JPH0288254U - - Google Patents
Info
- Publication number
- JPH0288254U JPH0288254U JP1989149258U JP14925889U JPH0288254U JP H0288254 U JPH0288254 U JP H0288254U JP 1989149258 U JP1989149258 U JP 1989149258U JP 14925889 U JP14925889 U JP 14925889U JP H0288254 U JPH0288254 U JP H0288254U
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- layer
- transparent conductive
- solar cell
- metal conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000005260 corrosion Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
- H10F77/166—Amorphous semiconductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/90—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers
- H10F19/902—Structures for connecting between photovoltaic cells, e.g. interconnections or insulating spacers for series or parallel connection of photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/169—Thin semiconductor films on metallic or insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Description
第1図は本考案の太陽電池モジユールの一実施
例を示す要部の斜視図、第2図は本考案の太陽電
池モジユールの概略的な構成を示す断面図、第3
図は低抵抗a―Si層が挿入された本考案の太陽
電池モジユールと従来の太陽電池モジユールの相
対的な効率を示した特性図、第4図は従来の太陽
電池モジユールを示した平面図である。 1……透明導電膜、2……a―Si層、3……
金属導電膜、4……太陽電池ユニツト、5……透
明導電膜と金属導電膜との接合部、6……低抵抗
a―Si層。
例を示す要部の斜視図、第2図は本考案の太陽電
池モジユールの概略的な構成を示す断面図、第3
図は低抵抗a―Si層が挿入された本考案の太陽
電池モジユールと従来の太陽電池モジユールの相
対的な効率を示した特性図、第4図は従来の太陽
電池モジユールを示した平面図である。 1……透明導電膜、2……a―Si層、3……
金属導電膜、4……太陽電池ユニツト、5……透
明導電膜と金属導電膜との接合部、6……低抵抗
a―Si層。
Claims (1)
- 【実用新案登録請求の範囲】 ガラス基板上に透明導電膜1、a―Si層2お
よび金属導電膜3で形成された太陽電池ユニツト
4の透明導電膜1と金属導電膜3との接合部5を
接触させて直列または並列に連結した非晶質太陽
電池モジユールにおいて、 前記a―Si層2の両方の電極に透明導電膜1
と金属導電膜3とを使用し、前記透明導電膜1と
金属導電膜3との間に低抵抗a―Si層6をプラ
ズマCVD法で蒸着・挿入して、透明導電膜1を
低抵抗a―Si層6で遮蔽させて、透明導電膜1
内の酸素による金属導電膜3の腐蝕を防止し得る
ことを特徴とする非晶質シリコン低抵抗太陽電池
モジユール。
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019880021391U KR910007262Y1 (ko) | 1988-12-24 | 1988-12-24 | 비정질 실리콘 저저항 태양전지 모듈 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0288254U true JPH0288254U (ja) | 1990-07-12 |
Family
ID=19282466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989149258U Pending JPH0288254U (ja) | 1988-12-24 | 1989-12-25 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH0288254U (ja) |
| KR (1) | KR910007262Y1 (ja) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939074A (ja) * | 1982-08-26 | 1984-03-03 | Fuji Electric Co Ltd | 太陽電池装置 |
-
1988
- 1988-12-24 KR KR2019880021391U patent/KR910007262Y1/ko not_active Expired
-
1989
- 1989-12-25 JP JP1989149258U patent/JPH0288254U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939074A (ja) * | 1982-08-26 | 1984-03-03 | Fuji Electric Co Ltd | 太陽電池装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR900013473U (ko) | 1990-07-05 |
| KR910007262Y1 (ko) | 1991-09-25 |
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