JPH03213817A - Imaging element - Google Patents

Imaging element

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Publication number
JPH03213817A
JPH03213817A JP2104742A JP10474290A JPH03213817A JP H03213817 A JPH03213817 A JP H03213817A JP 2104742 A JP2104742 A JP 2104742A JP 10474290 A JP10474290 A JP 10474290A JP H03213817 A JPH03213817 A JP H03213817A
Authority
JP
Japan
Prior art keywords
imaging
array
unevenness
roof
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2104742A
Other languages
Japanese (ja)
Inventor
Takaaki Miyashita
宮下 隆明
Kazuhiro Fujita
和弘 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2104742A priority Critical patent/JPH03213817A/en
Publication of JPH03213817A publication Critical patent/JPH03213817A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To decrease the unequalness on an imaging plane by setting the unequalness of the imaging performance periodically formed in accordance with the arranging pitch of the lenses of a lens array and the unequalness of the imaging light quantity of an imaging plane in such a manner as to have different phases. CONSTITUTION:This imaging element has a roof mirror array 5 continuously formed with many pieces of optical path separating mirrors 2 and roof mirrors 6 to a straight line shape at a specified arranging pitch and the lenses 4 formed in correspondence to the arranging pitch of the roof mirrors 6. The unequalness of the imaging performance (MTF) periodically formed in accordance with the arranging pitch of the lenses 4 of the lens array 3 and the unequalness of the imaging light quantity of the imaging plane 7 are so set as to be shifted from each other by, for example, 1/2 phase. The fluctuation in the intensity by each of the respective dots generated by the unequalness A of the MTF is, therefore, set in the form of offsetting the unequalness of the light quantity of the imaging plane 7. The unequalness of the MTF characteristic on the imaging plane is decreased in this way.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、複写機、及び、ファクシミリ、イメージスキ
ャナの原稿読取り部の結像光学系に用いられる結像素子
に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an imaging element used in an imaging optical system of a document reading section of a copying machine, facsimile machine, or image scanner.

従来の技術 従来の結像素子(ルーフミラーレンズアレイ)の−例を
第6図に基づいて説明する。物体面1がらの光は、光路
分離ミラー2の上側に形成された反射面2aにより反射
され、レンズアレイ3中の一定の配列ピッチPをもって
形成されたレンズ4を通過し、ルーフミラーアレイ5に
入射し、屋根型に形成された左右向い合う2枚のルーフ
ミラー6によりそれぞれ1回ずつ反射(合計2回反射)
された後、再び、レンズアレイ3を通過して、今度は、
光路分離ミラー2の下側に形成された反射面2bにより
反射されることによって、物体面1と共役な位置関係に
ある結像面(像面)7に結像され、これにより画像の読
取りが行われる。なお、レンズアレイ3とルーフミラー
アレイ5との間には迷光を遮断する絞り板8(第10図
参照)が設けられており、レンズアレイ3とルーフミラ
ーアレイ5と絞り板8との配列ピッチPは一致した状態
になっている。
2. Description of the Related Art An example of a conventional imaging element (roof mirror lens array) will be described with reference to FIG. The light from the object surface 1 is reflected by the reflective surface 2a formed on the upper side of the optical path separation mirror 2, passes through the lenses 4 formed with a constant arrangement pitch P in the lens array 3, and is reflected to the roof mirror array 5. The light enters and is reflected once by each of the two roof mirrors 6 formed in a roof shape that face each other on the left and right (2 reflections in total).
After passing through the lens array 3 again, this time,
By being reflected by the reflecting surface 2b formed on the lower side of the optical path separation mirror 2, an image is formed on an image forming surface (image surface) 7 that is in a conjugate positional relationship with the object surface 1, thereby making it possible to read the image. It will be done. Note that a diaphragm plate 8 (see FIG. 10) for blocking stray light is provided between the lens array 3 and the roof mirror array 5, and the arrangement pitch of the lens array 3, roof mirror array 5, and diaphragm plate 8 is P is in a matched state.

この場合、レンズ4が矩形状をなしていると、その配列
方向(Y方向)に対する光量分布は、第7図に示すよう
に、その先軸に対して対称な二等辺三角形状に近似され
る特性がある。すなわち、第8図(a )(b )(c
 )に示すように、ある1個のレンズ4の矩形開口部か
ら見た時、配列方向に対する単一レンズの光量分布Ls
の関係は、Y=Oの光軸付近での光量は大きなものとな
るが、Y=0.5、Y=1.Oと光軸からしだいに遠ざ
かるにつれてその光量も徐々に小さくなっていく。そこ
で、このような関係をさらに複数個のレンズ4を重ねた
状態で見ると、第10図に示すように、単一の光量分布
Lsが互いに重なり合った状態となり、その合成光量分
布Ltは山なりの不均一な光量ムラが生じた状態となる
In this case, if the lens 4 has a rectangular shape, the light intensity distribution in the arrangement direction (Y direction) is approximated to an isosceles triangular shape symmetrical with respect to its tip axis, as shown in FIG. It has characteristics. That is, Fig. 8(a)(b)(c)
), when viewed from the rectangular opening of a certain lens 4, the light intensity distribution Ls of a single lens in the arrangement direction
The relationship is that the amount of light near the optical axis is large when Y=O, but when Y=0.5, Y=1. The amount of light gradually decreases as it moves away from O and the optical axis. Therefore, if we further look at this relationship when a plurality of lenses 4 are superimposed, the single light intensity distribution Ls will overlap with each other, and the combined light intensity distribution Lt will be a mountain, as shown in FIG. This results in a state where unevenness in the amount of light occurs.

