JPH03183783A - Formation of titanium nitride type film - Google Patents
Formation of titanium nitride type filmInfo
- Publication number
- JPH03183783A JPH03183783A JP32177889A JP32177889A JPH03183783A JP H03183783 A JPH03183783 A JP H03183783A JP 32177889 A JP32177889 A JP 32177889A JP 32177889 A JP32177889 A JP 32177889A JP H03183783 A JPH03183783 A JP H03183783A
- Authority
- JP
- Japan
- Prior art keywords
- titanium nitride
- film
- titanium
- alkoxide
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 230000015572 biosynthetic process Effects 0.000 title description 7
- 238000000034 method Methods 0.000 claims abstract description 36
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 29
- 238000010438 heat treatment Methods 0.000 claims abstract description 27
- 239000000243 solution Substances 0.000 claims abstract description 25
- -1 titanium alkoxide Chemical class 0.000 claims abstract description 21
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 17
- 239000010936 titanium Substances 0.000 claims abstract description 17
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000012298 atmosphere Substances 0.000 claims abstract description 16
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 16
- 238000001035 drying Methods 0.000 claims abstract description 9
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 8
- 239000011259 mixed solution Substances 0.000 claims abstract description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 15
- 239000011248 coating agent Substances 0.000 claims description 14
- 229910052742 iron Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 abstract description 10
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 5
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 abstract description 4
- 230000003301 hydrolyzing effect Effects 0.000 abstract description 2
- 150000004703 alkoxides Chemical class 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 9
- 239000010959 steel Substances 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 239000002932 luster Substances 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910001315 Tool steel Inorganic materials 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical class [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- 239000010963 304 stainless steel Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000805 Pig iron Inorganic materials 0.000 description 1
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910001567 cementite Inorganic materials 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000010960 cold rolled steel Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 238000004534 enameling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- NREVZTYRXVBFAQ-UHFFFAOYSA-N propan-2-ol;yttrium Chemical compound [Y].CC(C)O.CC(C)O.CC(C)O NREVZTYRXVBFAQ-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、高硬度で耐蝕性に優れ、かつ金色を有する窒
化チタン系族を鉄系金属基体上に安全かつ簡便に形成す
る方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for safely and easily forming a titanium nitride group having high hardness, excellent corrosion resistance, and a golden color on an iron-based metal substrate.
本発明は、工具などの表面硬化処理、各種部品の装飾、
耐蝕性を必要とする化学品用容器の表面処理等に利用さ
れる。The present invention is applicable to surface hardening treatment of tools etc., decoration of various parts,
Used for surface treatment of chemical containers that require corrosion resistance.
従来の窒化チタン系膜の形成方法として、イオンブレー
ティング、スパッタリング等のPVD法及びCVD法等
が知られている。As conventional methods for forming titanium nitride films, PVD methods such as ion blasting and sputtering, CVD methods, and the like are known.
一方、金属アルコキシド溶液やその加水屑物を塗布後、
乾燥、加熱してガラス、セラミックスの基体上に被膜を
形成させる方法(いわゆるゾルゲル法)においては、酸
化物被膜を形成させるものは多く知られている。一方こ
のゾルゲル法による窒化チタン膜の形成方法として、石
英ガラスを基体上にゾルゲル法で酸化チタン族を生威し
、これをアンモニア中で加熱する方法が知られている(
「溶融塩」、第31巻′!J2号、158頁)。On the other hand, after applying metal alkoxide solution or its hydrated waste,
Among the methods of forming a film on a glass or ceramic substrate by drying and heating (so-called sol-gel method), many methods for forming an oxide film are known. On the other hand, as a method for forming a titanium nitride film using this sol-gel method, a method is known in which a titanium oxide group is grown on a quartz glass substrate by the sol-gel method and then heated in ammonia (
"Molten Salt", Volume 31'! J2 issue, p. 158).
前記PVD法等による窒化チタン膜形成方法では、大面
積への膜形成が困難であり、また特殊で高価な装置を必
要とするという問題がある。The method of forming a titanium nitride film using the PVD method or the like has problems in that it is difficult to form the film over a large area, and special and expensive equipment is required.
一方後者のゾルゲル法によるものにおいては、大面積へ
の膜形成も可能であるが、反応活性の大きなアンモニア
中で加熱することにより始めて窒化膜が形成するので、
毒性、腐食性、燃焼性等があり取扱い上の不便さがあっ
た。On the other hand, in the latter method using the sol-gel method, it is possible to form a film over a large area, but the nitride film is only formed by heating in ammonia, which has a high reaction activity.
It is toxic, corrosive, flammable, etc., and is inconvenient to handle.
