JPH03215330A - Method for glass surface treatment - Google Patents
Method for glass surface treatmentInfo
- Publication number
- JPH03215330A JPH03215330A JP32538789A JP32538789A JPH03215330A JP H03215330 A JPH03215330 A JP H03215330A JP 32538789 A JP32538789 A JP 32538789A JP 32538789 A JP32538789 A JP 32538789A JP H03215330 A JPH03215330 A JP H03215330A
- Authority
- JP
- Japan
- Prior art keywords
- acid solution
- glass
- acid
- glass surface
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims description 16
- 238000004381 surface treatment Methods 0.000 title claims description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000002253 acid Substances 0.000 claims abstract description 29
- 239000005355 lead glass Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 16
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 7
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 230000002349 favourable effect Effects 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000018044 dehydration Effects 0.000 abstract 1
- 238000006297 dehydration reaction Methods 0.000 abstract 1
- 238000010306 acid treatment Methods 0.000 description 15
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 9
- 229910017604 nitric acid Inorganic materials 0.000 description 9
- 239000011734 sodium Substances 0.000 description 5
- 229910052708 sodium Inorganic materials 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は重量％でＰｂＯを２５〜５０％含存する鉛ガラ
スの表面に反射防止層を形成するためのガラス表面処理
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a glass surface treatment method for forming an antireflection layer on the surface of lead glass containing 25 to 50% PbO by weight.
［従来の技術コ
従来よりガラス表面に反射防止処理を施す方法の一つに
、ガラスを酸溶液に浸漬して処理する酸処理方法がある
。ガラスを酸処理すると、ガラス中のＮａ“、Ｋ”、Ｐ
ｂ”等の陽イオンが酸溶液中の■“と置き換わるイオン
交換反応が起こり、ガラス表面に水和珪酸層が形成され
る。ガラス中から溶出した陽イオンは塩となってガラス
表面に付着し、保護膜を形成して前記イオン交換反応の
進行を妨害するため、通常これら塩類の溶解度の大きい
硝酸溶液を酸溶液として用いている。また水和珪酸層は
不安定であるために、加熱脱水して堅牢な無水珪酸層と
し、経時変化による層の劣化を防止している。[Prior Art] One of the conventional methods for applying antireflection treatment to a glass surface is an acid treatment method in which glass is immersed in an acid solution. When glass is treated with acid, Na", K", and P in the glass are
An ion exchange reaction occurs in which cations such as ``b'' replace ``■'' in the acid solution, and a hydrated silicic acid layer is formed on the glass surface. The cations eluted from the glass turn into salts and adhere to the glass surface, forming a protective film and interfering with the progress of the ion exchange reaction. Therefore, a nitric acid solution, in which these salts have a high solubility, is usually used as the acid solution. There is. Furthermore, since the hydrated silicic acid layer is unstable, it is heated and dehydrated to form a robust anhydrous silicic acid layer to prevent deterioration of the layer due to changes over time.
［発明が解決しようとする問題点］
前記酸処理方法は処理コストが安価であり、しかも他の
方法では困難な大型のガラスブロックの反射防止処理が
可能である。[Problems to be Solved by the Invention] The acid treatment method has a low processing cost, and is also capable of antireflection treatment of large glass blocks, which is difficult to achieve with other methods.
しかしながら放射線遮蔽に用いるようなＰｂＯを重量％
で２５〜５０％含有する鉛ガラスに反射防止処理を施す
場合、従来の方法ではガラス表面に侵蝕むらが発生し、
不均質干渉色を呈するため良好な反射防止層を得ること
が困難であった。However, PbO, such as those used for radiation shielding, is
When applying anti-reflection treatment to lead glass containing 25 to 50% lead, conventional methods cause uneven erosion on the glass surface.
It was difficult to obtain a good antireflection layer because of the non-uniform interference color.
