JPH03146682A - Production of floating magnetic head - Google Patents
Production of floating magnetic headInfo
- Publication number
- JPH03146682A JPH03146682A JP28153389A JP28153389A JPH03146682A JP H03146682 A JPH03146682 A JP H03146682A JP 28153389 A JP28153389 A JP 28153389A JP 28153389 A JP28153389 A JP 28153389A JP H03146682 A JPH03146682 A JP H03146682A
- Authority
- JP
- Japan
- Prior art keywords
- slider
- magnetic head
- magnetic disk
- floating
- floating magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007667 floating Methods 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 229910000859 α-Fe Inorganic materials 0.000 claims abstract description 17
- 238000001020 plasma etching Methods 0.000 claims abstract description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 7
- 239000001301 oxygen Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 13
- 230000001376 precipitating effect Effects 0.000 claims description 6
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 description 15
- 238000005530 etching Methods 0.000 description 14
- 238000000992 sputter etching Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241001422033 Thestylus Species 0.000 description 1
- -1 and at least Ar Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、固定磁気ディスク装置に用いられる浮動磁気
ヘッドに係わり、特に磁気ディスクの回転に伴って磁気
ディスクから浮上し、回転停止にともなって磁気ディス
クと接触するスライダ部の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a floating magnetic head used in a fixed magnetic disk device, and in particular, the floating magnetic head floats away from the magnetic disk as the magnetic disk rotates, and when the rotation stops. The present invention relates to a method of manufacturing a slider portion that comes into contact with a magnetic disk.
［従来技術］
近年、固定磁気ディスク装置に対する小型大容量化の要
請が強まるにつれ、磁気ディスクの径が小型化されると
共に、磁気ディスクの回転数を小さく〜して記録波長を
短くした高密度磁気記録再生が広く行なわれている。高
密度磁気記録再生を十分行なうためには、高い保持力の
記録媒体からなる磁気ディスクと磁気ギャップ長の小さ
な浮動磁気ヘッドが必要であり、また、使用に際しては
スペーンングロスをできるだけ小さくするために、磁気
ギャップが形成されたスライダ面を磁気ディスクからあ
まり浮上させないことが必要となる。[Prior art] In recent years, as the demand for smaller and larger capacity fixed magnetic disk devices has increased, the diameter of magnetic disks has been reduced, and high-density magnetic Recording and reproduction are widely practiced. In order to sufficiently perform high-density magnetic recording and reproducing, a magnetic disk made of a recording medium with high coercive force and a floating magnetic head with a small magnetic gap length are required. It is necessary to prevent the slider surface on which the gap is formed from floating too much above the magnetic disk.
磁気ヘッドが磁気ディスクから浮上する高さ、即ち浮上
量は、磁気ヘッド及び磁気ディスクの表面状態や装置の
押圧ばねの性能等により定まるが、最近ではこの値は０
．２μｍあるいはそれ以下の値に抑えられている。The height at which the magnetic head flies above the magnetic disk, that is, the flying height, is determined by the surface conditions of the magnetic head and magnetic disk, the performance of the device's pressure spring, etc., but recently this value has been reduced to 0.
．． The value is suppressed to 2 μm or less.
また、浮動磁気ヘッドのスライダ面と接触を繰り返す磁
気ディスクの表面は極めて薄い薄膜状の磁気媒体からで
きているため、その耐久性に何らかの対策を講じる必要
がある。従来の磁気ディスクにおいては、磁気ディスク
媒体の上にＳ ｉＯ２、Ｃ「などの保護膜を成膜し、さ
らに潤滑油を塗布したり、カーボン膜などの潤滑性を有
する保護膜を成膜はるなどして耐久性を持たせていたが
、スライダ面と磁気ディスクとは磁気ディスクの回転・
停止に伴って接触回転するため、これらの数十程度の保
護潤滑膜は磨耗消滅してしまうという問題点があった。Furthermore, since the surface of the magnetic disk, which repeatedly comes into contact with the slider surface of the floating magnetic head, is made of an extremely thin film-like magnetic medium, it is necessary to take some measures to ensure its durability. In conventional magnetic disks, a protective film such as SiO2 or C is formed on the magnetic disk medium, and then lubricating oil is applied or a protective film with lubricating properties such as a carbon film is formed. However, the slider surface and magnetic disk are connected to each other by the rotation of the magnetic disk.