本発明は、前記問題点を解消するものであり、チタニウ
ムアルコキシド溶液等を用いて窒素雰囲気等の中で加熱
することにより、鉄系金属基体上に窒化チタン系膜(窒
化チタンのみからなる膜及びそれを主として含む膜)を
直接、安全かつ簡便に形成できることを種々の実験の結
果、発見して本発明は完成されたものである。即ち、窒
素雰囲気下で鉄系金属基体に直接、窒化チタン系膜を形
成することは、従来全く考えられなかったものである。The present invention solves the above problems and forms a titanium nitride-based film (a film made only of titanium nitride) on an iron-based metal substrate by heating it in a nitrogen atmosphere using a titanium alkoxide solution or the like. As a result of various experiments, the present invention was completed by discovering through various experiments that it is possible to directly, safely and easily form a membrane containing the same. That is, forming a titanium nitride-based film directly on an iron-based metal substrate under a nitrogen atmosphere was completely unthinkable in the past.
また、前記混合溶液を用いて窒化チタン及び他の金属酸
化物からなる機能膜の形成は従来にない斬新なものであ
る。以上より、本発明は、アンモニア雰囲気を用いずに
鉄系金属基体上に密着性の良い美感に優れた窒化チタン
系膜を安全かつ簡便に形成する方法を提供することを目
的とする。Furthermore, the formation of a functional film made of titanium nitride and other metal oxides using the mixed solution is novel and unprecedented. As described above, an object of the present invention is to provide a method for safely and simply forming a titanium nitride film with good adhesiveness and excellent aesthetic appearance on an iron-based metal substrate without using an ammonia atmosphere.
本発明の窒化チタン系膜形成方法は、チタニウムアルコ
キシドの溶液等を、0.04〜4.2重量%(以下、単
に%という〉の炭素を含む鉄系金属基体の表面に塗布し
、乾燥し、次いで窒素等の不活性雰囲気中で850〜1
100℃に加熱することによって窒化チタン系膜を形成
させることを特徴とする。The method for forming a titanium nitride film of the present invention involves applying a titanium alkoxide solution or the like onto the surface of an iron-based metal substrate containing 0.04 to 4.2% by weight (hereinafter simply referred to as %) of carbon, and drying. , then 850-1 in an inert atmosphere such as nitrogen.
The method is characterized in that a titanium nitride film is formed by heating to 100°C.
前記アルコキシドとしては、エトキシド、プロポキシド
又はブトキシド、更にはこれらの混合物等が用いられ、
通常、炭化水素系、アルコール系又はアミン系等の溶媒
に溶解させてアルコキシド溶液として用いられる。その
濃度は特に限定されないが、適切な塗膜厚さ、塗布の容
易性等により種々選択される。また、前記加水分解液は
、通常金属アルコキシドをアルコール系、アミン系など
の水溶性溶媒に溶解し、水及び微量な塩酸を添加し調製
するが、この加水分解は部分的になされたものでも、完
全になされたものでもよい。なお、これらのアルコキシ
ド溶液又はその加水分解物にはこれらを安定化させる物
質(例えばキレート剤等〉や粘性を調節する物質等を添
加することもできる。As the alkoxide, ethoxide, propoxide or butoxide, and mixtures thereof, etc. are used,
Usually, it is used as an alkoxide solution by dissolving it in a hydrocarbon-based, alcohol-based, or amine-based solvent. The concentration is not particularly limited, but can be selected depending on the appropriate coating thickness, ease of application, etc. The hydrolyzed solution is usually prepared by dissolving the metal alkoxide in a water-soluble solvent such as alcohol or amine, and adding water and a small amount of hydrochloric acid. It can also be a complete one. In addition, a substance that stabilizes these solutions (for example, a chelating agent, etc.) or a substance that adjusts viscosity may be added to these alkoxide solutions or their hydrolysates.
前記「混合溶液」は、チタニウムアルコキシド等のチタ
ン化合物を他の金属成分に対して50モル%以上含み、
他にはジルコニウムアルコキシドを含む。これが50モ
ル%未満では、窒化チタン系膜としての性能、着色等が
十分でないからである。ここで、ジルコニウムアルコキ
シドを用いるのは、チタンと反応し化合物を生成せず、
また加熱後ガラスとならないからである。これには、通
常、一般に用いられるイツ) IJウム等の助剤金属の
アルコキシドを含む。このジルコニウム金属元素は、別
途調製されたジルコニウムアルコキシド溶液又はゾルと
して添加してもよいし、チタン及びジルコニウムの複合
アルコキシドの溶液又はゾルとして添加してもよい。尚
、アルカリ金属、アルカリ土類金属、ホウ素又はケイ素
等の金属元素は、チタンと反応をする等のため使用でき
ない。The "mixed solution" contains 50 mol% or more of a titanium compound such as titanium alkoxide based on other metal components,
Others include zirconium alkoxide. This is because if this amount is less than 50 mol%, the performance, coloring, etc. as a titanium nitride film will not be sufficient. Here, zirconium alkoxide is used because it does not react with titanium and produce compounds.
