JPH0318077A - Metal vapor laser device - Google Patents
Metal vapor laser deviceInfo
- Publication number
- JPH0318077A JPH0318077A JP15267489A JP15267489A JPH0318077A JP H0318077 A JPH0318077 A JP H0318077A JP 15267489 A JP15267489 A JP 15267489A JP 15267489 A JP15267489 A JP 15267489A JP H0318077 A JPH0318077 A JP H0318077A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- anode
- capacitor
- cathode
- inductance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/031—Metal vapour lasers, e.g. metal vapour generation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は金属蒸気レーザ、とくにそのパルス発生回路
の構成に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a metal vapor laser, and particularly to the configuration of its pulse generation circuit.
第2図は例えば昭和56年度レーザ研究$9巻第2号「
銅蒸気レーザの製作」に示された従来の金属蒸気レーザ
を示す断面構成図であり、図において、(ロ)は高圧電
源、(1)は充電リアクトル、(2)は充電ダイオード
、(3)はサイラトロン、(4)はコンデンサ、〈5)
はサイラトロン板,(6)はコンデンサ板、(9)は陰
極フランジ、00は外筒、qυは陰極、四は陽極、αJ
は放電内管、Q4,は断熱ウール、Q5はシール管、C
IQは窓、Q7)は銅粒、α引よ真空層、O場は絶縁ブ
レーク、四は陽極フランジである。Figure 2 shows, for example, 1981 Laser Research, Volume 9, No. 2.
1 is a cross-sectional configuration diagram showing a conventional metal vapor laser shown in ``Manufacturing of copper vapor laser'', in which (b) is a high voltage power supply, (1) is a charging reactor, (2) is a charging diode, and (3) is a high voltage power supply. is a thyratron, (4) is a capacitor, <5)
is the thyratron plate, (6) is the capacitor plate, (9) is the cathode flange, 00 is the outer cylinder, qυ is the cathode, 4 is the anode, αJ
is discharge inner tube, Q4 is insulation wool, Q5 is sealed tube, C
IQ is the window, Q7) is the copper grain, α pull vacuum layer, O field is the insulation break, and 4 is the anode flange.
次に動作について説明する。高圧電源(ロ)からコンデ
ンサ(4)に充電リアクトル(1)、充電ダイオード(
2冫を通して、高圧を充電する。サイラトロン(3)を
導通すると、サイラトロン板(5)、コンデンサ(4)
、コンデンサ板(6)、陰極フランジ(9)、陽極フラ
ンジ翰、外筒叫を通して、陰極αυ、陽極(ト)に高圧
電圧が印加される。陰極aυと賜極04に印加された電
圧は、セラミック等からなる放電内管部内でパルス放電
を形成する。放電によって放電内管αJに電力が供給さ
れると、シール管αクによって形成されt:真空層(ニ
)と断熱ウールQ4による熱遮蔽効果で放電内管0内が
1500度程度の高温に加熱される。その結果、銅粒a
′I)が蒸発し、放電内管0に充分な銅蒸気を供給する
。さらに、パルス放電を放電内管α4で行うと、銅蒸気
が放電により励起され、レーザ発振を生じ、窓049か
らレーザ光が出力される。Next, the operation will be explained. From the high voltage power supply (b) to the capacitor (4), charging reactor (1), charging diode (
High voltage is charged through the 2nd voltage. When the thyratron (3) is turned on, the thyratron plate (5) and the capacitor (4)
A high voltage is applied to the cathode αυ and the anode (g) through the capacitor plate (6), the cathode flange (9), the anode flange, and the outer tube. The voltage applied to the cathode aυ and the terminal electrode 04 forms a pulse discharge within the discharge inner tube made of ceramic or the like. When electric power is supplied to the discharge inner tube αJ by electric discharge, the inside of the discharge inner tube 0 is heated to a high temperature of about 1500 degrees due to the heat shielding effect of the vacuum layer (d) and the heat insulating wool Q4 formed by the seal tube α. be done. As a result, copper grain a
'I) is evaporated and supplies sufficient copper vapor to the discharge inner tube 0. Further, when a pulse discharge is performed in the discharge inner tube α4, copper vapor is excited by the discharge, laser oscillation occurs, and laser light is output from the window 049.
放電による銅蒸気の励起を充分にし、レーザ効率を高め
るためには、より急峻な電圧を陰極αDと、陽極四に印
加する必要がある。そのために、放電電流経路のインダ
クタンスは、できるだけ小さくする必要があり、特にサ
イラトロン(3)、コンデンサ板(6)、サイラトロン
板(5)、コンデンサ(4)からなるサイラトロン回路
は平行平板等を用いて配線するなどの工夫が施されてい
る。In order to sufficiently excite the copper vapor by discharge and increase laser efficiency, it is necessary to apply a steeper voltage to the cathode αD and the anode 4. For this reason, the inductance of the discharge current path must be made as small as possible. In particular, the thyratron circuit consisting of the thyratron (3), capacitor plate (6), thyratron plate (5), and capacitor (4) should be constructed using parallel plates, etc. Efforts have been made to improve the wiring.
