JPH03215386A - Production of oxide single crystal - Google Patents

Production of oxide single crystal

Info

Publication number
JPH03215386A
JPH03215386A JP657990A JP657990A JPH03215386A JP H03215386 A JPH03215386 A JP H03215386A JP 657990 A JP657990 A JP 657990A JP 657990 A JP657990 A JP 657990A JP H03215386 A JPH03215386 A JP H03215386A
Authority
JP
Japan
Prior art keywords
single crystal
crystal
crucible
ratio
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP657990A
Other languages
Japanese (ja)
Other versions
JPH0822799B2 (en
Inventor
Akihiro Takahashi
明博 高橋
Shuhei Toyoda
周平 豊田
Takeshi Obuchi
武志 大渕
Atsushi Okumura
淳 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP657990A priority Critical patent/JPH0822799B2/en
Publication of JPH03215386A publication Critical patent/JPH03215386A/en
Publication of JPH0822799B2 publication Critical patent/JPH0822799B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To effectively control shape of a solid-liquid interface in melt in pulling up of crystal to improve quality of a single crystal by growing an oxide single crystal from melt in a crucible with making a ratio of a crystalline diameter of pulledup single crystal to an inner diameter of the crucible in a specific range. CONSTITUTION:An oxide single crystal is grown with making a ratio of a crystalline diameter of pulled-up single crystal to an inner diameter of a crucible to 0.65-0.75 in growing the oxide single crystal from melt in the crucible by a pulling-up method. Said method is utilizable to all of various methods in the pulling-up method, thus an oxide single crystal such as LiNbO3 or LiTaO3 is advantageously obtained. For <=0.65 said ratio of a crystalline diameter to an inner diameter of the crucible, a shape ratio (a/L) at a solid-liquid interface of a single crystal 8 becomes smaller than -0.05 and a shape of the interface becomes concave (upwardly protruding), thus crystallinity is decreased. On the other hand, for >=0.75 of said ratio, crystallinity is also decreased, while the shape of the interface is downwardly protruding, thus improving of quality of the resultant single crystal 8 is difficult.

Description

【発明の詳細な説明】 (技術分野) 本発明は、L iNbo.,L iTaos等の酸化物
単結晶を製造する方法に係り、特にそのような酸化物単
結晶を引上げ法にて製造する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to L iNbo. , LiTaos, etc., and particularly relates to a method of manufacturing such an oxide single crystal by a pulling method.

(11景技術) 従来から、この種の酸化物単結晶の製造手法として、各
種の方法が知られているが、そのうちの一つである引上
げ法(チョクラルスキー法)は、ルツボ内の融液から、
目的とする酸化物単結晶を育成しつつ引き上げるもので
あり、大口径で、良質な酸化物単結晶を製造し得る手法
として実用に供されている。
(11th Background Art) Various methods have been known for producing this type of oxide single crystal, but one of them, the pulling method (Czochralski method), From the liquid
This method involves growing and pulling the desired oxide single crystal, and is in practical use as a method for producing large-diameter, high-quality oxide single crystals.

ところで、かかる引上げ法にて良質な単結晶を育成する
ためには、単結晶の固液界面を制御することが重要であ
り、このために、従来がら、融液を収容するルッポを加
熱するためのワークコイルを移動させたり、ルッポと単
結晶の相対的な回転数や引上げ速度を遅くする等して、
単結晶の育成が行なわれている。良質な単結晶を育成す
るためには固液界面形状が平坦であることが望ましいと
言われているからである。そのような固液界面形状が平
坦でないと、引上げ育成した単結晶内にクラックや気泡
等の巨視的欠陥が出現するようになるのである。
By the way, in order to grow a high-quality single crystal using such a pulling method, it is important to control the solid-liquid interface of the single crystal. By moving the work coil, slowing down the relative rotation speed and pulling speed of Lupo and the single crystal, etc.
Single crystals are being grown. This is because it is said that in order to grow a high-quality single crystal, it is desirable that the solid-liquid interface shape be flat. If the shape of the solid-liquid interface is not flat, macroscopic defects such as cracks and bubbles will appear in the pulled and grown single crystal.

しかしながら、このような従来から提案されている条件
変更だけでは、引上げ法における単結晶の良好な固液界
面制御は困難であり、従って良質な単結晶が得られない
という問題点があった。
However, it is difficult to control the solid-liquid interface of the single crystal in the pulling method only by changing the conditions that have been proposed in the past, and therefore, there is a problem that a high-quality single crystal cannot be obtained.