このような合成光量分布Ltは、第6図に示すように、
重なり度m(m=X/Da、ただし、X:レンズの視野
半径、Da:レンズの配列方向の幅)の値が整数倍に近
づいた時に始めてその光量のムラがなくなるという関係
がある。そこで、従来においては、前述したような合成
光量分布Ltのムラをなくすために、第11図に示すよ
うに、絞り板8のルーフミラーアレイ5に近い側の形状
をレンズアレイ3に近い側の形状よりも大きく形成し、
これにより、絞り板8のルーフミラーアレイ5に近い側
の開口部aをレンズアレイ3に近い側の開口部すよりも
狭く形成することによって、合成光量分布Ltの均一化
を図っている。
Such a composite light amount distribution Lt is, as shown in FIG.
There is a relationship in which the unevenness of the amount of light disappears only when the value of the degree of overlap m (m=X/Da, where X: radius of field of view of the lens, Da: width of the lens in the array direction) approaches an integral multiple. Therefore, in the past, in order to eliminate the unevenness of the composite light amount distribution Lt as described above, the shape of the diaphragm plate 8 on the side closer to the roof mirror array 5 is changed to the shape on the side closer to the lens array 3, as shown in FIG. Form larger than the shape,
Thereby, by forming the aperture a on the side closer to the roof mirror array 5 of the aperture plate 8 to be narrower than the aperture a on the side closer to the lens array 3, the combined light amount distribution Lt is made uniform.

発明が解決しようとする課題 上述したような装置において、まず、第一の従来例につ
いて述べる。第5図(a)はルーフミラーアレイ5のル
ーフミラー6の配列ピッチに対応して周期的に現われる
結像性能(MTF)のムラAと、結像面7の光量分布の
ムラBとの関係を示すものである。また、第5図(b)
は蛍光体ドツトアレイと組合せる場合の蛍光体ドツトの
発光強度分布を示すものである。さらに、第5図(c)
は結像素子(第6図参照)を用いて結像した場合におけ
る結像面7でのドツト強度分布を示すものである。また
、第5図(d)は電子写真プロセスを用いて可視画像を
得た際のドツトの濃度分布を示すものである。
Problems to be Solved by the Invention Regarding the above-described apparatus, first, a first conventional example will be described. FIG. 5(a) shows the relationship between unevenness A in the imaging performance (MTF) that appears periodically in correspondence with the arrangement pitch of the roof mirrors 6 of the roof mirror array 5 and unevenness B in the light amount distribution on the imaging surface 7. This shows that. Also, Fig. 5(b)
shows the emission intensity distribution of phosphor dots when combined with a phosphor dot array. Furthermore, Fig. 5(c)
6 shows the dot intensity distribution on the imaging plane 7 when an image is formed using the imaging element (see FIG. 6). Further, FIG. 5(d) shows the density distribution of dots when a visible image is obtained using an electrophotographic process.

この第5図(a)を見てわかるように、MTFのムラB
の分布と、結像面7の光量分布のムラAの分布とは、同
一位相をなしている。この場合、MTFの大小により各
ドツト毎のボケ量が異なるために各ドツト毎の強度に差
が生じる(同時にボケによりドツトサイズも若干具なる
)。また、結像素子の光量分布のムラBが同一位相であ
るため、さらに増幅される形となり強度分布の差が大き
くなる(この様子を第5図(C)の結像面でのドツト強
度分布に示す)。
As can be seen from Figure 5(a), the MTF unevenness B
The distribution of and the distribution of the unevenness A of the light amount distribution on the imaging plane 7 are in the same phase. In this case, since the amount of blur for each dot differs depending on the size of the MTF, a difference occurs in the intensity for each dot (at the same time, the size of the dot also changes slightly due to the blur). In addition, since the unevenness B in the light intensity distribution of the imaging element is in the same phase, it is further amplified and the difference in intensity distribution increases (this situation can be seen in the dot intensity distribution on the imaging plane in Figure 5 (C)). ).

そして、今、このような強度分布をもった光ブリントヘ
ッドを第12図に示すような電子写真プロセス、すなわ
ち、結像素子9を、感光体10の周囲に現像部11と転
写部12とクリーニング部13と除電部14と帯電部1
5とが配設されたものと組合せて、可視画像を得ると、
第5図(d)に示すように、配列方向に周期的な濃度差
をもってあられれることになる。従って、このように従
来の結像素子においては、結像面における光量分布の制
御については考慮がなされているが、結像性能のムラと
の関係についてまでは考慮がなされていないという問題
がある。
Now, an optical print head having such an intensity distribution is applied to an electrophotographic process as shown in FIG. section 13, static eliminating section 14, and charging section 1
5 is combined to obtain a visible image,
As shown in FIG. 5(d), there are periodic density differences in the arrangement direction. Therefore, in conventional imaging elements, although consideration has been given to controlling the light intensity distribution on the imaging surface, there is a problem in that the relationship with unevenness in imaging performance has not been considered. .

