JPH03193172A - cleaning equipment - Google Patents
cleaning equipmentInfo
- Publication number
- JPH03193172A JPH03193172A JP33321489A JP33321489A JPH03193172A JP H03193172 A JPH03193172 A JP H03193172A JP 33321489 A JP33321489 A JP 33321489A JP 33321489 A JP33321489 A JP 33321489A JP H03193172 A JPH03193172 A JP H03193172A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- tank
- liquid
- storage tank
- liq
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 180
- 238000003860 storage Methods 0.000 claims abstract description 39
- 238000007654 immersion Methods 0.000 claims abstract description 14
- 238000010992 reflux Methods 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims description 95
- 238000005406 washing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract 1
- 230000007723 transport mechanism Effects 0.000 description 4
- 239000003599 detergent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は、被洗浄物を洗浄槽内の洗浄液に浸漬して洗
浄を行う洗浄装置に係り、特に成分の異なる二種類の洗
浄液による浸漬洗浄を、引き続くつのステップによって
遂行するようにした洗浄装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a cleaning device that cleans an object by immersing it in a cleaning liquid in a cleaning tank, and particularly relates to immersion cleaning using two types of cleaning liquids with different components. The present invention relates to a cleaning device in which the following steps are performed.
［従来の技術］
従来のこの種の洗浄装置においては、水溶性洗剤等より
なる二種類の洗浄液を収容した二つの洗浄槽が横方向に
並べて設けられ、両洗浄柄の上部には被洗浄物を両洗浄
槽間で横移動させると共に各洗浄槽との対応位置で上下
動させるための搬送ｍ梢か設けられている。そして、搬
送機構により被洗浄物を一方の洗浄槽と対応する位置に
搬送すると共に、その洗浄槽内の洗浄液に浸漬して洗浄
を行い、この洗浄作業の終了後に、搬送機構により被洗
浄物を他方の洗浄槽と対応する位′Ｉ１．まで搬送する
と共に、その洗浄槽内の洗浄液に浸漬して洗浄を行うよ
うになっている。[Prior Art] In a conventional cleaning device of this type, two cleaning tanks containing two types of cleaning liquids such as water-soluble detergents are installed side by side in a horizontal direction, and the upper part of both cleaning handles is equipped with two cleaning tanks containing two types of cleaning liquids such as water-soluble detergents. A conveyor is provided for horizontally moving the cleaning tank between the two cleaning tanks and moving it up and down at a position corresponding to each cleaning tank. Then, the object to be cleaned is transported by the transport mechanism to a position corresponding to one of the cleaning tanks, and is immersed in the cleaning liquid in the cleaning tank to be cleaned.After this cleaning operation is completed, the object to be cleaned is transported by the transport mechanism to the position corresponding to one of the cleaning tanks. The position corresponding to the other cleaning tank 'I1. At the same time, they are immersed in the cleaning liquid in the cleaning tank for cleaning.
［発明が解決しようとする課題゛１
このため、前記の従来の洗浄装置では、装置全体か大型
になって大きな設置スペースを必要とすると共に、被洗
浄物の搬送機構が複雑になって製造コストが高騰すると
いう問題点があった。[Problems to be Solved by the Invention] 1 For this reason, in the conventional cleaning device described above, the entire device becomes large and requires a large installation space, and the transport mechanism for the object to be cleaned becomes complicated, which increases manufacturing costs. The problem was that prices were rising.
この発明は、このような従来の技術に存在する問題点に
着目してなされたものであって、その目的とするところ
は、成分の異なる二種類の洗浄液による浸漬洗浄を、被
洗浄物の上下動のみで引き続き行うことができ、装置全
体を小型化して８置スペースを小さくすることができる
と共に、被洗浄物の搬送機構を簡略化して、製造コスト
の低減を図ることかできる洗浄装置を提供することにあ
る。This invention was made by focusing on the problems that exist in the conventional technology, and its purpose is to perform immersion cleaning using two types of cleaning liquids with different components. To provide a cleaning device that can continue to perform operations by only moving, can downsize the entire device and reduce the space required for 8 machines, and can reduce manufacturing costs by simplifying the transport mechanism for the objects to be cleaned. It's about doing.
