JPH029800A - Raw material composition for production of silicon carbide whisker - Google Patents
Raw material composition for production of silicon carbide whiskerInfo
- Publication number
- JPH029800A JPH029800A JP15836088A JP15836088A JPH029800A JP H029800 A JPH029800 A JP H029800A JP 15836088 A JP15836088 A JP 15836088A JP 15836088 A JP15836088 A JP 15836088A JP H029800 A JPH029800 A JP H029800A
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- carbon
- raw material
- silicon dioxide
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 239000002994 raw material Substances 0.000 title claims abstract description 46
- 239000000203 mixture Substances 0.000 title claims description 38
- 229910010271 silicon carbide Inorganic materials 0.000 title description 19
- 238000004519 manufacturing process Methods 0.000 title description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 70
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 59
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 31
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 30
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 26
- 239000003575 carbonaceous material Substances 0.000 claims abstract description 20
- 239000011148 porous material Substances 0.000 claims abstract description 19
- 239000011230 binding agent Substances 0.000 claims abstract description 14
- 239000008187 granular material Substances 0.000 claims description 22
- 239000002245 particle Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 31
- 239000005011 phenolic resin Substances 0.000 abstract description 5
- 229920001568 phenolic resin Polymers 0.000 abstract description 4
- 229920001732 Lignosulfonate Polymers 0.000 abstract description 3
- 239000006232 furnace black Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000003208 petroleum Substances 0.000 abstract description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract description 2
- 239000007849 furan resin Substances 0.000 abstract description 2
- 239000011301 petroleum pitch Substances 0.000 abstract description 2
- 230000009467 reduction Effects 0.000 abstract description 2
- 239000011280 coal tar Substances 0.000 abstract 1
- 239000011269 tar Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 37
- 239000007789 gas Substances 0.000 description 27
- 238000010438 heat treatment Methods 0.000 description 22
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 22
- 238000002156 mixing Methods 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000007795 chemical reaction product Substances 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000010532 solid phase synthesis reaction Methods 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- 239000010439 graphite Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000003995 emulsifying agent Substances 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- -1 silicon halide Chemical class 0.000 description 5
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 230000035699 permeability Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010924 continuous production Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004108 freeze drying Methods 0.000 description 3
- 238000005469 granulation Methods 0.000 description 3
- 230000003179 granulation Effects 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000006234 thermal black Substances 0.000 description 3
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 241000209094 Oryza Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000011233 carbonaceous binding agent Substances 0.000 description 2
- 239000003245 coal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 239000010903 husk Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical class CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- FHVDTGUDJYJELY-UHFFFAOYSA-N 6-{[2-carboxy-4,5-dihydroxy-6-(phosphanyloxy)oxan-3-yl]oxy}-4,5-dihydroxy-3-phosphanyloxane-2-carboxylic acid Chemical compound O1C(C(O)=O)C(P)C(O)C(O)C1OC1C(C(O)=O)OC(OP)C(O)C1O FHVDTGUDJYJELY-UHFFFAOYSA-N 0.000 description 1
- 239000004484 Briquette Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229940072056 alginate Drugs 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012272 crop production Methods 0.000 description 1
- 239000010779 crude oil Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- WMVRXDZNYVJBAH-UHFFFAOYSA-N dioxoiron Chemical compound O=[Fe]=O WMVRXDZNYVJBAH-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011226 reinforced ceramic Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000011271 tar pitch Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、特に繊維強化プラスチック(FRP)、繊維
強化金属(FRM)、繊維強化セラミック(FRC)な
どの複合材料に使用する炭化ケイ素ウィスカーを炭素還
元法により製造する隙に使用する原料組成物に関し、本
発明は工業的規模で炭化ケイ素ウィスカーを連続的に、
効率よく製造するのに適した炭化ケイ素ウィスカー!!
!造用原料組成物に関する提案である。Detailed Description of the Invention (Industrial Application Field) The present invention particularly relates to silicon carbide whiskers used in composite materials such as fiber-reinforced plastics (FRP), fiber-reinforced metals (FRM), and fiber-reinforced ceramics (FRC). Regarding the raw material composition used in the gap produced by the carbon reduction method, the present invention continuously processes silicon carbide whiskers on an industrial scale.
Silicon carbide whiskers suitable for efficient production! !
! This is a proposal regarding a raw material composition for manufacturing.
(従来の技術)
現在知られているSiCウィスカーのり遣方法としては
、炭素およびケイ素の固体原料を用いる固相法、炭素お
よびケイ素の気体あるいはそれらと固体との反応や混合
ガスを用いる気相法とがある。(Prior art) Currently known SiC whisker bonding methods include a solid phase method using solid raw materials of carbon and silicon, and a gas phase method using gases of carbon and silicon or reactions or mixed gases of them with solids. There is.
前記固相法は、固体のSin、とCから、SiO□+C
’:: SiO+ C0540+ 3CO:: S
iC+2CO□Co、+C;: 2CO
なる反応を導く方法であり、所謂発生した気体状のSi
OとCOを反応させStCウィスカーを析出成長させる
技術である。In the solid phase method, from solid Sin and C, SiO□+C
':: SiO+ C0540+ 3CO:: S
iC+2CO□Co, +C;: 2CO This is a method of leading to the reaction, and the so-called gaseous Si generated
This is a technique in which O and CO are reacted to precipitate and grow StC whiskers.
例えば、かかる固相法に属する技術である特公昭59−
9516号公報に開示の技術は、Si源としてもみ殻灰
化物を用い、0源としてカーボンブラックを用い、非酸
化性雰囲気下で1300〜1700’Cに加熱する方法
である。For example, the technology belonging to the solid-phase method is
The technique disclosed in Japanese Patent No. 9516 is a method in which rice husk ash is used as a Si source, carbon black is used as a zero source, and heating is performed to 1300 to 1700'C in a non-oxidizing atmosphere.
また、特開昭6l−2274)93号公報に開示の技術
は、Si源として無水ケイ酸を用い、C源として活性炭
を用い、ノ1酸化性;(囲気下で1400〜1700’
Cの温度で加熱する方法をIJ ’41: L/ている
。Furthermore, the technology disclosed in JP-A No. 61-2274)93 uses silicic anhydride as a Si source and activated carbon as a C source.
A method of heating at a temperature of C is described in IJ '41: L/.
上述した固相法を実施する際に用いる製造装置としては
、例えば実公昭59−38441号公報には黒鉛材で構
成されたSiCウィスカー生成川反用容器が開示されて
おり、また特開昭61−227993号公報には、長平
方向に沿って温度勾配が付されている通路を有する炉体
内と、該通路に沿って設けられた原料充填域と、ウィス
カー生成域および排気管を有する複数の試料収容容器と
からなるSiCうイスカーの製造装置を提案している。As a manufacturing apparatus used to carry out the above-mentioned solid phase method, for example, Japanese Utility Model Publication No. 59-38441 discloses a container for producing SiC whiskers in a river, which is made of graphite material, and Japanese Patent Application Publication No. 1983-38441 discloses a container for producing SiC whiskers in a river. Publication No. 227993 discloses a furnace body having a passage with a temperature gradient along the longitudinal direction, a raw material filling area provided along the passage, a plurality of sample storage having a whisker generation area and an exhaust pipe. We are proposing an apparatus for manufacturing a SiC empty car, which consists of a container and a container.
