JPH0321894A - Stage device - Google Patents
Stage deviceInfo
- Publication number
- JPH0321894A JPH0321894A JP1155819A JP15581989A JPH0321894A JP H0321894 A JPH0321894 A JP H0321894A JP 1155819 A JP1155819 A JP 1155819A JP 15581989 A JP15581989 A JP 15581989A JP H0321894 A JPH0321894 A JP H0321894A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- base
- stages
- movement
- balancer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、例えば投影露光装置に応用されるような防振
機構を備えたステージ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a stage apparatus equipped with a vibration isolation mechanism, which is applied to, for example, a projection exposure apparatus.
[従来の技術]
近年、各種の精密な測定装置や半導体製造関連の各種装
置等において、きわめて高精度な位置決め装置の要求が
高まっている。通常、この種の位置決め装置はXY方向
に移動可能なステージを有する.また、大地からの振動
を絶縁するため、ステージを支持する基盤は、弾性体や
緩衝体により装置の土台上に保持されている。[Background Art] In recent years, there has been an increasing demand for extremely high-precision positioning devices in various precision measuring devices, various devices related to semiconductor manufacturing, and the like. Usually, this type of positioning device has a stage movable in the X and Y directions. Further, in order to insulate vibrations from the ground, the base supporting the stage is held on the base of the apparatus by an elastic body or a buffer body.
第7図は、従来から考えられている防振構造を備えたス
テージ装置の例である.
この従来例においては、ステージ51が、第1基盤52
上の軌道上に移動可能に載置される。また、第1基盤5
2は、ステージ51の移動の逆方向に移動できるよう第
2基盤56上に設定された軌道上に載置されている。さ
らに、第2基盤56は、基礎55上の装置上台54に取
り付けられた弾性体53により支持されている。Figure 7 is an example of a stage device equipped with a conventionally considered vibration-proof structure. In this conventional example, the stage 51 is
It is movably mounted on the upper orbit. In addition, the first base 5
2 is placed on a trajectory set on the second base 56 so that it can move in the opposite direction of the movement of the stage 51. Further, the second base 56 is supported by an elastic body 53 attached to the device top 54 on the base 55.
この従来例は、ステージ51の移動の際、ステージ51
の移動に伴なう反力により第1基盤52が第2基盤上を
移動する構造である。すなわち、反力を第1基盤52の
すべりで吸収することにより第1基盤52に振動を発生
しない構造である。In this conventional example, when the stage 51 is moved, the stage 51
The structure is such that the first base 52 moves on the second base due to the reaction force caused by the movement of the base. That is, the structure is such that the reaction force is absorbed by the sliding of the first base 52, so that no vibration is generated in the first base 52.
[発明が解決しようとする課題]
従来例に掲げたステージ装置は、投影露光装置等に用い
られる一般的なステージ装置には適用しにくい部分があ
った。すなわち、XYステージのように2@以上の移動
軸を有するステージ装置においては、すべり面を厳密な
水平状態に保つとともに、各移動軸に対応した複数方向
のすべりが可能な滑り機構を設ける必要がある.このた
め装置構造が複雑となり、装置重量も増加する.また、
第1基盤上をステージが移動する場合、第1基盤に発生
する反力は、この第1基盤を水平面内で回転しようとす
るモーメントを同時に発生し、上述のようなすべり機構
は、このモーメントを吸収できないから、ステージの移
動や停止に伴なう装置の振動が除去できないでいた。[Problems to be Solved by the Invention] The stage apparatus described in the conventional example has some difficulty in being applied to a general stage apparatus used in a projection exposure apparatus or the like. In other words, in a stage device such as an XY stage that has two or more axes of movement, it is necessary to maintain the sliding surface in a strictly horizontal state and to provide a sliding mechanism that can slide in multiple directions corresponding to each axis of movement. be. This complicates the device structure and increases the weight of the device. Also,
When the stage moves on the first base, the reaction force generated on the first base simultaneously generates a moment that attempts to rotate the first base in a horizontal plane, and the sliding mechanism as described above absorbs this moment. Because it cannot be absorbed, it has not been possible to eliminate the vibrations of the equipment that occur when the stage moves or stops.
本発明は、このような従来の問題点を解決するためにな
されたもので、ステージの移動に伴ないステージのff
ili置された基盤に発生する反力を積極的に打ち消す
機構を備えた、ステージの移動に伴なう基盤の振動が少
ないステージ装置を}是供することを目的とする。The present invention has been made to solve such conventional problems, and the ff of the stage increases as the stage moves.
