JPH03214748A - Method of forming bump of tab inner lead - Google Patents

Method of forming bump of tab inner lead

Info

Publication number
JPH03214748A
JPH03214748A JP1025690A JP1025690A JPH03214748A JP H03214748 A JPH03214748 A JP H03214748A JP 1025690 A JP1025690 A JP 1025690A JP 1025690 A JP1025690 A JP 1025690A JP H03214748 A JPH03214748 A JP H03214748A
Authority
JP
Japan
Prior art keywords
inner lead
punch
bump
bumps
hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1025690A
Other languages
Japanese (ja)
Inventor
Yasuhiro Otsuka
泰弘 大塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1025690A priority Critical patent/JPH03214748A/en
Priority to US07/510,208 priority patent/US5123163A/en
Publication of JPH03214748A publication Critical patent/JPH03214748A/en
Pending legal-status Critical Current

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  • Wire Bonding (AREA)

Abstract

PURPOSE:To simplify a bump forming process without creating the plastic deformation of an inner lead by a method wherein, after the bump is formed by a press process, a punch is removed from the inner lead while it is made to rotate around the punch axis. CONSTITUTION:When a hollow bump is formed by a mechanical press process, the circumference of the protrusion 15 of a punch 11 adheres tightly to the inner surface of the hollow bump 16 after the protrusion 15 of the punch 11 is pushed into an inner lead 14. Therefore, when the punch 11 is removed, the inner lead 14 is lifted above the die hole 13 of a die 12 and the plastic deformation of the inner led 14 is created. In order to avoid this problem, the punch 11 is removed from the inner lead while it is made to rotate around the punch axis. With this constitution, the adhesion between the punch 11 and the inner surface of the hollow bump 14 is released, so that the punch 11 can be removed easily without creating the deformation of the inner lead 14.

Description

【発明の詳細な説明】 [産業]二の利用分野] 本発明は半導体素子の実装に用いられるT A B (
 T aJ)0Δ旧.omatcd Bonding)
用テープキャリアのインナーリード先端部に、機械的な
プレス加工により成形されるバンプの形成方法に関する
[Detailed Description of the Invention] [Industry] Second Field of Application] The present invention is applied to T A B (
T aJ) 0Δ old. omatcd Bonding)
The present invention relates to a method for forming bumps on the tips of inner leads of tape carriers by mechanical press processing.

〔従來の技術] 一般に、″−1′導体素子を゛I’AB用テープキャリ
アに実装するには、半導体素子の′屯極rfl{または
テープキャリアのインナーリード先端部のいずれか一方
に、バンプとなる突起を形成する必要がある。半導体素
子の電極部にバンプ形成する方法には、例えば、「アイ
ビーエムジャーナル(IBM Journal) J第
8巻(1964年)102頁に記1{(のように電極f
jl{に直接バンプとなる突起をメッキ法により形成す
る方法や、[エレグ1・ロニック・パッケージング・ア
ンド・プロダクション(Elcclronic Pac
kaging &Production) J、198
4年12月号,33〜39頁に記載のようにエッチング
技術を用いたべデスタル法、すなわちバンプを形成する
部分をマスキングしておき、他のインナーリード部分を
ハーフエッチングすることにより、30〜7lOμmの
高さの突起を形成する方法、あるいは「昭和60年度電
子通信学会半導体・+1′一ト部四全国大会論文集、講
演番号2J(1985年+B])に記小又のようにガラ
ス基板にバンプを形成した後、電極部にバンプを移し換
える方式の転写バンプ法などが行われている。
[Prior Technology] Generally, in order to mount a ``-1'' conductor element on an ``I'AB tape carrier,'' either the ``receptor rfl'' of the semiconductor element or the inner lead tip of the tape carrier is It is necessary to form protrusions that serve as bumps.For example, the method of forming bumps on the electrodes of semiconductor devices is as described in "IBM Journal, Vol. 8, p. 102, 1964. electrode f
There is a method of forming protrusions that become bumps directly on the plating method, and a method of forming bumps directly on
Kaging & Production) J, 198
As described in the December 2004 issue, pages 33-39, the Bedestal method using etching technology, that is, masking the part where the bump will be formed and half-etching the other inner lead parts, is used to reduce the thickness of 30 to 7 lOμm. A method of forming protrusions with a height of A transfer bump method is used in which bumps are formed and then transferred to electrode portions.

