JPH0318123Y2 - - Google Patents

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Publication number
JPH0318123Y2
JPH0318123Y2 JP1986096204U JP9620486U JPH0318123Y2 JP H0318123 Y2 JPH0318123 Y2 JP H0318123Y2 JP 1986096204 U JP1986096204 U JP 1986096204U JP 9620486 U JP9620486 U JP 9620486U JP H0318123 Y2 JPH0318123 Y2 JP H0318123Y2
Authority
JP
Japan
Prior art keywords
double
transfer device
magnetic disk
sided processing
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1986096204U
Other languages
Japanese (ja)
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JPS634249U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP1986096204U priority Critical patent/JPH0318123Y2/ja
Publication of JPS634249U publication Critical patent/JPS634249U/ja
Application granted granted Critical
Publication of JPH0318123Y2 publication Critical patent/JPH0318123Y2/ja
Expired legal-status Critical Current

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  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【考案の詳細な説明】 産業上の利用分野 本考案は、たとえば磁気デイスクの両面を研磨
したり、あるいは研磨後の両面に僅かなすじを形
成(微粗面処理)したりするのに採用される円板
体の両面処理機に関するものである。
[Detailed description of the invention] Industrial field of application The invention is adopted, for example, to polish both sides of a magnetic disk, or to form slight streaks on both sides after polishing (micro-rough surface treatment). This invention relates to a double-sided processing machine for disc bodies.

従来の技術 従来のたとえば磁気デイスクの研磨は、特開昭
56年130834号公報や特開昭58年120460号公報に見
られるように、磁気デイスクを縦軸心の周りで回
転させながら、その上面に対してラツピングテー
プを接触させることによつて行なつていた。この
ような従来形式によると、一面の研磨を終えたの
ち磁気デイスクの表裏をかえて(裏返して)他面
の研磨を行なうのであり、この裏返し作業を人手
により行なうことから非能率的であり、かつ高価
格の原因ともなつていた。そこで別の手段とし
て、たとえば特開昭57年111830号公報に見られる
ように、磁気デイスクを一対のアダプタで挾持し
て横軸心の周りに回転自在とし、この磁気デイス
クの両面にそれぞれパツドを作用させて、同時に
両面の研磨を行なう形式が提供されている。
Conventional technology For example, conventional polishing of magnetic disks was
As seen in Japanese Patent Laid-Open No. 130834/1983 and Japanese Patent Laid-Open No. 120460/1983, wrapping tape is carried out by contacting the top surface of a magnetic disk while rotating it around its vertical axis. was. According to this conventional method, after polishing one side, the magnetic disk is turned over (turned over) and polished on the other side, which is inefficient as this flipping work is done manually. It was also the cause of high prices. Therefore, as another method, for example, as seen in Japanese Patent Application Laid-open No. 111830 of 1982, a magnetic disk is held between a pair of adapters so as to be rotatable around the horizontal axis, and pads are attached to both sides of the magnetic disk. A format is provided in which both surfaces are polished simultaneously.

考案が解決しようとする問題点 上記した両面同時研磨の従来形式によると、磁
気デイスクは一枚づつしか研磨を行なえず、その
たびにアダプタを操作しての着脱を行なうことか
ら能率が悪い。また、アダプタ操作を含めて、そ
の装脱は人手により行なうことから面倒で、かつ
非能率であり、しかも磁気デイスクの研磨面に人
手が触れ易いことになる。
Problems to be Solved by the Invention According to the above-mentioned conventional method of simultaneous double-sided polishing, only one magnetic disk can be polished, and the adapter must be operated to attach and detach each time, which is inefficient. In addition, the attachment and detachment, including the operation of the adapter, is performed manually, which is troublesome and inefficient, and moreover, the polished surface of the magnetic disk is easily touched by the human hand.

本考案の目的とするところは、複数枚の同時処
理を行なえ、しかも円板体の装脱は人手作業を伴
うことなく自動的に行なえる円板体の両面処理機
を提供する点にある。
An object of the present invention is to provide a double-sided processing machine for discs that can simultaneously process a plurality of discs and automatically load and unload the discs without manual labor.

問題点を解決するための手段 上記問題点を解決すべく本考案における円板体
の両面処理機は、複数枚の円板体を周方向等角度
置きに支持して両面の処理を行なう両面処理装置
を、支持面を傾斜して配設し、この両面処理装置
の上方に、傾斜軸心とは直交状の横方向に移動自
在な移載装置を設け、この移載装置を、移動台
と、この移動台に取付けた昇降部材と、この昇降
部材に配設した横方向に複数の保持装置とから構
成し、各保持装置のベースプレートは、昇降動と
横移動との少なくとも一方を行なうべく昇降部材
に取付け、各ベースプレートの下部に、横軸心の
周りに揺動自在な揺動片と揺動操作装置とを設
け、そして各揺動片に、出退操作装置を介してチ
ヤツク装置を設けている。
Means for Solving the Problems In order to solve the above-mentioned problems, the present invention provides a double-sided processing machine for disk bodies, which processes both sides of a plurality of disk bodies by supporting them at equal angles in the circumferential direction. The device is arranged with its support surface inclined, and a transfer device is provided above the double-sided processing device that is movable in a lateral direction orthogonal to the tilt axis, and this transfer device is used as a transfer platform. , consists of an elevating member attached to this moving table and a plurality of holding devices arranged in the horizontal direction on this elevating member, and the base plate of each holding device is moved up and down to perform at least one of an elevating movement and a lateral movement. Attached to the member, a rocking piece that can swing freely around the horizontal axis and a rocking operation device are provided at the bottom of each base plate, and a chuck device is provided on each rocking piece via the egress/egress operation device. ing.