Since contact rotation occurs when the motor stops, there is a problem in that the several dozen protective lubricant films are worn away.
また、従来の多結晶フェライトを用いた浮動磁気ヘッド
のスライダ面は、ラップ加工により滑らかな地肌に仕上
げられ、しかも、硬度の低い加工変質層が表面に露出し
ているため、使用に際して、磁気ディスクとスライダ面
の間に液体潤滑剤や雰囲気中の水蒸気が介在すると吸着
を生じ摩擦係数が大となる傾向があった。In addition, the slider surface of a conventional floating magnetic head using polycrystalline ferrite is finished with a smooth surface by lapping, and a degraded layer with low hardness is exposed on the surface. When liquid lubricant or water vapor in the atmosphere is present between the slider surface and the slider surface, adsorption tends to occur and the coefficient of friction tends to increase.
摩擦係数の大きなスライダ面と磁気ディスクとの接触回
転により磨耗が生じると、塵などの発生を招くと共に、
スライダ面と磁気ディスクとの密着度が増し、実効接触
面積が増加する結果、吸着力の増加や摩擦係数の増加を
招き、磁気ディスクの磨耗は増大し、耐久性を著しく弱
めることになるなどの問題があった。When wear occurs due to contact rotation between the slider surface, which has a large coefficient of friction, and the magnetic disk, it not only causes the generation of dust, etc.
The degree of close contact between the slider surface and the magnetic disk increases, resulting in an increase in the effective contact area, which results in an increase in adsorption force and an increase in the coefficient of friction, which increases wear on the magnetic disk and significantly weakens its durability. There was a problem.
そこで上記の問題点を解決するために、スライダ部を粒
界を析出した多結晶フェライト材で構成する浮動磁気ヘ
ッドが考案されており（特願昭６２−２９１５２０ ）
、この構成によって、スライダ面と磁気ディスク面と
の実効接触面積を小さくすることができ、両者間の摩擦
係数及び吸着力を低減し、磨耗を減らして磁気ディスク
装置の耐久性を向上させることができた。そして、前記
スライダ部を（を成する多結晶フェライト材の粒界を析
出させる方法として、従来、イオンミリングが適用され
てきた。イオンミリングによるエツチングは、湿式エツ
チングに比べ、浮動磁気ヘッドの多結晶フェライト材以
外の構成部に与える影響が少なく、しかもエツチング速
度の大きい方法である。In order to solve the above problems, a floating magnetic head was devised in which the slider part was made of polycrystalline ferrite material with precipitated grain boundaries (Japanese Patent Application No. 62-291520).
With this configuration, it is possible to reduce the effective contact area between the slider surface and the magnetic disk surface, reduce the friction coefficient and adsorption force between the two, reduce wear, and improve the durability of the magnetic disk device. did it. Conventionally, ion milling has been applied as a method to precipitate the grain boundaries of the polycrystalline ferrite material that forms the slider section. Etching by ion milling is more effective than wet etching for the polycrystalline material of the floating magnetic head. This method has little effect on components other than the ferrite material and has a high etching rate.
以下、Ａカ１定データの一例を参照して従来のイオンミ
リングによる多結晶フェライト材の粒界の析出について
説明する。Hereinafter, precipitation of grain boundaries in a polycrystalline ferrite material by conventional ion milling will be explained with reference to an example of A constant data.
