JPH0280346A - Composite for substrate to be calcined at low temperature and low-temperature calcined substrate - Google Patents
Composite for substrate to be calcined at low temperature and low-temperature calcined substrateInfo
- Publication number
- JPH0280346A JPH0280346A JP63227534A JP22753488A JPH0280346A JP H0280346 A JPH0280346 A JP H0280346A JP 63227534 A JP63227534 A JP 63227534A JP 22753488 A JP22753488 A JP 22753488A JP H0280346 A JPH0280346 A JP H0280346A
- Authority
- JP
- Japan
- Prior art keywords
- low
- lead
- substrate
- temperature
- calcined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、低温焼成基板用組成物等に関するものである
。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a composition for low-temperature firing substrates and the like.
[従来の技術]
低融点ガラスフリット等やアルミナ等の無機耐火物フィ
ラーを使用した1000℃以下で焼成される低温焼成基
板は、多層化した場合、Cu、 Ag等の低融点、低抵
抗の導体が使用できるため高周波回路に適しており、注
目を集めている。[Conventional technology] Low-temperature fired substrates that are fired at 1000°C or less using low-melting point glass frit, etc. or inorganic refractory fillers such as alumina, when multilayered, are made of low-melting point, low-resistance conductors such as Cu and Ag. It is suitable for high-frequency circuits and is attracting attention because it can be used with
しかし、該低温焼成基板は、1000℃以下の低温度で
の焼結を可能にするために、高融点の無機耐火物フィラ
ーと、500〜800℃で軟化する低融点ガラスフリッ
トから構成されている。However, in order to enable sintering at a low temperature of 1000°C or lower, the low-temperature firing substrate is composed of a high-melting point inorganic refractory filler and a low-melting glass frit that softens at 500 to 800°C. .
そのため、焼成温度、例えば900℃では、軟化した低
融点ガラスは流動性を増し、上記基板表面に流出し、該
基板表面に形成されている導体表面をおおい半田濡れ性
を悪化させるという欠点があった。Therefore, at a firing temperature of, for example, 900°C, the softened low-melting glass increases its fluidity and flows out onto the surface of the substrate, which has the disadvantage that it covers the surface of the conductor formed on the surface of the substrate and deteriorates the solder wettability. Ta.
またこの基板表面への低融点ガラスの流出を防止するた
め、軟化点が、該基板の焼成温度に近いガラスを用いた
場合、例えば、ガラス軟化点900℃のガラスを用いて
900℃で焼成する場合には、ガラスの流動性が不足し
、基板が緻密に焼結出来なくなり強度的に弱くなるとい
う欠点があった。Furthermore, in order to prevent the low melting point glass from flowing out onto the surface of the substrate, if a glass whose softening point is close to the firing temperature of the substrate is used, for example, glass with a glass softening point of 900°C is fired at 900°C. In some cases, the fluidity of the glass is insufficient and the substrate cannot be sintered densely, resulting in a weak strength.
[発明の解決しようとする課題]
本発明の目的は、従来技術が有していた前述の欠点を解
消しようとするものであり、従来知られていなかった低
温焼成基板用組成物等を新規に提供することを目的とす
るものである。[Problems to be Solved by the Invention] The purpose of the present invention is to solve the above-mentioned drawbacks of the prior art, and to create a new composition for low-temperature firing substrates that was previously unknown. The purpose is to provide
[課題を解決するための手段]
本発明は、前述の課題を解決すべ(なされたものであり
、無機成分が鉛含有低融点ガラスフリットと耐火物フィ
ラーとからなる低温焼成基板用組成物において、焼成時
に鉛と反応し、鉛化合物を形成する物質を上記無機成分
に対し0.01〜30重量%添加してなる低温焼成基板
用組成物を提供するものである。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems, and in a composition for a low-temperature fired substrate whose inorganic components are a lead-containing low-melting glass frit and a refractory filler, The object of the present invention is to provide a composition for a low-temperature fired substrate, in which a substance that reacts with lead to form a lead compound during firing is added in an amount of 0.01 to 30% by weight based on the above inorganic components.
以下本発明の詳細な説明する。尚%は特に記載しない限
り重量%を意味する。The present invention will be explained in detail below. Note that % means weight % unless otherwise specified.
本発明は鉛(pb)を含有した低融点ガラスフリット、
耐火物フィラー等からなる低温焼成基板用組成物におい
て、該組成物中にNbJs。The present invention provides a low melting point glass frit containing lead (pb),
In a composition for a low-temperature fired substrate comprising a refractory filler or the like, NbJs is contained in the composition.
