JPH03183793A - Stripe-plating device - Google Patents
Stripe-plating deviceInfo
- Publication number
- JPH03183793A JPH03183793A JP32090289A JP32090289A JPH03183793A JP H03183793 A JPH03183793 A JP H03183793A JP 32090289 A JP32090289 A JP 32090289A JP 32090289 A JP32090289 A JP 32090289A JP H03183793 A JPH03183793 A JP H03183793A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plated
- plating solution
- tank
- strip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、めっき液噴射方式によるストライプめっき条
の製造装置の改良に関し、とくにめっき作業の際にめっ
き液が走行する被めっき条に付着して持ち出されめっき
面以外を汚染することを防止可能に構成してなるめっき
装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an improvement in an apparatus for producing striped plating strips using a plating solution injection method, and in particular, the present invention relates to an improvement in an apparatus for producing striped plating strips using a plating solution injection method, and in particular, to prevent the plating solution from adhering to the stripes to be plated as it travels during plating work. The present invention relates to a plating apparatus configured to prevent contamination of surfaces other than the plating surface when the plating apparatus is taken out.
[従来の技術]
IC用のリードフレームなど電子部品材料には高い信頼
性が要求され、その接合面や電気的接点などには金など
の高価な貴金属等のめっきを施したり、IC#f載やワ
イヤボンディングを容易にするための半田めっきをした
りしておくのが通常である。[Prior art] Electronic component materials such as lead frames for ICs are required to have high reliability, and their bonding surfaces and electrical contacts are plated with expensive precious metals such as gold. It is usual to apply solder plating to facilitate wire bonding.
ストライプめっきは、そのような貴金属あるいは半田等
を必要最小限の範囲にめっきし、材料の節減と併せて原
価の低減を図るべく開発されたものである。Stripe plating was developed to plate such precious metals, solder, etc. to the minimum necessary range, and to save materials and reduce costs.
上記従来のストライプめっきは、被めっき条の被めっき
面だけを残して他の表面をすべてレジスト剤やマスキン
グテープなどでめっき液の浸入を遮断し、これをめっき
液中に浸漬して、被めっき面に電解液を撹拌噴射してめ
っきするのが一般的であった。In the conventional stripe plating described above, only the surface to be plated of the strip to be plated is left, all other surfaces are blocked from infiltration of the plating solution with a resist agent or masking tape, and then this is immersed in the plating solution. It was common to plate the surface by stirring and spraying an electrolyte onto the surface.
しかし、このような従来方法においては被めつき部組外
をマスキングテープによりマスクするため、めっき面の
広さに比べて多くのマスキングテープが必要となり、割
高になることは避けられない上、めっき液の持出しが多
く、また、被めっき部組外をすべてマスキングしたもの
をめっき槽内やガイドロールを通過させると、通過の除
液めっき条のスリット端部のパリなどによって破れを生
ずることがあり、そのため破れ部分からめっき液が浸透
して置換めっきを起し、外観不良の原因となることがあ
った。However, in this conventional method, the outside of the plated part is masked with masking tape, so a large amount of masking tape is required compared to the size of the plated surface, which is unavoidably expensive. If a large amount of liquid is carried out, and if the parts to be plated are entirely masked and passed through the plating tank or guide rolls, breakage may occur due to cracks at the slit ends of the liquid removal plating strips. As a result, the plating solution penetrates through the torn portion, causing displacement plating, which may cause poor appearance.
そこで発明者らは先に第2および3図に示すようなめっ
き装置を提案した。Therefore, the inventors previously proposed a plating apparatus as shown in FIGS. 2 and 3.
