JPH03184687A - Laser beam machining apparatus - Google Patents

Laser beam machining apparatus

Info

Publication number
JPH03184687A
JPH03184687A JP1323973A JP32397389A JPH03184687A JP H03184687 A JPH03184687 A JP H03184687A JP 1323973 A JP1323973 A JP 1323973A JP 32397389 A JP32397389 A JP 32397389A JP H03184687 A JPH03184687 A JP H03184687A
Authority
JP
Japan
Prior art keywords
laser
laser beams
total reflection
laser beam
reflection mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1323973A
Other languages
Japanese (ja)
Inventor
Masaharu Moriyasu
雅治 森安
Masatake Hiramoto
平本 誠剛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1323973A priority Critical patent/JPH03184687A/en
Publication of JPH03184687A publication Critical patent/JPH03184687A/en
Pending legal-status Critical Current

Links

Landscapes

  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To enable machinings at multiple points at the same time with a laser beam by adjusting an angle and horizontal position adjusting means arranged at beam splitters and a total reflecting mirror and a vertical position adjusting means arranged at an optical element. CONSTITUTION:In a laser beam machining apparatus for radiating plural laser beams to the multiple places at the same time, the beam splitters 2a, 2b having each angle and horizontal directional position adjusting means, the total reflecting mirror 3 and condenser lens 4 having the vertical directional position adjusting means condensing plural beams reflected from these are provided and plural laser beams condensed by the condenser lens 4 are projected at the desired interval on the straight line at the same time. By this method, multiple machining points can be machined on a work at the same time.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、レーザビームを用いて複数の加工線又は加工
点を同時に加工するレーザ加工装置に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a laser processing device that simultaneously processes a plurality of processing lines or processing points using a laser beam.

[従来の技術] 第3図は例えば特公昭62−58832号公報に開示さ
れた2列を同時に加工できる従来のレーザ加工装置の一
例を示す縦断面図である。図において、(1)はレーザ
発振器(図示せず)から取出されたレーザビーム、(2
〉はレーザビーム(1)を分配するためのビームスプリ
ッタ、(3〉は第1の全反射鏡である。(4a) 、 
(4b)はビームスプリッタ(2〉及び全反射鏡(3)
で反射したレーザビーム(la) 、 (lb)を加工
に必要なパワー密度に集光させる集光レンズ、(5) 
、 (6)はそれぞれガスノズル、(7a) 、 (7
b)は第2の全反射鏡、(8)は第3の全反射鏡、(9
〉は加工ヘッドである。また、(10)は被加工物、(
11)は被加工物(lO)が載置されたバックブーレト
である。
[Prior Art] FIG. 3 is a longitudinal cross-sectional view showing an example of a conventional laser processing apparatus that can simultaneously process two rows, as disclosed in, for example, Japanese Patent Publication No. 62-58832. In the figure, (1) is a laser beam extracted from a laser oscillator (not shown), (2)
> is a beam splitter for distributing the laser beam (1), (3> is the first total reflection mirror. (4a),
(4b) is a beam splitter (2) and a total reflection mirror (3)
(5) a condenser lens that condenses the laser beams (la) and (lb) reflected by the laser beams to the power density necessary for processing;
, (6) are gas nozzles, (7a) and (7
b) is the second total reflection mirror, (8) is the third total reflection mirror, (9
> is the processing head. In addition, (10) is the workpiece, (
11) is a back boulet on which the workpiece (lO) is placed.

(12a)、 (12b)は集光レンズ(4a) 、(
4b)の上下微動機構、(I3〉は第3の全反射鏡(8
)の上下微動機構、(14)は加工ヘッド(9)の上下
移動機構である。
(12a), (12b) are condensing lenses (4a), (
4b) vertical fine movement mechanism, (I3> is the third total reflection mirror (8
) is a vertical fine movement mechanism, and (14) is a vertical movement mechanism for the processing head (9).

