JPH03183681A - Manufacturing method of CdMnTe crystal - Google Patents
Manufacturing method of CdMnTe crystalInfo
- Publication number
- JPH03183681A JPH03183681A JP32481389A JP32481389A JPH03183681A JP H03183681 A JPH03183681 A JP H03183681A JP 32481389 A JP32481389 A JP 32481389A JP 32481389 A JP32481389 A JP 32481389A JP H03183681 A JPH03183681 A JP H03183681A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- furnace
- melt
- reaction tube
- transmission loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000007788 liquid Substances 0.000 claims abstract description 14
- 239000000155 melt Substances 0.000 claims abstract description 13
- 238000007711 solidification Methods 0.000 claims abstract 4
- 230000008023 solidification Effects 0.000 claims abstract 4
- 230000005540 biological transmission Effects 0.000 abstract description 23
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 230000005496 eutectics Effects 0.000 abstract description 9
- 229910017231 MnTe Inorganic materials 0.000 abstract description 8
- 229910004613 CdTe Inorganic materials 0.000 abstract description 7
- 239000000203 mixture Substances 0.000 abstract description 7
- 239000002994 raw material Substances 0.000 abstract description 6
- 230000007423 decrease Effects 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000002474 experimental method Methods 0.000 description 15
- 239000010453 quartz Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 241000257465 Echinoidea Species 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
[P↑業上の利用5)野]
この発明は、ブリッジマン炉内で融液を固化することに
よりCd M n T e結晶を製造する方法に関する
ものである。[Detailed Description of the Invention] [P↑ Commercial Application 5) Field] The present invention relates to a method for producing Cd M n Te crystal by solidifying a melt in a Bridgman furnace.
[従来の技術]
従来、Cd M n T e結晶はブリッジマン法によ
り作られている。このブリッジマン法は、所定の温度勾
配をも−する炉内中で、るつぼ内の原料となる物質を溶
融した後に、るつぼを炉内の温度分布の低い方へ微速で
移動させることによって、るつは内の融液を固化結晶成
長させる方法である。炉としては、水平型ブリッジマン
炉または垂直型ブリッジマン炉が使用されている。たと
えば水平型ブリッジマン炉を使用した場合、るつぼとし
てのグラファイトボートあるいはカーボンコートした石
英などでできたボート中に、高純度のCdTeおよびM
nTeが所望の組成となるように配合される。このボー
トは肉厚の石英反応管に入れられ真空封入される。石英
反応管角のCd蒸気圧を一定にコントロールして、結^
^組成比を所望の値にするため、石英反応管の一端に高
純度のCd塊も真空封入される。この石英反応管を横型
電気炉に入れ、原料を加熱溶融した後、石英反応管を低
温部へ微速で移動させて一端から結晶化させている。[Prior Art] Conventionally, Cd M n Te crystals have been produced by the Bridgman method. The Bridgman method involves melting the raw material in the crucible in a furnace with a predetermined temperature gradient, and then moving the crucible at a slow speed toward the lower temperature distribution in the furnace. The first method is to solidify the melt inside and grow crystals. As the furnace, a horizontal Bridgman furnace or a vertical Bridgman furnace is used. For example, when using a horizontal Bridgman furnace, high-purity CdTe and M
nTe is blended to have a desired composition. This boat is placed in a thick-walled quartz reaction tube and sealed under vacuum. By controlling the Cd vapor pressure at the angle of the quartz reaction tube at a constant level,
^ In order to set the composition ratio to a desired value, a high-purity Cd lump is also vacuum sealed at one end of the quartz reaction tube. This quartz reaction tube is placed in a horizontal electric furnace, and after heating and melting the raw materials, the quartz reaction tube is moved at a slow speed to a low temperature section to crystallize from one end.
従来、このように炉内で溶融原料を固化させ結晶化させ
るときの固液界面での炉長子方向における温度勾配およ
び結晶成長スピードは、特に意識されることなく、設定
されていた。Conventionally, when a molten raw material is solidified and crystallized in a furnace, the temperature gradient and crystal growth speed in the longitudinal direction of the furnace at the solid-liquid interface have been set without any particular consideration.
