JPH028368A - Automatic film-forming equipment - Google Patents

Abstract

PURPOSE:To shorten the length of time required for the feedback of film-forming conditions by making laser light incident upon the film surface of a substrate on which a film is formed in a chamber and then making the reflected laser light incident upon a photodetector. CONSTITUTION:The inside of a chamber 10 in a sputtering device is constituted so that it is provided with a laser light emitting device 1 and a photodetector 2, and a film formed on a substrate 3 is irradiated with laser light from the laser light emitting device 1. Subsequently, the laser light reflected from the film is made incident upon the photodetector 2 and measured, and the measured signals are sent to a sputtering condition-control part 7. The conditions for the subsequent sputtering are determined from the measured reflectivity in the sputtering condition-control part 7 and a sputtering controller 6 is controlled to make preparations for the subsequent sputtering. By this method, stable film formation in large quantities can be continuously carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Use] The present invention relates to an automatic film forming apparatus, particularly an automatic film forming apparatus for forming thin films by sputtering, vapor deposition, or the like.

[Conventional technology]

Conventional automatic film deposition equipment measures the reflectance of a thin film that has been deposited by taking it out of a vacuum chamber.

[Problem to be solved by the invention]

However, in the above-mentioned conventional automatic film deposition equipment, the substrate on which the film has been deposited is removed from the chamber and the reflectance of the thin film is measured, which takes time to provide feedback to the next deposition conditions. There were drawbacks.

[Means to solve the problem]

The automatic film forming apparatus of the present invention includes a laser light generator installed in a chamber so that laser light is incident on the film surface formed on the film, and a photodetector installed so that the laser light reflected from the film surface is incident. , a film-forming condition control unit that processes the detector output signal and controls film-forming conditions.

〔Example〕

Next, embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic diagram showing an embodiment of the present invention.

In the automatic film forming apparatus shown in FIG. 1, a laser light generator 1 is installed so that laser light is incident on a film formed on a substrate 3 in a chamber of a sputtering apparatus, and the laser light reflected from the film is A photodetector 2 is installed so that the light is incident.

The reflectance of the film formed on the substrate 3 is measured by the amount of laser light incident on the photodetector 2, and a measured value signal is sent to the controller 7 for controlling sputtering conditions. The sputtering condition control controller 7 determines the next sputtering condition based on the measured reflectance and controls the sputtering control section 6 to prepare for the next film formation.

In the above-mentioned embodiment, an example was shown in which the film-forming condition control section consisted of a sputtering condition control controller and a sputtering control section, but these may be configured as one body or may be formed by vapor deposition.

〔Effect of the invention〕

The automatic film deposition apparatus of the present invention adds a laser light generator and a photodetector to the chamber and can measure the reflectance of the film immediately after deposition, so the next deposition conditions can be quickly determined. Since the time required for feedback of conditions can be shortened, a large amount of film can be deposited continuously and stably.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram showing an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1...Laser beam generator, 2...Photodetector, 3...Substrate, 4...Target, 5...Shutter, 6... ... Sputter controller, 7 ... Sputter condition control unit, 10 ... Chamber agent, patent attorney
Susumu Hara

Claims (1)

[Claims] a chamber, a laser light generator arranged so that a laser beam is incident on the film surface of a substrate formed in the chamber, a photodetector arranged so that the laser light reflected from the film surface is incident, and a detector. An automatic film deposition apparatus characterized by including a deposition condition control section that processes output signals and controls deposition conditions.