An object of the present invention is to provide a stage device which is equipped with a mechanism that actively cancels out the reaction force generated on a substrate placed on the substrate, and which causes less vibration of the substrate as the stage moves.
[課題を解決するための千段]
本発明に係るステージ装置は、防振構造により土台から
支持された基盤の水平面上をステージが2次元移動する
形式のステージ装置において、基盤に支持され、かつ基
盤に対し相対移動が可能である所定質量の可動部材を複
数個備えている。[A Thousand Steps to Solve the Problem] A stage device according to the present invention is a stage device of a type in which the stage moves two-dimensionally on a horizontal plane of a base supported from a base by a vibration-proof structure. It includes a plurality of movable members of a predetermined mass that can move relative to the base.
また、ステージを加減速する際、基盤に作用する力を相
殺するために必要な可動部材の駆動条件を、基盤に対す
るステージの位置と移動状態(正負の加速度、スピード
等)とに基いて算出する演算手段を備える.
さらに、ステージの加減速によって発生する前記基盤の
振動を可動部材の移動により減少させるために、可動部
材の移動を演算手段により求められた駆動条件に応じて
制御する制御手段とを備える。In addition, when accelerating or decelerating the stage, the driving conditions for the movable members necessary to offset the force acting on the base are calculated based on the position of the stage with respect to the base and the state of movement (positive and negative acceleration, speed, etc.) Equipped with calculation means. Furthermore, in order to reduce vibrations of the base caused by acceleration and deceleration of the stage by moving the movable member, a control means is provided for controlling the movement of the movable member according to the drive condition determined by the calculation means.
[作用]
本発明に係るステージ装置において、防振構造は、装置
土台からの振動を吸収してステージ基盤への伝達を抑制
する。また、ステージは、この基盤上の水平面に設定さ
れた軌道上を2次元移動可能である。[Function] In the stage device according to the present invention, the vibration isolation structure absorbs vibrations from the device base and suppresses transmission to the stage base. Furthermore, the stage is capable of two-dimensional movement on a trajectory set on a horizontal plane on this base.
また、基盤にはこのステージの移動方向に対応させた可
動部材用の移動経路が複数本設置されていて、この移動
経路上を所定質量の各可動部材が運動して基盤に対する
相対移動を行う.この可動部材は、ステージの移動に伴
ない基盤に発生する反力を打ち消すために用いられるも
のである.ゆえに、可動部材はステージの重量に応じた
質量を持つ。また、これの移動経路は、可動部材の移動
がステージ移動等の装置本来の機能の障害にならないよ
うな位置に設定される。Furthermore, a plurality of movement paths for movable members are installed on the base, corresponding to the moving direction of the stage, and each movable member of a predetermined mass moves on these movement paths to move relative to the base. This movable member is used to cancel the reaction force generated on the base as the stage moves. Therefore, the movable member has a mass corresponding to the weight of the stage. Further, the movement path of this is set at a position where movement of the movable member does not interfere with the original functions of the apparatus such as stage movement.
本発明に係るステージ装置において、演算手段は、基盤
に対するステージの位置と移動状態とに基いて、ステー
ジを加減速する際に基盤に作用する力を相殺するために
必要な可動部材の駆動条件を算出する.
また、制御手段は、可動部材の移動を演算手段により算
出された駆動条件に応じて制御する。可動部材のこの移
動により基盤に発生する反力やモーメントは、ステージ
の加速や減速により基盤に発生する反力やモーメントを
中和させる方向と大きさに制御されている。これにより
、ステージの加速や減速により発生する基盤の振動、例
えば投影露光装置における位置決め完了時のようなステ
ージ停止時の振動が、ほぼ吸収される.[発明の実施例
】
第1図は、本発明の第1実施例のステージ装置の概略的
な構成を示す模式図である。本実施例のステージ装置は
、投影露光装置に用いるのに好適な位置決め用のXYス
テージで、実際には第2図(a) . (b)に示され
る機構と構戒である。すなわち、X方向にステージ1を
移動する機構、Y方向にステージ2を移動する機構を有
する。また、X方向とY方向2組の可動部材であるバラ
ンサウェイト8〜11は、ステージ1、2の移動に伴な
い基盤3に作用する反力やモーメントを打ち消すため、
ステージ1、2の移動方向や位置に対応させて4個取り
付けられている。しかし、第1図では説明のため、X方
向のステージlの移動と手前側のバランサウェイト11
のみを示す.
ステージ2は、基盤3上の水平面に設定された軌道(ガ
イドレール)上をy方向に移動する.また、ステージ1
は、ステージz上の水平面に設定された軌道上をX方向
に移動する.基盤3は、防振用の弾性体20により床面
45上に設置された装置土台21上に支持されている.