[発明が解決しようとする課題]
しかしながら、このような従来の方法では、Mn組成比
の大きなCdMnTe結晶を製造する場合、たとえばc
d、−xMnxTeの組成において、Xが0.05を越
えるようなCd M n T e結晶を製造する場合、
結1111中に共晶が次第に多くなり、厚さ1mm程度
のウェハにした際、その表面に特徴的な模様となり、光
透過損失が大きくなるという問題点があった。[Problems to be Solved by the Invention] However, in such conventional methods, when producing a CdMnTe crystal with a large Mn composition ratio, for example, c
When producing a Cd MnTe crystal in which X exceeds 0.05 in the composition of d, -xMnxTe,
There was a problem in that the amount of eutectic gradually increased in the crystallization 1111, and when the wafer was made into a wafer with a thickness of about 1 mm, a characteristic pattern appeared on the surface, resulting in a large light transmission loss.
この発明の目的は、かかる従来の問題点を解消し、結晶
中における共晶の発生を抑制し、光透過損失の小さなC
d M n T e結晶を製造する方法を提D(するこ
とにある。The purpose of this invention is to solve such conventional problems, to suppress the generation of eutectic in the crystal, and to suppress the generation of eutectic in the crystal, and to reduce the light transmission loss.
The purpose is to present a method for manufacturing dMnTe crystals.
[課題を解決するための手段]
本発明者は、上記の従来の問題点を解消するため、種々
検討を重ねた結果、ブリッジマン炉内の固液界面での温
度勾配が、上述の」(晶析出に大きく影響することを見
出し、この発明をなすに至った。[Means for Solving the Problems] In order to solve the above-mentioned conventional problems, the inventor of the present invention has conducted various studies, and as a result, the temperature gradient at the solid-liquid interface in the Bridgman reactor is as follows. It was discovered that this greatly affects crystal precipitation, and this invention was made.
すなわち、この発明は、ブリッジマン炉の炉内で融液が
固化する固液界面での炉長子方向の温度勾配を3.5℃
/ c m以上に設定することを特徴としている。That is, this invention reduces the temperature gradient in the direction of the furnace length at the solid-liquid interface where the melt solidifies in the Bridgman furnace to 3.5°C.
/ cm or more.
さらに、本発明者は、ブリッジマン炉内の固液表面での
炉長子方向の温度勾配とともに、結晶成長スピードも共
晶析出に大きく影響することを見出した。Furthermore, the present inventors have found that the crystal growth speed as well as the temperature gradient in the longitudinal direction of the furnace at the solid-liquid surface in the Bridgman furnace have a large effect on eutectic precipitation.
すなわち、この発明においては、ブリッジマン炉の炉内
での融液が固化する固液界面での温度勾配が3.5℃/
c m以上に設定されるとともに、結晶成長スピード
が0.8〜3.5mm/hであることが好ましい。That is, in this invention, the temperature gradient at the solid-liquid interface where the melt solidifies in the Bridgman furnace is 3.5°C/
It is preferable that the crystal growth speed is set at cm or more and the crystal growth speed is 0.8 to 3.5 mm/h.
[作用]
J、Cryst、Growth、52,614(198
1)によれば、CdTe−MnTe混晶の相図では、C
d 、−X Mnx T eにおいてXが0゜75近傍
のときにノ(品ができる。Q<x<0. 75の範囲で
偏析係数は1より小さく、したがって結晶成長中におい
て、Mnは不純物のような扱いを受けて、常に結晶成長
方向へ押しやられる傾向がある。[Action] J, Cryst, Growth, 52,614 (198
According to 1), in the phase diagram of CdTe-MnTe mixed crystal, C
d, -X Mnx Te When X is around 0.75, a product is formed.In the range of Q<x<0.75, the segregation coefficient is less than 1, so during crystal growth, Mn There is always a tendency to be pushed in the direction of crystal growth.
この発明に従えば、固液界面での炉長子方向の温度勾配
が3.5℃/ c m以上のように急峻な場合には、M
nが即しやられると同+17に、凝固結晶化していくた
め、確実にMnが結晶h°向へ押しやられ、共晶の発生
が抑制される。固液界面における炉長子方向の温度勾配
が緩い場合には、Mnの押しやられ方が不十分なため、
結晶成長スピードに関係なく、結晶中に共晶となってM
r+が残ってしまう。According to this invention, when the temperature gradient in the direction of the furnace length at the solid-liquid interface is steep, such as 3.5°C/cm or more, M
When n is immediately pushed away, it solidifies and crystallizes at +17, so Mn is reliably pushed toward the crystal h° direction, and the generation of eutectic is suppressed. When the temperature gradient in the furnace longitudinal direction at the solid-liquid interface is gentle, Mn is not pushed away enough;
Regardless of the crystal growth speed, M forms a eutectic in the crystal.
r+ remains.
