JPH031960U - - Google Patents

Info

Publication number
JPH031960U
JPH031960U JP6342389U JP6342389U JPH031960U JP H031960 U JPH031960 U JP H031960U JP 6342389 U JP6342389 U JP 6342389U JP 6342389 U JP6342389 U JP 6342389U JP H031960 U JPH031960 U JP H031960U
Authority
JP
Japan
Prior art keywords
plate
rotating
angle
main unit
shaped body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6342389U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6342389U priority Critical patent/JPH031960U/ja
Publication of JPH031960U publication Critical patent/JPH031960U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
第１図は本考案の一実施例が適用されたスパツ
タリング装置の概略構成図、第２Ａ図〜第２Ｃ図
は本考案の一実施例の動作を説明するための図で
ある。 １……架台、５……蓋体、８……ブラケツト、
１０……メインフレーム、１４……サブフレーム
、２０……第１エアシリンダ、２２……シリンダ
ロツド、３０……第２シリンダ、３２……シリン
ダロツド。

Claims (1)

  1. 【実用新案登録請求の範囲】 本体装置に回動自在に装着された板状体を所定
    角度回動させるための回動装置であつて、 一端が前記本体装置に回動自在に連結されたサ
    ブフレームと、このサブフレームに装着され前記
    板状体を第１の角度に回動させるための第１伸縮
    機構と、この第１シリンダの装着された前記サブ
    フレームを回動させて前記板状体を第１の角度よ
    りも大きな第２の角度に回動させるための第２伸
    縮機構とを備えた板状体の回動装置。
JP6342389U 1989-05-30 1989-05-30 Pending JPH031960U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6342389U JPH031960U (ja) 1989-05-30 1989-05-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6342389U JPH031960U (ja) 1989-05-30 1989-05-30

Publications (1)

Publication Number Publication Date
JPH031960U true JPH031960U (ja) 1991-01-10

Family

ID=31593459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6342389U Pending JPH031960U (ja) 1989-05-30 1989-05-30

Country Status (1)

Country Link
JP (1) JPH031960U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000055894A1 (en) * 1999-03-17 2000-09-21 Hitachi, Ltd. Plasma processing apparatus and method of maintaining the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000055894A1 (en) * 1999-03-17 2000-09-21 Hitachi, Ltd. Plasma processing apparatus and method of maintaining the same

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