JPH03213263A - Manufacture of magnetic head - Google Patents

Manufacture of magnetic head

Info

Publication number
JPH03213263A
JPH03213263A JP2010142A JP1014290A JPH03213263A JP H03213263 A JPH03213263 A JP H03213263A JP 2010142 A JP2010142 A JP 2010142A JP 1014290 A JP1014290 A JP 1014290A JP H03213263 A JPH03213263 A JP H03213263A
Authority
JP
Japan
Prior art keywords
floating
floating rail
rail surface
magnetic head
abrasive grains
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010142A
Other languages
Japanese (ja)
Inventor
Shigetomo Sawada
澤田 茂友
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2010142A priority Critical patent/JPH03213263A/en
Publication of JPH03213263A publication Critical patent/JPH03213263A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/048Lapping machines or devices; Accessories designed for working plane surfaces of sliders and magnetic heads of hard disc drives or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

PURPOSE:To prevent a head from being attracted to a magnetic disk surface by roughing a floating rail surface in a floating rail by means of an electrical erosion-arc machining process in use of a working fluid containing fine abrasive grains. CONSTITUTION:Utilizing an electrical erosion-arc machining process which has used a working fluid containing fine abrasive grains capable of selectly grinding a part of the surface of a workpiece, a rotating polyurethane ball 17 is pressed to a floating rail surface 4 of a floating slider with a load of almost 30-50g in the working fluid 13 in which the specified fine abrasive grains are uniformly dispersed, whereby it is approximated to an interval of about 1mum or so. With a fluid bearing-like flow produced at this time, the fine abrasive grains in the working fluid 13 collide with a minute area at high speed in the horizontal direction and slide thereon. With this action, an optional minute area on the floating rail surface 4 is cut off so that roughening work is made possible. Accordingly, only the floating rail surface 4 that avoided a magnetic pole part of a magnetic head element being exposed on an extension surface of the floating rail surface 4 and the neighborhood can be roughened in a selective manner.

Description

【発明の詳細な説明】 〔概 要] 磁気ヘッドの製造方法、特に磁気ディスク面への吸着を
防止した磁気ヘッドの製造方法に関し、浮動スライダに
おける浮上レール面の延長面に露出する前記磁気ヘッド
素子の磁極部分を損傷させずに、浮上レール面のみを選
択的に適度に粗面化して吸着現象を防止することを目的
とし、浮上レールを備えた浮動スライダに磁気ヘッド素
子を支持した磁気ヘッドの製造方法において、前記浮上
レールにおける浮上レール面を、微細な砥粒を含む加工
液を用いたEEM加工法により粗面化するように構成す
る。
[Detailed Description of the Invention] [Summary] Regarding a method of manufacturing a magnetic head, particularly a method of manufacturing a magnetic head that prevents adsorption to a magnetic disk surface, the magnetic head element exposed on an extended surface of a floating rail surface of a floating slider. The purpose of this technology is to selectively and moderately roughen only the surface of the floating rail without damaging the magnetic pole part of the magnetic head, in which the magnetic head element is supported on a floating slider equipped with a floating rail. In the manufacturing method, the floating rail surface of the floating rail is roughened by an EEM processing method using a processing liquid containing fine abrasive grains.

〔産業上の利用分野〕[Industrial application field]

本発明は磁気ヘッドの製造方法に係り、特に磁気ディス
ク面への吸着を防止した磁気ヘッドの製造方法に関する
ものである。
The present invention relates to a method of manufacturing a magnetic head, and more particularly to a method of manufacturing a magnetic head that prevents adsorption to a magnetic disk surface.

近年、磁気ディスク装置においては、大容量化、高密度
記録化に伴って磁気ディスク面に対する磁気ヘッドの浮
上量は益々微小化されるため、該磁気ディスクの記録面
及び磁気ヘッドにおける磁気ヘッド素子を支持した浮動
スライダの媒体対向面も高度に平滑化される傾向にある
In recent years, in magnetic disk drives, the flying height of the magnetic head relative to the magnetic disk surface has become smaller and smaller as the capacity has increased and recording density has increased. The media facing surface of the supported floating slider also tends to be highly smoothed.

