JPH0310085A - Surface treatment for substrate - Google Patents
Surface treatment for substrateInfo
- Publication number
- JPH0310085A JPH0310085A JP14309489A JP14309489A JPH0310085A JP H0310085 A JPH0310085 A JP H0310085A JP 14309489 A JP14309489 A JP 14309489A JP 14309489 A JP14309489 A JP 14309489A JP H0310085 A JPH0310085 A JP H0310085A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- zinc
- film
- treatment
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、アルミニウムもしくはアルミニウム合金から
なる基板の表面処理方法に関し、特に磁気ディスクの非
磁性下地膜を無電解ニッケル−リンめっきにより形成す
るための前処理方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for surface treatment of a substrate made of aluminum or an aluminum alloy, and particularly to a method for forming a non-magnetic base film of a magnetic disk by electroless nickel-phosphorus plating. The present invention relates to a pretreatment method.
〔発明の41!を要〕
本発明は、アルミニウムもしくはアルミニウム合金から
なる基板の表面処理において、上記基板に亜鉛置換処理
を行った後にその表面を酸性溶液で処理することにより
、後に非磁性下地膜として形成されるニラ−ケル−リン
破1漠の密着性1表面性を向上させようとするものであ
る。[41 inventions! [requires] In the surface treatment of a substrate made of aluminum or an aluminum alloy, the present invention involves performing a zinc substitution treatment on the substrate and then treating the surface with an acidic solution to form a non-magnetic base film. - It is intended to improve the adhesion and surface properties of Kellin fractures.
(従来の技術)
磁気記録の分野においては、高密度化、大言1化、高速
化等への要求がますます増大しており、磁性層を磁性塗
料の塗布により形成したいわゆる塗布型の磁気記録媒体
に代わって、磁性Nをスパッタリングやめっき等の薄膜
形成技術により形成したIwA型の磁気記録媒体が実用
化され、さらなる発展が期待されている。(Prior art) In the field of magnetic recording, demands for higher density, higher speed, and higher speed are increasing. In place of the recording medium, an IwA type magnetic recording medium in which magnetic N is formed by a thin film forming technique such as sputtering or plating has been put into practical use, and further development is expected.
I腔型の磁気記録媒体においては、通常、基板と磁性層
との間に非磁性下地膜が形成されている。In an I-cavity type magnetic recording medium, a nonmagnetic underlayer is usually formed between the substrate and the magnetic layer.
この非磁性下地膜は、基板の硬度を増大させ、また基板
と磁性層との間に介在することにより両者の密着性を高
めて磁性層の脱落等の障害を防止するために設けられる
ものである。−射的な1賎型の磁気記録媒体では、アル
ミニウムもしくはアルミニウム合金からなる基板の上に
非磁性下地膜としてニッケル−リン被膜が形成された構
成となっている。上記ニッケル−リン被膜はめつき技術
により形成されるものであるが、このめつき技術として
は、電解めっき法に比べて均一で緻密な薄膜が比較的容
易に得られ、−括大量生産が可能な無’If!解めっき
法が広く適用されている。This non-magnetic base film is provided to increase the hardness of the substrate, and by being interposed between the substrate and the magnetic layer, to increase the adhesion between the two and prevent problems such as the magnetic layer falling off. be. A single-magnetic magnetic recording medium has a structure in which a nickel-phosphorus film is formed as a nonmagnetic underlayer on a substrate made of aluminum or an aluminum alloy. The above-mentioned nickel-phosphorus coating is formed by plating technology, and compared to electrolytic plating, it is relatively easy to obtain a uniform and dense thin film, and - mass production is possible. Mu'If! Deplating methods are widely applied.
さらに、上記ニッケルーりン被膜の均一な析出を助け、
基板との密着性を向上させるために、無電解ニッケル−
リンめっきに先立って基板の表層のみを亜鉛と置換する
亜鉛置換処理(ジンケート処理)が行われることが多い
。Furthermore, it helps the uniform precipitation of the nickel-phosphorus coating,
Electroless nickel is used to improve adhesion to the substrate.
Prior to phosphor plating, zinc replacement treatment (zincate treatment) is often performed to replace only the surface layer of the substrate with zinc.