Moreover, it does not become glass after heating. This usually includes the commonly used auxiliary metal alkoxides, such as IJ. This zirconium metal element may be added as a separately prepared zirconium alkoxide solution or sol, or may be added as a solution or sol of a composite alkoxide of titanium and zirconium. Note that metal elements such as alkali metals, alkaline earth metals, boron, and silicon cannot be used because they react with titanium.
鉄系金属基体としては、普通鋼、工具鋼、鋳鉄及びステ
ンレス鋼等一般の鉄系金属を使用できる。この基体は0
.04〜4.2%の炭素を含む。As the ferrous metal substrate, common ferrous metals such as common steel, tool steel, cast iron, and stainless steel can be used. This base is 0
.. Contains 0.4-4.2% carbon.
これが0.04%未満では、窒化チタン系膜が十分に生
成せず、また4、2%を越えると基体の結晶が大きくな
り表面が粗くなるので好ましくない。If it is less than 0.04%, a titanium nitride film will not be formed sufficiently, and if it exceeds 4.2%, the crystals of the substrate will become large and the surface will become rough, which is not preferable.
アルコキシド溶液等の基体への塗布方法は、特に限定さ
れないが、スピンコード、スプレー、浸漬法等を用いる
ことができるが、このうち浸漬法が最も均一で欠点のな
い窒化チタン系膜を形成することができるので好ましい
。The method of applying the alkoxide solution to the substrate is not particularly limited, and spin cord, spray, dipping methods, etc. can be used, but among these methods, the dipping method forms the most uniform and defect-free titanium nitride film. This is preferable because it allows
また、乾燥は、溶媒を蒸発させ、更に空気中の水分によ
って金属アルコキシドの加水分解を進めるために行われ
る。尚、溶媒の除去が不十分の場合は、加熱後炭素成分
が残るので好ましくない。Further, drying is performed to evaporate the solvent and further promote hydrolysis of the metal alkoxide by moisture in the air. Note that if the solvent is insufficiently removed, carbon components will remain after heating, which is not preferable.
乾燥方法は、特に限定されないが、通常の電気乾燥器等
を用いて容易に行うことができる。The drying method is not particularly limited, but can be easily carried out using a normal electric dryer or the like.
加熱雰囲気は窒素を主体とする雰囲気である。The heating atmosphere is an atmosphere mainly containing nitrogen.
この雰囲気とは、実質上窒素のみからなる雰囲気でもよ
いし、約50容積%以上の窒素とアルゴン、ヘリウム等
の不活性ガスとからなる、窒素を主体とする混合ガス雰
囲気でもよい。This atmosphere may be an atmosphere consisting essentially only of nitrogen, or a mixed gas atmosphere mainly composed of nitrogen and consisting of about 50% by volume or more of nitrogen and an inert gas such as argon or helium.
加熱温度は、850℃〜1100℃である。この温度範
囲において、十分に反応して窒化チタン系膜が形成され
、850℃未満ではその反応が十分でなく、1100℃
に達するまでにほとんど反応が終了してしまい、110
0℃を越えてもその意義が少なく、またこの基体の素材
自体が転移してしまう場合もあり、かつ不経済だからで
ある。The heating temperature is 850°C to 1100°C. In this temperature range, a titanium nitride-based film is fully reacted and formed; below 850°C, the reaction is not sufficient;
The reaction is almost complete by the time it reaches 110
This is because there is little significance even if the temperature exceeds 0° C., and the material of the substrate itself may be transferred, and it is uneconomical.
加熱に用いる装置は、通常、炉内への空気の流入を遮断
し、窒素ガスを流入させて加熱することができる装置を
用いるが、加熱前に炉内空気を窒素で置換できる装置が
望ましく、通常の雰囲気加熱炉、例えば金属熱処理用の
雰囲気炉が用いられる。所定範囲内における加熱温度と
加熱時間は、鉄系金属の種類、塗膜の厚さ等によって種
々選択される。The device used for heating is usually a device that can cut off the inflow of air into the furnace and allow nitrogen gas to flow in for heating, but it is desirable to have a device that can replace the air in the furnace with nitrogen before heating. An ordinary atmosphere heating furnace, for example, an atmosphere furnace for metal heat treatment is used. The heating temperature and heating time within the predetermined range are variously selected depending on the type of iron-based metal, the thickness of the coating film, etc.