またガラス表面にガラスの屈折率の平方根に近い値を有
する薄膜を１／４λ（λは波長を表す）の厚さにして形
成すると、波長λにおける反射率が低減することが知ら
れており、それゆえガラス表面に良好な反射防止層を形
成するためには、その厚さが１／４λとなるように処理
条件を設定する必要がある。しかしながら硝酸溶液を耐
酸性の劣る鉛ガラスに使用すると、最適な反射防止層の
厚さ１／４λを得ることのできる処理条件が極端に限定
され、それゆえ工業的規模での処理条件の設定が難しく
なり、歩留まりが著しく悪くなる。It is also known that if a thin film having a value close to the square root of the refractive index of the glass is formed on the glass surface to a thickness of 1/4λ (λ represents the wavelength), the reflectance at the wavelength λ will be reduced. Therefore, in order to form a good antireflection layer on the glass surface, it is necessary to set the processing conditions so that the thickness thereof becomes 1/4λ. However, when a nitric acid solution is used on lead glass, which has poor acid resistance, the processing conditions under which the optimum anti-reflection layer thickness of 1/4λ can be obtained are extremely limited, and therefore it is difficult to set the processing conditions on an industrial scale. It becomes difficult and the yield becomes significantly worse.
本発明は上記事情に鑑みなされたもので、ＰｂＯを重量
％で２５〜５０％含有する鉛ガラスの表面に、酸処理法
を用いて良好な反射防止層を歩留まりよく形成する方法
を提供することを目的とするものである。The present invention was made in view of the above circumstances, and an object of the present invention is to provide a method for forming a good antireflection layer with high yield on the surface of lead glass containing 25 to 50% PbO by weight using an acid treatment method. The purpose is to
［問題点を解決するための手段コ
本発明者は上記目的を達成するために種々の研究を行っ
た結果、ガラスと酸との反応を適当な速度で進行させる
と良好な反射防止層を歩留まりよく形成できることを見
い出し、本発明として提案するものである。[Means for Solving the Problems] The present inventor has conducted various studies to achieve the above object, and has found that if the reaction between glass and acid is allowed to proceed at an appropriate rate, a good antireflection layer can be produced at a high yield. We have found that it can be easily formed and propose it as the present invention.
即ち、本発明のガラス表面処理方法は、重量％でＰｂＯ
を２５〜５０％含有する鉛ガラスの表面を６０℃以上の
弱酸溶液で処理した後、水洗し、加熱脱水することによ
って反射防止層を形成してなることを特徴とする。That is, in the glass surface treatment method of the present invention, PbO
The antireflection layer is formed by treating the surface of lead glass containing 25 to 50% with a weak acid solution at 60° C. or higher, washing with water, and dehydrating by heating.
また本発明においては弱酸溶液が酢酸溶液であることが
好ましい。Further, in the present invention, it is preferable that the weak acid solution is an acetic acid solution.
［作用コ
本発明のガラス表面処理方法によれば、酸処理時に６０
℃以上の酢酸溶液等の弱酸溶液を用いるために、重量％
でＰｂＯを２５〜５０％含有する鉛ガラスに対して反応
が緩やかに、且つ均一に進行する。[Function] According to the glass surface treatment method of the present invention, 60%
In order to use a weak acid solution such as an acetic acid solution above ℃, the wt%
The reaction proceeds slowly and uniformly with respect to lead glass containing 25 to 50% PbO.
酸処理による侵蝕むらの発生は、ガラス表面における酸
溶液のごくわずかな濃度差等によって反応速度に差違が
生じ、局部的に膜厚が変化することによるものであると
考えられる。本発明は６０℃以上の弱酸溶液を用いるた
めに、硝酸を用いる場合に比べ、反応が緩やかに進行し
、ガラス表面において反応速度の差違を生じる可能性が
極めて小さく、それゆえ侵蝕むらを生じることがない。The occurrence of uneven corrosion due to acid treatment is thought to be due to differences in reaction rates caused by minute differences in the concentration of acid solutions on the glass surface, resulting in local changes in film thickness. Since the present invention uses a weak acid solution at a temperature of 60°C or higher, the reaction proceeds more slowly than when nitric acid is used, and the possibility of a difference in reaction rate occurring on the glass surface is extremely small. There is no.
