JPH03104232A - Transferring method for bump electrode - Google Patents
Transferring method for bump electrodeInfo
- Publication number
- JPH03104232A JPH03104232A JP1242646A JP24264689A JPH03104232A JP H03104232 A JPH03104232 A JP H03104232A JP 1242646 A JP1242646 A JP 1242646A JP 24264689 A JP24264689 A JP 24264689A JP H03104232 A JPH03104232 A JP H03104232A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- bump electrode
- transfer
- metal terminal
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
第2の基板に形成させたバンプ電極を第1の基板に転写
させる新規方法に関し、
バンブ電極の転写に伴う第2の基板の損傷をなくすこと
を目的とし、
バンブ電極被着用金属端子の形成された第1の基板の表
面に紫外線硬化性樹脂または熱可塑性樹脂あるいは熱硬
化性樹脂の層を被着し、バンプ電極材料に対し弱密着性
である第2の基板の表面に転写用バンプ電極を形或し、
該金属端子と該転写用バンプ電極とが対向するように重
ねた該第lの基板と該第2の基板とをその対向方向に押
し付け、
該押し付けによって該樹脂層に突入した該転写用バンプ
電極を該金属端子に圧着せしめたのち該第2の基板を取
り除く、
ことを特徴とし構或する。[Detailed Description of the Invention] [Summary] Regarding a new method for transferring bump electrodes formed on a second substrate to a first substrate, the present invention aims to eliminate damage to the second substrate due to transfer of the bump electrodes. A layer of an ultraviolet curable resin, a thermoplastic resin, or a thermosetting resin is applied to the surface of the first substrate on which the metal terminal for bump electrodes is formed, and a second layer having weak adhesion to the bump electrode material is applied. forming a transfer bump electrode on the surface of the substrate,
The metal terminal and the transfer bump electrode are pressed against the first substrate and the second substrate, which are stacked so as to face each other, and the transfer bump electrode penetrates into the resin layer by the pressing. The second substrate is removed after being crimped onto the metal terminal.
本発明は、電子回路チップや絶縁基板等にバンプ電極を
転写手段で形戒させるバンプ電極の転写方法に関する。The present invention relates to a bump electrode transfer method for forming bump electrodes onto an electronic circuit chip, an insulating substrate, etc. using a transfer means.
最近の液晶表示パネルは、表示部の大画面化に加え薄形
化,軽量化,低価格化が一層強く要求されている。その
ため、該パネルに搭載されるパネル駆動回路部品のチッ
プ実装構造は、アウターリードボンディング装置を利用
するTAB (tapeautomated bon
ding)方式から、金等にてなるバンプ電極を利用す
るC O G (chip on glass)方式に
替わろうとしている。Recent liquid crystal display panels are required to be thinner, lighter, and cheaper in addition to larger display screens. Therefore, the chip mounting structure of the panel drive circuit components mounted on the panel is a TAB (tape automated boning) structure that uses an outer lead bonding device.
The COG (chip on glass) method is about to replace the COG (chip on glass) method, which uses bump electrodes made of gold or the like.
第5図は従来技術によるバンプ電極の転写方法の説明図
、第6図は第5図に示すチップの実装方法の説明図であ
る。FIG. 5 is an explanatory diagram of a method of transferring bump electrodes according to the prior art, and FIG. 6 is an explanatory diagram of a method of mounting the chip shown in FIG. 5.
第5図(イ)において、バンブ電極を形成させる電子回
路チップ(第1の基板)1の上面には、その所定部に金
をメタライズしたバンプ電極被着用金属端子2を形成さ
せる。In FIG. 5(A), on the upper surface of an electronic circuit chip (first substrate) 1 on which bump electrodes are to be formed, metal terminals 2 for bump electrodes, which are metallized with gold, are formed at predetermined portions thereof.
第5図(0において、バンプ電極材料に対し弱密着性で
ある転写用ガラス基板(第2の基板)3の表面には、端
子2に対向する金のバンプ電極4を形成させる。In FIG. 5 (0), gold bump electrodes 4 facing the terminals 2 are formed on the surface of the transfer glass substrate (second substrate) 3 which has weak adhesion to the bump electrode material.