またこのような磁気ヘッドの浮上化により回転する磁気
ディスク面に対する接触頻度も増加してヘッドクラッシ
ュが発生し易くなることから、該磁気ディスク面には潤
滑膜を塗布して上記障害を防止している。
Furthermore, as the magnetic head floats, the frequency of contact with the rotating magnetic disk surface increases, making head crashes more likely to occur. Therefore, a lubricant film is applied to the magnetic disk surface to prevent the above-mentioned problems. There is.

しかしながら、また前記磁気ディスクの記録面及び磁気
ヘッドの媒体対向面の高度な平滑化に伴い、磁気ヘッド
が磁気ディスクの潤滑膜面に吸着する現象が発生し易く
なってヘッドクラッシュを引き起こし、磁気ヘッドや磁
気ディスクの記録面が破壊される問題があり、磁気ディ
スク面に対する吸着を防止した磁気ヘッドを容易に製造
する方法が必要とされている。
However, as the recording surface of the magnetic disk and the medium facing surface of the magnetic head are highly smoothed, the magnetic head tends to stick to the lubricating film surface of the magnetic disk, causing a head crash. There is a problem that the recording surface of the magnetic disk is destroyed, and there is a need for a method for easily manufacturing a magnetic head that prevents adsorption to the magnetic disk surface.

〔従来の技術〕[Conventional technology]

従来の磁気ヘッドは例えば第7図に示すように媒体対向
面(構成を理解し易くするために上向きにしている)の
気流流入端側から流出端側に向かって、該気流流入端側
に傾斜面3と浮上力発生面(以下、浮上レール面と称す
る)4を有する一対の浮上レール2を備えたA l 、
O,・TiC%セラミック、或いはNi−ZnやMn−
Zn等のフェライトからなる浮動スライダlと、その浮
動スライダ1の気流流出部の端面に薄膜磁気ヘッド素子
5がA l 203等からなる絶縁性保護膜6により被
覆された状態で支持された構成からなっている。
In a conventional magnetic head, for example, as shown in FIG. 7, the airflow inflow end of the medium facing surface (facing upward to make the configuration easier to understand) is tilted toward the outflow end. A l equipped with a pair of levitation rails 2 having a surface 3 and a levitation force generating surface (hereinafter referred to as levitation rail surface) 4;
O,・TiC% ceramic, or Ni-Zn or Mn-
The structure includes a floating slider l made of ferrite such as Zn, and a thin film magnetic head element 5 supported on the end face of the airflow outflow portion of the floating slider 1 while being covered with an insulating protective film 6 made of Al 203 or the like. It has become.

そしてかかる磁気ヘッドは図示しないヘッド位置決め機
構のアクセスアームに支持ばね及びジンバルばねを介し
て支持された状態で、回転する磁気ディスク上に微小間
隔で浮上させ、かつ磁気ディスクの半径方向に高速でア
クセスして任意のトラックへ情報の書き込み、または読
み出しを行っている。
The magnetic head is supported by an access arm of a head positioning mechanism (not shown) via a support spring and a gimbal spring, and is made to float above the rotating magnetic disk at minute intervals, and accessed at high speed in the radial direction of the magnetic disk. information is written to or read from any track.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところで前記1膜磁気ヘッド素子5を支持した浮動スラ
イダlの形成工程では、磁気ヘッドの磁気ディスクに対
する低浮上化に伴い、該浮動スライダ1の浮上レール面
4を高い平面度で加工し、かつ浮上レール面4の延長面
に露出する前記磁気ヘッド素子5の磁極部分5aの寸法
精度を高く保持するため、従来においては該浮上レール
面4をラッピング等により表面粗さRaをZnm以下の
平坦面に精密に仕上げている。
By the way, in the process of forming the floating slider l supporting the single-film magnetic head element 5, the flying rail surface 4 of the floating slider 1 is processed to have a high flatness and the flying In order to maintain high dimensional accuracy of the magnetic pole portion 5a of the magnetic head element 5 exposed on the extended surface of the rail surface 4, conventionally, the floating rail surface 4 is polished to a flat surface with a surface roughness Ra of Znm or less by lapping or the like. Finished with precision.

