JPH029569A - Lap surface reference plate - Google Patents

Lap surface reference plate

Info

Publication number
JPH029569A
JPH029569A JP63160506A JP16050688A JPH029569A JP H029569 A JPH029569 A JP H029569A JP 63160506 A JP63160506 A JP 63160506A JP 16050688 A JP16050688 A JP 16050688A JP H029569 A JPH029569 A JP H029569A
Authority
JP
Japan
Prior art keywords
lap
base plate
cell part
thermal deformation
temperature distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63160506A
Other languages
Japanese (ja)
Other versions
JP2632935B2 (en
Inventor
Masae Hasegawa
長谷川 雅栄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanadevia Corp
Original Assignee
Hitachi Zosen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Zosen Corp filed Critical Hitachi Zosen Corp
Priority to JP63160506A priority Critical patent/JP2632935B2/en
Publication of JPH029569A publication Critical patent/JPH029569A/en
Application granted granted Critical
Publication of JP2632935B2 publication Critical patent/JP2632935B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To reduce thermal deformation of a lap surface by a method wherein a means to approximately uniformize temperature distribution in the direction of the thickness of a base plate part is mounted to a lap cell part. CONSTITUTION:Grooves 11 with a deep depth are formed in a lap cell part 14, and a ratio d/B of a groove depth (d) to a width B of the lap cell part is increased. As a result, since a quantity (q) of heat flows mainly in the direction of a side 15 of the lap cell part 14, inflow of heat to a base plate part 13 of lapping machine is prevented from occurring, temperature distribution in the direction of thickness is approximately uniformized at the base plate part 13, and thermal deformation is prevented from occurring to the base plate part 13. In the lap cell part 14, axially symmetrical type temperature distribution occurs to the lap cell part 14 and a temperature difference is produced, but the lap cell part 14 is separated by the grooved 11. Further, since the width B of the lap cell part 14 is low compared with the diameter of a lap surface plate, deformation of the lap cell part 14 can be ignored. Thus, thermal deformation of a lap surface 10 is reduced sharply.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は、ラップ定盤、さらに詳しくは、たとえばシ
リコンウェハなどを研磨するラッピングマシンなどに使
用されるラップ定盤に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a lapping plate, and more particularly to a lapping plate used in a lapping machine for polishing, for example, silicon wafers.

従来の技術および発明の課題 この種のラップ定盤として、たとえば第1図および第2
図に示すようなものが知られている。
PRIOR TECHNOLOGY AND PROBLEMS TO BE INVENTION This type of lap surface plate is, for example, shown in FIGS. 1 and 2.
The one shown in the figure is known.

同図において、ラップ定盤の表面(ラップ面)(10)
に、互いに直交する複数のみぞ(11)が形成され、ラ
ップ定盤は、みぞ(11)の底より裏面(12)側のベ
ースプレート部(13)と、みぞ(11)により互いに
分離させられた複数のラップセル部(14)とに分けら
れている。寸法の1例を挙げれば、ラップ定盤の全体厚
さHが45mm、ラップセル部(14)の高さすなわち
みぞ(11)の深さ(みぞ深さ)dが15〜17mm、
ラップセル部(14)の幅(ラップセル部幅)Bが最大
40關である(第3図参照)。
In the same figure, the surface of the lap surface plate (lap surface) (10)
A plurality of grooves (11) are formed at right angles to each other, and the lap surface plate is separated from the base plate portion (13) on the back surface (12) side from the bottom of the groove (11) by the groove (11). It is divided into a plurality of wrap cell parts (14). To give an example of the dimensions, the overall thickness H of the lap surface plate is 45 mm, the height of the lap cell part (14), that is, the depth of the groove (11) (groove depth) d is 15 to 17 mm,
The width B of the wrap cell portion (14) (wrap cell portion width) is at most 40 mm (see FIG. 3).

このような従来のラップ定盤では、みぞ深さdとラップ
セル部幅Bの比(d/B)が小さいため、第3図に示す
ように、ラップ加工により発生する熱Qqはラップ面(
10)からベースプレート部(13)側へ直線的に流れ
、ベースプレート部(13)内の厚さ方向に大きな温度
勾配が生じ、ラップ定盤は、中央部がラップ面(10)
側に突出する中凸形の球面状に熱変形する。この熱変形
の半径Rは、ラップ定盤の周辺を自由状態と仮定すると
、次の式(1)で表わされる。
In such a conventional lapping surface plate, the ratio (d/B) between the groove depth d and the lap cell width B is small, so as shown in Fig. 3, the heat Qq generated by lapping is absorbed by the lapping surface (
10) to the base plate part (13) side, a large temperature gradient is generated in the thickness direction within the base plate part (13), and the lap surface plate has a central part that is connected to the lap surface (10).
It is thermally deformed into a convex spherical shape that protrudes to the side. The radius R of this thermal deformation is expressed by the following equation (1), assuming that the periphery of the lap surface plate is in a free state.