これに対し、気相法としては、Si源として気体の四塩
化ケイ素などのハロゲン化ケイ素と四塩化炭素などの気
体の炭素化合物を水素気流中で高温で反応させる方法、
メチルトリクロルシランなどの有機シランの熱分解によ
る方法などが知られている3例えば、特公昭59−45
635号公報に開示の技術は、ハロゲン化ケイ素ガスと
ハロゲン化カーボンガスをキャリアガス(11□)を介
して加熱反応管内に導入し、複数のスリットが設けられ
ているSiCまたはSiC含有の有底筒状基板上に、S
iCウィスカーを育成させる方法であり、また、特公昭
59−45635号公報には炭素粉末を充填した磁製管
もしくは黒鉛管を、外管内に装入して、1300℃にし
なから四塩化ケイ素と水素の混合ガスを発生させて炭化
ケイ素ウィスカーを製造する方法を提案している。On the other hand, the gas phase method involves reacting a gaseous silicon halide such as silicon tetrachloride as a Si source with a gaseous carbon compound such as carbon tetrachloride in a hydrogen stream at high temperature;
Methods using thermal decomposition of organic silanes such as methyltrichlorosilane are known.
The technique disclosed in Publication No. 635 introduces halogenated silicon gas and halogenated carbon gas into a heated reaction tube via a carrier gas (11□), and produces a SiC or SiC-containing bottomed tube provided with a plurality of slits. On the cylindrical substrate, S
This is a method for growing iC whiskers, and in Japanese Patent Publication No. 59-45635, a porcelain tube or a graphite tube filled with carbon powder is inserted into the outer tube, and then heated to 1300°C and then heated with silicon tetrachloride. We have proposed a method for producing silicon carbide whiskers by generating a hydrogen gas mixture.
(発明が解決しようとする問題点)
固相法として示した上記の2つの従来技術は、(1)
粒状のSiCが多量にシj生することに加え、原料の
未反応粒状物が残存し、これらが生成したSiCウィス
カー中に混在するため、金属やセラミックスの補強材と
して好適な高純度のウィスカーを得られない、従って、
これらの粒状物を分離し精製するための複雑な工程がさ
らに必要となり、しかもウィスカーの収率も低い。(Problems to be solved by the invention) The above two conventional techniques shown as solid phase methods are (1)
In addition to the generation of a large amount of granular SiC, unreacted granular materials from the raw materials remain and are mixed in the generated SiC whiskers. not obtained, therefore
Further complicated steps are required to separate and purify these particulates, and the yield of whiskers is also low.
(2)反応速度が遅いため高アスペクト比のウィスカー
を大量かつ連続的に製造することが難しい。(2) Due to the slow reaction rate, it is difficult to continuously produce large amounts of high aspect ratio whiskers.
(3) 反応温度が高い。(3) Reaction temperature is high.
などの問題点があった。There were problems such as.
また、かかる固相法に用いる装:ηについては、いずれ
もバッチ式製造装置であり、連続製造ができないだけで
なく、大量かつ効率的な生産を行うためには、反応容器
が多数必要であり、装置が大規模になるという問題点が
あった。In addition, the equipment used in the solid phase method: η is a batch-type production equipment, which not only cannot perform continuous production, but also requires a large number of reaction vessels in order to perform large-scale and efficient production. However, there was a problem in that the equipment became large-scale.
次に、気相法として示した上記2つの従来技術では、い
ずれも原料となるハロゲン化ケイ素が高価であるという
問題点があった。また、これらの従来方法には、工業的
ないわゆる工業的規模での連続的な製造手段に閏する具
体的な開示がみられない、さらに、これらの方法では、
生成したウィスカーは、固定されて円筒状基板やこの基
板の役目をする!fl製管の内壁などに析出成長する。Next, the above two conventional techniques described as gas phase methods both have a problem in that the silicon halide used as the raw material is expensive. In addition, these conventional methods do not contain any specific disclosure regarding continuous production means on an industrial scale.Furthermore, in these methods,
The generated whiskers are fixed and serve as a cylindrical substrate or this substrate! Precipitates and grows on the inner walls of fl pipes.
従って、基板上に析出成長させるのであるから、基板表
面の微妙な温度むらや析出したウィスカーの密止度、さ
らには基板の場所による反応ガス濃度の違いなどにより
、長さや径などの形状が不均一になる。Therefore, since the precipitation is grown on the substrate, the length, diameter, and other shapes may vary due to subtle temperature variations on the substrate surface, the density of the precipitated whiskers, and differences in reactant gas concentration depending on the location of the substrate. It becomes uniform.
本発明の目的は、上述した固相法、気相法の従来技術の
有する問題点を克服できる技術を開発するところにある
。An object of the present invention is to develop a technique that can overcome the problems of the conventional solid phase method and gas phase method described above.
(問題点を解決するための手段)
玉出の目的に対し本発明は、二酸化ケイ素粉末と炭素質
物質を原料とする固相炭素環元法において工業規模で連
続的に効率よ(炭化ケイ素ウィスカーを製造するために
は、前記原料を用い°ζウィスカー製造に適した原料組
成物を作る事が重要であることに着目し、原料組成物中
に炭化ケイ素ウィスカーを生成させる空間を存在させる
ことを特徴とする炭化ケイ素ウィスカー製造用原料組成
物を42案し、上述した課題を解決することとした。(Means for Solving the Problems) For the purpose of Tamade, the present invention aims to efficiently and continuously produce silicon carbide whiskers on an industrial scale in a solid-phase carbocyclic process using silicon dioxide powder and carbonaceous materials as raw materials. Focusing on the importance of creating a raw material composition suitable for producing °ζ whiskers using the above-mentioned raw materials in order to produce it, the feature is that a space is created in the raw material composition to generate silicon carbide whiskers. We have developed 42 raw material compositions for producing silicon carbide whiskers to solve the above-mentioned problems.
(作用)
本発明思想の基本原理とするところは、炭素およびケイ
素の固体原料を用いる固相法においては与えられた温度
および糸の組成において次の各反応が想定される。(Function) The basic principle of the present invention is that in the solid phase method using solid raw materials of carbon and silicon, the following reactions are assumed at a given temperature and yarn composition.
■ SiOx + C: SiO+ C0■ SiO
+2C= sic +c。■ SiOx + C: SiO+ C0■ SiO
+2C=sic+c.
■ SiC+2Si(h :: 3SiO・ト
CO■ S i + SiO□、II’ 2SiO■
C+SiO’;: Si+CO
■ SiC+ SiO二2Si (−CO従来SiC粒
状物質を工業的製造する場合においては、−C的にはケ
イ素原料として二酸化ケイ素粉末を使用した場合■およ
び■の反応によって生成される。■ SiC+2Si(h::3SiO・t
CO■ S i + SiO□, II' 2SiO■
C+SiO';: Si+CO ■ SiC+ SiO2Si (-CO In the conventional industrial production of SiC granular materials, -C is produced by the reactions of ■ and ■ when silicon dioxide powder is used as the silicon raw material. .
