JPH0319199B2 - - Google Patents

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Publication number
JPH0319199B2
JPH0319199B2 JP58182181A JP18218183A JPH0319199B2 JP H0319199 B2 JPH0319199 B2 JP H0319199B2 JP 58182181 A JP58182181 A JP 58182181A JP 18218183 A JP18218183 A JP 18218183A JP H0319199 B2 JPH0319199 B2 JP H0319199B2
Authority
JP
Japan
Prior art keywords
beryl
quartz
crystal
flux
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58182181A
Other languages
Japanese (ja)
Other versions
JPS6077199A (en
Inventor
Masaaki Takeuchi
Eiji Togawa
Yoshio Morita
Tadaaki Atomachi
Koji Kasuga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP58182181A priority Critical patent/JPS6077199A/en
Publication of JPS6077199A publication Critical patent/JPS6077199A/en
Publication of JPH0319199B2 publication Critical patent/JPH0319199B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B9/00Single-crystal growth from melt solutions using molten solvents
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/34Silicates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】 本発明はフラツクスを用いたベリル単結晶の合
成方法に関し、フラツクス法により良質なベリル
単結晶を効率よくかつ経済的に合成する方法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for synthesizing beryl single crystals using flux, and more particularly to a method for efficiently and economically synthesizing high-quality beryl single crystals by a flux method.

近年、大型の合成単結晶を作る技術に大きな興
味がもたれている。合成単結晶は、レーザおよび
メーザ分野の使用に成功している。これら工業用
分野以外にも合成宝石として装飾用分野に出まわ
つている。
In recent years, there has been a great deal of interest in techniques for producing large synthetic single crystals. Synthetic single crystals have been successfully used in laser and maser fields. In addition to these industrial fields, synthetic gemstones are also used in the decorative field.

単結晶を合成する公知の方法には数種の型式が
あるが(例えば、ヴエルヌーイ法および引上げ法
がある)これらの方法は、ベリル及び類似石の大
型単結晶を合成するには致命的な欠点を有してい
る。上記2方法は簡単な組織(コラダム・スピネ
ル等)の合成にはよく用いられているが、これら
についても結晶ひずみが大きいという欠点を有し
ている。さらに上記2方法でのベリル単結晶の合
成は今のところ成功していない。単結晶を合成す
る第3の方法は水熱合成である。水熱合成法は設
備に高温高圧容器が必要であるなど、コストがか
かりすぎる。またこの方法でベリル単結晶を合成
する場合ベリル組成中の酸化クロムのドープがう
まくいかず、合成宝石として使用できる単結晶を
得ることが困難である。
Although there are several types of known methods for synthesizing single crystals (e.g. Vuernoulli method and pulling method), these methods have fatal drawbacks for synthesizing large single crystals of beryl and similar stones. have. Although the above two methods are often used to synthesize simple structures (colladam spinel, etc.), they also have the drawback of large crystal strain. Furthermore, the synthesis of beryl single crystals using the above two methods has not been successful so far. A third method of synthesizing single crystals is hydrothermal synthesis. Hydrothermal synthesis requires high-temperature, high-pressure vessels and is therefore too costly. Furthermore, when beryl single crystals are synthesized using this method, doping of chromium oxide in the beryl composition is not successful, making it difficult to obtain single crystals that can be used as synthetic gemstones.

酸化物、フツ化物、金属塩等のフラツクス中に
結晶組成成分を溶解し、温度による溶解度の差を
利用して単結晶を合成するフラツクス法も公知で
ある。
A flux method is also known in which crystal components are dissolved in a flux of oxides, fluorides, metal salts, etc., and a single crystal is synthesized by utilizing the difference in solubility depending on temperature.

従来のフラツクス法におけるベリル単結晶の合
成においては、単結晶育成用の母剤として、天然
ベリル、酸化アルミニウム、酸化ベリリウム、石
英、酸化クロム、酸化チタン等のうちから、ほぼ
ベリル組成になる様に調合された原料を使用して
いた。この場合、次の様な欠点を有している。
In the synthesis of beryl single crystals using the conventional flux method, the base material for single crystal growth is selected from among natural beryl, aluminum oxide, beryllium oxide, quartz, chromium oxide, titanium oxide, etc., so that it has an almost beryl composition. They used mixed raw materials. This case has the following drawbacks.

(1) 天然ベリルを母剤とした場合には、天然ベリ
ル中に含まれている不純物のために、目的の色
のベリル単結晶を得ることが願しい。
(1) When natural beryl is used as a base material, it is desirable to obtain beryl single crystals of the desired color due to impurities contained in natural beryl.