R−t/α・θ ・・・・・・・・・ (1)なお、上
式において、tはベースプレート部の厚さ(ベースプレ
ート部厚さ)、αはラップ定盤の線膨張係数、θはベー
スプレート部(13)の表側と裏側の温度差を表わす。
R-t/α・θ ・・・・・・・・・ (1) In the above formula, t is the thickness of the base plate (base plate thickness), α is the linear expansion coefficient of the lap surface plate, θ represents the temperature difference between the front side and the back side of the base plate portion (13).

式(1)より明らかなように、tを一定として熱変形を
小さく  (Rを大きく)するには、αおよびθを小さ
くする必要がある。
As is clear from equation (1), in order to reduce thermal deformation (increase R) while keeping t constant, it is necessary to reduce α and θ.

ところが、上記のラップ定盤の場合は、ベースプレート
部(13)の温度差θが大きいため、熱変形が大きい。
However, in the case of the lap surface plate described above, the temperature difference θ of the base plate portion (13) is large, so that thermal deformation is large.

このため、現状では、始業時にζ熱定常状態になるまで
空運転を行なっている。
For this reason, at present, idle operation is performed until the ζ-thermal steady state is reached at the start of work.

また、ラップ定盤の修正作業は、熱変形を考慮する必要
があるため、高度な熟練作業となっており、しかもラッ
プ定盤の摩耗によって板厚が変化し、熱変形量も変化す
るため、とくに大形のラッピングマシンにおいて熱変形
の生じにくいラップ定盤が必要とされている。
In addition, repairing the lap surface plate requires highly skilled work as it is necessary to take thermal deformation into consideration.Furthermore, as the plate thickness changes due to wear of the lap surface plate, the amount of thermal deformation also changes. In particular, there is a need for a lapping surface plate that is less prone to thermal deformation in large lapping machines.

この発明の目的は、上記の問題を解決した熱変形の小さ
いラップ定盤を提供することにある。
An object of the present invention is to provide a lapping surface plate that solves the above-mentioned problems and has minimal thermal deformation.

課題を解決するための手段 この発明によるラップ定盤は、 表面に互いに交差する複数のみぞが形成されて、みぞの
底より裏面側のベースプレート部と、みぞにより互いに
分離させられた複数のラップセル部とに分けられている
ラップ定盤において、ラップセル部に、ベースプレート
部の厚さ方向の温度分布をほぼ均一にするための手段が
設けられていることを特徴とするものである。
Means for Solving the Problems A lap surface plate according to the present invention has a plurality of mutually intersecting grooves formed on its surface, and includes a base plate part on the back side from the bottom of the grooves, and a plurality of lap cell parts separated from each other by the grooves. The lap platen is characterized in that the lap cell portion is provided with means for making the temperature distribution in the thickness direction of the base plate portion substantially uniform.

作   用 ベースプレート部の厚さ方向の温度分布がほぼ均一にな
って、温度差が小さくなるため、熱変形が小さくなる。
Function: The temperature distribution in the thickness direction of the base plate portion becomes almost uniform, and the temperature difference becomes small, so that thermal deformation becomes small.

実  施  例 以下、第4図〜第11図を参照して、この発明の詳細な
説明する。なお、これらの図面において、第1図〜第3
図の従来例のものと対応する部分には同一の符号を付し
ている。
EXAMPLES Hereinafter, the present invention will be described in detail with reference to FIGS. 4 to 11. In addition, in these drawings, Figures 1 to 3
The same reference numerals are given to the parts corresponding to those of the conventional example in the figure.

第4図および第5図は、第1実施例を示す。4 and 5 show a first embodiment.

第1実施例の場合、みぞ深さdが従来のものに比べてた
とえば3倍程度に深くなっている。
In the case of the first embodiment, the groove depth d is, for example, about three times deeper than that of the conventional one.

