JPH0281035U - - Google Patents
Info
- Publication number
- JPH0281035U JPH0281035U JP16002988U JP16002988U JPH0281035U JP H0281035 U JPH0281035 U JP H0281035U JP 16002988 U JP16002988 U JP 16002988U JP 16002988 U JP16002988 U JP 16002988U JP H0281035 U JPH0281035 U JP H0281035U
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- portion located
- semiconductor manufacturing
- furnace tube
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図は、この考案の半導体製造装置の一実施
例の縦断面図である。 １……均熱部石英管、２……炉口側部石英管、
３……キヤツプ、４……炉体均熱部、５……炉体
ヒーター部、６……接続テーパー部。
例の縦断面図である。 １……均熱部石英管、２……炉口側部石英管、
３……キヤツプ、４……炉体均熱部、５……炉体
ヒーター部、６……接続テーパー部。
Claims (1)
- 加熱炉に長尺の石英炉心管が収容されており、
この石英炉心管内に挿入された半導体基板に加熱
処理を施す半導体製造装置において、前記石英炉
心管が前記加熱炉の均熱部に位置する部分と炉口
側に位置する部分とに分離されており着脱可能に
嵌合されていることを特徴とする半導体製造装置
。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16002988U JPH0281035U (ja) | 1988-12-09 | 1988-12-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16002988U JPH0281035U (ja) | 1988-12-09 | 1988-12-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0281035U true JPH0281035U (ja) | 1990-06-22 |
Family
ID=31441742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16002988U Pending JPH0281035U (ja) | 1988-12-09 | 1988-12-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0281035U (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05259146A (ja) * | 1992-03-09 | 1993-10-08 | Hitachi Ltd | 半導体製造装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52150961A (en) * | 1976-06-11 | 1977-12-15 | Hitachi Ltd | Reaction tube in a heat treatment furnace |
| JPS58123719A (ja) * | 1982-01-19 | 1983-07-23 | Seiko Instr & Electronics Ltd | 半導体装置の製造装置 |
-
1988
- 1988-12-09 JP JP16002988U patent/JPH0281035U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52150961A (en) * | 1976-06-11 | 1977-12-15 | Hitachi Ltd | Reaction tube in a heat treatment furnace |
| JPS58123719A (ja) * | 1982-01-19 | 1983-07-23 | Seiko Instr & Electronics Ltd | 半導体装置の製造装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05259146A (ja) * | 1992-03-09 | 1993-10-08 | Hitachi Ltd | 半導体製造装置 |