(2) 天然ベリルを母剤とした場合には、ベリル組
成中のAl2、O3、BeOが優先的に溶解してしま
い、フラツクス中でのベリル各組成(Al2O3
SiO2、BeO、Cr2O3、Fe2O3等)の溶解量及び
各組成比のコントロールが困難である。
(2) When natural beryl is used as a matrix, Al 2 , O 3 , and BeO in the beryl composition are preferentially dissolved, and the beryl compositions (Al 2 O 3 , BeO) in the flux are dissolved preferentially.
It is difficult to control the amount of dissolved components (SiO 2 , BeO, Cr 2 O 3 , Fe 2 O 3 , etc.) and their respective composition ratios.

(3) 天然ベリルを母剤とした場合には、SiO2
溶解が遅いため、SiO2の残がいが残り、これ
が自然核生成ベリルの発生源となり、多量の微
結晶が析出し、目的とする大型ベリル単結晶中
へ内包されるなど、大型ベリル単結晶の品質を
低下させる。
(3) When natural beryl is used as a base material, the dissolution of SiO 2 is slow, so residues of SiO 2 remain, which becomes a source of naturally nucleated beryl, precipitates a large amount of microcrystals, and does not meet the intended purpose. This reduces the quality of large beryl single crystals, such as inclusion in large beryl single crystals.

(4) ベリル各組成成分<酸化アルミニウム、酸化
ベリリウム、酸化ケイ素としての石英(ここで
いう石英とは溶融石英・石英多孔質ガラス等を
さす)>を調合して母剤とした場合には、石英
の溶解スピードが遅いため、ベリル単結晶の育
成スピードも非常に遅く、コストが非常に高く
なる。
(4) When beryl composition components (aluminum oxide, beryllium oxide, quartz as silicon oxide (here, quartz refers to fused quartz, porous quartz glass, etc.) are mixed and used as a base material, Since the dissolution speed of quartz is slow, the growth speed of beryl single crystals is also very slow, making the cost very high.

(5) (4)において、石英の溶解スピードを速くする
ために、石英の粉末を用いると、この石英粉が
自然核生成ベリルの発生核となり、(3)と同じ結
果となる。
(5) In (4), if quartz powder is used in order to increase the dissolution speed of quartz, this quartz powder becomes the generation nucleus of naturally nucleated beryl, resulting in the same result as in (3).

(6) (4)において、ベリル単結晶の育成スピードを
速くするために、単結晶析出・育成部の温度と
原料溶解部の温度の温度差を広くすると、自然
核生成ベリルが多量に発生し、(3)と同じ結果と
なるばかりか、単結晶中に多量のインクルージ
ヨンが発生する。
(6) In (4), in order to increase the growth speed of beryl single crystals, if the temperature difference between the temperature of the single crystal precipitation/growth section and the temperature of the raw material melting section is widened, a large amount of naturally nucleated beryl will be generated. , not only does it give the same result as (3), but also a large amount of inclusions occur in the single crystal.

(7) 母剤として石英を使用した場合には、石英投
入1〜2日で石英表面にzAl2O3・xSiO2
yBeO(x:1〜6、y:1〜3、z:0〜1)
の組成を持つ中間層が形成され、SiO2の溶解
スピードが初期の1/4〜1/10に低下する。
(7) When quartz is used as a base material, zAl 2 O 3・xSiO 2
yBeO (x: 1-6, y: 1-3, z: 0-1)
An intermediate layer with a composition of

以上の問題点を解決するために、フラツクスへ
の酸化ケイ素の溶解を安定して行うことができる
方法が待ち望まれていた。
In order to solve the above problems, a method that can stably dissolve silicon oxide in flux has been awaited.

本発明はかかる欠点を除去したもので、フラツ
クス中へ溶解する酸化ケイ素の供給量を合成水晶
を使用することにより、欠陥の少ない大型ベリル
単結晶を育成スピードを一定として育成させうる
ものである。
The present invention eliminates such drawbacks and allows large beryl single crystals with few defects to be grown at a constant growth speed by using synthetic quartz to control the amount of silicon oxide dissolved in the flux.

母剤として、酸化アルミニウム、酸化ベリリウ
ム、合成水晶でほぼベリル組成に調合し、着色剤
として酸化クロム、酸化チタン又は酸化鉄を0〜
5wt%の範囲で混合したものを焼結して使用す
る。好ましくは、酸化アルミニウム、酸化ベリリ
ウム、をモル比で1:3になる様配合し、着色剤
を0〜3wt%混合した焼結体と合成水晶の2種類
の母剤を使用する。
As a base agent, aluminum oxide, beryllium oxide, and synthetic quartz are mixed to have an approximately beryl composition, and as a coloring agent, chromium oxide, titanium oxide, or iron oxide is mixed with 0 to 0.
A mixture of 5wt% is sintered and used. Preferably, two types of base materials are used: a sintered body in which aluminum oxide and beryllium oxide are blended in a molar ratio of 1:3, and a coloring agent is mixed in an amount of 0 to 3 wt%, and a synthetic quartz crystal.