本形成方法は、アルコキシド溶液等を用いて所定の鉄系
金属基体表面に乾燥塗膜を形成し、窒素を主体とする不
活性雰囲気中で所定温度に加熱して、アルコキシドと窒
素を反応させて窒化チタン系膜を形成させるものである
。この窒素は、不活性のため、850℃〜1100℃で
はチタニウムアルコキシドと反応して窒化物を生成する
ことは通常では、とても考えられず、実施してみてもそ
うである。しかし本方法では、種々実験を重ねた所、所
定の鉄系金属基体を用いた場合、窒化チタン系膜が選択
的に形成されることを発見したものである。This formation method involves forming a dry coating film on the surface of a predetermined iron-based metal substrate using an alkoxide solution, etc., and heating it to a predetermined temperature in an inert atmosphere mainly composed of nitrogen to cause the alkoxide and nitrogen to react. A titanium nitride-based film is formed. Since this nitrogen is inert, it is normally difficult to imagine that it would react with titanium alkoxide at 850°C to 1100°C to produce nitrides, even if it is tried. However, in this method, after conducting various experiments, it was discovered that when a predetermined iron-based metal substrate is used, a titanium nitride-based film can be selectively formed.
この作用の理由は未だ明瞭ではないが、以下の実施例で
示すように、(1)ガラス、セラミック、銅等の金属基
体を用いた場合良好な皮膜ができなかったこと、(2)
炭素含有量0.48%の鋼が極めて良好な被膜を作るこ
と等から考えると、鉄表面の結晶形若しくは表面形態、
鉄若しくは炭化鉄の材料自体等が反応促進の触媒作用を
示すことが考えられる。The reason for this effect is still not clear, but as shown in the examples below, (1) a good film could not be formed when using a metal substrate such as glass, ceramic, or copper; (2)
Considering that steel with a carbon content of 0.48% forms an extremely good film, the crystal shape or surface morphology of the iron surface,
It is thought that the material itself, such as iron or iron carbide, exhibits a catalytic action to promote the reaction.
いずれにしても本方法は、窒素源として高活性なアンモ
ニアを使用せず不活性な窒素を用いても、反応させるこ
とができたものである。In any case, this method was able to carry out the reaction even when inert nitrogen was used as the nitrogen source without using highly active ammonia.
以下実施例により本発明を具体的に説明する。 The present invention will be specifically explained below using Examples.
本実施例で使用した鉄系金属基体は約2 x 5 cm
、厚さ0.3〜l cttrの板状であり、その表面は
、エメリー紙、ラッピング等によって研磨しその後00
5μmのアルミナ砥粒を用いてパフ研磨した。また、加
熱には、金属熱処理用雰囲気電気炉(炉内寸法8φX6
5C1l)を使用した。窒化チタン系膜形成の確認は、
X線回折法で行なった。The iron-based metal substrate used in this example was approximately 2 x 5 cm.
It is a plate shape with a thickness of 0.3 to 1 cttr, and its surface is polished with emery paper, wrapping, etc.
Puff polishing was performed using 5 μm alumina abrasive grains. In addition, for heating, an atmosphere electric furnace for metal heat treatment (furnace internal dimensions 8φ x 6
5C1l) was used. To confirm the formation of titanium nitride film,
This was done using X-ray diffraction method.
実施例1
チタニウムインプロポキシド1モルをシクロヘキサン1
1に溶解して溶液を調製した。この溶液を浸漬法によっ
て普通鋼(炭素含有量0.48%)に塗布した。その後
電熱乾燥器を用いて120℃、30分で乾燥を行い溶媒
を完全に除去し、次いで前記電気炉を用いて窒化を行な
った。まず、炉内の空気を真空ポンプ(ロータリーポン
プ)で0 、 2 Torr以下に排気し、その後窒素
ガスを流入させて空気を窒素と置換した。その後in/
分の流量で窒素を流しながら常圧で、約り00℃/時間
の昇温速度で960℃に加熱し、1時間保持した。Example 1 1 mol of titanium impropoxide to 1 mol of cyclohexane
1 to prepare a solution. This solution was applied to ordinary steel (carbon content 0.48%) by a dipping method. Thereafter, it was dried at 120° C. for 30 minutes using an electric dryer to completely remove the solvent, and then nitrided using the electric furnace. First, the air in the furnace was evacuated to 0.2 Torr or less using a vacuum pump (rotary pump), and then nitrogen gas was introduced to replace the air with nitrogen. Then in/
The mixture was heated to 960° C. at a rate of about 00° C./hour at normal pressure while nitrogen was flowing at a flow rate of 100° C./hour, and maintained for 1 hour.
