JPH03184876A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPH03184876A
JPH03184876A JP32673989A JP32673989A JPH03184876A JP H03184876 A JPH03184876 A JP H03184876A JP 32673989 A JP32673989 A JP 32673989A JP 32673989 A JP32673989 A JP 32673989A JP H03184876 A JPH03184876 A JP H03184876A
Authority
JP
Japan
Prior art keywords
layer
heat
substrate
polyimide
thermal head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP32673989A
Other languages
Japanese (ja)
Other versions
JP2547876B2 (en
Inventor
Hiroki Nishino
浩己 西野
Masato Kawanishi
真人 川西
Mitsuhiko Yoshikawa
吉川 光彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP1326739A priority Critical patent/JP2547876B2/en
Priority to US07/628,845 priority patent/US5252988A/en
Priority to DE69017390T priority patent/DE69017390T2/en
Priority to EP90313701A priority patent/EP0433093B1/en
Publication of JPH03184876A publication Critical patent/JPH03184876A/en
Application granted granted Critical
Publication of JP2547876B2 publication Critical patent/JP2547876B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To improve the heat response of a resistor part by providing a high- heat conductive metal layer on the rear surface of a high-heat resistant resin substrate. CONSTITUTION:On a copper foil 1A of a double-copper plated, laminated substrate P, a polyimide precursor dissolved in a solvent of NMP is applied with a predetermined thickness. After the solution is dried, it is precured to be a polyimide layer. After the polyimide layer is patterned, it is heated by being put in an oven or irradiated with infrared rays to be a polyimide resin heat- accumulation layer 3. Thereafter, a heating resistor layer 4 is sputtered all over the layer 3, furthermore being patterned by photoetching. Thereon, a common electrode 6 and a lead electrode 5 are photoetched into a predetermined pattern. Thereon, a protective film 7 is sputtered. With the use of a thermal head produced in this manner, a material cost is lowered, the warpage of the high-heat resistant resin substrate at the time of heat treatment is reduced, a pattern accuracy is improved, a high-speed printing can be conducted, and the printing quality is enhanced.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 この発明は、感熱式プリンターや熱転写式プリンターに
使用するサーマルヘッドに関するものである。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention relates to a thermal head used in a thermal printer or a thermal transfer printer.

(ロ)従来の技術 従来、サーマルヘッドにおいては、第3図に示すように
、セラミック基板12に設けられたガラスグレーズ層1
3を介して、Ta5iOt等の発熱抵抗体14、AI又
はAl−3i等の共通電極I6およびリード電極15を
、フォトエツチング法により所定のパターンに形成しん
後、保護膜I7として、S 1AION、S iON等
をスパー)夕蒸着又はプラズマCVD法により形成する
ようにしている。
(B) Prior Art Conventionally, in a thermal head, a glass glaze layer 1 provided on a ceramic substrate 12 is used as shown in FIG.
After forming a heat generating resistor 14 such as Ta5iOt, a common electrode I6 and a lead electrode 15 such as AI or Al-3i into a predetermined pattern by photo-etching through the protective film I7, S1AION, S The iON and the like are formed by spar vapor deposition or plasma CVD.

(ハ)発明が解決しようとする課題 しかしながら、従来のこのようなグレーズセラミック基
板を用いたサーマルヘッドの場合、原材料コストが高く
、又、加工性に乏しいため製造プロセスが複雑になると
いう問題点があった。
(c) Problems to be solved by the invention However, in the case of conventional thermal heads using such glazed ceramic substrates, there are problems in that the cost of raw materials is high and the manufacturing process is complicated due to poor workability. there were.