また、温度勾配を3.5℃/ c m以上に設定した場
合において、結晶成長スピードは0.8〜3゜5 m
m / hであることが好ましい。結晶成長スピードが
3.5mm/hよりも速くなると、Mnの押しやられ方
が不十分なまま結晶化するので、Mnは共晶となって結
晶中に残されやすくなる。また、結晶スピードが0.8
mm/h米満となり、地端に遅くなると、固液界面で元
来蜆察される温度の微妙な揺らぎが恕影響となって、−
旦凝固結晶化したものが微視的には1.4所的に+IG
融Hし、このときの体積差によって結晶中に気孔が残る
ようになる。In addition, when the temperature gradient is set to 3.5°C/cm or more, the crystal growth speed is 0.8 to 3°5 m
Preferably m/h. When the crystal growth speed is faster than 3.5 mm/h, Mn is crystallized without being sufficiently pushed away, so Mn becomes a eutectic and tends to remain in the crystal. In addition, the crystal speed is 0.8
mm/h, and as it slows down to the ground, the subtle fluctuations in temperature that are originally observed at the solid-liquid interface become a coercive influence, and -
Once solidified and crystallized, microscopically 1.4 places +IG
H melts, and the difference in volume at this time causes pores to remain in the crystal.
[実施例]
大騒I
高純度原料のCdTeおよびM n T eをそれぞれ
モル比で0.94:0.06のII成比となるようにグ
ラフフィトボート中で配合したものを合計で48個準備
した。別々に肉厚の石英反応管中に入れ真空封入すると
ともに、同時にCd塊を石英反応管の一端に真空封入し
た。[Example] Daisou I A total of 48 pieces of high-purity raw materials CdTe and MnTe were blended in a graphite boat at a molar ratio of 0.94:0.06, respectively. Got ready. They were separately placed in a thick-walled quartz reaction tube and vacuum sealed, and at the same time, a Cd lump was vacuum sealed at one end of the quartz reaction tube.
この石英反応管を横型電気炉に入れ、原料を加貼溶融し
た後、約12峙間保持し、その後石英反応管を低温部へ
移動させた。低温部への移動スピードは、それぞれ0.
5;0.8.1.0.2゜0;3.O;3.5;4.0
;5.Omm/hと8つの条件で変化させた。また、固
液界面での炉長子方向の温度勾配を、2.3℃/cm、
3. 0℃/cm、−3.5℃/cm、4.0℃/
cm、5゜0℃/cm、 6.0℃/cm、の6つの
条件で変化させ、低温部への移動スピード条件と組合せ
て2148個の結晶を成長させた。This quartz reaction tube was placed in a horizontal electric furnace, and after applying and melting the raw materials, it was held for about 12 hours, and then the quartz reaction tube was moved to a low temperature section. The speed of movement to the low temperature part is 0.
5;0.8.1.0.2゜0;3. O; 3.5; 4.0
;5. The speed was varied under eight conditions including Omm/h. In addition, the temperature gradient in the furnace longitudinal direction at the solid-liquid interface was set to 2.3°C/cm,
3. 0℃/cm, -3.5℃/cm, 4.0℃/
The temperature was varied under six conditions: cm, 5.0°C/cm, and 6.0°C/cm, and 2148 crystals were grown by combining the conditions with the speed of movement to the low temperature section.
得られた各結晶は幅4(1mm、長さ200mm。Each crystal obtained has a width of 4 (1 mm and a length of 200 mm).
深さ15 m mであった。結晶長さ方向の中央部か馬
厚さ2mmのウェハを切り出し、両面研摩して仕上げ、
厚さ1mmの試料とした。各試料について堅忍で、波長
850nmの光で、光透過損失を11111足した。各
試料についての測定結果を表1にまとめて示す。なお、
石英反応管の低温部への移動スピードが0.5mm/h
のものについては、すべて全長にわたって気孔が散発し
ており、光透過損失は/IpJ定できなかった。The depth was 15 mm. Cut out a wafer with a thickness of 2 mm from the center of the crystal length, polish both sides, and finish.