またガラス表面においては、ガラスを酸溶液に浸漬する
酸処理時はもとより、酸溶液槽より引き上げた後も、表
面に付着した酸の液滴あるいは洗浄水や空気中の水分に
より反応が進行するために、永和珪酸層の厚さが変化す
る。この反応は酸処理後のガラス表面を洗浄し、加熱脱
水して無水珪酸層を形成するまで続《ため、反射防止層
の厚さが最終的に１／４λとなるように処理条件、とく
に酸処理時間を設定することが重要である。本発明はガ
ラスと酸溶液とが緩やかに反応する結果、工業的規模で
の酸処理時間の設定が容易になる。このことは特に放射
線遮蔽ガラスのような大型の鉛ガラスブロックの処理に
対して有効である。即ちこのような大型の鉛ガラスブロ
ックの場合、酸溶液槽から引き上げて表面に無水珪酸層
を形成するまでの一連の作業にかなりの時間を要するが
、反応が緩やかな速度で進行するため、反射防止履の厚
さの変化が小さく、それゆえ酸処理時間の設定が容易に
なるのである。In addition, on the glass surface, reactions proceed due to acid droplets adhering to the surface, cleaning water, and moisture in the air, not only during acid treatment by immersing the glass in an acid solution, but also after it is removed from the acid solution tank. , the thickness of the Eiwa silicate layer changes. This reaction continues until the glass surface after acid treatment is washed and heated to dehydrate to form an anhydrous silicic acid layer. Therefore, the treatment conditions, especially acid It is important to set the processing time. In the present invention, as a result of the gradual reaction between the glass and the acid solution, it becomes easy to set the acid treatment time on an industrial scale. This is particularly useful for processing large blocks of lead glass such as radiation shielding glass. In other words, in the case of such a large lead glass block, it takes a considerable amount of time to pull it out of the acid solution bath and form an anhydrous silicic acid layer on the surface, but since the reaction proceeds at a slow rate, the reflection Changes in the thickness of the protective shoe are small, and therefore the acid treatment time can be easily set.
なお、ガラスと酸溶液の反応速度が緩やかであることが
好ましいのは上述の通りであり、このことがら極く薄い
硝酸溶液で処理する方法も考えられるが、このような希
硝酸溶液を用いて工業的規模で反射防止処理を行う場合
、その濃度等の制御が極めて困難である。それゆえ本発
明は弱酸溶液を使用するのであるが、常温の弱酸溶液を
ＰｂＯを２５〜５０重量％含有する鉛ガラスに用いると
処理に極めて長い時間を要し、作業効率を著しく低下さ
せるため、弱酸溶液をＢθ℃以上にして酸処理時間の設
定が困難にならない程度に反応速度を上げる。As mentioned above, it is preferable that the reaction rate between the glass and the acid solution be slow, and for this reason, a method of treating with an extremely dilute nitric acid solution may be considered; When performing antireflection treatment on an industrial scale, it is extremely difficult to control the concentration, etc. Therefore, the present invention uses a weak acid solution, but if a weak acid solution at room temperature is used for lead glass containing 25 to 50% by weight of PbO, it will take an extremely long time to process, and the work efficiency will be significantly reduced. The temperature of the weak acid solution is raised to Bθ° C. or above, and the reaction rate is increased to such an extent that setting the acid treatment time is not difficult.
また本発明が弱酸溶液として酢酸溶液が好ましいとして
いるのは、安価で、且つ入手が容易であるとともに、金
属腐蝕作用が極めて小さく、酸溶液槽や処理するガラス
の移送用金具（共に主としてステンレス製である）を腐
蝕させないため、金サビ等の液中浮遊物を発生させる危
険性がないことによる。このような理由から酢酸溶液を
用いるが、これ以外にもクエン酸溶液、シュウ酸溶液、
硝酸アンモニウム溶液等を使用することが可能である。In addition, the present invention prefers acetic acid solution as a weak acid solution because it is inexpensive and easily available, has extremely low metal corrosion effect, and is suitable for use in acid solution tanks and metal fittings for transporting glass to be processed (both are mainly made of stainless steel). This is because there is no risk of floating objects such as gold rust occurring in the liquid because it does not corrode the metal ( For these reasons, acetic acid solution is used, but in addition to this, citric acid solution, oxalic acid solution,
It is possible to use ammonium nitrate solution and the like.
［実施例］
以下本発明のガラス表面処理方法を実施例に基づき説明
する。[Examples] The glass surface treatment method of the present invention will be explained below based on Examples.