次に、前述した従来の装置における第二の問題点につい
て述べる。第13図は、レンズアレイ3の配列ピッチP
に対応して周期的に変化するMTF特性特性光線、MT
F特性特性光ラとも呼ぶ)と像面7における光量分布特
性b(破線、光学系の光量分布特性すのムラとも呼ぶ。
Next, the second problem with the conventional device described above will be described. FIG. 13 shows the arrangement pitch P of the lens array 3.
MTF characteristic characteristic ray that changes periodically in response to MT
F-characteristic characteristic (also referred to as light ray) and light quantity distribution characteristic b (dashed line, also referred to as unevenness of the light quantity distribution characteristic of the optical system) at the image plane 7.

ただし、ここでは光学系のみの状態とする)との関係を
示したものであり、これらの位相は互いにP/2ずつず
れた形となって配設されている。この場合、各レンズ光
軸16の位置では光量は大きく、レンズ光軸16の中間
点の位置ではその光量は小さくなっており、一方、MT
F特性特性光量分布特性すとは逆の形状をした形となっ
ている。
However, here, only the optical system is shown), and their phases are shifted by P/2 from each other. In this case, the amount of light is large at the position of each lens optical axis 16, and the amount of light is small at the position of the midpoint of the lens optical axis 16.
The F-characteristic light intensity distribution characteristic has a shape opposite to that of the light intensity distribution characteristic.

このように、MTF特性特性光相と光量分布特性すの位
相とをP/2ずつずらした理由としては、それら2種類
のムラをできるだけ低減させ、結像面における結像光量
のムラを補正するためである。
In this way, the reason why the light phase of the MTF characteristic and the phase of the light intensity distribution characteristic are shifted by P/2 is to reduce these two types of unevenness as much as possible and correct the unevenness of the imaged light intensity on the imaging plane. It's for a reason.

しかし、従来の結像素子に用いられる光源(ここでは、
蛍光体ドツトアレイ)では、第13図に示すように、ア
レイ化された個々の光源17のドツト面積はすべて等し
い。このため、結像面(実際の像面)に結像した際の光
量分布は、前述した破線で示す光量分布すと同一の状態
となる。また、MTF特性により、結像面での結像ドツ
ト面積18は場所により異なったものとなり、MTF特
性特性光ラや光学系の光量分布特性すのムラを補正して
低減することができず、その結果、高品位な画像を得る
ことができないという問題を生じる。
However, the light source used in the conventional imaging element (here,
In the phosphor dot array), as shown in FIG. 13, the dot areas of the individual light sources 17 arranged in the array are all equal. Therefore, the light amount distribution when an image is formed on the image plane (actual image plane) is the same as the light amount distribution shown by the broken line described above. Furthermore, due to the MTF characteristics, the imaged dot area 18 on the imaging plane differs depending on the location, and it is not possible to correct and reduce the unevenness of the MTF characteristic light beam or the light amount distribution characteristic of the optical system. As a result, a problem arises in that a high-quality image cannot be obtained.

課題を解決するための手段 そこで、このような問題点を解決するために、請求項1
記載の発明は、光路分離ミラーと、ルーフミラーを一定
の配列ピッチで多数個直線状に連続形成したルーフミラ
ーアレイと、このルーフミラーアレイと前記光路分離ミ
ラーとの間に位置し前記ルーフミラーの配列ピッチに対
応して形成されたレンズを有するレンズアレイと、この
レンズアレイと前記ルーフミラーアレイとの間に位置し
迷光を遮断する絞り板とよりなる結像素子において、レ
ンズアレイのレンズの配列ピッチに対応して周期的に形
成される結像性能のムラと結像面の結像光量のムラとが
異なる位相となるように設定した。
Means for Solving the Problem Therefore, in order to solve such problems, claim 1
The described invention includes an optical path separating mirror, a roof mirror array in which a plurality of roof mirrors are continuously formed in a straight line at a constant arrangement pitch, and a roof mirror array located between the roof mirror array and the optical path separating mirror, In an imaging element comprising a lens array having lenses formed corresponding to an array pitch, and an aperture plate located between this lens array and the roof mirror array to block stray light, the arrangement of the lenses of the lens array is It is set so that the unevenness in imaging performance, which is periodically formed in correspondence with the pitch, and the unevenness in the amount of imaged light on the imaging plane have different phases.

請求項2記載の発明は、ドツト7レイ状に配列された光
源を備え、レンズが一定の配列ビ1.チ。
The invention as set forth in claim 2 is provided with a light source arranged in a 7-dot array, and in which the lenses are arranged in a constant array. blood.

をもって多数個配列されたレンズアレイと、このレンズ
アレイの前記配列ピッチPに対応して屋根型反射面が多
数個配列されたルーフミラーアレイと、このルーフミラ
ーアレイと前記レンズアレイとの間に設けられた絞り板
と、光路分離ミラーとよりなり、前記レンズアレイの前
記配列ピッチPに対応して周期的に変化する結像特性の
位相と像面の光量分布特性の位相とが互いにP/2ずら
して設けられた結像素子において、前記結像特性の値の
高い位置で前記光源のドツト面積を大きく設定し、前記
結像特性の値の低い位置で前記光源のドツト面積を小さ
く設定した。
a roof mirror array in which a large number of roof-shaped reflective surfaces are arranged corresponding to the arrangement pitch P of the lens array; and a roof mirror array provided between the roof mirror array and the lens array. The phase of the imaging characteristic, which changes periodically corresponding to the arrangement pitch P of the lens array, and the phase of the light quantity distribution characteristic of the image plane are mutually P/2. In the staggered imaging elements, the dot area of the light source is set to be large at a position where the value of the imaging characteristic is high, and the dot area of the light source is set to be small at a position where the value of the imaging characteristic is low.

