JPS559543A - Antireflecting film formation control unit - Google Patents

Antireflecting film formation control unit

Info

Publication number
JPS559543A
JPS559543A JP8226078A JP8226078A JPS559543A JP S559543 A JPS559543 A JP S559543A JP 8226078 A JP8226078 A JP 8226078A JP 8226078 A JP8226078 A JP 8226078A JP S559543 A JPS559543 A JP S559543A
Authority
JP
Japan
Prior art keywords
light
reflectance
detected
point
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8226078A
Other languages
Japanese (ja)
Inventor
Masahito Nakajima
Katsumi Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8226078A priority Critical patent/JPS559543A/en
Publication of JPS559543A publication Critical patent/JPS559543A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE:To enable accuracy to be increased and the number of steps to be reduced by intensity-modulating and radiating the light of a single wavelength to the surface of optical substrates, deteting the point where the reflectance thereof change and controlling the antireflection film to an optimum thickness. CONSTITUTION:The substrate 7' to be monitored of its film thickness is determined among multiple optical substrates 7'. Light of a single wavelength having undergone intensity modulation is radiated from a light emitting light source 1 and the quantity of this light is detected with a radiation light quantity detector 2. The light having reached the substrate 7' through reflecting mirror 6 from the light emitting light source 1 and reflected therefrom is detected in a reflected light quantity detector 3. The reflectance of the substrate sample 7' is obtained based on the outputs of both light quantity detectors 2, 3 and the point where said reflectance turns over from decrease to increase or the point where it becomes lower than the specified value is detected and the thickness of the antireflection films is so controlled as to become optimum.
JP8226078A 1978-07-06 1978-07-06 Antireflecting film formation control unit Pending JPS559543A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8226078A JPS559543A (en) 1978-07-06 1978-07-06 Antireflecting film formation control unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8226078A JPS559543A (en) 1978-07-06 1978-07-06 Antireflecting film formation control unit

Publications (1)

Publication Number Publication Date
JPS559543A true JPS559543A (en) 1980-01-23

Family

ID=13769479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8226078A Pending JPS559543A (en) 1978-07-06 1978-07-06 Antireflecting film formation control unit

Country Status (1)

Country Link
JP (1) JPS559543A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176649U (en) * 1981-04-30 1982-11-08
JPS6243601A (en) * 1985-08-22 1987-02-25 Kyowa Gas Chem Ind Co Ltd Formation of multilayered reflection preventive film of optical parts made of synthetic resin
JPH08315432A (en) * 1995-05-15 1996-11-29 Nippondenso Co Ltd Apparatus for producing optical information recording medium and production method therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176649U (en) * 1981-04-30 1982-11-08
JPS6243601A (en) * 1985-08-22 1987-02-25 Kyowa Gas Chem Ind Co Ltd Formation of multilayered reflection preventive film of optical parts made of synthetic resin
JPH08315432A (en) * 1995-05-15 1996-11-29 Nippondenso Co Ltd Apparatus for producing optical information recording medium and production method therefor

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