なお、ステージ1、2は、ステージ制御器42からのイ
3号に基いて基盤3上を移動する.また、このときのス
テージ1、2の座標位置は、ステージ1のx1y方向に
沿った側辺に固定された2個のミラーと、基盤3に固定
され、それぞれのミラーにレーザビームを垂直に投射す
る2台の干渉計とで構成される位置検出器40によりモ
ニタされてステージ制御器42にフィードバックされる
。In the stage device according to the present invention, the calculation means calculates the drive conditions of the movable member necessary to offset the force acting on the base when accelerating or decelerating the stage, based on the position and movement state of the stage with respect to the base. calculate. Further, the control means controls the movement of the movable member according to the drive condition calculated by the calculation means. The reaction force or moment generated on the base by this movement of the movable member is controlled in the direction and magnitude to neutralize the reaction force or moment generated on the base due to acceleration or deceleration of the stage. As a result, vibrations of the base caused by acceleration or deceleration of the stage, such as vibrations when the stage stops, such as when positioning is completed in a projection exposure system, are almost completely absorbed. [Embodiments of the Invention] FIG. 1 is a schematic diagram showing a schematic configuration of a stage device according to a first embodiment of the present invention. The stage apparatus of this embodiment is a positioning XY stage suitable for use in a projection exposure apparatus, and is actually shown in FIG. 2(a). The mechanism and precepts are shown in (b). That is, it has a mechanism for moving the stage 1 in the X direction and a mechanism for moving the stage 2 in the Y direction. In addition, the balancer weights 8 to 11, which are two sets of movable members in the X direction and the Y direction, cancel the reaction force and moment acting on the base 3 as the stages 1 and 2 move.
Four of them are attached corresponding to the moving direction and position of stages 1 and 2. However, in FIG. 1, for the sake of explanation, the movement of the stage l in the X direction and the balancer weight 11 on the front side are shown.
Only shown. The stage 2 moves in the y direction on a track (guide rail) set on a horizontal plane on the base 3. Also, stage 1
moves in the X direction on a trajectory set on the horizontal plane above stage z. The base 3 is supported on a device base 21 installed on a floor surface 45 by an elastic body 20 for vibration isolation.
Note that stages 1 and 2 move on base 3 based on No. 3 from stage controller 42. In addition, the coordinate positions of stages 1 and 2 at this time are two mirrors fixed to the sides of stage 1 along the The position is monitored by a position detector 40 composed of two interferometers, and fed back to the stage controller 42.
バランサウェイト8〜11は、基盤3の側面に設けられ
た送りネジ12〜15で支持され、バランサ制御器43
からの信号に基いて基盤3に対する相対運all(直線
運動)を行う。なお、バランサウェイト8〜11の質量
は、ステージ1、2の質量に応じて決定される。このた
め、ステージ回りのスペース等を考虜して鉛等の高密度
の材料を適用することが望ましい。The balancer weights 8 to 11 are supported by feed screws 12 to 15 provided on the side surface of the base 3, and are supported by the balancer controller 43.
Relative movement (linear movement) with respect to the base 3 is performed based on signals from. Note that the masses of the balancer weights 8 to 11 are determined according to the masses of the stages 1 and 2. For this reason, it is desirable to consider the space around the stage and use a high-density material such as lead.
演算器41は、位置検出器40からの検出信号に基いて
ステージ制御器42が出力するステージ!、2の位置や
、移動状態(正負の加速度、速度等〉に基いて基盤3に
作用する反力とモーメントとを求め、これに基いて最適
なバランサウエイト8〜11の駆動条件を算出する。こ
の駆動条件に従ってバランサ制御器43は、バランサウ
ェイト8〜11の移動を制御する.
ステージ1、2の移動に伴なって基盤3に作用する反力
は、ステージ1、2の加速度と質量との積で表わされる
慣性力である。厳密には、y方向についてはステージ1
、2の総重量、x方向についてはステージ1のみの重量
を考えれば良い。また、このとき基盤3に作用する回転
力は、ステージ1、2の基ffl3に対する力点と基盤
3の重心との間の距離と上記反力との積で表わされるモ
ーメントである。Arithmetic unit 41 is a stage controller 42 outputs based on a detection signal from position detector 40! , 2 and the movement state (positive and negative acceleration, speed, etc.), the reaction force and moment acting on the base 3 are determined, and based on this, the optimal driving conditions for the balance weights 8 to 11 are calculated. According to this driving condition, the balancer controller 43 controls the movement of the balancer weights 8 to 11. The reaction force acting on the base 3 as the stages 1 and 2 move is the combination of the acceleration and mass of the stages 1 and 2. It is the inertial force expressed as the product.Strictly speaking, in the y direction, stage 1
, 2, and the weight of only stage 1 in the x direction. Further, the rotational force acting on the base 3 at this time is a moment expressed by the product of the distance between the point of force of the stages 1 and 2 on the base ffl3 and the center of gravity of the base 3 and the reaction force.