作用 請求項1記載の発明により、結像性能のムラによる位相
と結像面の結像光量のムラの位相とが逆位相として重ね
合わされるような構成とすることによって、結像素子を
用いて結像したトッドの強度ムラを補正し平坦化するこ
とができる。
Effects According to the invention described in claim 1, by using a configuration in which the phase due to unevenness in imaging performance and the phase due to unevenness in the amount of imaged light on the imaging surface are superimposed as opposite phases, an image forming element can be used. The intensity unevenness of the imaged tod can be corrected and flattened.

請求項2記載の発明により、結像特性すなわちMTF特
性のムラと、像面の光量分布特性すなわち光学系の光量
分布特性のムラとに対応させて、光源のドツト面積の大
きさを変化させることによって、実際の結像面上におけ
るそれらMTF特性のムラと光学系の光量分布特性のム
ラとを同時に補正してムラを低減することができ、これ
により高品位な画像を得ることができる。
According to the invention as claimed in claim 2, the size of the dot area of the light source is changed in accordance with the unevenness of the imaging characteristic, that is, the MTF characteristic, and the unevenness of the light quantity distribution characteristic of the image plane, that is, the unevenness of the light quantity distribution characteristic of the optical system. Accordingly, it is possible to reduce the unevenness by simultaneously correcting the unevenness of the MTF characteristics on the actual imaging plane and the unevenness of the light amount distribution characteristic of the optical system, thereby making it possible to obtain a high-quality image.

実施例 請求項1記載の発明の一実施例を第1図に基づいて説明
する。なお、結像素子の全体構成は従来技術(第6図参
照)において述べたのでその説明は省略し、また、同一
部分については同一符号を用いる。
Embodiment An embodiment of the invention set forth in claim 1 will be described based on FIG. The overall configuration of the imaging element has been described in the prior art (see FIG. 6), so its explanation will be omitted, and the same parts will be denoted by the same reference numerals.

第6図に示すように、光路分離ミラー2と、ルーフミラ
ー6を一定の配列ピッチで多数個直線状に連続形成した
ルーフミラーアレイ5と、このルーフミラーアレイ5と
前記光路分離ミラー2との間に位置し前記ルーフミラー
6の配列ピッチに対応して形成されたレンズ4を有する
レンズアレイ3と、このレンズアレイ3と前記ルーフミ
ラーアレイ5との間に位置し迷光を遮断する絞り板8(
第10図参照)とよりなる結像素子において、本実施例
では、レンズアレイ3のレンズ4の配列ピッチに対応し
て周期的に形成される結像性能(MTF)のムラと結像
面(像面)7の結像光量のムラとは、互いに1/2の位
相だけずらすように設定されている。そこで、以下、光
量分布の位相をl/2だけずらした理由を具体例を挙げ
て述べる。
As shown in FIG. 6, an optical path separating mirror 2, a roof mirror array 5 in which a large number of roof mirrors 6 are continuously formed linearly at a constant pitch, and a combination of the roof mirror array 5 and the optical path separating mirror 2. a lens array 3 having lenses 4 located therebetween and formed corresponding to the arrangement pitch of the roof mirrors 6; and an aperture plate 8 located between the lens array 3 and the roof mirror array 5 to block stray light. (
In this embodiment, in an imaging element consisting of an imaging surface (see FIG. The unevenness in the amount of image light on the image plane 7 is set to be shifted by 1/2 phase from each other. Therefore, the reason why the phase of the light amount distribution is shifted by l/2 will be described below using a specific example.

第1図(a)〜(d)は、従来技術で述べた第5図(a
)〜(d)にそれぞれ対応するものである。この場合、
第1図(a)かられかるように、MTFのムラAと結像
面7の結像光量のムラBとは位相をほばl/2ずらして
設定しであるため、MTFのムラAにより発生した各ド
ツト毎の強度ばらつきが結像面7の光量ムラのばらつき
を相殺する形となり、第1図(c)に示すように結像面
7でのドツト強度分布の差が著しく改善されることにな
る。これにより、従来例(第12図参照)で用いた電子
写真プロセスと組合せて可視画像を得ると、第1図(d
)に示すように各ドツト毎の濃度差を区別して考える必
要がなくなりほとんど無視することができるため、場所
によって濃度ムラの生じない鮮明な画像を得ることが可
能となる。
Figures 1 (a) to (d) are similar to Figure 5 (a) described in the prior art.
) to (d), respectively. in this case,
As can be seen from Fig. 1(a), the MTF unevenness A and the unevenness B of the imaging light amount on the imaging surface 7 are set with a phase shift of about 1/2, so the MTF unevenness A The generated intensity variation for each dot cancels out the variation in the unevenness of the light amount on the imaging surface 7, and the difference in dot intensity distribution on the imaging surface 7 is significantly improved as shown in FIG. 1(c). It turns out. When this is combined with the electrophotographic process used in the conventional example (see Figure 12) to obtain a visible image, Figure 1 (d
), it is no longer necessary to consider the density difference between each dot separately and it can be almost ignored, making it possible to obtain a clear image without density unevenness depending on the location.

