1H)=23.4Hz)
実施例7
トリス(トリエチルホスフィン)白金0.19namo
l、ジメチルフェニルブロモシラン3.0当量をベンゼ
ン0.30d中、90℃で2時間加熱することにより1
H−NMRでは77%の収率で、ジメチルフェニルシリ
ル(ブロモ)ビス(トリエチルホスフィン)白金が得ら
れた。反応液を濃縮し、ペンタンで抽出した後、ペンタ
ン溶液を冷却することにより淡黄色固体を得た。このも
のは、文献に未収載の新規化合物であり、そのスペクト
ルデータは以下のとおりであった・
1H″″NMRδ 8.1077.36(5H,m)、
2.30−1.68(12H,m)1.45−1.
01(18H,m)、0.99.0.84.0.69(
1:4:1)(6H1各々s、 J(”5Pt−5L−
C−18)=27.0Hz)実施例8
トリス(トリエチルホスフィン)白金0.075mmo
l、メチルトリクロロシラン8.5当量をベンゼン0.
25d中、90℃で15分加熱することにより、 11
(−NMRでは、はぼ定量的にジクロロメチルシリル(
クロロ)ビス(トリエチルホスフィン)白金が得られた
0反応液を濃縮することによりことにより無色高粘性液
体を得た。このものは、文献に未収載の新規化合物であ
り、その物性値、スペクトルデータなどは以下のとおり
であった。1H-NMR: δ 8.02-7.19 (IOH, m)
, 1.90 (12H1br s), 0.46.0.33
.. 0.20 (1:4:1) (9H1 each s, J(”5
Pt-5i-C-1H) = 23.4Hz) Example 7 Tris(triethylphosphine)platinum 0.19namo
1, by heating 3.0 equivalents of dimethylphenylbromosilane in 0.30 d of benzene at 90°C for 2 hours.
According to H-NMR, dimethylphenylsilyl(bromo)bis(triethylphosphine)platinum was obtained with a yield of 77%. After concentrating the reaction solution and extracting with pentane, a pale yellow solid was obtained by cooling the pentane solution. This is a new compound that has not been described in the literature, and its spectral data were as follows: 1H″NMRδ 8.1077.36 (5H, m);
2.30-1.68 (12H, m) 1.45-1.
01 (18H, m), 0.99.0.84.0.69 (
1:4:1) (6H1 each s, J("5Pt-5L-
C-18) = 27.0Hz) Example 8 Tris(triethylphosphine)platinum 0.075mmo
1, 8.5 equivalents of methyltrichlorosilane and 0.1 equivalent of benzene.
By heating at 90°C for 15 minutes in 25d, 11
(-NMR shows that dichloromethylsilyl (
A colorless, highly viscous liquid was obtained by concentrating the reaction solution from which chloro)bis(triethylphosphine)platinum was obtained. This compound is a new compound that has not been described in any literature, and its physical property values, spectral data, etc. are as follows.
1H−NMR:62.48−1.96(12H,m)、
1.39−0.97(18H1m)1.47.1.38
.1.29(1:4:1) (3H1各々、 J(19
S pi−3i−C−1H)=16.2)1z)’ 1
P−NMR:19 、 Oppm (J (31P−”
’ Pt )=2512Hz)実施例9
トリス(トリエチルホスフィン)白金0.06mmd。1H-NMR: 62.48-1.96 (12H, m),
1.39-0.97 (18H1m) 1.47.1.38
.. 1.29 (1:4:1) (3H1 each, J(19
S pi-3i-C-1H)=16.2)1z)' 1
P-NMR: 19, Oppm (J (31P-”
'Pt)=2512Hz) Example 9 Tris(triethylphosphine)platinum 0.06 mmd.
ジクロロジメチルシラン3当量を、ベンゼン0.2m1
l中、120℃で1時間加熱することにより、1)1−
NMRでは90%の収率でクロロジメチルシリル(クロ
ロ)ビス(トリエチルホスホフィン)白金が得られた。3 equivalents of dichlorodimethylsilane, 0.2ml of benzene
1) 1-
According to NMR, chlorodimethylsilyl(chloro)bis(triethylphosphophine)platinum was obtained with a yield of 90%.