放冷後、被膜付普通鋼を炉内から取り出しその表面を観
察した所、強く密着した金色の金属光沢を有する膜が形
成されており、針金等の金属片で素材に傷がつくまで力
を加えても膜が剥がれなかった。被膜面のX線回折を行
った結果、第1図に示すように、基材の普通鋼(主成分
α−Fe、黒丸印)のみならず窒化チタン(白丸印)に
基ずく回折線も認められ、窒化チタン膜の形成が確認さ
れた。After cooling, the coated ordinary steel was taken out of the furnace and its surface was observed. A strongly adhered film with a golden metallic luster was formed, and force was applied with a piece of metal such as a wire until the material was scratched. Even when added, the film did not peel off. As a result of X-ray diffraction of the coating surface, as shown in Figure 1, diffraction lines based on not only the base material ordinary steel (main component α-Fe, marked with black circles) but also titanium nitride (marked with white circles) were observed. The formation of a titanium nitride film was confirmed.
実施例2
加熱温度を880℃、加熱時間を5時間とすること以外
は実施例1と同様にして実験した所、実施例1と同様の
結果が得られた。Example 2 An experiment was conducted in the same manner as in Example 1 except that the heating temperature was 880° C. and the heating time was 5 hours, and the same results as in Example 1 were obtained.
実施例3
炭素含有量0.25%の普通鋼を用いること以外は実施
例1と同様に実施した所、金色の金属光沢はやや薄かっ
たが、はぼ良好な金属光沢を示し、その他は実施例1と
同様の結果が得られた。Example 3 The same procedure as Example 1 was carried out except that ordinary steel with a carbon content of 0.25% was used. Although the golden metallic luster was a little thin, it showed a very good metallic luster. Similar results to Example 1 were obtained.
実施例4
炭素含有量1.0%の工具鋼を用い、窒化のための加熱
温度を1070℃としたこと以外は、実施例1と同様に
実施した所、実施例1と同様の結果が得られた。Example 4 The same procedure as in Example 1 was carried out except that tool steel with a carbon content of 1.0% was used and the heating temperature for nitriding was 1070°C, and the same results as in Example 1 were obtained. It was done.
実施例5
炭素含有量4.24%のダクタイル用銑鉄用いたこと以
外は、実施例4と同様に実施した。その結果、金属光沢
は薄く 〈実施例3よりもやや薄い)、表面はやや粗か
ったが、X線回折では、窒化チタンの回折線が認められ
た。Example 5 The same procedure as Example 4 was carried out except that ductile pig iron having a carbon content of 4.24% was used. As a result, the metallic luster was thin (slightly thinner than in Example 3) and the surface was somewhat rough, but diffraction lines of titanium nitride were observed in X-ray diffraction.
実施例6
SUS 304ステンレス鋼を用いること以外は実施例
4と同様に実施した所、少々白っぽい金色の膜が得られ
た。この膜のX線回折の結果によれば、窒化チタンとと
もに炭化チタンに一致する回折線も認められた。Example 6 The same procedure as in Example 4 was carried out except that SUS 304 stainless steel was used, and a slightly whitish golden film was obtained. According to the results of X-ray diffraction of this film, diffraction lines matching titanium carbide as well as titanium nitride were also observed.
実施例7
チタニウムイソプロポキシドを2モルとし、加熱温度を
1070℃とし、更に塗布、乾燥、加熱を同一条件で2
サイクル繰り返したこと以外は、実施例1と同様に実施
した。尚、この塗膜の断面の走査型電子顕微鏡観察によ
ると、塗膜の厚さは1〜1.5μmと厚かった。Example 7 Titanium isopropoxide was used as 2 moles, the heating temperature was set to 1070°C, and coating, drying, and heating were carried out for 2 times under the same conditions.
The same procedure as in Example 1 was carried out except that the cycle was repeated. Incidentally, according to scanning electron microscope observation of a cross section of this coating film, the thickness of the coating film was as thick as 1 to 1.5 μm.
このように塗布回数を増やして塗膜を厚くしても、色む
ら、ひび、剥離などの欠点を生じることもなく、かつよ
り一層金色の濃い塗膜が得られた。この塗膜の密着性も
良好であり、針金等の金属片で素材に傷が付くまで力を
加えても膜が剥がれなかった。Even when the coating film was thickened by increasing the number of coatings in this manner, defects such as color unevenness, cracking, and peeling did not occur, and a coating film with a deeper golden color was obtained. The adhesion of this coating film was also good, and the film did not peel off even when force was applied to the material with a piece of metal such as a wire.