［課題を解決するための手段」
上記の目的を達成するために、この発明においては、成
分の異なる二種類の洗浄液による浸漬洗浄を、引き続く
二つのステップによって遂行するようにした洗浄装置に
おいて、第１洗浄液を収容する第１洗浄槽と、その第１
洗浄槽の一側に配設され、第２洗浄液を貯留する貯液槽
と、前記第１洗浄槽の貯液槽と逆の側に、第１洗浄槽の
側壁から所定の間隔をおいて立設された壁面と、その壁
面と第１洗浄槽との間に落下する第２洗浄液を貯液槽に
還流するための還流路と、前記貯液槽の」上方位置と第
１洗浄槽の」上方位置との間に水平移動可能に設けられ
、常には貯液槽の上方位置に配置されて前記壁面の側か
開放されると共に、作動時には第１洗浄格の上方位置に
配置されて壁面との密着により一つの浸漬洗浄槽を形成
する第２洗浄槽と、前記貯液槽内の第２洗浄液を第２洗
浄槽内に供給するために、貯液槽と壁面との間に設けら
れなポンプを含む洗浄液供給回路と、被洗浄物を前記第
１洗浄槽内に上方から下降させて、第１洗浄桁内の第１
洗浄液に浸漬させると共に、被洗浄物をその第１洗浄液
中から中間上昇位置まで引き上げて、前記作動状態の第
２洗浄槽内の第２洗浄液に浸漬させるリフトとを備えた
ものである。[Means for Solving the Problems] In order to achieve the above object, the present invention provides a cleaning apparatus that performs immersion cleaning using two types of cleaning liquids having different components in two successive steps. a first cleaning tank containing a first cleaning liquid;
A liquid storage tank is provided on one side of the cleaning tank and stores a second cleaning liquid, and a liquid storage tank is provided on the opposite side of the first cleaning tank from the liquid storage tank, and is installed at a predetermined distance from the side wall of the first cleaning tank. a wall surface provided therein, a return path for returning the second cleaning liquid that falls between the wall surface and the first cleaning tank to the liquid storage tank, and an upper position of the liquid storage tank and the first cleaning tank. It is provided so as to be horizontally movable between the upper position and the liquid storage tank, and is normally placed above the liquid storage tank so that the side of the wall surface is open, and when activated, it is placed above the first cleaning stage and is connected to the wall surface. a second cleaning tank that forms one immersion cleaning tank by close contact with the liquid storage tank; A cleaning liquid supply circuit including a pump and a first cleaning tank in which the object to be cleaned is lowered from above into the first cleaning tank and
It is equipped with a lift for immersing the object in the cleaning liquid, lifting the object to be cleaned from the first cleaning liquid to an intermediate raised position, and immersing it in the second cleaning liquid in the second cleaning tank in the operating state.
「作 用」
上記のように構成された洗浄装置において、被洗浄物か
リフＩ〜により第１洗浄槽内に上方の原位置から下降さ
れるときには、第２洗浄槽が貯液槽の上方位置に移動配
置されている。このため、被洗浄物は第２洗浄槽と干渉
することなく第１洗浄槽内の第１洗浄液に浸漬されて、
浸漬洗浄が行われる。"Function" In the cleaning device configured as described above, when the object to be cleaned is lowered from its original position above into the first cleaning tank by lift I~, the second cleaning tank is moved to a position above the liquid storage tank. It has been moved and placed. Therefore, the object to be cleaned is immersed in the first cleaning liquid in the first cleaning tank without interfering with the second cleaning tank.
Immersion cleaning is performed.
この洗浄作業が終了すると、被洗浄物がリフトにより第
１洗浄液中から中間上昇位Ｍ、まで引き−１−けられる
と共に、第２洗浄槽が貯液槽の上方位置から第１洗浄槽
の」一方位置に移動されて、壁面との密着により一つの
浸漬洗浄槽が形成される。この状態でポンプの作動によ
り洗浄液供給回路を介して、貯液槽から第２洗浄槽内に
第２洗浄液が供給され、被洗浄物か第２洗浄液に浸漬さ
れて洗浄が行われる。When this cleaning work is completed, the object to be cleaned is pulled by a lift from the first cleaning liquid to an intermediate ascending position M, and the second cleaning tank is moved from a position above the liquid storage tank to a position above the first cleaning tank. It is moved to one position and forms one immersion cleaning tank by coming into close contact with the wall surface. In this state, the second cleaning liquid is supplied from the liquid storage tank into the second cleaning tank through the cleaning liquid supply circuit by the operation of the pump, and the object to be cleaned is immersed in the second cleaning liquid to be cleaned.