次に作用について説明する。まず、レーザビーム(1)
はビームスプリッタ(2)により2分割される。分割さ
れたそれぞれのレーザビーム(la)、(lb)は、ビ
ームスプリッタ(2)及び第1の全反射鏡〈3)により
折り曲げられ、2本の平行なレーザビーム(la) 、
 (lb)となる。2本の平行なレーザビーム(la)
 、 (lb)はそれぞれ集光レンズ(4a) 、 (
4b)によって集束され、それぞれその集光途中にある
第2の全反射’a (7a) 、 (7b)により光軸
方向が変えられる。さらに、2本のレーザビーム(la
) 、 (lb)は第3の全反射鏡(8)により全反射
され、互いに平行して鉛直方向に進む2本の集光された
レーザビーム(le) 、 (ld)となる。この2本
の集光されたレーザビーム(le) 、 (ld)の間
隔は、第3の全反射鏡(8)の上下微動機構(13)に
より調整される。また、その焦点はそれぞれの集光レン
ズ(4a) 、 <4b)を上下微動機構(12a) 
、 (12b)により上下動することにによって調整さ
れる。このようにして、レーザビーム(1)の間隔や焦
点位置を調整して被加工物(10)にレーザビーム(l
e) 、(ld)を照射し、溶接や切断などの加工を行
なう。
Next, the effect will be explained. First, laser beam (1)
is divided into two by a beam splitter (2). The divided laser beams (la) and (lb) are bent by a beam splitter (2) and a first total reflection mirror (3), forming two parallel laser beams (la),
(lb). Two parallel laser beams (la)
, (lb) are condenser lenses (4a) and (lb), respectively.
4b), and the direction of the optical axis is changed by the second total reflection 'a (7a) and (7b) in the middle of the focusing, respectively. Furthermore, two laser beams (la
), (lb) are totally reflected by the third total reflection mirror (8) and become two condensed laser beams (le), (ld) that travel parallel to each other in the vertical direction. The interval between these two focused laser beams (le) and (ld) is adjusted by the vertical fine movement mechanism (13) of the third total reflection mirror (8). In addition, the focus is adjusted by moving the respective condensing lenses (4a) and <4b) up and down using a fine movement mechanism (12a).
, (12b) by moving up and down. In this way, by adjusting the interval and focal position of the laser beam (1), the laser beam (l) is applied to the workpiece (10).
e) , (ld) is irradiated to perform processing such as welding and cutting.

【発明が解決しようとする課題] 上記のように構成した従来のレーザ加工装置によれば、
集光レンズ(4a) 、(4b)とレーザビーム(lc
) 、 (ld)焦点との間のレーザビームの光路上に
、そそれぞれ2枚ずつの全反射鏡(第2の全反射鏡(7
a) 、(7b)と第3の全反射鏡(8))が挿入され
ているので、レーザ照射点(加工点) (10a)、(
10b)と全反射鏡の距離が短かくなり、2本のレーザ
ビーム(le) 、(ld)の間隔を小さくすればする
ほどこの距離が短くなるため、全反射鏡が汚れて実用的
には使用できないという問題があった。また、この装置
では原理上2本のレーザビームを設けるのが限界であり
、3本以上のレーザビームで加工することはできなかっ
た。
[Problems to be Solved by the Invention] According to the conventional laser processing apparatus configured as described above,
Condensing lenses (4a), (4b) and laser beam (lc
), (ld) Two total reflection mirrors (second total reflection mirror (7)) are placed on the optical path of the laser beam between the focus and the
a), (7b) and the third total reflection mirror (8)) are inserted, so the laser irradiation point (processing point) (10a), (
10b) and the total reflection mirror becomes shorter, and the smaller the distance between the two laser beams (le) and (ld), the shorter this distance becomes, so the total reflection mirror gets dirty and becomes impractical. There was a problem that it could not be used. Further, in principle, this device is limited to two laser beams, and processing cannot be performed using three or more laser beams.

本発明は、上記のような課題を解決するためになされた
もので、簡便で光学部品の汚染が少なく、加工線(又は
加工点)の間隔を狭くすることができ、かつ加工線の数
が3本以上でも使用できるレーザ加工装置を得ることを
目的とする。
The present invention was made to solve the above-mentioned problems, and is simple, reduces contamination of optical components, narrows the interval between processing lines (or processing points), and reduces the number of processing lines. The object of the present invention is to obtain a laser processing device that can be used with three or more laser beams.