そこで、セラミック基板の代わりに安価で加工性に富む
高耐熱性樹脂基板を使用したサーマルヘッドの実用化が
進められている。つまり、このサーマルヘッドにおいて
は、第4図に示すように、高耐熱性樹脂基板22上にパ
ータン化された電極層(共通電極29およびリード電極
28)を形成し、この後にワニス状のポリイミド前駆体
を塗布し、予備加熱(乾燥・ハーフキュア)を行い、層
状のポリイミド前駆体を形成し、所定のパターンにエッ
チングしf二液、オーブン又は赤外線の照射装置を用い
て300℃以上の温度に加執して、前記ポリイミド前駆
体のイミド化を行い、ポリイミド樹脂蓄M層23を形成
し、この上に共通電極29とリード電極28とに電気的
に接合さ乙る発熱抵抗体24を形成して、更に、保護膜
27を積層した構成を採用している。
Therefore, efforts are being made to put into practical use thermal heads that use highly heat-resistant resin substrates that are inexpensive and easy to process, instead of ceramic substrates. That is, in this thermal head, as shown in FIG. 4, a patterned electrode layer (common electrode 29 and lead electrode 28) is formed on a highly heat-resistant resin substrate 22, and then a varnish-like polyimide precursor is formed. A layered polyimide precursor is formed by coating the body, preheating (drying and half-curing), etching it into a predetermined pattern, and heating it to a temperature of 300°C or higher using an oven or infrared irradiation device. Then, the polyimide precursor is imidized to form a polyimide resin storage M layer 23, and a heating resistor 24 electrically connected to the common electrode 29 and the lead electrode 28 is formed thereon. Then, a structure in which a protective film 27 is further laminated is adopted.

ところで、このような高耐熱性樹脂基板を用いたサーマ
ルヘッドにおいては、電極層、ポリイミド樹脂蓄熱層、
発熱抵抗体、保護膜をそれぞれ形成して行く際に、フォ
トエツチングや、熱処理工程を経るにしたがって樹脂基
板が反り、ファインパターン化が困難になるという問題
点がある。
By the way, in a thermal head using such a highly heat-resistant resin substrate, an electrode layer, a polyimide resin heat storage layer,
When forming the heating resistor and the protective film, the resin substrate warps as it goes through photo-etching and heat treatment steps, making it difficult to form fine patterns.

さらに、このサーマルヘッドは動作時に、発熱抵抗体に
発する熱に対して、放熱特性が十分でなく、その熱が基
板に蓄積し、連続パルス印加による熱応答性が悪くなる
。その結果、ピーク温度(温度の最高値)及びパルス印
加直前のベース温度(温度の最低値)が次第に上昇し、
高速印字が難しく、連続印字した際にいわゆる尾引き現
象が発生しゃずいという問題点がある。
Furthermore, this thermal head does not have sufficient heat dissipation characteristics for the heat generated in the heating resistor during operation, and the heat accumulates on the substrate, resulting in poor thermal response due to continuous pulse application. As a result, the peak temperature (highest temperature value) and the base temperature (lowest temperature value) just before pulse application gradually rise,
It is difficult to print at high speed, and there is a problem that so-called trailing phenomenon occurs when printing continuously.

この発明はこのような事情を考慮してなさ4tfこもの
で、材料コストが低く、熱処理時の高耐熱性樹脂基板の
反りを緩和してパターン精度を向上させ、放熱特性を向
上させて高速印字を可能にした印字品質の良いサーマル
ヘッドを提供するものである。
This invention was created with these circumstances in mind.The 4TF material has low material cost, reduces the warpage of a highly heat-resistant resin substrate during heat treatment, improves pattern accuracy, and improves heat dissipation characteristics to enable high-speed printing. The present invention provides a thermal head with high printing quality.

(ニ)課題を解決するための手段 この発明は、耐熱樹脂基板と、前記基板表面に形成され
た耐熱樹脂からなる蓄熱層と、蓄熱層の上に形成された
発熱抵抗体層と、前記基板表面に形成され発熱抵抗体層
に通電するための電極層と、発熱抵抗体層及び電極層の
上に形成された保護層と、前記基板裏面に形成された放
熱用金属層を備えたサーマルヘッドである。
(d) Means for Solving the Problems This invention provides a heat-resistant resin substrate, a heat-storage layer made of heat-resistant resin formed on the surface of the substrate, a heat-generating resistor layer formed on the heat-storage layer, and the substrate. A thermal head comprising: an electrode layer formed on the surface of the substrate for supplying current to the heat generating resistor layer; a protective layer formed on the heat generating resistor layer and the electrode layer; and a heat dissipating metal layer formed on the back surface of the substrate. It is.