すなわち、被めっき条20を広巾面を垂直に維持して長
手方向に摺動走行させ、被めっき面21を残してマスキ
ングテープ22により別途マスキング工程で最少限に部
分マスキングしておき、めっき液槽4内に貯溜されてい
るめっき液2をボン15により図中矢印のように強制循
環せしめ、時的に補助槽6に貯溜したのち、加圧された
めつき液をノズル3から前記被めっき面21に噴射する
。ノズル3の外周には前記被めっき条のマスキングテー
プ22で区分されている被めっき面21の巾より幾分広
い間隔を有するかあるいはその内径寸法がマスキングテ
ープ22に十分接する開口面を形成する外套1が設けら
れており、この外套1とノズル3との間あるいは液槽4
への入口には回収ロアが形成されていて、めっき液槽4
の上部において吸引ポンプ8により排気し、めっき液槽
4内が負圧にされることにより前記被めっき面21に噴
射されためっき液は前記回収ロアによって吸引され、当
該余剰のめっき液2はめっき液m4に吸引回収される。That is, the strip 20 to be plated is slid in the longitudinal direction while keeping its wide surface vertical, and the surface 21 to be plated is left and is partially masked to the minimum using a masking tape 22 in a separate masking step. The plating solution 2 stored in the plating tank 4 is forced to circulate as shown by the arrow in the figure using a bong 15, and is temporarily stored in an auxiliary tank 6, after which the pressurized plating solution is passed through the nozzle 3 to the surface to be plated 21. Inject to. On the outer periphery of the nozzle 3 is a mantle having an interval somewhat wider than the width of the surface to be plated 21 divided by the masking tape 22 of the strip to be plated, or having an opening surface whose inner diameter is in sufficient contact with the masking tape 22. 1 is provided between the mantle 1 and the nozzle 3 or a liquid tank 4.
A collection lower is formed at the entrance to the plating solution tank 4.
The plating solution is evacuated by the suction pump 8 at the upper part of the plating tank 4, and the inside of the plating solution tank 4 is made negative pressure, so that the plating solution sprayed onto the surface to be plated 21 is sucked by the recovery lower, and the excess plating solution 2 is removed from the plating tank 4. It is sucked and collected into liquid m4.
補助槽6は、前記めっき液の噴射のための加圧の安定化
と陽極材10の設置のために設けられたものであり、加
圧されためっき液2が補助槽6内に一時的に加圧状態で
貯溜され、ノズル3を介して噴射されるものである。The auxiliary tank 6 is provided to stabilize the pressure for spraying the plating solution and to install the anode material 10, and the pressurized plating solution 2 is temporarily stored in the auxiliary tank 6. It is stored under pressure and is injected through a nozzle 3.
なお、第2図は補助槽6をめっき液槽4の外部に設置し
、開rR119を開閉可能に構成することで陽極材10
の設置交換を容易化した例を示したものであり、第3図
はめっき液槽4内に隔!!11を設けることによりめっ
き液槽4内の負圧化させる空taffが狭くなるように
して、吸引ポンプ8の吸引容量を小さくしても必要な負
圧を十分得られるように構成した例を示したものである
。In addition, in FIG. 2, the auxiliary tank 6 is installed outside the plating solution tank 4, and the anode material 10 is configured so that the opening rR119 can be opened and closed.
Figure 3 shows an example where the installation and replacement of the plating solution tank 4 is simplified. ! 11 is provided so that the empty taff for creating a negative pressure in the plating liquid tank 4 is narrowed, so that even if the suction capacity of the suction pump 8 is reduced, the necessary negative pressure can be obtained sufficiently. It is something that
[発明が解決しようとするg!題]
上記既提案の装置によりすぐれたストライプめっきを行
なうことができ、すでに実用化されて好評を得ているが
、めっき面に噴射させためっき液については、負圧吸引
によりめっき槽内部に回収せしめるための前記吸引手段
を有しているものの、それによってめっき面に噴射した
めっき液を完全に回収せしめる事は不可能であり、外套
の開口面に接触摺動走行しめっきされた後、僅に付着し
ためつき液が外套の端縁によって被めっき条の上下に押
し拡げられる恰好で浸散し、めっき部組外を汚染させた
り、めっきにじみを生じさせたりする原因となることが
ある。[The invention tries to solve g! [Issue] The previously proposed device described above can perform excellent stripe plating, and has already been put into practical use and has been well received. However, the plating solution sprayed onto the plating surface is collected inside the plating tank by negative pressure suction. However, it is impossible to completely recover the plating solution sprayed onto the plating surface, and it is difficult to completely recover the plating solution sprayed onto the plating surface. The tamping liquid attached to the casing may be spread upward and downward on the plating strip by the edge of the mantle and spread, causing contamination of the outside of the plating area or causing plating smearing.
