JPH0283017U - - Google Patents

Info

Publication number
JPH0283017U
JPH0283017U JP16094588U JP16094588U JPH0283017U JP H0283017 U JPH0283017 U JP H0283017U JP 16094588 U JP16094588 U JP 16094588U JP 16094588 U JP16094588 U JP 16094588U JP H0283017 U JPH0283017 U JP H0283017U
Authority
JP
Japan
Prior art keywords
filter
outlet
center
filtration material
porous filtration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16094588U
Other languages
Japanese (ja)
Other versions
JPH069020Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988160945U priority Critical patent/JPH069020Y2/en
Publication of JPH0283017U publication Critical patent/JPH0283017U/ja
Application granted granted Critical
Publication of JPH069020Y2 publication Critical patent/JPH069020Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Filtering Of Dispersed Particles In Gases (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本考案による濾過器の概略断面図、第
２図は第１図の濾過器の平面図、第３図は本考案
による濾過器をプラズマエツチング装置用電極と
して用いたプラズマエツチング装置を示す概略断
面図、第４図は本考案による濾過器の他の例を示
す概略断面図、第５図は従来の濾過器の概略断面
図、第６図は従来の濾過器をプラズマエツチング
装置用電極として用いたプラズマエツチング装置
を示す概略断面図である。 １，２１，３１…濾過器、２，２２，３２…流
出口、３，２３，３３…多孔質濾過材、４，２４
，３４…流入口、５，２５，３５…流体、１１，
４１…ケーシング、１２，４２…エツチング室、
１３，４３…上部電極（濾過器）、１３ａ，４３
ａ…流入口、１３ｂ，４３ｂ…流出口、１３ｃ，
４３ｃ…多孔質濾過材、１４，４４…下部電極、
１４ａ，４４ａ…水冷部分、１５，４５…反応性
ガス、１６，４６…基板、１７，４７…高周波電
源、１８，４８…排気口。 FIG. 1 is a schematic sectional view of a filter according to the present invention, FIG. 2 is a plan view of the filter shown in FIG. 4 is a schematic sectional view showing another example of a filter according to the present invention, FIG. 5 is a schematic sectional view of a conventional filter, and FIG. 6 is a schematic sectional view of a conventional filter for plasma etching equipment. FIG. 2 is a schematic cross-sectional view showing a plasma etching device used as an electrode. 1, 21, 31... Filter, 2, 22, 32... Outlet, 3, 23, 33... Porous filter material, 4, 24
, 34... inlet, 5, 25, 35... fluid, 11,
41...Casing, 12,42...Etching chamber,
13, 43... Upper electrode (filter), 13a, 43
a... Inlet, 13b, 43b... Outlet, 13c,
43c... Porous filter material, 14, 44... Lower electrode,
14a, 44a...water cooling part, 15,45...reactive gas, 16,46...substrate, 17,47...high frequency power supply, 18,48...exhaust port.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 上流中央に小径の流体流入口を有するとともに
、下流に大径の流出口を具え、この流出口に多孔
質濾過材を配設した濾過器であつて、前記多孔質
濾過材を、中央部を厚肉とするとともに、端部に
向けて順次薄肉とした凸レンズ形状としたことを
特徴とする濾過器。 A filter having a small-diameter fluid inlet at the center of the upstream, a large-diameter outlet at the downstream, and a porous filtration material disposed at the outlet, the porous filtration material being disposed at the center of the filter. A filter characterized by having a thick wall and a convex lens shape that gradually becomes thinner toward the end.
JP1988160945U 1988-12-12 1988-12-12 Porous electrode Expired - Lifetime JPH069020Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988160945U JPH069020Y2 (en) 1988-12-12 1988-12-12 Porous electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988160945U JPH069020Y2 (en) 1988-12-12 1988-12-12 Porous electrode

Publications (2)

Publication Number Publication Date
JPH0283017U true JPH0283017U (en) 1990-06-27
JPH069020Y2 JPH069020Y2 (en) 1994-03-09

Family

ID=31443459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988160945U Expired - Lifetime JPH069020Y2 (en) 1988-12-12 1988-12-12 Porous electrode

Country Status (1)

Country Link
JP (1) JPH069020Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11149995A (en) * 1997-11-14 1999-06-02 Foi:Kk Plasma processing equipment
JP2022061936A (en) * 2020-10-07 2022-04-19 株式会社リコー Filter holding device, developing device, process cartridge, and image forming device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162918U (en) * 1983-04-18 1984-10-31 株式会社共立 air cleaner

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162918U (en) * 1983-04-18 1984-10-31 株式会社共立 air cleaner

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11149995A (en) * 1997-11-14 1999-06-02 Foi:Kk Plasma processing equipment
JP2022061936A (en) * 2020-10-07 2022-04-19 株式会社リコー Filter holding device, developing device, process cartridge, and image forming device

Also Published As

Publication number Publication date
JPH069020Y2 (en) 1994-03-09

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