第７図は、浮動磁気ヘッドのスライダ面をラップした後
、その表面状態を触針式微小形状測定器（ＤＥＫＴＡＫ
３０３０．５ＬＯＡＮ社製）により測定した結果である
。同図で、横軸は表面に沿って触針が移動した距離即ち
測定範囲を、縦軸は表面の凹凸の大きさを示している。Figure 7 shows the surface condition of the floating magnetic head after being lapped using a stylus-type micro-shape measuring device (DEKTAK).
3030.5 (manufactured by LOAN). In the figure, the horizontal axis shows the distance traveled by the stylus along the surface, that is, the measurement range, and the vertical axis shows the size of the unevenness on the surface.
同図かられかるように、ラップ後のスライダ面には、表
面粗さだけで粒界による段差は見られない。第６図は、
ラップ後のスライダ面をイオンミリングで処理し、その
表面形状をΔｐ１定した結果である。第６図及び第７図
から、イオンミリングによって、スライダ面に１００〜
１５０の段差が現れ、結晶粒界が析出していることがわ
かる。As can be seen from the figure, the slider surface after lapping shows only surface roughness and no steps due to grain boundaries. Figure 6 shows
The slider surface after lapping was processed by ion milling, and the surface shape was determined by Δp1. From Fig. 6 and Fig. 7, it can be seen that 100~
A step difference of 150 mm appears, indicating that grain boundaries have precipitated.
［発明が解決しようとする課題］
上記したように、磁気ディスクの回転に伴って磁気ディ
スクから浮上し、回転停止に伴って磁気ディスクと接触
するスライダ部を有する浮動磁気ヘッドの製造工程にお
いて、前記スライダ部を構成する多結晶フェライト材に
粒界を析出させる方法として、イオンミリングが適用さ
れており、多結晶フェライト材の粒界を有効に析出させ
ている。[Problems to be Solved by the Invention] As described above, in the manufacturing process of a floating magnetic head having a slider portion that levitates from the magnetic disk as the magnetic disk rotates and comes into contact with the magnetic disk when the rotation stops, Ion milling is applied as a method for precipitating grain boundaries in the polycrystalline ferrite material that constitutes the slider portion, and effectively precipitates the grain boundaries in the polycrystalline ferrite material.
しかし、イオンミリング装置は構造が複雑で高価である
ばかりでなく、−度に処理できる数量が少ないことなど
により製造コストを押し上げ、良質ではあるが、安価な
浮動磁気ヘッドの供給を困難にしていた。However, ion milling equipment not only has a complex structure and is expensive, but also can only process small quantities at a time, which increases manufacturing costs and makes it difficult to supply high-quality but inexpensive floating magnetic heads. .
一方、上記の課題を解決するために、従来から、前記ス
ライダ部を構成する多結晶フェライト材に粒界を析出さ
せる方法としてプラズマエツチングの可能性が指摘され
てはいたが、何ら具体的な技術の公開はなく、あくまで
推測の範囲に留まっていた。On the other hand, in order to solve the above-mentioned problems, the possibility of plasma etching has been pointed out as a method of precipitating grain boundaries in the polycrystalline ferrite material that constitutes the slider part, but no specific technology has been developed. It has not been made public and remains only speculation.
［課題を解決するための手段］
本発明は上記問題点を解決するためになされたものであ
り、磁気ディスクの回転に伴って磁気ディスクから浮上
し、回転停止に伴って磁気ディスクと接触するスライダ
部を有する浮動磁気ヘッドの製造工程において、前記ス
ライダ部を構成する多結晶フェライト材に粒界を析出さ
せる方法として、Ａ「プラズマによるプラズマエツチン
グ、あねいは酸素プラズマによるプラズマエツチング、
あるいはＣＦ４プラズマによるプラズマエツチングを特
徴とする製造方法を提供しようとするものである。[Means for Solving the Problems] The present invention has been made to solve the above problems, and provides a slider that rises above the magnetic disk as the magnetic disk rotates and comes into contact with the magnetic disk when the rotation stops. In the manufacturing process of a floating magnetic head having a part, a method for precipitating grain boundaries in the polycrystalline ferrite material constituting the slider part is A "plasma etching using plasma, or plasma etching using oxygen plasma,"
Alternatively, it is an attempt to provide a manufacturing method characterized by plasma etching using CF4 plasma.