(解決課題) ここにおいて、本発明は、かかる事情を背景にして為さ
れたものであって、その課題とするところは、引上げ法
において、酸化物単結晶引上げ時の融液固液界面の形状
を効果的に制御し得る手法を提供することにある。
(Problem to be solved) The present invention has been made against the background of the above, and its object is to solve the problem of the shape of the melt-solid-liquid interface during pulling of an oxide single crystal in the pulling method. The objective is to provide a method that can effectively control the

(解決手段) そして、本発明は、かかる課題解決のために、酸化物単
結晶を引上げ法にてルッポ内の融液から育成するに際し
、引上げ単結晶の結晶径とルツボ内径との比を0.65
以上、0.75以下として育成を行なうことを特徴とす
る酸化物単結晶の製造方法を、その要旨とするものであ
る。
(Solution Means) In order to solve this problem, the present invention aims to reduce the ratio of the crystal diameter of the pulled single crystal to the inner diameter of the crucible to 0 when growing an oxide single crystal from the melt in the Lupo by the pulling method. .65
The gist of the above is a method for producing an oxide single crystal, which is characterized in that the growth is carried out at a value of 0.75 or less.

(具体的構成・作用) 要するに、引上げ法における酸化物単結晶の引上げに際
し、固液界面形状が結晶の回転数等に依存することは従
来から知られているが、本発明者らが種々検討した結果
、かかる固液界面形状が、引上げ結晶と引上げに用いら
れる融解用ルッポの内径(直径)との比(結晶径/ルツ
ボ径)に依存することが見い出されたのであり、そして
本発明は、そのような知見に基づいて完成されたもので
ある。
(Specific structure/effect) In short, it has been known for a long time that the shape of the solid-liquid interface depends on the rotation speed of the crystal when pulling an oxide single crystal using the pulling method, but the present inventors have conducted various studies. As a result, it was found that the shape of the solid-liquid interface depends on the ratio (crystal diameter/crucible diameter) between the pulled crystal and the inner diameter (diameter) of the melting tube used for pulling. , was completed based on such knowledge.

すなわち、第1図に引上げ法の一例が概略的に示されて
いるが、そのような引上げ法において、結晶径(L)/
ルツボ径(φ)の比が大きくなるに従い、結晶の固液界
面形状は下方に凸なる形状となるのであり、本発明にお
いては、かかるL/φの比が0.65〜0.75となる
ように結晶の育成を行なうようにしたものであり、これ
によって固液界面形状が平坦かやや下凸となるようにし
て、結晶性を改善せしめ、以て結晶欠陥の発生を抑制し
て、得られる単結晶の品質を向上せしめたのである。
That is, an example of a pulling method is schematically shown in FIG. 1, and in such a pulling method, the crystal diameter (L)/
As the crucible diameter (φ) ratio increases, the solid-liquid interface shape of the crystal becomes convex downward, and in the present invention, the L/φ ratio is 0.65 to 0.75. In this way, the solid-liquid interface shape becomes flat or slightly convex, improving crystallinity, thereby suppressing the occurrence of crystal defects, and increasing the yield. This improved the quality of the single crystal produced.

なお、本発明は、引上げ法として公知の各種の手法の何
れに対しても適用され得、それによって、かかる引上げ
法にて製造されるLiNbOz.LiTao3等の酸化
物単結晶を有利に与えるものである。
Note that the present invention can be applied to any of various methods known as a pulling method, and thereby LiNbOz. This advantageously provides oxide single crystals such as LiTao3.

例えば、第1図に概略的に示される引上げ法においては
高周波誘導加熱炉が用いられ、そのワークコイル(誘導
コイル)2にて、ルツボ4が加熱せしめられるようにな
っている。そして、ルツボ4内には、目的とする単結晶
を与える酸化物の融液6が収容されており、この融液6
に対して公知の如く種結晶にて種付けが行なわれ、その
種結晶から結晶を成長させつつ、その育成された単結晶
8が融液6から漸次引き上げられるのである。なお、こ
のような結晶8の育成に際しては、従来と同様に、単結
晶8がその軸回りに回転せしめられたり、ルツボ4が回
転せしめられたりして、単結晶8とルツボ4との相対的
な回転が行なわれる。
For example, in the pulling method schematically shown in FIG. 1, a high frequency induction heating furnace is used, and a crucible 4 is heated by a work coil (induction coil) 2 of the furnace. The crucible 4 contains a melt 6 of an oxide that provides the desired single crystal, and this melt 6
As is well known, seeding is performed using a seed crystal, and while the crystal is grown from the seed crystal, the grown single crystal 8 is gradually pulled up from the melt 6. In addition, when growing such a crystal 8, as in the conventional case, the single crystal 8 is rotated around its axis, the crucible 4 is rotated, and the relative relationship between the single crystal 8 and the crucible 4 is changed. A rotation is performed.