作 用 かかる本考案構成によると、移載装置において
は、各保持装置を上昇させて同一レベルにすると
ともに離間方向に横移動させておき、そして揺動
片を横軸心の周りに垂直姿勢にするとともに、チ
ヤツク装置を退入動させた状態で未処理物支持部
に対向させたのち、昇降部材の昇降動と、チヤツ
ク装置の出退動と、チヤツク装置のチヤツク動と
の組合わせ動作、ならびに所定ピツチの移動とを
行なうことにより、各保持装置に、それぞれ未処
理円板体を垂直姿勢で保持させ得る。次いで移載
装置を移動させて両面処理装置の上方所定位置に
停止させたのち、各保持装置のベースプレートの
うち一部を下降させるとともに残りを接近動させ
ることにより、これら保持装置で保持してなる末
処理円板体を、両面処理装置が支持する周方向等
角度置きのパターンに配列し得る。そして揺動操
作装置により揺動片を揺動させて、受け側の傾斜
支持面に沿うように各未処理円板体を傾斜させた
のち、出退操作装置によりチヤツク装置を突出動
させることによつて、傾斜支持面上に未処理円板
体を接当させ得る。次いで、チヤツク装置を解除
したのち前述とは逆作動させることにより、移載
装置を非作用姿勢で待機させ得る。そして傾斜支
持面の形成部材などを使用して未処理円板体の両
面に対して、研磨などの処理を行なつたのち、前
述と同様に移載装置を作動させることによつて、
両面処理装置から回転体群を取り出せ得る。
According to the configuration of the present invention, in the transfer device, each holding device is raised to the same level and moved laterally in the direction of separation, and the swinging piece is placed in a vertical position around the horizontal axis. At the same time, after the chuck device is moved in and out and opposed to the unprocessed material support part, a combination operation of the lifting and lowering movement of the elevating member, the movement in and out of the chuck device, and the chuck movement of the chuck device, In addition, by performing the movement by a predetermined pitch, each holding device can hold each unprocessed disc body in a vertical position. Next, the transfer device is moved and stopped at a predetermined position above the double-sided processing device, and then a part of the base plate of each holding device is lowered and the rest is moved closer to each other, so that the paper is held by these holding devices. The finishing discs may be arranged in a circumferentially equiangular pattern supported by the double-sided processing device. Then, the rocking piece is swung by the swiveling operation device to tilt each unprocessed disk body along the inclined support surface on the receiving side, and then the chuck device is moved to protrude by the ejection and withdrawal operation device. Thus, it is possible to abut the untreated disc body on the inclined support surface. Next, by releasing the chuck device and activating it in the opposite manner to that described above, the transfer device can be placed on standby in a non-operating position. Then, after performing polishing or other processing on both sides of the untreated disc using a member forming an inclined support surface, etc., by operating the transfer device in the same manner as described above,
The group of rotating bodies can be taken out from the double-sided processing apparatus.

実施例 以下に本考案の一実施例を図面に基づいて説明
する。
Embodiment An embodiment of the present invention will be described below based on the drawings.

第6図〜第8図において1は内部に処理室2を
形成するケース状の本体で、所定の箇所には透視
式の開閉扉3が設けられる。処理室2内の一端に
は、未処理の円板体、すなわち円板体の一例であ
る磁気デイスク4を、その面を前後方向で相対向
させて並列支持し、かつ横方向に3列(複数列)
配列支持する未処理物支持部5が設けられる。こ
の未処理物支持部5の支持台6は、前後移動装置
7によつて並列ピツチ分づつ前後方向に移動自在
となる。この未処理物支持部5から他端側に順
次、第1両面処理装置8と、第1洗浄装置9と、
第2両面処理装置10と、第2洗浄装置11とが
配設される。そして他端に、前記未処理物支持部
5と同様の処理物支持部12が設けられる。この
処理物支持部12の処理済み磁気デイスク4Aを
支持する支持台13は、前後移動装置14によつ
て並列ピツチ分づつ前後方向に移動自在となり、
そのピツチ移動は未処理物支持部5の移動方向と
は逆方向となる。前記処理室2内の上部には、両
端方向に往復移動自在な第1移載装置15と第2
移載装置16とが配設され、ここで第1移載装置
15は未処理物支持部5から第1洗浄装置9まで
受け持ち、また第2移載装置16は第1洗浄装置
9から処理物支持部12まで受け持つ。そして両
移載装置15,16は、それぞれ3個(複数個)
の保持装置17A,17B,17Cを有する。
In FIGS. 6 to 8, reference numeral 1 denotes a case-like main body forming a processing chamber 2 therein, and a see-through opening/closing door 3 is provided at a predetermined location. At one end of the processing chamber 2, unprocessed disk bodies, that is, magnetic disks 4, which are an example of disk bodies, are supported in parallel with their surfaces facing each other in the front and back direction, and are arranged in three rows ( multiple columns)
An unprocessed material support section 5 for array support is provided. The support stand 6 of the unprocessed material support section 5 is movable in the front and back direction by a parallel pitch by a back and forth moving device 7. From this unprocessed material support part 5 to the other end side, a first double-sided processing device 8, a first cleaning device 9,
A second double-sided processing device 10 and a second cleaning device 11 are provided. A processed material support section 12 similar to the unprocessed material support section 5 is provided at the other end. The support stand 13 that supports the processed magnetic disk 4A of the processed material support section 12 is movable in the front and back direction by parallel pitches by the back and forth moving device 14.
The pitch movement is in the opposite direction to the movement direction of the unprocessed material support section 5. At the upper part of the processing chamber 2, there are a first transfer device 15 and a second transfer device 15 that can reciprocate in both end directions.
A transfer device 16 is provided, in which the first transfer device 15 takes charge from the unprocessed material support section 5 to the first cleaning device 9, and the second transfer device 16 takes charge of the processing from the first cleaning device 9 to the processed material. It covers up to the support part 12. And both transfer devices 15 and 16 are 3 pieces each (plural pieces)
It has holding devices 17A, 17B, and 17C.