［実施例］
第１図は本発明の製造方法により作製した浮動磁気ヘッ
ド１０の斜視図であり、以下同図を用いて説明する。１
１は多結晶フェライトからなるスライダ部であり、スラ
イダ面１１ａの略中央部には平行な一対の逃げ溝１１ｂ
が形成され、溝１１ｂに挾まれてセンターレールｌｌｃ
が設けられている。１２は多結晶フェライトからなる磁
気コア半休であり、突き合わせ面に形成された巻き線窓
１３を通してコイル１４が巻かれ、スライダ部１１を他
の磁気コア半休となる如く、センターレールｌｌｃの端
面に突き合わされ、磁気ヘッド部を形成している。[Example] FIG. 1 is a perspective view of a floating magnetic head 10 manufactured by the manufacturing method of the present invention, and the following description will be made using the same figure. 1
Reference numeral 1 denotes a slider portion made of polycrystalline ferrite, and a pair of parallel escape grooves 11b are provided approximately at the center of the slider surface 11a.
is formed and sandwiched between the grooves 11b and the center rail llc
is provided. 12 is a half magnetic core made of polycrystalline ferrite, a coil 14 is wound through a winding window 13 formed on the abutting surface, and the slider part 11 is pushed against the end face of the center rail LLC like the other half half of the magnetic core. Together, they form a magnetic head section.
浮動磁気ヘッド１０のスライダ面１１ａを研磨機によっ
てラップした。後、さらにこのスライダ面１１ａにプラ
ズマエツチングを施してスライダ面１１ａ上に多結晶粒
界を析出させた。The slider surface 11a of the floating magnetic head 10 was lapped using a polisher. Thereafter, this slider surface 11a was further subjected to plasma etching to precipitate polycrystalline grain boundaries on the slider surface 11a.
第２図は本発明方法を適用した平行平板型のエツチング
装置２０の原理的略図である。図中２１はエツチング室
、２２は電極、２３はガス導入口、２４゛は排気口、２
５は電極２２に載置された浮動磁気ヘッド、２６は高周
波電源、２７は電圧計である。この装置自体は、通常の
プラズマエツチング方法を適用する装置と何等異なると
ころはなく、安価で大量に処理できるという特長を備え
ていることは言うまでもない。FIG. 2 is a schematic diagram of the principle of a parallel plate type etching apparatus 20 to which the method of the present invention is applied. In the figure, 21 is an etching chamber, 22 is an electrode, 23 is a gas inlet, 24 is an exhaust port, 2
5 is a floating magnetic head placed on the electrode 22, 26 is a high frequency power source, and 27 is a voltmeter. This apparatus itself is no different from an apparatus that applies a normal plasma etching method, and it goes without saying that it has the advantage of being inexpensive and capable of processing in large quantities.
略々このように構成されたエツチング装置において、排
気口２４から真空ポンプ（図示せず）で排気しながらエ
ツチング室２１ヘガス導入口２３より特定のガスを導入
し、エツチング室２１を所定の真空度に保つ。この状態
で高周波電源２６により電極２２に１３．５１３ＭＨｚ
の高周波電圧を印加してエツチング室２１内にプラズマ
を発生させ、ワークとしての浮動磁気ヘッド２５にエツ
チングを施した。In the etching apparatus configured as described above, a specific gas is introduced into the etching chamber 21 from the gas inlet 23 while being evacuated from the exhaust port 24 with a vacuum pump (not shown), and the etching chamber 21 is brought to a predetermined degree of vacuum. Keep it. In this state, a frequency of 13.513 MHz is applied to the electrode 22 by the high frequency power supply 26.
Plasma was generated in the etching chamber 21 by applying a high frequency voltage of 1, and the floating magnetic head 25 as a workpiece was etched.