第5図(ハ)において、チップlの上にガラス基板3を
重ね、例えば400℃程度に加熱した雰囲気中で適当な
押圧力FO、例えば50μffiI1のバンプ電極4を
100個形成させるには約3kgの押圧力F0を加える
と、バンブ電極4は拡散または共晶によって端子2に接
合される。In FIG. 5(c), in order to stack the glass substrate 3 on top of the chip l and form 100 bump electrodes 4 with an appropriate pressing force FO of, for example, 50 μffiI1 in an atmosphere heated to about 400° C., approximately 3 kg is required. When a pressing force F0 of 2 is applied, the bump electrode 4 is bonded to the terminal 2 by diffusion or eutectic.
次いで、常温に冷却したのちガラス基板3を取り除くと
第5図(二)に示す如く、ガラス基板3から剥離したバ
ンブ電極4は、チップlの端子2に転写形成される。Next, after cooling to room temperature, the glass substrate 3 is removed, and the bump electrodes 4 peeled off from the glass substrate 3 are transferred and formed on the terminals 2 of the chip 1, as shown in FIG. 5(2).
第6図(イ)において、バンプ電極4が形成されたチッ
プ1の上面に樹脂層5、例えば紫外線硬化性樹脂(UV
樹脂)層5を被着させる。In FIG. 6(A), a resin layer 5, for example, an ultraviolet curable resin (UV
A layer 5 (resin) is applied.
次いで第6図(+1)に示す如く、バンプ電極4が接合
される端子6を上面に形成した透光性絶縁基板(ガラス
基板)7は、紫外線8の透過孔9を設けたテーブル10
に固定する。テーブルIOはX−Y方向の移動および回
転(θ)可能である。Next, as shown in FIG. 6 (+1), a light-transmitting insulating substrate (glass substrate) 7 having a terminal 6 formed on its upper surface to which the bump electrode 4 is bonded is placed on a table 10 provided with a hole 9 through which ultraviolet rays 8 can pass.
Fixed to. The table IO can be moved in the X-Y direction and rotated (θ).
基板7との位置関係を正したチップ1は、バンプ電極4
が下向きであり、上下動可能なヒータープレート11に
より適当な押圧力F,で基板7に押し付ると共に、紫外
線8は基板7を通して樹脂5に照射させる。The chip 1 whose positional relationship with the substrate 7 has been corrected is the bump electrode 4
is directed downward, and is pressed against the substrate 7 with an appropriate pressing force F by a vertically movable heater plate 11, and the resin 5 is irradiated with ultraviolet rays 8 through the substrate 7.
その結果、第6図(ハ)に示す如くバンプ電極4は端子
6に接合し、接合されたバンブ電極4の周囲は硬化した
UVI{脂層5に固められるようになる。As a result, the bump electrode 4 is bonded to the terminal 6 as shown in FIG. 6(C), and the periphery of the bonded bump electrode 4 is hardened with a hardened UVI layer 5.
前述したように従来のバンプ電極の転写方法は、バンプ
電極4の転写に際して高温下で加圧する。As described above, in the conventional bump electrode transfer method, when transferring the bump electrode 4, pressure is applied at high temperature.
そのため、チップlにクラックの発生することがあり、
著しくは該クラックによってチップ1が割れるようにな
る。このような損傷チップ1の交換は極めて困難であり
、基板7と共に廃棄せざるを得ないこともある。Therefore, cracks may occur in the chip l.
Significantly, the cracks cause the chip 1 to break. It is extremely difficult to replace such a damaged chip 1, and it may be necessary to discard it together with the board 7.
本発明の目的は、バンプ電極の転写時における前記チッ
プの損傷をなくすことである。An object of the present invention is to eliminate damage to the chip during transfer of bump electrodes.