みぞ深さdとラップセル部幅Bの比(d/B)が大きい
ため、第5図に示すように、熱量qは主にラップセル部
(14)の側面(15)の方向に流れる。したがって、
ベースプレート部(13)への熱の流入が防がれ、ベー
スプレート部(13)では厚さ方向の温度分布がほぼ均
一になり、ベースプレート部(13)では熱変形は発生
しない。また、ラップセル部(14)では軸対称型の温
度分布となり、温度差が生じるが、ラップセル部(14
)がみぞ(11)により分離されており、しかもラップ
セル部幅Bがラップ定盤の直径に比べて小さいため、ラ
ップセル部(14)の変形は無視することができる。こ
のため、ラップ面(lO)の熱変形は、非常に小さい。
Since the ratio (d/B) between the groove depth d and the wrap cell part width B is large, the amount of heat q mainly flows in the direction of the side surface (15) of the wrap cell part (14), as shown in FIG. therefore,
Heat is prevented from flowing into the base plate portion (13), the temperature distribution in the thickness direction of the base plate portion (13) becomes substantially uniform, and no thermal deformation occurs in the base plate portion (13). In addition, the wrap cell portion (14) has an axially symmetrical temperature distribution, and a temperature difference occurs; however, the wrap cell portion (14)
) are separated by grooves (11), and the wrap cell width B is smaller than the diameter of the lap surface plate, so deformation of the wrap cell portion (14) can be ignored. Therefore, thermal deformation of the lapped surface (lO) is very small.

第6図および第7図は、第2実施例を示す。6 and 7 show a second embodiment.

第2実施例の場合、ラップセル部(14)の裏側の約半
分の部分の4側全周が取除かれて、ラップ面(lO)の
部分の幅Bより小さい幅すを有する導柱部(1B)が形
成されている。
In the case of the second embodiment, the entire circumference of the fourth side of about half of the back side of the wrap cell part (14) is removed, and the guide pillar part (14) having a width smaller than the width B of the wrap surface (IO) part ( 1B) is formed.

第7図に示すように、熱量qは、ラップセル部(14)
のラップ面(lO)側の部分の裏面(17)および導柱
部(1B)の側面(18)によって発散され、ベースプ
レート部(13)中への熱伝導量はOに近くなり、ベー
スプレート部(13)の厚さ方向の温度分布はほぼ均一
になる。したがって、同様に、ラップ面(lO)の熱変
形は、非常に小さくなる。
As shown in FIG. 7, the amount of heat q is
The heat is dissipated by the back surface (17) of the portion on the lap surface (lO) side and the side surface (18) of the guide column part (1B), and the amount of heat conducted into the base plate part (13) is close to O. 13) The temperature distribution in the thickness direction becomes almost uniform. Therefore, the thermal deformation of the lapped surface (lO) will be very small as well.

第8図および第9図は、第3実施例を示す。FIGS. 8 and 9 show a third embodiment.

第3実施例のラップ定盤はたとえばポリッシングプレー
トとして使用されるものであり、厚さ方向のほぼ中央に
、互いに交差する複数の穴(19)がガンドリルなどに
より形成されている。
The lapping surface plate of the third embodiment is used, for example, as a polishing plate, and has a plurality of holes (19) that intersect with each other formed approximately in the center in the thickness direction using a gun drill or the like.

また、これらの穴(19)の表側と裏側に、互いに直交
する複数のみぞ(11)(20)がワイヤカットなどに
より形成されている。そして、表側のみぞ(11)の間
の部分がラップセル部(14)、これより裏側の部分が
ベースプレート部(13)となっている。なお、みぞ(
11)の表側の部分、穴(19)およびみぞ(11)(
20)の端部は、たとえばシリコーンゴムなどの軟弾性
部材のシール(21)により密封されている。ラップ定
盤の裏面(12)には水冷ジャケット(22)が固定さ
れ、その表面側には、ラップ定盤のみぞ(20)に対応
してみぞ(23)が形成されている。そして、ジャケッ
ト(22)のみぞ(23)、ラップ、定盤の穴(19)
およびみぞ(11)(20)ニ、冷却水が循環させられ
る。また、ラップ定盤のラップ面(lO)側に、ポリッ
シングパッド(24)が取付けられる。
Further, on the front and back sides of these holes (19), a plurality of grooves (11) and (20) orthogonal to each other are formed by wire cutting or the like. The portion between the grooves (11) on the front side is a wrap cell portion (14), and the portion on the back side thereof is a base plate portion (13). In addition, the groove (
11), the hole (19) and the groove (11) (
The end portion of 20) is sealed with a seal (21) made of a soft elastic member such as silicone rubber. A water cooling jacket (22) is fixed to the back surface (12) of the lap surface plate, and grooves (23) are formed on the surface side thereof corresponding to the grooves (20) of the lap surface plate. And the groove (23) of the jacket (22), the wrap, and the hole of the surface plate (19)
Cooling water is circulated through the grooves (11) and (20). Further, a polishing pad (24) is attached to the lapping surface (lO) side of the lapping surface plate.

