JPH03184219A - Manufacture of electric contact material - Google Patents

Manufacture of electric contact material

Info

Publication number
JPH03184219A
JPH03184219A JP32451489A JP32451489A JPH03184219A JP H03184219 A JPH03184219 A JP H03184219A JP 32451489 A JP32451489 A JP 32451489A JP 32451489 A JP32451489 A JP 32451489A JP H03184219 A JPH03184219 A JP H03184219A
Authority
JP
Japan
Prior art keywords
weight
base material
wire
electric contact
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32451489A
Other languages
Japanese (ja)
Inventor
Hiroyoshi Inabe
稲辺 浩義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Electronic Components Ltd
Original Assignee
Seiko Electronic Components Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Electronic Components Ltd filed Critical Seiko Electronic Components Ltd
Priority to JP32451489A priority Critical patent/JPH03184219A/en
Publication of JPH03184219A publication Critical patent/JPH03184219A/en
Pending legal-status Critical Current

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  • Metal Extraction Processes (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture Of Switches (AREA)
  • Contacts (AREA)

Abstract

PURPOSE:To manufacture an electric contact material which has strong spring property and is hard to buckle by underplating a specified base material with Ni in a specified thickness, drawing the base material after it is plated with Au in a specified thickness, and heat-treating it. CONSTITUTION:A base material 1 consists of 30-40wt.% of Co, 10-20wt.% of Ni, 10-20wt.% of Cr, 2-10wt.% of W, 2-10wt.% of Mo, <=1wt.% of Ti, <=1wt.% of Mn, <=1wt.% of Si, and the rest Fe. A Ni film 2 with 0-10mum of plating thickness is formed on the base material 1 as an undercoating, and after a Au film 3 with 0-10mum of plating thickness is formed by plating Au, the base material is drawn and heated at 400-800 deg.C. In this way, mechanical strength, for example, tensile strength and transverse rupture coefficient of the obtained base material become as high as 180-220kg/mm<2> and 7800-8300kg/mm<2>, respectively and thus an electric contact material having strong spring property and being hard to buckle can be obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えばスイッチとして用いられるねじりばね
、及び摺動端子用の材料となるばね性の良く、安価な、
電気接点用材料とその製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention provides a torsion spring used as a switch, and an inexpensive material with good spring properties that can be used as a material for a sliding terminal.
This invention relates to materials for electrical contacts and methods of manufacturing the same.

〔従来の技術〕[Conventional technology]

従来、電気接点用材料としては、Au合金、Ag合金、
pt合金等貴金属材が使用され第1表に示すような特性
が得られていた。
Conventionally, materials for electrical contacts include Au alloy, Ag alloy,
A noble metal material such as a PT alloy was used, and the properties shown in Table 1 were obtained.

第1表は、従来の電気接点用材料の機械的強さ。Table 1 shows the mechanical strength of conventional electrical contact materials.

第  1  表 〔発明が解決しようとする課題〕 ところが、上述したごときの従来の電気接点用材料では
、価格が高く、また、接点として使用する場合、線その
もののばね性が弱く、へたり易いといった課題がある。
Table 1 [Problems to be Solved by the Invention] However, the conventional materials for electrical contacts as described above are expensive, and when used as contacts, the wire itself has weak springiness and tends to buckle easily. There are challenges.

この発明は、上記課題を解決した、電気接点用材料とそ
の製造方性を提供することを目的とする。
An object of the present invention is to provide a material for an electrical contact and a method for manufacturing the same, which solves the above-mentioned problems.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために、その母材として、Co:3
0〜40重量% Ni:10〜20重量%、Cr:10
〜20重量%、W:2〜10重量%、Mo : 2〜1
0重量%、Ti11重量%以下。
In order to achieve the above purpose, Co:3 is used as the base material.
0-40% by weight Ni: 10-20% by weight, Cr: 10
~20% by weight, W: 2-10% by weight, Mo: 2-1
0% by weight, Ti 11% by weight or less.