請求項2記載の発明の第一の実施例を第2図に基づいて
説明する。なお、結像素子の全体構成については従来技
術(第6図参照)で述べたのでここでの詳細な説明は省
略し、同一部分については同一符号を用いる。
A first embodiment of the invention as claimed in claim 2 will be described based on FIG. The overall configuration of the imaging element has been described in the prior art (see FIG. 6), so a detailed explanation will be omitted here, and the same parts will be denoted by the same reference numerals.

第2図に示すように、結像素子は、レンズアレイ3の配
列ピッチP(第6図参照)に対応して周期的に変化する
結像特性のムラa(以下、MTF特性のムラaと呼ぶ)
の位相と、像面7の光量分布特性b(以下、光量分布の
ムラbと呼ぶ)の位相とが、互いにP/2だけずらした
形で構成されている。
As shown in FIG. 2, the imaging element has an unevenness a in imaging characteristics (hereinafter referred to as an unevenness a in MTF characteristics) that periodically changes in accordance with the arrangement pitch P of the lens array 3 (see FIG. 6). call)
The phase of the light intensity distribution characteristic b of the image plane 7 (hereinafter referred to as unevenness b of the light intensity distribution) is shifted by P/2 from each other.

この場合、光源としての蛍光体ドツトアレイ管19のド
ツトCは、MTF特性aの高い位置(レンズ光軸16の
中間点)では大きく設定され、MTF特性aの低い位置
(レンズ光軸16)では小さくなるように設定されてい
る。これは言い替えると、蛍光体ドツトアレイ管19の
ドツトCは、光量の高い位置(レンズ光軸16)では小
さく形成され、光量の低い位置(レンズ光軸16の中間
点)では大きく形成されている。また、これら最大、最
小の中間部分の領域では、同様な関係に基づいてドツト
面積を設定する。
In this case, the dots C of the phosphor dot array tube 19 serving as a light source are set to be large at a position where the MTF characteristic a is high (the midpoint of the lens optical axis 16), and are set to be small at a position where the MTF characteristic a is low (the lens optical axis 16). It is set to be. In other words, the dots C of the phosphor dot array tube 19 are formed small at positions where the amount of light is high (lens optical axis 16), and are formed large at positions where the amount of light is low (midpoint of the lens optical axis 16). Further, in the area between the maximum and minimum areas, the dot area is set based on a similar relationship.

このようにMTF特性aのムラ及び光量分布すのムラに
対応して、蛍光体ドツトアレイ管19のドツトCの形状
を変化させることによって、結像面(実際の像面)上に
おける光量分布dは、第2図に示すようにほぼ均一(直
線状)になり、これにより結像面でのドツト面積eはす
べて等しくなる。従って、このように、結像面上におけ
るMTF特性aのムラと光学系の光量分布特性すのムラ
とを同時に補正して光量ムラを低減することができるた
め、従来に比べ一段と高品位な画像を得ることができる
In this way, by changing the shape of the dots C of the phosphor dot array tube 19 in response to the unevenness of the MTF characteristic a and the unevenness of the light intensity distribution, the light intensity distribution d on the image forming plane (actual image plane) can be changed. , are almost uniform (linear) as shown in FIG. 2, and as a result, the dot areas e on the imaging plane are all equal. Therefore, it is possible to simultaneously correct the unevenness of the MTF characteristic a on the imaging plane and the unevenness of the light intensity distribution characteristic of the optical system, thereby reducing the unevenness of the light intensity, resulting in a much higher quality image than before. can be obtained.

次に、請求項2記載の発明の第二の実施例を第3図に基
づいて説明する。本実施例も上述した第一の実施例と同
様に、光源としての蛍光体ドツトアレイ管19の形状を
MTF特性のムラ及び光量分布のムラに対応して変化さ
せるが、この場合、レンズ配列方向Yに直交する副走査
方向XのMTF特性はレンズ配列方向Yの位置に依存し
ての変化が小さいため、その副走査方向XへのドツトC
の形状はすべて同一とし、主走査方向となるレンズ配列
方向YのみへのドツトCの形状を変化させたものである
Next, a second embodiment of the invention as claimed in claim 2 will be described based on FIG. In this embodiment, as in the first embodiment, the shape of the phosphor dot array tube 19 as a light source is changed in accordance with the unevenness of the MTF characteristics and the unevenness of the light amount distribution. Since the MTF characteristics in the sub-scanning direction X, which is orthogonal to
The shapes of the dots C are all the same, and the shape of the dots C is changed only in the lens arrangement direction Y, which is the main scanning direction.

また、MTF特性aのムラと光量分布すのムラとの関係
は互いに位相をほぼP/2ずらして構成しているが、M
TF特性aのムラと光量分布すのムラの最大位置は第一
の実施例と異なり、レンズ光軸16の位置でMTF特性
aのムラが最大となるように設定している。
In addition, the relationship between the unevenness of the MTF characteristic a and the unevenness of the light amount distribution is determined by shifting the phase by approximately P/2 from each other.
The maximum position of the unevenness of the TF characteristic a and the unevenness of the light amount distribution is different from the first embodiment, and is set so that the unevenness of the MTF characteristic a becomes maximum at the position of the lens optical axis 16.