本発明において、高品質のベリル単結晶を効率
よく育成できるのは、石英と異なり水晶は、フラ
ツクスに容易に溶解し、水晶表面に中間化合物を
作らないため、フラツクス中における酸化ケイ素
濃度が容易にコントロールできるためである。
In the present invention, high-quality beryl single crystals can be grown efficiently because, unlike quartz, quartz easily dissolves in flux and does not form intermediate compounds on the surface of the quartz, so the concentration of silicon oxide in the flux can be easily reduced. This is because it can be controlled.

以下実施例に基づき本発明を詳しく説明する。 The present invention will be explained in detail below based on Examples.

実施例 1 母剤としてAl2O3、BeO、SiO2(石英)(モル比
1:3:6)を焼結したものと、同じくSiO2(水
晶)を焼結したものを使用した場合(Cr2O3
1wt%混入させておく) 母剤は育成量に合わせて、1週間ごとに追加す
るものとする。
Example 1 When using sintered Al 2 O 3 , BeO, and SiO 2 (quartz) (molar ratio 1:3:6) as the base material, and sintered SiO 2 (quartz) as the base material ( Cr2O3 _
(1wt% mixed) The mother compound should be added every week depending on the amount of growth.

最初、母剤15gを白金るつぼ(φ70mm×110mm)
に入れ、フラツクスとしてV2O5800gを加え、加
熱した。育成部の温度970℃、母剤部の温度980℃
となる様な炉を2台用意し、2週間ごとに母剤を
1〜15g(育成期間が長くなるほど投入量を増や
す)づつ追加し、140日間育成させた。育成部に
はベリル単結晶板をシードとして白金線でつるし
て入れた。(第1図)育成スピードをグラフに示
すと、第2図の様になり、母剤に水晶を使用した
場合の方が、育成スピードが速いことがわかる。
また、得られた単結晶をX線ロツキングカーブ、
顕微鏡で調べたところ、石英を使用したもので
は、育成初期の部分にインクルージヨンが、全体
に微結晶の内包がみられ、あまり良い結晶は得ら
れていなかつたが、水晶を使用したものでは、イ
ンクルージヨン、微結晶の内包ともみられず、高
品質の結晶が得られた。
First, 15g of base material was poured into a platinum crucible (φ70mm x 110mm).
800 g of V 2 O 5 was added as a flux and heated. Temperature of growth part: 970℃, temperature of base agent: 980℃
Two furnaces were prepared, and 1 to 15 g of mother compound was added every two weeks (the amount added increases as the growing period gets longer), and the plants were grown for 140 days. A beryl single-crystal plate was placed as a seed in the growth section, suspended from a platinum wire. (Fig. 1) When the growth speed is shown in a graph, it becomes as shown in Fig. 2, and it can be seen that the growth speed is faster when crystal is used as the base material.
In addition, the obtained single crystal was subjected to X-ray rocking curve,
When examined under a microscope, the crystals using quartz showed inclusions in the early stages of growth and inclusions of microcrystals throughout, and the crystals were not very good. High quality crystals were obtained, with no inclusions or microcrystals present.

実施例 2 育成部の温度970℃、母剤部の温度990℃となる
様にして、他は実施例1と同じ条件で、ベリル単
結晶を育成した。
Example 2 A beryl single crystal was grown under the same conditions as in Example 1, except that the temperature in the growth part was 970°C and the temperature in the base material part was 990°C.

育成スピードをグラフに示すと、第3図の様に
なり、母剤に水晶を使用した場合の方が、育成ス
ピードが速いことがわかる。また、得られた単結
晶をX線ロツキングカーブ、顕微鏡で調べたとこ
ろ、石英を使用したものでは、全体にインクルー
ジヨン、微結晶の内包がみられ、また結晶に双晶
等がみられ、非常に品質の悪いものであつた。水
晶を使用したものでは、育成の初期の部分にイン
クルージヨンがみられ、またわずかではあるが、
微結晶の内包も存在していた。
When the growth speed is shown in a graph as shown in Figure 3, it can be seen that the growth speed is faster when crystal is used as the base material. In addition, when the obtained single crystal was examined using an X-ray rocking curve and a microscope, inclusions and inclusions of microcrystals were observed throughout the crystal, and twin crystals were observed in the crystal. It was of extremely poor quality. For those using crystal, inclusions are seen in the early stages of growth, and although there are a few,
Microcrystal inclusions were also present.