ベースプレート部(13)とラップセル部(14)の間
に穴(19)が形成され、この穴(19)に冷却水が流
されているため、第9図に示すように、熱量qは、穴(
19)の部分で発散され、ベースプレート部(13)に
は伝わらない。このため、ベースプレート部(13)の
温度分布がほぼ均一になり、同様に、ラップ面(10)
の熱変形は非常に小さくなる。
A hole (19) is formed between the base plate part (13) and the wrap cell part (14), and cooling water is flowing through this hole (19), so the amount of heat q is (
19) and is not transmitted to the base plate portion (13). Therefore, the temperature distribution of the base plate part (13) becomes almost uniform, and similarly, the temperature distribution of the base plate part (13) becomes almost uniform.
The thermal deformation of will be very small.

第10図および第11図は、第4実施例を示す。FIG. 10 and FIG. 11 show a fourth embodiment.

第4実施例の場合、ラップセル部(14)とベースプレ
ート部(13)の間に、断熱層(25)が設けられてい
る。すなわち、ラップセル部(14)は、ベースプレー
ト部(I3)側の部分で2つに分けられ、断熱層(25
)を形成する断熱効果のあるエポキシ樹脂系接着剤など
で貼り合わされている。そして、ベースプレート部(1
3)は公知の低膨張材で、ラップセル部(I4)は従来
と同様の比較的安価な材料で作られている。
In the case of the fourth embodiment, a heat insulating layer (25) is provided between the wrap cell section (14) and the base plate section (13). That is, the wrap cell part (14) is divided into two parts on the base plate part (I3) side, and the heat insulating layer (25)
) are bonded together using an epoxy resin adhesive that has a heat insulating effect. Then, the base plate part (1
3) is a known low-expansion material, and the wrap cell portion (I4) is made of a relatively inexpensive material similar to the conventional material.

ラップセル部(14)とベースプレート部(13)の間
に断熱層(25)が設けられているので、第11図に示
すように、ベースプレート部(13)に伝わる熱量は少
なく、ベースプレート部(13)の厚さ方向の温度勾配
は小さくなる。しかも、ベースプレート部(13)は低
膨張材で作られているので、熱変形は非常に小さい。
Since the heat insulating layer (25) is provided between the wrap cell section (14) and the base plate section (13), the amount of heat transmitted to the base plate section (13) is small, as shown in FIG. The temperature gradient in the thickness direction becomes smaller. Furthermore, since the base plate portion (13) is made of a low-expansion material, thermal deformation is extremely small.

ラップ定盤の熱変形を小さくするには、全体を低膨張材
で作ればよいが、低膨張材は非常に高価である。第4実
施例の場合は、ベースプレート部(13)だけが低膨張
材で作られているので、全体を低膨張材で作る場合に比
べて安価である。
In order to reduce thermal deformation of the lap surface plate, it is possible to make the entire plate from a low expansion material, but low expansion materials are very expensive. In the case of the fourth embodiment, only the base plate portion (13) is made of a low-expansion material, so it is cheaper than the case where the entire base plate part (13) is made of a low-expansion material.

また、ラップセル部(14)が摩耗したときには、ラッ
プセル部(14)を貼り替えるだけですみ、高価な低膨
張材を使用したベースプレート部(13)は継続使用で
きるので、ラップ定盤のコストダウンが可能である。
In addition, when the wrap cell part (14) wears out, it is only necessary to replace the wrap cell part (14), and the base plate part (13) made of expensive low expansion material can be used continuously, reducing the cost of the lap surface plate. It is possible.