前記、高耐熱性樹脂基板の裏面全面に、樹脂基板よりも
熱伝導性のよい金属層、例えば、銅箔等を、接着又はス
パッタ蒸着などによって設けるか、若しくはサーマルヘ
ッド基板として両面銅張積層基板を用い、一方は、電極
層として利用し、裏面4 の銅箔をテープあるいてよレノスト等でマスクして、前
記電甑層のフォトエツチング工程を行い、そのままま銅
箔を残して熱伝導層とすることが好ましい。
A metal layer having better thermal conductivity than the resin substrate, such as copper foil, is provided on the entire back surface of the high heat-resistant resin substrate by adhesion or sputter deposition, or a double-sided copper-clad laminate is used as a thermal head substrate. One side is used as an electrode layer, and the copper foil on the back side 4 is masked with tape or a mask, and the photo-etching process of the electrode layer is performed, leaving the copper foil as it is and forming a thermally conductive layer. It is preferable that

(ホ)作用 高耐熱性tatq=基板を用いることにより、材料コス
トが低下できる。また、樹脂基板よりも熱伝導性のよい
金属層を基板裏面に設けることにより、フォトエツチン
グや熱処理工程で生じる基板の反りを緩和できるために
、パターン精度が向上する。
(e) Effect: By using a highly heat-resistant tatq=substrate, material costs can be reduced. Furthermore, by providing a metal layer with better thermal conductivity than the resin substrate on the back surface of the substrate, it is possible to alleviate the warpage of the substrate that occurs during photoetching and heat treatment steps, thereby improving pattern accuracy.

さらに、発熱抵抗体より発生する熱を、すみやかに放散
させる結果、熱応答性が良くなり、高速印字が可能にな
り、印字の尾引き現象を解消することができる。
Furthermore, as the heat generated by the heating resistor is quickly dissipated, thermal responsiveness is improved, high-speed printing becomes possible, and the trailing phenomenon of printing can be eliminated.

(へ)実施例 以下、図面に示す実施例に基づいてこの発明の詳細な説
明する。
(F) Embodiments The present invention will now be described in detail based on embodiments shown in the drawings.

実施例(1) 第1図は、実施例(1)のサーマルヘッドの要部断面図
である。このサーマルヘッドは両面銅張積層基板Pを用
いて次のように製作される。なお、2は縦300rtt
m、 1400mm、厚さ0.8朋の高耐熱性樹脂基板
であり、その両面に厚さ3〜5μmの銅箔1.IAが接
着されている。
Embodiment (1) FIG. 1 is a sectional view of a main part of a thermal head of embodiment (1). This thermal head is manufactured using a double-sided copper-clad laminate board P as follows. In addition, 2 is vertical 300rtt
It is a highly heat-resistant resin substrate with a diameter of 1400 mm and a thickness of 0.8 μm, with copper foil 1.5 μm thick on both sides. IA is glued.

まず、銅箔IA上に、N−メチルピロドリン/(NMP
)を溶媒とするポリイミド前駆体をスピンコータあるい
はロールコータを用いて所定の厚さに塗布し、120℃
程度の温度で数分間乾燥後、200℃の温度で30分間
予備硬化を行いポリイミド層を形成する。
First, N-methylpyrodrine/(NMP
) was applied as a solvent to a predetermined thickness using a spin coater or roll coater, and heated at 120°C.
After drying for several minutes at a temperature of about 100° C., preliminary curing is performed at a temperature of 200° C. for 30 minutes to form a polyimide layer.

次に、両面銅張積層基板Pの片面上に形成されたポリイ
ミド層のパターン形成を行った後に、オーブンあるいは
赤外線の照射によって約300℃〜350℃の温度で3
0分間程度加熱し、ポリイミド樹脂蓄熱層3を形成する
Next, after patterning the polyimide layer formed on one side of the double-sided copper-clad laminate P, the polyimide layer is heated for 30 minutes at a temperature of approximately 300°C to 350°C in an oven or by irradiation with infrared rays.
The polyimide resin heat storage layer 3 is formed by heating for about 0 minutes.