しかし、これらの方法でバンプを形成するには、高価な
露光装置やメッキ装置なとの設Oiifが必要となるば
かりでなく、パターンニングのためのりソグラフィ工程
やエッチング工程が必要になるためバンプ形成工程が長
くなるという課題がある。
However, forming bumps using these methods not only requires expensive exposure equipment and plating equipment, but also lithography and etching processes for patterning, making it difficult to form bumps. The problem is that the process becomes long.

このため第4図に示すように(特公昭64−1009/
1号公報)、金型を用いた機械的なプレス成形加工技術
を用いてインナーリード先端部にペデスタル18を製作
する力法が提案されている。この方法は、下型ヘフィル
ムとインナーリードが一体となったテープキャリアを装
着し、上方からインナーリードの幅よりも大きな凸部を
有する上型を降下させてインナーリードの先端部に凹部
17をプレス加工によって形成し、バンプとなるペデス
タル18をインナーリード先端部に形成する方法である
。なお、上型の凸部により押圧されたインナーリードの
四部l7の材料の逃げのため、幅方向に切欠きが設けら
れている。
For this reason, as shown in Fig. 4 (Tokuko Sho 64-1009/
1), a force method has been proposed in which the pedestal 18 is manufactured at the tip of the inner lead using a mechanical press forming technique using a mold. In this method, a tape carrier in which a film and an inner lead are integrated is attached to a lower mold, and an upper mold having a convex portion larger than the width of the inner lead is lowered from above to press a recess 17 at the tip of the inner lead. This is a method in which a pedestal 18, which becomes a bump, is formed by processing at the tip of the inner lead. Note that cutouts are provided in the width direction to allow the material of the four parts 17 of the inner lead pressed by the convex portion of the upper die to escape.

〔発明が解決しようとする課題] ところが、このようなプレス加工方法によりインナーリ
ード先端部に成形されたバンプは、インナーリードの外
形部分を金型を用いて成形した断面形状が中実構造のバ
ンプのため、半尋体素子とバンプを熱圧着で接合する工
程において作用させる圧縮荷重に対して、ほぼ剛体とし
て作用する。
[Problems to be Solved by the Invention] However, the bumps formed at the tips of the inner leads by such a press working method are bumps whose cross-sectional shape is solid, which is obtained by molding the outer shape of the inner leads using a mold. Therefore, it acts almost as a rigid body against the compressive load applied in the step of joining the half-body element and the bump by thermocompression bonding.

このため個々のバンプの高さにバラッキが゛あると、半
導体素子とバンプを接合するとき、すべてのバンプを均
一に接合することができず、電気的に接続不良が発生す
るという課題がある。接続不良を発生させないためには
、バンプの高さのバラッキを少なくとも0.5pm以下
とすることが必要であり、極めて高精度にバンプを形成
することが要求される。また、インナーリードの四部に
は、事前に切欠きを設ける加工を行う必要がある等の課
題がある。
Therefore, if there is variation in the height of the individual bumps, there is a problem that when bonding the bumps to the semiconductor element, it is not possible to bond all the bumps uniformly, resulting in electrical connection failures. In order to prevent connection failures, it is necessary to keep the variation in bump height to at least 0.5 pm or less, and it is required to form bumps with extremely high precision. Further, there are problems such as the need to process the four parts of the inner lead to provide notches in advance.