また、単結晶8の結晶径(L)の制御は、公知の結晶径
自動制御装置(ADC)等を用いて行なわれることとな
る。この結晶径自動制御装置(ADC)は、成長した単
結晶8の重量測定から結晶径(L)の計測を行ない、ワ
ークコイル2等による加熱量を制御することによって、
育成される単結晶8が目的とする結晶径(L)となるよ
うにするものである。
Further, the crystal diameter (L) of the single crystal 8 is controlled using a known automatic crystal diameter control device (ADC) or the like. This automatic crystal diameter control device (ADC) measures the crystal diameter (L) from the weight measurement of the grown single crystal 8, and controls the amount of heating by the work coil 2, etc.
This is to ensure that the single crystal 8 to be grown has a desired crystal diameter (L).

本発明は、かくの如き引上げ法において、結晶径(L)
/ルツボ径(φ)の比が0.65〜0.75となるよう
に単結晶8を育成するものであり、それによって、第2
図に示される如き、テール部が平坦かやや下凸となる外
形形状を呈する単結晶8が得られることとなるのである
.なお、かかるL/φが0.65未満であると、固液界
面の形状比(a/L)が−0.05よりも小さな値とな
って、界面形状が凹(上凸)状となり、結晶性が悪化す
るようになるのであり、一方、L/φが0.75を越え
るようになると、界面形状は下凸であるものの、結晶性
が悪くなり、得られる単結晶8の品質を向上せしめるこ
とが困難となる。
In the present invention, in such a pulling method, the crystal diameter (L)
The single crystal 8 is grown so that the ratio of crucible diameter (φ) is 0.65 to 0.75.
As shown in the figure, a single crystal 8 having an outer shape with a flat or slightly downwardly convex tail portion is obtained. In addition, when L/φ is less than 0.65, the shape ratio (a/L) of the solid-liquid interface becomes a value smaller than -0.05, and the interface shape becomes concave (upward convex). On the other hand, when L/φ exceeds 0.75, although the interface shape is downward convex, the crystallinity deteriorates and the quality of the obtained single crystal 8 is improved. It becomes difficult to discipline.

(実施例) 以下に、本発明の代表的な実施例を示し、本発明を更に
具体的に明らかにすることとするが、本発明が、そのよ
うな実施例の記載によって、何等の制約をも受けるもの
でないことは、言うまでもないところである。
(Example) Below, typical examples of the present invention will be shown to clarify the present invention more specifically. However, the present invention is not limited in any way by the description of such examples. Needless to say, it is not something that can be accepted.

先ず、120mφの白金ルツボにLiNbOs焼結体を
入れ、高周波誘導加熱により、1300℃に加熱して溶
融せしめ、そして種付けした後、結晶肩部を育成し、引
上げ速度:3■/hr、結晶の回転数:8rpm、ルツ
ボの回転数:Orpmなる条件下において、結晶径を下
記第1表の如く設定して結晶径自動制御装置(ADC)
にて制御しつつ、LiNbO3単結晶を成長させた。そ
して、引上げ後、得られた単結晶を切断し、その界面形
状(a/L)を観察して、その結果を、下記第1表に示
した。また、150■φのルツボを用いて、上記と同様
にしてLiNbO.単結晶を育成した結果も、下記第1
表に併わせて示した。
First, a LiNbOs sintered body was placed in a 120 mφ platinum crucible, heated to 1300°C by high frequency induction heating to melt it, and after seeding, a crystal shoulder was grown and the crystal was grown at a pulling rate of 3/hr. Under the conditions of rotation speed: 8 rpm and crucible rotation speed: Orpm, the crystal diameter was set as shown in Table 1 below, and the automatic crystal diameter control device (ADC) was used.
A LiNbO3 single crystal was grown under control. After pulling, the obtained single crystal was cut and its interface shape (a/L) was observed, and the results are shown in Table 1 below. Also, using a 150 φ crucible, LiNbO. The results of growing single crystals are also shown in the first section below.
It is also shown in the table.

更に、この第1表の結果を、第3図に示した。Furthermore, the results of Table 1 are shown in FIG.

かかる第1表並びに第3図の結果より、L/φを0.6
5以上とすることにより、固液界面が平坦化乃至は下凸
状化することが判った。
From the results shown in Table 1 and Figure 3, L/φ is set to 0.6.
It has been found that when the value is 5 or more, the solid-liquid interface becomes flat or downwardly convex.