なお、ここで、結像素子の重なり度mに対する単一レン
ズ系と合成レンズ系の光量分布を比較した例を第9図(
a)(b)に示しておく。この図で、縦軸は光量、横軸
はレンズ配列方向を示したものである。また、第10図
及び第11図は、本出願人により特願昭63−1430
86号として出願されたものの中に記載したものであり
、絞り板8の開口形状を変えることによって合成光量分
布を均一化できる補正方法を示したものである。従って
、これにより、MTF特性aの位相と光量分布すの位相
とをP/2ずらすことは容易に行うことができることが
わかる。
Here, an example of comparing the light intensity distribution of a single lens system and a composite lens system with respect to the degree of overlap m of the imaging elements is shown in Figure 9 (
Shown in a) and (b). In this figure, the vertical axis represents the amount of light, and the horizontal axis represents the lens arrangement direction. Furthermore, FIGS. 10 and 11 are shown in Japanese Patent Application No. 63-1430 filed by the present applicant.
This is described in the application filed as No. 86, and shows a correction method that can make the combined light amount distribution uniform by changing the aperture shape of the diaphragm plate 8. Therefore, it can be seen that it is possible to easily shift the phase of the MTF characteristic a and the phase of the light amount distribution by P/2.

次に、請求項2記載の発明の第三の実施例を第4図に基
づいて説明する。本実施例は、これまで述べた2つの実
施例に述べられた光プリンタ用の光源としての蛍光体ド
ツトアレイ管19を用いて、電子写真記録装置20を構
成したものである。感光体21は矢印方向に回転して行
くようになっており、その周囲には帯電チャージャ22
、現像部23、転写チャージャ24、クリーニング部2
5、除電ランプ26が配置されている。そして、これら
蛍光体ドツトアレイ管19を備えた結像素子は、帯電チ
ャージャ22と現像部23との間に位置して設けられて
いる。
Next, a third embodiment of the invention set forth in claim 2 will be described based on FIG. 4. In this embodiment, an electrophotographic recording apparatus 20 is constructed using the phosphor dot array tube 19 as a light source for an optical printer described in the two embodiments described above. The photoreceptor 21 rotates in the direction of the arrow, and a charger 22 is placed around it.
, developing section 23, transfer charger 24, cleaning section 2
5. A static elimination lamp 26 is arranged. The imaging element including the phosphor dot array tube 19 is located between the charger 22 and the developing section 23.

従って、蛍光体ドツトアレイ管19のドツトCの形状を
MTF特性aのムラ及び光量分布すのムラに対応して変
化させることによって、感光体21と転写チャージャ2
4との間に挿入される転写紙27に、MTF特性aのム
ラ及び光量分布すのムラを低減した鮮明で高品位な画像
を得ることが可能となる。
Therefore, by changing the shape of the dots C of the phosphor dot array tube 19 in accordance with the unevenness of the MTF characteristic a and the unevenness of the light amount distribution, the photoreceptor 21 and the transfer charger 2
4, it is possible to obtain a clear, high-quality image with reduced unevenness in the MTF characteristic a and unevenness in the light amount distribution.

なお、光源として蛍光体ドツトアレイ管19を用いた場
合について述べたが、この他に、LEDアレイ、LCS
 (液晶シャッタ)アレイ等を用いることもできる。た
だし、LCSは自己発光ではなく別途光源を必要とし、
液晶によるシャッター機能を用いて光のオン、オフをし
ているため、液晶の1ドツトの開口形状を変化させるこ
とに相当するものである。
Although the case where the phosphor dot array tube 19 is used as a light source has been described, in addition to this, an LED array, an LCS
(Liquid crystal shutter) array etc. can also be used. However, LCS is not self-luminous and requires a separate light source.
Since the shutter function of the liquid crystal is used to turn on and off the light, this is equivalent to changing the aperture shape of one dot of the liquid crystal.

発明の効果 請求項1記載の発明は、光路分離ミラーと、ルーフミラ
ーを一定の配列ピッチで多数個直線状に連続形成したル
ーフミラーアレイと、このルーフミラーアレイと前記光
路分離ミラーとの間に位置し前記ルーフミラーの配列ピ
ッチに対応して形成されたレンズを有するレンズアレイ
と、このレンズアレイと前記ルーフミラーアレイとの間
に位置し迷光を遮断する絞り板とよりなる結像素子にお
いて、レンズアレイのレンズの配列ピッチに対応して周
期的に形成される結像性能のムラと結像面の結像光量の
ムラとが異なる位相となるように設定したので、結像性
能のムラの位相と結像面の結像光量のムラの位相とが逆
位相として重ね合わされるような構成とすることによっ
て、結像素子を用いて結像したトッドの強度ムラを補正
し平坦化することができ、これにより従来のように濃度
ムラが生じるようなことがなくなり鮮明な画像を得るこ
とができるものである。
Effects of the Invention The invention according to claim 1 provides an optical path separating mirror, a roof mirror array in which a large number of roof mirrors are continuously formed in a straight line at a constant arrangement pitch, and between this roof mirror array and the optical path separating mirror. An imaging element comprising a lens array having lenses arranged in correspondence with the array pitch of the roof mirrors, and an aperture plate located between the lens array and the roof mirror array to block stray light, The unevenness in imaging performance, which is periodically formed in accordance with the arrangement pitch of the lenses in the lens array, and the unevenness in the amount of light formed on the imaging surface are set to have different phases, so that the unevenness in imaging performance can be reduced. By adopting a configuration in which the phase and the phase of unevenness in the amount of imaged light on the imaging plane are superimposed as opposite phases, it is possible to correct and flatten the intensity unevenness of the tod imaged using the imaging element. This eliminates the unevenness of density that occurs in the conventional method and makes it possible to obtain clear images.