ところで、II型の磁気記録媒体は上述のような非磁性
下地膜や磁性層の他、保!!膜、II?l滑層等の十数
μm〜数十人厚の−様な機能性膜が積層された構成を有
している。かかる構成において、下層側の性状は上層側
の性状に大きく影響するため、各機能性膜には物理的、
化学的1機械的に厳しい条件が課せられている。特に近
年では高密度化を目的としてin気ヘッドの浮上坦が減
少される傾向にあるので、信号エラーやドロップアウト
、さらにはヘッドクラッシュ等の重大な障害を回避する
ためには、これら機能性膜の均一性、密着性、平滑性の
向上が極めて重要な課題となる。By the way, type II magnetic recording media have a non-magnetic base film and a magnetic layer as described above, as well as a magnetic layer. ! Membrane II? It has a structure in which functional films, such as lubricating layers, with a thickness of 10-10 μm to several tens of μm are laminated. In such a configuration, the properties of the lower layer greatly affect the properties of the upper layer, so each functional film has physical and
Strict chemical and mechanical conditions are imposed. Particularly in recent years, there has been a trend to reduce the flying flatness of in-air heads for the purpose of increasing density, so in order to avoid serious problems such as signal errors, dropouts, and even head crashes, it is necessary to use these functional films. Improving the uniformity, adhesion, and smoothness of the film is an extremely important issue.
このような事情から、無電解ニッケル−リンめっきに先
立つ亜鉛置換処理にも高い均一性および平滑性を達成で
きる方法が要求されており、たとえば亜鉛置換処理を2
回繰り返すこともその一例である。これは、1回目の亜
鉛置換処理により粒径の比較的大きな亜鉛を早く成長さ
せた後、硝酸等の強酸を用いた短時間処理により核とな
る亜鉛のみを残して大部分の亜鉛を一旦除去し、2回目
の亜鉛置換処理により上記の核を元にしてより粒径の小
さい亜鉛を成長させるものである。これらの各工程の間
では、当然のことながら純水で十分な洗浄が行われる。Under these circumstances, there is a need for a method that can achieve high uniformity and smoothness in the zinc replacement treatment prior to electroless nickel-phosphorus plating.
One example is repeating the process several times. This process involves quickly growing zinc with a relatively large particle size through the first zinc replacement treatment, and then using a short-time treatment with strong acids such as nitric acid to remove most of the zinc, leaving only the core zinc. However, by the second zinc substitution treatment, zinc having a smaller particle size is grown based on the above-mentioned nuclei. As a matter of course, sufficient washing with pure water is performed between each of these steps.
しかしながら、上述のように2回の亜鉛置換処理を行い
、かつ各工程間において十分な水洗を行ったとしても、
無電解ニッケル−リンめっきにおけるめっきムラ、めっ
き被膜の光沢低下、および密着不良を完全に防ぐことは
困難であることがわかってきた。However, even if zinc replacement treatment is performed twice as described above and sufficient water washing is performed between each process,
It has been found that it is difficult to completely prevent uneven plating, decreased gloss of the plated film, and poor adhesion in electroless nickel-phosphorus plating.
そこで本発明は、上述のような問題を生じない基板の表
面処理方法の提供を目的とする。Therefore, an object of the present invention is to provide a method for surface treatment of a substrate that does not cause the above-mentioned problems.
(!!!!題を解決するための手段)
本発明者らは上述の目的を達成するために鋭意検討を行
った結果、亜鉛置換処理後の基板表面には水酸化亜各1
)の薄い被膜が形成されており、上述の問題点はこの被
膜からニッケル−リンめっき浴中に亜鉛イオンが溶出す
るために生ずるものであることを見出した。つまり、め
っきムラや光沢低下は亜鉛置換処理後の基板表面から亜
鉛イオンが不均一に溶出したために成長しためっき被膜
に欠陥や表面凹凸が発生した結果であり、また密着不良
は亜鉛の共析によりめっき被膜の内部応力が増大した結
果である。したがって、これらの問題を解決するために
は、ニッケル−リンめっき浴中に亜鉛イオンを溶出させ
ないことが有効であると考えられる。(Means for Solving the Problem) The inventors of the present invention have conducted intensive studies to achieve the above-mentioned object, and have found that after the zinc substitution treatment, the surface of the substrate is
) was formed, and it was discovered that the above-mentioned problem was caused by the elution of zinc ions from this film into the nickel-phosphorus plating bath. In other words, uneven plating and reduced gloss are the result of uneven elution of zinc ions from the surface of the substrate after zinc replacement treatment, resulting in defects and surface irregularities in the grown plating film, and poor adhesion is due to the eutectoid of zinc. This is the result of increased internal stress in the plating film. Therefore, in order to solve these problems, it is considered effective to prevent zinc ions from being eluted into the nickel-phosphorous plating bath.