エツチングした後のスライダ面１１ａの表面形状は前記
の触針式微小形状測定器を用いて測定し、その結果を示
す図の縦軸及び横軸は第６図あるいは第７図と同一のも
のとした。The surface shape of the slider surface 11a after etching was measured using the stylus-type micro-shape measuring device, and the vertical and horizontal axes of the figures showing the results are the same as those in FIG. 6 or 7. did.
実施例１
前記特定ガスとしてＡｒを用いた本発明方法により、浮
動磁気ヘッドにエツチングを施した場合のスライダ面の
表面形状の測定結果を第３図に示す。同図から、結晶粒
界の析出により、表面に１００〜１５０ の段差が生じ
ていることがわかる。本例のプラズマエツチングにおい
て、印加した高周波電力は３００Ｗ、Ａｒガス圧は１０
ｔａ Ｔｏ ｒ−ｒに設定して行なった。Example 1 FIG. 3 shows the measurement results of the surface shape of the slider surface when a floating magnetic head was etched by the method of the present invention using Ar as the specific gas. From the same figure, it can be seen that a step difference of 100 to 150 degrees occurs on the surface due to the precipitation of grain boundaries. In the plasma etching of this example, the applied high frequency power was 300 W, and the Ar gas pressure was 10
The test was conducted with the settings set to taTorr.
実施例２
前記特定ガスとして酸素を用いた本発明方法により、浮
動磁気ヘッドにエツチングを施した場合のスライダ面の
表面形状の測定結果を第４図に示す。同図から、結晶粒
界の析出により、表面に１００１１５０ の段差が生じ
ていることがわかる。本例のプラズマ某ツチングにおい
て、印加した高周波電力は３００ＷＳＡｒガス圧は５０
ｍＴｏｒｒに設定して行なった。Example 2 FIG. 4 shows the measurement results of the surface shape of the slider surface when a floating magnetic head was etched by the method of the present invention using oxygen as the specific gas. From the same figure, it can be seen that a step difference of 1001150 mm is generated on the surface due to the precipitation of grain boundaries. In a certain plasma cutting in this example, the applied high frequency power was 300, and the WSAr gas pressure was 50.
It was set to mTorr.
実施例３
前記特定ガスとしてＣＦ４を用いた本発明方法により、
浮動磁気ヘッドにエツチングを施した場合の゛スライダ
面の表面形状の測定結果を第５図に示す。同図から、結
晶粒界の析出により、表面に、１００〜１５０ の段差
が生じていることがわかる。本例のプラズマエツチング
において、印加した高周波電力は３００ＷＳＡｒガス圧
は１００ｍＴｏｒｒに設定して行なった。Example 3 By the method of the present invention using CF4 as the specific gas,
FIG. 5 shows the measurement results of the surface shape of the slider surface when the floating magnetic head was etched. From the same figure, it can be seen that a step difference of 100 to 150 degrees is generated on the surface due to the precipitation of grain boundaries. In the plasma etching of this example, the applied high frequency power was set at 300WSAr gas pressure at 100 mTorr.
以上のように、上記実施例１，２．３のいづれにおいて
も、スライダ面には結晶粒界の析出により１００〜１５
０ の段差が生じており、このことから硬度の高い凸部
が形成されたことがわかる。As described above, in both Examples 1 and 2.3, the slider surface has 100 to 15
A level difference of 0.0 mm was observed, which indicates that a convex portion with high hardness was formed.