実施例8
チタニウムイソプロポキシドをジェタノールアミンとイ
ソプロピルアルコールの等容量混合液に溶解し、濃度0
.5モル/1の溶液を用いたこと、乾燥は150℃、3
0分で行なったこと以外は実施例1と同様に実施した所
、実施例1と同様の結果が得られた。Example 8 Titanium isopropoxide was dissolved in an equal volume mixture of jetanolamine and isopropyl alcohol, and the concentration was 0.
.. A 5 mol/1 solution was used, and drying was performed at 150°C.
The same procedure as in Example 1 was carried out except that the test was carried out for 0 minutes, and the same results as in Example 1 were obtained.
実施例9
チタニウムイソプロポキシド0.1モルを0゜4モルの
エチルアルコールに溶解し、この溶液に微量の塩酸、0
.1モルの水及び0.4モルのエチルアルコールからな
る溶液を加えて加水分解して調製した部分加水分解物を
用いること以外は、実施例1と同様に実施した。この結
果、金属光沢は実施例1の場合よりもやや薄かったが、
X線回折では、窒化チタンの回折線が認められた。Example 9 0.1 mol of titanium isopropoxide was dissolved in 0.4 mol of ethyl alcohol, and a trace amount of hydrochloric acid and 0.04 mol of titanium isopropoxide were dissolved in this solution.
.. Example 1 was carried out in the same manner as in Example 1, except that a partial hydrolyzate prepared by adding and hydrolyzing a solution consisting of 1 mol of water and 0.4 mol of ethyl alcohol was used. As a result, the metallic luster was slightly thinner than in Example 1, but
In X-ray diffraction, diffraction lines of titanium nitride were observed.
実施例10
炭素含有量0.040%の冷間圧延鋼板を用いること以
外は実施例1と同様に実施した所、金属光沢は、やや薄
かったが、その他は実施例1と同様の結果が得られた。Example 10 The same procedure as Example 1 was carried out except that a cold rolled steel plate with a carbon content of 0.040% was used. The metallic luster was slightly thinner, but otherwise the same results as in Example 1 were obtained. It was done.
実施例11
シクロヘキサン11に対しチタニウムイソプロポキシド
を1.3モルの割合で溶解した溶液と、シクロへ牛サン
11に対しジルコニウムノルマルプロポキシドとイツト
リウムイソプロポキシドがそれぞれ0.96モル、0.
08モルの割合になるように溶解した溶液とを各々を調
製した。Example 11 A solution in which titanium isopropoxide was dissolved in cyclohexane 11 at a ratio of 1.3 mol, and zirconium normal propoxide and yttrium isopropoxide were dissolved in cyclohexane 11 at a ratio of 0.96 mol and 0.96 mol, respectively.
Each was prepared with a solution in which they were dissolved at a ratio of 0.8 mol.
これらの溶液の等量混合物(混合溶液)を調製し、これ
をデイツプコーテイング液とし、加熱温度を1070℃
とした以外は、実施例1と同様に実施した所、青みがか
った金色の膜が得られた。A mixture of equal amounts of these solutions (mixed solution) was prepared, this was used as a dip coating liquid, and the heating temperature was 1070°C.
The procedure was carried out in the same manner as in Example 1 except that a bluish-gold film was obtained.
尚、X線回折をした所、窒化チタンに一致する回折線、
低級の酸化チタンと考えられる回折線及び正方晶ジルコ
ニアに一致する回折線が認められ、ジルコニアを含む窒
化チタン系膜の形成が確認された。In addition, when X-ray diffraction was performed, diffraction lines matching titanium nitride,
Diffraction lines considered to be low-grade titanium oxide and diffraction lines consistent with tetragonal zirconia were observed, confirming the formation of a titanium nitride-based film containing zirconia.
比較例1
炭素含有量0.005%のほうろう用鋼板を用いること
以外は実施例1と同様に実施したが、実質的な窒化チタ
ン系膜の生成は認められなかった。Comparative Example 1 The same procedure as in Example 1 was carried out except that a steel plate for enameling with a carbon content of 0.005% was used, but no substantial titanium nitride film was observed.