本発明にかかる′v&板の表面処理方法はかかる知見に
もとづいて提案されるものであり、アルミニウムもしく
はアルミニウム合金からなる基板に亜鉛y1換処理を行
った後、前記基板を酸性溶液中に浸漬し、さらに無電解
ニッケル−リンめっきを行うことを特徴とするものであ
る。The surface treatment method for 'v& board according to the present invention is proposed based on such knowledge, and after performing zinc y1 conversion treatment on a substrate made of aluminum or aluminum alloy, the substrate is immersed in an acidic solution. , further comprising electroless nickel-phosphorus plating.
本発明において、亜鉛置換処理は従来公知の方法により
行うことができる。たとえば、水11あたり酸化亜鉛8
0g、水酸化ナトリウム400gを含有する処理浴に常
温付近で30〜150秒程度浸漬することが行われる。In the present invention, the zinc substitution treatment can be performed by a conventionally known method. For example, 8 parts zinc oxide per 1 part water.
0 g of sodium hydroxide and 400 g of sodium hydroxide at room temperature for about 30 to 150 seconds.
41!j鉛′l!換処理により形成される亜鉛層の厚さ
は100〜5000人とすることが望ましい、上記範囲
より薄いと基板上に均一に析出せず、上記範囲より厚い
と厚みムラやピンホールの発生が多くなり基板との密着
性が劣化する。より好ましい範囲は基板の組成にもよる
が、おおよそ900〜1500人である。41! j lead'l! It is desirable that the thickness of the zinc layer formed by the conversion treatment be between 100 and 5000. If it is thinner than the above range, it will not be deposited uniformly on the substrate, and if it is thicker than the above range, there will be many uneven thicknesses and pinholes. As a result, the adhesion with the substrate deteriorates. A more preferable range is approximately 900 to 1,500 people, although it depends on the composition of the substrate.
続く酸性溶液中への浸漬は、亜鉛置換処理後の基板表面
に存在する水酸化亜鉛の被膜を溶解除去するために行わ
れるものである。このとき、酸性溶液のpH1成分およ
び浸漬条件は、水酸化亜鉛の被膜のみを選択的に溶解し
、その下の亜鉛層には影響を与えないように選ぶことが
必要である。The subsequent immersion in an acidic solution is performed in order to dissolve and remove the zinc hydroxide film present on the surface of the substrate after the zinc substitution treatment. At this time, it is necessary to select the pH 1 component of the acidic solution and the immersion conditions so as to selectively dissolve only the zinc hydroxide coating without affecting the underlying zinc layer.
上記酸性溶液のp Hは2.0〜3.5とすることが望
ましい、上記範囲よりpHが低い場合には亜鉛層まで浸
食されるEれがあり、高い場合には水酸化亜鉛の被膜の
除去が不十分となる。しかし、pHが上述の範囲であっ
ても希硝酸、塩酸等のように酸化力を有する酸は不適当
である。好適な酸の代表例は酢酸であり、水1Nに対し
て10〜500 rn!使用することができる。The pH of the above acidic solution is preferably 2.0 to 3.5. If the pH is lower than the above range, the zinc layer may be eroded, and if it is higher, the zinc hydroxide coating may be damaged. Removal will be insufficient. However, even if the pH is within the above range, acids with oxidizing power such as dilute nitric acid and hydrochloric acid are unsuitable. A typical example of a suitable acid is acetic acid, 10-500 rn! can be used.
なお、上記酸性溶液には水酸化亜鉛の分解を促進する目
的で水1Nに対して10〜500gの硫酸アルミニウム
を添加しても良い。In addition, aluminum sulfate of 10 to 500 g per 1N of water may be added to the above acidic solution for the purpose of promoting the decomposition of zinc hydroxide.
浸漬条件としては、温度を20〜40”C,浸漬時間を
15〜60秒とすることが望ましい、上記範囲外では、
水酸化亜鉛の被膜の除去が不十分となるか、あるいは亜
鉛層まで浸食される虞れがある。As for the immersion conditions, it is desirable to set the temperature to 20 to 40"C and the immersion time to 15 to 60 seconds. Outside the above range,
There is a risk that the removal of the zinc hydroxide film will be insufficient or that the zinc layer will be eroded.