この洗浄作業が終了すると、被洗浄物がリフトにより第
２洗浄液中から原位置まで引き上げられると共に、第２
洗浄槽が壁面から所定間隔だけ離間移動されて、第２洗
浄楕から落下する第２洗浄液が還流路を介して貯液槽内
に還流される。そして、この第２洗浄液の還流終了後に
、第２洗浄楕が貯液槽の上方位置まで復帰移動される。When this cleaning work is completed, the object to be cleaned is lifted up from the second cleaning liquid to its original position by a lift, and
The cleaning tank is moved away from the wall by a predetermined distance, and the second cleaning liquid falling from the second cleaning ellipse is returned to the liquid storage tank via the reflux path. After the reflux of the second cleaning liquid is completed, the second cleaning ellipse is returned to a position above the liquid storage tank.
［実施例］
以下、この発明を具体化した洗浄装置の一実施例を、図
面に基づいて詳細に説明する。[Example] Hereinafter, an example of a cleaning device embodying the present invention will be described in detail based on the drawings.
第１図及び第２図に示すように、装置本体１は内部に第
１洗浄槽２を倫え、この第１洗浄槽２内には水溶性洗剤
等からなる第１洗浄液３が収容されている。貯液槽４４
は第１洗浄槽２の−・側に隣接配置され、その内部には
水又は水溶＝１９°仕十液等よりなる第２洗浄液５か貯
留されている。壁面６は第１洗浄楕２の貯液槽４と逆の
側に、第１洗浄槽２の側壁から所定の間隔１−をおいて
立設形成されている。還流路としての還流樋７は壁面６
と第１洗浄槽２の側壁との間に形成され、両者間に落下
する第２洗浄液５かこの還流ｔＭ１７を介して貯液槽４
内に還流される。As shown in FIGS. 1 and 2, the main body 1 of the apparatus has a first cleaning tank 2 therein, and a first cleaning liquid 3 made of a water-soluble detergent or the like is stored in the first cleaning tank 2. There is. Liquid storage tank 44
is arranged adjacent to the - side of the first cleaning tank 2, and a second cleaning liquid 5 made of water or an aqueous solution (19° liquid) is stored therein. The wall surface 6 is formed upright on the opposite side of the first cleaning ellipse 2 from the liquid storage tank 4 at a predetermined distance 1- from the side wall of the first cleaning tank 2. The return gutter 7 as a return flow path is connected to the wall surface 6
and the side wall of the first cleaning tank 2, and the second cleaning liquid 5 falling between the two flows through the reflux tM17 to the liquid storage tank 4.
It is refluxed into the interior.
一対のカイトレール８は前記第１洗浄槽２及び貯液’Ｍ
Ｊ４の上方に配：Ｖされ、両１２．４に跨かつて水平方
向に延び−Ｃいる。第２洗浄槽９はカイトレール８−に
に水平移動可能に支持され、前記壁面６と対向する側面
には開り部１０か設けられると共に、上縁には溢水口１
１が形成されている。エアシリンダ１２は貯液槽４の」
一方において装置本体ｊ内に設ｃ−ｔられ、コネクタ１
３を介して第２洗浄１ｉ９に連結されている。そして、
常には第１図に実線で示すように、第２洗浄槽９が貯液
槽４の上方位置に配置されて、その−開開口部１０が開
放され、同図に鎖線で示すように、エアシリンダ１２に
より第２洗浄槽９か第１洗浄槽２の−Ｆ方位置に移動配
置されたときには、その−開開口部１０が壁面６に密着
して一つの浸漬洗浄槽か形成される。A pair of kite rails 8 are connected to the first cleaning tank 2 and the liquid storage 'M'.
It is placed above J4 and extends horizontally across both 12.4 and -C. The second cleaning tank 9 is horizontally movably supported by the kite rail 8-, and has an opening 10 on the side facing the wall 6, and an overflow port 1 on the upper edge.
1 is formed. The air cylinder 12 is connected to the liquid storage tank 4.
On the other hand, it is installed in the device body j, and the connector 1
3 to the second wash 1i9. and,
Normally, the second cleaning tank 9 is placed above the liquid storage tank 4, as shown by the solid line in FIG. When the second cleaning tank 9 or the first cleaning tank 2 is moved to the -F direction position by the cylinder 12, its -opening opening 10 is brought into close contact with the wall surface 6, forming one immersion cleaning tank.
