JPH0319993Y2 - - Google Patents

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Publication number
JPH0319993Y2
JPH0319993Y2 JP1985016953U JP1695385U JPH0319993Y2 JP H0319993 Y2 JPH0319993 Y2 JP H0319993Y2 JP 1985016953 U JP1985016953 U JP 1985016953U JP 1695385 U JP1695385 U JP 1695385U JP H0319993 Y2 JPH0319993 Y2 JP H0319993Y2
Authority
JP
Japan
Prior art keywords
cleaned
ultrasonic
cleaning
tank
ultrasonic oscillator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985016953U
Other languages
Japanese (ja)
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JPS61132090U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985016953U priority Critical patent/JPH0319993Y2/ja
Publication of JPS61132090U publication Critical patent/JPS61132090U/ja
Application granted granted Critical
Publication of JPH0319993Y2 publication Critical patent/JPH0319993Y2/ja
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は超音波洗浄装置に関し、特に磁気ヘツ
ドあるいは焼成部材、磁性部材その他各種の電子
部品をチツピングなどを起さずに超音波洗浄する
ことのできる超音波洗浄装置に関する。
[Detailed Description of the Invention] The present invention relates to an ultrasonic cleaning device, and more particularly to an ultrasonic cleaning device that can ultrasonically clean magnetic heads, fired members, magnetic members, and various other electronic components without causing chipping. .

磁気ヘツドはその製造工程中に油とか粉などの
汚物が付着するので、超音波洗浄によつてこの汚
れを取り除く必要がある。超音波による洗浄原理
は、空胴現象(キヤビテーシヨン)による液中で
の気泡の発生と破壊の繰り返しにより、被洗浄部
材に付着した汚物に衝撃を与えて取り除くものと
考えられる。しかし磁気ヘツドのようなものを洗
浄する場合、磁気ヘツドの前面はフエライトコア
がケースから露出しかつこの面は研磨されている
ので、無制限に超音波洗浄を行うと、ヘツド前面
の面あらさ精度を阻害し、場合によつては毀損し
ていまう。特に磁気ヘツド前面を下向きにしたま
ま超音波洗浄すると、コアのフエライト結晶粒が
その表面から剥離、脱落し、微視的にみると表面
がこまかくかけるという、いわゆるチツピングを
起こし、不良品となつていまう。このチツピング
現象は、前述のキヤビテーシヨンによる表面の浸
蝕作用によりコアの結晶粒が剥れて自重で脱落す
るためと考えられる。
Since dirt such as oil and powder adheres to the magnetic head during the manufacturing process, it is necessary to remove this dirt by ultrasonic cleaning. The principle of cleaning using ultrasonic waves is thought to be that the repeated generation and destruction of bubbles in a liquid due to cavitation causes dirt adhering to the member to be cleaned to be impacted and removed. However, when cleaning something like a magnetic head, the ferrite core on the front surface of the magnetic head is exposed from the case and this surface is polished, so if you perform unlimited ultrasonic cleaning, the accuracy of the surface roughness on the front surface of the head will be reduced. This can hinder, and in some cases, even damage. In particular, if ultrasonic cleaning is performed with the front surface of the magnetic head facing downward, the ferrite crystal grains in the core will peel off and fall off from the surface, causing so-called chipping, where the surface is chipped when viewed microscopically, resulting in a defective product. Mau. This chipping phenomenon is thought to be due to the core crystal grains peeling off due to the surface erosion caused by the cavitation described above and falling off under their own weight.