また、かくして得られた各種のLiNbOs単結晶につ
いて、結晶欠陥の測定をそれぞれ行なったところ、結晶
径/ルツボ径(L/φ)が0.65〜0.75の場合に
おいて、固液界面形状(a/L)が−0.05〜0.1
0となり、結晶欠陥の少ない、良好な結晶が得られるこ
とが判った. なお、結晶欠陥の良否は、それぞれの単結晶から0.5
閣の厚さのウエハを切り出し、X線トボグラフによって
測定した写真より、判定した.即ち、ウエハ内を7閣角
の枡目に区切り、その枡目の欠陥の有無を測定し、全測
定枡目に対する欠陥の存在する枡目の比を取り、0〜1
0%のものを良好:Oとし、また10〜20%のものを
中程度:Δとし、更に欠陥割合が20%以上のものは不
良:×とした.結果を、下記第1表に併わせ示した.第 l O:欠陥割合 0〜lO% Δ: 〃  10〜20% X:#20%以上 (発明の効果) 以上の説明から明らかなように、本発明によれば、酸化
物単結晶の引上げ法による製造において、任意に固液界
面形状を制御することが出来ることとなり、以て有効な
固液界面形状での育成によって、高品質な単結晶を有利
に得ることが出来ることとなったのである。
In addition, when crystal defects were measured for various LiNbOs single crystals obtained in this way, it was found that when the crystal diameter/crucible diameter (L/φ) was 0.65 to 0.75, the solid-liquid interface shape ( a/L) is -0.05 to 0.1
0, indicating that good crystals with few crystal defects can be obtained. In addition, the quality of crystal defects is 0.5 from each single crystal.
The judgment was made based on a photograph taken by cutting out a wafer with a thickness of about 100 mm and measuring it using an X-ray tobograph. That is, the inside of the wafer is divided into squares of 7 squares, the presence or absence of defects in the squares is measured, and the ratio of the squares with defects to all the measured squares is calculated, and the ratio is set from 0 to 1.
Those with a defect rate of 0% were evaluated as good: O, those with a defect rate of 10 to 20% were evaluated as moderate: Δ, and those with a defect ratio of 20% or more were evaluated as poor: ×. The results are also shown in Table 1 below. No. 1 O: Defect ratio 0-10% Δ: 10-20% In the manufacturing process, the shape of the solid-liquid interface can be controlled arbitrarily, and high-quality single crystals can be advantageously obtained by growing with an effective solid-liquid interface shape. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、単結晶引上げ装置の一例を概略的に示す説明
図であり、第2図は、そのような引上げ装置によって製
造される単結晶の一例を示す外形図であり、第3図は、
実施例において得られた各種結晶径/ルッポ径(L/φ
)に対する固液界面形状( a / L )の結果を示
すグラフである.2:ワークコイル   4:ルツボ 6:融液       8:単結晶
FIG. 1 is an explanatory diagram schematically showing an example of a single crystal pulling device, FIG. 2 is an outline diagram showing an example of a single crystal produced by such a pulling device, and FIG. ,
Various crystal diameters/Luppo diameter (L/φ
) is a graph showing the results of the solid-liquid interface shape (a/L). 2: Work coil 4: Crucible 6: Melt 8: Single crystal

Claims (2)

【特許請求の範囲】[Claims] (1)酸化物単結晶を引上げ法にてルツボ内の融液から
育成するに際し、引上げ単結晶の結晶径とルツボ内径と
の比を0.65以上、0.75以下として育成を行なう
ことを特徴とする酸化物単結晶の製造方法。
(1) When growing an oxide single crystal from the melt in a crucible using the pulling method, the ratio of the crystal diameter of the pulled single crystal to the crucible inner diameter is 0.65 or more and 0.75 or less. Characteristic method for producing oxide single crystals.
(2)前記酸化物単結晶がLiNbO_3である請求項
(1)記載の製造方法。
(2) The manufacturing method according to claim (1), wherein the oxide single crystal is LiNbO_3.
JP657990A 1990-01-16 1990-01-16 Method for producing oxide single crystal Expired - Lifetime JPH0822799B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP657990A JPH0822799B2 (en) 1990-01-16 1990-01-16 Method for producing oxide single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP657990A JPH0822799B2 (en) 1990-01-16 1990-01-16 Method for producing oxide single crystal

Publications (2)

Publication Number Publication Date
JPH03215386A true JPH03215386A (en) 1991-09-20
JPH0822799B2 JPH0822799B2 (en) 1996-03-06

Family

ID=11642239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP657990A Expired - Lifetime JPH0822799B2 (en) 1990-01-16 1990-01-16 Method for producing oxide single crystal

Country Status (1)

Country Link
JP (1) JPH0822799B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4735594B2 (en) * 2007-04-13 2011-07-27 住友金属鉱山株式会社 Oxide single crystal growth method

Also Published As

Publication number Publication date
JPH0822799B2 (en) 1996-03-06

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