洗浄液供給回路１４は前記貯液槽４と壁１１ｉｉ ６と
の間に設けられ、その途中にはポンプ１５が介装されて
いる。そして、前記のように第２洗浄槽９が第１洗浄槽
２の上方位置に配置された状態で、ポンプ１５の作動に
より貯液槽４内の第２洗浄液５が、洗浄液供給回路１４
を介して第２洗浄槽９内に供給される。The cleaning liquid supply circuit 14 is provided between the liquid storage tank 4 and the wall 11ii6, and a pump 15 is interposed therebetween. Then, with the second cleaning tank 9 disposed above the first cleaning tank 2 as described above, the second cleaning liquid 5 in the liquid storage tank 4 is supplied to the cleaning liquid supply circuit 14 by the operation of the pump 15.
The water is supplied into the second cleaning tank 9 via.
一対のガイドレール１６は前記第１洗浄槽２の対向側壁
の内面に取り付けられ、上下方向に延びている。リフト
を構成する昇降台１７はガイドローラ１８を介してカイ
トレール１６に上下動可能に支持され、その上面には被
洗浄物を収容した洗浄筒１９が載置される。連結用チェ
ーン２０は一端において昇降台１７に固定され、その他
端にはバランスウェーＩ・２１が取り付けられている。A pair of guide rails 16 are attached to the inner surfaces of opposing side walls of the first cleaning tank 2 and extend in the vertical direction. A lifting table 17 constituting a lift is supported by a kite rail 16 via guide rollers 18 so as to be able to move up and down, and a cleaning cylinder 19 containing an object to be cleaned is placed on its upper surface. The connecting chain 20 is fixed to the lifting platform 17 at one end, and the balance way I.21 is attached to the other end.
ガイド用スブロケッ１−２２．２３は連結用チェーン２
０の移動を案内するように装置本体１上に設けられ、一
方のガイド用スプロケット２２がモータ２４によりスブ
ロケッ１−２５．２６及び無端チェーン２７を介して回
転される。Guide block 1-22.23 is connecting chain 2
One guide sprocket 22 is rotated by a motor 24 via a sprocket 1-25, 26 and an endless chain 27.
そして、前記モータ２４によるガイ）く用スプロケット
２２の一方向への回転に伴い、昇降台１７が第１図及び
第２図に実線で示す第１洗浄槽２上方の原位置Ａから、
鎖線で示す第１洗浄槽２内の下降位置Ｂまで搬入下降さ
れて、洗浄能１９内の被洗浄物か第１洗浄液３に浸漬さ
れると共に、カイト用スプロケット２２の他方向への回
転に伴い、昇降台１７が下降位置Ｂから鎖線で示す中間
上昇位置Ｃまで引き上けられて、前記被洗浄物が作動状
態の第２洗浄槽９内の第２洗浄液５に浸漬される。As the guide sprocket 22 is rotated in one direction by the motor 24, the lifting platform 17 moves from the original position A above the first cleaning tank 2 shown by the solid line in FIGS. 1 and 2.
The object to be cleaned is carried in and lowered to the lowered position B in the first cleaning tank 2 shown by the chain line, and the object to be cleaned in the cleaning capacity 19 is immersed in the first cleaning liquid 3, and as the kite sprocket 22 rotates in the other direction. , the lifting platform 17 is raised from the lowered position B to the intermediate raised position C shown by the chain line, and the object to be cleaned is immersed in the second cleaning liquid 5 in the second cleaning tank 9 in the activated state.
次に、前記のように構成された洗浄装置について動作を
説明する。Next, the operation of the cleaning device configured as described above will be explained.
さて、この洗浄装置の非洗浄時には、第１図に実線で示
すように、第２洗浄［９か貯液［４の上方位置に配置さ
れている。この状態で被洗浄物を収容した洗浄筒１９を
昇降台１７上に載置した後、図示しないスタートスイッ
チを操作すると、モータ２４の回転によりチェーン２０
等を介して昇降台１７が原位置Ａから第１洗浄槽２内の
下降位置Ｂまで搬入下降され、洗浄筒１９に収容された
被洗浄物が第１洗浄ｊｆＭ２内の第１洗浄液３に浸漬さ
れて浸漬洗浄か行われる。Now, when this cleaning device is not cleaning, it is disposed above the second cleaning [9] or the storage liquid [4], as shown by the solid line in FIG. After placing the cleaning cylinder 19 containing the object to be cleaned on the lifting table 17 in this state, when a start switch (not shown) is operated, the chain 20 is rotated by the rotation of the motor 24.