一方SiCウィスカーの生成反応は■の反応と■の反応
、即ち
■ 3SiO+CO→SiC+2SiO□の反応におい
て生成される。On the other hand, SiC whiskers are produced by the reaction (1) and the reaction (2), that is, the reaction (3SiO+CO→SiC+2SiO□).
固体原料において反応生成されたSiOおよびCOの主
として気相反応が関与してウィスカーの生成成長となる
のである。The formation and growth of whiskers is mainly caused by the gas phase reaction of SiO and CO produced in the solid raw material.
このことは、5i−0−C系の化学熱力学的平衡状態を
示すW、八、クリンスキおよびW、rl。This indicates a chemical thermodynamic equilibrium state for the 5i-0-C system, W,8,Krinski and W,rl.
シューマン(一般的にシューマン線図)がしられている
、これらは、この系において一酸化ケイ素と一酸化炭素
の系内におけるモル分圧比と温度によって示されるもの
であり、前記ウィスカーの生成領域が■の反応において
進むと考えられている。Schumann diagrams (generally known as Schumann diagrams) are known, and are shown by the molar partial pressure ratio and temperature of silicon monoxide and carbon monoxide in this system, and the whisker formation region is It is thought that the process proceeds in the reaction of (■).
従って、系内において前記−酸化ケイ素と一酸化炭素の
モル分圧比と温度を適宜、決定するごとによってウィス
カーを効率よく生成することができるものである。Therefore, whiskers can be efficiently generated by appropriately determining the molar partial pressure ratio of silicon oxide and carbon monoxide and the temperature in the system.
炭化ケイ素ウィスカーの生成は前記基本原理の下におい
て生成されるものであるが、+iil記生成領域は平衡
関係において準安定領域の為、適宜操作を必要とする場
合がある。具体的には特公昭54−17720号公報に
j18示されている如く、固相反応において一酸化ケイ
素ガスを生成させ、別の反応器へ導入後、外部よりの一
酸化炭素とのモル分圧比の調整後、前記混合ガスの温度
を匿作してやることにおいて、前記準安定り■域でSi
Cウィスカーを生成することになる。Although silicon carbide whiskers are generated based on the above-mentioned basic principle, since the generation region (iii) is a metastable region in terms of equilibrium, appropriate operations may be required. Specifically, as shown in J18 of Japanese Patent Publication No. 54-17720, silicon monoxide gas is generated in a solid phase reaction, and after being introduced into another reactor, the molar partial pressure ratio with carbon monoxide from the outside is determined. After adjusting the temperature of the mixed gas, Si
C whiskers will be generated.
すなわち、前記モル分圧、温度を均一に制?1[rる為
には原料および原料充填方法、加熱方法を適宜選択組合
わせることによって効率よく生成されるのである。In other words, can the molar partial pressure and temperature be uniformly controlled? In order to produce 1[r], it can be produced efficiently by appropriately selecting and combining raw materials, raw material filling methods, and heating methods.
しかしながら、前記制御する上には原料の選択および原
料充填方法が特に影習を及ぼす、このことは、装置全体
の温度分圧制御と共に原料の極微細な部分においても成
立させることが必要であり、原料選択は肝要であり、し
かもウィスカーの生成には充填方法も含め形成空間を保
存するようにしなければならない。However, the selection of raw materials and the method of filling the raw materials have a particular influence on the above control, and this needs to be achieved not only in the temperature partial pressure control of the entire device but also in the minute parts of the raw materials. The selection of raw materials is important, and in addition, the formation space must be preserved in whisker production, including the filling method.
以上の経緯に基づいて本発明においては、原料として二
酸化ケイ素t5)末および炭素質物質を前述の如く二酸
化ケイ素と炭素質物質からなり、気孔・tが35〜85
%であり、平均気孔径が5〜1000μmであることを
特徴とする炭化ケイ素ウィスカー製造用原料組成物原i
tとし、炭化ケイ素ウィスカー生成に必要な生成空間を
イrする組成物にしたのである。Based on the above circumstances, in the present invention, the raw materials are silicon dioxide t5) powder and carbonaceous material, which are made of silicon dioxide and carbonaceous material as described above, and the pores/t are 35 to 85.
% and an average pore diameter of 5 to 1000 μm.
t, and created a composition that fills the formation space necessary for silicon carbide whisker formation.
すなわら、従来において固相原料からの直接法として二
酸化ケイ素原料として天然の多孔質構造のもみ殻灰化物
あるいはシリカゲルが、また炭素原料としては、ストラ
フチャーの発達したファーネスカーボンブラック等が使
用されたが、本発明は、これらと同様に原料内部にウィ
スカー形成空間を形成することにより極めて効率よ<
+iiI記丘作制御nをなし得る組成物を新規に見出し
たものである。In other words, in the past, natural porous rice husk ash or silica gel was used as the silicon dioxide raw material in the direct method from solid-phase raw materials, and furnace carbon black with developed struts was used as the carbon raw material. However, the present invention is extremely efficient by forming a whisker forming space inside the raw material in the same way as these.
+iii A composition capable of controlling hill crop production has been newly discovered.
以下、詳細に説明する。This will be explained in detail below.
まず、11;I記原j4 、tjl成物は、気孔率が3
5〜B5%であり、平均気孔径が5〜1000μmであ
ることが必要である。前記原料組成物の気孔率が35〜
85%であることが必要な理由は、前記気孔率が35%
より低いと組成物中における通気性が悪く、反応生成ガ
スが放出され難く、組成物内で局部的に一酸化ケイ素ガ
ス分圧が高(なり、粗大な粒状炭化ケイ素が化成し易い
からである。一方+iff記気孔率はウィスカーの反応
生成空間の点を考慮すればなるべく高い方が好ましいが
、85%より高いと組成物の強度が極めて低く、反応界
2z中で組成物が潰れ反応界2=中の充填密度が高くな
り通気性が著しく悪化するからである。First, the 11;I original j4, tjl composition has a porosity of 3
It is necessary that the B content is 5% to 5% and the average pore diameter is 5 to 1000 μm. The porosity of the raw material composition is 35-35.
The reason why it is necessary to be 85% is that the porosity is 35%.
If it is lower, the gas permeability in the composition is poor, the reaction product gas is difficult to release, and the partial pressure of silicon monoxide gas is locally high in the composition (this is because coarse granular silicon carbide is easily formed). On the other hand, it is preferable that the +if porosity is as high as possible in consideration of the reaction generation space of whiskers, but if it is higher than 85%, the strength of the composition will be extremely low, and the composition will be crushed in the reaction field 2z. This is because the filling density inside becomes high and air permeability deteriorates significantly.