上記実施例において、未処理物支持部5の支持
台6上の磁気デイスク4は、第1移載装置15の
各保持装置17A,17B,17Cによつて各列
から1個づつ取出され、保持される。そして第1
移載装置15は他端側に移動し、第1両面処理装
置8に対向して停止したのち、保持装置17A,
17B,17Cで保持してなる3枚の磁気デイス
ク4を第1両面処理装置8に渡す。この第1両面
処理装置8で所期の両面処理が同時に行なわれた
3枚の磁気デイスク4は、待機していた第1移載
装置15の保持装置17A,17B,17Cによ
つて再び取出され、そして他端側への移動により
第1洗浄装置9に対向して停止される。次いで第
1移載装置15の磁気デイスク4は第1洗浄装置
9に渡され、ここで処理後の洗浄を受ける。第1
洗浄装置9に磁気デイスク4を渡した第1移載装
置15は未処理物支持部5側へ復帰移動し、また
第1洗浄装置9には第2移載装置16が対向して
停止する。第1洗浄装置9にて洗浄された磁気デ
イスク4は第2移載装置16に受取られ、そして
第2両面処理装置10に渡される。ここで両面処
理された磁気デイスク4は、第2移載装置16に
より第2洗浄装置11に渡されて洗浄を受け、こ
れにより処理済みとなつた磁気デイスク4Aは処
理物支持部12の支持台13上に渡される。
In the above embodiment, the magnetic disks 4 on the support stand 6 of the unprocessed material support section 5 are taken out one by one from each row by each holding device 17A, 17B, 17C of the first transfer device 15, and held. be done. and the first
The transfer device 15 moves to the other end side, stops facing the first double-sided processing device 8, and then moves to the holding device 17A,
The three magnetic disks 4 held by 17B and 17C are delivered to the first double-sided processing device 8. The three magnetic disks 4 that have been simultaneously subjected to the desired double-sided processing in the first double-sided processing device 8 are taken out again by the holding devices 17A, 17B, and 17C of the first transfer device 15 that have been on standby. , and is stopped facing the first cleaning device 9 by moving toward the other end. Next, the magnetic disk 4 of the first transfer device 15 is transferred to the first cleaning device 9, where it is cleaned after processing. 1st
The first transfer device 15 that has transferred the magnetic disk 4 to the cleaning device 9 moves back toward the unprocessed material support section 5, and the second transfer device 16 stops facing the first cleaning device 9. The magnetic disk 4 cleaned by the first cleaning device 9 is received by the second transfer device 16 and then transferred to the second double-side processing device 10. The magnetic disk 4 that has been processed on both sides is transferred to the second cleaning device 11 by the second transfer device 16 for cleaning, and the magnetic disk 4A that has been processed is placed on the support stand of the processing object support section 12. Passed on 13.

上記実施例では処理と洗浄とを2回繰り返して
いるが、これは両面処理装置と洗浄装置とをさら
に組み込むことによつて、3回以上の繰り返しも
行なえる。
Although the processing and cleaning are repeated twice in the above embodiment, they can be repeated three or more times by further incorporating a double-sided processing device and a cleaning device.

次に両面処理装置8,10の詳細を第1図,第
5図〜第8図において説明する。
Next, details of the double-sided processing apparatuses 8 and 10 will be explained with reference to FIGS. 1 and 5 to 8.