このようにして基板を酸性溶液に浸漬した後、水洗を経
て通常の無電解ニッケル−リンめっきが行われる01.
ニッケル−リンめっき浴の組成としては、磁気ディスク
の非磁性下地膜の形成の目的で従来使用されているもの
が通用可能であり、特に限定されるものではない、また
、形成されるめっき被膜の膜厚も特に限定されるもので
はないが、特に磁気ディスクに適用する場合、余り薄す
ぎては基板の硬度を十分に向上させることができず、ま
た厚すぎては表面性が劣化してその上に積層される磁性
層の表面性に悪影響を及ぼすほか、めっき被膜の内部応
力が増大してクランク発生や基板との密着不良の原因と
なる。かかる観点から、望ましい膜厚は10〜500I
!mの範囲である。After the substrate is immersed in the acidic solution in this way, it is washed with water and subjected to normal electroless nickel-phosphorus plating.01.
The composition of the nickel-phosphorus plating bath is not particularly limited, and may be the one conventionally used for the purpose of forming a non-magnetic base film for magnetic disks. Although the film thickness is not particularly limited, especially when applied to magnetic disks, if it is too thin, it will not be possible to sufficiently improve the hardness of the substrate, and if it is too thick, the surface properties will deteriorate and its In addition to having an adverse effect on the surface properties of the magnetic layer laminated thereon, this increases the internal stress of the plating film, causing cracking and poor adhesion to the substrate. From this point of view, the desirable film thickness is 10 to 500I.
! m range.
亜鉛置換処理は強アルカリ溶液中で行われるため、処理
後の基板表面においては亜鉛層がさらに水酸化亜鉛の被
膜に被われた状態となっている。Since the zinc substitution treatment is performed in a strong alkaline solution, the zinc layer on the substrate surface after treatment is further covered with a film of zinc hydroxide.
水酸化亜鉛は水にはほとんど不溶であるため、ニッケル
−リンめっきを行う前に水洗を行ってもこの破n2は存
在したままである。しかし、この被膜は酸に可溶である
ため、このままp Hの低いニッケル−リンめっき浴に
浸漬すると不均一に溶出し、めっきムラの発生や表面凹
凸の増大の原因となるほか、浴中に溶出した亜鉛イオン
がニッケル−リン被膜中に取り込まれてその内部応力を
増大させ、密着不良の原因ともなる。しかし、本発明に
よれば、水酸化亜鉛の被膜はニッケル−リンめっきに先
立って酸性溶液により除去され、基板の表面には平滑な
亜鉛層が露出するので、該亜鉛層の上に成長するニラゲ
ル−リン被膜は極めて均一で、高い光沢を有し、密着性
に優れたものとなる。さらに、亜鉛イオンがニッケル−
リンめっき浴中に溶出しないことから、ニッケルの析出
阻害が起こらず、めっき浴の寿命も延長する。Since zinc hydroxide is almost insoluble in water, this fracture n2 remains even if water is washed before nickel-phosphorus plating. However, since this film is soluble in acids, if it is immersed in a nickel-phosphorus plating bath with a low pH, it will elute unevenly, causing uneven plating and increased surface roughness. The eluted zinc ions are incorporated into the nickel-phosphorus coating, increasing its internal stress and causing poor adhesion. However, according to the present invention, the zinc hydroxide film is removed with an acidic solution prior to nickel-phosphorus plating, and a smooth zinc layer is exposed on the surface of the substrate, so that the nila gel grows on the zinc layer. - The phosphorus film is extremely uniform, has high gloss, and has excellent adhesion. Furthermore, zinc ions are nickel-
Since it does not elute into the phosphorous plating bath, there is no inhibition of nickel precipitation and the life of the plating bath is extended.
(実施例〕
以下、本発明の好適な実施例について実験結果にもとづ
いて説明する。(Example) Hereinafter, preferred examples of the present invention will be described based on experimental results.
本実施例は、3.5インチのアルミニウム合金ディスク
基板に2回の亜鉛T!置換理、酸性溶液中への浸漬、無
電解ニッケル−リンめっきの各工程を実施し、各工程が
終了するごとに表面性状の31価を行ったものである。In this example, a 3.5-inch aluminum alloy disk substrate was coated with two times of zinc T! Each step of substitution treatment, immersion in an acidic solution, and electroless nickel-phosphorus plating was carried out, and the surface texture was evaluated for 31 valence after each step.
