JPH028199Y2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION This invention relates to an electron beam macro analyzer device, and particularly relates to an improvement for simultaneous contouring and analysis of a sample.

Conventionally, before the rolling process of iron rolling materials such as slabs and blooms, a portion of the material is cut into a predetermined thickness sample, and the quality is determined based on the elemental distribution of precipitates that appear on the cut surface. It was judged as good or bad. Furthermore, this distribution inspection was carried out using the sulfur print method, which required a relatively large number of steps and was not only inefficient, but also difficult to quantitatively understand the precipitates. It was hot. In addition, an X-ray microanalyzer is used as a means to quickly analyze the elements contained in minute parts of metals, but in order to know the precipitate distribution in the cross section of slabs, blooms, etc. using this equipment,
Not only does the sample have to be cut into analysis samples with a size of about 20 mm x 20 mm, but also because the area of this analysis point is about a few microns.
It takes too much time to perform surface analysis of cross sections of slabs, blooms, etc. Therefore, slabs,
For surface analysis of large samples such as cross-sectional samples of blooms, conventional X-ray microanalyzers having such a configuration have extremely low analysis efficiency and increased costs.

In addition, inspections in the manufacturing process of slabs, blooms, etc. require quick area analysis of the entire cross-sectional sample, so the outline of the sample must be mapped in advance before measurement.
It was necessary to input the information to the CPU and control the measurement location using the CPU. However, such a method not only requires a complicated apparatus, but also significantly increases the cost of the apparatus. Furthermore, visual observation is also available as a method of checking measurement points, but this method cannot be said to be very practical from the point of view of automation of the apparatus.

The purpose of this invention is to provide an extremely effective means to quickly eliminate the above-mentioned defects, and the gist of this invention to achieve this purpose is to The X-ray spectrometer and the contour discriminator are operated in both the X and Y directions so that the contour discrimination and analysis of the sample can be performed simultaneously using the X-ray spectrometer and the contour discriminator.

Hereinafter, a preferred embodiment of the electron beam macro analyzer device according to the invention will be described in detail with reference to the drawings. The electron beam is focused by an electron lens 2 and irradiated onto a sample 3. A scanning coil 4 for scanning the electron beam is provided below the electron lens 2, and X-rays generated from the sample 3 are incident on an X-ray spectrometer 5.
The output signal of the X-ray spectrometer 5 is sent to a display unit 8 consisting of a CRT via an X-ray measurement circuit 6 and a CPU 7, and the status of the sample 3 is displayed on the display unit 8. This sample 3 is provided in a recess 10a of a sample holder 10 provided on a sample stage 9, and this sample stage 9 is configured to be operated in both the X and Y directions by an XY stage controller device. Further, a contour discrimination device 11 is provided as means for capturing the X-rays or reflected electrons, and an output signal of the contour discrimination device 11 is applied to the scanning coil 4 via the CPU 12.

This contour discriminating device 11 is configured as shown in the block diagram shown in FIG. After summer,
This electric signal passes through an amplifier 22 and then enters a comparator 2.
3, the presence or absence of a sample is determined and an output signal is output. This filter 20 absorbs fluorescent X-rays Fe-Kx from iron, which is the main constituent element of the sample 3, and fluorescent X-rays from the sample holder 10.
Cu-Kx and Zn-Kx can be distinguished very clearly, that is, Fe-Kx can pass through, but Cu-Kx and Zn-Kx cannot.

With the above configuration, for example,
Fluorescent X-ray Al-K from precipitates such as Al ₂ O ₃ and MnS〓,
S−K〓 is spectrally detected by the X-ray spectrometer 5, and the detected fluorescent X-rays are measured by the X-ray measurement circuit 6 and output as X-ray intensity to the CPU 7, and at the same time, the sample stage 9 is moved in the XY direction. By driving the electron beam, the electron beam can scan the entire surface of the sample 3 (in this case, a rail fragment).

The electron beam macro analyzer device according to this invention has the above-mentioned configuration and function, so it has an innovative configuration that allows analysis of large samples and contour discrimination at the same time. It is possible to obtain a great effect in the analysis and measurement of this type of sample.

The above example describes a method for determining contours using characteristic X-rays from iron, which is the main constituent element of the sample, but by changing the material of the sample holder to Al,
The same effect can be expected even if continuous X-ray doses are detected. Moreover, even if reflected electrons are detected instead of continuous X-ray detection, exactly the same effect can be expected.

[Brief explanation of the drawing]

FIG. 1 is a block diagram showing an electron beam macro analyzer device according to this invention, and FIG. 2 is a block circuit diagram showing the main parts of FIG. 1. 1... Electron gun, 3... Sample, 5... X-ray spectrometer, 10... Sample holder, 11... Outline discrimination device.

Claims (1)

[Claims for Utility Model Registration] An electron gun that emits an electron beam, an electron lens 2 that focuses the emitted electron beam, and a scanning coil 4 that scans the focused electron beam.
An X-ray spectrometer 5 that separates X-rays generated from the surface of the sample and a signal from the X-ray spectrometer 5 are input.
An X-ray measurement circuit that outputs a measurement signal to the CPU 7,
In an electron beam macro analyzer device that analyzes the composition of a sample by irradiating the sample with an electron beam and spectroscopy of the X-rays generated from the sample, the display section 8 displays signals from the CPU 7. X-rays generated from the irradiated surface by beam irradiation pass through a filter 20 that transmits only the X-rays generated from the sample, and the X-rays that have passed through the filter 20 are detected by an X-ray detector 21. The contour discriminating device 11 is equipped with an amplifier 22 that amplifies the X-rays detected by the electron beam, and a comparator 23 that compares the amplified signal of the X-rays with a certain value to determine whether or not there is a sample at the electron beam irradiation position. When the CPU 12 processes the signal from the contour discrimination device 11 and determines that the sample does not exist at the electron beam irradiation position, the XY stage controller 9a and scanning coil 4 are activated to displace the X-ray irradiation position and scan the entire surface of the sample. An electron beam macro analyzer device comprising the CPU 12 that outputs signals, and a sample stage 9 that displaces a sample holder 10 two-dimensionally based on signals from an XY stage controller 9a.