本発明の目的は、上記したような従来技術の欠点を解消
し、めっき部組外のめっき液による汚染及びめっきにじ
み等のない、より高品質のストライプめっき条をy13
f!シ得る新規なめつき装置を提供しようとするもので
ある。The purpose of the present invention is to eliminate the drawbacks of the prior art as described above, and to provide a stripe plating strip of higher quality that is free from contamination by plating solution outside the plating section and plating bleeding, etc.
f! The present invention is intended to provide a new licking device that can be used in various ways.
[課題を解決するための手段]
本発明は、めっき液槽内のめつき液をめっき面に向って
噴射するノズルと該ノズルの周囲を区画してめっき開口
面を形成する外套と、めつき槽の内部を負圧とし噴射し
ためつき液をめつき槽内に回収せしめるための吸引手段
とを有し、前記外套の開1]面に被めっき条を摺動走行
させて被めっき面にめっきをする装置において、外套端
縁の被めっき条の長手方向側の端縁にめっき面の巾より
大きい内申を有する外気を導入し得る小間隙口を形成し
たものである。[Means for Solving the Problems] The present invention provides a nozzle for injecting a plating solution in a plating solution tank toward a plating surface, a mantle that partitions the periphery of the nozzle to form a plating opening surface, and a plating method. and a suction means for making the inside of the tank a negative pressure and collecting the injected plating liquid into the plating tank, and sliding the strip to be plated on the open surface of the mantle to coat the surface to be plated. In a plating device, a small gap opening is formed at the end edge of the mantle on the longitudinal side of the strip to be plated, through which outside air having an internal diameter larger than the width of the plating surface can be introduced.
[作用]
外套端縁の被めっき条が走行する長手方向側の端縁に外
気を導入し得る小間隙口を形成しておけば、めっき面に
残存付着した僅かなめっき液がこの小間隙口でめっき検
測の負圧によりめつき槽内側にすすり込まれる形となっ
て残存付着しためつき液が回収される一方、外套の端縁
に間隙があれば従来例のように当該端縁をもって被めっ
き面を擦する作用もなくなることになり、従来例におけ
るように残存付着しためっき液が被めっき条の上下に押
し拡げられ理数せしめられる作用も解消され、めっき液
による汚染やめっきにじみの原因となるものが一切M消
されることになり、常に正常なめっきを安定して行なう
ことが可能となる。[Function] If a small gap is formed at the edge of the mantle on the longitudinal side along which the strip to be plated runs, a small gap through which outside air can be introduced will allow the small amount of plating solution remaining on the plated surface to flow into the small gap. The remaining adhering plating liquid is collected by being sucked into the inside of the plating tank by the negative pressure of the plating inspection, and if there is a gap at the edge of the mantle, it is removed by holding the edge as in the conventional case. This eliminates the effect of rubbing the surface to be plated, and eliminates the effect of the remaining plating solution being spread above and below the plated strips, which is the cause of contamination by the plating solution and bleeding of the plating, as in the conventional case. This means that all of the particles that become M are removed, making it possible to consistently perform normal plating at all times.
[実施例] 以下に、本発明について実施例図面を参照し説明する。[Example] The present invention will be described below with reference to the drawings.
第1図は、本発明に係るめっき装置の外套部間口面IA
近傍の具体的構成例を示す説明斜視図である。FIG. 1 shows the frontage surface IA of the outer mantle of the plating apparatus according to the present invention.
FIG. 2 is an explanatory perspective view showing a specific example of a nearby structure.
既に説明したように、−時的に補助1ff6に貯溜され
、加圧されためっき液がノズル3から被めっき而21に
噴射される。As already explained, the pressurized plating solution is temporarily stored in the auxiliary 1ff6 and is injected from the nozzle 3 onto the plated object 21.
ノズル3の外周には被めっき条のマスキングテープ22
で区分されている被めっき面21の111より幾分広い
間隔を有する開口面(円筒型であれば内径寸法がマスキ
ングテープ22に十分に接する開口面)IAを有する外
套1が設けられており、前述のように最少限の表面が部
分マスキグテ−122によりマスキングされ、被めっき
面21を形成した被めっき条20が当該外套1の端縁1
1に接触し摺動走行しつつ図中矢印方向に移動し、この
走行移動の間に前記ノズル3より噴射されためっき液に
より被めっき面21にストライプめっきが行なわれる。Masking tape 22 to be plated is placed on the outer periphery of the nozzle 3.