The sample was 1 mm thick. For each sample, a light transmission loss of 11111 was added for light at a wavelength of 850 nm. The measurement results for each sample are summarized in Table 1. In addition,
The movement speed of the quartz reaction tube to the low temperature section is 0.5 mm/h.
All of them had pores scattered over the entire length, and the light transmission loss /IpJ could not be determined.
実験■
CdTeおよびM n T eの組成比をそれぞれモル
比で0.85:0,15とする以外は、上記の実験Iと
同様にして合計48個の結晶を成長させ、得られた結晶
からウェハの試料を切り出して、光透過損失を1lp1
定した。その結果を表2に示す。Experiment ■ A total of 48 crystals were grown in the same manner as in Experiment I above, except that the mole ratio of CdTe and MnTe was 0.85:0, 15, respectively. Cut out a sample of the wafer and reduce the light transmission loss to 1lp1.
Established. The results are shown in Table 2.
実験■
CdTeおよびM n T eの組成比がそれぞれモル
比で0. 78+o、22となるようにに合する以外は
、上記の実験Iと同様にしてA:L4g個の結晶を成長
させ、得られた結晶からウニI\の試料を切り出して、
光透過損失をaFI定した。その結果を表3に示す。Experiment ■ The composition ratios of CdTe and MnTe are each 0.0 in molar ratio. A:L 4g crystals were grown in the same manner as in Experiment I above, except that they were combined to become 78 + o, 22, and a sample of sea urchin I\ was cut out from the obtained crystals.
Light transmission loss was determined by aFI. The results are shown in Table 3.
実験■
CdTeおよびMnTeの組成比がそれぞれモル比で0
.70:0.30となるように配合する以外は、上記の
実験Iと同様にして合計48個の結晶を成長させ、得ら
れた結晶からつj−/\の試料を切り出して、光透過損
失を測定した。その結果を表4に示す。Experiment ■ The composition ratio of CdTe and MnTe is 0 in terms of molar ratio.
.. A total of 48 crystals were grown in the same manner as in Experiment I above, except that the ratio was 70:0.30, and a sample of J-/\ was cut out from the obtained crystals to determine the optical transmission loss. was measured. The results are shown in Table 4.
実験V
CdTeおよびM n T eの組成比がそれぞれモル
比で0163:0.37となるように配合する以外は、
上記の実験■と同様にして合=148個の結晶を成長さ
せ、得られた結晶からウニ/%の試料を切り出し、光透
過損失をaF+定した。その結果を表5に示す。Experiment V Except for blending CdTe and MnTe in a molar ratio of 0163:0.37,
A total of 148 crystals were grown in the same manner as in Experiment ① above, and samples of sea urchin/% were cut out from the obtained crystals, and the light transmission loss was determined by aF+. The results are shown in Table 5.
なお、実験■〜Vにおいて、石英反応管の低温部への移
動スピードを0 、 5 m rn / hとした試料
はすべて、実験Iと同様に、結晶の全長にわたって気孔
が散発しており、光透過損失をAPI定することができ
なかった。In addition, in experiments ① to V, all of the samples in which the movement speed to the low temperature part of the quartz reaction tube was 0 and 5 mrn/h had pores scattered over the entire length of the crystal, as in experiment I. Transmission loss could not be determined by API.
表1゜
実験Iでの光透過損失
(dB/問)
Cd +−x
nx Te
x −0,06
*)
結晶の全長にわたって気孔が散発しており、光透過損失
はiMP+定できなかった。Table 1: Light transmission loss in Experiment I (dB/question) Cd + - x nx Tex -0,06 *) Since pores were scattered over the entire length of the crystal, the light transmission loss could not be determined by iMP+.
表2゜ 実験■での光透過損失 (d137mm ) Cd +−x nx Te x −0,15 光透過損失はaFI定できなかった。Table 2゜ Light transmission loss in experiment ■ (d137mm ) Cd +-x nx Te x −0,15 Light transmission loss could not be determined by aFI.