ついで、スパッタ法を用いて発熱抵抗体層4を全面に形
成し、更にフォトエツチングにより発熱抵抗体層4をパ
ターン化し、その上部に共通電極6及びリード電極5を
フォトエツチングにより所定のパターンに形成後、最後
にスパッタ法により医護膜7を酸膜してサーマルヘッド
を完成させる。
Next, a heat generating resistor layer 4 is formed on the entire surface using a sputtering method, and the heat generating resistor layer 4 is further patterned by photoetching, and a common electrode 6 and a lead electrode 5 are formed on the top thereof in a predetermined pattern by photoetching. Finally, the medical protective film 7 is coated with an acid film by sputtering to complete the thermal head.

実施例(2) 第2図は、実施例(2)のサーマルヘッド断面図である
。このサーマルヘッドは次のようにして製作される。
Example (2) FIG. 2 is a sectional view of a thermal head of Example (2). This thermal head is manufactured as follows.

まず、高耐熱性樹脂基板として、両面銅張積層基板Pを
用いて、一方の銅箔をフォトリソグラフィ法によって所
定のパターンにエツチングし、パターン化された銅層8
Aを形成する。この際、裏面の銅箔1はテープあるいは
レジスト等でマスクしておき、そのまま残しておく。
First, using a double-sided copper-clad laminate P as a highly heat-resistant resin substrate, one of the copper foils was etched into a predetermined pattern by photolithography, and the patterned copper layer 8
Form A. At this time, the copper foil 1 on the back side is masked with tape or resist and left as is.

次に、この銅層8Aの上に無電解メツキ法によって厚さ
1μmのニッケル・リンメツキ層8Bおよび厚さ0.1
μmの金メツキ層8Cを順に積層して、電極層すなわち
共通電極9とリード電極8を形成する。
Next, on this copper layer 8A, a nickel plating layer 8B with a thickness of 1 μm and a nickel plating layer 8B with a thickness of 0.1 μm are formed by electroless plating.
Electrode layers, that is, a common electrode 9 and a lead electrode 8 are formed by sequentially stacking gold plating layers 8C having a thickness of .mu.m.

次に、この上部に、実施例(1)と同様にしてポリイミ
ド前駆体を形成し、フォトリソグラフィ法を用いて、所
定のパターンにエツチングして台形状のポリイミド層を
形成する。
Next, a polyimide precursor is formed on this top in the same manner as in Example (1), and etched into a predetermined pattern using photolithography to form a trapezoidal polyimide layer.

次に、このポリイミド前駆体層をオーブンあるいは赤外
線の照射によって300°C〜400℃の温度で30分
間の熱処理を行い、台形状のポリイミド樹脂蓄熱層3を
形成する。この際、基板裏面に設けられた熱伝導性のよ
い銅箔lがあるため、樹脂基板2の冷却効果がより向上
し、樹脂基板2の劣化及びソリの発生を防ぐことができ
る。
Next, this polyimide precursor layer is heat-treated at a temperature of 300° C. to 400° C. for 30 minutes in an oven or by irradiation with infrared rays to form a trapezoidal polyimide resin heat storage layer 3. At this time, since there is a copper foil l with good thermal conductivity provided on the back surface of the substrate, the cooling effect of the resin substrate 2 is further improved, and deterioration and warping of the resin substrate 2 can be prevented.

次に、スパッタ法より、発熱抵抗体層4を形成し、更に
スパッタ法を用いて保護膜7を形成して、サーマルヘッ
ドを完成させる。
Next, a heating resistor layer 4 is formed by sputtering, and a protective film 7 is further formed by sputtering to complete the thermal head.

このサーマルヘッドをアルミニウム製放熱板li上に接
着剤IOによって接合したもの(第2図)と、高耐熱性
樹脂基板2の裏面に銅箔lが無いサーマルヘッド(比較
例)との駆動パルス印加時における放熱特性を第5図お
よび第6図に示す。
Application of driving pulses between this thermal head bonded to an aluminum heat sink li using adhesive IO (Fig. 2) and a thermal head without copper foil 1 on the back side of the highly heat-resistant resin substrate 2 (comparative example) Figures 5 and 6 show the heat dissipation characteristics at this time.