しかし、前記浮動スライダ1の浮上レール面4をあまり
高精度に平滑、平坦化すると、潤滑膜を設けた磁気ディ
スク面に吸着する現象が発生し易くなってヘッドクラッ
シュを引き起こす問題があった・ このような吸着現象は、該浮動スライダlの平坦な浮上
レール面4を例えば3〜5μmの粒径のダイヤモンドか
らなる砥粒を用いたラッピング加工により適度な粗面に
することによって防止することができるが、該浮動スラ
イダ1の形成工程時に番よ、その浮動スライダ1に前記
薄膜磁気ヘッド素子5が既に支持されているため、ラッ
ピング加工により浮上レール面4を粗面化する際に、該
浮上レール面4と共に、その延長面に露出する前記磁気
ヘッド素子5の磁極部分5aも粗面化してしまう問題が
あり、該磁極部分5aを損傷させずに浮上レール面4の
みを選択的に粗面化して吸着現象を防止することは至難
であった。
However, if the floating rail surface 4 of the floating slider 1 is smoothed and flattened with too high precision, it tends to stick to the magnetic disk surface provided with a lubricating film, causing a problem that causes a head crash. Such an adsorption phenomenon can be prevented by making the flat floating rail surface 4 of the floating slider l appropriately rough by lapping with diamond abrasive grains having a grain size of 3 to 5 μm, for example. However, during the process of forming the floating slider 1, since the thin film magnetic head element 5 is already supported on the floating slider 1, when the floating rail surface 4 is roughened by lapping, the floating rail There is a problem in that the magnetic pole portion 5a of the magnetic head element 5 exposed on the extended surface of the surface 4 is also roughened, and therefore only the floating rail surface 4 may be selectively roughened without damaging the magnetic pole portion 5a. It was extremely difficult to prevent the adsorption phenomenon.

本発明は上記した従来の問題点に鑑み、浮動スライダに
おける浮上レール面の延長面に露出する前記磁気ヘッド
素子の磁極部分を損傷させずに、浮上レール面のみを選
択的に適度に粗面化して吸着現象を防止し得るようにし
た磁気ヘッドの製造方法を提供することを目的とするも
のである。
In view of the above-mentioned conventional problems, the present invention selectively roughens only the floating rail surface to an appropriate degree without damaging the magnetic pole portion of the magnetic head element exposed on the extended surface of the floating rail surface in a floating slider. It is an object of the present invention to provide a method for manufacturing a magnetic head that can prevent the attraction phenomenon.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記した目的を達成するため、浮上レールを備
えた浮動スライダに磁気ヘッド素子を支持した磁気ヘッ
ドの製造方法において、浮上レールを備えた浮動スライ
ダに磁気ヘッド素子を支持した磁気ヘッドの製造方法に
おいて、前記浮上レールにおける浮上レール面を、微細
な砥粒を含む加工液を用いたEEM加工法により粗面化
するように構成する。
To achieve the above object, the present invention provides a method for manufacturing a magnetic head in which a magnetic head element is supported on a floating slider equipped with a floating rail, in which a magnetic head is manufactured in which a magnetic head element is supported on a floating slider equipped with a floating rail. In the method, the floating rail surface of the floating rail is roughened by an EEM processing method using a processing fluid containing fine abrasive grains.

〔作 用〕[For production]

本発明は被加工物表面の一部を選択的に研削加工するこ
とを可能とする微細な砥粒を含む加工液を用いたEla
stic Emission Machining法(
以下)EEM加工法と称する)を利用して、第3図に示
すように所定の微細な砥粒を一様に分散した加工液13
中で、浮動スライダの浮上レール面4に回転するポリウ
レタン球17を30〜50gの負荷で押し付けて1μm
程度の間隔に近接させることにより、その際に生じる流
体軸受的流れによって、該加工液13中の微細な砥粒が
微小領域(例えば1〜2111111φ)に水平方向に
高速で衝突、滑走する。この作用により、前記浮上レー
ル面4上の任意の微小領域が削られて粗面加工が可能と
なる。
The present invention utilizes an Ela grinder using a machining fluid containing fine abrasive grains that enables selective grinding of a part of the surface of a workpiece.
Stic Emission Machining method (
As shown in Fig. 3, a machining liquid 13 in which predetermined fine abrasive grains are uniformly dispersed using the EEM machining method (hereinafter referred to as EEM machining method)
Inside, a rotating polyurethane ball 17 is pressed against the floating rail surface 4 of the floating slider with a load of 30 to 50 g, and
By making the abrasive particles close to each other at a distance of about 100 mm, the fine abrasive grains in the machining liquid 13 collide and slide horizontally at a high speed in a minute area (for example, 1 to 2111111φ) due to the fluid bearing flow generated at that time. Due to this action, any minute area on the floating rail surface 4 is shaved, making it possible to roughen the surface.