また、前記原料組成物の平均気孔径が5〜1000μm
であることが必要な理由は平均気孔径が5μmより小さ
いと高温反応時に二酸化ケイ素の溶融により気孔が閉塞
してしまうからであり、1000μmより大きいと二酸
化ケイ素と炭素質物質の接触反応が低下してしまうから
である。Further, the average pore diameter of the raw material composition is 5 to 1000 μm.
The reason why this is necessary is that if the average pore diameter is smaller than 5 μm, the pores will be closed due to melting of silicon dioxide during high-temperature reaction, and if it is larger than 1000 μm, the contact reaction between silicon dioxide and carbonaceous material will be reduced. This is because
前記組成物のSt源としての二酸化ケイ素は比表面積が
0.01rrf/g以上のものを使用することが有利で
ある。その理由は、比表面積が0.01rrf/gより
小さいと二酸化ケイ素と炭素質物質との反応効率が低下
し、110記式■のガス発生が不充分になり易いからで
ある。又、二酸化ケイ素が未反応で残存したり、あるい
は、炭化ケイ素の粗大粒状物質を生成することとなる。It is advantageous to use silicon dioxide having a specific surface area of 0.01 rrf/g or more as the St source in the composition. The reason for this is that if the specific surface area is smaller than 0.01 rrf/g, the reaction efficiency between silicon dioxide and the carbonaceous material decreases, and the gas generation of formula (110) tends to become insufficient. Moreover, silicon dioxide may remain unreacted, or coarse granular materials of silicon carbide may be produced.
なお、二酸化ケイ素は、細かい程好ましいが、余りに細
かい粉末は仮に入手できても極め°ζ高価であるため工
業材料として使用するには不適であり、本発明では、0
.1〜10rd/εの範囲の二酸化ケイ素が入手も比較
的容易でありしかも好適な結果が得られる。Incidentally, the finer the silicon dioxide, the better, but even if a powder that is too fine is available, it is extremely expensive and therefore unsuitable for use as an industrial material.
.. Silicon dioxide in the range of 1 to 10 rd/ε is relatively easy to obtain and also provides suitable results.
前記二酸化ケイ素は、天然でも合成でも使用できるが、
純度が高い程好適である。The silicon dioxide can be used either naturally or synthetically,
The higher the purity, the better.
一方、前記組成物のC源としての炭素質物質のうちの炭
素粉末としては、前記−酸化ケイ素ガス分圧を調整し、
極めて良好な炭化ケイ素ウィスカーを得る上で比表面積
が1=1000m”/gの範囲内の炭素粉末を使用する
ことが有利である。その理由は、前記比表面積が1m”
/[より小さいと前記式■にしたがう反応の生起する箇
所が少なく、−酸化ケイ素の生成反応がtrlt制され
るため、本発明の目的とする炭化ケイ素ウィスカーを効
率よく製造することが困難であるし、一方1000m”
/gより大きい比表面積を存する炭素わ)末は反応性の
面から考慮すると極めて好適であると考えられるが、そ
のような炭素粉末は入手が困難であるばかりでなく、嵩
比重が極めて低いため、粒状物として用いる場合気孔率
が高くなり過ぎて圧潰強度が著しく低くなる欠点を有す
るからであり、なかでも10〜500m”/Hの範囲内
の炭素粉末が入手も比較的容易であり、しかも好適な結
果を得ることができる。炭素粉末は石油系、石炭系の有
機物の不完全燃焼、あるいは、不活性気相中での熱分解
によって得られるコンタクトブラック、サーマルブラッ
ク、ファーネブラック、ランプブランクより選ばれるい
ずれか少なくとも一種を用いることが好ましいが、なか
でもストラフチャーが高いファーネスブラックが好適で
ある。On the other hand, as the carbon powder of the carbonaceous material as the C source of the composition, the -silicon oxide gas partial pressure is adjusted,
In order to obtain very good silicon carbide whiskers, it is advantageous to use carbon powder with a specific surface area in the range 1=1000 m"/g. This is because the specific surface area is 1 m"/g.
/ [If it is smaller, there are fewer places where the reaction according to the above formula (1) occurs, and the -silicon oxide production reaction is trlt controlled, making it difficult to efficiently produce the silicon carbide whiskers that are the object of the present invention. On the other hand, 1000m”
Carbon powder with a specific surface area larger than /g is considered to be extremely suitable from the viewpoint of reactivity, but such carbon powder is not only difficult to obtain, but also has an extremely low bulk specific gravity. This is because, when used in the form of granules, the porosity becomes too high and the crushing strength becomes extremely low. Among these, carbon powder in the range of 10 to 500 m"/H is relatively easy to obtain, and Favorable results can be obtained. Carbon powder can be used for contact black, thermal black, furnace black, and lamp blanks obtained by incomplete combustion of petroleum-based or coal-based organic substances, or by thermal decomposition in an inert gas phase. It is preferable to use at least one selected from the following, and among them, furnace black with high strutness is preferable.
また、前記炭素質物質としての炭素系結合剤としては、
前記二酸化ケイ素または前記二酸化ケイ素と前記炭素粉
末の表面に三次元網目構造を形成できるものであればよ
く、例えば原油、残香油、石油ピッチ、木り−ルピッヂ
、フラン樹脂、石油タール、コールクール、リグニンス
ルホン酸塩、アルギン酸塩、フェノール芳香核高分子糖
類、:1ンスターチ、ポリ酢酸ビニル、タールピッチ、
アスファルト、ポリアクリロニトリルなどの鎖状ビニル
系、ポリフェニレンなどの芳香族同士のビフェニル結合
からなる高分子から選ばれる少なくとも一種であればよ
い、前記のうちフェノール樹脂、$J、W tfi、リ
グニンスルホン酸塩等の易水溶性の炭素系の結合剤は水
溶液状で添加することができ有利である。中でも、フェ
ノール樹脂は、炭素収率が比較的高い為有利に使用でき
、水系フェノール樹脂が特に好適である。前記水系フェ
ノールを使用するのは、前記二酸化ケイ素および+11
記炭素粉末との混合時において媒液として水を使用し゛
(均一・混合させることができるからである。Moreover, as the carbonaceous binder as the carbonaceous material,
Any material that can form a three-dimensional network structure on the surface of the silicon dioxide or the silicon dioxide and the carbon powder may be used, such as crude oil, residual oil, petroleum pitch, wood lupidge, furan resin, petroleum tar, coal cour, Lignosulfonate, alginate, phenolic aromatic core polymer saccharide, 1st starch, polyvinyl acetate, tar pitch,
At least one selected from asphalt, chain vinyl systems such as polyacrylonitrile, and polymers consisting of biphenyl bonds between aromatic groups such as polyphenylene, among the above, phenolic resin, $J, W tfi, lignin sulfonate Easily water-soluble carbon-based binders, such as, can be advantageously added in the form of an aqueous solution. Among them, phenolic resins can be advantageously used because they have a relatively high carbon yield, and water-based phenolic resins are particularly suitable. The aqueous phenol is used for the silicon dioxide and +11
Water is used as a medium when mixing with the carbon powder (this is because it allows uniform mixing).