実施例 3 母剤として、Al2O3、BeO(モル比1:3)に
Cr2O3を0.5wt%混入した焼結体と、石英を使用
し、他の1台では、前記焼結体と水晶を母剤とし
て使用した。
Example 3 Al 2 O 3 and BeO (molar ratio 1:3) were used as base agents.
A sintered body mixed with 0.5 wt% of Cr 2 O 3 and quartz were used, and in the other one, the sintered body and quartz were used as a base material.

最初、焼結体80g、SiO210gを白金るつぼ
(φ70mm×110mm)に入れ、フラツクスとして
Li2O/M0O3/V2O5(重量比1:1:1)800gを
加え、加熱した。育成部の温度930℃、母剤部
(焼結体投入部)の温度940℃なる様に2台のフラ
ツクス炉をセツトした。1台には石英、1台には
水晶を10日ごとに追加し、140日間育成させた。
育成部にはベリル単結晶をシードとして白金線で
つるして入れた。(第4図) 育成スピードをグラフに示すと、第5図の様に
なり、母剤に水晶を使用した場合の方が育成スピ
ードが速いことがわかる。また、得られた単結晶
をX線ロツキングカーブ、顕微鏡で調べたとこ
ろ、石英を使用したものでは、全体に微結晶の内
包がみられた。インクルージヨンもわずかにみら
れた。水晶を使用したものではインクルージヨ
ン、微結晶の内包は、みられず非常に高品質の単
結晶であつた。
First, 80 g of sintered body and 10 g of SiO 2 were placed in a platinum crucible (φ70 mm x 110 mm) and used as a flux.
800 g of Li 2 O/M 0 O 3 /V 2 O 5 (weight ratio 1:1:1) was added and heated. Two flux furnaces were set so that the temperature of the growth section was 930°C and the temperature of the base material section (sintered compact charging section) was 940°C. Quartz was added to one unit, and crystal was added to the other unit every 10 days, and the plants were grown for 140 days.
A beryl single crystal was placed as a seed in the growth section, suspended from a platinum wire. (Fig. 4) When the growth speed is shown in a graph, it becomes as shown in Fig. 5, and it can be seen that the growth speed is faster when crystal is used as the base material. Further, when the obtained single crystal was examined using an X-ray rocking curve and a microscope, it was found that the crystal containing microcrystals was found throughout the crystal using quartz. Slight inclusions were also observed. When crystal was used, no inclusions or microcrystalline inclusions were observed, and the single crystal was of very high quality.

実施例 4 育成部の温度930℃、母剤部(焼結体投入部)
の温度950℃とし、他の条件は実施例3と同じに
して、ベリル単結晶を育成した。
Example 4 Temperature of growth section: 930°C, base material section (sintered body input section)
A beryl single crystal was grown at a temperature of 950°C and other conditions the same as in Example 3.

育成スピードをグラフに示すと、第6図の様に
なり、母剤に水晶を使用した方が、育成スピード
が速いことがわかる。また、得られた単結晶をX
線ロツキングカーブ、顕微鏡で調べたところ、石
英を使用したものでは、大きなインクルージヨン
が数個所でみられ、微結晶の内包も多かつた。水
晶を使用したものでは、育成の初期の部分にわず
かにインクルージヨンがみられるだけで、全体と
して、高品質の単結晶であつた。
When the growth speed is shown in a graph as shown in Figure 6, it can be seen that the growth speed is faster when crystal is used as the base material. In addition, the obtained single crystal was
When the line rocking curve was examined using a microscope, large inclusions were seen in several places in the case of the one using quartz, and there were many inclusions of microcrystals. In the case of using crystal, only a few inclusions were observed in the early stage of growth, and the crystal was overall of high quality.