上記実施例１，２．３に示したプラズマエ・ノチングに
おいては、特定ガスとして各々Ａｒ、酸素、ＣＦ４−を
単独で使用したが、必ずしも単独ガスに限ることはなく
、少なくともＡｒ、酸素、ＣＦ４のいづれかを含む混合
ガスを使用することができる。また、本発明の適用に当
たっては平行平板型のエツチング装置を用いたが、エツ
チング装置もこれに限らず、例えば円筒型エツチング装
置などプラズマエツチングが可能ないかなる装置にも適
用し得ることは言うまでもない。In the plasma etching shown in Examples 1 and 2.3 above, Ar, oxygen, and CF4- were used alone as specific gases, but it is not necessarily limited to a single gas, and at least Ar, oxygen, and CF4- are used. A gas mixture containing either of these can be used. Further, in applying the present invention, a parallel plate type etching apparatus is used, but the etching apparatus is not limited to this, and it goes without saying that the present invention can be applied to any apparatus capable of plasma etching, such as a cylindrical type etching apparatus.
［発明の効果コ
以上、詳細に説明したところから明らかなように、本発
明になる浮動磁気ヘッドの製造方法によれば、磁気ディ
スクの回転に伴って磁気ディスクから浮上し、回転停止
に伴って磁気ディスクと接触するスライダ部を有する浮
動磁気ヘッドの製造工程において、Ａｒプラズマ、ある
いは酸素プラズマ、あるいはＣＦ４プラズマによるプラ
ズマエツチングにより、前記スライダ部を構成する多結
晶フェライト材に容易に粒界を析出させることができる
。しかも、安価な装置で大量に処理できるため、本製造
方法は実用上極めて優れた特長を有するものである。[Effects of the Invention] As is clear from the above detailed explanation, according to the method for manufacturing a floating magnetic head according to the present invention, the floating magnetic head levitates from the magnetic disk as the magnetic disk rotates, and when the rotation stops, In the manufacturing process of a floating magnetic head having a slider portion that contacts a magnetic disk, grain boundaries are easily precipitated in the polycrystalline ferrite material constituting the slider portion by plasma etching using Ar plasma, oxygen plasma, or CF4 plasma. be able to. Moreover, this manufacturing method has an extremely excellent feature in practical use because it can be processed in large quantities using inexpensive equipment.
第１図は本発明になる製造方法により作製した浮動磁気
ヘッドの斜視図、第２図は本発明になる製造方法を適用
した平行平板型のエツチング装置の原理的略図、第３図
はＡｒガスを用いた本発明方法により作製した浮動磁気
ヘッドのスライダ面形状を示すグラフ、第４図は酸素ガ
スを用いた本発明方法により作製した浮動磁気ヘッドの
スライダ面形状を示すグラフ、第５図はＣＦ４ガスを用
いた本発明方法により作製した浮動磁気ヘッドのスライ
ダ面形状を示すグラフ、第６図は従来の製造方法により
作製した浮動磁気ヘッドのスライダ面形状を示すグラフ
、第７図はラップ加工後の浮動磁気ヘッドのスライダ面
形状を示すグラフである。
１０・・・本発明の浮動磁気ヘッド、
１１・・・スライダ部、ｌｌａ・・・スライダ面、２０
・・・プラズマエツチング装置、２２・・・電極、２３
・・・ガス導入口、
２５・・・ワークとしての浮動磁気ヘッド、２６・・・
高周波電源。FIG. 1 is a perspective view of a floating magnetic head manufactured by the manufacturing method of the present invention, FIG. 2 is a schematic diagram of the principle of a parallel plate type etching apparatus to which the manufacturing method of the present invention is applied, and FIG. 3 is an Ar gas etching device. 4 is a graph showing the slider surface shape of a floating magnetic head manufactured by the method of the present invention using oxygen gas. FIG. 5 is a graph showing the slider surface shape of a floating magnetic head manufactured by the method of the present invention using oxygen gas. A graph showing the slider surface shape of a floating magnetic head manufactured by the method of the present invention using CF4 gas. FIG. 6 is a graph showing the slider surface shape of a floating magnetic head manufactured by the conventional manufacturing method. FIG. 7 is a graph showing the slider surface shape of a floating magnetic head manufactured by the conventional manufacturing method. 7 is a graph showing the shape of the slider surface of the subsequent floating magnetic head. DESCRIPTION OF SYMBOLS 10... Floating magnetic head of the present invention, 11... Slider part, lla... Slider surface, 20
... plasma etching device, 22 ... electrode, 23
...Gas inlet, 25...Floating magnetic head as a workpiece, 26...
