JPH0321348A - Thermostatic apparatus - Google Patents

Thermostatic apparatus

Info

Publication number
JPH0321348A
JPH0321348A JP15621689A JP15621689A JPH0321348A JP H0321348 A JPH0321348 A JP H0321348A JP 15621689 A JP15621689 A JP 15621689A JP 15621689 A JP15621689 A JP 15621689A JP H0321348 A JPH0321348 A JP H0321348A
Authority
JP
Japan
Prior art keywords
heat exchange
piping
heating means
reaction tank
treatment solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15621689A
Other languages
Japanese (ja)
Inventor
Tomohiro Hayasaka
早坂 知紘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumco Techxiv Corp
Original Assignee
Komatsu Electronic Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Electronic Metals Co Ltd filed Critical Komatsu Electronic Metals Co Ltd
Priority to JP15621689A priority Critical patent/JPH0321348A/en
Publication of JPH0321348A publication Critical patent/JPH0321348A/en
Pending legal-status Critical Current

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  • Devices For Use In Laboratory Experiments (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To enhance heat exchange efficiency, airtightness and reliability by arranging an electromagnetic heating means or a far infrared heating means heating a treatment solution through piping to the predetermined part of the piping and heating said solution from the outside of the piping in a non-contact state. CONSTITUTION:A treatment solution is led out of the reaction tank 1 filled with the treatment solution by piping 2 and further returned to the reaction tank 1. The heat exchange with the treatment solution is performed by the heat exchange port 4 arranged to a part of the piping 2 to control the treatment solution to predetermined temp. The heat exchange part 4 is constituted of the electromagnetic or far infrared heating means arranged to the outside of the piping 2. As a result, heat exchange efficiency is enhanced and a structure is simple and airtightness is high and, further, reliability becomes high.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、恒温装置に係り、特に、腐食性薬液等の温度
制御に用いられる恒温装置の熱交換部の構造に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a constant temperature device, and particularly to the structure of a heat exchange section of a constant temperature device used for controlling the temperature of corrosive chemicals and the like.

〔従来の技術〕[Conventional technology]

強腐食性薬液を一般産業用に用いる場合は、該液温によ
って反応速度が大幅に変化するため、常に、液温の制御
には綿密な注意を払う必要がある。
When a strongly corrosive chemical solution is used for general industrial purposes, the reaction rate changes significantly depending on the temperature of the solution, so careful attention must always be paid to controlling the solution temperature.

そこで、液温の制御を行うために恒温槽等のいろいろな
温度制御装置が開発されている。
Therefore, various temperature control devices such as thermostats have been developed to control the liquid temperature.

このような温度制御装置は、通常第3図に示すように、
処理液の充填された反応槽101から、配管102を介
して、ポンプ103によって処理液を循環せしめ、熱交
換部104で熱交換を行い、フィルタ105を介して温
度制御および不純物除去のなされた処理液を反応槽に戻
すように構威されている。
Such a temperature control device usually has the following characteristics, as shown in FIG.
The treatment liquid is circulated by a pump 103 from a reaction tank 101 filled with the treatment liquid through a pipe 102, heat exchanged in a heat exchange section 104, and the temperature is controlled and impurities are removed through a filter 105. It is arranged to return the liquid to the reaction tank.

ここで、処理液として強腐蝕性の薬液を用いるため、配
管部には耐腐蝕性材料であるフッ素樹脂が用いられ、熱
交換部にも薬液に対して耐性を持つようにするためにい
ろいろな工夫がなされている。
Since a highly corrosive chemical is used as the processing liquid, fluororesin, which is a corrosion-resistant material, is used for the piping, and various materials are used in the heat exchange section to make it resistant to the chemical. Efforts have been made.

従来の熱交換部は、第4図にその一例を示す如く、薬液
に対して不純物汚染のない高純度アルミナからなる熱交
換板201,202がフッ素樹脂等の耐薬品性の樹脂か
らなる側部壁体203を介して対向配置せしめられて熱
交換室204を形威し、この熱交換部において、処理容
器からパイプ等で導出されてくる例えば半導体処理薬液
に対し温度制御を行なうようにしたものが堤案されてい
る。
As an example of the conventional heat exchange section is shown in FIG. 4, heat exchange plates 201 and 202 are made of high-purity alumina that is free from impurity contamination with chemical solutions, and side parts are made of chemical-resistant resin such as fluororesin. They are arranged facing each other with a wall 203 interposed therebetween to form a heat exchange chamber 204, and in this heat exchange section, the temperature of, for example, a semiconductor processing chemical solution led out from a processing container through a pipe or the like is controlled. is being proposed.