まず、常法にしたがって3.5インチのアルミニウム合
金ディスク基板に亜鉛置換処理を行い、続いて硝酸に短
時間浸漬することによって核となる亜鉛粒子のみを残し
て大部分の亜鉛層を除去した後、再び同じ条件により亜
鉛ra換処理を行った。First, a 3.5-inch aluminum alloy disk substrate was subjected to zinc replacement treatment according to a conventional method, and then most of the zinc layer was removed by immersing it in nitric acid for a short time, leaving only the core zinc particles. Then, zinc ra exchange treatment was performed again under the same conditions.
その後、水lj!あたり酢酸50 m j! *硫酸ア
ルミウニラム200 gを含有する酸性溶液(p H2
,3)中に上記の基板を20℃にて45秒間浸漬するこ
とにより、表面に存在する水酸化亜鉛の被膜を除去した
。After that, water lj! per acetic acid 50 mj! *Acidic solution containing 200 g of aluminum unilum sulfate (pH2
, 3) at 20° C. for 45 seconds to remove the zinc hydroxide film present on the surface.
なお、各工程間では必ず純水による洗浄を行った。Note that washing with pure water was always performed between each step.
以上の各工程が終Tするごとに、表面凹凸を触針式表面
粗さ計により測定した結果を第1図(A)ないし第1図
(D)に示1.第1図(A)は処理前、第1図(B)は
1回目の亜鉛置換処理終了後、第1図(C)は2回目の
亜鉛置換処理終了後、第1図(D)は酸性溶液に浸漬後
の基板の表面illさを表しており、各図において垂直
方向は水平方向に対して1000倍に拡大し表面凹凸を
強調しである。Each time the above steps are completed, the surface unevenness was measured using a stylus type surface roughness meter. The results are shown in FIGS. 1(A) to 1(D). Figure 1 (A) is before treatment, Figure 1 (B) is after the first zinc replacement treatment, Figure 1 (C) is after the second zinc replacement treatment, and Figure 1 (D) is the acid state. The surface illumination of the substrate after being immersed in the solution is shown, and in each figure, the vertical direction is magnified 1000 times as much as the horizontal direction to emphasize the surface irregularities.
まず、処理前のアルミニウム合金基板は第1図(A)よ
り明らかなように鏡面加工により極めて平滑な表面を有
するものであるが、亜鉛置換処理を1回行うと第1図(
B)に示すように粒径の大きな亜鉛が成長するために表
面凹凸が大幅に増大する。しかし、−旦亜鉛店を除去し
た後に2回目の亜鉛置換処理を行うと、第1図(C)に
示すように平滑度は大きく改善され、さらに酸性溶液中
に浸漬して水酸化亜鉛の被膜を除去することにより第1
図(D)に示すように平滑度は極めて良好なものとなっ
た。First, as is clear from Fig. 1(A), the aluminum alloy substrate before treatment has an extremely smooth surface due to mirror finishing, but after one zinc substitution treatment, the surface becomes very smooth as shown in Fig. 1(A).
As shown in B), the surface unevenness increases significantly due to the growth of zinc having a large particle size. However, when a second zinc replacement treatment was performed after removing the zinc oxide, the smoothness was greatly improved as shown in Figure 1 (C), and further immersion in an acidic solution resulted in a coating of zinc hydroxide. The first
As shown in Figure (D), the smoothness was extremely good.
次に、上述の第1図(D)に示した基板について以下の
組成を有するニジケル−リンめっき浴中において無電解
ニッケル−リンめっきを行った。Next, electroless nickel-phosphorus plating was performed on the substrate shown in FIG. 1(D) described above in a nickel-phosphorus plating bath having the following composition.
硫酸ニッケル 25 g/1次亜リン酸す
トリウム 30 g/lリンゴ酸
30g/l
コハク酸 16 g/l酢酸ナトリウ
ム 10g/j!硫酸銅 0.
05 g / 1なお上記ニッケル−リンめっき浴の
p Hはアンモニア水または水酸化ナトリウム水溶液に
より2113.5に調整した。Nickel sulfate 25 g/1 Sodium hypophosphite 30 g/l Malic acid
30g/l Succinic acid 16g/l Sodium acetate 10g/j! Copper sulfate 0.