本実施例において、ステージ1、2の移動により基盤3
に作用するこれらの反力とモーメントとは、バランサウ
ェイト8〜11の移動により基盤3に作用する反力とモ
ーメントとにより同時に打ち消される必要がある.
例えば、ステージ1が、第1図の矢印のようなX方向の
移動を行ったとき、ステージ1の移動とは逆方向に2個
のバランサウェイト9、1lが加速、減速されて反力が
打ち消される。In this embodiment, by moving stages 1 and 2, the base 3
These reaction forces and moments acting on the base plate 3 must be simultaneously canceled by the reaction forces and moments acting on the base 3 due to the movement of the balancer weights 8 to 11. For example, when stage 1 moves in the X direction as shown by the arrow in Figure 1, the two balancer weights 9 and 1l are accelerated and decelerated in the opposite direction to the movement of stage 1, canceling out the reaction force. It will be done.
また同時に、このときのステージl、2の基盤3の重心
に対する位置関係によりバランサウェイト9とバランサ
ウェイト11とに対する加速度の振り分けが決定される
。また、これで不十分な場合は、例えば、バランサウェ
イト8、12を互いに逆方向に移動させる加速度が決定
される。この駆動条件に従ったバランサウェイト8=1
1の移動により前記のモーメントも打ち消される。At the same time, the allocation of acceleration to the balancer weights 9 and 11 is determined based on the positional relationship of the stages 1 and 2 with respect to the center of gravity of the base 3 at this time. If this is insufficient, for example, the accelerations for moving the balancer weights 8 and 12 in opposite directions are determined. Balancer weight 8 = 1 according to this driving condition
The movement of 1 also cancels out the moment.
ただし、投影露光装置の位置決め用XYステジである本
実施例においては、位置決め精度に重大な影響を持つス
テージ1、2停止時の振動発生が最大の問題である。そ
こで、ステージ!、2の減速や停止の際に基盤3に発生
する反力とモーメントとを前述のようにして完全に打ち
消し、それ以外の加速や等速移動の期間を利用してバラ
ンサウエイト8〜1lの原点復帰等の適当なリセットが
行われる.また、演算器41は、位置検出器40からの
位置情報に従ってステージ1、2位置をバランサウェイ
ト8〜11の駆動条件に取り込んでも良いが、本実施例
においては、ステージ1、2移動のプログラム(ステー
ジ1、2を位置決めすべき設計上の目標位置情報を含む
)に従って自動的にバランサウェイト8〜1lの駆動条
件を演算する。However, in this embodiment, which is an XY stage for positioning in a projection exposure apparatus, the biggest problem is the occurrence of vibration when the stages 1 and 2 are stopped, which has a serious effect on positioning accuracy. So, the stage! , completely cancel out the reaction force and moment generated in the base 3 during deceleration and stop of step 2 as described above, and use the other periods of acceleration and constant movement to return to the origin of balance weight 8 to 1l. Appropriate resets such as recovery are performed. Further, the calculator 41 may incorporate the stages 1 and 2 positions into the drive conditions of the balancer weights 8 to 11 according to the position information from the position detector 40, but in this embodiment, the stage 1 and 2 movement program ( (including design target position information for positioning stages 1 and 2), the drive conditions for balancer weights 8 to 1l are automatically calculated.
第1図、第2図のここまでの構成において、1と2とは
、それぞれX方向、Y方向に移動するステージ、4と6
とは、それぞれのステージ1、2の駆動用の送りネジ、
5と7とは、それぞれの送りネジ4、6の駆動用のモー
タである。また、16〜19は、送りネジ12〜15駆
動用のモータである。In the configurations shown in Figures 1 and 2 up to this point, 1 and 2 are stages that move in the X direction and Y direction, respectively, and 4 and 6.
is the feed screw for driving each stage 1 and 2,
5 and 7 are motors for driving the feed screws 4 and 6, respectively. Moreover, 16-19 are motors for driving the feed screws 12-15.