反応液を濃縮することにより、淡黄色高粘性液体を得た
。このものは文献に未収載の新規化合物であり、その物
性値、スペクトルデータなとは以下のとおりであった。By concentrating the reaction solution, a pale yellow highly viscous liquid was obtained. This compound is a new compound that has not been described in any literature, and its physical properties and spectral data are as follows.
1H−NMR82,37−1,72(12H,m)、1
.31−0.79(18H。1H-NMR82,37-1,72(12H,m),1
.. 31-0.79 (18H.
m) 1.09.0.97.0.85(1:4:1)
(6H1各々s、J(L″5Pt−5i−C−H)=2
1.61(z)′”P−NMR19,2ppm(J(3
1P−”’Pt)=2700Hz)実施例10
トリス(トリエチルホスフィン)白金0.38mmol
、ヨードペンタメチルジシラン2.5当量を、ベンゼン
0.60−中、90℃で10分加熱することにより、
90%の収率でペンタメチルジシリル(ヨード)ビス(
トリエチルホスフィン)白金が得られた0反応液を濃縮
し、ベンゼン−ペンタン(v/v=1:l)で抽出した
後、抽出液を濃縮することにより、淡黄色固体を得た。m) 1.09.0.97.0.85 (1:4:1)
(6H1 each s, J(L″5Pt-5i-C-H)=2
1.61(z)′”P-NMR19.2ppm (J(3
1P-”'Pt)=2700Hz) Example 10 Tris(triethylphosphine)platinum 0.38 mmol
, by heating 2.5 equivalents of iodopentamethyldisilane in 0.60°C of benzene at 90°C for 10 minutes.
Pentamethyldisilyl(iodo)bis(
The reaction solution yielding platinum (triethylphosphine) was concentrated, extracted with benzene-pentane (v/v=1:l), and the extract was concentrated to obtain a pale yellow solid.
このものは文献に未収載の新規化合物であり、そのスペ
クトルデータは以下のとおりであった。This compound is a new compound that has not been described in any literature, and its spectral data are as follows.
1H−NMR:δ 2.62−2.10(12H−m)
、1.47−0.99(18H1m)0.90.0.7
1.0.52(1:4:1) (6H1各々s、 J(
”5Pt−Si−C−1)1)=34.2)IZ)、0
.45(9)1. s)。1H-NMR: δ 2.62-2.10 (12H-m)
, 1.47-0.99 (18H1m) 0.90.0.7
1.0.52 (1:4:1) (6H1 each s, J(
"5Pt-Si-C-1)1)=34.2)IZ),0
.. 45(9)1. s).
Claims (1)
に、少なくとも2分子のホスフィンを配位した0価のニ
ッケル族遷移金属錯体を反応させることを特徴とするS
i−M(M:ニッケル族遷移金属)結合を有するニッケ
ル族遷移金属錯体の製造方法。(1) S characterized by reacting a silicon compound having a silicon-halogen atom bond with a zero-valent nickel group transition metal complex coordinated with at least two molecules of phosphine.
A method for producing a nickel group transition metal complex having an i-M (M: nickel group transition metal) bond.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63254508A JPH02794A (en) | 1988-02-10 | 1988-10-07 | Production of complex of nickel group metal having silicon-transition metal bond |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2949188 | 1988-02-10 | ||
| JP63-29491 | 1988-02-10 | ||
| JP63254508A JPH02794A (en) | 1988-02-10 | 1988-10-07 | Production of complex of nickel group metal having silicon-transition metal bond |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02794A true JPH02794A (en) | 1990-01-05 |
| JPH0552840B2 JPH0552840B2 (en) | 1993-08-06 |
Family
ID=12277543
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63254508A Granted JPH02794A (en) | 1988-02-10 | 1988-10-07 | Production of complex of nickel group metal having silicon-transition metal bond |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02794A (en) |
-
1988
- 1988-10-07 JP JP63254508A patent/JPH02794A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0552840B2 (en) | 1993-08-06 |
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