従って、該浮上レール面4の延長面に露出する前記磁気
ヘソ・ド素子の磁極部及びその近傍を避けた浮上レール
面4のみを選択的に粗面化することができる。
Therefore, only the levitation rail surface 4 can be selectively roughened, avoiding the magnetic pole portion of the magnetic heso-do element exposed on the extended surface of the levitation rail surface 4 and the vicinity thereof.

特に浮動スライダの材質がNi−ZnやMn−Znなど
のフェライト、或いはA l 203・TiC等の多結
晶体である場合には、加工領域単位が微小なため、各結
晶の向きによる微小部分の削れ速度の差に起因してその
加工面に結晶粒界が出現し易くなり、前記加工液13中
の微細な砥粒の粒径を適当に選択することにより、ヘッ
ド吸着を防止し得る適度な粗面化が容易となる。
In particular, when the material of the floating slider is ferrite such as Ni-Zn or Mn-Zn, or polycrystalline material such as Al203/TiC, the machining area unit is minute, so the minute portion may be affected by the orientation of each crystal. Due to the difference in cutting speed, grain boundaries tend to appear on the machined surface, and by appropriately selecting the grain size of the fine abrasive grains in the working fluid 13, a suitable amount can be created to prevent head adsorption. Surface roughening becomes easy.

〔実施例〕〔Example〕

以下図面を用いて本発明の実施例について詳細に説明す
る。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は本発明に係る磁気ヘッドの製造方法における浮
上レール面を粗面化する工程を説明するための斜視図、
第2図は浮上レール面の粗面化に適用するEEM加工機
の概略構成図である。
FIG. 1 is a perspective view for explaining the step of roughening the floating rail surface in the method of manufacturing a magnetic head according to the present invention;
FIG. 2 is a schematic configuration diagram of an EEM processing machine applied to roughen the surface of a floating rail.

本実施例では薄膜磁気ヘッド素子5がA 12i’s等
からなる絶縁性保護膜6により被覆された状態で支持さ
れたNi−Znフェライトからなるスライダ用ブロック
基板をスライダ形成工程により、第1図に示すように気
流流入端側に傾斜面3と浮上力発生面(以下、浮上レー
ル面と称する)4を有する一対の浮上レール2を形成し
た浮動スライダ1を、第2図に示すEEM加工機におけ
る例えばX軸方向に移動可能な移動テーブルIl上の加
工容器12内に、浮上レール面4を上向きにして配置す
ると共に、例えば0.05μmの粒径のSiO□からな
る微細な砥粒の適量を水等の分散媒に一様に分散したコ
ロイダルシリカからなる加工液13を充満し、゛該加工
液13中の前記浮動スライダ1における浮上レール面4
上に、Y軸方向に移動操作を可能とする支持体14に支
持バネ14aを介して支持された回転モータ15の回転
軸16に取付けられた、例えば50mmφのポリウレタ
ン球17を1100Orpの回転速度で回転させ、かつ
50gを負荷した状態で押し付けることにより該浮上レ
ール面4との間に約1μmの厚さの水膜が形成される。
In this embodiment, a slider block substrate made of Ni--Zn ferrite, on which a thin-film magnetic head element 5 is supported while being covered with an insulating protective film 6 made of A12i's, etc., is formed in a slider forming process as shown in FIG. A floating slider 1 having a pair of floating rails 2 having an inclined surface 3 and a floating force generating surface (hereinafter referred to as floating rail surface) 4 on the airflow inflow end side as shown in FIG. For example, in a processing container 12 on a moving table Il movable in the X-axis direction, the floating rail surface 4 is placed facing upward, and an appropriate amount of fine abrasive grains made of SiO□ with a grain size of 0.05 μm, for example, is placed. A machining fluid 13 made of colloidal silica uniformly dispersed in a dispersion medium such as water is filled, and the floating rail surface 4 of the floating slider 1 in the machining fluid 13 is filled with
Above, a polyurethane ball 17 of, for example, 50 mmφ is attached to a rotating shaft 16 of a rotary motor 15 supported via a support spring 14a on a support body 14 that can be moved in the Y-axis direction, at a rotation speed of 1100 Orp. By rotating and pressing under a load of 50 g, a water film with a thickness of about 1 μm is formed between the floating rail surface 4 and the floating rail surface 4.