尚、難水溶性の炭素系結合剤は溶剤および乳化剤を使用
してエマルシヨンとして水分散させる。Incidentally, the poorly water-soluble carbonaceous binder is dispersed in water as an emulsion using a solvent and an emulsifier.
すなわち、難水性の炭素系結合剤は溶剤を使用して均一
混合物となし、加熱撹拌しながら湯水と乳化剤を添加し
エマルジョンとするのである。 +’+iJ記乳化剤と
しては、酢酸エチレン、ステアリン酸変成体等が使用で
きる。That is, the water-resistant carbon-based binder is made into a homogeneous mixture using a solvent, and hot water and an emulsifier are added while heating and stirring to form an emulsion. +'+iJ As the emulsifier, ethylene acetate, modified stearic acid, etc. can be used.
本発明の目的とする炭化ケイ素ウィスカーを得るには、
前記二酸化ケイ素と炭素質物質を原料として使用するこ
とによって達成できるのであるが、通気性を向上させて
反応時に生成するCOガスのガス抜けを良好として反応
を進み易くするとともに反応容器内の一酸化ケイ素ガス
分圧を適正に制御することができる気孔径、気孔率、強
度を有する組成物とするには次の製造方法を必要とする
。To obtain the silicon carbide whiskers that are the object of the present invention,
This can be achieved by using silicon dioxide and carbonaceous materials as raw materials, which improves air permeability and facilitates the outgassing of CO gas produced during the reaction, making it easier for the reaction to proceed, and reducing monoxide in the reaction vessel. The following manufacturing method is required to obtain a composition having pore diameter, porosity, and strength that allow proper control of silicon gas partial pressure.
本発明によれば、二酸化う・イ素と炭素粉末と炭素系の
結合剤よりなるtIj合物は充分に均一混合された後、
凍結乾燥する必要がある。According to the present invention, after the tIj compound consisting of borium/iron dioxide, carbon powder, and carbon-based binder is thoroughly and uniformly mixed,
Needs to be freeze-dried.
前記混合物のスラリー濃度を10〜50%にした後11
11記混合物を凍結乾燥することにより前記混合物中の
水分を三次元網目状態を維持したままで除去するのであ
る。このことは、混合物の形態が乾燥後の組成物構造を
決定するものであり、混合時の水分壁およびその後の乾
燥方法が重要となるのである。After making the slurry concentration of the mixture 10 to 50%, 11
By freeze-drying the mixture described in Item 11, water in the mixture is removed while maintaining the three-dimensional network state. This means that the morphology of the mixture determines the structure of the composition after drying, and the moisture wall during mixing and the subsequent drying method are important.
前記混合物のスラリー濃度を10〜50%にした理由は
混合時の水溶媒が50%以上であると分散混合状態は均
一になるが、乾燥後、網目状の気孔空間が形成されず、
又形成されても一つの網目状の隔壁厚みが薄くもろくな
る。The reason why the slurry concentration of the mixture was set to 10 to 50% is that if the water solvent at the time of mixing is 50% or more, the dispersed mixing state becomes uniform, but after drying, a network of pore spaces is not formed.
Moreover, even if it is formed, the thickness of one mesh-like partition wall is thin and it becomes brittle.
一方、混合時の水溶媒が10%以下であると分散混合状
態が均一にならず、′Q集状態となり、均一網目構造を
採ることが困難となり、気孔空間形成の隔壁厚みが大き
く反応低下となる。On the other hand, if the water solvent during mixing is less than 10%, the dispersion and mixing state will not be uniform and will become a 'Q cluster' state, making it difficult to obtain a uniform network structure, and the thickness of the partition walls forming pore spaces will be large and the reaction will be reduced. Become.
また、前記混合物の乾燥として凍結乾燥法を用いるのは
、一般加熱乾燥においては、乾燥時にマイグレーション
を起こして本発明の目的とする気孔空間を形成しなくな
り、本発明の目的とする三次元網目構造を形成しにくい
のである。In addition, the freeze-drying method is used to dry the mixture because, in general heat drying, migration occurs during drying and the pore spaces that are the object of the present invention are not formed, and the three-dimensional network structure that is the object of the present invention is not formed. It is difficult to form.
すなわち、乾燥後に形成される三次元網目構造は前記二
酸化ケイ素および炭素質物質の配合量と溶媒量によって
形状が定められ、その気孔空間により炭化ケイ素ウィス
カー生成の為の律速となるウィスカー生成空間が確保さ
れるのである。That is, the shape of the three-dimensional network structure formed after drying is determined by the amount of silicon dioxide and carbonaceous material blended and the amount of solvent, and the pore space ensures a whisker generation space that is rate-determining for the generation of silicon carbide whiskers. It will be done.
本発明によれば、炭化ケイ素ウィスカーを製造する上で
、原料中の炭素量を増加させ°ζ前記式■の反応が生起
する箇所を増加させ、前記−酸化ケイ素ガス分圧の上昇
を制j2Hすることが有効であり、前記配合原料におけ
る二酸化ケイ素と炭素質物質の割合、すなわちc/5i
o1モル比を3〜10の範囲とすることが有利である。According to the present invention, in producing silicon carbide whiskers, the amount of carbon in the raw material is increased to increase the number of locations where the reaction of formula (3) occurs, thereby suppressing the increase in the -silicon oxide gas partial pressure It is effective to
It is advantageous for the o1 molar ratio to be in the range from 3 to 10.
前記C/5i(hモル比3〜10とする理由は、理論配
合量(C/SiO□モル比3)より炭素質物質が少ない
と二酸化ケイ素が炭化物にならず金属に迄還元される反
応が起き易くなる。また、C/SiOxモル比lOを越
えて炭素■が多すぎると余分な炭素が残留することとな
り品位も低下し経済的でない。The reason why the C/5i (h molar ratio is set to 3 to 10) is that if the amount of carbonaceous material is less than the theoretical blending amount (C/SiO□ molar ratio 3), the reaction in which silicon dioxide does not become a carbide and is reduced to a metal occurs. Furthermore, if there is too much carbon (2) exceeding the C/SiOx molar ratio 1O, excess carbon will remain, resulting in a decrease in quality, which is not economical.
また、前記炭素質物質としての炭素系の結合剤系の結合
剤の配合重量、八(ポ)は二酸化ケイ素の全比表面積、
B(nf)は炭素粉末の全比表面積である。すなわち、
使用する二酸化ケイ素お、紅び炭素粉末の全比表面積に
対して前記炭素系の結合剤の配合量を決定するのである
。In addition, the blended weight of the carbon-based binder-based binder as the carbonaceous material, 8 (po) is the total specific surface area of silicon dioxide,
B(nf) is the total specific surface area of the carbon powder. That is,
The amount of the carbon-based binder to be blended is determined based on the total specific surface area of the silicon dioxide and red carbon powder used.
前記配合比Mがo、oosより小さいと粒状物原料内の
三次元網目構造体の圧潰強度が低くハンドリング及び反
応容器内で崩壊し易くなるからである。This is because if the blending ratio M is smaller than o or oos, the crushing strength of the three-dimensional network structure within the granular raw material will be low and it will easily collapse during handling and within the reaction vessel.