05 g/1 The pH of the nickel-phosphorus plating bath was adjusted to 2113.5 with ammonia water or sodium hydroxide aqueous solution.
かかるめっき浴(浴i90’c)にて20μmJ!Xの
ニッケル−リン被膜を成長させた後、片面につき2μm
の研磨を行い、レーザー光式表面欠陥検査機により欠陥
の大きさと発止個数をカウントした。20μmJ in such a plating bath (bath i90'c)! After growing the nickel-phosphorus film of
The size and number of defects were counted using a laser beam surface defect inspection machine.
また比較のために、1回目の亜鉛置換処理終了後に水洗
を経てニッケル−リンめっきを行った基板、および2回
目の亜鉛置換処理終了後に水洗を経てニッケル−リンめ
っきを行った基板についても同様に表面欠陥を測定した
。For comparison, the same results were applied to a board that was washed with water and nickel-phosphorus plated after the first zinc replacement treatment, and a board that was washed with water and nickel-phosphorus plated after the second zinc replacement treatment. Surface defects were measured.
以上の結果を第1表にまとめる。The above results are summarized in Table 1.
第1表
第1表に示した結果は、前述の第1図(B)ないし第1
図(D)に示す結果を良く反映している。Table 1 The results shown in Table 1 are based on the results shown in Figures 1 (B) to 1 above.
This well reflects the results shown in Figure (D).
すなわち、酸性溶液に浸漬した後にニッケル−リンめっ
きをhii!シた基板は、第1図(D)に示した極めて
平滑度の高い表面にめっき被膜が形成されているため、
欠陥が全く生じていなかった。これに対し、亜S4>置
換処理を1回行っただけの基板においては、第1図([
3)に示したような表面凹凸の増大した表面にめっき被
膜が形成されたために比較的小さな径の欠陥が多数発生
しており、かかる欠陥の発生は亜鉛11喚処理の回数を
2回とした場合にも完全に抑制することはできなかった
。That is, nickel-phosphorus plating is applied after immersion in an acidic solution! The plated substrate has a plating film formed on its extremely smooth surface as shown in Figure 1 (D).
No defects occurred. On the other hand, for the substrate on which sub-S4>substitution processing was performed only once, as shown in Fig. 1 ([
As shown in 3), many defects with relatively small diameters were generated due to the formation of the plating film on the surface with increased surface irregularities, and the number of such defects was determined by the number of times of zinc 11 treatment. In some cases, it could not be completely suppressed.
以上の説明からも明らかなように、本発明の基板の表面
処理方法を通用すれば、アルミニウムもしくはアルミニ
ウム合金からなる基板の表面が無電解ニッケル−リンめ
っきに先立って極めて平滑に調整されるため、ニッケル
−リン被膜の表面が極めて平滑となる。したがって、本
発明を磁気ディスクの製造に適用する場合には、上記ニ
ッケル−リン被膜の上に形成される磁性層の表面をも高
度に平滑とすることが可能となる。このような磁性層の
表面性の向上は、高密度化に伴って磁気ヘッドの浮上量
が高度に微小化されても、信号エラーやドロップアウト
、さらにはヘッドクラッシュ等の重大な障害を起こさず
極めて信顛性の高い磁気ディスクの提供を可能とするも
のである。As is clear from the above description, if the substrate surface treatment method of the present invention is applied, the surface of the substrate made of aluminum or aluminum alloy will be made extremely smooth prior to electroless nickel-phosphorus plating. The surface of the nickel-phosphorus coating becomes extremely smooth. Therefore, when the present invention is applied to the manufacture of magnetic disks, it is possible to make the surface of the magnetic layer formed on the nickel-phosphorus film highly smooth. This improvement in the surface properties of the magnetic layer means that even if the flying height of the magnetic head becomes highly miniaturized due to increased density, serious problems such as signal errors, dropouts, and even head crashes will not occur. This makes it possible to provide a magnetic disk with extremely high reliability.
また、本発明ではニッケル−リンめっき浴中に亜鉛イオ
ンが溶出することがないので、形成されるニッケル−リ
ン被膜の内部応力が増大およびこれに伴うvIi着性の
低下が起こらず、耐久性に優れた基板を提供することが
できる。さらに、めっき浴の寿命も延長するので、生産
性および経済性も向上する。In addition, in the present invention, since zinc ions are not eluted into the nickel-phosphorus plating bath, the internal stress of the nickel-phosphorus coating that is formed does not increase and the resulting decrease in vIi adhesion does not occur, resulting in improved durability. An excellent substrate can be provided. Furthermore, since the life of the plating bath is extended, productivity and economic efficiency are also improved.