さて、本実施例のXYステージにおいて第3図(a)の
よう&:Xステージ1とYステージ2とが、それぞれ矢
印X,Yの方・向にほぼ同時に移動(加速または減速)
して基盤3に反力Fが作用したとき、バランサウェイト
9、10は、それぞれ矢印Ay,Axの方向に駆動(加
速)される.これにより、バランサウェイト9、10は
、それぞれ基盤3に対しF9、FIOの反力を発生して
反力F3を打ち消す.このときの反力F3、F9、F1
0の関係を第3図(b)に示す.反力F3、F9、FI
Oの合力は零となって基盤3は静止状態を保ち、振動も
発生しない。Now, in the XY stage of this embodiment, as shown in FIG. 3(a), the
When the reaction force F acts on the base 3, the balancer weights 9 and 10 are driven (accelerated) in the directions of arrows Ay and Ax, respectively. As a result, the balancer weights 9 and 10 generate reaction forces F9 and FIO on the base 3, respectively, to cancel out the reaction force F3. Reaction forces F3, F9, F1 at this time
0 relationship is shown in Figure 3(b). Reaction force F3, F9, FI
The resultant force of O becomes zero, and the base 3 remains stationary and no vibration occurs.
以上の作用は、基盤3上のどの位置でステージ1、2の
加減速があってもバランサウエイト8〜11の移動の組
み合せ方、およびそれらの駆動量(加速度)で対応する
ことが可能であり、ステージ1、2の移動中にその加速
度が変化するような場合でも、バランサウェイト8〜1
1の駆動加速度を変化させることにより自在な対応が可
能である.
次に、ステージ1,2の重心が、基盤3に対し第5図(
a)のグラフに示されるような運動を行った場合を例と
して、本実施例におけるバランサウェイト8〜11の制
御アルゴリズムを第6図を参照して説明する。The above action can be handled by combining the movements of the balance weights 8 to 11 and their drive amounts (accelerations) regardless of the acceleration or deceleration of stages 1 and 2 at any position on the base 3. , even if the acceleration of stages 1 and 2 changes while they are moving, balancer weights 8 to 1
By changing the drive acceleration of 1, flexible responses are possible. Next, the center of gravity of stages 1 and 2 is set relative to the base 3 as shown in Figure 5 (
The control algorithm for the balancer weights 8 to 11 in this embodiment will be explained with reference to FIG. 6, taking as an example the case where the movement shown in the graph of a) is performed.
第5図(a)においてステージ1、2の重心は、静止状
態(時刻t=0〉から所定速度v0に達するまで等加速
度運動し、時刻t,で所定速度Voになると,そこから
は等速度運動を続け、その後時刻t2から等加速度運動
な減速を行なって時刻t3で停止する.この加速の期間
と減速の期間とにおけるステージ1、2の重心の加速度
は、第5図(b)のようにそれぞれ±a.で一定である
ものとする。そこで、演算器41はステージ1、2の現
在位置と目標位置とを確認(ステップ100)した後、
ステージ1、2の加速度(ここでは第5図(b)に示し
た加速度マップ〉に基いて、ステージ1、2移動に伴な
い発生する力を算出する(ステップ101)。すなわち
、この加速度a。により基盤3には次式のような反力F
が作用する.F=MXao
M:ステージ1、2質量
(ただし、一方のステージ1のみが移動する場合にはM
:ステージ1質量)
ここで例えば、ステージ!、2の重心の移動方向が、基
盤3の重心上を通る場合、基盤3に作用する反力Fは、
基盤3の重心をステージ1、2の重心移動方向の逆方向
に移動しようとする力であり、基i3を移動平面内で回
転させるモーメントは発生しない.従って、このときの
ステージ1、2の重心移動方向とX軸とのなす角度をθ
とすれば、反力Fを打ち消すためにX軸方向のバランサ
ウエイト9、11とY軸方向のバランサウェイト8、1
0とを駆動することによって基盤3に作用させるべき反
力FxFyは単純に次式で与えられる。In Fig. 5(a), the centers of gravity of stages 1 and 2 move with constant acceleration from a resting state (time t = 0) until they reach a predetermined speed v0, and when they reach a predetermined speed Vo at time t, they move at a constant speed from there. It continues to move, and then decelerates with uniform acceleration from time t2 and stops at time t3.The accelerations of the centers of gravity of stages 1 and 2 during this acceleration period and deceleration period are as shown in Figure 5 (b). are assumed to be constant at ±a., respectively.Therefore, after confirming the current position and target position of stages 1 and 2 (step 100),
Based on the acceleration of stages 1 and 2 (here, the acceleration map shown in FIG. 5(b)), the force generated as the stages 1 and 2 move is calculated (step 101). That is, this acceleration a. Therefore, the reaction force F on the base 3 is given by the following formula
acts. F=MXao M: Stage 1, 2 mass (However, if only one stage 1 moves, M
: Stage 1 mass) Here, for example, stage! , 2 passes over the center of gravity of the base 3, the reaction force F acting on the base 3 is:
This is a force that attempts to move the center of gravity of the base 3 in the opposite direction to the direction of movement of the center of gravity of stages 1 and 2, and no moment is generated that rotates the base i3 within the movement plane. Therefore, at this time, the angle between the moving direction of the center of gravity of stages 1 and 2 and the X axis is θ
Then, in order to cancel the reaction force F, balancer weights 9 and 11 in the X-axis direction and balancer weights 8 and 1 in the Y-axis direction are used.