第5図は、lパルス印加時の発熱抵抗体層の表面温度の
時間的変化を示しており、(A)は比較例、(B)は実
施例を示す。これから基板裏面に銅箔が設けられている
と、発熱抵抗体層4下のポリイミド樹脂蓄熱層3および
耐熱性樹脂基板2中に、局所的に蓄熱部H(第2図)が
発生しても、基板裏面の銅箔1を通して熱がすみやかに
放散し、熱応答性が向上していることがわかる。
FIG. 5 shows the temporal change in the surface temperature of the heating resistor layer during application of 1 pulse, in which (A) shows a comparative example and (B) shows an example. If a copper foil is provided on the back side of the board, even if a heat storage area H (Fig. 2) occurs locally in the polyimide resin heat storage layer 3 and the heat-resistant resin board 2 under the heating resistor layer 4, , it can be seen that heat is quickly dissipated through the copper foil 1 on the back surface of the board, and the thermal response is improved.

また、第6図は、連続パルス印加した際のビーク屋度と
、ベース濃度の時間的変化を示している。
Furthermore, FIG. 6 shows the peak intensity and the temporal change in base concentration when continuous pulses are applied.

(Ap)及び(Ab)は従来列のピーク温度とベース温
度を示し、(Bp)および(Bb)は実施例のピーク/
IA度とベース温度を示している。つまり、基板裏面に
銅箔lが設けられている方がピーク濃度、ベース温度共
に低い値を示していることから、発熱抵抗体部の残熱に
よる尾引き現象が改善されることが理解できる。
(Ap) and (Ab) indicate the peak temperature and base temperature of the conventional column, and (Bp) and (Bb) indicate the peak/base temperature of the example.
It shows IA degree and base temperature. In other words, since both the peak concentration and the base temperature are lower when the copper foil l is provided on the back surface of the substrate, it can be understood that the trailing phenomenon due to residual heat in the heating resistor portion is improved.

また、さらに、第2図の放熱板11とサーマルヘッド基
板との接着剤lOに熱伝導性のよい接着ペースト剤を用
いることにより、さらに放熱特性を向上させることがで
きる。
Furthermore, by using an adhesive paste with good thermal conductivity as the adhesive lO between the heat sink 11 and the thermal head substrate shown in FIG. 2, the heat dissipation characteristics can be further improved.

(ト)発明の効果 この発明によれば、高耐熱性樹脂基板の裏面に熱伝導性
のよい金属層を設けることで、駆動パルス印加時に発熱
する抵抗体部の熱応答性を向上することかでき、高速印
字が可能となる。また、熱の放散性も改善され、尾引き
現象を防止することができる。ざらに、基板裏面が金属
層のため、加工時の樹脂基板自体の反りが緩和され、パ
ターン加工精度が向上し、ファインパターン化が容易に
なる。従って、信頼性に優れた安価なサーマルヘッドが
提供される。
(G) Effects of the Invention According to this invention, by providing a metal layer with good thermal conductivity on the back surface of a highly heat-resistant resin substrate, it is possible to improve the thermal response of the resistor part that generates heat when a driving pulse is applied. This enables high-speed printing. Furthermore, heat dissipation is improved, and tailing phenomenon can be prevented. In general, since the back surface of the substrate is a metal layer, warping of the resin substrate itself during processing is alleviated, pattern processing accuracy is improved, and fine patterning is facilitated. Therefore, a highly reliable and inexpensive thermal head is provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の実施例(1)のサーマルヘッドを示
す断面図、第2図はこの発明の実施例(2)のサーマル
ヘッドを示す断面図、第3図は従来のサーマルヘッドを
示す断面図、第4図は比較例の構成を示す断面図、第5
図および第6図は印加パルスに対する温度特性を示す説
明図である。 1.1A・・・・・・銅箔、2・・・・・・高耐熱性樹
脂基板、3・・・・・・ポリイミド樹脂蓄熱層、4・・
・・・・発熱抵抗体層、5・・・・・・リード電極、6
・・・・・共通電極、7・・・・・・保護膜。
Fig. 1 is a sectional view showing a thermal head according to an embodiment (1) of the present invention, Fig. 2 is a sectional view showing a thermal head according to an embodiment (2) of the invention, and Fig. 3 is a sectional view showing a conventional thermal head. 4 is a sectional view showing the configuration of a comparative example;
This figure and FIG. 6 are explanatory diagrams showing temperature characteristics with respect to applied pulses. 1.1A...Copper foil, 2...High heat-resistant resin substrate, 3...Polyimide resin heat storage layer, 4...
... Heat generating resistor layer, 5 ... Lead electrode, 6
...Common electrode, 7...Protective film.