処理室2内の床板上にベース枠20が固定さ
れ、このベース枠20上に固定側処理部21と可
動側処理部22が相対向して配設される。前記固
定側処理部21では、ベース枠20から立設した
機枠23に、軸受24を介して回転軸25が回転
自在に支持されており、その際に回転軸心は、両
移載装置15,16の移動方向とは直交状の前後
方向で、かつ可動側処理部22側が上位となるよ
うに、たとえば10度傾斜させた傾斜軸心26に設
定される。前記回転軸25の内端にはフランジ材
27が固着され、さらにフランジ材27の内面に
は、処理体の一例である環状の研磨体(砥石な
ど)が取付けられる。前記回転軸25内には傾斜
軸心26に沿つた流体路30が形成され、この流
体路30の外端は回転継手31を介して供給ホー
ス32に接続される。そして流体路30の終端
(内端)を研磨体29の前面複数箇所に開口して
いる。すなわちフランジ材27の内側において回
転軸25にリング材33が取付けられ、このリン
グ材33には前記流体路30に連通する複数の分
配路34が形成されている。前記研磨体29内に
は放射方向路35が周方向に複数形成され、各放
射方向路35は前面に開口する複数の開口部36
に連通している。また研磨体29からフランジ材
27に亘つては放射方向路35に連通する中継路
37が形成され、これら中継路37の外端は配管
38を介して前記分配路34に連通している。他
方の可動側処理部22では、ベース枠20から立
設した機枠40に、軸受41を介して長さ方向に
摺動自在な筒体42が配設され、そして筒体42
内には軸受43を介して回転軸44が回転のみ自
在に設けてある。前記筒体42の摺動と回転軸4
4の回転とは、共通となる前記傾斜軸心26上で
行なわれる。前記筒体42に連動する摺動操作装
置45は、機枠40からのブラケツト46に横方
向ピン47を介して取付けたレバー48と、この
レバー48の下端に連動し、かつベース枠20側
に取付けたシリンダ装置49と、前記レバー48
の上端に連動し、かつ筒体42の外端に取付けた
受けリング50とから構成される。前記回転軸4
4の内端近くにはキー51を介してボス部材52
が固着され、そして内端には球軸受53を介して
フランジ材54が遊動自在に取付けてある。この
フランジ材54からのピン55はボス部材52に
形成したばか孔56を挿通し、またフランジ材5
4とボス部材52との間には中立維持用のばね5
7が介在される。そしてフランジ材54の内面に
は研磨体58が取付けられる。前記回転軸44内
には傾斜軸心26に沿つた流体路59が形成さ
れ、この流体路59の外端は回転継手60を介し
て供給ホース67に接続される。そして流体路5
9の終端(内端)を研磨体58の前面複数箇所に
開口している。すなわちフランジ材54の内側に
おいて回転軸44にリング材61が取付けられ、
このリング材61には前記流体路59に連通する
複数の分配路62が形成されている。前記研磨体
58内には放射方向路63が周方向に複数形成さ
れ、各放射方向路63は、前面に開口する複数の
開口部64に連通している。また研磨体58から
フランジ材54に亘つては放射方向路63に連通
する中継路65が形成され、これら中継路65の
外端は配管66を介して前記分配路62に連通し
ている。
A base frame 20 is fixed on a floor plate in the processing chamber 2, and a fixed side processing section 21 and a movable side processing section 22 are arranged on the base frame 20 so as to face each other. In the fixed-side processing section 21, a rotating shaft 25 is rotatably supported by a machine frame 23 that stands up from a base frame 20 via a bearing 24, and the rotating shaft center is aligned with both transfer devices 15. , 16 in the front-rear direction, and the tilt axis 26 is set to be tilted by, for example, 10 degrees so that the movable processing section 22 side is on the upper side. A flange member 27 is fixed to the inner end of the rotating shaft 25, and an annular abrasive body (such as a grindstone), which is an example of a processing body, is attached to the inner surface of the flange member 27. A fluid path 30 is formed within the rotary shaft 25 along the inclined axis 26 , and the outer end of the fluid path 30 is connected to a supply hose 32 via a rotary joint 31 . The terminal end (inner end) of the fluid path 30 is opened at a plurality of locations on the front surface of the polishing body 29. That is, a ring material 33 is attached to the rotating shaft 25 inside the flange material 27, and a plurality of distribution channels 34 communicating with the fluid channel 30 are formed in the ring material 33. A plurality of radial passages 35 are formed in the circumferential direction in the polishing body 29, and each radial passage 35 has a plurality of openings 36 opening at the front surface.
is connected to. Relay passages 37 communicating with the radial passages 35 are formed from the polishing body 29 to the flange member 27, and the outer ends of these relay passages 37 communicate with the distribution passage 34 via piping 38. In the other movable side processing section 22, a cylinder 42 that is slidable in the longitudinal direction via a bearing 41 is disposed on a machine frame 40 that stands up from the base frame 20.
A rotating shaft 44 is rotatably provided inside via a bearing 43. Sliding of the cylindrical body 42 and the rotation axis 4
The four rotations are performed on the common tilt axis 26. A sliding operation device 45 that is linked to the cylinder body 42 is linked to a lever 48 that is attached to a bracket 46 from the machine frame 40 via a lateral pin 47, and a lever 48 that is linked to the lower end of this lever 48 and is attached to the base frame 20 side. The installed cylinder device 49 and the lever 48
The receiving ring 50 is interlocked with the upper end of the cylindrical body 42 and is attached to the outer end of the cylindrical body 42. The rotating shaft 4
A boss member 52 is installed near the inner end of 4 via a key 51.
is fixed, and a flange member 54 is freely movably attached to the inner end via a ball bearing 53. The pin 55 from the flange material 54 is inserted through the hole 56 formed in the boss member 52, and
4 and the boss member 52 is a spring 5 for maintaining neutrality.
7 is intervened. A polishing body 58 is attached to the inner surface of the flange material 54. A fluid passage 59 along the inclined axis 26 is formed within the rotary shaft 44 , and the outer end of the fluid passage 59 is connected to a supply hose 67 via a rotary joint 60 . and fluid path 5
The terminal end (inner end) of the polishing body 58 is opened at a plurality of locations on the front surface of the polishing body 58 . That is, the ring material 61 is attached to the rotating shaft 44 inside the flange material 54,
A plurality of distribution passages 62 communicating with the fluid passage 59 are formed in this ring material 61 . A plurality of radial passages 63 are formed in the polishing body 58 in the circumferential direction, and each radial passage 63 communicates with a plurality of openings 64 opening at the front surface. Relay passages 65 communicating with the radial passages 63 are formed from the polishing body 58 to the flange member 54, and the outer ends of these relay passages 65 communicate with the distribution passage 62 via piping 66.