請求項2記載の発明は、ドツトアレイ状に配列された光
源を備え、レンズが一定の配列ピッチPをもって多数個
配列されたレンズアレイと、このレンズアレイの前記配
列ピッチPに対応して屋根型反射面が多数個配列された
ルーフミラーアレイと、このルーフミラーアレイと前記
レンズアレイとの間に設けられた絞り板と、光路分離ミ
ラーとよりなり、前記レンズアレイの前記配列ピッチP
に対応して周期的に変化する結像特性の位相と像面の光
量分布特性の位相とが互いにP/2ずらして設けられた
結像素子において、前記結像特性の値の高い位置で前記
光源のドツト面積を大きく設定し、前記結像特性の値の
低い位置で前記光源のドツト面積を小さく設定したので
、このように結像特性すなわちMTF特性のムラと、像
面の光量分布特性すなわち光学系の光量分布特性のムラ
とに対応させて、光源のドツト面積の大きさを変化させ
ることによって、実際の結像面上におけるそれらMTF
特性のムラと光学系の光量分布特性のムラとを同時に補
正してムラを低減することができ、これにより高品位な
画像を得ることができるものである。
The invention as claimed in claim 2 provides a lens array including light sources arranged in a dot array shape, a lens array in which a large number of lenses are arranged at a constant arrangement pitch P, and a roof-type reflector corresponding to the arrangement pitch P of this lens array. It consists of a roof mirror array in which a large number of surfaces are arranged, a diaphragm plate provided between the roof mirror array and the lens array, and an optical path separation mirror, and the arrangement pitch P of the lens array is
In an imaging element in which the phase of an imaging characteristic that changes periodically in response to the image plane and the phase of the light amount distribution characteristic of the image plane are shifted from each other by P/2, the Since the dot area of the light source is set large and the dot area of the light source is set small at the position where the value of the imaging characteristic is low, the unevenness of the imaging characteristic, that is, the MTF characteristic, and the light intensity distribution characteristic of the image plane, that is, By changing the size of the dot area of the light source in accordance with the unevenness of the light intensity distribution characteristics of the optical system, these MTFs on the actual image forming plane can be adjusted.
It is possible to reduce the unevenness by simultaneously correcting the unevenness in the characteristics and the unevenness in the light amount distribution characteristic of the optical system, thereby making it possible to obtain a high-quality image.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は請求項I記載の発明の一実施例である光量ムラ
を補正する様子を示す説明図、第2図は請求項2記載の
発明の第一の実施例を示す説明図、第3図は請求項2記
載の発明の第二の実施例を示す説明図、第4図は請求項
2記載の発明の第三の実施例を示す説明図、第5図は従
来において光量ムラが生じている様子を示す説明図、第
6図は結像素子の構成を示す斜視図、第7図及び第8図
はレンズ開口形状により光量分布が変化する様子を示す
説明図、第9図は重なり度に対する単一レンズ系及び合
成レンズ系の光量分布の様子を示す説明図、第10図は
レンズを複数個連ねた状態での配列方向に対する光量変
化の様子を示す説明図、第11図は従来において絞り板
の端部形状を変えることにより光量ムラの調整を行う様
子を示す説明図、第12図は結像素子を電子写真プロセ
スと組合わせた時の様子を示す構成図、第13図は従来
における光量分布を示す説明図である。 2・・・光路分離ミラー 3・・・レンズアレイ、4・
・・レンズ、5・・・ルーフミラーアレイ、6・・・ル
ーフミラー、7・・・結像面、8・・・絞り板、A・・
・結像性能のムラ、B・・・結像光量のムラ、a・・・
結像特性、b・・・光量分布特性、C・・・ドツト、e
・・・ドツト面積出 願 人 株式会社 リ コ (d) ドラl−フ重−宅し ■■■■■■■閣■■■腸■ 均−鳳亡ぶ 1息:A>B>C,>D 1 図 i37図 ルミL 串 テ (a) (b) に) よむ 図 (a ) 見−しつス°5( (b)  金族しンズゑ 、3. JO図 しt 7鳳) 図 [士 J) JZ図 −2
FIG. 1 is an explanatory diagram showing how light intensity unevenness is corrected according to an embodiment of the invention as claimed in claim I, FIG. 2 is an explanatory diagram showing a first embodiment of the invention as claimed in claim 2, and FIG. The figure is an explanatory diagram showing a second embodiment of the invention as claimed in claim 2, FIG. 4 is an explanatory diagram showing a third embodiment of the invention as claimed in claim 2, and FIG. 5 is an explanatory diagram showing a third embodiment of the invention as claimed in claim 2. 6 is a perspective view showing the structure of the imaging element, FIGS. 7 and 8 are explanatory diagrams showing how the light amount distribution changes depending on the lens aperture shape, and FIG. 9 is an explanatory diagram showing the overlapping An explanatory diagram showing the state of the light quantity distribution of a single lens system and a composite lens system with respect to the power, Fig. 10 is an explanatory diagram showing the state of the light quantity change in the arrangement direction when multiple lenses are connected, and Fig. 11 is an explanatory diagram showing the state of the light quantity distribution in the arrangement direction when multiple lenses are connected. Fig. 12 is an explanatory diagram showing how unevenness in light amount is adjusted by changing the shape of the end of the diaphragm plate, Fig. 12 is a configuration diagram showing the state when the imaging element is combined with the electrophotographic process, and Fig. 13 is FIG. 2 is an explanatory diagram showing a conventional light amount distribution. 2... Optical path separation mirror 3... Lens array, 4...
... Lens, 5... Roof mirror array, 6... Roof mirror, 7... Image forming surface, 8... Aperture plate, A...
・Unevenness in imaging performance, B...Unevenness in imaging light amount, a...
Imaging characteristics, b... light intensity distribution characteristics, C... dots, e
... Dottsu Area Applicant Riko Co., Ltd. (d) Dora l - Fuju - House ■■■■■■■ Cabinet ■■■ Intestine ■ Hitoshi - Otori's first breath: A>B>C,>D 1 Figure i Figure 37 Rumi L Kushite (a) (b) に) Read diagram (a) See-shitsusu°5 ((b) Kinzoku Shinzue, 3. JO diagram t 7-ho) Figure [shi J) JZ diagram-2