このような結晶粒の脱落を防止するために上下
に離隔して超音波発振部を配置し、この間に被洗
浄面を上向きにして被洗浄部材を保持し超音波洗
浄を行うようにした装置(実開昭57−55580号)
が提案されている。この構成によれば被洗浄部材
の加工面の面あらさ精度を害することなく洗浄で
きるので、特に表面を研磨した結晶粒組成の各種
素材、磁気ヘツド等の洗浄に有用なものである
が、この装置では上側超音波発振部の高さ位置の
調整機構は有するものの、洗浄動作中は上下の超
音波発振部と被洗浄部材の取付部は固定されてお
り、洗浄作業中に生じた液中の浮遊物等のため
に、表面全体にわたつて均一にかつ充分に洗浄す
るには末だ難点があつた。
In order to prevent such drop-off of crystal grains, ultrasonic oscillator units are placed vertically apart, and between these units, the member to be cleaned is held with the surface to be cleaned facing upward, and ultrasonic cleaning is performed ( Utsukai No. 57-55580)
is proposed. With this configuration, cleaning can be performed without impairing the surface roughness accuracy of the machined surface of the member to be cleaned, so it is particularly useful for cleaning various materials with polished surfaces, magnetic heads, etc. Although it has a mechanism for adjusting the height position of the upper ultrasonic oscillator, the upper and lower ultrasonic oscillators and the mounting part of the object to be cleaned are fixed during cleaning operation, so floating in the liquid that occurs during cleaning operation is It was extremely difficult to clean the entire surface uniformly and thoroughly because of the dirt.

本考案は、被洗浄部品の微細加工面を上向きに
して配置し、しかも洗浄動作中に超音波発振部を
前記被洗浄部品に対して移動させ得るように構成
することにより、多面かつ微細加工面をチツピン
グや面あらさ精度の低下を起すことなく各面効果
的に洗浄することのできる超音波洗浄装置を提供
することを目的とするものである。
In the present invention, by arranging the part to be cleaned with the micro-machined surface facing upward and by configuring the ultrasonic oscillation unit to be moved relative to the part to be cleaned during the cleaning operation, it is possible to An object of the present invention is to provide an ultrasonic cleaning device that can effectively clean each surface without causing chipping or deterioration of surface roughness accuracy.

この目的のために本考案に係る超音波洗浄装置
は、洗浄槽内に、各々出力調整可能な下側超音波
発振部と上側超音波発振部とを設け、被洗浄部品
の加工面を上向きにして前記両発振部の間に保持
するための被洗浄部品取付部を設け、さらに前記
上側および下側の超音波発振部の両方またはいず
れか一方を前記被洗浄部品取付部に対して水平面
内で往復移動または回転し得るように槽内に保持
するとともにその駆動機構を設けたものである。
For this purpose, the ultrasonic cleaning device according to the present invention is provided with a lower ultrasonic oscillator and an upper ultrasonic oscillator, each with adjustable output, in the cleaning tank so that the processed surface of the parts to be cleaned faces upward. and a part to be cleaned attachment part for holding between the two oscillation parts, and furthermore, both or one of the upper and lower ultrasonic oscillation parts is provided within a horizontal plane with respect to the part to be cleaned part attachment part. It is held in a tank so that it can reciprocate or rotate, and is provided with a drive mechanism.

以下、本考案を、図面を参照しながら実施例に
ついて説明する。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図は本考案の1実施例に係る超音波洗浄装
置を、その動作中の状態で示した側面断面図であ
る。洗浄槽1の底部に下側超音波発振部3が配置
され、また前記底部に支柱2を介して被洗浄部品
である磁気ヘツド4を保持するための取付治具5
が設けられている。この治具5は複数個の上下に
貫通した段付孔部5aを有し、該孔部5aの各段
差部にそれぞれ前記磁気ヘツド4が保持される。
この場合、磁気ヘツド4はその研磨した前面(磁
気媒体走行面)4aが上向きになるように孔部5
aに保持され、これによつて磁気ヘツド研磨面4
aおよびヘツド底面4bが前記孔部を通して上下
に露出し、またヘツド側部の一部も治具5から露
出している。前記被洗浄部品の精度仕上加工面
は、磁気ヘツドにおいてはその前面つまり磁気ギ
ヤツプのある磁気媒体走行面となる。
FIG. 1 is a side sectional view showing an ultrasonic cleaning device according to an embodiment of the present invention in a state in which it is in operation. A lower ultrasonic oscillator 3 is disposed at the bottom of the cleaning tank 1, and a mounting jig 5 for holding a magnetic head 4, which is a component to be cleaned, is disposed at the bottom via a support 2.
is provided. This jig 5 has a plurality of stepped holes 5a penetrating vertically, and the magnetic head 4 is held in each stepped portion of the holes 5a.
In this case, the magnetic head 4 is arranged so that its polished front surface (magnetic medium running surface) 4a faces upward.
a, whereby the magnetic head polishing surface 4
a and the bottom surface 4b of the head are exposed vertically through the hole, and a part of the side part of the head is also exposed from the jig 5. The precision-finished surface of the part to be cleaned becomes the front surface of the magnetic head, that is, the magnetic medium running surface with the magnetic gap.