上述の如く、本発明のベリル単結晶の合成方法
は、ほぼベリルの組成比を示す酸化ベリリウム、
酸化アルミニウム、二酸化ケイ素及び着色剤とし
て酸化クロム等を加えてなる母剤物質に、上記溶
融融剤(フラツクス)としての五酸化バナジウ
ム、モリブデン酸ナトリウム、三酸化モリブデ
ン、酸化リチウム、酸化ナトリウム等の中から選
ばれた1種又は2種以上を加え、上記融剤の溶融
温度以上に加熱して溶融塩を形成し、種子結晶上
にベリル単結晶を析出させる合成法において、上
記母剤物質の二酸化ケイ素として、合成水晶を使
用したことにより、インクルージヨン、及び微結
晶の内包が全くない高品質の単結晶が得られると
同時に、結晶の成長速度が格段に向上したベリル
単結晶の合成を可能にしたものである。品質向
上、歩留向上が本発明により容易に達成できるた
め、メーザ用等機能結晶に用いられるだけでな
く、宝飾用としても用いることができるため、実
用上極めて有用な発明である。
As mentioned above, the method for synthesizing beryl single crystals of the present invention involves the use of beryllium oxide, which has a composition ratio approximately that of beryl,
A base substance consisting of aluminum oxide, silicon dioxide, and chromium oxide as a coloring agent is mixed with vanadium pentoxide, sodium molybdate, molybdenum trioxide, lithium oxide, sodium oxide, etc. as the above-mentioned melting agent (flux). In a synthesis method in which beryl single crystals are precipitated on seed crystals by adding one or more selected from the above and heating above the melting temperature of the above-mentioned flux to form a molten salt, the above-mentioned base material dioxide is added. By using synthetic quartz as silicon, we can obtain high-quality single crystals with no inclusions or inclusions of microcrystals, while at the same time making it possible to synthesize beryl single crystals with significantly improved crystal growth rates. This is what I did. Since the present invention can easily improve quality and yield, it can be used not only for functional crystals such as masers, but also for jewelry, so it is an extremely useful invention in practice.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第4図はフラツクス法における、る
つぼの概略断面図である。第1図及び第4図にお
いて、1は白金るつぼ、2は母剤、3はフラツク
ス、4はシード、5は白金板である。第4図にお
いて、2−aは焼結体、2−bは石英又は水晶で
ある。第2図・第3図・第5図及び第6図は本発
明にもとづく、育成日数と育成スピード関係を示
したものである。A……母剤として水晶を使用し
た場合の育成スピードカーブ、B……母剤として
石英を使用した場合の、育成スピードカーブ。
1 and 4 are schematic cross-sectional views of a crucible in the flux method. In FIGS. 1 and 4, 1 is a platinum crucible, 2 is a base material, 3 is a flux, 4 is a seed, and 5 is a platinum plate. In FIG. 4, 2-a is a sintered body, and 2-b is quartz or crystal. Figures 2, 3, 5, and 6 show the relationship between the number of days for growth and the speed of growth based on the present invention. A...Growing speed curve when using quartz as the base material, B...Growing speed curve when using quartz as the base material.

Claims (1)

【特許請求の範囲】[Claims] 1 ほぼベリルの組成比を示す酸化ベリリウム、
酸化アルミニウム、二酸化ケイ素及び着色剤とし
て酸化クロム等を加えてなる母剤物質に、上記溶
融剤(フラツクス)としての五酸化バナジウム、
モリブデン酸ナトリウム、三酸化モリブデン、酸
化リチウム、酸化ナトリウム等の中から選ばれた
1種叉は2種以上を加え、上記融剤の溶融温度以
上に加熱して溶融塩を形成し、種子結晶上にベリ
ル単結晶を析出させてなる合成法において、上記
母剤物質の二酸化ケイ素として、合成水晶を使用
したことを特徴とするベリル単結晶の合成方法。
1 Beryllium oxide, which has a composition ratio almost that of beryl,
Vanadium pentoxide as a melting agent (flux),
One or more selected from sodium molybdate, molybdenum trioxide, lithium oxide, sodium oxide, etc. are added and heated to a temperature higher than the melting temperature of the above flux to form a molten salt. 1. A method for synthesizing a beryl single crystal, characterized in that a synthetic quartz crystal is used as silicon dioxide as the base substance.
JP58182181A 1983-09-30 1983-09-30 Synthesis method of beryl single crystal Granted JPS6077199A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58182181A JPS6077199A (en) 1983-09-30 1983-09-30 Synthesis method of beryl single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58182181A JPS6077199A (en) 1983-09-30 1983-09-30 Synthesis method of beryl single crystal

Publications (2)

Publication Number Publication Date
JPS6077199A JPS6077199A (en) 1985-05-01
JPH0319199B2 true JPH0319199B2 (en) 1991-03-14

Family

ID=16113754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58182181A Granted JPS6077199A (en) 1983-09-30 1983-09-30 Synthesis method of beryl single crystal

Country Status (1)

Country Link
JP (1) JPS6077199A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115095A (en) * 1981-12-25 1983-07-08 Matsushima Kogyo Co Ltd Synthesis of artificial beryl single crystal

Also Published As

Publication number Publication date
JPS6077199A (en) 1985-05-01

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