表3、 実験■での光透過損失 (rill/++m ) Cd +−x Mr+×Te xmo、22 光透過損失は4−1定できなかった。Table 3, Light transmission loss in experiment ■ (rill/++m) Cd +-x Mr+×Te xmo, 22 The light transmission loss could not be determined at 4-1.
表4゜ 実験■での光透過損失 (dll/n11) Cd +−x n X Te x −0,30 光透過損失は1l11定できなかった。Table 4゜ Light transmission loss in experiment ■ (dll/n11) Cd +-x n X Te x −0,30 The light transmission loss could not be determined.
表5゜ 実験Vでの光i!過損失 (rH3/開) Cd、−8 n X Te x −0,37 光透過損失は測定できなかった。Table 5゜ Light i in Experiment V! excess loss (rH3/open) Cd, -8 n X Te x −0,37 Light transmission loss could not be measured.
表1〜表5の結果から明らかなように、この発明に従い
、同波界面での温度勾配を3.5℃/Cm以上に設定し
て成長させた結晶は光透過損失の低減がみとめられた。As is clear from the results in Tables 1 to 5, the crystal grown according to the present invention with the temperature gradient at the wave interface set to 3.5°C/Cm or higher was found to have reduced optical transmission loss. .
さらに、結晶成長スピードを0.8〜3.5mm/hと
した結晶は、特に低減された光透過損失を示した。Furthermore, crystals with crystal growth speeds of 0.8 to 3.5 mm/h showed particularly reduced light transmission loss.
[発明の効果]
この発明では、因液界曲での炉長手刀向の温度勾配を3
.5℃/ c m以上に設定することにより、共晶の析
出を抑制して、従来よりも光透過損失の低減された結晶
を成長させることができる。さらに、結晶成長スピード
条件を0,8〜3.5mm/hにtlF用限疋すること
により、光透過損失を従来のおよそ1/2〜1/3にす
ることができ、この結晶を光磁界センサに使用した場合
、光磁界センサとしての性能をほぼ2倍か病3倍にする
ことができる。[Effect of the invention] In this invention, the temperature gradient in the longitudinal direction of the furnace at the liquid boundary curve is reduced to 3.
.. By setting the temperature to 5° C./cm or higher, it is possible to suppress the precipitation of eutectic and grow a crystal with lower light transmission loss than before. Furthermore, by limiting the crystal growth speed to 0.8 to 3.5 mm/h for tIF, the optical transmission loss can be reduced to approximately 1/2 to 1/3 of that of the conventional method, and this crystal can be grown in an optical magnetic field. When used in a sensor, the performance as an optical magnetic field sensor can be almost doubled or tripled.
Claims (2)
Te結晶を製造する方法において、前記融液の固化によ
る固液界面での温度勾配を3.5℃/cm以上に設定す
ることを特徴とする、CdMnTe結晶の製造方法。(1) Solidify the melt in the Bridgman furnace to produce CdMn
A method for producing a CdMnTe crystal, characterized in that the temperature gradient at the solid-liquid interface due to solidification of the melt is set to 3.5° C./cm or more.
Te結晶を製造する方法において、前記融液の固化によ
る固液界面での温度勾配を3.5℃/cm以上に設定す
るとともにさらに結晶成長スピードを0.8〜3.5m
m/hにすることを特徴とする、CdMnTe結晶の製
造方法。(2) Solidify the melt in the Bridgman furnace to produce CdMn
In the method for producing a Te crystal, the temperature gradient at the solid-liquid interface due to solidification of the melt is set to 3.5° C./cm or more, and the crystal growth speed is further increased from 0.8 to 3.5 m.
A method for producing a CdMnTe crystal, characterized in that the CdMnTe crystal is produced at m/h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32481389A JPH03183681A (en) | 1989-12-13 | 1989-12-13 | Manufacturing method of CdMnTe crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32481389A JPH03183681A (en) | 1989-12-13 | 1989-12-13 | Manufacturing method of CdMnTe crystal |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03183681A true JPH03183681A (en) | 1991-08-09 |
Family
ID=18169963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32481389A Pending JPH03183681A (en) | 1989-12-13 | 1989-12-13 | Manufacturing method of CdMnTe crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03183681A (en) |
-
1989
- 1989-12-13 JP JP32481389A patent/JPH03183681A/en active Pending
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