[課題を解決するための手段] 本発明に係るレーザ加工装置は、それぞれ角度及び水平
方向の位置調整手段を有する少なくとも1個のビームス
プリッタ及び全反射鏡と、上下方向の位置調整手段を有
し、これらビームスプリッタと全反射鏡で反射した複数
のレーザビームをそれぞれ集光させる光学素子とを備え
、光学素子で集光された複数のレーザビームを直線上又
は同一平面上に所望の間隔で同時に照射するようにした
ものである。
[Means for Solving the Problems] A laser processing apparatus according to the present invention includes at least one beam splitter and a total reflection mirror each having an angular and horizontal position adjustment means, and a vertical position adjustment means. , is equipped with these beam splitters and an optical element that focuses the plurality of laser beams reflected by the total reflection mirror, so that the plurality of laser beams focused by the optical element can be simultaneously aligned at desired intervals in a straight line or on the same plane. It is designed to irradiate.

[作 用] 被加工物に所望の間隔で複数のレーザビームを同時に照
射することにより、複数の加工線又は加工点を同時に加
工する。
[Operation] By simultaneously irradiating a workpiece with a plurality of laser beams at desired intervals, a plurality of processing lines or processing points are processed simultaneously.

上記レーザビームの間隔は、ビームスプリッタ及び全反
射鏡に設けた角度及び水平方向の位置調整手段と、光学
素子に設けた上下方向の位置調整手段とを調整すること
により、所望の値に設定することができる。
The interval between the laser beams is set to a desired value by adjusting the angle and horizontal position adjustment means provided on the beam splitter and the total reflection mirror, and the vertical position adjustment means provided on the optical element. be able to.

[発明の実施例] 第1図は本発明に係るレーザ加工装置の原理的説明図、
第2図は本発明実施例の構成説明図である。図において
、(1)はレーザ発振器(図示せず)から取り出された
レーザビーム、(2a) 、 (2b)はレーザビーム
(1)を分割し、分配するためのビームスプリッタ、(
3)は全反射鏡、(la) 、 (lb) 、(lc)
はそれぞれビームスプリッタ(2a) 、 (2b)及
び全反射鏡(3)によって2分割し、分配されたレーザ
ビームである。(4)はレーザビーム(la)〜(lc
)を加工に必要なパワー密度に集光させる集光レンズで
ある。(lO〉は被加工物、(12)は例えばラックと
ビニオンとからなり、集光レンズ(4)を上下方向に移
動させて焦点位置を調整するための上下調整機構、(1
5a)〜(15c)は被加工物のシーム(加工線)であ
る。(16a)、(lfib)はビームスプリッタ(2
〉及び全反射鏡(3〉の角度調整機構、(17a)、(
x7b)は例えばラックとピニオンとからなり、ビーム
スプリッタ〈2)及び全反射鏡(3〉の角度調整機構(
16a) 。
[Embodiments of the invention] FIG. 1 is a diagram illustrating the principle of a laser processing apparatus according to the present invention,
FIG. 2 is an explanatory diagram of the configuration of an embodiment of the present invention. In the figure, (1) is a laser beam extracted from a laser oscillator (not shown), (2a) and (2b) are beam splitters for splitting and distributing the laser beam (1), (
3) are total reflection mirrors, (la), (lb), (lc)
are laser beams that are split into two by beam splitters (2a) and (2b) and a total reflection mirror (3), respectively. (4) is a laser beam (la) to (lc
) is a condensing lens that condenses light to the power density required for processing. (lO> is the workpiece, (12) is a vertical adjustment mechanism consisting of, for example, a rack and a pinion, and adjusts the focal position by moving the condensing lens (4) in the vertical direction;
5a) to (15c) are seams (processing lines) of the workpiece. (16a), (lfib) are beam splitters (2
〉 and total reflection mirror (3〉 angle adjustment mechanism, (17a), (
x7b) consists of, for example, a rack and a pinion, and an angle adjustment mechanism (
16a).

(16b)を水平方向に移動させる移動機構である。(16b) is a moving mechanism that moves it in the horizontal direction.