The lifting table 17 is carried in and lowered from the original position A to the lowered position B in the first cleaning tank 2 via the etc., and the object to be cleaned accommodated in the cleaning cylinder 19 is immersed in the first cleaning liquid 3 in the first cleaning jfM2. It is then immersed and cleaned.
そして、この第１洗浄液３による浸漬洗浄が終了すると
、モータ２４の回転により昇降台１７が下降位置Ｂから
中間上昇位置Ｃまで上昇されて一時的に停留され、洗浄
能１９内の被洗浄物か第１洗浄槽２内の第１洗浄液３か
ら引き上げられる。When the immersion cleaning with the first cleaning liquid 3 is completed, the lifting table 17 is raised from the lowered position B to the intermediate raised position C by the rotation of the motor 24 and is temporarily stopped, and the object to be cleaned in the cleaning capacity 19 is It is pulled up from the first cleaning liquid 3 in the first cleaning tank 2.
その後、第１図に鎖線で示すように、エアシリンダ１２
の作動により第２洗浄槽９が貯液槽４の上方位置から第
１洗浄槽２の上方位置に移動され、第２洗浄槽９の一側
開口部１０が壁面６に密着し０
て一つの浸漬洗浄槽か形成される。この状態でポンプ１
５の作動により洗浄液供給回路１４を介して、貯液槽４
から第２洗浄ＩＩＱ内に第２洗浄［５か供給され、被洗
浄物が第２洗浄液５に浸漬されて洗浄が行われる。After that, as shown by the chain line in FIG. 1, the air cylinder 12
As a result of the operation, the second cleaning tank 9 is moved from a position above the liquid storage tank 4 to a position above the first cleaning tank 2, and one side opening 10 of the second cleaning tank 9 is brought into close contact with the wall surface 6, and one An immersion cleaning tank is formed. In this state, pump 1
5, the liquid storage tank 4 is supplied via the cleaning liquid supply circuit 14.
The second cleaning liquid 5 is supplied into the second cleaning IIQ, and the object to be cleaned is immersed in the second cleaning liquid 5 to perform cleaning.
このとき、第２洗浄４’ｌ１９内の第２洗浄液５は溢水
口１１から溢れ出て、還流樋７により貯液槽４内に還流
されるため、第２洗浄槽９内の第２洗浄液５は常に一定
の水位に維持される。又、第２洗浄槽９の開口部１０と
壁面６との間の僅かな隙間から第２洗浄液５か漏出する
ことがあるが、この漏出した第２洗浄液５は第１洗浄槽
２内に流入することなく、還流樋７を介して貯液槽４内
に還流される。At this time, the second cleaning liquid 5 in the second cleaning tank 9 overflows from the overflow port 11 and is refluxed into the liquid storage tank 4 by the reflux gutter 7. is always maintained at a constant water level. Further, the second cleaning liquid 5 may leak from a small gap between the opening 10 of the second cleaning tank 9 and the wall surface 6, but this leaked second cleaning liquid 5 flows into the first cleaning tank 2. The liquid is refluxed into the liquid storage tank 4 through the reflux gutter 7 without being drained.
さらに、この第２洗浄液５による浸漬洗浄が終了すると
、ポンプ１５か停止されて第２洗浄槽９内への第２洗浄
液５の供給か停止されると共に、モータ２４の回転によ
り昇降台１７が中間上昇位置Ｃから原位置Ａまで上昇復
帰されて、被洗浄物が第２洗浄槽９内の第２洗浄液５か
ら引き上げら１
れる。その後、エアシリンダ１２の作動により第２洗浄
槽９が壁面６から所定間隔したけ離間した位置まで移動
されて、第２洗浄槽９の開口部１０が開放され、その開
［１部１０から落丁する第２洗浄液５が還流樋７を介し
て貯液槽４内に還流される。そして、この第２洗浄液５
の還流終了後に、第２洗浄槽９が貯液１ｗ４の上方位置
まで復帰移動される。Furthermore, when the immersion cleaning with the second cleaning liquid 5 is completed, the pump 15 is stopped and the supply of the second cleaning liquid 5 into the second cleaning tank 9 is stopped, and the lifting platform 17 is moved to the intermediate position by the rotation of the motor 24. The object to be cleaned is raised and returned from the raised position C to the original position A, and the object to be cleaned is lifted out of the second cleaning liquid 5 in the second cleaning tank 9. Thereafter, the second cleaning tank 9 is moved to a position a predetermined distance from the wall surface 6 by the operation of the air cylinder 12, and the opening 10 of the second cleaning tank 9 is opened. The second cleaning liquid 5 is refluxed into the liquid storage tank 4 via the reflux gutter 7. Then, this second cleaning liquid 5
After the reflux is completed, the second cleaning tank 9 is returned to a position above the storage liquid 1w4.