本発明はその実施例を示す第1図によれば、バンプ電極
被着用金属端子2の形成された第1の基板lの表面に紫
外線硬化性樹脂の層5を被着し、
バンプ電極材料に対し弱密着性である第2の基vi3の
表面に転写用バンブ電極4を形成し、金属端子2と転写
用バンプ電極4とが対向するように重ねた第1の基板l
と第2の基板3とをその対向方向に押し付け、
該押し付けによって樹脂層5に突入した転写用バンプ電
極4を金属端子2に圧着せしめたのち第2の基板3を取
り除く、
ことを特徴とするバンプ電極の転写方法である。According to FIG. 1 showing an embodiment of the present invention, a layer 5 of an ultraviolet curable resin is applied to the surface of a first substrate 1 on which a metal terminal 2 for applying bump electrodes is formed, and a layer 5 of an ultraviolet curable resin is applied to the bump electrode material. On the other hand, the transfer bump electrode 4 is formed on the surface of the second group vi3 which has weak adhesion, and the first substrate l is stacked so that the metal terminal 2 and the transfer bump electrode 4 face each other.
and the second substrate 3 in opposing directions, and the transfer bump electrodes 4 that have protruded into the resin layer 5 by the pressing are crimped onto the metal terminals 2, and then the second substrate 3 is removed. This is a method of transferring bump electrodes.
以上説明したように、本発明によるバンブ電極の転写方
法は、第2の基板から第1の基板にバンブ電極を転写す
るに際し、加熱する必要がないまたは従来方法の転写よ
り低温度に加熱すればよく、加圧力も従来方法のそれよ
り少なくて済む。As explained above, the bump electrode transfer method according to the present invention does not require heating or requires heating at a lower temperature than the conventional transfer method when transferring the bump electrode from the second substrate to the first substrate. In addition, the pressurizing force can be less than that of the conventional method.
そのため、バンプ電極が転写されるチップ等の第2の基
板は、バンプ電極の転写に際し損傷されないようになる
。Therefore, the second substrate such as a chip onto which the bump electrodes are transferred is not damaged during the transfer of the bump electrodes.
以下に、図面を用いて本発明の実施例を説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第1図は本発明方法の一実施例によるバンプ電極転写方
法の主要工程の説明図、第2図は第1図に示すチップの
実装方法の説明図、第3図は本発明方法の他の実施例に
よるバンブ電極転写方法の主要工程の説明図、第4図は
第3図に示すチップの実装方法の説明図である。第1図
〜第4図において、前出図と共通部分には同一符号を使
用する。FIG. 1 is an explanatory diagram of the main steps of a bump electrode transfer method according to an embodiment of the method of the present invention, FIG. 2 is an explanatory diagram of the chip mounting method shown in FIG. 1, and FIG. 3 is an explanatory diagram of another method of the present invention. FIG. 4 is an explanatory diagram of the main steps of the bump electrode transfer method according to the embodiment, and FIG. 4 is an explanatory diagram of the chip mounting method shown in FIG. 3. In FIGS. 1 to 4, the same reference numerals are used for parts common to those in the previous figures.
第1図(イ)において、バンプ電極を形成させる電子回
路チップ(第1の基板)lの上面には、その所定部に金
をメタライズしたバンプ電極被着用金属端子2を形成し
、紫外線硬化性樹脂(UV樹脂)層5を塗布させる。In FIG. 1(a), on the upper surface of an electronic circuit chip (first substrate) l on which bump electrodes are to be formed, metal terminals 2 for attaching bump electrodes metallized with gold are formed on predetermined portions of the electronic circuit chip (first substrate) l on which bump electrodes are to be formed. A resin (UV resin) layer 5 is applied.
第1図(0)において、バンプ電極材料に対し弱密着性
である転写用ガラス基板(第2の基板)3の表面には、
端子2に対向する金のバンプ電極4を形成させる。In FIG. 1(0), on the surface of the transfer glass substrate (second substrate) 3, which has weak adhesion to the bump electrode material,
A gold bump electrode 4 facing the terminal 2 is formed.