High frequency power supply.
Claims (3)
し、回転停止に伴って磁気ディスクと接触するスライダ
部を有する浮動磁気ヘッドにおいて、前記スライダ部を
構成する多結晶フェライト材の粒界を析出させるに当た
り、Ａｒプラズマによるプラズマエッチングを適用する
ことを特徴とする浮動磁気ヘッドの製造方法。1. In a floating magnetic head having a slider portion that levitates from the magnetic disk as the magnetic disk rotates and comes into contact with the magnetic disk when the rotation stops, in precipitating grain boundaries of a polycrystalline ferrite material constituting the slider portion, A method for manufacturing a floating magnetic head, characterized in that plasma etching using Ar plasma is applied.
し、回転停止に伴って磁気ディスクと接触するスライダ
部を有する浮動磁気ヘッドにおいて、前記スライダ部を
構成する多結晶フェライト材の粒界を析出させるに当た
り、酸素プラズマによるプラズマエッチングを適用する
ことを特徴とする浮動磁気ヘッドの製造方法。2. In a floating magnetic head having a slider portion that levitates from the magnetic disk as the magnetic disk rotates and comes into contact with the magnetic disk when the rotation stops, in precipitating grain boundaries of a polycrystalline ferrite material constituting the slider portion, A method of manufacturing a floating magnetic head characterized by applying plasma etching using oxygen plasma.
し、回転停止に伴って磁気ディスクと接触するスライダ
部を有する浮動磁気ヘッドにおいて、前記スライダ部を
構成する多結晶フェライト材の粒界を析出させるに当た
り、ＣＦ＿４（テトラフロロメタン）プラズマによるプ
ラズマエッチングを適用することを特徴とする浮動磁気
ヘッドの製造方法。3. In a floating magnetic head having a slider portion that levitates from the magnetic disk as the magnetic disk rotates and comes into contact with the magnetic disk when the rotation stops, in precipitating grain boundaries of a polycrystalline ferrite material constituting the slider portion, A method for manufacturing a floating magnetic head, characterized by applying plasma etching using CF_4 (tetrafluoromethane) plasma.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28153389A JPH03146682A (en) | 1989-10-27 | 1989-10-27 | Production of floating magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28153389A JPH03146682A (en) | 1989-10-27 | 1989-10-27 | Production of floating magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03146682A true JPH03146682A (en) | 1991-06-21 |
Family
ID=17640497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28153389A Pending JPH03146682A (en) | 1989-10-27 | 1989-10-27 | Production of floating magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03146682A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07326150A (en) * | 1994-05-30 | 1995-12-12 | Nec Corp | Magnetic head and its manufacture |
| US7114241B2 (en) | 1998-11-11 | 2006-10-03 | Western Digital (Fremont), Inc. | Method of manufacturing a magnetic head device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241183A (en) * | 1987-03-27 | 1988-10-06 | Canon Inc | How to treat objects |
| JPH01133274A (en) * | 1987-11-18 | 1989-05-25 | Victor Co Of Japan Ltd | Floating magnetic head and its manufacture |
-
1989
- 1989-10-27 JP JP28153389A patent/JPH03146682A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241183A (en) * | 1987-03-27 | 1988-10-06 | Canon Inc | How to treat objects |
| JPH01133274A (en) * | 1987-11-18 | 1989-05-25 | Victor Co Of Japan Ltd | Floating magnetic head and its manufacture |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07326150A (en) * | 1994-05-30 | 1995-12-12 | Nec Corp | Magnetic head and its manufacture |
| US7114241B2 (en) | 1998-11-11 | 2006-10-03 | Western Digital (Fremont), Inc. | Method of manufacturing a magnetic head device |
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