The jacket 1 is provided with an opening surface (in the case of a cylindrical type, an opening surface whose inner diameter dimension sufficiently contacts the masking tape 22) IA having a somewhat wider interval than 111 of the surface to be plated 21 divided by, As mentioned above, the minimum surface is masked by the partial masking tape 122, and the plated strip 20 forming the plated surface 21 is attached to the edge 1 of the mantle 1.
1 and moves in the direction of the arrow in the figure while sliding, and during this running movement, stripe plating is performed on the surface to be plated 21 with the plating solution sprayed from the nozzle 3.
このめっきの際に従来例においてはめっき液が少量残留
付着して持ち出され、それが外套の被めっき状の移動方
向の端縁11aにより擦すられることにで上下に理数さ
れ、汚染やめっきにじみの原因となっていた。During this plating, in the conventional example, a small amount of plating solution remains attached and is taken out, and it is rubbed up and down by the edge 11a of the outer coat in the moving direction of the plated shape, causing contamination and plating smearing. It was causing this.
本発明においては、この外套1の端縁の被めっき条が移
動する測〈被めっき条の長手方向側〉の端縁11aに外
気を導入し得る小間隙口12が形成される。In the present invention, a small gap opening 12 through which outside air can be introduced is formed at the end edge 11a of the mantle 1 on the longitudinal side of the plating strip along which the plating strip moves.
間隙口12の内rt1については、開口面IAの中いっ
ばいに形成するのが望ましいが、実用上はめっき面21
の巾より大であれば差支えはない。As for the inner part rt1 of the gap opening 12, it is desirable to form it in the middle of the opening surface IA.
There is no problem as long as it is larger than the width of .
この間隙口12の深さについては、先に説明した吸引ボ
ン18の吸引力とも関係があるが、要するに前記しため
っき表面に付着し持ち出されようとしている付着めっき
液を吸引ポンプ8による負圧力によって槽内側にすすり
込むことが出来ればよいのであり、余りに深さが大にす
ぎれば外気までも大量に吸い込んでしまい、めっき槽4
内部の負圧が2激に不十分となり、加圧噴射されている
めっき液がその加圧力によって間隙口12がら外部に流
出するような状態となり反って逆効果となる。The depth of this gap opening 12 is also related to the suction force of the suction bong 18 described earlier, but in short, the adhering plating liquid that has adhered to the plating surface and is about to be taken out is removed by the negative pressure of the suction pump 8. It is fine as long as it can soak into the inside of the plating tank, but if the depth is too large, a large amount of outside air will be sucked in and
The internal negative pressure becomes extremely insufficient, and the pressurized plating solution flows out through the gap opening 12 due to the pressurizing force, causing the opposite effect.
そのような液の流出を生ぜず、しかも付着めっき液を内
部間にすすり込むには、実用上1−以下の深さとするこ
とが望ましい。In order to prevent such liquid from flowing out and to allow the adhering plating liquid to sip between the interior spaces, it is practically desirable to have a depth of 1 mm or less.
小間隙口12は、第2図に示すように、被めっき条の走
行出口側の外套1の端縁11aに形成するのは当然であ
るが、めっき液の噴射圧力を考慮しかつ被めっき条の走
行速度をそれ程速くできないことをも考慮すれば、その
反対側すなわち被めっき条の入口側の端縁にも同様の小
間隙口を形成しておくことが望ましい。As shown in FIG. 2, the small gap opening 12 is naturally formed at the edge 11a of the mantle 1 on the running exit side of the strip to be plated. Considering that the traveling speed of the plating strip cannot be increased that much, it is desirable to form a similar small gap opening on the opposite side, that is, on the edge of the inlet side of the strip to be plated.
[発明の効果]
以上の通り、本発明に係るめっき装置によればめっき液
の持ち出しによるめっき条の汚染あるいはめっきにじみ
を十分に防止できストライプめっき条の品質向上に寄与
し得るばかりでなく、めっき液の持ち出し量が大巾に減
少する結果、めっき後の洗浄水のめっき液による汚染が
大巾に少なくなり、洗浄後の廃液処理を簡略化し得ると
いう副次的メリットをも期待することができる。[Effects of the Invention] As described above, the plating apparatus according to the present invention can sufficiently prevent contamination of the plating strip or bleeding of the plating due to removal of the plating solution, and can not only contribute to improving the quality of the stripe plating strip, but also improve the plating. As a result of the drastic reduction in the amount of liquid taken out, the contamination of the wash water after plating with the plating solution is greatly reduced, and the secondary benefit of simplifying the treatment of waste liquid after cleaning can be expected. .