なお、この発明は前記実施例の構成に限定されるもので
はなく、例えば、第１洗浄槽２の底部に超音波発振器を
設けて、被洗浄物を第１洗浄液３内への浸漬と超音波と
の併用で洗浄するように構成する等、この発明の趣旨か
ら逸脱しない範囲で、各部の構成を任意に変更して具体
化することも可能である。Note that the present invention is not limited to the configuration of the embodiment described above. For example, an ultrasonic oscillator may be provided at the bottom of the first cleaning tank 2, and the object to be cleaned may be immersed in the first cleaning liquid 3 and subjected to ultrasonic waves. It is also possible to arbitrarily change and embody the configuration of each part without departing from the spirit of the present invention, such as configuring it to be cleaned in combination with the present invention.
［発明の効果コ
この発明は、以上説明したように構成されているため、
成分の異なる二種類の洗浄液による浸漬洗浄を、被洗浄
物の、ト下動のみで引き続き行うことができ、装置全体
を小型化して設置スペースを２
小さくすることかできると共に、被洗浄物の搬送機構を
簡略化して、製造コストの低減を図ることができるとい
う優れた効果を奏する。[Effects of the Invention] Since this invention is configured as explained above,
Immersion cleaning using two types of cleaning solutions with different components can be performed continuously by simply moving the object to be cleaned down, making it possible to downsize the entire device and reduce the installation space. This has the excellent effect of simplifying the mechanism and reducing manufacturing costs.
第１図はこの発明を具体化した洗浄装置の一実施例を示
す正断面図、第２図は同しく洗浄装置の側断面図である
。
２・・・第１洗浄槽、３・・・第１洗浄液、４・・・貯
液槽、５・・・第２洗浄液、６・・・壁面、７・・・還
流路を構成する還流樋、９・・・第２洗浄槽、１４・・
・洗浄液供給回路、１５・・・ポンプ、１７・・・リフ
トを構成する昇降台６FIG. 1 is a front sectional view showing an embodiment of a cleaning device embodying the present invention, and FIG. 2 is a side sectional view of the cleaning device. 2... First cleaning tank, 3... First cleaning liquid, 4... Liquid storage tank, 5... Second cleaning liquid, 6... Wall surface, 7... Reflux gutter forming a reflux path. , 9... second cleaning tank, 14...
-Cleaning liquid supply circuit, 15...pump, 17...lifting platform 6 that constitutes the lift
Claims (1)
き続く二つのステップによって遂行するようにした洗浄
装置において、 第１洗浄液（３）を収容する第１洗浄槽（２）と、 その第１洗浄槽（２）の一側に配設され、第２洗浄液（
５）を貯留する貯液槽（４）と、 前記第１洗浄槽（２）の貯液槽（４）と逆の側に、第１
洗浄槽（２）の側壁から所定の間隔をおいて立設された
壁面（６）と、 その壁面（６）と第１洗浄槽（２）との間に落下する第
２洗浄液（５）を貯液槽（４）に還流するための還流路
（７）と、 前記貯液槽（４）の上方位置と第１洗浄槽（２）の上方
位置との間に水平移動可能に設けられ、常には貯液槽（
４）の上方位置に配置されて前記壁面（６）の側が開放
されると共に、作動時には第１洗浄槽（２）の上方位置
に配置されて壁面（６）との密着により一つの浸漬洗浄
槽を形成する第２洗浄槽（９）と、 前記貯液槽（４）内の第２洗浄液（５）を第２洗浄槽（
９）内に供給するために、貯液槽（４）と壁面（６）と
の間に設けられたポンプ（１５）を含む洗浄液供給回路
（１４）と、 被洗浄物を前記第１洗浄槽（２）内に上方から下降させ
て、第１洗浄槽（２）内の第１洗浄液（３）に浸漬させ
ると共に、被洗浄物をその第１洗浄液（３）中から中間
上昇位置まで引き上げて、前記作動状態の第２洗浄槽（
９）内の第２洗浄液（５）に浸漬させるリフト（１７）
と を備えたことを特徴とする洗浄装置。[Claims] 1. In a cleaning device that performs immersion cleaning using two types of cleaning liquids having different components in two successive steps, a first cleaning tank (2) containing a first cleaning liquid (3); and a second cleaning liquid (
5), and a first washing tank (2) on the opposite side of the first cleaning tank (2) from the liquid storage tank (4).