Mn:1重量%以下、Si:1重量%以下残部がFeか
らなる母材に、Niを下地として、0〜10μmメッキ
し、その上にAuを1〜10μmメッキした後に、引き
抜き加工し、400〜800℃で熱処理することにより
、価格的に安価で、ばね性の良い電気接点用材料を得て
、提供するものである。
Mn: 1% by weight or less, Si: 1% by weight or less A base material of which the balance is Fe is plated with Ni as a base to a thickness of 0 to 10 μm, and then Au is plated to a thickness of 1 to 10 μm, followed by drawing. By heat treatment at ~800°C, an inexpensive material for electrical contacts with good spring properties is obtained and provided.

〔作用〕[Effect]

母材にAuメッキを施した後、引き抜き加工をするとい
う加工工程をとることにより、メッキ加工時間が少なく
、価格的に安価な、電気接点用材料を提供することがで
きる。
By performing a drawing process after applying Au plating to the base material, it is possible to provide an electrical contact material that requires less plating time and is inexpensive.

母材の機械的強さが、引張り強さ180〜220kg/
開2、横断性係数7800〜8300kg/mm2であ
るために、ばね性か強く、へたりにくい電気接点材料を
提供することができる。
The mechanical strength of the base material is tensile strength of 180 to 220 kg/
Since it has an openness of 2 and a transverse coefficient of 7,800 to 8,300 kg/mm2, it is possible to provide an electrical contact material that has strong spring properties and is resistant to fading.

〔実施例〕〔Example〕

以下、本発明を好ましい例として、高精度ポテンショメ
ータの摺動接点用のバネ細線を得る実施例で図面に基づ
いて説明する。第1図は、メッキ上りの線材の断面図、
第2図は、引き抜き加工時のダイス部の断面図、第3図
は、引き抜き加工後の線材の断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings as a preferred example, in which a fine spring wire for a sliding contact of a high-precision potentiometer is obtained. Figure 1 is a cross-sectional view of the plated wire;
FIG. 2 is a sectional view of the die part during drawing, and FIG. 3 is a sectional view of the wire after drawing.

母材として、以下にしめす組成のCo基合金を使用する
。Co:30〜40重量%、Ni:10〜20重量%、
Cr:10〜20重量%、W:2〜10重量%、Mo 
: 2〜I 0重量%、Ti11重量%以下、Mn:1
重量%以下、5il1重量%以下、残部をFe。
A Co-based alloy having the composition shown below is used as the base material. Co: 30-40% by weight, Ni: 10-20% by weight,
Cr: 10-20% by weight, W: 2-10% by weight, Mo
: 2-I 0% by weight, Ti 11% by weight or less, Mn: 1
5il 1% by weight or less, the balance being Fe.

上記に示す線を、800℃〜1200℃で溶体化処理し
、線のくせを矯正するためのスキンバス引き抜き加工を
行なう。この母材の線径は、100〜300μmである
The wire shown above is subjected to solution treatment at 800° C. to 1200° C., and skin bath drawing processing is performed to correct the curl of the wire. The wire diameter of this base material is 100 to 300 μm.

その後、Niを下地として、0〜10μmメッキし、そ
の上にAuを1〜10μmメッキする。
Thereafter, Ni is used as a base plate and plated to a thickness of 0 to 10 μm, and then Au is plated to a thickness of 1 to 10 μm.

第1図は、メッキ上りの線材の横断面図であり、1はC
o基合金2はNi膜、3はAu膜をしめす。
Figure 1 is a cross-sectional view of a plated wire, and 1 is a C
O-based alloy 2 is a Ni film, and 3 is an Au film.

この素線を約65μmまで細線化する引き抜き加工は、
減面率3〜15%で50〜99%の加工率とする。サプ
ライボビンより繰り出された素線を、引き抜きダイスを
10〜30個程度使用して、引き抜き加工し、巻き取り
ボビンに巻き取る。第2図は、引き抜き加工時のダイス
部の縦断面図であり、図示のようにダイス4は、その全
体が潤滑油5に覆われ、素線は潤滑油の中を矢示aの方
向引き抜かれ細線化していく。第3図は、引き抜き加工
後の線材の断面図で何回かの工程で結果的に数10μm
の細線となる。
The drawing process that thins this wire to about 65 μm is
A processing rate of 50 to 99% is achieved with an area reduction rate of 3 to 15%. The wire unwound from the supply bobbin is drawn using about 10 to 30 drawing dies, and then wound onto a take-up bobbin. FIG. 2 is a longitudinal cross-sectional view of the die part during drawing processing, and as shown in the figure, the die 4 is entirely covered with lubricating oil 5, and the wire is pulled through the lubricating oil in the direction of arrow a. It is pulled out and becomes a thin line. Figure 3 is a cross-sectional view of the wire after drawing, resulting in several tens of μm in several steps.
It becomes a thin line.