第1図は本発明に係る装置の外套部間口面近傍の具体的
構成状況を示す説明図、第2および3図は既提案の2I
aのめっき装置の説明断面図である1:外套、
IA:外套部間口面、
3:ノズル、
6・補助槽、
11・外套部端縁、
12:外気導入小間隙口、
20:被めっき条、
2
:被めっき面、
22:マスキングチー1゜Fig. 1 is an explanatory diagram showing the specific configuration near the frontage of the mantle of the device according to the present invention, and Figs. 2 and 3 are the previously proposed 2I.
It is an explanatory cross-sectional view of the plating apparatus in a. 1: Mantle, IA: Mantle front surface, 3: Nozzle, 6. Auxiliary tank, 11. Mantle end edge, 12: Outside air introduction small gap, 20: Plating strip. , 2: Plated surface, 22: Masking chi 1°
Claims (1)
するノズルと該ノズルの周囲を区画してめっき開口面を
形成する外套と、めっき槽の内部を負圧とし噴射しため
っき液をめっき槽内に回収せしめるための吸引手段とを
有し、前記外套の開口面に被めっき条を摺動走行させて
被めっき面にめっきをする装置において、外套端縁の被
めっき条の長手方向側の端縁にめっき面の巾より大きい
内巾を有する外気を導入し得る小間隙口を形成してなる
ストライプめっき装置。(1) A nozzle that sprays the plating solution in the plating solution tank toward the plating surface, a jacket that partitions the area around the nozzle to form a plating opening surface, and a negative pressure inside the plating tank that sprays the plating solution. and a suction means for recovering the plating into the plating tank, and in the device for plating the surface to be plated by sliding the strip to be plated on the opening surface of the jacket, the longitudinal direction of the strip to be plated at the edge of the jacket. A stripe plating device in which a small gap opening, which has an inner width larger than the width of the plating surface and can introduce outside air, is formed on the side edge.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32090289A JPH03183793A (en) | 1989-12-11 | 1989-12-11 | Stripe-plating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32090289A JPH03183793A (en) | 1989-12-11 | 1989-12-11 | Stripe-plating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03183793A true JPH03183793A (en) | 1991-08-09 |
Family
ID=18126546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32090289A Pending JPH03183793A (en) | 1989-12-11 | 1989-12-11 | Stripe-plating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03183793A (en) |
-
1989
- 1989-12-11 JP JP32090289A patent/JPH03183793A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR930007059B1 (en) | Doping apparatus | |
| JP2965310B2 (en) | High speed pickling method and apparatus | |
| EP1314486B1 (en) | Cleaning device for a glue applying device | |
| US20070163886A1 (en) | Processing solution tank | |
| JPH03183793A (en) | Stripe-plating device | |
| CA2141604C (en) | Process for the electrolytic processing especially of flat items and arrangement for implementing the process | |
| JPH07275786A (en) | Intermittent application method | |
| JPH05345162A (en) | Coater | |
| JPS61270395A (en) | Electroplating method | |
| US5374795A (en) | Wire cut electric discharge machine | |
| JPH0211747A (en) | Continuous zinc hot dipping apparatus | |
| JPH02190495A (en) | Stripe plating device | |
| JP2623792B2 (en) | Stripe plating equipment | |
| JP3492771B2 (en) | Applicator for coating liquid on substrate | |
| JPS61195996A (en) | Liquid flow plating method | |
| JPH08103710A (en) | Substrate coating liquid coating device | |
| JPS62274092A (en) | Method and device for plating strips | |
| JP3416717B2 (en) | Automatic wire rope cleaning and recovery system | |
| JPH03191090A (en) | Horizontal electroplating device | |
| JPH02153091A (en) | stripe plating equipment | |
| JP3112554U (en) | Gate pump equipment | |
| JP2580810B2 (en) | Stripe plating equipment | |
| CN213538180U (en) | Industrial yarn is with oiling device | |
| JP3277993B2 (en) | Continuous molten metal plating equipment | |
| KR19980081273A (en) | Coating device and coating method |