第1図(ハ)において、チップlの上にバンプ電極4が
下向きのガラス基仮3を重ね、室温または例えば200
℃程度に加熱した状態で適当な押圧力F’、例えば50
μ− +1のバンプ電極4を100個形成させるには約
1kgの押圧力F!で押し付ける。In FIG. 1(c), a glass substrate 3 with bump electrodes 4 facing downward is placed on top of the chip l, and
Appropriate pressing force F', for example 50°C,
To form 100 bump electrodes 4 of μ- +1, a pressing force F of approximately 1 kg is required! Press it with
すると、第1図(二)に示す如く樹脂層5内に押し込め
られた各バンプ電極4は、その先端部と端子2との圧着
力および、バンプ電極4と樹脂層5との密着力によって
チップlに接合されるようになる。Then, as shown in FIG. 1 (2), each bump electrode 4 pushed into the resin layer 5 is formed into a chip by the pressure force between its tip and the terminal 2 and the adhesion force between the bump electrode 4 and the resin layer 5. It comes to be joined to l.
そこで、ガラス基仮3を取り除くとバンプ電極4は、ガ
ラス基板3より剥離して第1図(ネ〉に示す如く、樹脂
層5に埋入された状態でチップlの上に残されるように
なる.
第2図(イ)において、バンプ電極接続用端子6を上面
に形成した透光性絶縁基板(ガラス基vi)7は、紫外
線8の透過孔9を設けたテーブル10に固定する。基仮
7との位置関係を正したチップ1は、バンプ電極4が下
向きであり、上下動可能なヒータープレート11により
適当な押圧力F,で基板7に押し付ると共に、基板7を
通して樹脂層5に紫外線8を照射させる。Therefore, when the glass substrate 3 is removed, the bump electrodes 4 are peeled off from the glass substrate 3 and remain embedded in the resin layer 5 on the chip 1, as shown in FIG. In FIG. 2(a), a translucent insulating substrate (glass substrate vi) 7 on which a bump electrode connection terminal 6 is formed is fixed to a table 10 provided with a hole 9 for transmitting ultraviolet rays 8. The chip 1, whose positional relationship with the temporary 7 is corrected, has the bump electrodes 4 facing downward, is pressed against the substrate 7 with an appropriate pressing force F by the vertically movable heater plate 11, and is pressed against the resin layer 5 through the substrate 7. is irradiated with ultraviolet rays 8.
その結果、第2図([F)に示す如くバンプ電極4は端
子6に接合し、接合されたバンプ電極4はその周囲を硬
化したUV樹脂層5で固められ、チップ1の実装が完了
する。As a result, the bump electrodes 4 are bonded to the terminals 6 as shown in FIG. .
第3図(イ)において、バンブ電極を形成させる電子回
路チップ(第1の基板)■の上面には、その所定部に金
をメタライズしたバンプ電極被着用金属端子2を形成し
、熱可塑性樹脂または熱硬化性樹脂の層12を被着させ
る。In FIG. 3 (A), on the upper surface of the electronic circuit chip (first substrate) ■ on which the bump electrodes are to be formed, metal terminals 2 for bump electrodes are formed with gold metallized on the upper surface of the electronic circuit chip (first substrate) ■, which is made of thermoplastic resin. Alternatively, a layer 12 of thermosetting resin is applied.
第3図(0)において、バンブ電極材料に対し弱密着性
である転写用ガラス基板(第2の基板)3の表面には、
端子2に対向する金のバンブ電極4を形戒させる。In FIG. 3(0), on the surface of the transfer glass substrate (second substrate) 3, which has weak adhesion to the bump electrode material,
The gold bump electrode 4 facing the terminal 2 is shaped.
第3図(ハ)において、チップlの上にバンプ電極4が
下向きのガラス基板3を重ね、室温または例えば200
゜C程度に加熱した状態で適当な押圧力F!、例えばS
Oμ− I1のバンプ電極4を100個形成させるには
約1kgの押圧力F2で押し付ける。In FIG. 3(c), the glass substrate 3 with the bump electrodes 4 facing downward is placed on top of the chip l, and
Appropriate pressing force F when heated to around °C! , for example S
In order to form 100 bump electrodes 4 of Oμ-I1, pressing is performed with a pressing force F2 of about 1 kg.