A wall (6) is erected at a predetermined distance from the side wall of the cleaning tank (2), and a second cleaning liquid (5) falls between the wall (6) and the first cleaning tank (2). a reflux path (7) for refluxing the liquid to the liquid storage tank (4); and a reflux path (7) provided horizontally movably between the upper position of the liquid storage tank (4) and the upper position of the first cleaning tank (2); Always in the liquid storage tank (
4) is placed above the wall surface (6) so that the side of the wall surface (6) is open, and when activated, it is placed above the first cleaning tank (2) and is in close contact with the wall surface (6) to form one immersion cleaning tank. a second cleaning tank (9) forming a second cleaning tank (9);
9) a cleaning liquid supply circuit (14) including a pump (15) provided between the liquid storage tank (4) and the wall surface (6) for supplying the cleaning liquid to the first cleaning tank; (2) lower the object from above into the first cleaning tank (2) to immerse it in the first cleaning liquid (3), and at the same time pull up the object from the first cleaning liquid (3) to an intermediate raised position. , the second cleaning tank in the operating state (
9) Lift (17) immersed in the second cleaning liquid (5)
A cleaning device characterized by comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33321489A JPH03193172A (en) | 1989-12-23 | 1989-12-23 | cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33321489A JPH03193172A (en) | 1989-12-23 | 1989-12-23 | cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03193172A true JPH03193172A (en) | 1991-08-22 |
Family
ID=18263592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33321489A Pending JPH03193172A (en) | 1989-12-23 | 1989-12-23 | cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03193172A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0657473U (en) * | 1993-01-07 | 1994-08-09 | 三菱重工業株式会社 | Mobile cleaning device |
-
1989
- 1989-12-23 JP JP33321489A patent/JPH03193172A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0657473U (en) * | 1993-01-07 | 1994-08-09 | 三菱重工業株式会社 | Mobile cleaning device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH06502514A (en) | Semiconductor processing method and device | |
| JPH05255876A (en) | Method for washing metallic articles, device for washing metallic articles and device for drying metallic articles | |
| CN112620279A (en) | Wet process device | |
| US5299587A (en) | Rotating and reciprocating immersion cleaning apparatus and method | |
| KR100552236B1 (en) | Cleaning device and work conveying method | |
| JP3166049B2 (en) | Cleaning equipment | |
| JP3343344B2 (en) | Ultrasonic cleaning equipment | |
| US3476126A (en) | Material handling apparatus | |
| KR100595091B1 (en) | Washing machine | |
| JPH0377319A (en) | Ultrasonic cleaning apparatus | |
| JPS62130202A (en) | Cleaning method and equipment for impregnation | |
| CN219664592U (en) | Cleaning tank for cleaning environment-friendly optical instrument | |
| JPH03193175A (en) | cleaning equipment | |
| US1285272A (en) | Dish-washing apparatus. | |
| CN109411394B (en) | Chip cleaning device for semiconductor device processing | |
| JPH0652977U (en) | Cleaning equipment | |
| JPH0618627Y2 (en) | Cleaning and draining device | |
| TWM458655U (en) | Foldable wafer clean cassette frame and wafer clean device | |
| CN212664312U (en) | Inner hole spraying and cleaning device | |
| CN212577012U (en) | Medicinal material of easily floating surface of water is with soaking formula cleaning machine entirely | |
| SU659211A1 (en) | Component-cleaning washing machine | |
| JP2600449B2 (en) | How to clean box parts | |
| JP3155571B2 (en) | Immersion cleaning machine for machined parts | |
| JPH0125324Y2 (en) | ||
| CN210546730U (en) | Full-automatic wafer cleaning machine |