前記ベース枠20内には前後方向の駆動軸70
が配設され、この駆動軸70の固定側端は無端伝
動装置71を介して固定側の回転軸25に連動連
結している。また駆動軸70の可動側端は歯車伝
動装置72を介して中間軸73に連動連結する。
この中間軸73には伝動輪体74が軸心方向摺動
のみ自在に外嵌され、この伝動輪体74にベルト
75を介して連動する受動輪体76が可動側の回
転軸44に固定されている。そして筒体42と伝
動輪体74とを、板材77や軸受78などを介し
て連動している。また駆動軸70は無端伝動装置
79を介してモータ80に連動連結している。
Inside the base frame 20 is a drive shaft 70 in the front and rear direction.
The fixed end of the drive shaft 70 is interlocked with the fixed rotating shaft 25 via an endless transmission 71. Further, the movable end of the drive shaft 70 is operatively connected to an intermediate shaft 73 via a gear transmission 72.
A transmission wheel body 74 is fitted onto the intermediate shaft 73 so as to be slidable only in the axial direction, and a passive wheel body 76 that is interlocked with the transmission wheel body 74 via a belt 75 is fixed to the rotating shaft 44 on the movable side. ing. The cylindrical body 42 and the transmission wheel body 74 are interlocked via a plate member 77, a bearing 78, and the like. Further, the drive shaft 70 is operatively connected to a motor 80 via an endless transmission 79.

前記固定側処理部21には磁気デイスク4を嵌
脱自在ならびに回転自在に支持する支持装置90
が設けられる。この支持装置90は、傾斜軸心2
6上に位置するとともに回転軸25の先端に軸受
91を介して遊転自在に支持される支軸98と、
この支軸98の遊端に固定した共用溝付きローラ
92と、この共用溝付きローラ92に対向し、周
方向2個を1組として、120度おきに3組配設さ
れた押付け用溝付きローラ93と、これら押付け
用溝付きローラ93を取付けた前後軸94を回転
自在に支持する軸受け装置95と、この軸受け装
置95を介して押付け用溝付きローラ93を共用
溝付きローラ92に対して接近、離間させるシリ
ンダ装置96と、対となる溝付きローラ92,9
3間で回転自在に支持されるリング状のキヤリツ
ジ97とから構成される。
The fixed side processing section 21 includes a support device 90 that supports the magnetic disk 4 in a detachable and rotatable manner.
is provided. This support device 90 has an inclined axis 2
a support shaft 98 located on the top of the rotary shaft 25 and freely rotatably supported at the tip of the rotating shaft 25 via a bearing 91;
A common grooved roller 92 fixed to the free end of this support shaft 98, and three sets of pressing grooves facing the common grooved roller 92 and arranged at intervals of 120 degrees, two in the circumferential direction. A bearing device 95 rotatably supports the roller 93 and the front and rear shafts 94 to which the pressing grooved rollers 93 are attached, and the pressing grooved roller 93 is connected to the common grooved roller 92 via the bearing device 95. A cylinder device 96 for approaching and separating, and a pair of grooved rollers 92, 9
A ring-shaped carriage 97 is rotatably supported between the two.

第1図〜第4図において、前記第1移載装置1
5と第2移載装置16は、共通のレール100に
それぞれ移動台101を介して横方向に移動自在
であり、その移動は、レール100に沿つて螺子
軸102を配設し、この螺子軸102に連通する
正逆駆動自在なモータ103を設けるとともに、
移動台101と一体にナツト体104を螺子軸1
02に螺合させることにより行なえる。なお移動
手段は、上述した螺軸形式のほかにベルト形式な
どであつてもよい。移動台101には、ガイド1
05を介して案内され、かつシリンダ装置106
にて操作される昇降部材107が設けられ、この
昇降部材107に前記保持装置17A,17B,
17Cが横方向に配設されている。中央の保持装
置17Bのベースプレート108Bは、昇降部材
107に対してガイド109の案内を受けて昇降
自在であり、その昇降はシリンダ装置110によ
り行なわれる。両側の保持装置17A,17Cの
ベースプレート108A,108Cは共通のロツ
ド111に案内されて横方向で互いに接近離間自
在であり、その接近離間動は両ベースプレート1
08A,108C間に設けたシリンダ装置112
により行なわれ、また昇降部材107側に離間限
ストツパ113と接近限ストツパ114とを設け
ている。各ベースプレート108A,108B,
108Cの下部には横方向ピン115A,115
B,115Cを介して横軸心の周りの前後揺動自
在な揺動片116A,116B,116Cが取付
けてあり、その揺動はベースプレート108A,
108B,108Cとの間に設けたシリンダ装置
(揺動操作装置の一例)117A,117B,1
17Cにより行なわれる。各揺動片116A,1
16B,116Cには、出退操作装置の一例であ
るシリンダ装置118A,118B,118Cを
介して可動片119A,119B,119Cが取
付けられ、これら可動片119A,118B,1
19Cにチヤツク装置120A,120B,12
0Cが固定される。121A,121B,121
Cはガイド、122A,122B,122Cはチ
ヤツク爪を示す。
In FIGS. 1 to 4, the first transfer device 1
5 and the second transfer device 16 are movable in the lateral direction on a common rail 100 via a moving table 101, and the movement is achieved by disposing a screw shaft 102 along the rail 100, and In addition to providing a motor 103 that can freely drive in forward and reverse directions and communicating with 102,
The nut body 104 is attached to the screw shaft 1 integrally with the moving table 101.
This can be done by screwing it into 02. Note that the moving means may be of a belt type or the like in addition to the above-mentioned screw type. The guide 1 is mounted on the moving table 101.
05 and cylinder device 106
An elevating member 107 is provided which is operated by a
17C are arranged laterally. The base plate 108B of the central holding device 17B is movable up and down with respect to the elevating member 107 under the guidance of a guide 109, and is moved up and down by a cylinder device 110. The base plates 108A and 108C of the holding devices 17A and 17C on both sides are guided by a common rod 111 and can be moved toward and away from each other in the lateral direction, and the movement toward and away from each other is caused by the movement of the base plates 108A and 108C of the holding devices 17A and 17C on both sides.
Cylinder device 112 installed between 08A and 108C
A separation limit stopper 113 and an approach limit stopper 114 are provided on the elevating member 107 side. Each base plate 108A, 108B,
At the bottom of 108C are horizontal pins 115A, 115.
Swing pieces 116A, 116B, and 116C are attached to the base plate 108A and 115C so as to be able to swing back and forth around the horizontal axis via the base plates 108A and 115C, respectively.
Cylinder device (an example of a swing operation device) 117A, 117B, 1 provided between 108B and 108C
17C. Each rocking piece 116A, 1
Movable pieces 119A, 119B, 119C are attached to 16B, 116C via cylinder devices 118A, 118B, 118C, which are an example of an exit/exit operation device, and these movable pieces 119A, 118B, 1
Check device 120A, 120B, 12 at 19C
0C is fixed. 121A, 121B, 121
C indicates a guide, and 122A, 122B, and 122C indicate chuck claws.