そしてかかるポリウレタン球17を該浮上レール面4の
延長面に露出する前記磁気ヘッド素子5の磁極部5a及
びその近傍を避けた浮上レール面4の長さ方向に5 m
m/minの移動速度で移動させて加工を行う。
Then, the polyurethane balls 17 are placed at a length of 5 m in the length direction of the floating rail surface 4, avoiding the magnetic pole part 5a of the magnetic head element 5 exposed on the extended surface of the floating rail surface 4 and the vicinity thereof.
Machining is performed by moving at a moving speed of m/min.

この時、第4図に示すように回転するポリウレタン球1
7と浮上レール面4間に生じる加工液13の流体軸受的
流れによって該加工液13中の微細な砥粒が該浮上レー
ル面4に水平に高速で衝突、滑走する作用により削られ
て、第1図に斜線で示すように前記磁極部5aを損傷さ
せることなく浮上レール面4のみを例えば0゜03〜0
.05μm程度の表面粗さRaの粗面21に加工するこ
とが可能となる。
At this time, as shown in Fig. 4, the rotating polyurethane ball 1
7 and the floating rail surface 4, the fine abrasive grains in the working fluid 13 collide with the floating rail surface 4 at high speed horizontally and are scraped by the action of sliding. As shown by diagonal lines in FIG.
.. It becomes possible to process the rough surface 21 with a surface roughness Ra of about 0.05 μm.

第5図はEEM加工法による前記浮上レール面の表面粗
さ(Rmax)と削り加工量(μm)との関係を示す図
であり、この図によって明らかなように、表面粗さは削
り加工量が増加してもあまり変化しないで、−様な粗面
を容易に形成することができる。
FIG. 5 is a diagram showing the relationship between the surface roughness (Rmax) of the floating rail surface and the cutting amount (μm) by the EEM processing method. As is clear from this figure, the surface roughness is the cutting amount. Even if the amount increases, it does not change much, and a --like rough surface can be easily formed.