取付治具5に取り付けた磁気ヘツド4の上方で
かつ洗浄槽内に上側超音波発振部6が適当な支持
フレーム7に固着され、さらに該支持フレーム7
がガイド板16上を左右に摺動し得るように保持
されている。上下の超音波発振部6,3はそれぞ
れ互いに向き合う方向に超音波を発振するように
配置され、またそれぞれ別々に出力調整装置1
0,11を介して超音波発振器12に接続され、
これによつて前記上側および下側の超音波発振部
6,3の出力を個別に可変できるようになつてい
る。洗浄槽1内には、例えば水、アルコール、ア
セトンあるいはトリクロルエチレンなどの洗浄液
14で満され、上述の上側、下側の各超音波発振
部6,3および治具5、磁気ヘツド4などがこの
洗浄液14に浸漬される。
Above the magnetic head 4 attached to the mounting jig 5 and inside the cleaning tank, an upper ultrasonic oscillator 6 is fixed to a suitable support frame 7.
is held so as to be able to slide left and right on the guide plate 16. The upper and lower ultrasonic oscillating units 6 and 3 are arranged so as to oscillate ultrasonic waves in directions facing each other, and each has a separate output adjustment device 1.
connected to the ultrasonic oscillator 12 via 0, 11;
This allows the outputs of the upper and lower ultrasonic oscillators 6, 3 to be individually varied. The cleaning tank 1 is filled with a cleaning liquid 14 such as water, alcohol, acetone, or trichlorethylene, and the above-mentioned upper and lower ultrasonic oscillators 6, 3, jig 5, magnetic head 4, etc. It is immersed in the cleaning liquid 14.

第1図の実施例では前述の如く上側超音波発振
部6が支持フレーム7とともに横方向に所定のス
トロークで往復摺動し得るように構成されてい
る。この場合の往復移動周期は、1例として、1
サイクル/秒以下であり、この往復動作の手段と
して支持フレーム7に取り付けられたピニオン軸
13およびピニオン8と、前記ガイド板16に形
成されかつ前記ピニオン8とかみ合うラツク9
と、槽壁を貫通してのびるピニオン軸の軸端に連
結された可逆モータ(図示省略)とから成る駆動
機構が設けられている。しかしながら本考案によ
る駆動機構は上記構造のものに限定されるもので
なく、例えばピストン−シリンダ装置あるいは槽
外のモータにより駆動される送りねじおよびこれ
に螺合する被洗浄部品側に固着されたナツトから
成るねじ機構なども有効に採用され得る。ピスト
ン−シリンダ装置の場合はシリンダが槽外に設置
され、被洗浄部品を移動方向と平行にピストンロ
ツドが洗浄槽1を貫通して被洗浄部品支持フレー
ム7の端部に連結される。槽壁を貫通する部分に
は液もれ防止用の適当な密封装置が設けられるこ
とは勿論である。
In the embodiment shown in FIG. 1, as described above, the upper ultrasonic oscillator 6 is configured to be able to reciprocate in the lateral direction with a predetermined stroke together with the support frame 7. In this case, the reciprocating cycle is, for example, 1
cycles/second or less, and as a means for this reciprocating movement, a pinion shaft 13 and a pinion 8 are attached to the support frame 7, and a rack 9 formed on the guide plate 16 and meshing with the pinion 8.
and a reversible motor (not shown) connected to the shaft end of a pinion shaft extending through the tank wall. However, the drive mechanism according to the present invention is not limited to the structure described above, and includes, for example, a piston-cylinder device or a feed screw driven by a motor outside the bath, and a nut fixed to the part to be cleaned that is screwed into the feed screw. A screw mechanism consisting of the following can also be effectively employed. In the case of a piston-cylinder device, a cylinder is installed outside the tank, and a piston rod passes through the cleaning tank 1 parallel to the direction of movement of the parts to be cleaned and is connected to an end of the support frame 7 for the parts to be cleaned. Needless to say, the portion penetrating the tank wall is provided with a suitable sealing device to prevent liquid leakage.