この装置では、熱交換板201,202は半導体処理薬
液との反応を防ぐため表面をフッ素樹脂でコーティング
されており、サーモモジュール205.206によって
各々冷却又は発熱せしめられるように構成されている。
In this apparatus, the surfaces of heat exchange plates 201 and 202 are coated with fluororesin to prevent reaction with semiconductor processing chemicals, and are configured to be cooled or heated, respectively, by thermo modules 205 and 206.

そしてサーモモジュール205.206の放熱側は夫々
、冷却パイプ207,208を介して導入される冷却水
によって冷却される放熱ブロック209.210に接触
せしめられている。
The heat radiation sides of the thermo-modules 205 and 206 are brought into contact with heat radiation blocks 209 and 210, respectively, which are cooled by cooling water introduced through cooling pipes 207 and 208.

そして、第1の配管211を介して半導体処理薬液を上
記熱交換室内に導入すると、熱交換室4内で冷却された
後第2の配管212を介して処理容器に戻される。
When the semiconductor processing chemical is introduced into the heat exchange chamber through the first pipe 211, it is cooled in the heat exchange chamber 4 and then returned to the processing container via the second pipe 212.

この装置では、熱交換板が処理薬液と接触して反応する
ようなこともなく良好に半導体処理薬液の温度制御を行
なうことが可能である半面、熱交換効率が十分でなく、
制御に時間がかかるという問題点があった。
Although this device can effectively control the temperature of the semiconductor processing chemical without the heat exchange plate coming into contact with the processing chemical and causing a reaction, the heat exchange efficiency is insufficient.
There was a problem that it took time to control.

また、従来例の装置では構造部材の一部にフッ素樹脂を
用いているため、熱膨張、熱収縮の点から使用温度範囲
に限界があった。
Furthermore, since conventional devices use fluororesin for some of the structural members, there is a limit to the operating temperature range due to thermal expansion and contraction.

そこで、本発明者は、熱交換効率を高めるべく、熱交換
ブロックの内部に複゛数の流路を設け、この流路に半導
体処理薬液が流入するように配管と、熱交換ブロックと
を気密的に接続するようにした熱交換器を提案している
Therefore, in order to increase the heat exchange efficiency, the present inventor provided multiple flow channels inside the heat exchange block and airtightly connected the piping and the heat exchange block so that the semiconductor processing chemical solution flowed into the flow channels. We are proposing a heat exchanger that can be connected to

この熱交換器によれば、熱交換ブロックの内部に配設さ
れた複数の流路を処理薬液が流れることにより熱交換ブ
ロックと処理薬液との接触面積が増大し、熱交換効率が
向上する。
According to this heat exchanger, the contact area between the heat exchange block and the processing chemical increases as the processing chemical flows through the plurality of channels arranged inside the heat exchange block, thereby improving heat exchange efficiency.

しかしながら、かかる構造では、処理薬液の流れの効率
があまり良くなく、また、熱交換ブロックと配管との熱
膨張率の差によってシール部分で液モレや、腐食性ガス
のモレが生じたりすることがあった。
However, with this structure, the flow efficiency of the processing chemical is not very good, and the difference in thermal expansion coefficient between the heat exchange block and the piping may cause liquid leakage or corrosive gas leakage at the sealing part. there were.

本発明は、前記実情に鑑みてなされたもので、更に熱交
換効率が高く、構造が簡単で気密性が高く信頼性の高い
熱交換器を提供することを目的とする。
The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a heat exchanger that has high heat exchange efficiency, simple structure, high airtightness, and high reliability.