次に、上記のように構成した本発明装置の作用を説明す
る。レーザ発振器から出射されたレーザビーム(1)は
ビームスプリッタ(2a)及び全反射鏡(3)によって
必要な数に分割される。即ち、第2図に示すように、レ
ーザビーム(1)の2分の1はビームスプリッタ(2a
)により所定の角度で反射してレーザビーム(1a)と
なり、残りの2分の1はビームスプリッタ(2a)を透
過して全反射鏡(3〉により所定の角度で反射し、レー
ザビーム(lb)ととなる。
Next, the operation of the apparatus of the present invention configured as described above will be explained. A laser beam (1) emitted from a laser oscillator is split into a required number of beams by a beam splitter (2a) and a total reflection mirror (3). That is, as shown in FIG. 2, one-half of the laser beam (1)
) at a predetermined angle and becomes a laser beam (1a), the remaining half passes through a beam splitter (2a) and is reflected at a predetermined angle by a total reflection mirror (3>), forming a laser beam (lb ).

そして、両レーザビーム(la) 、(lb)はその先
軸がほぼ1点で交わるように集光レンズに入射し、オフ
セット距fiaで同時に被加工物(10)に照射され、
被加工物(10)の切断や溶接などを行なう。
Both laser beams (la) and (lb) enter the condenser lens so that their leading axes intersect at approximately one point, and simultaneously irradiate the workpiece (10) with an offset distance fia.
Cutting, welding, etc. of the workpiece (10) are performed.

第1図はレーザビーム(1)を3分割する場合の例で、
3本のレーザビーム(1a)〜(1c〉の出力を等しく
する場合には、ビームスプリッタ(2a)は33.3%
反射、6.66%透過、ビームスプリッタ(2b〉は5
0%0%反射0%透過のものを用いる。3本に分割した
レーザビーム(la) 、(lb) 、(lc)を集光
レンズ(4)の中心を通過するように調整すれば、それ
ぞれのレーザビーム(la)〜(lc)は光軸A上の集
光レンズ(4)から焦点距離fの位置に集光される。こ
のとき、レーザビーム(1c)の集光点のレンズ光軸A
からのオフセット距離aは、集光レンズ(4〉の焦点距
離をfル−ザビームの集光レンズ(4)への入射角をθ
とすれば、 a −f X tanθ となる。
Figure 1 is an example of dividing the laser beam (1) into three parts.
When making the output of the three laser beams (1a) to (1c) equal, the beam splitter (2a) is 33.3%
Reflection, 6.66% transmission, beam splitter (2b> is 5
Use one with 0% 0% reflection and 0% transmission. If the three divided laser beams (la), (lb), and (lc) are adjusted to pass through the center of the condenser lens (4), each laser beam (la) to (lc) will align with the optical axis. The light is focused from the condenser lens (4) on A to a position having a focal length f. At this time, the lens optical axis A of the focal point of the laser beam (1c)
The offset distance a from f is the focal length of the condensing lens (4), and the incident angle of the laser beam to the condensing lens (4) is θ.
Then, a −f X tanθ.

即ち、オフセット距離aを調整するには、集光レンズ(
4)の入射角θを調整すればよい。このためには、集光
レンズ(4)の上下調整機構(12)により集光レンズ
(1)を上下に移動させて被加工物(lO)との距離を
調整する。ついで、ビームスプリッタ(2a〉及び全反
射鏡(3)の角度調整機構(lea)。
That is, to adjust the offset distance a, the condenser lens (
4) The incident angle θ may be adjusted. For this purpose, the distance between the condenser lens (1) and the workpiece (lO) is adjusted by moving the condenser lens (1) up and down using the vertical adjustment mechanism (12) of the condenser lens (4). Next, the beam splitter (2a) and the angle adjustment mechanism (lea) of the total reflection mirror (3).

(ieb)と水平方向の移動機構(17a) 、 (1
7a)とにより、集光レンズ(4)への入射角θを調整
すればオフセット距離aを調整することができる。
(ieb) and horizontal movement mechanism (17a), (1
7a), the offset distance a can be adjusted by adjusting the incident angle θ to the condenser lens (4).