The reaction force FxFy that should be applied to the base 3 by driving 0 is simply given by the following equation.
X@方向のバランサウェイト9、11
FX =MXa, Xcos θ
Y@方向のバランサウェイト8、10
F, =Mxa o Xs i n θこれに
より、上記反力F,F,およびバランサウェイト8〜1
1の質量に基いて、バランサウエイト8〜l1の駆動条
件、すなわち駆動加速度を決定する(ステップ102)
,この演算結果はバランサ制御器43へ出力される。Balancer weights 9, 11 in X@ direction FX = MXa, Xcos θ Balancer weights 8, 10 in Y@ direction F, = Mxa o Xs in θ As a result, the above reaction forces F, F, and balancer weights 8 to 1
Based on the mass of balance weights 1 to 1, drive conditions of balance weights 8 to 11, that is, drive acceleration are determined (step 102).
, this calculation result is output to the balancer controller 43.
さて、本実施例の制御アルゴリズムでは上記のごとくバ
ランサウェイト8〜11の加速度を決定(ステップ10
2)1,,た後、ステージ1,2の重心移動方向が基盤
3の重心上を通るか否かを判断する(ステップ103)
。この判断の結果、ステージ1、2の重心移動方向が、
基盤3の重心上を通らない場合、基盤3に作用する反力
Fは、基盤3の重心をステージ1、2の重心移動の逆方
向に移動しようとする力であると同時に、基盤3を移動
平面内で回転しようとするモーメントも発生させる。そ
こで、ステージ移動に伴なって基盤3に発生するモーメ
ントを求め(ステップ104)、このモーメントからバ
ランサウェイト8〜11の駆動加速度を駆動条件として
算出する(ステップ105)。そして、このモーメント
を相殺するための駆動条件が、前述の駆動条件に併せて
バランサ制御器43へ出力され(ステップ106)、バ
ランサウェイト8〜11がステージ!、2の加減速とほ
ぼ同時に駆動される(ステップ107),このときの駆
動条件としては、ステージ1、2の重心の位置とは基盤
3の重心点をはさんで対称側のXまたはY軸のバランサ
ウェイト8〜11をステージ1、2の重心の移動方向と
同方向へ加速度を持たせて駆動すれば良い.モーメント
としての作用を打ち消す力は、ステージの移動により発
生するベクトルカをF.、ステージ1、2の重心から基
盤3の重心間の勤径ベクトルをr,とすれば、次式で与
えられる.
r=l F, Ixlr. lxcos θこの
結果、ステージ移動に伴なって基盤3に発生する反力F
およびモーメン1・がキャンセルされることとなって、
基盤3の振動の発生を大幅に低下させることが可能とな
る。Now, in the control algorithm of this embodiment, the accelerations of balancer weights 8 to 11 are determined as described above (step 10).
2) After 1,, it is determined whether the moving direction of the center of gravity of stages 1 and 2 passes over the center of gravity of the base 3 (step 103).
. As a result of this judgment, the direction of movement of the center of gravity of stages 1 and 2 is
If it does not pass over the center of gravity of the base 3, the reaction force F acting on the base 3 is a force that attempts to move the center of gravity of the base 3 in the opposite direction to the movement of the center of gravity of stages 1 and 2, and at the same time moves the center of gravity of the base 3. It also generates a moment that tends to rotate within the plane. Therefore, the moment generated in the base 3 as the stage moves is determined (step 104), and the driving acceleration of the balancer weights 8 to 11 is calculated from this moment as a driving condition (step 105). Then, the drive conditions for canceling this moment are output to the balancer controller 43 in conjunction with the above-mentioned drive conditions (step 106), and the balancer weights 8 to 11 are set to the stage! , 2 are driven almost simultaneously with the acceleration/deceleration of stages 1 and 2 (step 107).The driving conditions at this time are that the center of gravity of stages 1 and 2 is located on the X or Y axis on the symmetric side across the center of gravity of base 3. The balancer weights 8 to 11 may be driven with acceleration in the same direction as the moving direction of the centers of gravity of stages 1 and 2. The force that cancels the action as a moment is the vector force generated by the movement of the stage. , if the radius vector between the centers of gravity of stages 1 and 2 and the center of gravity of base 3 is r, then it is given by the following equation. r=l F, Ixlr. lxcos θ As a result, the reaction force F generated on the base 3 as the stage moves
and Momen 1 have been canceled,
It becomes possible to significantly reduce the occurrence of vibrations in the base 3.