両洗浄装置9,11は、3枚の磁気デイスク4
を並べて各別に支持するローラ130と、これら
ローラ130に連動する回転駆動装置131など
を有する。
Both cleaning devices 9 and 11 are equipped with three magnetic disks 4.
It has rollers 130 that line up and support each one separately, a rotation drive device 131 that interlocks with these rollers 130, and the like.

次に上記実施例において要部の作用を説明す
る。
Next, the operation of the main parts in the above embodiment will be explained.

未処理物支持部5上の磁気デイスク4を第1移
載装置15で取り出す際、中央のベースプレート
108Bは上昇位置にあり、また両側のベースプ
レート108A,108Cは離間位置にある。そ
して揺動片116A,116B,116Cは垂直
姿勢にあり、チヤツク装置120A,120B,
120Cは退入させるとともにチヤツク爪122
A,122B,122Cを接近動させている。こ
れにより各チヤツク装置120A,120B,1
20Cは同一レベルで、かつ所定ピツチ置きとな
る。この状態の第1移載装置15を未処理物支持
部5の上方に停止させ、そして昇降部材107を
下降して磁気デイスク4の貫通孔19にチヤツク
爪122A,122B,122Cを対向させる。
次いでシリンダ装置118A,118B,118
Cを作動させてチヤツク装置120A,120
B,120Cを前進させ、第3図に示すように貫
通孔19内にチヤツク爪122A,122B,1
22Cを突入させる。そしてチヤツク装置120
A,120B,120Cを作動させ、チヤツク爪
122A,122B,122Cを第4図仮想線か
ら実線に示すように移動させて貫通孔19の内面
に圧接させ、以つて磁気デイスク4の保持を行な
う。次いで昇降部材107を上昇させて磁気デイ
スク4を持上げたのち、チヤツク装置120A,
120B,120Cを後退動させる。その後、第
1移載装置15を他端側に移動させて、第1図,
第8図実線に示すように第18の上方に停止させ
る。次いでシリンダ装置117A,117B,1
17Cの作動により揺動片119A,119B,
119Cを横方向ピン115A,115B,11
5Cの周りに揺動させ、磁気デイスク4を傾斜軸
心26に沿つて傾斜させる。そしてシリンダ装置
110により中央のベースプレート108Bを下
降させるとともに、シリンダ装置112により両
側のベースプレート108A,108Bを接近動
させて、3枚の磁気デイスク4を第1両面処理装
置8に渡すための三角状の配列とする。次いで昇
降部材107を下降させ、第1図仮想線に示すよ
うに各キヤリツジ97にそれぞれ磁気デイスク4
を対向させる。この状態でシリンダ装置118
A,118B,118Cを作動させ、チヤツク装
置120A,120B,120Cを介して磁気デ
イスク4を前進させ、第2図仮想線に示すように
キヤリツジ97内に磁気デイスク4を挿入させ
る。そしてチヤツク爪122A,122B,12
2Cによる保持を解除したのち、各部を上述とは
逆作用させて保持装置17A,17B,17Cを
上方で待機させる。
When the magnetic disk 4 on the unprocessed material support section 5 is taken out by the first transfer device 15, the center base plate 108B is in the raised position, and the base plates 108A and 108C on both sides are in the separated position. The swinging pieces 116A, 116B, 116C are in a vertical position, and the chuck devices 120A, 120B,
120C is retracted and the chuck claw 122
A, 122B, and 122C are moved closer together. As a result, each chuck device 120A, 120B, 1
20C are at the same level and at predetermined intervals. The first transfer device 15 in this state is stopped above the unprocessed material support section 5, and the elevating member 107 is lowered to make the chuck claws 122A, 122B, and 122C face the through holes 19 of the magnetic disk 4.
Next, the cylinder devices 118A, 118B, 118
C is activated to check the chuck devices 120A, 120.
B, 120C are advanced, and the chuck claws 122A, 122B, 1 are inserted into the through hole 19 as shown in FIG.
Inject 22C. and check device 120
A, 120B, and 120C are actuated to move the chuck claws 122A, 122B, and 122C from the imaginary lines in FIG. Next, after raising the elevating member 107 and lifting the magnetic disk 4, the chuck device 120A,
120B and 120C are moved backward. After that, the first transfer device 15 is moved to the other end side, and as shown in FIG.
It is stopped above the 18th point as shown by the solid line in FIG. Next, the cylinder devices 117A, 117B, 1
By the operation of 17C, the swinging pieces 119A, 119B,
119C to the horizontal pins 115A, 115B, 11
5C to tilt the magnetic disk 4 along the tilt axis 26. Then, the cylinder device 110 lowers the center base plate 108B, and the cylinder device 112 moves the base plates 108A, 108B on both sides closer together to form a triangular shape for passing the three magnetic disks 4 to the first double-sided processing device 8. Make it an array. Next, the elevating member 107 is lowered, and the magnetic disk 4 is placed in each carriage 97 as shown by the imaginary line in FIG.
to face each other. In this state, the cylinder device 118
A, 118B, and 118C are actuated to advance the magnetic disk 4 via the chuck devices 120A, 120B, and 120C, and insert the magnetic disk 4 into the carriage 97 as shown by the phantom line in FIG. And chuck claws 122A, 122B, 12
After releasing the holding by 2C, each part is operated in the opposite manner to the above, and the holding devices 17A, 17B, and 17C are made to stand by above.