第2図に示した実施例で、集光レンズ(4)の焦点距離
fを127mm(5インチ)、集光レンズ(4)からビ
ームスプリッタ(2)及び全反射鏡(4)までの距離を
1500m+*、水平方向の移動機構(17a) 、 
(17b)のストロークを300mmとしたところ、オ
フセット距11i1aを最小2 mmから最大25關ま
で調整することができた。
In the example shown in Fig. 2, the focal length f of the condenser lens (4) is 127 mm (5 inches), and the distance from the condenser lens (4) to the beam splitter (2) and the total reflection mirror (4) is 1500m+*, horizontal movement mechanism (17a),
When the stroke of (17b) was set to 300 mm, the offset distance 11i1a could be adjusted from a minimum of 2 mm to a maximum of 25 steps.

上記の実施例では、レーザビームをビームスプリッタに
より複数に分割する場合を示したが、複数の発振器から
取り出したレーザビームを用いてもよい。また、入射レ
ーザビームを同一平面に配置して、それぞれのレーザビ
ームの焦点が直線上に並ぶようにしたが、例えばレーザ
ビームが3本の場合には集光点が3角形になるようにし
てもよい。
In the above embodiment, a case is shown in which the laser beam is split into a plurality of parts by a beam splitter, but laser beams taken out from a plurality of oscillators may also be used. In addition, the incident laser beams were arranged on the same plane so that the focal points of each laser beam were aligned on a straight line, but for example, in the case of three laser beams, the focal point was arranged in a triangular shape. Good too.

[発明の効果] 以上詳記したように、本発明は、ビームスプリッタと全
反射鏡に設けた角度及び水平方向の位置調整手段と、光
学素子に設けた上下方向の位置調整手段とを調整するこ
とにより、複数のレーザビームの焦点のオフセット距離
を所望の値に設定して、レーザビームを直線上又は同一
平面上に照射させるようにしたので、被加工物上に複数
の加工線又は加工点を同時に加工できるとともに、間隙
も自由に調整でき、かつ、光学素子と被加工物間の距離
を長くできるので汚染が少なくなる等、顕著な効果を得
ることができる。
[Effects of the Invention] As detailed above, the present invention adjusts the angle and horizontal position adjustment means provided on the beam splitter and the total reflection mirror, and the vertical position adjustment means provided on the optical element. By setting the offset distance of the focal points of multiple laser beams to a desired value, the laser beams are irradiated in a straight line or on the same plane, so that multiple processing lines or processing points can be printed on the workpiece. It is possible to simultaneously process the optical element and the workpiece, the gap can be adjusted freely, and the distance between the optical element and the workpiece can be increased, so that remarkable effects such as reduced contamination can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例の原理的説明図、第2図は本発明
実施例の説明図、第3図は従来のレーザ加工装置の一例
を示す縦断面図である。 図において、(1)、(la) 、 (lb) 、 (
lc)はレーザビーム、(2a) 、(2b)はビーム
スプリッタ、(3)は全反射鏡、(4〉は集光レンズ、
(lO〉は被加工物、(12〉は上下調整機構、(16
a)、(leb)は角度調整機構、(17a)、(17
b)は水平方向移動機構である。なお、図中同一符号は
同−又は相当部分を示すものとする。
FIG. 1 is an explanatory diagram of the principle of an embodiment of the present invention, FIG. 2 is an explanatory diagram of an embodiment of the present invention, and FIG. 3 is a longitudinal sectional view showing an example of a conventional laser processing apparatus. In the figure, (1), (la), (lb), (
lc) is a laser beam, (2a) and (2b) are beam splitters, (3) is a total reflection mirror, (4> is a condenser lens,
(lO> is the workpiece, (12> is the vertical adjustment mechanism, (16
a), (leb) are angle adjustment mechanisms, (17a), (17
b) is a horizontal movement mechanism. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】 複数本のレーザビームを複数個所に同時に照射して被加
工物の加工を行なうレーザ加工装置において、 それぞれ角度及び水平方向の位置を調整する手段を有し
、レーザ発振器からのレーザビームを反射させる少なく
とも1個のビームスプリッタ及び全反射鏡と、 上下方向の位置を調整する手段を有し、前記ビームスプ
リッタ及び全反射鏡で反射した複数のレーザビームをそ
れぞれ集光させる1個の光学素子とを備え、 該光学素子で集光された複数のレーザビームを直線上又
は同一面上に所望の間隔で同時に照射することを特徴と
するレーザ加工装置。
[Claims] A laser processing device that processes a workpiece by simultaneously irradiating a plurality of laser beams to a plurality of locations, each having means for adjusting the angle and horizontal position, and at least one beam splitter and one total reflection mirror that reflects the laser beam; and one beam splitter that has means for adjusting the position in the vertical direction and that focuses the plurality of laser beams reflected by the beam splitter and the total reflection mirror, respectively. What is claimed is: 1. A laser processing apparatus comprising: an optical element, which simultaneously irradiates a plurality of laser beams focused by the optical element on a straight line or on the same plane at desired intervals.
JP1323973A 1989-12-15 1989-12-15 Laser beam machining apparatus Pending JPH03184687A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1323973A JPH03184687A (en) 1989-12-15 1989-12-15 Laser beam machining apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1323973A JPH03184687A (en) 1989-12-15 1989-12-15 Laser beam machining apparatus