本発明の目的はこのような従来の課題を解決し、バンプ
形成二1一程が油litて、バンプ高さのバラッキが存
在しても十分な接合強度で、しがも{n頼性高く半導体
素子との接合が達成できるTAI’{インナーリードの
バンプ形成方法を提供することにある。
The purpose of the present invention is to solve these conventional problems, and to provide sufficient bonding strength even when the bump formation is oily and uneven in bump height, yet highly reliable. An object of the present invention is to provide a method for forming TAI' {inner lead bumps that can achieve bonding with a semiconductor element.

[韻↓題を踊′決するための丁段] 前記[−1的を達成するため、本発明に係るl’ .’
l F3イ=3− ンナーリードのバンプ形成方法においては、’l’ A
 ll用テープキャリアのインナーリード先端部近傍に
、ポンチとダイスを用いてプレス加]二を行いバンプを
形成する方法であって、前記バンプをプレス形成後、前
記ポンチを該ポンチ軸の回りに回転させながら、前記イ
ンナーリードから離脱するものである。
[Dingdan for deciding the rhyme ↓ theme] In order to achieve the above-mentioned [-1 goal], the l'. according to the present invention. '
l F3 = 3- In the inner lead bump formation method, 'l' A
A method of forming a bump near the tip of an inner lead of a tape carrier for ll using a punch and a die, the method comprising: after forming the bump by pressing, rotating the punch around the punch axis; The inner lead is detached from the inner lead while causing the inner lead to move.

[ (’I; JfJ ) 十.述の課題を解決するTABインナーリードのバンプ
構造としては、第2図に示すようなポンチとダイスを用
い、インナーリードl4の幅よりも小さなドーム状に形
成された中空構造バンプ16が考えられる。中空構造バ
ンプl6ではバンプ形成のための前加]一が不用となり
バンプ形成工程を大幅に簡略化できるという利点があり
、しかも中実構造に比べ圧縮力に対して変形し易いバン
プ構造となるため、バンプの高さにバラツキが存在して
も熱圧若時の圧縮荷重によりバンプが塑性変形し均一・
な高さに矯正することができる。このため、バンプ高さ
にバラツキが存在しても、中空バンプを゛レ0−/1 体素子の全ての電極部と均一に密着させ、良1y了な接
合を達成できる。
[('I; JfJ) 10. As a bump structure for a TAB inner lead that solves the above-mentioned problem, a hollow structure bump 16 formed in a dome shape smaller than the width of the inner lead l4 using a punch and die as shown in FIG. 2 can be considered. The hollow structure bump 16 has the advantage that the bump formation process can be greatly simplified since the pre-addition for bump formation is unnecessary, and the bump structure is more easily deformed by compressive force compared to a solid structure. Even if there is variation in the height of the bumps, the bumps will be plastically deformed by the compressive load when hot and pressurized, resulting in uniform and uniform bump heights.
It can be corrected to a suitable height. Therefore, even if there is variation in the bump height, the hollow bump can be brought into uniform contact with all the electrode parts of the 0-/1-layer element, and a good bonding can be achieved.

ところが、機械的なプレス加」:で中空構造のバンプを
形成する場合、第3図に示すようにポンチ11の凸部1
5がインナーリードl4に押し込まれると、ボンチ11
の凸部l5の外周と中空バンプl6の内面は密i゜゛1
するため、ポンチ11の離脱の際にインナーリード14
がダイス12のダイス穴13より」二方に持ち」一げら
れ、インナーリード14が塑性変形するという課題があ
った。ここで、インナーリード14に変形が生じると、
半導体素子の電極部と良好な接合を行えなくなる。
However, when forming a hollow bump using a mechanical press, the convex portion 1 of the punch 11 as shown in FIG.
5 is pushed into the inner lead l4, the punch 11
The outer periphery of the convex portion l5 and the inner surface of the hollow bump l6 are closely spaced i゜゛1.
Therefore, when the punch 11 is removed, the inner lead 14
There was a problem in that the inner leads 14 were lifted from the die hole 13 of the die 12 by being held in both directions, causing plastic deformation of the inner leads 14. Here, if the inner lead 14 is deformed,
Good bonding with the electrode portion of the semiconductor element cannot be achieved.