Ta21s等の鉛化合物を形成する物質を含有させるこ
とにより、1000”C以下の焼成の際、上記低温焼成
基板用組成物中の低融点ガラスフリットに含有されてい
るpbと上記鉛化合物を形成する物質が反応し、鉛化合
物を形成することにより、上記基板表面への低融点ガラ
スの溶出を防止しようとするものである。尚pbは通常
上記低融点ガラスフリット中に酸化鉛物として含有され
ている。By containing a substance that forms a lead compound such as Ta21s, the lead compound is formed with PB contained in the low melting point glass frit in the low temperature fired substrate composition during firing at 1000"C or less. This is intended to prevent the elution of the low melting point glass onto the surface of the substrate by causing the substances to react and forming a lead compound.Note that PB is usually contained in the low melting point glass frit as a lead oxide. There is.
上記鉛化合物を形成する物質は、単独で使用しても良く
、2種併用しても良い。The substances forming the lead compound may be used alone or in combination of two types.
該鉛化合物を形成する物質の添加量は、低融点ガラスフ
リット及び耐火物フィラーの総量である無機成分に対し
て0.01〜30%添加するのが好ましい。The amount of the substance forming the lead compound added is preferably 0.01 to 30% based on the total amount of the low melting point glass frit and the refractory filler, which is the inorganic component.
添加量が0.01%未満では添加による半田濡れ向上の
効果が少な(、他方30%を越えると低温焼成基板の誘
電率が増大するので好ましくない。望ましい範囲は0.
05〜20%であり、特に望ましい範囲は0.1〜lO
%である。If the amount added is less than 0.01%, the effect of improving solder wetting will be small (on the other hand, if it exceeds 30%, the dielectric constant of the low-temperature fired substrate will increase, which is undesirable. The desirable range is 0.01%.
05 to 20%, and a particularly desirable range is 0.1 to 1O
%.
一方、本発明にかかる、鉛を含有したガラスフリット量
は特には限定されないが、無機成分中のガラスフリット
量が、30%より少ないと緻密な焼結層が出来ず、70
%より多いと基板の導体の半田濡れ性が低下するので好
ましくない。On the other hand, the amount of lead-containing glass frit according to the present invention is not particularly limited, but if the amount of glass frit in the inorganic component is less than 30%, a dense sintered layer cannot be formed;
% or more is not preferable because the solder wettability of the conductor on the board decreases.
鉛含有ガラスフリット量は、40〜60%が、特に望ま
しい。The amount of lead-containing glass frit is particularly preferably 40 to 60%.
耐火物フィラーとしてはアルミナ(A1.O,)、ジル
コン、コージライト、フォルステライト等が、単独また
は併用で用いることが出来る。これらフィラーは、いず
れもガラスとなじみ易く、緻密な焼結基板が得られ、さ
らには入手し易いという特徴を持っている。As the refractory filler, alumina (A1.O,), zircon, cordierite, forsterite, etc. can be used alone or in combination. All of these fillers have the characteristics of being compatible with glass, producing a dense sintered substrate, and being easy to obtain.
[作用]
本発明において、本発明にかかる鉛化合物を形成する物
質であるNb2O5,TaaOsは低温焼成基板用組成
物中の低融点ガラスフリットに含まれているpboと反
応し、PbNb1Os、 PbTa*Osを形成するこ
とによって上記低融点ガラスの軟化点を上昇させる働き
をする。そのため焼成時の上記低融点ガラスの流動性の
余分な増大を防ぎ、低温焼成基板表面への該低融点ガラ
スの流出を防止する。従って、低温焼成基板表面へ流出
した上記低融点ガラスが導体表面を覆い半田濡れ性を阻
害する現象を防止する。[Function] In the present invention, Nb2O5 and TaaOs, which are substances forming the lead compound according to the present invention, react with pbo contained in the low melting point glass frit in the composition for a low temperature fired substrate, and form PbNb1Os, PbTa*Os. By forming this, it functions to raise the softening point of the above-mentioned low melting point glass. Therefore, the fluidity of the low melting point glass is prevented from increasing excessively during firing, and the low melting point glass is prevented from flowing out onto the surface of the low temperature fired substrate. Therefore, the phenomenon in which the low melting point glass flowing out onto the surface of the low-temperature fired substrate covers the conductor surface and inhibits solder wettability is prevented.
[実施例]
耐火物フィラーとしてアルミナ60%、低融点ガラスフ
リット(Pb0−Altos−3iOa−fl:aO系
)40%の混合物に、NbzOs 、 TazOsを[
表−1]に示した割合で添加した0次いで、これらに有
機バインダーとしてアクリル樹脂、可塑剤としてフタル
酸ジブチル並びに溶剤としてトルエンを添加し、混練し
て粘度10000〜30000 CPSのスラリーを作
製した。[Example] NbzOs, TazOs [
Next, an acrylic resin as an organic binder, dibutyl phthalate as a plasticizer, and toluene as a solvent were added to these and kneaded to prepare a slurry having a viscosity of 10,000 to 30,000 CPS.