第1図(A)ないし第1図(D)は基板の各表面処理段
階における表面粗さを表す特性図であり、第1図(A)
は処理前、第1図(B)は亜鉛置換処理1回終了後、第
1図(C)は亜鉛置換処理2回終了後、第1図(D)は
酸性溶液中に浸漬した後の基板にそれぞれ対応する。1(A) to 1(D) are characteristic diagrams showing the surface roughness at each surface treatment stage of the substrate, and FIG. 1(A)
1(B) shows the substrate before treatment, FIG. 1(B) shows the substrate after one zinc replacement treatment, FIG. 1(C) shows the substrate after two zinc replacement treatments, and FIG. 1(D) shows the substrate after being immersed in an acidic solution. correspond to each.
Claims (1)
に亜鉛置換処理を行った後、前記基板を酸性溶液中に浸
漬し、さらに無電解ニッケル−リンめっきを行うことを
特徴とする基板の表面処理方法。A method for surface treatment of a substrate, which comprises subjecting a substrate made of aluminum or an aluminum alloy to zinc substitution treatment, immersing the substrate in an acidic solution, and further performing electroless nickel-phosphorus plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14309489A JPH0310085A (en) | 1989-06-07 | 1989-06-07 | Surface treatment for substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14309489A JPH0310085A (en) | 1989-06-07 | 1989-06-07 | Surface treatment for substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0310085A true JPH0310085A (en) | 1991-01-17 |
Family
ID=15330773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14309489A Pending JPH0310085A (en) | 1989-06-07 | 1989-06-07 | Surface treatment for substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0310085A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140011686A (en) * | 2012-07-18 | 2014-01-29 | 삼성전자주식회사 | Power device and power device module |
| JP2019052327A (en) * | 2017-09-12 | 2019-04-04 | 奥野製薬工業株式会社 | Method for forming electroless nickel phosphorus plating film on aluminum-based material |
-
1989
- 1989-06-07 JP JP14309489A patent/JPH0310085A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140011686A (en) * | 2012-07-18 | 2014-01-29 | 삼성전자주식회사 | Power device and power device module |
| JP2019052327A (en) * | 2017-09-12 | 2019-04-04 | 奥野製薬工業株式会社 | Method for forming electroless nickel phosphorus plating film on aluminum-based material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4631112A (en) | Surface-treated aluminum alloy substrates for magnetic disks | |
| US4150172A (en) | Method for producing a square loop magnetic media for very high density recording | |
| JPH0310085A (en) | Surface treatment for substrate | |
| JP2001209925A (en) | Aluminum substrate for magnetic recording medium and method of manufacturing the same | |
| US3970433A (en) | Recording surface substrate | |
| JP2001073166A (en) | Aluminum alloy substrate for magnetic recording medium and method of manufacturing the same | |
| JP2005206866A (en) | Pretreatment method for electroless plating, method for producing substrate for magnetic recording medium including the method, and substrate for magnetic recording medium produced by the production method | |
| JPH0515790B2 (en) | ||
| JPH0316019A (en) | Aluminum substrate | |
| JPS6139235A (en) | Production of magnetic recording medium | |
| JPH0429739B2 (en) | ||
| JP2884598B2 (en) | Surface treatment method for magnetic disk substrate | |
| JPH0451885B2 (en) | ||
| JPH0323975B2 (en) | ||
| JP2794725B2 (en) | Manufacturing method of magnetic recording medium | |
| JPS6187221A (en) | Method for manufacturing magnetic recording material | |
| JPS6364649A (en) | Stamper manufacturing method | |
| JPS6057131B2 (en) | Manufacturing method for high recording density magnetic disks | |
| JPH04353617A (en) | Magnetic recording medium | |
| JPH0159359B2 (en) | ||
| JPS6220152A (en) | Stamper for molding optical disk and its manufacture | |
| JPS63304422A (en) | Magnetic recording medium | |
| JPS63249308A (en) | Magnetic film and manufacture thereof | |
| JPH03273526A (en) | Production of magnetic disk substrate | |
| JPS61202323A (en) | Magnetic recording medium |