従来の金属蒸気レーザは、上記のように構成されている
ので、サイラトロン(3}、コンデンサ(4)、サイラ
トロン板(5)、コンデンサ板(6)からなるパルス回
路のインダクタンスが充分に小さくならず、陰極αυと
陽極四との間に、充分急峻な電圧を供給出来なかった。Conventional metal vapor lasers are configured as described above, so the inductance of the pulse circuit consisting of the thyratron (3), capacitor (4), thyratron plate (5), and capacitor plate (6) is not sufficiently small. , it was not possible to supply a sufficiently steep voltage between the cathode αυ and the anode 4.
そのため、金属蒸気の励起が不足して、レーザ効率の低
下を招いていた。Therefore, the excitation of the metal vapor is insufficient, resulting in a decrease in laser efficiency.
この発明は上記のような問題点を解決するためになされ
たもので、パルス回路のインダクタンスを充分に小さく
でき、効率の高い金属蒸気レーザ装置を得ることを目的
とする。This invention was made to solve the above-mentioned problems, and aims to provide a highly efficient metal vapor laser device in which the inductance of a pulse circuit can be sufficiently reduced.
この発明に係る金属蒸気レーザ装置は、上記スイッチが
放電管の外周を取り囲むように配置されたものである。In the metal vapor laser device according to the present invention, the switch is arranged so as to surround the outer periphery of the discharge tube.
この発明による金属蒸気レーザ装置は、スイッチが放電
の外周をとり囲むように配置されているため、パルス回
路のインダクタンスがきわめて小さくなり、陰極と陽極
に急峻な電圧が印加でき、効率の高い金属蒸気レーザ装
置を提供できる。In the metal vapor laser device according to the present invention, since the switches are arranged so as to surround the outer periphery of the discharge, the inductance of the pulse circuit is extremely small, and a steep voltage can be applied to the cathode and anode, making it possible to use highly efficient metal vapor lasers. We can provide laser equipment.
第1図はこの発明の一実施例による銅蒸気レーザ装置を
示す断面構成図であり、図において、(7)はFET等
の半導体で構成されたスイソチであり、複数個のFET
が直並列接続されたものである。FIG. 1 is a cross-sectional configuration diagram showing a copper vapor laser device according to an embodiment of the present invention. In the figure, (7) is a switch made of semiconductors such as FETs, and
are connected in series and parallel.
また、(8)は絶縁ガイドである。Further, (8) is an insulated guide.
上記のように構成された銅蒸気レーザ装置は従来の外筒
QOの代わりに絶縁物で形成される絶縁ガイド(3)で
周囲を覆っている。さらに、絶縁ガイド?8)の外周を
取り囲んでF E T (7)の直並列接続が、放電内
管Q:1と同軸状に配置されている。直並列接続された
F E T (7)の一方はコンデンサ(4)に、他方
は陽極フランジ翰に接続されている。The copper vapor laser device configured as described above is surrounded by an insulating guide (3) made of an insulating material instead of the conventional outer cylinder QO. Furthermore, an insulation guide? A series-parallel connection of FET (7) surrounding the outer periphery of 8) is arranged coaxially with the discharge inner tube Q:1. One of the FET (7) connected in series and parallel is connected to the capacitor (4), and the other to the anode flange.
第1図の構成で、コンデンサ(4)に高圧が充電されて
いるとき、上記F E T (7)を導通させると、コ
ンデンサ(4)に充電された高圧はF E T (7)
を通って、陰極0υと陽極■■■との間に印加され、放
電内管G3に放電を形成する。In the configuration shown in Fig. 1, when the capacitor (4) is charged with a high voltage, when the FET (7) is made conductive, the high voltage charged in the capacitor (4) becomes FET(7).
The voltage is applied between the cathode 0υ and the anode ■■■, forming a discharge in the inner discharge tube G3.
このような構成にした場合、実際上、パルス回路と銅蒸
気レーザ管が一体となるため、従来存在したパルス回路
のインダクタンスは存在しなくなる。例えば、従来の大
口径銅蒸気レーザ装置においては、パルス回路のインダ
クタンスは約300nH,レーザ管のインダクタンスも
約3oonHである。In such a configuration, the pulse circuit and the copper vapor laser tube are actually integrated, so that the inductance of the conventional pulse circuit no longer exists. For example, in a conventional large diameter copper vapor laser device, the inductance of the pulse circuit is about 300 nH and the inductance of the laser tube is also about 3 oonH.
印加する電圧をVdとすれば、放電内管(ハ)に放電に
よって流れる電流の立ち上がりの最大は、パルス回路と
レーザ管のトータルのインダクタンスをLとした場合、
di/dt=Vd/L
で表される。つまり、トータルのインダクタンスが小さ
くなれば、電流の立ち上がりも高くなる。If the applied voltage is Vd, the maximum rise of the current flowing through the discharge inner tube (c) due to discharge is expressed as di/dt=Vd/L, where L is the total inductance of the pulse circuit and laser tube. be done. In other words, the smaller the total inductance, the higher the current rise.