重量％でＳｉＯ。４５．５％、Ｂａ０ ２％、Ｐｂ０
３５％、Ｎａ．０ ３％、Ｋ２０ｌ３％、ＣｅＯ２１．
５％のガラスになるように調合した原料バッチを石英ル
ツボに投入し、約１２００℃で４時間溶融した後、金型
に流し込んで板状に成形した。次いで徐冷した板状成形
品を３０Ｘ３０Ｘ１０＋ａｍの大きさに切り出し、その
両面を光学研磨して試料を得た。このようにして得られ
た試料を、放射性物質を取り扱う施設内部で通常用いら
れるナトリウム光（５８９．３ｎｍ ）近傍における反
射率を低減させるために以下のような反射防止処理を施
した。まず得られた試料を８０℃、１／１０規定度の酢
酸溶液あるいはＢＯ℃、１／ｌＯ規定度の硝酸溶液に浸
漬して酸処理を施した。次にこの酸処理した試料を酸溶
液と同温度の水道水で十分にすすいだ後、表面に付いて
いる水滴をふきとった。SiO in weight %. 45.5%, Ba0 2%, Pb0
35%, Na. 0 3%, K20l3%, CeO21.
A raw material batch prepared to give 5% glass was put into a quartz crucible, melted at about 1200°C for 4 hours, and then poured into a mold to form a plate. Next, the slowly cooled plate-shaped molded product was cut into a size of 30×30×10+am, and both surfaces thereof were optically polished to obtain a sample. The sample thus obtained was subjected to the following antireflection treatment in order to reduce reflectance near sodium light (589.3 nm), which is commonly used inside facilities that handle radioactive materials. First, the obtained sample was subjected to acid treatment by immersing it in a 1/10 normal acetic acid solution at 80°C or a 1/1O normal nitric acid solution at BO°C. Next, the acid-treated sample was thoroughly rinsed with tap water at the same temperature as the acid solution, and then water droplets on the surface were wiped off.
その後乾燥機を用いて１１０℃で２４時間加熱した。Thereafter, it was heated at 110° C. for 24 hours using a dryer.
図面は、上記のようにして反射防止処理を施した試料一
面の５５０ｎｍにおける全反射率と酸処理時間との関係
を示したものである。なお処理前の全反射率は５．５％
であり、この全反射率の値が２％以下になる浸漬時間を
最適酸処理時間とした。The drawing shows the relationship between the total reflectance at 550 nm of the entire surface of the sample subjected to the antireflection treatment as described above and the acid treatment time. The total reflectance before treatment is 5.5%.
The immersion time at which the total reflectance value was 2% or less was determined as the optimum acid treatment time.
図面から酢酸溶液で処理した試料（ａ）の最適酸処理時
間は約１０〜１５時間であり、硝酸溶液で処理した試料
（ｂ）のそれが０．７５〜１時間であるのに対して時間
的な幅が広いことが明らかである。From the drawing, the optimum acid treatment time for sample (a) treated with acetic acid solution is about 10-15 hours, while that of sample (b) treated with nitric acid solution is 0.75-1 hour. It is clear that there is a wide range of
また酢酸溶液に１５時間浸漬した試料（ａ）と硝酸溶液
に１時間浸漬した試料（ｂ）の表面状態を比較したとこ
ろ、硝酸溶液に浸漬した試料（ｂ）の表面吠態は浸蝕む
らによる不均質な干渉色が認められたのに対して、酢酸
溶液に浸漬した試料（ａ）には浸蝕むらは全く認められ
ず、表面は一様に濃紫色を呈した。ナトリウム光の１７
４の厚さに成膜した場合、反射光は黄緑色が最も干渉し
て消光し、外観はその補色として紫色を呈することから
、酢酸溶液に浸漬した試料（ａ）は反射防止層の厚さが
ナトリウム光の１７４の厚さ相当であることがわかる。In addition, when comparing the surface conditions of sample (a) immersed in an acetic acid solution for 15 hours and sample (b) immersed in a nitric acid solution for 1 hour, it was found that the surface condition of the sample (b) immersed in a nitric acid solution was due to uneven erosion. While a homogeneous interference color was observed, sample (a) immersed in the acetic acid solution showed no erosion unevenness at all, and the surface uniformly exhibited a dark purple color. sodium light 17
When the film is formed to a thickness of 4, the reflected light is quenched due to the most interference with yellow-green, and the appearance is purple as its complementary color. It can be seen that the thickness is equivalent to 174 mm of sodium light.