一方、配合比Mが0.15より大きいと前記乾燥時にお
いて溶融し、三次元網目構造体を形成することが困難と
なり、また造粒できないからである。On the other hand, if the blending ratio M is larger than 0.15, it will melt during the drying process, making it difficult to form a three-dimensional network structure and making it impossible to granulate it.
本発明によれば、1111記粒状物の平均粒径は3〜1
8m5の範囲内とすることが好ましい、その理由は、1
jり記粒状物の平均粒径が3IIImより小さいと粒状
物とした効果が殆どな(、一方181より大きいと粒状
物内における反応速度が遅くなり、経済的でないからで
ある。According to the present invention, the average particle size of the 1111 granules is 3 to 1
It is preferable to set the area within the range of 8 m5 for the following reasons: 1.
If the average particle size of the granules is smaller than 3IIIm, there is little effect as a granule (on the other hand, if it is larger than 181, the reaction rate within the granules becomes slow, making it uneconomical.
本発明によれば、前記比較的大きな粒状物となす場合に
は二酸化ケイ素と炭素質物質とし゛この炭素粉末と炭素
系の結合剤よりなるn;1記組成物を充分に均一混合さ
れた後、例えば、パン型造粒機、ドラム型造粒機、水平
振動型造粒機、ブリケットマシン、流動混合造粒機なと
の造粒機によって造粒してもよいが、前記凍結乾燥と造
粒を一括して処理することができるフリーズドライの手
段を用いるのが好適である。According to the present invention, when forming the relatively large granules, silicon dioxide and a carbonaceous material are thoroughly and uniformly mixed together with the composition consisting of this carbon powder and a carbon-based binder. For example, granulation may be performed using a granulator such as a pan-type granulator, a drum-type granulator, a horizontal vibration-type granulator, a briquette machine, or a fluidized mixing granulator; It is preferable to use a freeze-drying method that can process all of the ingredients all at once.
本発明によれば、粒状物の高密度を0.20−0.70
g/cjの範囲内となすことが有利である。前記真密度
を0.20〜0.70g/c+jの範囲内とすることが
有利な理由は、嵩密度は低い方がウィスカー生成空間そ
の他の点で好ましいが、0.20g/cdより低い粒状
物となすためには前記組成物の気孔率を著しく高めなけ
ればならず、前記気孔率は余り高くすると前述の如く組
成物の強度が著しく低下し、粒状物としての強度も低下
することとなる。According to the present invention, the high density of granules is 0.20-0.70
Advantageously, it is within the range of g/cj. The reason why it is advantageous to set the true density within the range of 0.20 to 0.70 g/c+j is that although a lower bulk density is preferable in terms of whisker generation space and other aspects, granules with a density lower than 0.20 g/cd In order to achieve this, it is necessary to significantly increase the porosity of the composition, and if the porosity is too high, the strength of the composition will decrease significantly as described above, and the strength of the granular material will also decrease.
一方0.70g/cdより高いと反応生成ガスの通気性
が悪く予熱帯における高温ガスの流れが不均一になり、
原料と高温ガスとの熱交換が不充分になるばかりでなく
前記−酸化ケイ素ガスの析出物の影響を敏感に受は易く
なり原料の円滑な自重降下が阻害され長時間の安定した
1呆業を維持することが困難になるからである。また、
本目的である、ウィスカー生長空間を&?f保すること
が非常に困難となる。前記粒状物嵩密度は0.30〜0
.(i0g八−の範囲内において最も良い結果が得られ
る。On the other hand, if it is higher than 0.70 g/cd, the permeability of the reaction product gas will be poor and the flow of high-temperature gas in the preheating zone will become uneven.
Not only is the heat exchange between the raw material and the high-temperature gas insufficient, but it is also susceptible to the effects of the silicon oxide gas precipitates, which impedes the smooth fall of the raw material under its own weight, resulting in long-term stable operation. This is because it becomes difficult to maintain. Also,
The main purpose is whisker growth space &? It becomes very difficult to maintain f. The bulk density of the granules is 0.30 to 0.
.. (The best results are obtained within the range of i0g8-.
次に本発明の原t’t at成物を評価する」−におい
て使用したウィスカー製造反応器に就いて説明する。Next, the whisker production reactor used in "Evaluating the original t'at product of the present invention" will be explained.
前記粒状物原料を予熱(IFと加熱(iFと冷却帯を有
する反応容器の」二方より装入し前記装入された原料を
前記予熱IF内を連続的あるいは間歇的に自重降下させ
つつ加熱帯に至らせ、前記加熱帯内で水平方向に加熱し
てガス発生反応を行わせ、次いで冷却帯に降下させ非酸
化性雰囲気下で冷却後11」記反応容器の冷却帯下部よ
り連続的あるいは間歇的に反応生成物を排出させること
によって炭化ケイ素ウィスカーが製造される。The granular raw material is charged from two sides of a reaction vessel having a preheating (IF) and a heating (iF) and cooling zone, and the charged raw material is processed while being continuously or intermittently lowered by its own weight in the preheating IF. It is brought to the tropics, heated horizontally in the heating zone to cause a gas generation reaction, and then lowered to the cooling zone and cooled in a non-oxidizing atmosphere. Silicon carbide whiskers are produced by discharging the reaction product intermittently.
本発明の目的である極めて粒状の少ない炭化ケイ素ウィ
スカーを!!!造する上で、加熱帯における反応温度を
1500〜2000℃の範囲内に制御nした。その理由
は、前記反応温度が1500 ’Cより低いと前記式■
で示される反応速度が極めて遅く効率的に炭化ケイ素ウ
ィスカーを製造することが困難になるからであり、一方
2000°Cより高いと炭化ケイ素粉末が生成し、結晶
成長し昌いため、本発明の目的とする極めて粒状の少な
いβ型炭化ケイ素ウィスカーを連続製造することが困難
であるからである。Silicon carbide whiskers with extremely low graininess are the object of the present invention! ! ! During the production, the reaction temperature in the heating zone was controlled within the range of 1500 to 2000°C. The reason is that when the reaction temperature is lower than 1500'C, the formula
This is because the reaction rate shown by is extremely slow and it becomes difficult to efficiently produce silicon carbide whiskers.On the other hand, if the temperature is higher than 2000°C, silicon carbide powder is generated and crystals grow. This is because it is difficult to continuously produce β-type silicon carbide whiskers with very little graininess.
次に本発明のウィスカー製造用原料組成物に使用した連
続製造装置の1例を図面を参照しながら具体的に説明す
る。Next, one example of a continuous production apparatus used for the raw material composition for producing whiskers of the present invention will be specifically explained with reference to the drawings.