〔問題点を解決するための手段〕[Means for solving problems]

そこで本発明では、配管の所定の部分に、配管を介して
処理液を加熱する電磁加熱手段または遠赤外線加熱手段
を配設し、配管の外側から非接触で加熱を行うようにし
ている。
Therefore, in the present invention, electromagnetic heating means or far-infrared heating means for heating the processing liquid via the piping is provided at a predetermined portion of the piping, and heating is performed from the outside of the piping without contact.

〔作用〕[Effect]

上記構或によれば、配管の外側から非接触で加熱を行う
ことができるため、熱交換部と配管との接続が不要であ
り、また、配管との接合部がないため、温度変化の激し
い場合にも、熱膨張係数の差によるモレ等も皆無となる
According to the above structure, heating can be performed from the outside of the pipe without contact, so there is no need to connect the heat exchange part to the pipe, and since there is no joint with the pipe, it is possible to heat the pipe from the outside without contact. Even in this case, there is no leakage due to differences in thermal expansion coefficients.

また、熱交換部と処理液とは非接触であり、配管の外側
にとりつければよいため、製造も極めて容易である。
Furthermore, since the heat exchange part and the processing liquid do not come into contact with each other and can be attached to the outside of the piping, manufacturing is also extremely easy.

〔実施例〕〔Example〕

以下、本発明の実施例について図面を参照しつっ詳細に
説明する。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

第1図は、本発明実施例の恒温装置を示す図、第2図は
その熱交換部の拡大図である。
FIG. 1 is a diagram showing a constant temperature apparatus according to an embodiment of the present invention, and FIG. 2 is an enlarged view of its heat exchange section.

この恒温装置は、第1図に示すように、処理液の充填さ
れた反応槽1から、フッ素樹脂からなる配管2を介して
、ボンプ3によって処理液を循環せしめ、配管の外側に
電磁波加熱手段41を配設し、さらにその外側を容器4
2で被覆した熱交換部4で熱交換を行い、フィルタ5を
介して温度制御および不純物除去のなされた処理液を反
応槽に戻すように構威されている。
As shown in FIG. 1, this constant temperature device circulates the processing liquid from a reaction tank 1 filled with the processing liquid through a pipe 2 made of fluororesin using a pump 3, and has an electromagnetic wave heating device installed outside the pipe. 41 is arranged, and the outside thereof is further covered with a container 4.
Heat exchange is performed in a heat exchange section 4 covered with a heat exchanger 2, and the treated liquid, which has undergone temperature control and impurity removal, is returned to the reaction tank via a filter 5.

この熱交換部は、第2図に拡大図を示すように、配管2
の外側に電磁波加熱手段41を配設してなるもので、配
管は接合部をもたないため、配青の整形が容易で、極め
て気密性も高い。更に接合部をもたないため、熱膨張係
数の違いによる液モレも皆無となる。
As shown in the enlarged view in FIG.
The electromagnetic wave heating means 41 is disposed on the outside of the piping, and since the piping has no joints, it is easy to shape the blue distribution, and the airtightness is extremely high. Furthermore, since there are no joints, there is no leakage of liquid due to differences in thermal expansion coefficients.

この熱交換部では、容器内の配管面積全体で熱交換を行
うことになり、処理薬液との熱交換面積が大きく、熱交
換効率が極めて高い。
In this heat exchange section, heat exchange is performed over the entire piping area within the container, so the heat exchange area with the processing chemical is large, and the heat exchange efficiency is extremely high.

なお、実施例では、熱交換部を電磁波加熱手段で構成し
たが、遠赤外加熱手段で構成してもよい。
In addition, in the embodiment, the heat exchange section is constructed of electromagnetic wave heating means, but it may be constructed of far-infrared heating means.

また配管の材質についても、フッ素樹脂のみならず、耐
薬品性薬液に対して不純物汚染のない耐熱性および耐圧
性が高い材料であれば何でもよい。
Furthermore, the material of the piping is not limited to fluororesin, but any material may be used as long as it is not contaminated with impurities and has high heat resistance and pressure resistance against chemical-resistant chemicals.