これらの事実は本発明のガラス表面処理方法が、ＰｂＯ
を２５〜５０％含有する鉛ガラスに対して、低い全反射
率を得る酸処理時間の幅が広いために処理条件の設定が
容易であり、また表面状態のよい反射防止層を形成する
のに適していることを示している。These facts indicate that the glass surface treatment method of the present invention
For lead glass containing 25 to 50% of lead glass, it is easy to set the treatment conditions because the acid treatment time range to obtain a low total reflectance is wide, and it is also possible to form an antireflection layer with a good surface condition. indicates suitability.
なお、図面中の全反射率は波長５５０ｎｍにおける値を
示したものであり、ｌ５０φｍｍ積分球付分光光度計を
用いて硫酸バリウムの白色拡散板を基準として測定した
。Incidentally, the total reflectance in the drawings shows the value at a wavelength of 550 nm, and was measured using a spectrophotometer with a 150 mm integrating sphere using a barium sulfate white diffuser plate as a reference.
［効果］
以上のように本発明のガラス表面処理方法によれば、Ｐ
ｂＯを重量％で２５〜５０％含有する鉛ガラスに対して
、反応が緩やかで均一に進み、処理条件の設定が容易で
あるために、ガラス表面に良好な反射防止層を歩留まり
よく形成することができる。[Effect] As described above, according to the glass surface treatment method of the present invention, P
For lead glass containing 25 to 50% bO by weight, the reaction proceeds slowly and uniformly, and processing conditions can be easily set, so that a good antireflection layer can be formed on the glass surface with a high yield. I can do it.
図面は、試料一面の５５０ｎｍにおける全反射率と酸処
理時間との関係を示したグラフであり、図中の（ａ）は
酢酸溶液による処理、（ｂ）は硝酸溶液による処理であ
る。The drawing is a graph showing the relationship between the total reflectance at 550 nm of the entire surface of the sample and the acid treatment time, in which (a) shows the treatment with an acetic acid solution, and (b) shows the treatment with a nitric acid solution.
Claims (2)
の表面を、６０℃以上の弱酸溶液で処理した後、水洗し
、加熱脱水することによって反射防止層を形成してなる
ことを特徴とするガラス表面処理方法。(1) An antireflection layer is formed by treating the surface of lead glass containing 25 to 50% PbO by weight with a weak acid solution at 60°C or higher, washing with water, and heating and dehydrating it. Glass surface treatment method.
請求の範囲第１項記載のガラス表面処理方法。(2) The glass surface treatment method according to claim 1, wherein the weak acid solution is an acetic acid solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32538789A JP2710071B2 (en) | 1989-12-14 | 1989-12-14 | Glass surface treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32538789A JP2710071B2 (en) | 1989-12-14 | 1989-12-14 | Glass surface treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03215330A true JPH03215330A (en) | 1991-09-20 |
| JP2710071B2 JP2710071B2 (en) | 1998-02-10 |
Family
ID=18176264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32538789A Expired - Fee Related JP2710071B2 (en) | 1989-12-14 | 1989-12-14 | Glass surface treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2710071B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6752675B2 (en) | 2000-04-13 | 2004-06-22 | Matsushita Electric Industrial Co., Ltd. | Method for recycling cathode ray tube bulb |
| JP2022549126A (en) * | 2019-09-20 | 2022-11-24 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | Method for treating lead-containing glass, making it possible to limit the leaching of the lead contained in this glass in solution |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3475913B2 (en) | 2000-06-09 | 2003-12-10 | 松下電器産業株式会社 | Separation method of glass panel and funnel |
-
1989
- 1989-12-14 JP JP32538789A patent/JP2710071B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6752675B2 (en) | 2000-04-13 | 2004-06-22 | Matsushita Electric Industrial Co., Ltd. | Method for recycling cathode ray tube bulb |
| JP2022549126A (en) * | 2019-09-20 | 2022-11-24 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | Method for treating lead-containing glass, making it possible to limit the leaching of the lead contained in this glass in solution |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2710071B2 (en) | 1998-02-10 |
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