比較例2
基体として石英ガラス等のガラス、アルミナ等のセラミ
ックスを用いて、実施例1と同じ雰囲気下で850℃〜
1100℃の温度で加熱をしても実質的な窒化チタン膜
の生成は認められなかった。また金属基体としてニッケ
ル、モリブテンを用いて1100℃まで加熱しても、更
に銅を用いて1050℃まで加熱しても、同様に窒化チ
タン膜の生成は認められなかった。Comparative Example 2 Using glass such as quartz glass or ceramics such as alumina as the substrate, temperature was increased from 850°C under the same atmosphere as in Example 1.
Even when heated at a temperature of 1100° C., substantial formation of a titanium nitride film was not observed. Similarly, no titanium nitride film was observed even when nickel or molybdenum was used as the metal substrate and heated to 1100°C, and even when copper was used and heated to 1050°C.
実施例の効果
以上より炭素含有量が0.04〜4.2%の種々の鋼を
用いて880℃〜1070℃の温度で加熱すると、いず
れも良好な窒化チタン系膜(窒化チタン膜も含む)が形
成された。特に炭素含有量が0.48%の普通鋼(実施
例1.2)、同1゜0%の工具鋼(実施例4)において
は良好な結果を示した。そのうち特に前者は880℃と
いう低温でも不活性の窒素と十分に反応して良好な被膜
を形成した。また3度塗布して被膜を厚くした場合(実
施例7)は濃色を示すので前記のやや薄い色をした場合
(実施例3.9)でもこの手法により十分な着色、被膜
を得ることもできる。The effects of the examples show that when various steels with carbon contents of 0.04 to 4.2% are heated at temperatures of 880°C to 1070°C, all of them produce good titanium nitride films (including titanium nitride films). ) was formed. Particularly good results were shown for common steel with a carbon content of 0.48% (Example 1.2) and tool steel with a carbon content of 1.0% (Example 4). Among these, the former reacted sufficiently with inert nitrogen even at a low temperature of 880° C. to form a good film. In addition, when the film is thickened by applying it three times (Example 7), it shows a deep color, so even when the above-mentioned slightly lighter color is applied (Example 3.9), sufficient coloring and film can be obtained by this method. can.
塩酸を用いた部分加水分解物を用いると(実施例9)、
透明な溶液を調製し易いので、透明塗膜が作製し易く取
扱いが便利であり、重合物のため被膜を作り易い。When using a partial hydrolyzate using hydrochloric acid (Example 9),
Since it is easy to prepare a transparent solution, it is easy to create a transparent coating film and convenient to handle, and because it is a polymer, it is easy to create a film.
更に、窒化チタンに金属酸化物を共存させた複合セラミ
ック膜(実施例11)においては、安定かつ強度に優れ
た膜が形成され、また単なる窒化チタン膜の場合(実施
例1等)に比して、より破壊靭性に優れ、更に異なった
色彩(実施例6も同様)を発現することもできた。Furthermore, in the composite ceramic film in which titanium nitride and metal oxide coexisted (Example 11), a film with excellent stability and strength was formed, and compared to the case of a simple titanium nitride film (Example 1, etc.). As a result, it was possible to exhibit better fracture toughness and a different color (same as in Example 6).
尚、本発明においては、前記具体的実施例に示すものに
限られず、目的、用途に応じて本発明の範囲内で種々変
更した実施例とすることができる。It should be noted that the present invention is not limited to those shown in the above-mentioned specific embodiments, and may be modified in various ways within the scope of the present invention depending on the purpose and use.
窒化チタン系膜は高硬度で耐蝕性に優れかつ金色で美感
に優れた膜のため、本方法によればこのような有用な膜
を鉄系金属基体上に形成することができ、そのため高硬
度、耐蝕性及び美感に優れた被覆製品を製造できる。ま
た、金属基体は鉄系であり、安価かつ一般的なもののた
め、極めて利用範囲が広く、経済的でかつ大変有用であ
る。また本方法では所定の金属基体等を用いるので、低
温加熱で実施でき、また密着性に優れかつ仕上がり面の
美しい被膜を形成できる。また、本方法によれば、アン
モニア雰囲気と異なり、窒素雰囲気等の中で窒化チタン
系膜を形成できるので、毒性、腐食性、燃焼性の心配が
なく、極めて安全かつ安価に実施できる。また、本方法
ではゾルゲル法を用いるので、PVD法等のような特殊
で高価な装置を必要としない。従って取扱いが簡便で、
製造コストも安くでき、大型若しくは複雑な基体を用い
ても均一かつ確実に被膜を形成できる。Titanium nitride film has high hardness, excellent corrosion resistance, and is golden in color and has an excellent aesthetic appearance. According to this method, such a useful film can be formed on an iron-based metal substrate. , it is possible to produce coated products with excellent corrosion resistance and aesthetic appearance. In addition, the metal base is iron-based and is inexpensive and common, so it has an extremely wide range of applications, is economical, and is very useful. Furthermore, since this method uses a predetermined metal substrate, it can be carried out at low temperature heating, and a film with excellent adhesion and a beautiful finished surface can be formed. Further, according to this method, unlike an ammonia atmosphere, a titanium nitride film can be formed in a nitrogen atmosphere or the like, so there is no concern about toxicity, corrosivity, or combustibility, and the method can be carried out extremely safely and inexpensively. Further, since this method uses a sol-gel method, special and expensive equipment such as PVD method is not required. Therefore, it is easy to handle,
Manufacturing costs can be reduced, and a coating can be formed uniformly and reliably even when using a large or complicated substrate.