次に、本発明の第2実施例を第4図を参照して説明する
。Next, a second embodiment of the present invention will be described with reference to FIG.
第4図は、本発明の第2実施例における基盤3側面に取
り付けられたパランサウエイト22〜25の構成を示す
斜視図である.ここで、バランサウェイト22〜25以
外の部分は第1実施例と同様の構威である。また、バラ
ンサウェイト23、24は、それぞれバランサウェイト
25、22の反対側の基盤3側面に取り付けられている
。FIG. 4 is a perspective view showing the structure of the parallax weights 22 to 25 attached to the side surface of the base 3 in the second embodiment of the present invention. Here, the parts other than the balancer weights 22 to 25 have the same structure as the first embodiment. Further, the balancer weights 23 and 24 are attached to the side surface of the base 3 opposite to the balancer weights 25 and 22, respectively.
第2実施例において可動部材であるバランサウェイト2
2〜25は、基盤3に回転可能に取り付けられた偏心荷
重である。また、ステージ3の移動に伴なう加速度やモ
ーメントの打ち消しは、この偏心荷重の角運動により行
われる。また、各バランサウェイト22〜25の回転中
心は、X軸、Y軸と平行である。Balancer weight 2 which is a movable member in the second embodiment
2 to 25 are eccentric loads rotatably attached to the base 3. Furthermore, the acceleration and moment accompanying the movement of the stage 3 are canceled out by the angular movement of this eccentric load. Moreover, the rotation center of each balancer weight 22-25 is parallel to the X-axis and the Y-axis.
これらのバランスウェイト22〜25は、第6図のフロ
ーチャート図中におけるバランサウェイト8〜11の加
速度をバランサウェイト22〜25の角加速度に置き替
えたフローに従って制御される.本実施例では、バラン
サウェイトが回転運動するため、1/2回転毎に反力の
発生方向が逆転する.従って、回転方向は一方向社する
だけでも良い。また、このようなバランサウェイトの場
合、基盤3の側辺の上下方向のゆれに対してもそれを抑
えることができる。These balance weights 22 to 25 are controlled according to a flowchart in FIG. 6 in which the accelerations of balancer weights 8 to 11 are replaced with angular accelerations of balancer weights 22 to 25. In this embodiment, since the balancer weight rotates, the direction of reaction force generation is reversed every 1/2 rotation. Therefore, it is sufficient to rotate in only one direction. In addition, in the case of such a balancer weight, it is possible to suppress vertical shaking of the sides of the base plate 3.
以上のように両実施例によれば、ステージ1、2の移動
により発生する基盤3の振動をなくすことができるので
、ステージ1、2の位置決め精度や能率(時間)が向上
する.また、ステージ1、2上にあるものに対する影響
、例えば、ウエハのずれ等を最小限にすることができる
。As described above, according to both embodiments, it is possible to eliminate the vibration of the base 3 caused by the movement of the stages 1 and 2, thereby improving the positioning accuracy and efficiency (time) of the stages 1 and 2. Further, the influence on things on the stages 1 and 2, such as displacement of the wafer, can be minimized.
また、これら両実施例のように可動部材の移動経路を、
可動部材の移動がステージ移動等の装置本来の機能の障
害にならないような位置に設定すれば、ステージ設計の
自由度が増すとともにステージ装置全体の小型化も可能
となる。In addition, as in both of these embodiments, the movement path of the movable member is
By setting the movable member at a position where the movement of the movable member does not interfere with the original functions of the apparatus such as stage movement, the degree of freedom in stage design increases and the overall stage apparatus can be made smaller.