また第6図は前記浮上レール面4をその長さ方向に0.
06〜0.08μm削った場合の表面粗さを測定した図
である。この図より0.03〜0.04μmの表面粗さ
(Rmax)に加工された領域が前記磁極部5a及びそ
の近傍の非加工領域と0.2mm程度の未加工境界領域
を介して形成されていることが明らかであり、該磁極部
5a近傍を除く浮上レール面4の大部分をEEM加工法
により容易に粗面化できることが判る。
In addition, FIG. 6 shows the floating rail surface 4 in the longitudinal direction.
It is the figure which measured the surface roughness when shaved by 0.06 to 0.08 μm. From this figure, a region processed to a surface roughness (Rmax) of 0.03 to 0.04 μm is formed through the magnetic pole portion 5a and the unprocessed region in its vicinity, and an unprocessed boundary region of about 0.2 mm. It is clear that most of the floating rail surface 4 except for the vicinity of the magnetic pole portion 5a can be easily roughened by the EEM processing method.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明に係る磁気ヘッ
ドの製造方法によれば、EEM加工法により浮動スライ
ダにおける浮上レール面の延長面に露出する前記磁気ヘ
ッド素子の磁極部分を損傷させずに、浮上レール面のみ
を適度な粗面に容易に形成することが可能となる利点を
有し、磁気ディスク面へのヘッド吸着を防止することが
できる等、実用上価れた効果を奏する。
As is clear from the above description, according to the method of manufacturing a magnetic head according to the present invention, the magnetic pole portion of the magnetic head element exposed on the extended surface of the floating rail surface of the floating slider is not damaged by the EEM processing method. This has the advantage that only the floating rail surface can be easily formed into a moderately rough surface, and has practical effects such as being able to prevent the head from adhering to the magnetic disk surface.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る磁気ヘッドの製造方法における浮
上レール面を粗面化する工程 を説明するための斜視図、 第2図は本発明の浮上レール面の粗面化に適用するEE
M加工機の概略構成図、 第3図はEEM加工法による粗面化の原理を説明するた
めの図、 第4図は本発明の浮上レール面の粗面化を説明するため
の図、 第5図はEEM加工法による浮上レール面の表面粗さと
削り加工量との関係を示す図、第6図はEEM加工法に
よる浮上レール面の長さ方向の表面粗さを測定した図、 第7図は従来の磁気ヘッドを説明するための斜視図であ
る。 第1図〜第4図において、 1は浮動スライダ、2は浮上レール、3は傾斜面、4は
浮上レール面、5は薄膜磁気ヘッド素子、6は絶縁性保
護膜、11は移動テーブル、12は加工容器、13は加
工液、14は支持体、I5は回転モータ、16は回転軸
、17はポリウレタン球、21は粗面をそれぞれ示す。 3イr畳r寧III ント手≦弓η^j會上し−ル酌^ta面イと!=通吊丁
tEEr1mIA暖べψl膠)r齢fkCσ第2図 E EMIIOIン1t=z5 tj16ILq!tW
’tnE’Fflj図16I Lq!tW’tnE’t&kr+粗fit花をt19F
in6グ第4図
FIG. 1 is a perspective view for explaining the step of roughening the floating rail surface in the method of manufacturing a magnetic head according to the present invention, and FIG. 2 is an EE applied to roughening the floating rail surface of the present invention.
A schematic configuration diagram of the M processing machine, Figure 3 is a diagram for explaining the principle of surface roughening by EEM processing method, Figure 4 is a diagram for explaining the roughening of the floating rail surface of the present invention, Figure 5 is a diagram showing the relationship between the surface roughness of the floating rail surface and the amount of cutting by the EEM processing method, Figure 6 is a diagram showing the surface roughness measured in the length direction of the floating rail surface by the EEM processing method, and Figure 7 The figure is a perspective view for explaining a conventional magnetic head. 1 to 4, 1 is a floating slider, 2 is a floating rail, 3 is an inclined surface, 4 is a floating rail surface, 5 is a thin film magnetic head element, 6 is an insulating protective film, 11 is a moving table, 12 13 is a processing container, 13 is a processing liquid, 14 is a support, I5 is a rotating motor, 16 is a rotating shaft, 17 is a polyurethane ball, and 21 is a rough surface. 3 years old 3 days ago ≦bow η^j meeting - le cup ^ta face and! = tEEr1mIA warm ψl glue) r age fkCσ Fig. 2 E EMIIOIN1t=z5 tj16ILq! tW
'tnE'FfljFigure 16I Lq! tW'tnE't&kr+rough fit flower t19F
in6 fig. 4

Claims (1)

【特許請求の範囲】 浮上レール(2)を備えた浮動スライダ(1)に磁気ヘ
ッド素子(5)を支持した磁気ヘッドの製造方法におい
て、 前記浮上レール(2)における浮上レール面(4)を、
微細な砥粒を含む加工液(13)を用いたEEM加工法
により粗面(21)化することを特徴とする磁気ヘッド
の製造方法。
[Claims] A method for manufacturing a magnetic head in which a magnetic head element (5) is supported on a floating slider (1) equipped with a floating rail (2), comprising: a floating rail surface (4) of the floating rail (2); ,
A method for manufacturing a magnetic head, characterized in that the surface (21) is roughened by an EEM processing method using a processing liquid (13) containing fine abrasive grains.
JP2010142A 1990-01-18 1990-01-18 Manufacture of magnetic head Pending JPH03213263A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010142A JPH03213263A (en) 1990-01-18 1990-01-18 Manufacture of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010142A JPH03213263A (en) 1990-01-18 1990-01-18 Manufacture of magnetic head

Publications (1)

Publication Number Publication Date
JPH03213263A true JPH03213263A (en) 1991-09-18

Family

ID=11742036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010142A Pending JPH03213263A (en) 1990-01-18 1990-01-18 Manufacture of magnetic head

Country Status (1)

Country Link
JP (1) JPH03213263A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115519467A (en) * 2021-06-08 2022-12-27 环球晶圆股份有限公司 Silicon carbide wafer and polishing method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115519467A (en) * 2021-06-08 2022-12-27 环球晶圆股份有限公司 Silicon carbide wafer and polishing method therefor
US12308224B2 (en) 2021-06-08 2025-05-20 Globalwafers Co., Ltd. Silicon carbide wafers and grinding method thereof

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