そこで、本発明のように、ポンチをインナーリードから
離脱する際に、ポンチをポンチ軸回りに回転することに
より、ポンチと中空バンプ内面との密着状態を解除でき
、インナーリードに変形を−ljえることなく、容易に
ポンチの離脱が可能となる。
Therefore, as in the present invention, by rotating the punch around the punch axis when detaching the punch from the inner lead, the close contact between the punch and the inner surface of the hollow bump can be released, causing deformation to the inner lead. It is possible to easily remove the punch without any trouble.

[実施例] 以下、本発明について図面を用いて訂細に説明する。[Example] Hereinafter, the present invention will be explained in detail using the drawings.

第1図(a)〜←)は本発明のインナーリードのバンプ
形成ノj法の概略をTLIJl順に示す゛部分断面した
側面図、第2図は本発明の一実施例により形成された中
空バンプを示す断面図である。
FIGS. 1(a) to ←) are partially cross-sectional side views showing the outline of the inner lead bump forming method of the present invention in TLIJl order, and FIG. 2 is a hollow bump formed according to an embodiment of the present invention. FIG.

まず第1図(a)に示すように、ボンチ11の凸部I5
とダイスI2上のダイス穴13の中心軸が一致するよう
に、ポンチl1の位置を調整後、インナーリード4をダ
イス121−に固定する。ここに、用いたインナーリー
 ド14は幅80Ilm,  ピッチ160pm,厚さ
3 5 ! Il1の銅製のリード(表面にAuのメッ
キをlpm形成)とした。ポンチ11の先端凸部15の
直径は30ttm、ダイス穴13の直径は50Bn+と
した。
First, as shown in FIG. 1(a), the convex portion I5 of the punch 11 is
After adjusting the position of the punch l1 so that the center axis of the die hole 13 on the die I2 coincides with the inner lead 4, the inner lead 4 is fixed to the die 121-. The inner lead 14 used here has a width of 80 lm, a pitch of 160 pm, and a thickness of 35! The lead Il1 was made of copper (with lpm of Au plating formed on the surface). The diameter of the convex tip 15 of the punch 11 was 30ttm, and the diameter of the die hole 13 was 50Bn+.

次いで、第1図(b)に示すように、ポンチ11をイン
ナーリード14に押し込み、中空バンプ16をプレス成
形する。最後に第1図(e)に示すように、ポンチ1l
をポンチ軸回りに回転させながら」一方に引き上げイン
ナーリード14から離脱したところ、インナーリード1
4に塑性変形を生じさせることなくポンチ11を容易に
インナーリード14から離脱することかできた。このと
き、第2図に示すような高さ30±3μm、底面におけ
る直径50lImの中空バンプl6を形成できた5 上記方法により形成した中空バンプと、半導体メ・;子
のAQ電極部とを低温ボンディング法(素子加熱温度:
l50’C,加圧用ツール温度:450℃,圧力50g
I■リード,1秒)により接合した結果、強度的にも電
気的にも良好な接続が達成され、形成された中空バンプ
は、インナーリードのバンプとして十分に使用できるこ
とをmu認した。ここでバンプ高さに±3μmのバラツ
キがあるにもかかわらず、良好な接続を達成できたのは
、バンプが中空構造であり熱圧着時の押し込み荷重によ
りバンプの高さのバラツキを矯正できたためである。
Next, as shown in FIG. 1(b), the punch 11 is pushed into the inner lead 14 to press-form the hollow bump 16. Finally, as shown in Figure 1(e), punch 1l.
When the inner lead 1 was pulled up to one side and separated from the inner lead 14 while rotating around the punch axis, the inner lead 1
The punch 11 could be easily removed from the inner lead 14 without causing plastic deformation to the inner lead 4. At this time, a hollow bump 16 with a height of 30±3 μm and a diameter of 50 lIm at the bottom surface was formed as shown in FIG. Bonding method (element heating temperature:
150'C, pressure tool temperature: 450°C, pressure 50g
As a result of bonding using the I-lead, 1 second), a good connection was achieved both in terms of strength and electrically, and it was confirmed that the formed hollow bumps could be sufficiently used as bumps for inner leads. Despite the ±3 μm variation in bump height, we were able to achieve a good connection because the bump has a hollow structure and the push load during thermocompression bonding was able to correct the variation in bump height. It is.