すると、第3図(二)に示す如く樹脂層l2内に押し込
められた各バンプ電極4は、その先端部と端子2との圧
着力および、バンブ電極4と樹脂層l2との密着力によ
ってチンプ1に接合されるようになる。Then, as shown in FIG. 3(2), each bump electrode 4 pushed into the resin layer 12 is chipped due to the pressure force between its tip and the terminal 2 and the adhesion force between the bump electrode 4 and the resin layer 12. 1.
そこで、ガラス基板3を取り除くとバンプ電極4は、ガ
ラス基板3より剥離して第3図(ネ)に示す如く、樹脂
層l2に埋入された状態でチップlの上に残されるよう
になる。Therefore, when the glass substrate 3 is removed, the bump electrodes 4 are separated from the glass substrate 3 and are left on the chip l embedded in the resin layer l2, as shown in FIG. 3(N). .
第4図(イ)において、バンプ電極接続用端子6を上面
に形成した透光性絶縁基板(ガラス基板)7は、テーブ
ルl3の上面に固定する。基板7との位置関係を正した
チップ1は、バンブ電極4が下向きであり、上下動可能
なヒータープレーHlにより適当な押圧力F+ で基仮
7に押し付るようにする。In FIG. 4(A), a translucent insulating substrate (glass substrate) 7 having bump electrode connection terminals 6 formed on its upper surface is fixed to the upper surface of a table 13. The chip 1, whose positional relationship with the substrate 7 has been corrected, has the bump electrode 4 facing downward, and is pressed against the base 7 with an appropriate pressing force F+ by the vertically movable heater plate H1.
その結果、第4図(t!)に示す如くバンプ電極4は端
子6に接合し、接合されたバンプ電極4はバンプ電極4
と共に加熱され硬化した樹脂層l2で固められ、チップ
1の実装が完了する。As a result, the bump electrode 4 is joined to the terminal 6 as shown in FIG. 4 (t!), and the joined bump electrode 4 is connected to the bump electrode 4.
At the same time, the chip 1 is solidified with a heated and hardened resin layer l2, and the mounting of the chip 1 is completed.
なお、前記実施例は液晶表示パネルに係わるが、本発明
は半導体装置等について広く利用可能である。Note that although the above embodiments relate to liquid crystal display panels, the present invention can be widely used in semiconductor devices and the like.
以上説明したように本発明方法によれば、第2の基板か
ら第1の基板にバンプ電極を転写するに際し、加熱する
必要がないまたは従来方法の転写より低温度に加熱すれ
ばよく、加圧力も従来方法のそれより少なくて済むため
、バンプ電極を転写すべきチップ等の第2の基板は、バ
ンブ電極の転写に際し損傷されないようになる。As explained above, according to the method of the present invention, when transferring bump electrodes from the second substrate to the first substrate, there is no need to heat or it is only necessary to heat the bump electrodes to a lower temperature than in the conventional transfer method. Since the second substrate, such as a chip, to which the bump electrodes are to be transferred is not damaged during the transfer of the bump electrodes, the second substrate, such as a chip, is not damaged during the transfer of the bump electrodes.