本発明の方法の実施に直接使用する装置は図に示す如く
原料装入口lと予熱帯2と加熱帯3と冷却帯4と密閉自
在の生成物排出口5とを有し、それらが、縦方向にそれ
ぞれ連接されてなる反応容器6であって、11社記加1
.さ帯を形成する筒7は黒鉛製であり、加熱帯の装入物
を間接電気加熱する手段8.9を具備し、少なくとも前
記加熱帯の外側に炭素あるいは黒鉛質よりなる断熱層1
0を有するものである。As shown in the figure, the apparatus directly used for carrying out the method of the present invention has a raw material charging port 1, a preheating zone 2, a heating zone 3, a cooling zone 4, and a sealable product outlet 5, which are connected vertically. Reaction vessels 6 connected in different directions, including 11 reactors 6 and 1
.. The tube 7 forming the band is made of graphite and is equipped with means 8.9 for indirectly electrically heating the charge in the heating zone, and at least a heat insulating layer 1 made of carbon or graphite is provided on the outside of the heating zone.
0.
前記反応容器6は装置の中心部に設置され、間接加熱手
段8.9は黒鉛製発熱体8と前記発熱体体の外側に近接
して設りられて黒鉛製反射筒に囲まれた空間内には非酸
化性ガス装入[T111より例えばAr、He、N!
、Co、Hi 、その他の非酸化性ガスが封入され、空
気の侵入による黒鉛製発熱体の酸化消耗が防止される。The reaction vessel 6 is installed in the center of the apparatus, and the indirect heating means 8.9 is provided in a space surrounded by a graphite heating element 8 and a graphite reflector cylinder, which is provided close to the outside of the heating element 8. A non-oxidizing gas is charged [from T111, for example, Ar, He, N!
, Co, Hi, and other non-oxidizing gases to prevent the graphite heating element from being consumed by oxidation due to air intrusion.
実施例1
比表面積1.7 nf/g、平均粒子径2.3μmの二
酸化ケイ素粉末(S i O! 90.5重世%>10
0重鼠重星対して比表面積が20nf/Hのサーマルブ
ラック粉末(固定炭素98.5重量%)50trtff
1部と分散剤としてポリオキシエチレンアルキルフェニ
ルエーテル0.5重量部と水800重n部、固形分に対
して固定炭素20%の水溶液フェノール樹脂40%溶液
を625重1部を添加し、樹脂性ボールミルを使用して
充分混合した後、液体窒素中に滴下させ、凍結固化させ
た。更に固化物を0.1Torrに減圧された乾燥機内
で乾燥させ水分を除去した。得られた粒状物は充填嵩密
度0.3g/ cJ、粒状物破面の走査型電子顕微鏡に
よる観察から平均気孔径2977mであり、二酸化ケイ
素とサーマルブラックが14牧状に骨格を形成した三次
元多孔′LT構造となっていた。Example 1 Silicon dioxide powder (S i O! 90.5% > 10
Thermal black powder (fixed carbon 98.5% by weight) 50 trtff with a specific surface area of 20 nf/H relative to the 0-weight star
1 part by weight of polyoxyethylene alkyl phenyl ether as a dispersant, 800 parts by weight of water, and 625 parts by weight of a 40% solution of an aqueous phenol resin containing 20% fixed carbon based on the solid content. After thorough mixing using a plastic ball mill, the mixture was dropped into liquid nitrogen and solidified by freezing. Furthermore, the solidified product was dried in a dryer under reduced pressure of 0.1 Torr to remove moisture. The obtained granules had a filling bulk density of 0.3 g/cJ, an average pore diameter of 2977 m based on observation of the fractured surface of the granules, and a three-dimensional structure in which silicon dioxide and thermal black formed a 14-molecular skeleton. It had a porous LT structure.
水銀圧入法で調べた気孔率は78%であった。The porosity determined by mercury intrusion method was 78%.
次いで、この粒状物を前記竪型の間接加熱炉の上部より
装入し、前記加熱炉内を連続的に自ffi降下させて、
反応温度として1800℃に制御された加熱帯に至らせ
た。加熱帯における装入物を0゜2m/hrの降下速度
で自重降下させつつ水平方向にm1接加熱して反応を行
わせた後、冷却()に自重降下させ、排出口より反応生
成物を連続的にIJF出させた。Next, this granular material is charged from the upper part of the vertical indirect heating furnace, and is continuously lowered in the heating furnace,
A heating zone was established in which the reaction temperature was controlled at 1800°C. The charge in the heating zone is allowed to fall under its own weight at a rate of 0.2 m/hr while being heated in the horizontal direction by m1 to cause a reaction, and then allowed to fall under its own weight in the cooling (), and the reaction product is discharged from the discharge port. IJF was issued continuously.
得られた反応生成物から遊離炭素を除去し、次いでフッ
化水素酸10%、水溶液に3時間浸W1シて’mM二酸
化ケイ素を除去した。Free carbon was removed from the resulting reaction product, and then the product was immersed in a 10% aqueous solution of hydrofluoric acid for 3 hours to remove 'mM silicon dioxide.
得られた精製物はX線回折によりβ型炭化ケイ素である
ことが確認され、走査型電子l!I′i微鏡観察で平均
径0.5μm、平均長6μm、粒状物が12%含有され
た炭化ケイ素ウィスカーが得られた。The obtained purified product was confirmed to be β-type silicon carbide by X-ray diffraction, and scanning electron l! I′i microscopic observation revealed that silicon carbide whiskers had an average diameter of 0.5 μm, an average length of 6 μm, and contained 12% of particulate matter.
実施例2
無水タール(比I!(1,15、水分0.3%以下)
360重団部に対し溶剤としてトルエン360重量部を
撹拌機付ステンレス容器内で混合溶解さ・Uた後、60
℃の温水600ffiffi部と乳化剤(酢化エチレン
+ステアリン酢変成体)9重量部添加し、ヒーターにて
60°Cに保ちながら加熱撹拌を約1時間おこない、エ
マルジヨン化させた。えられたエマルジョン化液に実施
例1で使用した二酸化り・イ素100重量部を添加し、
前記容器内で撹I↑を約2時間おこなって混合液とした
。Example 2 Anhydrous tar (ratio I! (1.15, water content 0.3% or less)
360 parts by weight and 360 parts by weight of toluene as a solvent were mixed and dissolved in a stainless steel container with a stirrer.
600 ffiffi parts of warm water at 600 °C and 9 parts by weight of an emulsifier (ethylene acetate + modified stearic acid) were added, and heated and stirred for about 1 hour while maintaining the temperature at 60 °C with a heater to form an emulsion. Adding 100 parts by weight of phosphor and ion dioxide used in Example 1 to the obtained emulsion liquid,
Stirring I↑ was performed in the container for about 2 hours to obtain a mixed solution.
次いで、11;1記混合液を実施例1と同様に凍結乾燥
を行い水分除去した。得られた粒状物は、高密度0.(
ig/cj、気孔率58%、平均気孔径210ymの三
次元網目構造を有していた。Next, the mixture of 11:1 was freeze-dried in the same manner as in Example 1 to remove water. The obtained granules have a high density of 0. (
It had a three-dimensional network structure with ig/cj, porosity of 58%, and average pore diameter of 210ym.