発明の効果 この発明のラップ定盤によれば、上述のように、ベース
プレート部の厚さ方向の温度分布がほぼ均一になって、
温度差が小さくなるため、熱変形が小さくなる。
Effects of the Invention According to the lap surface plate of the present invention, as described above, the temperature distribution in the thickness direction of the base plate portion becomes almost uniform,
Since the temperature difference becomes smaller, thermal deformation becomes smaller.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例を示すラップ定盤の斜視図、第2図は第
1図のラップ定盤の要部を拡大して示す一部切欠き斜視
図、第3図は第2図のラップ定盤の熱の移動および温度
分布を示す説明図、第4図は第1実施例を示す第2図相
当の図面、第5図は同第3図相当の図面、第6図は第2
実施例を示す第2図相当の図面、第7図は同第3図F目
当の図面、第8図は第3実施例を示す第2図相当の図面
、第9図は同第3図相当の図面、第10図は第4実施例
を示す第2図相当の図面、第11図は同第3図相当の図
面である。 (lO)・・・ラップ面、(11)・・・みぞ、(12
)・・・裏面、(13)・・・ベースプレート部、(1
4)・・・ラップセル部、(IB)・・・導柱部、(1
9)・・・穴、(25)・・・断熱層。 以  上 特許出願人  日立造船メタルワークス株式会社代理人
 厚木 瑛之助(外4名) ]1
Figure 1 is a perspective view of a conventional lap surface plate, Figure 2 is a partially cutaway perspective view showing an enlarged main part of the lap plate shown in Figure 1, and Figure 3 is a wrap plate shown in Figure 2. An explanatory diagram showing the movement of heat and temperature distribution of the surface plate, Fig. 4 is a drawing equivalent to Fig. 2 showing the first embodiment, Fig. 5 is a drawing equivalent to Fig. 3, and Fig. 6 is a drawing equivalent to Fig. 2.
7 is a drawing equivalent to FIG. 2 showing the embodiment, FIG. 7 is a drawing corresponding to FIG. 3 F, FIG. 8 is a drawing equivalent to FIG. 2 showing the third embodiment, and FIG. 9 is a drawing equivalent to FIG. 10 is a drawing corresponding to FIG. 2 showing the fourth embodiment, and FIG. 11 is a drawing corresponding to FIG. 3. (lO) ... Wrap surface, (11) ... Groove, (12
)... Back side, (13)... Base plate part, (1
4) ... Wrap cell part, (IB) ... Guide column part, (1
9)...hole, (25)...insulating layer. Patent applicant: Hitachi Zosen Metal Works Co., Ltd. Agent Einosuke Atsugi (4 others)]1

Claims (1)

【特許請求の範囲】[Claims] 表面に互いに交差する複数のみぞが形成されて、みぞの
底より裏面側のベースプレート部と、みぞにより互いに
分離させられた複数のラップセル部とに分けられている
ラップ定盤において、ラップセル部に、ベースプレート
部の厚さ方向の温度分布をほぼ均一にするための手段が
設けられていることを特徴とするラップ定盤。
In a lap surface plate in which a plurality of grooves that intersect with each other are formed on the surface and is divided into a base plate portion on the back side from the bottom of the grooves and a plurality of wrap cell portions separated from each other by the grooves, the wrap cell portion includes: A lap surface plate characterized by being provided with means for making the temperature distribution substantially uniform in the thickness direction of the base plate portion.
JP63160506A 1988-06-28 1988-06-28 Lap surface plate Expired - Lifetime JP2632935B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63160506A JP2632935B2 (en) 1988-06-28 1988-06-28 Lap surface plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63160506A JP2632935B2 (en) 1988-06-28 1988-06-28 Lap surface plate

Publications (2)

Publication Number Publication Date
JPH029569A true JPH029569A (en) 1990-01-12
JP2632935B2 JP2632935B2 (en) 1997-07-23

Family

ID=15716420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63160506A Expired - Lifetime JP2632935B2 (en) 1988-06-28 1988-06-28 Lap surface plate

Country Status (1)

Country Link
JP (1) JP2632935B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106066A (en) * 1976-03-02 1977-09-06 Toyota Motor Corp Direct connected clutch controller for automatic gear reduction having a torque converter with direct connected clutch
JPS53124964A (en) * 1977-04-07 1978-10-31 Toshiba Corp Polishing device of semiconductor wafers

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52106066A (en) * 1976-03-02 1977-09-06 Toyota Motor Corp Direct connected clutch controller for automatic gear reduction having a torque converter with direct connected clutch
JPS53124964A (en) * 1977-04-07 1978-10-31 Toshiba Corp Polishing device of semiconductor wafers

Also Published As

Publication number Publication date
JP2632935B2 (en) 1997-07-23

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