[発明の効果]
本発明に係るステージ装置においては、ステージを加減
速する際に基盤に作用する力を可動部材の移動により相
殺するから、ステージの加速や減速により発生する基盤
の振動、例えば投影露光装置における位置決め完了時の
ようなステージ停止時の振動が、ほぼ吸収される。これ
により、ステージの位置決め精度が向上するととも(、
ステージの移動速度を大きくしてステージ装置の能率を
第1図は、本発明の第1実施例のXYステージの概略な
構成を示す模式図である。[Effects of the Invention] In the stage device according to the present invention, the force acting on the base when accelerating or decelerating the stage is offset by the movement of the movable member, so vibrations of the base caused by acceleration or deceleration of the stage, such as projection Vibration when the stage is stopped, such as when positioning in the exposure apparatus is completed, is almost absorbed. This improves the positioning accuracy of the stage (
FIG. 1 is a schematic diagram showing the general configuration of an XY stage according to a first embodiment of the present invention.
第2図(a)と第2図(b)は,本発明の第1実施例の
XYステージの構成を示す、それぞれ2,4視図と平面
図である。FIGS. 2(a) and 2(b) are a 2nd and 4th perspective view and a plan view, respectively, showing the configuration of the XY stage of the first embodiment of the present invention.
第3図(a)と第3図(b)は、本発明の第1実施例の
XYステージにおける、それぞれ概略な平面図とベクト
ル力の模式図である。FIG. 3(a) and FIG. 3(b) are a schematic plan view and a schematic diagram of vector force, respectively, in the XY stage of the first embodiment of the present invention.
第4図は、本発明の第2実施例のXYステージの構成を
示す斜視図である。FIG. 4 is a perspective view showing the configuration of an XY stage according to a second embodiment of the present invention.
第5図(a) と第5図(b)は、本発明の第1実施例
のXYステージにおけるステージの移動状態を示す、そ
れぞれ速度の経時変化の線図と,加速度の経時変化の線
図である。FIG. 5(a) and FIG. 5(b) are a diagram of a change in velocity over time and a diagram of a change in acceleration over time, respectively, showing the moving state of the stage in the XY stage of the first embodiment of the present invention. It is.
第6図は、本発明の第1実施例のXYステージノ の制御を説明するフローチャート図である。FIG. 6 shows the XY stage node of the first embodiment of the present invention. FIG. 3 is a flowchart diagram illustrating control.
第7図は、従来例のステージ装置の概略な構成を示す模
式図である。FIG. 7 is a schematic diagram showing the general configuration of a conventional stage device.
[主要部分の符号の説明]
1・・・ステージ 3・・・基盤11・・・
バランサウエイト 20・・・弾性体40・・・位置検
出器 41・・・演算器43・・・バランサ制御
器[Explanation of symbols of main parts] 1...Stage 3...Foundation 11...
Balancer weight 20...Elastic body 40...Position detector 41...Calculator 43...Balancer controller
Claims (1)
能なステージを有するステージ装置において、 前記基盤に対して相対移動可能に設けられた所定の質量
を有する複数個の可動部材と、 前記ステージを加減速する際に前記基盤に作用する力を
相殺するために必要な前記可動部材の駆動条件を、前記
基盤に対する前記ステージの位置と移動状態とに基いて
算出する演算手段と、前記可動部材の移動を、算出され
た前記駆動条件に応じて制御する制御手段とを備え、 前記ステージの加減速によって発生する前記基盤の振動
を、前記可動部材の前記移動により減少させるようにし
たことを特徴とするステージ装置。[Scope of Claim] A stage device having a stage provided on a base of a vibration-proof structure and movable two-dimensionally in a horizontal plane, comprising: a plurality of stages having a predetermined mass that are movable relative to the base; a movable member; and a drive condition for the movable member necessary to offset the force acting on the base when accelerating or decelerating the stage is calculated based on the position and movement state of the stage with respect to the base. comprising a calculation means and a control means for controlling the movement of the movable member according to the calculated drive condition, the vibration of the base generated by acceleration and deceleration of the stage being reduced by the movement of the movable member. A stage device characterized in that the stage device is configured to
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1155819A JP2808677B2 (en) | 1989-06-20 | 1989-06-20 | Stage drive method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1155819A JP2808677B2 (en) | 1989-06-20 | 1989-06-20 | Stage drive method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0321894A true JPH0321894A (en) | 1991-01-30 |
| JP2808677B2 JP2808677B2 (en) | 1998-10-08 |
Family
ID=15614177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1155819A Expired - Lifetime JP2808677B2 (en) | 1989-06-20 | 1989-06-20 | Stage drive method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2808677B2 (en) |
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| CN102235459A (en) * | 2010-04-23 | 2011-11-09 | 株式会社日立高新技术仪器 | Reaction absorber and semiconductor assembling system |
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