第l図は本発明方法の一実施例における主要工程の説明
図、
第2図は第1図に示すチップの実装方法の説明図、
第3図は本発明方法の他の実施例における主要工程の説
明図、
第4図は第3図に示すチ・冫プの実装方法の説明図、
第5図は従来技術によるバンプ電極の転写方法の説明図
、
第6図は第5図に示すチップの実装方法の説明図、
である。
図中において、
1はチップ(第1の基板)、
2はバンプ電極被着用金属端子、
3はガラス基板(第2の基板)、
4はバンブ電極、
5は紫外線硬化性樹脂層、
12は熱可塑性または熱硬化性樹脂層、を示す。
不発明矛ユ六の一実雄中11二方1アリ主電工程の説a
fJ旧第 1 図
第1図に示1+7フ゛f)実裳方冫六〇説ap旧第 2
図
オもたaft万!云のイ亡の実鉗争11二Bけう主倭工
種の書紀θ月図番 3 図
(イノ
(ロノ
第3口1;示ず斗−,7’/)実供お式の意茫明閏(ハ
)
(二2
第5閏に示イ千t7の実裟ij六0説af4図第 b
棟Fig. 1 is an explanatory diagram of the main steps in one embodiment of the method of the present invention, Fig. 2 is an explanatory diagram of the chip mounting method shown in Fig. 1, and Fig. 3 is an explanatory diagram of the main steps in another embodiment of the method of the present invention. FIG. 4 is an explanatory diagram of the method for mounting the chip shown in FIG. 3. FIG. 5 is an explanatory diagram of the method of transferring bump electrodes according to the prior art. This is an explanatory diagram of the implementation method. In the figure, 1 is a chip (first substrate), 2 is a metal terminal to which a bump electrode is attached, 3 is a glass substrate (second substrate), 4 is a bump electrode, 5 is an ultraviolet curable resin layer, and 12 is a heat Indicates a plastic or thermosetting resin layer. Theory of the main electrical process of 11, 2, 1, and 1 of 6 uninvented spears a
f.
Figure omota aft million! 112 B. The Shoki of the Master of Japanese Crafts, θ Month Figure No. 3 (Ino (Rono 3rd entry 1; Showed to, 7'/) The meaning of the actual ceremony of the offering ceremony Leap (c) (22 The fruit of 1,000 t7 shown in the 5th leap ij 60 theory af 4 figure b
ridge
Claims (1)
板(1)の表面に紫外線硬化性樹脂または熱可塑性樹脂
あるいは熱硬化性樹脂の層(5、12)を被着し、 バンプ電極材料に対し弱密着性である第2の基板(3)
の表面に転写用バンプ電極(4)を形成し、該金属端子
(2)と該転写用バンプ電極(4)とが対向するように
重ねた該第1の基板(1)と該第2の基板(3)とをそ
の対向方向に押し付け、該押し付けによって該樹脂層(
5、12)に突入した該転写用バンプ電極(4)を該金
属端子(2)に圧着せしめたのち該第2の基板(3)を
取り除く、ことを特徴とするバンプ電極の転写方法。[Claims] A layer (5, 12) of an ultraviolet curable resin, a thermoplastic resin, or a thermosetting resin is applied to the surface of the first substrate (1) on which the metal terminal (2) for attaching the bump electrode is formed. a second substrate (3) to which the bump electrode material is adhered and has weak adhesion to the bump electrode material;
A transfer bump electrode (4) is formed on the surface of the first substrate (1) and the second substrate, which are stacked so that the metal terminal (2) and the transfer bump electrode (4) face each other. The substrate (3) is pressed in the opposite direction, and the pressing causes the resin layer (
5, 12) A method for transferring a bump electrode, characterized in that the second substrate (3) is removed after the transfer bump electrode (4) inserted into the metal terminal (2) is crimped onto the metal terminal (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1242646A JPH03104232A (en) | 1989-09-19 | 1989-09-19 | Transferring method for bump electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1242646A JPH03104232A (en) | 1989-09-19 | 1989-09-19 | Transferring method for bump electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03104232A true JPH03104232A (en) | 1991-05-01 |
Family
ID=17092144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1242646A Pending JPH03104232A (en) | 1989-09-19 | 1989-09-19 | Transferring method for bump electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03104232A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5456003A (en) * | 1992-06-18 | 1995-10-10 | Matsushita Electric Industrial Co., Ltd. | Method for packaging a semiconductor device having projected electrodes |
-
1989
- 1989-09-19 JP JP1242646A patent/JPH03104232A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5456003A (en) * | 1992-06-18 | 1995-10-10 | Matsushita Electric Industrial Co., Ltd. | Method for packaging a semiconductor device having projected electrodes |
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