このような構成で、例えば前記可逆モータを作
動させて上側超音波発振部6を往復移動させなが
ら、上側および下側の超音波発振部6,3を発振
させて液中に超音波を発生させる。磁気ヘツド4
の研磨面4aは上方を向いているので、超音波に
よる洗浄作用を受けても、表面のフエライト結晶
粒が自重で剥れ落ちることがなく、チツピングな
どを起さずに磁気ヘツド4に付着した油、塵介な
どの汚れが除去される。被洗浄部品に対面した上
側の超音波発振部6は左右に移動するので、浮遊
物の影響を受けず、多面体あるいは複雑な形状の
ものでも各面むらなく洗浄され、微細な加工面も
有効に洗浄される。汚れの程度により、あるいは
被洗浄部品の形状、種類などによつて超音波発振
器12の出力を調整し、あるいは超音波発振部の
移動速度を変える。
With such a configuration, for example, while operating the reversible motor to reciprocate the upper ultrasonic oscillating unit 6, the upper and lower ultrasonic oscillating units 6, 3 are oscillated to generate ultrasonic waves in the liquid. . magnetic head 4
Since the polished surface 4a faces upward, the ferrite crystal grains on the surface do not peel off under their own weight even when subjected to ultrasonic cleaning action, and adhere to the magnetic head 4 without causing chipping. Dirt such as oil and dirt is removed. Since the upper ultrasonic oscillation unit 6 facing the part to be cleaned moves from side to side, it is not affected by floating objects, and even polyhedral or complex-shaped objects can be cleaned evenly on each surface, and even finely machined surfaces can be effectively cleaned. Washed. The output of the ultrasonic oscillator 12 is adjusted or the moving speed of the ultrasonic oscillator is changed depending on the degree of contamination or the shape and type of the parts to be cleaned.

第2図は本考案の他の実施例の側面断面図であ
る。この実施例では下側超音波発振部3は槽底部
を貫通した回転軸15に軸支されて該軸のまわり
に回転し得るようになつている。回転軸15は槽
外でモータ17に連結され、このモータの付勢に
より下側超音波発振部3が回転駆動される。この
実施例でも被洗浄部品の加工面は上向きに取り付
けられているので、第1図の実施例と同様に加工
面を毀損することなく、また浮遊物をさけつつ微
細加工面や多面の洗浄が効果的に行われる。
FIG. 2 is a side sectional view of another embodiment of the present invention. In this embodiment, the lower ultrasonic oscillator 3 is rotatably supported by a rotating shaft 15 passing through the bottom of the tank so as to be able to rotate around the shaft. The rotating shaft 15 is connected to a motor 17 outside the tank, and the lower ultrasonic oscillator 3 is rotationally driven by the urging of this motor. In this embodiment as well, the machined surface of the part to be cleaned is mounted facing upward, so micro-machined surfaces and multiple surfaces can be cleaned without damaging the machined surface and avoiding floating objects, as in the embodiment shown in Figure 1. done effectively.

上述の実施例はいずれも上下の超音波発振部
6,3のいずれか一方のみを移動させるように構
成したが、本考案は必ずしもこのような態様に限
定されるものではなく、上側および下側の超音波
発振部の両方を可動させるようにしてもよい。そ
の駆動機構についても種々の手段が採用される。
また第2図の実施例で治具5を全体として円形状
に形成し、この円形板に被洗浄物を担持するため
の複数個の貫通孔を形成し、これによつてより多
くの被洗浄物を一度に洗浄するようにすることも
できる。さらに上側の超音波発振部6の高さ位置
を調整するように構成してもよい。
Although each of the above-mentioned embodiments is configured to move only one of the upper and lower ultrasonic oscillating units 6, 3, the present invention is not necessarily limited to such an embodiment; Both ultrasonic oscillation units may be moved. Various means are also adopted for the drive mechanism.
In addition, in the embodiment shown in FIG. 2, the jig 5 is formed into a circular shape as a whole, and a plurality of through holes are formed in this circular plate to support objects to be cleaned. You can also choose to wash things all at once. Furthermore, the height position of the upper ultrasonic oscillation section 6 may be adjusted.

上述の如く本考案によれば、被洗浄部品の面あ
らさ精度を必要とする面を上向きにして上下の超
音波発振部の間に設置し、しかもこれらの超音波
発振部を移動するように構成したので、微細な加
工面であつても面精度を維持しながら一層洗浄効
果を高めることができる。
As described above, according to the present invention, the part to be cleaned is installed between the upper and lower ultrasonic oscillators with the surface that requires surface roughness accuracy facing upward, and these ultrasonic oscillators are configured to be moved. Therefore, the cleaning effect can be further enhanced while maintaining surface accuracy even on finely machined surfaces.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の1実施例に係る超音波洗浄装
置の概略的な側面断面図、第2図は本考案の他の
実施例の部分的な側面断面図である。 1……洗浄槽、2……支柱、3……下側超音波
発振部、4……被洗浄部品(磁気ヘツド)、5…
…治具、6……上側超音波発振部、8……ラツ
ク、9……ピニオン、10,11……出力調整装
置、12……超音波発振器、14……洗浄液、1
5……回転軸、16……ガイド板、17……モー
タ。
FIG. 1 is a schematic side sectional view of an ultrasonic cleaning device according to one embodiment of the present invention, and FIG. 2 is a partial side sectional view of another embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Cleaning tank, 2... Support column, 3... Lower ultrasonic oscillator, 4... Parts to be cleaned (magnetic head), 5...
... Jig, 6 ... Upper ultrasonic oscillator, 8 ... Rack, 9 ... Pinion, 10, 11 ... Output adjustment device, 12 ... Ultrasonic oscillator, 14 ... Cleaning liquid, 1
5... Rotating shaft, 16... Guide plate, 17... Motor.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 洗浄槽内に、各々出力調整可能な下側超音波発
振部と上側超音波発振部とを、共に槽内の洗浄液
に浸るように上下に水平に設け、被洗浄部品の精
密仕上加工面を上向きにして前記下側および上側
超音波発振部の間に該被洗浄部品を配置するため
の取付部を水平に設け、さらに前記上側および
(または)下側超音波発振部を前記取付部に対し
て往復水平移動または回転可能に保持するととも
にその移動または回転駆動機構を設け、前記取付
部は、複数個の上下に貫通した段付孔部を有し、
該段付孔部の各段部に被洗浄部品が、少なくとも
その上部が露出するように載置され、かつ複数個
の被洗浄部品が同時に前記上側超音波発振部に対
面するように構成されることを特徴とする超音波
洗浄装置。
Inside the cleaning tank, a lower ultrasonic oscillator and an upper ultrasonic oscillator, each with adjustable output, are installed vertically and horizontally so that they are immersed in the cleaning liquid in the tank, with the precision-finished surface of the parts to be cleaned facing upward. A mounting section for placing the part to be cleaned is provided horizontally between the lower and upper ultrasonic oscillating sections, and the upper and/or lower ultrasonic oscillating sections are mounted relative to the mounting section. The mounting portion has a plurality of stepped holes penetrating vertically, the mounting portion having a plurality of vertically penetrating stepped holes;
A component to be cleaned is placed in each step of the stepped hole so that at least an upper portion thereof is exposed, and a plurality of components to be cleaned are configured to simultaneously face the upper ultrasonic oscillating section. An ultrasonic cleaning device characterized by:
JP1985016953U 1985-02-08 1985-02-08 Expired JPH0319993Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985016953U JPH0319993Y2 (en) 1985-02-08 1985-02-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985016953U JPH0319993Y2 (en) 1985-02-08 1985-02-08

Publications (2)

Publication Number Publication Date
JPS61132090U JPS61132090U (en) 1986-08-18
JPH0319993Y2 true JPH0319993Y2 (en) 1991-04-26

Family

ID=30504207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985016953U Expired JPH0319993Y2 (en) 1985-02-08 1985-02-08

Country Status (1)

Country Link
JP (1) JPH0319993Y2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503644U (en) * 1973-05-15 1975-01-16
JPS53103662A (en) * 1977-02-22 1978-09-09 Asahi Chem Ind Co Ltd Method of and for washing filtering cylinder

Also Published As

Publication number Publication date
JPS61132090U (en) 1986-08-18

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