[発明の効果] 以」二説明したように、本発明のTABインナーリード
のバンプ形成ノj?J、は、バンプ形成工程力< li
i’i Jitで、バンプ高さのバラツキが存在しても
十分な接合強度で、しかも信頼性高く半導体素子との接
合か達成できる効果がある。
[Effects of the Invention] As explained above, the bump formation process of the TAB inner lead of the present invention is as follows. J is the bump forming process force < li
i'i Jit has the effect of achieving sufficient bonding strength and highly reliable bonding to a semiconductor element even if there are variations in bump height.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜0)は本発明のTABインナーリードの
バンプ形成方法を工程順に示す概略図、第2図は本発明
の−・実施例により形成した中空構造のバンプを示す断
面図、第3図はボンチ削脱時にノ1じるインナーリード
の変形の様子を示す概略図、第4図は従来の゛IA1{
インナーリードのバンプ形成方法を示す概略図である。 +1・・ポンチ 13・・・ダイス穴 l5・・・凸部 17・・・凹部 l2・・・ダイス l4・・・インナーリード 16・・・中空バンプ 18・・・ペデスタル
1(a) to 0) are schematic diagrams illustrating the process order of the method for forming bumps on a TAB inner lead of the present invention, and FIG. 2 is a sectional view showing a hollow structure bump formed according to an embodiment of the present invention. Fig. 3 is a schematic diagram showing the deformation of the inner lead that occurs when removing the punch, and Fig. 4 is a schematic diagram showing the deformation of the inner lead when removing the punch.
FIG. 3 is a schematic diagram showing a method for forming bumps on inner leads. +1... Punch 13... Die hole l5... Convex portion 17... Concave portion l2... Dice l4... Inner lead 16... Hollow bump 18... Pedestal

Claims (1)

【特許請求の範囲】[Claims] (1)TAB用テープキャリアのインナーリード先端部
近傍に、ポンチとダイスを用いてプレス加工を行いバン
プを形成する方法であって、前記バンプをプレス形成後
、前記ポンチを該ポンチ軸の回りに回転させながら、前
記インナーリードから離脱することを特徴とするTAB
インナーリードのバンプ形成方法。
(1) A method in which a bump is formed by pressing using a punch and a die near the tip of the inner lead of a TAB tape carrier, and after the bump is press-formed, the punch is rotated around the punch axis. A TAB characterized in that the TAB is detached from the inner lead while being rotated.
How to form bumps on inner leads.
JP1025690A 1989-04-27 1990-01-19 Method of forming bump of tab inner lead Pending JPH03214748A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1025690A JPH03214748A (en) 1990-01-19 1990-01-19 Method of forming bump of tab inner lead
US07/510,208 US5123163A (en) 1989-04-27 1990-04-17 Process and apparatus for forming bumps on film carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1025690A JPH03214748A (en) 1990-01-19 1990-01-19 Method of forming bump of tab inner lead

Publications (1)

Publication Number Publication Date
JPH03214748A true JPH03214748A (en) 1991-09-19

Family

ID=11745238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1025690A Pending JPH03214748A (en) 1989-04-27 1990-01-19 Method of forming bump of tab inner lead

Country Status (1)

Country Link
JP (1) JPH03214748A (en)

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