以上により磁気デイスク4を渡した状態で研磨
(処理)に移る。すなわちキヤリツジ97内に渡
された磁気デイスク4は、その一面が研磨体29
の支持面(前面)によりかかるように支持されて
おり、これに対して研磨体58が接近動される。
この接近動は、シリンダ装置49の作動でレバー
48を揺動させ、筒体42を介して回転軸44を
前進させることにより行なえる。これにより両研
磨体29,58で磁気デイスク4の両面を挾持し
た状態になるのであるが、その際に多少の変位
は、ばね57に抗して球軸受53の周りでフラン
ジ材54が変位することから、前述した挾持は全
面に亘つてきつちりと行なわれる。この前後にモ
ータ80が作動され、両研磨体29,58は傾斜
軸心26の周りに同方向に等速回転されている。
したがつて3枚の磁気デイスク4の両面に、回転
している研磨体29,58を接触させて、これら
両面に対する研磨を行なう。この研磨作業中に研
磨液が供給ホース32,67、回転継手31,6
0、流体路30,59、分配路34,62、配管
38,66、中継路37,65、放射方向路3
5,63と流れ、開口部36,64から研磨面に
供給される。所期の研磨を行なつたのち、先ず可
動側の研磨体58を離間動させる。その際に、前
述した流体路59などを介して開口部64から空
気や水などの流体が噴射され、これにより磁気デ
イスク4と研磨体58との面離れを促進して、研
磨体58が一諸に引き出されることを防止する。
次いで第1移載装置15の各保持装置17A,1
7B,17Cを、クランプ爪122A,122
B,122Cの動きだけを逆として、前述した渡
し時と同様に作動させ、以つてキヤリツジ97内
の磁気デイスク4を保持装置17A,17B,1
7Cに保持させる。この保持作用で、研磨体29
から磁気デイスク4を離間させる際に、流体路3
0などを介して開口部36から流体が噴射され、
以つて両者29,4の面離れを促進させる。その
後、第1移載装置15は移動して第1洗浄装置9
上で停止し、そして前述と同じような作動によつ
て磁気デイスク4をローラ130上に並ぼで降ろ
し、所期の洗浄を受けさせる。
After the magnetic disk 4 has been handed over, polishing (processing) is started. That is, the magnetic disk 4 passed into the carriage 97 has one surface covered with the polishing body 29.
The polishing body 58 is moved toward the support surface (front surface) of the polishing body 58 .
This approaching movement can be performed by swinging the lever 48 by operating the cylinder device 49 and moving the rotary shaft 44 forward through the cylinder 42. As a result, both surfaces of the magnetic disk 4 are sandwiched between the two polishing bodies 29 and 58, but at this time, some displacement is caused by the displacement of the flange material 54 around the ball bearing 53 against the spring 57. Therefore, the above-mentioned clamping is performed tightly over the entire surface. The motor 80 is operated before and after this, and both the polishing bodies 29 and 58 are rotated at a constant speed in the same direction around the inclined axis 26.
Therefore, the rotating polishing bodies 29 and 58 are brought into contact with both surfaces of the three magnetic disks 4 to perform polishing on both surfaces. During this polishing work, the polishing liquid is supplied to the supply hoses 32, 67 and the rotary joints 31, 6.
0, fluid path 30, 59, distribution path 34, 62, piping 38, 66, relay path 37, 65, radial path 3
5 and 63, and is supplied to the polishing surface from the openings 36 and 64. After the intended polishing has been performed, the polishing body 58 on the movable side is first moved away. At this time, fluid such as air or water is injected from the opening 64 through the fluid path 59 described above, thereby promoting separation between the magnetic disk 4 and the polishing body 58, so that the polishing body 58 Prevent being drawn out by others.
Next, each holding device 17A, 1 of the first transfer device 15
7B, 17C, clamp claws 122A, 122
B, 122C are operated in the same manner as in the above-described transfer operation, with only the movements of B and 122C being reversed.
Hold at 7C. With this holding action, the polishing body 29
When separating the magnetic disk 4 from the fluid path 3
Fluid is injected from the opening 36 through the
This promotes separation of the surfaces of both 29 and 4. Thereafter, the first transfer device 15 moves to the first cleaning device 9.
Then, by the same operation as described above, the magnetic disks 4 are lowered side by side onto the rollers 130 and subjected to the desired cleaning.

なお第2移載装置16も同様の作用を行ない、
以つて処理済みの磁気デイスク4Aを処理物支持
部12上に渡す。
Note that the second transfer device 16 also performs the same operation,
The processed magnetic disk 4A is then transferred onto the processing object support section 12.