実り一例1と同様に合成を行い、反応生成物を得た。得
られた反応生成物は、平均径0.2μm、平均長11μ
m、粒状物24%含有のβ型炭化ケイ素ウィスカーであ
った。Synthesis was carried out in the same manner as in Example 1 to obtain a reaction product. The obtained reaction product had an average diameter of 0.2 μm and an average length of 11 μm.
m, β-type silicon carbide whiskers containing 24% particulate matter.
3.4 1〜3
実施例1と同様であるが、原料としての二酸化ケイ素に
比表面積0.22ボ/g、平均粒径14μmのものを使
用した場合(実施例3)炭素わ)末を比表面積とその添
加量および炭素系の結合剤の添加h【をかえ合成温度条
件を変化させた場合(実施例4)二酸化ケイ素は実施例
1と同様であるが炭素粉末の比表面積と添加量および溶
媒の添加量をかえで造粒物の平均気孔径を大きく作製し
た場合(比較例1)実施例3と同様であるが炭素系結合
剤としてピッチを使用し乳化剤でエマルジョン化し造粒
物の平均気孔径を比較的大きくし気孔ドを大きくした場
合(比較例2)実施例2と同様であるが転勤造粒法を用
いて造粒動程を大きくした場合(比較例3)についての
結果をまとめて表にしこの結果から、いずれの実施例に
おいても比較例に比らべ反応生成物中の粒状物は少なか
った。3.4 1 to 3 Same as Example 1, but when using silicon dioxide as a raw material with a specific surface area of 0.22 bo/g and an average particle size of 14 μm (Example 3) Specific surface area, amount of addition, and addition of carbon-based binder (Example 4) When changing synthesis temperature conditions (Example 4) Silicon dioxide was the same as in Example 1, but the specific surface area of carbon powder and amount of addition were changed. and a case where the average pore size of the granules was made larger by changing the amount of solvent added (Comparative Example 1) Same as Example 3, but using pitch as the carbon-based binder and emulsifying with an emulsifier. When the pore diameter was relatively large and the pore size was increased (Comparative Example 2) The results were shown for the same as Example 2, but when the granulation movement was increased using the transfer granulation method (Comparative Example 3). The results are summarized in a table, and the results show that the amount of particulate matter in the reaction product was lower in all Examples than in the Comparative Example.
なお、比較例1においては、合成時反応器内で崩壊しわ
)状物となり、閉塞不能となり反応生成物は得られなか
った。In Comparative Example 1, the reactor disintegrated into a wrinkled material during synthesis, making it impossible to close the reactor, and no reaction product was obtained.
(発明の効果)
以上詳述した通り、本発明にあっては上記実施例に例示
した如く二酸化ケイ素と炭素質物質からなり気孔率が3
8〜85%であり、平均気孔径が5〜1000μmの炭
化ケイ素ウィスカー製造用組成物にその構成上の特徴が
ありこれを平均粒径3〜lQmmの粒状物として使用す
ることにより最終的に粒状炭化ケイ素の含有Btの少な
い炭化ケイ素ウィスカーを得ることができる。(Effects of the Invention) As detailed above, the present invention is made of silicon dioxide and a carbonaceous material and has a porosity of 3 as exemplified in the above embodiment.
The composition for producing silicon carbide whiskers has a structural characteristic of 8 to 85% and an average pore size of 5 to 1000 μm, and by using it as a granule with an average particle size of 3 to 1Q mm, it can finally be made into granules. Silicon carbide whiskers containing less Bt in silicon carbide can be obtained.
第1図は、実施例、比較例に使用したウィスカー製造反
応器である。
第2図は、本発明による炭化ケイ素ウィスカー製造用原
料組成物を模式的に示した拡大断面図。
符号の説明
1−・−・原料装入口、2−・・・−予熱帯、3−・−
・−加熱・((2,4−・・・−・冷却帯、5−・−生
成物排出口、6・−・・−反応容器、7− 加熱シ;シ
を形成する筒、8・・・・・・黒鉛製発熱体、9・・・
・・−黒ス:)製反射箇、10・・−・−・断熱層、1
1・−・・−非酸化性ガス装入口、12− ・−・室内
電極、13・・−・・可とう導体、14−・・−・−ブ
スバー、15・・・・・@温バ・イブ、16−・・−外
殻、17〜・・・・耐火煉瓦、18−−−−一排気ダク
ト、19・・・−・・原料ホンパー、21・・−二酸化
ケイ素、22・−・・・・・炭素質物質
以上FIG. 1 shows a whisker production reactor used in Examples and Comparative Examples. FIG. 2 is an enlarged cross-sectional view schematically showing a raw material composition for producing silicon carbide whiskers according to the present invention. Explanation of symbols 1-- Raw material charging inlet, 2-- Preheating zone, 3--
・-Heating・((2, 4-...- Cooling zone, 5--Product outlet, 6--Reaction vessel, 7- Heating cylinder; 8-... ...Graphite heating element, 9...
...-Black :) reflective part, 10...--Heat insulation layer, 1
1--Non-oxidizing gas charging port, 12--Indoor electrode, 13--Flexible conductor, 14--Bus bar, 15--@warm bar Eve, 16--Outer shell, 17--Refractory brick, 18--Exhaust duct, 19--Raw material hopper, 21--Silicon dioxide, 22-- ...More than carbonaceous materials
Claims (1)
〜85%であり、平均気孔径が5〜1000μmで三次
元網目構造であることを特徴とする炭化ケイ素ウィスカ
ー製造用原料組成物。 2)前記炭素質物質は炭素粉末と炭化せしめた炭素系の
結合剤からなることを特徴とする請求項1記載の炭化ケ
イ素ウィスカー製造用原料組成物。 3)前記炭素質物質は炭化せしめた炭素系の結合剤から
なることを特徴とする請求項1記載の炭化ケイ素ウィス
カー製造用原料組成物。 4)平均粒径が3〜18mmの粒状物であることを特徴
とする請求項1記載の炭化ケイ素ウィスカー製造用原料
組成物。[Claims] 1) Made of silicon dioxide and carbonaceous material, with a porosity of 35
85%, an average pore diameter of 5 to 1000 μm, and a three-dimensional network structure. 2) The raw material composition for producing silicon carbide whiskers according to claim 1, wherein the carbonaceous material comprises carbon powder and a carbonized carbon-based binder. 3) The raw material composition for producing silicon carbide whiskers according to claim 1, wherein the carbonaceous material comprises a carbonized carbon-based binder. 4) The raw material composition for producing silicon carbide whiskers according to claim 1, which is a granular material having an average particle size of 3 to 18 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15836088A JPH029800A (en) | 1988-06-27 | 1988-06-27 | Raw material composition for production of silicon carbide whisker |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15836088A JPH029800A (en) | 1988-06-27 | 1988-06-27 | Raw material composition for production of silicon carbide whisker |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH029800A true JPH029800A (en) | 1990-01-12 |
Family
ID=15669973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15836088A Pending JPH029800A (en) | 1988-06-27 | 1988-06-27 | Raw material composition for production of silicon carbide whisker |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH029800A (en) |
-
1988
- 1988-06-27 JP JP15836088A patent/JPH029800A/en active Pending
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