このようにして加工したAuグラッドCo基合金線を、
400〜800℃で熱処理すると、引張り強さが、18
0〜220kg/m+*2横断性係数7800〜830
0kg/mm2の機械的強さを有する。
The Au-glad Co-based alloy wire processed in this way is
When heat treated at 400-800℃, the tensile strength increases to 18
0~220kg/m+*2 Transverse coefficient 7800~830
It has a mechanical strength of 0 kg/mm2.

〔発明の効果〕〔Effect of the invention〕

本考案によれば次のような利点がある。 The present invention has the following advantages.

(ア)Auメッキ加工後、引き抜き加工をするというこ
とで、Co基合金線の重量に比べて、Au膜厚の重量が
非常に小さくなり、価格的に安価な電気接点用材料を提
供することができる。
(a) By performing drawing processing after Au plating, the weight of the Au film is extremely small compared to the weight of the Co-based alloy wire, thereby providing a material for electrical contacts that is inexpensive. I can do it.

(イ)母材の機械的強さが、引っ張り強さ180〜22
0 kg/ +1111’ 、伸び1〜3%、ビッカー
ス硬さ400〜500.横弾性係数7700〜8300
kg/關2であるため、ばね性が強く、へたりにくい電
気接点用材料を提供することができる。
(a) The mechanical strength of the base material is tensile strength of 180 to 22
0 kg/+1111', elongation 1-3%, Vickers hardness 400-500. Transverse elastic modulus 7700-8300
kg/2, it is possible to provide a material for electrical contacts that has strong spring properties and is resistant to fading.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、メッキ上りの素線の断面図、第2図は、引き
抜き加工時のダイス部の断面図、第3図は、引き抜き加
工後の線材の断面図である。 ・Co基合金 ・Ni膜 ・Au膜 ・引き抜きダイス ・液体潤滑油
FIG. 1 is a sectional view of the plated wire, FIG. 2 is a sectional view of the die part during drawing, and FIG. 3 is a sectional view of the wire after drawing.・Co-based alloy ・Ni film ・Au film ・Drawing die ・Liquid lubricating oil

Claims (1)

【特許請求の範囲】[Claims] 接点性とばね性を具備したAuクラッドCo基合金線と
その製造方法において、Co:30〜40重量%、Ni
:10〜20重量%、Cr:10〜20重量%、W:2
〜10重量%、Mo:2〜10重量%、Ti:1重量%
以下、Mn:1重量%以下、Si:1重量%以下残部が
Feからなる母材に、Niを下地として、0〜10μm
メッキし、その上にAuを1〜10μmメッキした後に
、引き抜き加工し、400〜800℃で熱処理すること
を特徴とする電気接点用材料の製造方法。
In the Au-clad Co-based alloy wire having contact properties and spring properties and its manufacturing method, Co: 30 to 40% by weight, Ni
: 10-20% by weight, Cr: 10-20% by weight, W: 2
~10% by weight, Mo: 2-10% by weight, Ti: 1% by weight
Hereinafter, on a base material consisting of Mn: 1% by weight or less, Si: 1% by weight or less and the balance being Fe, 0 to 10 μm thick
A method for manufacturing an electrical contact material, which comprises plating, plating Au to a thickness of 1 to 10 μm, and then drawing it and heat treating it at 400 to 800°C.
JP32451489A 1989-12-13 1989-12-13 Manufacture of electric contact material Pending JPH03184219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32451489A JPH03184219A (en) 1989-12-13 1989-12-13 Manufacture of electric contact material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32451489A JPH03184219A (en) 1989-12-13 1989-12-13 Manufacture of electric contact material

Publications (1)

Publication Number Publication Date
JPH03184219A true JPH03184219A (en) 1991-08-12

Family

ID=18166650

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32451489A Pending JPH03184219A (en) 1989-12-13 1989-12-13 Manufacture of electric contact material

Country Status (1)

Country Link
JP (1) JPH03184219A (en)

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