更ニ、ジルコニウムアルコキシドを含む混合溶液を用い
ることにより、同様に複合セラミックからなる窒化チタ
ン系膜を形成することができるため、単なる窒化チタン
膜にない特性を容易に賦与することもでき、更に色彩感
の異なる金色を賦与することもできる。Furthermore, by using a mixed solution containing zirconium alkoxide, it is possible to form a titanium nitride film made of composite ceramic in the same way, so it is possible to easily impart properties not found in a simple titanium nitride film, and furthermore, it is possible to form a titanium nitride film made of a composite ceramic. It is also possible to give different shades of gold.
以上より、膜形成条件を種々選択することにより、目的
、用途に応じた被膜を形成でき、その利用範囲は極めて
広い。As described above, by selecting various film-forming conditions, a film can be formed depending on the purpose and use, and its range of use is extremely wide.
図は実施例1において被膜面のX線回折結果を示すグラ
フである。The figure is a graph showing the X-ray diffraction results of the coating surface in Example 1.
Claims (1)
ウムアルコキシドの加水分解物を含む加水分解液(II)
、又は、チタニウムアルコキシド及びチタニウムアルコ
キシドの加水分解物のうちの少なくとも一方を50モル
%以上含みかつジルコニウムアルコキシドを含む混合溶
液(III)を、0.04〜4.2重量%の炭素を含む鉄
系金属基体の表面に塗布し、乾燥し、次いで窒素を主体
とする不活性雰囲気中で850〜1100℃に加熱する
ことを特徴とする窒化チタン系膜の形成方法。(1) Titanium alkoxide solution (I), hydrolyzate containing titanium alkoxide hydrolyzate (II)
Or, the mixed solution (III) containing at least 50 mol% of titanium alkoxide and a hydrolyzate of titanium alkoxide and zirconium alkoxide is mixed into an iron-based solution containing 0.04 to 4.2% by weight of carbon. 1. A method for forming a titanium nitride film, which comprises coating the surface of a metal substrate, drying it, and then heating it to 850 to 1100°C in an inert atmosphere mainly containing nitrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32177889A JPH03183783A (en) | 1989-12-11 | 1989-12-11 | Formation of titanium nitride type film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32177889A JPH03183783A (en) | 1989-12-11 | 1989-12-11 | Formation of titanium nitride type film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03183783A true JPH03183783A (en) | 1991-08-09 |
| JPH0549754B2 JPH0549754B2 (en) | 1993-07-27 |
Family
ID=18136323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32177889A Granted JPH03183783A (en) | 1989-12-11 | 1989-12-11 | Formation of titanium nitride type film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03183783A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19506579A1 (en) * | 1995-02-24 | 1996-08-29 | Fraunhofer Ges Forschung | Forming titanium nitride layer on substrate using CVD |
| JP2006027941A (en) * | 2004-07-14 | 2006-02-02 | Univ Kanagawa | Method for manufacturing nitride thin film |
| JP2013244534A (en) * | 2012-05-29 | 2013-12-09 | Toyota Motor Corp | Method of surface treatment and facing agent |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02259080A (en) * | 1989-03-31 | 1990-10-19 | Shoei Chem Ind Co | Method of forming metal nitride thin film |
-
1989
- 1989-12-11 JP JP32177889A patent/JPH03183783A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02259080A (en) * | 1989-03-31 | 1990-10-19 | Shoei Chem Ind Co | Method of forming metal nitride thin film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19506579A1 (en) * | 1995-02-24 | 1996-08-29 | Fraunhofer Ges Forschung | Forming titanium nitride layer on substrate using CVD |
| JP2006027941A (en) * | 2004-07-14 | 2006-02-02 | Univ Kanagawa | Method for manufacturing nitride thin film |
| JP2013244534A (en) * | 2012-05-29 | 2013-12-09 | Toyota Motor Corp | Method of surface treatment and facing agent |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0549754B2 (en) | 1993-07-27 |
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