Publications (1)

Publication Number Publication Date
JPH03184687A true JPH03184687A (en) 1991-08-12

Family

ID=18160701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1323973A Pending JPH03184687A (en) 1989-12-15 1989-12-15 Laser beam machining apparatus

Country Status (1)

Country Link
JP (1) JPH03184687A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998030317A1 (en) * 1997-01-10 1998-07-16 Morphometrix Technologies Inc. Membrane microfilter manufacturing process
US6184490B1 (en) * 1996-04-09 2001-02-06 Carl-Zeiss-Stiftung Material irradiation apparatus with a beam source that produces a processing beam for a workpiece, and a process for operation thereof
JP2004276063A (en) * 2003-03-14 2004-10-07 Hitachi Via Mechanics Ltd Laser beam machining device
JP2008290086A (en) * 2007-05-22 2008-12-04 Disco Abrasive Syst Ltd Laser processing equipment
WO2012048872A1 (en) * 2010-10-14 2012-04-19 Manz Ag Optical system for splitting a laser beam comprising cascaded, adjustable beam splitters

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6184490B1 (en) * 1996-04-09 2001-02-06 Carl-Zeiss-Stiftung Material irradiation apparatus with a beam source that produces a processing beam for a workpiece, and a process for operation thereof
WO1998030317A1 (en) * 1997-01-10 1998-07-16 Morphometrix Technologies Inc. Membrane microfilter manufacturing process
JP2004276063A (en) * 2003-03-14 2004-10-07 Hitachi Via Mechanics Ltd Laser beam machining device
JP2008290086A (en) * 2007-05-22 2008-12-04 Disco Abrasive Syst Ltd Laser processing equipment
WO2012048872A1 (en) * 2010-10-14 2012-04-19 Manz Ag Optical system for splitting a laser beam comprising cascaded, adjustable beam splitters

Similar Documents

Publication Publication Date Title
JP4459530B2 (en) Laser processing equipment
US6331692B1 (en) Diode laser, laser optics, device for laser treatment of a workpiece, process for a laser treatment of workpiece
JPH02295692A (en) laser processing equipment
JP2003200286A (en) Laser micro spot welding equipment
JPS6293095A (en) Laser processing equipment
JP4837170B2 (en) Laser annealing method and apparatus
JPH02137687A (en) Laser light condensing device
JP3682295B2 (en) Laser processing equipment
JPH0436794B2 (en)
JPH08338962A (en) Beam homogenizer and laser processing equipment
JPH03184687A (en) Laser beam machining apparatus
JPH03138092A (en) Laser beam machine
JPH01186293A (en) Laser welding method
JPH0347685A (en) Method and device for laser beam marking
JPS6258832B2 (en)
JP7710452B2 (en) Materials processing using laser beams, especially assemblies involving laser drilling
JPH02284782A (en) Method for converging laser beams having different wavelengths
JP2001205469A (en) Optical system for laser beam emission
JP2000084691A (en) Laser processing equipment
JP2002273589A (en) Laser drilling apparatus and method
JPS63299881A (en) Condensing apparatus for laser beam
JP2002316289A (en) Laser beam machining device
JPH02299791A (en) Workpiece irradiating method with laser beam
JPH02255292A (en) Laser processing device
JPS6138774Y2 (en)