この発明によれば、パルス回路のインダクタンスが存在
しなくなったので、たとえば大口径銅蒸気レーザ装置に
おいては、トータルのインダクタンスが約半分に低減さ
れ、従って電流の立ち上がりが約2倍おおきくなり、銅
蒸気の励起が充分となって、高いレーザ効率を得ること
ができる。According to this invention, since there is no inductance in the pulse circuit, for example, in a large-diameter copper vapor laser device, the total inductance is reduced by about half, and therefore the current rise is about twice as large. is sufficiently excited, and high laser efficiency can be obtained.
また、回路のインダクタンスが小さくなれば、放電電力
の無効な成分も極めて少なくなり、最低眼の投入電力に
て、放電内管aJを1500度程度に加熱できる。Furthermore, if the inductance of the circuit is reduced, the ineffective components of the discharge power will be extremely reduced, and the inner discharge tube aJ can be heated to about 1500 degrees with the lowest input power.
また、銅蒸気レーザ装置の外部に電界も磁界も@洩しな
いために極めて、他へのノイズの発生が少なくなる。Further, since neither electric field nor magnetic field leaks to the outside of the copper vapor laser device, the occurrence of noise to others is extremely reduced.
なお、上記実施例によれは絶縁ガイド(8)とFET(
7)は、別々に設置されているが、F E T (7)
によって絶縁ガイドを兼ねても構わない。In addition, according to the above embodiment, the insulation guide (8) and the FET (
7) are installed separately, but F E T (7)
It may also serve as an insulating guide.
なお、上記実地例では半導体にF E ’I”(7)を
用いたが、別に他の半導体でも構わない。In the above practical example, F E 'I'' (7) was used as the semiconductor, but other semiconductors may be used.
また、上記実施例ではF E T (7)は、放電内管
Cl4の外周に同軸状に設置されているが、放電内管α
東の外周であり、かつ多角形状であっても問題は無い。In addition, in the above embodiment, FET (7) is installed coaxially around the outer circumference of the discharge inner tube Cl4, but the
There is no problem even if it is the outer periphery of the east and has a polygonal shape.
以上のように、この発明によれば放電管の外周を取り囲
むようにスイッチを配置したので、放電回路のインタク
タンスが極めて小さくなり、陰極と陽極の間に急峻度の
高い電圧が供給でき、立ち上がりの高い放QCN流が得
られることにより、効率の高い金h蒸気レーザ装置を得
ることができる。As described above, according to the present invention, since the switches are arranged so as to surround the outer periphery of the discharge tube, the inductance of the discharge circuit becomes extremely small, and a voltage with a high steepness can be supplied between the cathode and the anode. By obtaining a high emission QCN flow, a highly efficient gold vapor laser device can be obtained.
第1図はこの発明の一実施例による金属蒸気レーザ装置
を示す断面構成図、及び第2図は従来の金属蒸気レーザ
装置を示す断面構成図である。
(ロ)・高圧sth、(4)・・・コンデンサ、(7)
・・・FET,(8)・・・絶縁ガイド、α4・・・放
電内管、α9・・・シール管。
なお、図中、同一符号は同一、又は相当部分を示す。FIG. 1 is a sectional view showing a metal vapor laser device according to an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional metal vapor laser device. (b) High voltage sth, (4)...Capacitor, (7)
... FET, (8) ... Insulation guide, α4 ... Discharge inner tube, α9 ... Seal tube. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (1)
圧電圧をスイッチを導通させることにより、放電管内に
放電を起こし、レーザ光を発生させるものにおいて、上
記スイッチは、上記放電管の外周をとり囲んで配置され
たことを特徴とする金属蒸気レーザ装置。A capacitor is charged with a high voltage from a high voltage power source, and the high voltage is conducted through a switch, thereby causing a discharge in a discharge tube and generating a laser beam. A metal vapor laser device characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15267489A JPH0797678B2 (en) | 1989-06-14 | 1989-06-14 | Metal vapor laser equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15267489A JPH0797678B2 (en) | 1989-06-14 | 1989-06-14 | Metal vapor laser equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0318077A true JPH0318077A (en) | 1991-01-25 |
| JPH0797678B2 JPH0797678B2 (en) | 1995-10-18 |
Family
ID=15545628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15267489A Expired - Fee Related JPH0797678B2 (en) | 1989-06-14 | 1989-06-14 | Metal vapor laser equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0797678B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100452963B1 (en) * | 2002-01-05 | 2004-10-15 | 김옥수 | An apparatus for turning of elevator cage floor |
-
1989
- 1989-06-14 JP JP15267489A patent/JPH0797678B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100452963B1 (en) * | 2002-01-05 | 2004-10-15 | 김옥수 | An apparatus for turning of elevator cage floor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0797678B2 (en) | 1995-10-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |