JPH03211847A - Device for forming bump of tab inner lead - Google Patents

Device for forming bump of tab inner lead

Info

Publication number
JPH03211847A
JPH03211847A JP763590A JP763590A JPH03211847A JP H03211847 A JPH03211847 A JP H03211847A JP 763590 A JP763590 A JP 763590A JP 763590 A JP763590 A JP 763590A JP H03211847 A JPH03211847 A JP H03211847A
Authority
JP
Japan
Prior art keywords
bump
punch
inner lead
hollow
bumps
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP763590A
Other languages
Japanese (ja)
Inventor
Yasuhiro Otsuka
泰弘 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP763590A priority Critical patent/JPH03211847A/en
Priority to US07/510,208 priority patent/US5123163A/en
Publication of JPH03211847A publication Critical patent/JPH03211847A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To make it possible to so form a bump easily as to obtain the bonding to a semiconductor device with a satisfactory joining strength even when there are variations in the heights of the bumps and give no deformation to an inner lead, by using a punch for forming the bump on the inner lead. CONSTITUTION:A bump of a hollow structure is formed, using a punch whose diameter is increased upward from the lowest end of a protruding part 12 of the punch's head as a trapezoidal punch 11 of an inverted circular cone shape. That is, the center of the protruding part 12 of the punch's head is made to coincide with the center of a die's hole 15 of a die 16. Thereafter, the punch 11 is pushed into an inner lead 13 installed on the die 16, and a hollow bump 14 is formed at the head of the inner lead 13. After the hollow bump 14 is formed, when the punch 11 is detached from the inner lead 13, the punch 11 can be detached from it, giving scarcely any deformation to it, and the bump 14 to the hollow structure can be formed. Thereby, even when there are variations in the heights of the bumps, the bump 14 of the hollow structure which can attain the bonding to a semiconductor element with a satisfactory bonding strength can be formed easily, giving no deformation to the inner lead 13.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は半導体素子の実装に用いられるTAB(Tap
c Automated [3onding)用テープ
キャリアのインナーリード先端部に、機械的なプレス加
工により形成するバンプ形成装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to TAB (Tap) used for mounting semiconductor devices.
The present invention relates to a bump forming device that forms bumps on the inner lead tips of a tape carrier for Automated [3 onding] by mechanical press processing.

[従来の技術] 一般に、半導体素子をTAB用テープキャリアに実装す
るには、半導体素子の電極部又はテープキャリアのイン
ナーリード先端部のいずれか一方に、バンプとなる突起
を形成する必要がある。半導体素子の電極部にバンプ形
成する方法には、例えば。
[Prior Art] Generally, in order to mount a semiconductor element on a TAB tape carrier, it is necessary to form a protrusion that becomes a bump on either the electrode part of the semiconductor element or the inner lead tip of the tape carrier. Examples of methods for forming bumps on electrode portions of semiconductor devices include:

[アイビーエムジャーナル(IB(I Journal
) J第8巻(1964年)102頁に記載のように電
極部に直接バンプとなる突起をメツキ法により形成する
方法や、[エレクトロニック・パッケージング・アンド
・プロダクション([1cctronic l’ack
aging& I’roduc目on)J、1984イ
(司2月シ5,33〜39頁に記載のようにエツチング
技術を用いたペデスタル法、すなわちバンプを形成する
部分をマスキングしておき、他のインナーリード部分を
ハーフエツチングすることにより、30〜40pmの高
さの突起を形成する方法、あるいは[昭和60年度電7
通信学会゛1′−導体・材料部門全国大会論文集、11
1が演番号2J(1985年+ + B )に記−代の
ようにガラス基板にバンプを形成した後、電極部にバン
プを移し換える方式の転写バンプ法などが行われている
[IB (I Journal)
) J Vol. 8 (1964) p. 102, there is a method of forming protrusions that will become bumps directly on the electrode portion by plating method, and a method of forming protrusions that will become bumps directly on the electrode portions, as described in [Electronic Packaging and Production ([1cctronic l'ack
The pedestal method using an etching technique, that is, the part where the bump is to be formed, is masked and the other inner There is a method of forming protrusions with a height of 30 to 40 pm by half-etching the lead part, or
Communication Society of Japan 1'-Conductor/Materials Division National Conference Proceedings, 11
A transfer bump method has been used in which bumps are formed on a glass substrate and then transferred to electrode portions as described in 1985+2J (1985++B).

しかし、これらの方法でバンプを形成するには、高価な
露光装置やメツキ装置などの設備が必要となるだけでな
く、材料コストが高く、パターンニングのためのりソゲ
ラフイエ程やエツチングゴー程が必要になるためバンプ
形成]−程も長くなるという課題がある。
However, forming bumps using these methods not only requires equipment such as expensive exposure equipment and plating equipment, but also requires high material costs and a process of laminating and etching for patterning. Therefore, there is a problem that the bump formation becomes long.

このため、特公昭64−10094号公報に記載のよう
に、金型を用いた機械的なプレス成形加工技術を用いて
インナーリード先端部に凹部18を加工し、ペデスタル
19を製作する方法が提案されている(第6図参照)。
For this reason, as described in Japanese Patent Publication No. 64-10094, a method has been proposed in which the pedestal 19 is manufactured by forming a recess 18 at the tip of the inner lead using mechanical press forming technology using a mold. (See Figure 6).

この方法は、下型にフィルムとインナーリードが一体と
なったテープキャリアを装着し、−1一方からインナー
リードの幅よりも大きな凸部を有する」8型を降下させ
てインナーリードの先端部に四部18をプレス加]−に
よって形成し、バンプとなるペデスタル19をインナー
リード先端部に形成する方法である。なお、」−型の凸
部により圧下されたインナーリードの四部18の材料の
逃げのため、幅方向に切欠きが設けられている。
In this method, a tape carrier in which a film and an inner lead are integrated is attached to the lower mold, and a mold 8 having a protrusion larger than the width of the inner lead is lowered from one side to the tip of the inner lead. In this method, the four parts 18 are formed by pressing, and a pedestal 19, which becomes a bump, is formed at the tip of the inner lead. Note that notches are provided in the width direction to allow the material of the four parts 18 of the inner lead that has been pressed down by the "-" shaped convex portion to escape.

[発明が解決しようとする課題] ところが、このようなプレス加工方法によりインナーリ
ード先端部に成形されたバンプは、インナーリードの外
形部分を金型を用いて成形した断1ni形状が中実(構
造のバンプのため、半導体素子とバンプを熱圧着で接合
する工程において作用させる圧縮荷重に対してほぼ剛体
として作用する。このため個々のバンプの高さにバラツ
キがあると、半導体素子とバンプな接合するとき、すべ
てのバンプを均一に接合することができず、電気的に接
続不ftが発生するという課題がある。接続不良を発生
させないためには、バンプの高さのバラツキを少なくと
も0.5pm以下とすることが必要であり、極めて高精
度にバンプを形成することが要求される。また、インナ
ーリードの凹部には、事前に切欠きを設ける加工を行う
必要がある等の課題がある。
[Problems to be Solved by the Invention] However, the bumps formed on the tips of the inner leads by such a press working method have a solid (structure) Because of the bumps, they act almost as a rigid body against the compressive load applied during the process of bonding semiconductor elements and bumps by thermocompression bonding.For this reason, if there are variations in the height of individual bumps, it may be difficult to bond the semiconductor element and bumps properly. When bonding all the bumps uniformly, there is a problem that electrical connection defects occur.In order to prevent connection defects, it is necessary to reduce the variation in the height of the bumps by at least 0.5 pm. It is necessary to do the following, and it is required to form the bumps with extremely high precision.Furthermore, there are problems such as the need to process the recesses of the inner leads to provide notches in advance.

本発明の目的はこのような従来の課題を解決し、バンプ
高さのバラツキが存在しても十分な接合強度で半導体素
子との接合が達成できる中空構造のバンプな、インナー
リードに変形を生じさせることなく容易に形成すること
ができる、TABインナーリードのバンプ形成装置を提
供することにある。
The purpose of the present invention is to solve such conventional problems, and to provide a bump with a hollow structure that can achieve bonding with a semiconductor element with sufficient bonding strength even if there are variations in bump height, and which causes deformation in the inner lead. An object of the present invention is to provide an apparatus for forming bumps on TAB inner leads, which can be easily formed without causing any damage.

[課題を解決するための手段] 011記目的を達成するため、不発1すJに係るTA[
(インナーリードのバンプ形成装置においては、TA[
3用テープキヤリアのインナーリード先端部近傍に機械
的なプレス加]二によりバンプを形成するポンチとダイ
スの組を有する装置であって、前記ポンチの先端を、該
ポンチが前記ダイスのダイス穴より離脱される軸方向に
向けて拡径する逆円錐台形状に形成したものである。
[Means for solving the problem] In order to achieve the purpose stated in 011, TA [
(In the inner lead bump forming device, TA[
A device having a punch and die set for forming a bump by mechanical pressing near the tip of the inner lead of a tape carrier for 3, wherein the punch presses the tip of the punch from the die hole of the die. It is formed into an inverted truncated cone shape that expands in diameter in the direction of the axis from which it is removed.

[作用] バンプ高さにバラツキが生じても、良好な接続を可能と
するバンプ構造として、ポンチとダイスを用いた機械的
なプレス法によりインナーリードの幅よりも小さなドー
ム状に形成した、第2図に示すように中空構造のバンプ
14が考えられる。中空構造バンプではバンプ成形のた
めの前加工が不用となりバンプ形成工程を大幅に簡略化
できるという利点があり、しかも中実構造に比べ圧縮力
に対して変形し易いバンプ構造となるため、バンプの高
さにバラツキが存在しても熱圧着時の圧縮荷重によりバ
ンプが塑性変形し均一な高さに矯正することができる。
[Function] As a bump structure that enables good connection even if there is variation in bump height, the bump structure is formed into a dome shape smaller than the width of the inner lead by mechanical pressing using a punch and die. As shown in FIG. 2, a bump 14 having a hollow structure is considered. Hollow structure bumps have the advantage of not requiring any pre-processing for bump formation, which greatly simplifies the bump formation process.Furthermore, the bump structure is more easily deformed under compressive force than solid structures, making it easier to form bumps. Even if there is variation in height, the bump can be plastically deformed by the compressive load during thermocompression bonding and can be corrected to a uniform height.

このため、バンプ高さにバラツキが存在しても、中空バ
ンプ14を半導体素子の全ての電極部と均一に接触させ
ることができる。
Therefore, even if there are variations in bump height, the hollow bumps 14 can be brought into uniform contact with all the electrode parts of the semiconductor element.

ところが第3図(a)〜(ハ)に示すように、中空バン
プ14をポンチIIとダイス!6を用いた機械的プレス
加にで形成する場合、第3図G)に示すポンチ11の離
脱工程でポンチ11が中空バンブ14内面と密着してい
るため、ポンチ11の凸部12と中空バンプ14内面の
間に作用する摩擦力により、インナーリード13はポン
チ1!と一体となって移動し、第5図に示すような変形
がインナーリード13に生じるという問題が生じる。イ
ンナーリード13に変形が生じると、半導体素子の電極
部とバンプ14とを良好に接合できなくなるため、イン
ナーリード13に変形を与えることなくポンチ11を容
易に難脱することが必要となる。
However, as shown in FIGS. 3(a) to 3(c), the hollow bump 14 is punched with a punch II! 6, the punch 11 is in close contact with the inner surface of the hollow bump 14 during the removal process of the punch 11 shown in FIG. Due to the frictional force acting between the inner surfaces of 14, the inner lead 13 is punched 1! This causes a problem in that the inner lead 13 moves together with the inner lead 13, causing the inner lead 13 to be deformed as shown in FIG. If the inner lead 13 is deformed, the electrode portion of the semiconductor element and the bump 14 cannot be bonded well, so it is necessary to easily remove the punch 11 without deforming the inner lead 13.

従来一般に用いられているポンチ11は、第4図(ロ)
に示すようにポンチI!先端の凸部!2が円筒状(一定
の直tF、)であるため、ポンチl!の凸部12が中空
バンプ14内面に対し僅かに相対移動しても、ポンチI
Iの凸部12は中空バンプ14内面と相変わらず密着し
ており、ポンチIIを容易に離脱させることができなか
った。このため、インナーリードI3にはポンチIIの
離脱により第5図に示すような大きな変形l、が残ると
いう問題があった。
The punch 11 commonly used in the past is shown in Fig. 4 (b).
As shown in Punch I! Convex part at the tip! 2 is cylindrical (constant straight tF,), the punch l! Even if the convex portion 12 moves slightly relative to the inner surface of the hollow bump 14, the punch I
The convex portion 12 of I was still in close contact with the inner surface of the hollow bump 14, and the punch II could not be easily removed. For this reason, there was a problem in that the inner lead I3 was left with a large deformation l as shown in FIG. 5 due to the detachment of the punch II.

一方、第1図に示すような本発明のバンプ形成用ポンチ
11では、ポンチ11の先端は、該ポンチ11がダイス
16のダイス穴15より離間される軸方向に向けて拡径
する逆円錐台形状に形成しであるため、第4図(、−、
)に示すようにポンチ11の凸部12先端が中空バンプ
14に対し4’frかに−に方向に相対移動しさえすれ
ば、ポンチ11先端は中空バンプ14内面から離れ、ポ
ンチ11とバンブ14内面との間に隙間I7が生じ、容
易にインナーリードI3からポンチ11を離脱すること
ができる。したがって、インナーリード13に変形をほ
とんど生じさせることなく中空構造のバンプ14を形成
することができる。
On the other hand, in the bump forming punch 11 of the present invention as shown in FIG. Since it is formed into a shape, as shown in Fig. 4 (, -,
), as long as the tip of the protrusion 12 of the punch 11 moves relative to the hollow bump 14 in the negative direction by 4'fr, the tip of the punch 11 separates from the inner surface of the hollow bump 14, and the punch 11 and the bump 14 A gap I7 is created between the inner lead I3 and the inner lead I3, so that the punch 11 can be easily removed from the inner lead I3. Therefore, the bump 14 having a hollow structure can be formed without substantially deforming the inner lead 13.

[実施例1 以下、本発明の一実施例についてN面を用いて詳細に説
明する。
[Example 1] Hereinafter, an example of the present invention will be described in detail using the N side.

第1図は本発明のバンプ形成用ポンチを示す側面図、第
2図は本発明の一実施例により形成された中空構造のバ
ンプを示す断1rii IMI、第3図(a)〜(c)
は本発明の一実施例によるバンプ形成方法を工程順に示
す断面図を示す。
FIG. 1 is a side view showing a bump forming punch of the present invention, FIG. 2 is a cross-sectional view showing a hollow structure bump formed according to an embodiment of the present invention, and FIGS. 3(a) to (c)
1A and 1B are cross-sectional views showing step-by-step a bump forming method according to an embodiment of the present invention.

第1図に示すように、逆円錐台形状のポンチlとして、
該ポンチ先端の凸部12最下端の直径φdが30μmで
あり、その最下端より上方に拡径する側壁間のなす角度
Oが60度であるポンチ11を用い、第3図(a)〜(
c)に示すような工程により、中空構造のバンプ形成を
行った。中空バンプ14の形成に用いたダイス16は、
穴直径が50pm、深さが30μmである皿型のダイス
穴15を有するものとし、インナーリード13は幅70
pn+、厚さ35pm、 ピッチ140p mのものを
用いた。
As shown in Fig. 1, as an inverted truncated conical punch l,
Using a punch 11 in which the diameter φd of the lowermost end of the convex portion 12 at the tip of the punch is 30 μm, and the angle O formed between the side walls that widen in diameter upward from the lowermost end is 60 degrees, FIGS.
A bump having a hollow structure was formed by the process shown in c). The die 16 used to form the hollow bump 14 is
It has a dish-shaped die hole 15 with a hole diameter of 50 pm and a depth of 30 μm, and the inner lead 13 has a width of 70 pm.
A pn+ material with a thickness of 35 pm and a pitch of 140 pm was used.

まず、第3図(、)に示すように、ポンチ11先端の凸
部12とダイス16のダイス穴15の中心を一致させ、
その後、第3図(ト)に示すようにダイス16上に装着
したインナーリードI3にポンチ11を押し込み(イン
ナーリードへのポンチ!1押し込み量は約30μm)、
インナーリード13の先端に中空バンプ14を形成した
。中空バンプ14を形成した後、第3図(c)に示すよ
うにポンチ11を離脱したところ、インナーリード13
にほとんど変形を与えることなくポンチ11を離脱する
ことができ、第2図に示すような中空構造のバンプ14
を形成することができた。ここで、第5図に示すインナ
ーリード13の変形量I、は111+11以内であった
。また、形成した中空バンプ14の高さのバラツキは約
30±1μmであった。
First, as shown in FIG. 3(,), align the convex portion 12 at the tip of the punch 11 with the center of the die hole 15 of the die 16,
Thereafter, as shown in FIG. 3 (G), the punch 11 is pushed into the inner lead I3 mounted on the die 16 (the amount of pushing of the punch 1 into the inner lead is about 30 μm),
A hollow bump 14 was formed at the tip of the inner lead 13. After forming the hollow bump 14, when the punch 11 is removed as shown in FIG. 3(c), the inner lead 13 is removed.
The punch 11 can be removed with almost no deformation to the bump 14, which has a hollow structure as shown in FIG.
was able to form. Here, the amount of deformation I of the inner lead 13 shown in FIG. 5 was within 111+11. Furthermore, the height variation of the formed hollow bumps 14 was approximately 30±1 μm.

−1−記の方法により形成した、TABテープのインナ
ーリード13の中空バンプ14と、半導体素子のAQ電
極部と低温ボンディング法(素子加熱温度:275℃、
加圧用ツール温度:450°C9圧力60gf/リード
The hollow bump 14 of the inner lead 13 of the TAB tape formed by the method described in -1- is bonded to the AQ electrode part of the semiconductor element using a low-temperature bonding method (element heating temperature: 275°C,
Pressure tool temperature: 450°C9 pressure 60gf/lead.

1秒)により接合した結果、バラツキが±Ipmある中
空バンプ14の高さが矯正され、強度的にも電気的にも
良好な接続が達成され、インナーリードのバンプとして
十分に使用できることを確認した。
As a result of bonding (1 second), the height of the hollow bump 14, which had a variation of ±Ipm, was corrected, a good connection was achieved both in terms of strength and electrically, and it was confirmed that it could be fully used as a bump for the inner lead. .

なお、比較のため、第4図(ロ)に示すような円筒状の
凸111112を有する従来のポンチ11を用い同様に
中空バンプ14の形成を行ったところ、第4図(b)に
示すような大きな変形がインナーリード13に生じ(変
形量は30〜50μm)、半導体素子のAρff1極部
と良好な接続を行うことができなかった。
For comparison, hollow bumps 14 were similarly formed using a conventional punch 11 having a cylindrical protrusion 111112 as shown in FIG. 4(b). A large deformation occurred in the inner lead 13 (the amount of deformation was 30 to 50 μm), and a good connection to the Aρff1 pole portion of the semiconductor element could not be made.

〔発明の効果〕〔Effect of the invention〕

以」−説明したように1本発明のTABインナーリード
のバンプ形成用のポンチを用いることにより、バンプの
高さのバラツキが存在しても十分な接合強度で半導体素
子との接合が達成できる中空構造のバンプを、インナー
リードに変形を生じさせることなく容易に形成すること
ができる効果を有する。
As explained above, by using the punch for forming bumps on TAB inner leads of the present invention, a hollow hole can be formed that can achieve bonding with a semiconductor element with sufficient bonding strength even if there are variations in bump height. This has the effect that a structural bump can be easily formed without causing deformation of the inner lead.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のバンプ形成用ポンチを示す側面図、第
2[女1は本発明の一実施例により形成された中空バン
プを示す断面図、第3図(a)〜(ハ)はバンプ形成を
工程順に示す断面図、第4図(a)は本発明のバンプ形
成用ポンチを用いた場合のポンチの離脱]−程を示す断
面図、第4図(b)は従来のポンチを用いた場合のポン
チの離脱工程を示す断面図、第5図はポンチの離脱によ
り生じたインナーリードの変形の様子を示す断面図、第
6図は従来の中実構造のバンプを示す側面区である。 11・・・ポンチ      I2・・・凸部13・・
・インナーリード  14・・・中空バンプ5・・・ダ
イス穴     16・・・ダイス7・・・隙間   
    18・・・凹部9・・・ペデスタル
FIG. 1 is a side view showing a bump forming punch according to the present invention, FIG. 2 is a sectional view showing a hollow bump formed according to an embodiment of the present invention, and FIGS. 4(a) is a sectional view showing the process of removing the punch when the bump forming punch of the present invention is used, and FIG. 4(b) is a sectional view showing the process of bump formation using the conventional punch. 5 is a sectional view showing the deformation of the inner lead caused by the removal of the punch when the punch is used, and FIG. 6 is a side view showing the conventional solid bump structure. be. 11... Punch I2... Convex portion 13...
・Inner lead 14...Hollow bump 5...Die hole 16...Dice 7...Gap
18... recess 9... pedestal

Claims (1)

【特許請求の範囲】[Claims] (1)TAB用テープキャリアのインナーリード先端部
近傍に機械的なプレス加工によりバンプを形成するポン
チとダイスの組を有する装置であって、前記ポンチの先
端を、該ポンチが前記ダイスのダイス穴より離脱される
軸方向に向けて拡径する逆円錐台形状に形成したことを
特徴とするTABインナーリードのバンプ形成装置。
(1) A device having a punch and die set for forming a bump near the tip of the inner lead of a TAB tape carrier by mechanical pressing, the punch punching the tip of the punch into the die hole of the die. A bump forming device for a TAB inner lead, characterized in that it is formed into an inverted truncated conical shape whose diameter increases in the axial direction from which it is detached.
JP763590A 1989-04-27 1990-01-17 Device for forming bump of tab inner lead Pending JPH03211847A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP763590A JPH03211847A (en) 1990-01-17 1990-01-17 Device for forming bump of tab inner lead
US07/510,208 US5123163A (en) 1989-04-27 1990-04-17 Process and apparatus for forming bumps on film carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP763590A JPH03211847A (en) 1990-01-17 1990-01-17 Device for forming bump of tab inner lead

Publications (1)

Publication Number Publication Date
JPH03211847A true JPH03211847A (en) 1991-09-17

Family

ID=11671289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP763590A Pending JPH03211847A (en) 1989-04-27 1990-01-17 Device for forming bump of tab inner lead

Country Status (1)

Country Link
JP (1) JPH03211847A (en)

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