〔発明の効果〕〔Effect of the invention〕

以上説明してきたように、本発明の恒温装置によれば、
所定の部分に、配管を介して処理液を加熱する電磁加熱
手段または遠赤外線加熱手段を配設し、配管の外側から
非接触で加熱を行うようにしているため、熱交換部・と
配管との接続が不要であり、瞬時に恒温制御することが
でき、信頼性の向上を行うことが可能となる。
As explained above, according to the constant temperature device of the present invention,
Electromagnetic heating means or far-infrared heating means that heat the processing liquid through the piping are installed in designated areas, and heating is performed from the outside of the piping without contact. There is no need for a connection, and constant temperature control can be performed instantly, making it possible to improve reliability.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明実施例の恒温装置を示す図、第2図は熱
交換部の拡大図、第3図は従来例の恒温装置を示す図、
第4図は、従来例の熱交換器を示す図である。 101・・・反応槽、102・・・配管、103・・・
ボンプ、104・・・熱交換部、105・・・フィルタ
、201,202・・・熱交換板、203・・・側部壁
体、204・・・熱交換室、205,206・・・サー
モモジュール、207.208・・・冷却パイプ、20
9,210・・・放熱ブロック、211・・・第lの配
管、212・・・第2の配管、1・・・反応槽、2・・
・配管、3・・・ポンプ、4・・・熱交換部、5・・・
フィルタ、41・・・電磁波加熱手段、42・・・容器
。 第1図 第3区 41 第2図 第4図
FIG. 1 is a diagram showing a constant temperature device according to an embodiment of the present invention, FIG. 2 is an enlarged view of a heat exchange section, and FIG. 3 is a diagram showing a conventional constant temperature device.
FIG. 4 is a diagram showing a conventional heat exchanger. 101... Reaction tank, 102... Piping, 103...
Bomb, 104... Heat exchange section, 105... Filter, 201, 202... Heat exchange plate, 203... Side wall, 204... Heat exchange chamber, 205, 206... Thermo Module, 207.208...Cooling pipe, 20
9,210... Heat dissipation block, 211... Lth piping, 212... Second piping, 1... Reaction tank, 2...
・Piping, 3...Pump, 4...Heat exchange section, 5...
Filter, 41... Electromagnetic wave heating means, 42... Container. Figure 1 Section 3 41 Figure 2 Figure 4

Claims (1)

【特許請求の範囲】 処理液の充填された反応槽と、反応槽から処理液を導出
しさらに反応槽に戻す配管と、配管の一部に配設され処
理液との熱交換を行い、処理液を所定の温度に制御する
熱交換部とを含む恒温装置において、 前記熱交換部が、配管の外側に配設された電磁加熱手段
または遠赤外加熱手段であることを特徴とする恒温装置
[Scope of Claims] A reaction tank filled with a processing liquid, a pipe for leading out the processing liquid from the reaction tank and returning it to the reaction tank, and a pipe installed in a part of the pipe to perform heat exchange with the processing liquid, A constant temperature device including a heat exchange section for controlling a liquid to a predetermined temperature, wherein the heat exchange section is an electromagnetic heating means or a far infrared heating means disposed outside the piping. .
JP15621689A 1989-06-19 1989-06-19 Thermostatic apparatus Pending JPH0321348A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15621689A JPH0321348A (en) 1989-06-19 1989-06-19 Thermostatic apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15621689A JPH0321348A (en) 1989-06-19 1989-06-19 Thermostatic apparatus

Publications (1)

Publication Number Publication Date
JPH0321348A true JPH0321348A (en) 1991-01-30

Family

ID=15622899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15621689A Pending JPH0321348A (en) 1989-06-19 1989-06-19 Thermostatic apparatus

Country Status (1)

Country Link
JP (1) JPH0321348A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621242U (en) * 1992-08-11 1994-03-18 株式会社金門製作所 Ultrapure water heating device
WO2000025552A1 (en) * 1998-10-27 2000-05-04 Molekulare Energietechnik Ag Heating arrangement

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621242U (en) * 1992-08-11 1994-03-18 株式会社金門製作所 Ultrapure water heating device
WO2000025552A1 (en) * 1998-10-27 2000-05-04 Molekulare Energietechnik Ag Heating arrangement
ES2185518A1 (en) * 1998-10-27 2003-04-16 Molekulare Energietechnik Ag HEATING DEVICE
EA003311B1 (en) * 1998-10-27 2003-04-24 Молекуляре Энергитехник Аг Heating arrangement

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