Claims (1)

【特許請求の範囲】  1、光路分離ミラーと、ルーフミラーを一定の配列ピ
ッチで多数個直線状に連続形成したルーフミラーアレイ
と、このルーフミラーアレイと前記光路分離ミラーとの
間に位置し前記ルーフミラーの配列ピッチに対応して形
成されたレンズを有するレンズアレイと、このレンズア
レイと前記ルーフミラーアレイとの間に位置し迷光を遮
断する絞り板とよりなる結像素子において、前記レンズ
アレイの前記レンズの配列ピッチに対応して周期的に形
成される結像性能のムラと結像面の結像光量のムラとが
異なる位相となるように設定したことを特徴とする結像
素子。  2、ドットアレイ状に配列された光源を備え、レンズ
が一定の配列ピッチPをもって多数個配列されたレンズ
アレイと、このレンズアレイの前記配列ピッチPに対応
して屋根型反射面が多数個配列されたルーフミラーアレ
イと、このルーフミラーアレイと前記レンズアレイとの
間に設けられた絞り板と、光路分離ミラーとよりなり、
前記レンズアレイの前記配列ピッチPに対応して周期的
に変化する結像特性の位相と像面の光量分布特性の位相
とが互いにP/2ずらして設けられた結像素子において
、前記結像特性の値の高い位置で前記光源のドット面積
を大きく設定し、前記結像特性の値の低い位置で前記光
源のドット面積を小さく設定したことを特徴とする結像
素子。
[Scope of Claims] 1. An optical path separating mirror, a roof mirror array in which a large number of roof mirrors are continuously formed in a straight line at a constant arrangement pitch, and an optical path separating mirror located between the roof mirror array and the optical path separating mirror; An imaging element comprising a lens array having lenses formed corresponding to the arrangement pitch of the roof mirrors, and a diaphragm plate positioned between the lens array and the roof mirror array to block stray light, the lens array An imaging element characterized in that the unevenness in imaging performance, which is periodically formed in accordance with the array pitch of the lenses, and the unevenness in the amount of imaged light on the imaging surface are set to have different phases. 2. A lens array including a light source arranged in a dot array, in which a large number of lenses are arranged at a constant arrangement pitch P, and a large number of roof-shaped reflective surfaces arranged in correspondence with the arrangement pitch P of this lens array. a roof mirror array, a diaphragm plate provided between the roof mirror array and the lens array, and an optical path separation mirror,
In the imaging element, the imaging element is provided such that the phase of the imaging characteristic that changes periodically corresponding to the arrangement pitch P of the lens array and the phase of the light amount distribution characteristic of the image plane are shifted by P/2 from each other. An imaging element characterized in that a dot area of the light source is set large at a position where the value of the imaging characteristic is high, and a dot area of the light source is set small at a position where the value of the imaging characteristic is low.
JP2104742A 1989-09-06 1990-04-20 Imaging element Pending JPH03213817A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2104742A JPH03213817A (en) 1989-09-06 1990-04-20 Imaging element

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP1-231242 1989-09-06
JP23124289 1989-09-06
JP1-304411 1989-11-22
JP2104742A JPH03213817A (en) 1989-09-06 1990-04-20 Imaging element

Publications (1)

Publication Number Publication Date
JPH03213817A true JPH03213817A (en) 1991-09-19

Family

ID=26445144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2104742A Pending JPH03213817A (en) 1989-09-06 1990-04-20 Imaging element

Country Status (1)

Country Link
JP (1) JPH03213817A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005221872A (en) * 2004-02-06 2005-08-18 Nec Viewtechnology Ltd Illuminating device and display device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005221872A (en) * 2004-02-06 2005-08-18 Nec Viewtechnology Ltd Illuminating device and display device

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