次いでこのスラリーを約0.2mm厚のシートに成形し
た後、70℃で2時間乾燥し、グリーンシートを作製し
た。このグリーンシートに導体ペーストを印刷し、12
層に積層し90℃、10kg/am”、6分間熱圧着し
、900℃、6時間焼成し多層の低温焼成基板を得た。Next, this slurry was formed into a sheet with a thickness of about 0.2 mm, and then dried at 70° C. for 2 hours to produce a green sheet. Print conductor paste on this green sheet and
The layers were laminated, thermocompressed at 90° C., 10 kg/am” for 6 minutes, and fired at 900° C. for 6 hours to obtain a multilayer low temperature fired substrate.
焼成雰囲気は、Ag−Pd導体を印刷した場合は、空気
中であリ、銅導体を印刷した場合は、窒素中であった。The firing atmosphere was air when the Ag-Pd conductor was printed, and nitrogen when the copper conductor was printed.
この多層の低温焼成基板について、焼結密度、気孔率、
半田濡れ性誘電率を評価した。導体の材質及び評価結果
を[表−1]の実施例と1表−2]の比較例に示した。Regarding this multilayer low temperature fired substrate, the sintered density, porosity,
The solder wettability and dielectric constant were evaluated. The conductor materials and evaluation results are shown in Examples in [Table 1] and Comparative Examples in Table 1 and Table 2].
[特性評価方法]
誘 電 率:安藤電気製交流ブリッジにより100kH
zの特性を測定し評価した。[Characteristics evaluation method] Dielectric constant: 100kHz by Ando Electric AC bridge
The characteristics of z were measured and evaluated.
温度25±1℃、湿度45±1% 半田の濡れた面積割合を評価し た。Temperature 25±1℃, humidity 45±1% Evaluate the wet area ratio of solder Ta.
面積割合を評価した。The area ratio was evaluated.
[表−1]の続き
実施例
[表−1]
実施例
[表−1]の続き
実施例
[表−2]
比較例
[発明の効果]
本発明にかかるNb2O5、Taxes等の鉛化合物を
形成する物質は、低温焼成基板表面からの低融点ガラス
の流出を防止し、優れた半田濡れ性を示す低温焼成基板
用組成物と低温焼成基板を新規に提供するものであり、
その工業的価値は多大である。Continuation of [Table-1] Example [Table-1] Continuation of Example [Table-1] Example [Table-2] Comparative example [Effect of the invention] Formation of lead compounds such as Nb2O5, Taxes, etc. according to the present invention The substance prevents the outflow of low-melting point glass from the surface of the low-temperature fired substrate and provides a new low-temperature fired substrate composition and low-temperature fired substrate that exhibits excellent solder wettability.
Its industrial value is enormous.
Claims (2)
フィラーとからなる低温焼成基板用組成物において、焼
成時に鉛と反応し、鉛化 合物を形成する物質を上記無機成分に対し 0.01〜30重量%添加してなる低温焼成基板用組成
物。(1) In a low-temperature firing substrate composition in which the inorganic component is a lead-containing low-melting glass frit and a refractory filler, the amount of a substance that reacts with lead to form a lead compound during firing is 0.01 to 0.01 to the above inorganic component. A composition for low-temperature firing substrates containing 30% by weight.
る低温焼成基板。(2) A low-temperature-fired substrate obtained by firing the composition for a low-temperature-fired substrate according to item 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63227534A JPH0280346A (en) | 1988-09-13 | 1988-09-13 | Composite for substrate to be calcined at low temperature and low-temperature calcined substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63227534A JPH0280346A (en) | 1988-09-13 | 1988-09-13 | Composite for substrate to be calcined at low temperature and low-temperature calcined substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0280346A true JPH0280346A (en) | 1990-03-20 |
Family
ID=16862411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63227534A Pending JPH0280346A (en) | 1988-09-13 | 1988-09-13 | Composite for substrate to be calcined at low temperature and low-temperature calcined substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0280346A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6265965A (en) * | 1985-09-18 | 1987-03-25 | 旭硝子株式会社 | Glass ceramic composition for low temperature sintered substrate |
-
1988
- 1988-09-13 JP JP63227534A patent/JPH0280346A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6265965A (en) * | 1985-09-18 | 1987-03-25 | 旭硝子株式会社 | Glass ceramic composition for low temperature sintered substrate |
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