考案の効果 上記構成の本考案によると、移載装置における
各部の動作の組合せにより、この移載装置を運ん
できた複数枚の円板体を、両面処理装置が支持す
る所期のパターンに合うべく配列したのち、この
両面処理装置に渡すことができ、さらに逆作用に
より処理済みの円板体を両面処理装置で取出すこ
とができる。これにより、能率的な複数枚の同時
処理を行なうことができるとともに、円板体の装
脱は人手作業を伴うことなく自動的に行なうこと
ができる。また傾斜支持面に対する円板体の供給
により、供給された円板体の保持(支持)を容易
にかつ正確に行なうことができる。
Effects of the invention According to the invention having the above configuration, the combination of the operations of each part of the transfer device allows the plurality of discs carried by the transfer device to fit into the desired pattern supported by the double-sided processing device. After arranging them as desired, they can be passed to this double-sided processing device, and further, by a reverse action, the processed disk bodies can be taken out from the double-sided processing device. This makes it possible to efficiently process a plurality of disks at the same time, and to automatically load and unload disks without manual intervention. Further, by supplying the disc body to the inclined support surface, the supplied disc body can be easily and accurately held (supported).

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の一実施例を示し、第1図は移載
装置部の側面図、第2図は同正面図、第3図は保
持装置部の縦断側面図、第4図は同正面図、第5
図は両面処理装置の縦断側面図、第6図は全体の
一部切欠き正面図、第7図は同一部切欠き平面
図、第8図は同一部切欠き側面図である。 4……磁気デイスク(未処理円板体)、4A…
…磁気デイスク(処理済円板体)、8……第1両
面処理装置、9……第1洗浄装置、10……第2
両面処理装置、11……第2洗浄装置、12……
処理物支持部、15……第1移載装置、16……
第2移載装置、17A,17B,17C……保持
装置、19……磁気デイスク貫通孔、26……傾
斜軸心(回転軸心)、29……研磨体(処理体)、
58……研磨体(処理体)、90……支持装置、
97……キヤリツジ、101……移動台、107
……昇降部材、108A,108B,108C…
…ベースプレート、116A,116B,116
C……揺動片、117A,117B,117C…
…シリンダ装置(揺動操作装置)、118A,1
18B,118C……シリンダ装置(出退操作装
置)、119A,119B,119C……可動片、
120A,120B,120C……チヤツク装
置、122A,122B,122C……チヤツク
爪。
The drawings show an embodiment of the present invention, in which Fig. 1 is a side view of the transfer device, Fig. 2 is a front view of the same, Fig. 3 is a vertical side view of the holding device, and Fig. 4 is a front view of the same. , 5th
6 is a partially cutaway front view of the double-sided processing apparatus, FIG. 7 is a partially cutaway plan view of the same, and FIG. 8 is a partially cutaway side view of the same. 4...Magnetic disk (untreated disk body), 4A...
...Magnetic disk (processed disc body), 8...First double-sided processing device, 9...First cleaning device, 10...Second
Double-sided processing device, 11... Second cleaning device, 12...
Processing object support section, 15... First transfer device, 16...
Second transfer device, 17A, 17B, 17C... Holding device, 19... Magnetic disk through hole, 26... Inclined axis (rotation axis), 29... Polishing body (processing body),
58... Polishing body (processing body), 90... Support device,
97...Carriage, 101...Moveable platform, 107
...Lifting member, 108A, 108B, 108C...
...Base plate, 116A, 116B, 116
C... Rocking piece, 117A, 117B, 117C...
...Cylinder device (swing operation device), 118A, 1
18B, 118C... Cylinder device (exit/exit operation device), 119A, 119B, 119C... Movable piece,
120A, 120B, 120C...chuck device, 122A, 122B, 122C...chuck claw.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 複数枚の円板体を周方向等角度置きに支持して
両面の処理を行なう両面処理装置を、支持面を傾
斜して配設し、この両面処理装置の上方に、傾斜
軸心とは直交状の横方向に移動自在な移載装置を
設け、この移載装置を、移動台と、この移動台に
取付けた昇降部材と、この昇降部材に配設した横
方向に複数の保持装置とから構成し、各保持装置
のベースプレートは、昇降動と横移動との少なく
とも一方を行なうべく昇降部材に取付け、各ベー
スプレートの下部に、横軸心の周りに揺動自在な
揺動片と揺動操作装置とを設け、そして各揺動片
に、出退操作装置を介してチヤツク装置を設けた
ことを特徴とする円板体の両面処理機。
A double-sided processing device that supports a plurality of discs at equal angles in the circumferential direction and processes both sides is installed with the support surface inclined, and above the double-sided processing device, there is a A horizontally movable transfer device is provided, and this transfer device is composed of a moving table, an elevating member attached to the moving table, and a plurality of horizontally disposed holding devices disposed on the elevating member. The base plate of each holding device is attached to an elevating member to perform at least one of vertical movement and lateral movement, and a rocking piece that can swing freely around the horizontal axis and a rocking operation are provided at the bottom of each base plate. What is claimed is: 1. A double-sided processing machine for a disc body, characterized in that a chuck device is provided on each swinging piece via an ingress/egress operation device.
JP1986096204U 1986-06-24 1986-06-24 Expired JPH0318123Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986096204U JPH0318123Y2 (en) 1986-06-24 1986-06-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986096204U JPH0318123Y2 (en) 1986-06-24 1986-06-24

Publications (2)

Publication Number Publication Date
JPS634249U JPS634249U (en) 1988-01-12
JPH0318123Y2 true JPH0318123Y2 (en) 1991-04-17

Family

ID=30961684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986096204U Expired JPH0318123Y2 (en) 1986-06-24 1986-06-24

Country Status (1)

Country Link
JP (1) JPH0318123Y2 (en)

Also Published As

Publication number Publication date
JPS634249U (en) 1988-01-12

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