Claims (1)

【特許請求の範囲】[Claims] 1、耐熱樹脂基板と、前記基板表面に形成された耐熱樹
脂からなる蓄熱層と、蓄熱層の上に形成された発熱抵抗
体層と、前記基板表面に形成され発熱抵抗体層に通電す
るための電極層と、発熱抵抗体層及び電極層の上に形成
された保護層と、前記基板裏面に形成された放熱用金属
層を備えたサーマルヘッド。
1. A heat-resistant resin substrate, a heat storage layer made of heat-resistant resin formed on the surface of the substrate, a heating resistor layer formed on the heat storage layer, and a heating resistor layer formed on the surface of the substrate for energizing the heating resistor layer. A thermal head comprising: an electrode layer; a protective layer formed on the heating resistor layer and the electrode layer; and a heat dissipation metal layer formed on the back surface of the substrate.
JP1326739A 1989-12-15 1989-12-15 Method of manufacturing thermal head Expired - Fee Related JP2547876B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1326739A JP2547876B2 (en) 1989-12-15 1989-12-15 Method of manufacturing thermal head
US07/628,845 US5252988A (en) 1989-12-15 1990-12-11 Thermal head for thermal recording machine
DE69017390T DE69017390T2 (en) 1989-12-15 1990-12-14 Thermal head for thermal recording device.
EP90313701A EP0433093B1 (en) 1989-12-15 1990-12-14 Thermal head for thermal recording machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1326739A JP2547876B2 (en) 1989-12-15 1989-12-15 Method of manufacturing thermal head

Publications (2)

Publication Number Publication Date
JPH03184876A true JPH03184876A (en) 1991-08-12
JP2547876B2 JP2547876B2 (en) 1996-10-23

Family

ID=18191141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1326739A Expired - Fee Related JP2547876B2 (en) 1989-12-15 1989-12-15 Method of manufacturing thermal head

Country Status (1)

Country Link
JP (1) JP2547876B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109968826A (en) * 2017-03-20 2019-07-05 深圳市博思得科技发展有限公司 Thermal printing head

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219250U (en) * 1985-07-18 1987-02-05
JPS62105643A (en) * 1985-11-01 1987-05-16 Alps Electric Co Ltd Thermal head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6219250U (en) * 1985-07-18 1987-02-05
JPS62105643A (en) * 1985-11-01 1987-05-16 Alps Electric Co Ltd Thermal head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109968826A (en) * 2017-03-20 2019-07-05 深圳市博思得科技发展有限公司 Thermal printing head

Also Published As

Publication number Publication date
JP2547876B2 (en) 1996-10-23

Similar Documents

Publication Publication Date Title
JPH10513314A (en) Method for selectively removing a metal layer from a non-metal substrate
JPH03184876A (en) Thermal head
JP2594646B2 (en) Manufacturing method of thermal head
JPS61169262A (en) Thermal head and its preparation
JPH0564905A (en) Manufacture of thermal head
JP2547861B2 (en) Method of manufacturing thermal head
JP2519340B2 (en) Thermal recording device
JP2937951B2 (en) Method for manufacturing multilayer printed wiring board
JP2521360B2 (en) Thermal recording device
JP3022065B2 (en) Manufacturing method of hybrid integrated circuit board
JP2652958B2 (en) Manufacturing method of printed wiring board
JPH0671921A (en) Thermal head
JPS62257702A (en) Manufacture of wiring board
JP3208290B2 (en) Method of forming thin film member
JP2681205B2 (en) Printed wiring board with membrane element
JPS60170290A (en) Method of producing metal base circuit board
JPS58176997A (en) Multi-layer wiring structure and thermal head
JPH01202894A (en) Printed circuit board
JPS5939567A (en) Thermal head manufacturing method
JPH03205162A (en) thermal head
JPH0557936A (en) Thermal head and method of manufacturing the same
JPH0832029A (en) Manufacturing method of hybrid integrated circuit
JPH085202B2 (en) Method of manufacturing thermal head
JPS62162564A (en) Manufacture of thermal head
JPH0517716B2 (en)

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees