JPH03219038A - Plate material for electrical conducting parts of electronic and electrical equipment - Google Patents
Plate material for electrical conducting parts of electronic and electrical equipmentInfo
- Publication number
- JPH03219038A JPH03219038A JP1171690A JP1171690A JPH03219038A JP H03219038 A JPH03219038 A JP H03219038A JP 1171690 A JP1171690 A JP 1171690A JP 1171690 A JP1171690 A JP 1171690A JP H03219038 A JPH03219038 A JP H03219038A
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- alloy
- strength
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- plate
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Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は半導体やICのリードフレームあるいはコネ
クタやスイッチなどの導電部品に使用される電子電気機
器導電部品用板材に関し、高い強度、良好な繰返し曲げ
性を有するとともに、良好な電気伝導性、熱伝導性(放
熱性)、耐食性、ボンディング性を有し、しかも安価な
電子・電気機器導電部品用板材に関するものである。[Detailed Description of the Invention] Industrial Application Field The present invention relates to a plate material for conductive parts of electronic and electrical equipment used in lead frames of semiconductors and ICs, or conductive parts such as connectors and switches, and which has high strength and good repeated bendability. The present invention relates to an inexpensive plate material for electrically conductive parts of electronic and electrical equipment, which also has good electrical conductivity, thermal conductivity (heat dissipation), corrosion resistance, and bonding properties.
従来の技術
電子9電気機器に使用される導電部品の代表的なものと
しては、トランジスタなどの個別半導体や1.C,LS
I、SCRに使用されるリードフレームがある。このリ
ードフレームは、代表的には次のような工程を経てIC
や半導体に組込まれる。Conventional Technology Electronics 9 Typical conductive parts used in electrical equipment include individual semiconductors such as transistors and 1. C, L.S.
There is a lead frame used for I.SCR. This lead frame is typically made into an IC through the following process.
and incorporated into semiconductors.
すなわち先ずリードフレーム用材料としての導電材料か
らなる板厚0.1〜0.5間の板材を用意し、その板材
にプレス打抜き加工またはエツチングを施して所要のリ
ードフレーム形状(但しアウターリード側が相互に連な
っているもの)とし、次いでそのリードフレームの所定
箇所に高純度81などからなる半導体素子(Siチップ
)を接合する。That is, first, a plate material made of a conductive material as a lead frame material with a thickness of 0.1 to 0.5 is prepared, and the plate material is press punched or etched to form the desired lead frame shape (however, the outer leads are mutually connected). Then, a semiconductor element (Si chip) made of high purity 81 or the like is bonded to a predetermined location of the lead frame.
この接合は、ダイボンディングと称されるものであって
、Agペースト等の導電樹脂を用いて加圧接着する方法
、あるいは予めリードフレーム素材の片面もしくは半導
体素子(Siチップ)の面に、Au、Ag、Ni等のう
ちの1種の単層または2種以上の多重層からなるメツキ
層を形成しておき、このメツキ層を介し加熱拡散圧着し
てAu−3iなどの共晶反応を利用してリードフレーム
と半導体素子とを接合する方法、さらにはPb−3nは
んだ等を用いて接合する方法などがある。この後、基板
上のリードフレームの所定箇所にダイボンディングされ
た半導体素子(Siチップ)」−のA/電極とリードフ
レームの導体端子(インナーリート)とをAu線もしく
Al線で接続する。この接続はワイヤボンディングと称
されている。引続いて半導体素子、結線部分、および半
導体素子が取付けられた部分のリードフレームを保護す
るために樹脂やセラミック等で封止し、最終的にリード
フレームのアウタリードの相互に連なる部分を切除する
。This bonding is called die bonding, and is performed by pressure bonding using a conductive resin such as Ag paste, or by attaching Au, A plating layer consisting of a single layer or a multilayer of two or more of Ag, Ni, etc. is formed in advance, and the material is heat-diffusion-pressed through this plating layer to utilize the eutectic reaction of Au-3i or the like. There are methods of bonding a lead frame and a semiconductor element using a method such as a method of bonding a lead frame and a semiconductor element, and a method of bonding a lead frame and a semiconductor element using a Pb-3n solder or the like. Thereafter, the A/electrode of the semiconductor element (Si chip) die-bonded to a predetermined location of the lead frame on the substrate and the conductor terminal (inner lead) of the lead frame are connected with an Au wire or an Al wire. This connection is called wire bonding. Subsequently, the semiconductor element, the wiring section, and the portion of the lead frame to which the semiconductor element is attached are sealed with resin, ceramic, or the like to protect them, and finally, the interconnected portions of the outer leads of the lead frame are cut off.
以」二のような工程を経て使用されるリードフレーム用
の板材としては、良好なプレス加工性もしくはエツチン
グ性を有すること、およびワイヤボンディングにおける
接合性すなわちボンディング性が良好であること、さら
には良好な放熱性(熱伝導性)、導電性を有し、しかも
半導体装置の輸送や電子機器への組込みに際しての曲が
りや繰返し曲げによって破損が生じない機械的強度や優
れた耐繰返し曲げ性を有し、また耐食性を有することが
要求される。The plate material for the lead frame used through the following two processes must have good press workability or etching property, and good bondability in wire bonding, and also have good bondability. It has good heat dissipation (thermal conductivity) and electrical conductivity, and also has mechanical strength and excellent repeated bending resistance that will not cause damage due to bending or repeated bending when transporting semiconductor devices or incorporating them into electronic equipment. , it is also required to have corrosion resistance.
従来このようなリードフレーム用板材としては、Fe−
42%Ni合金である42合金、あるいはFe17%C
o−29%Ni合金であるコバール、さらにはCu系合
金のリン青銅(CA 501) 、C11Fe−Zn
−P (CA 194)合金、Cu−FeCo−3n
−P (CA 195)合金等が使用されている。Conventionally, such lead frame plate materials include Fe-
42 alloy which is 42%Ni alloy or Fe17%C
Kovar, which is an o-29% Ni alloy, as well as phosphor bronze (CA 501), which is a Cu-based alloy, and C11Fe-Zn.
-P (CA 194) alloy, Cu-FeCo-3n
-P (CA 195) alloy etc. are used.
発明が解決しようとする課題
従来のリードフレーム用板材として用いられているコバ
ールや42合金はいずれも高価なNiを多量に含有する
ため高価格とならざるを得ず、しかも熱伝導性や耐食性
に劣る問題があった。またCu系合金は繰返し曲げ性が
劣り、また価格的な面でも問題があった。そこでリード
フレーム材で代表される電子・電気機器導電部品の導電
用板材として、これらの部品に要求される諸特性を満足
ししかも安価な材料の開発・実用化が強く望まれている
。Problems to be Solved by the Invention Both Kovar and 42 alloys, which are conventionally used as plate materials for lead frames, are expensive because they contain large amounts of expensive Ni, and they have poor thermal conductivity and corrosion resistance. There was an inferior problem. Further, Cu-based alloys have poor repeatability and are also problematic in terms of cost. Therefore, there is a strong desire to develop and put into practical use a material that satisfies the various characteristics required for these parts and is inexpensive and can be used as a conductive plate material for conductive parts of electronic and electrical equipment such as lead frame materials.
一般に安価な導電材料としてはアルミニウム合金が知ら
れており、アルミニウム合金を用いたリードフレーム用
板材としては、既に特開昭62−96638号や特開昭
62−96644号等に記載のものが提案されている。Aluminum alloy is generally known as an inexpensive conductive material, and lead frame plate materials using aluminum alloy have already been proposed in JP-A-62-96638 and JP-A-62-96644. has been done.
これらのアルミニウム合金では、電気伝導性や放熱性は
比較的良好であるが、従来のリードフレーム用板材であ
る42合金やリン青銅と比較して強度が低く、また繰返
し曲げ性が充分でなく、そこでより強度が高くかつ繰返
し曲げ性に優れたアルミニウム合金基の板材の開発が望
まれている。Although these aluminum alloys have relatively good electrical conductivity and heat dissipation, their strength is lower than that of conventional lead frame plate materials such as 42 alloy and phosphor bronze, and their repeated bendability is insufficient. Therefore, it is desired to develop an aluminum alloy-based plate material that has higher strength and excellent repeated bending properties.
この発明は以」二の事情を背景としてなされたもので、
特に優れた繰返し曲げ性を有するとともに機械的強度も
高く、かつその他の諸特性、すなわちボンディング性や
耐食性も優れ、しかも安価なアルミニウム基合金からな
る電子・電気機器導電部品用板材を提供することを目的
とするものである。This invention was made against the background of the following two circumstances.
It is an object of the present invention to provide a plate material for electrically conductive parts of electronic and electrical equipment made of an inexpensive aluminum-based alloy that has particularly excellent repeated bendability, high mechanical strength, and other properties such as bonding properties and corrosion resistance. This is the purpose.
課題を解決するための手段
本発明者等はアルミニウム基合金について、前述のよう
なリードフレーム等の電子電気機器導電部品に使用され
る板材として必要な特性、特に優れた繰返し曲げ性と高
い強度、良好な耐食性と優れたボンディング性を満足さ
せ得る板材を見出すべく種々実験・検討を重ねた結果、
表層材としてAl−Mg系、A l−Mn系、もしくは
Al−Mg−Mn系のアルミニウ合金を用いかつ芯材と
して高強度のアルミニウム合金を用いた複合板を適用す
ることによって前述の目的を満たすことができることを
見出し、この発明をなすに至ったのである。Means for Solving the Problems The present inventors have developed an aluminum-based alloy that has the characteristics necessary as a plate material used in electrically conductive parts of electronic and electrical equipment such as lead frames as described above, in particular, excellent repeated bendability and high strength. As a result of various experiments and studies in order to find a plate material that satisfies good corrosion resistance and excellent bonding properties,
The above objective is achieved by applying a composite plate that uses Al-Mg-based, Al-Mn-based, or Al-Mg-Mn-based aluminum alloy as the surface layer material and a high-strength aluminum alloy as the core material. They discovered that it is possible to do this and came up with this invention.
具体的には、請求項1の発明の電子電気機器導電部品用
板材は、40kgf /−以上の引張強度を有するアル
ミニウム合金を芯材とし、その芯材の両面に、Mg
11.5〜5.0%とMn0.l−1,5%のうちいず
れか1種または2種を含有するアルミニウム合金からな
る表層材を片面当り IILLI11以上の厚さで接合
したことを特徴とするものである。Specifically, the plate material for electrically conductive parts of electronic and electrical equipment according to the invention of claim 1 has an aluminum alloy having a tensile strength of 40 kgf/- or more as a core material, and Mg on both sides of the core material.
11.5-5.0% and Mn0. It is characterized in that a surface layer material made of an aluminum alloy containing one or two of l-1.5% is bonded to a thickness of IILLI11 or more per side.
また請求項2の発明の電子電気機器導電部品用板材は、
請求項1の発明の材料における芯材のアルミニウム合金
が、へ1−Cu−Mg系合金、すなわちCu 0.5
〜5.0wt%、M g 0.2〜2.9w1%を含
有し、残部がAlおよび不可避的不純物よりなることを
特徴とするものである。Further, the plate material for electrically conductive parts of electronic and electrical equipment according to the invention of claim 2 is as follows:
The aluminum alloy of the core material in the material of the invention of claim 1 is a 1-Cu-Mg alloy, that is, Cu 0.5
~5.0wt%, Mg 0.2~2.9w1%, and the remainder consists of Al and inevitable impurities.
さらに請求項3の発明の電子電気機器導電部品用板材は
、請求項2の発明における芯材のアルミニウム合金が、
Cu、Mgのほか、さらにMnQwf%以下、Croi
vl%以下、Zroivl%以下、V 0.3v1%以
下、Ni5.7w+%以下のうちの1種または2種以上
を含有しているものからなることを特徴とするものであ
る。Furthermore, in the plate material for electrically conductive parts of electronic and electrical equipment according to the invention of claim 3, the aluminum alloy of the core material according to the invention of claim 2 is
In addition to Cu and Mg, MnQwf% or less, Croi
It is characterized by containing one or more of the following: vl% or less, Zroivl% or less, V 0.3v1% or less, and Ni 5.7w+% or less.
さらに請求項4の発明の電子電気機器導電部品用板材は
、請求項1の発明の材料における芯材のアルミニウム合
金が、AJ−Zn−Mg系合金、すなわちZn 2.
0〜?、Ow1%、M g 1. O−3,5w1%
を含有し、残部が、l/および不可避的不純物よりなる
ことを特徴とするものである。Furthermore, in the plate material for electrically conductive parts of electronic and electrical equipment according to the invention of claim 4, the aluminum alloy of the core material in the material of the invention of claim 1 is an AJ-Zn-Mg alloy, that is, Zn2.
0~? , Ow1%, M g 1. O-3,5w1%
, with the remainder consisting of l/ and unavoidable impurities.
また請求項5の発明の電子電気機器導電部品用板材は、
請求項4の発明における芯材のアルミニウム合金が、Z
n、Mgのほか、さらにCu2,5wI%以下、M n
1.0wt%以下、CroJvl%以下、Zr0.
3v1%以下、V 0.3v1%以下、N i 5,
7v1%以下のうちの1種または2種以上を含有してい
るものからなることを特徴とするものである。Further, the plate material for electrically conductive parts of electronic and electrical equipment according to the invention of claim 5 is as follows:
In the invention of claim 4, the aluminum alloy of the core material is Z
In addition to n, Mg, Cu2.5 wI% or less, M n
1.0wt% or less, CroJvl% or less, Zr0.
3v1% or less, V 0.3v1% or less, N i 5,
It is characterized by containing one or more of 7v1% or less.
作 用
この発明の電子電気機器導電部品用板材は複合アルミニ
ウム合金板からなるものであって、基本的には表層材と
してAl−Mg系、Al−Mn系、もしくはAl−Mg
−Mn系の比較的軟質なアルミニウム合金を用いること
によって良好な繰返し曲げ性、優れたボンディング性お
よび耐食性を確保し、かつ芯材として高強度のアルミニ
ウム合金を用いることによって強度を確保している。以
下さらにこれらの各村の作用および厚み等について説明
する。Function The plate material for electrically conductive parts of electronic and electrical equipment of the present invention is made of a composite aluminum alloy plate, and basically contains Al-Mg type, Al-Mn type, or Al-Mg type as the surface layer material.
- By using a relatively soft Mn-based aluminum alloy, good repeated bending properties, excellent bonding properties, and corrosion resistance are ensured, and by using a high-strength aluminum alloy as the core material, strength is ensured. The function, thickness, etc. of each of these villages will be further explained below.
一般に電子電気機器導電部品用板材、例えばリードフレ
ーム用板材では、引張り強さ35kgr/−以」−が要
求され、さらに高い信頼性が求められる場合にはより高
い引張り強さが必要である。そこでこの発明においても
複合板全体として35kgr/−以−にの引張り強さが
要求される。Generally, plate materials for electrically conductive parts of electronic and electrical equipment, such as plate materials for lead frames, are required to have a tensile strength of 35 kgr/- or more, and even higher tensile strength is required when higher reliability is required. Therefore, in this invention as well, the composite plate as a whole is required to have a tensile strength of 35 kgr/- or more.
複合板の強度σは、表層材の強度σf1全厚さに占める
表層材の厚さの割合f1芯材の強度σCによって、次式
により与えられる。The strength σ of the composite plate is given by the following equation, where the strength σf1 of the surface layer material is the ratio of the thickness of the surface layer f1 to the total thickness f1, and the strength σC of the core material.
σ=f・σf+σc (1f)
したがって表層材の厚さは電子電気機器導電部品用板材
として要求される全強度σと、芯材に用いられるアルミ
ニウム合金板の強度σc1および表層材に用いられるア
ルミニウム合金板の強度σfからその厚さ割合が設計さ
れる。σ=f・σf+σc (1f) Therefore, the thickness of the surface layer material is the total strength σ required as a plate material for electrically conductive parts of electronic and electrical equipment, the strength σc1 of the aluminum alloy plate used for the core material, and the aluminum alloy used for the surface layer material. The thickness ratio is designed from the strength σf of the plate.
一方、リードフレーム用板材等では、金線やアルミニウ
ムワイヤとの接着(ワイヤボンディング)を超音波振動
接合で行なうことが多いが、超音波振動接合では硬さの
低い材料はど接合し易く、不良率が少なくなることが本
発明者等の実験により判明している。そこで本発明者等
は既に表層材としてAl純度99.0%以上の軟質な純
Al系の材料を用いることにより、超音波振動接合にお
けるボンディング性を向上させることを特願昭63−3
22925号において提案しているが、この発明では、
ボンディング性を向上させるべく芯材より軟質であって
しかも高強度化に対応させるべく純Al系材料よりも高
強度のAl−Mg系、AlMn系、もしくはAl−Mg
−Mn系アルミニウム合金を表層材として用いている。On the other hand, for plate materials for lead frames, bonding (wire bonding) with gold wire or aluminum wire is often performed by ultrasonic vibration bonding, but with ultrasonic vibration bonding, materials with low hardness are easily bonded, resulting in defects. It has been found through experiments by the present inventors that the ratio decreases. Therefore, the present inventors have already proposed in Japanese Patent Application No. 63-3 that the bonding performance in ultrasonic vibration bonding can be improved by using a soft pure Al-based material with an Al purity of 99.0% or more as the surface layer material.
Although proposed in No. 22925, in this invention,
Al-Mg type, AlMn type, or Al-Mg type material that is softer than the core material to improve bonding properties and has higher strength than pure Al type material to correspond to high strength.
-Mn-based aluminum alloy is used as the surface layer material.
なおこのように超音波振動により接合する場合、ボンデ
ィング性の向上に関係する比較的軟質な表面層は 5μ
m以上あれば充分であり、したがってAl−Mg系、A
l−Mn系、もしくはAl−Mg−Mn系のアルミニウ
ム合金からなる表層材は8μm以上の厚さで設けておけ
ば充分に優れたボンディング性を得ることができる。Note that when bonding is performed using ultrasonic vibration in this way, the relatively soft surface layer that is involved in improving bonding properties has a thickness of 5μ.
m or more is sufficient, therefore Al-Mg system, A
Sufficiently excellent bonding properties can be obtained by providing the surface layer material made of l-Mn-based or Al-Mg-Mn-based aluminum alloy with a thickness of 8 μm or more.
またAl−Mg系、AA’−Mn系、もしくはAl−M
g−Mn系のアルミニウム合金は耐食性が優れており、
したがって両面にこれらの合金系のアルミニウム合金か
らなる表層材を接合することによって、電子電気機器導
電部品用板材として優れた耐食性を得ることができる。Also, Al-Mg system, AA'-Mn system, or Al-M
g-Mn-based aluminum alloys have excellent corrosion resistance,
Therefore, by bonding surface layer materials made of aluminum alloys based on these alloys on both sides, excellent corrosion resistance can be obtained as a plate material for electrically conductive parts of electronic and electrical equipment.
ここで、表層材の厚みが8μm以上では充分な耐食性を
発揮することができる。Here, when the thickness of the surface layer material is 8 μm or more, sufficient corrosion resistance can be exhibited.
さらに表層材として、芯材よりも軟質なA1Mg系、A
l−Mn系、もしくはAl−MgMn系アルミニウム合
金を用いることによって、良好な繰返し曲げ性を得るこ
とができる。これは、表面層が芯材よりも軟かく延性に
優れるために曲げ時における表面のクラックの発生が抑
制されるためである。このような繰返し曲げ性に関して
も、表層材の厚みが8μm以上では充分に良好な特性を
確保することができる。Furthermore, as a surface layer material, A1Mg type, which is softer than the core material,
Good repeat bendability can be obtained by using l-Mn-based or Al-MgMn-based aluminum alloy. This is because the surface layer is softer and more ductile than the core material, which suppresses the occurrence of surface cracks during bending. Regarding such repeated bendability, sufficiently good characteristics can be ensured when the thickness of the surface layer material is 8 μm or more.
一方表層材の厚さ配分としては、次に述べるように片面
最大lO%あれば良く、この場合表層材の最小強度σf
を15kgf/−とし、全厚さに占める表層材の厚さの
割合fを20%とし、複合板全体の強度σとして35
kgr / m4以上を確保するためには、芯材の強度
σ。としては、前述の式から明らかなように40kgf
/−以上とする必要がある。On the other hand, as for the thickness distribution of the surface layer material, it is sufficient to have a maximum of 10% on one side, as described below, and in this case, the minimum strength σf of the surface layer material is
is 15 kgf/-, the ratio f of the thickness of the surface layer to the total thickness is 20%, and the strength σ of the entire composite board is 35
In order to ensure kgr/m4 or more, the strength of the core material σ. As is clear from the above formula, 40kgf
/- or more.
ここで、既に述べたように表層材は片面当りの厚さ 8
μm以上で形成しておくことによって、良好なボンディ
ング性、耐食性、繰返し曲げ性を得ることができるが、
このように絶対厚みとして片面当り 8μs以上であれ
ば、表層材の厚さ配分割合(片面)が10%を越えても
繰返し曲げ性、ボンディング性、耐食性の向上効果はそ
れ以上は余り大きくならない。そればかりでなく、表層
材の厚さ配分割合が片面で10%を越えれば芯材の厚さ
配分割合が少なくなる結果、複合板全体としての強度を
35kgf/−以上に確保するために芯材の強度をさら
に高めなければならないことになり、そのため芯材自体
の延性が低下しやすくなる。したがって表層材の板厚配
分は全体で20%以下とすることが好ましい。Here, as already mentioned, the thickness of the surface material per side is 8
By forming the film with a thickness of μm or more, good bonding properties, corrosion resistance, and repeated bending properties can be obtained.
As described above, if the absolute thickness is 8 μs or more per side, even if the thickness distribution ratio (one side) of the surface layer material exceeds 10%, the effects of improving repeat bendability, bonding performance, and corrosion resistance will not increase much beyond that. Not only that, if the thickness distribution ratio of the surface layer material exceeds 10% on one side, the thickness distribution ratio of the core material will decrease. The strength of the core material must be further increased, and as a result, the ductility of the core material itself tends to decrease. Therefore, it is preferable that the thickness distribution of the surface layer material be 20% or less in total.
芯材としては前述のように40kgF/−以上のものを
用いれば良いが、このような高強度を安価なアルミニウ
ム合金で得るためには、芯材のアルミニウム合金として
は熱処理型アルミニウム合金であるAl−Cu−Mg系
合金もしくはAl−ZnMg系合金を用いることが望ま
しい。芯材としてAl−Cu−Mg系合金を用いるのが
請求項2゜3の発明であり、またAl−Zn−Mg系合
金を用いるのが請求項4.5の発明である。As mentioned above, it is sufficient to use a core material of 40 kgF/- or more, but in order to obtain such high strength with an inexpensive aluminum alloy, the aluminum alloy for the core material should be Al, which is a heat-treated aluminum alloy. It is desirable to use a -Cu-Mg alloy or an Al-ZnMg alloy. The invention according to claim 2.3 uses an Al-Cu-Mg alloy as the core material, and the invention according to claim 4.5 uses an Al-Zn-Mg alloy as the core material.
ここでA / −Cu−M g系合金とは、必須合金成
分として、Cuを0.5%(重量%、以下同じ)以上、
5.0%以下含有し、かつMgを0.2%以上、20%
以下含有するものであり、このような芯材に用いられる
Al−Cu−Mg系合金におけるCu、Mg含有量限定
理由について説明する。Here, the A/-Cu-Mg alloy is one that contains 0.5% (by weight, the same applies hereinafter) or more of Cu as an essential alloy component;
Contains 5.0% or less, and 0.2% or more of Mg, 20%
The reasons for limiting the content of Cu and Mg in the Al-Cu-Mg alloy used for such a core material will be explained below.
Cu:
Cuは強度向上に寄与する元素であるが、Cuが0.5
%未満では強度向上の効果が充分に得られず、一方5.
0%を越えて含有させれば圧延性が低下して圧延が困難
となる。したがってCuは0.5〜50%の範囲内とし
た。Cu: Cu is an element that contributes to improving strength, but when Cu is 0.5
If it is less than 5.%, the effect of improving strength cannot be sufficiently obtained.
If it is contained in an amount exceeding 0%, rolling properties will decrease and rolling will become difficult. Therefore, Cu was set within the range of 0.5 to 50%.
Mg・
MgはCuと共存することにより析出物を形成して強度
向上に寄与する元素であり、リードフレーム等の部品に
用いられる複合材の芯材に必要な強度を与えるに重要で
ある。しかしながら 0.2%未満では強度向上効果が
充分に得られず、一方2.0%を越えて含有させても著
しい強度の向上はなく、しかも圧延性が極端に低下する
。したがってMgは0.2〜2.0%の範囲内とした。Mg/Mg is an element that forms precipitates when coexisting with Cu and contributes to improving strength, and is important for providing the necessary strength to the core material of composite materials used in parts such as lead frames. However, if the content is less than 0.2%, a sufficient strength improvement effect cannot be obtained, and on the other hand, if the content exceeds 2.0%, there is no significant improvement in strength, and moreover, the rolling properties are extremely reduced. Therefore, Mg was set within the range of 0.2 to 2.0%.
一方A/−Zn−Mg系合金とは、必須成分としてZn
2.0%以上、70%以下含有し、かっMgを1.0%
以上、3.5%以下含有するものである。このような芯
材に用いられるAl−ZnMg系合金におけるZn、M
g含有量限定理由を次に説明する。On the other hand, A/-Zn-Mg alloy contains Zn as an essential component.
Contains 2.0% or more and 70% or less, and 1.0% Mg
Above, the content is 3.5% or less. Zn and M in Al-ZnMg alloys used for such core materials.
The reason for limiting the g content will be explained below.
Zn:
2口はMgと共存するこきにより析出物を形成して強度
向上に寄与する元素であり、リードフレーム等の部品に
用いられる複合材の芯材に必要な強度を与えるために重
要である。Znが2.0%未満では強度向上の効果が充
分に得られず、一方7.0%を越えて含有させても著し
い強度の向上はない。したがってZnは2.0〜7.0
%の範囲内とした。Zn: Zn is an element that coexists with Mg to form precipitates and contributes to improving strength, and is important for providing the necessary strength to the core material of composite materials used in parts such as lead frames. . If the Zn content is less than 2.0%, a sufficient strength improvement effect cannot be obtained, and on the other hand, if the Zn content exceeds 7.0%, there is no significant strength improvement. Therefore, Zn is 2.0 to 7.0
It was set within the range of %.
Mg :
MgはZnと共存することにより析出物を形成して強度
向上に寄与する元素であり、リードフレーム等の部品に
用いられる複合材の芯材に必要な強度を与えるに重要で
ある。Mgが1.0%未満では強度向」二効果が充分に
得られず、一方3596を越えて含有させても著しい強
度の向上はなく、圧延性が低下するだけである。したが
ってMgは1.0〜3.5%の範囲内とした。Mg: Mg is an element that forms precipitates when coexisting with Zn and contributes to improving strength, and is important for providing the necessary strength to the core material of composite materials used in parts such as lead frames. If the Mg content is less than 1.0%, sufficient strength-improving effects cannot be obtained, and on the other hand, if the Mg content exceeds 3596, there is no significant improvement in strength, but only the rolling properties are reduced. Therefore, Mg was set within the range of 1.0 to 3.5%.
なおこのAl−Zn−Mg系合金の場合、さらに強度向
上を図るために、2.5%以下のCuを含有させても良
い。Cuが2.5%を越えれば鋳造割れが発生し製造が
困難となるから、Cuを添加する場合のCu添加量は
2.5%以下とする。In the case of this Al-Zn-Mg alloy, 2.5% or less of Cu may be contained in order to further improve the strength. If Cu exceeds 2.5%, casting cracks will occur and manufacturing will be difficult, so when adding Cu, the amount of Cu added should be
2.5% or less.
この発明の電子電気機器導電部品板材の芯材として用い
るアルミニウム基合金は、基本的には上述のようなAl
−Cu−Mg系合金もしくはAlZn−Mg系合金であ
ればリードフレーム等の部品に必要な緒特性を確保でき
るが、さらに耐熱性(耐軟化性)を向上させるために、
上記のAtCu−Mg系合金もしくはA I−Z n
−M g系合金に必要に応じてMn1.0%以下、Cr
0.3%以下、Zr03%以下、vo、3%以下、Ni
5.7%以下のうちの1種または2種以上を添加しても
良い。これらの元素の添加量限定理由は次の通りである
。The aluminum-based alloy used as the core material of the electrically conductive component plate material for electronic and electrical equipment of this invention is basically the above-mentioned Al
-Cu-Mg alloy or AlZn-Mg alloy can ensure the necessary mechanical properties for parts such as lead frames, but in order to further improve heat resistance (softening resistance),
The above AtCu-Mg alloy or A I-Z n
-Mn 1.0% or less, Cr
0.3% or less, Zr03% or less, VO, 3% or less, Ni
One or more of these may be added in an amount of 5.7% or less. The reason for limiting the amount of these elements added is as follows.
Mn:
Mnは溶体化処理時の再結晶粒を微細化し、より一層の
強度向上および耐熱性(耐軟化性)の向上を図るに有効
な元素であるが、 1.f1%を越えて含有させても強
度向上および耐熱性向上の効果は飽和し、また溶体化処
理時の焼入れ感受性を高めて製造が困難となる。したが
ってMnの添加量は1.096以下きした。Mn: Mn is an effective element for refining recrystallized grains during solution treatment and further improving strength and heat resistance (softening resistance). Even if the content exceeds f1%, the effects of improving strength and heat resistance will be saturated, and the quenching sensitivity during solution treatment will increase, making manufacturing difficult. Therefore, the amount of Mn added was 1.096 or less.
Cr:
C「も溶体化処理時の再結晶粒を微細化して、強度およ
び耐熱性を一層向上させるに有効な元素であるが、0.
3%を越えて含有させても強度向上および耐熱性向上の
効果は飽和し、また鋳造時に巨大な化合物を生成し易く
なる。したがってC「の添加量は0.3%以下とした。Cr: C is also an effective element for refining recrystallized grains during solution treatment and further improving strength and heat resistance.
Even if the content exceeds 3%, the effects of improving strength and heat resistance are saturated, and large compounds are likely to be formed during casting. Therefore, the amount of C" added was set to 0.3% or less.
Zr:
Zrも再結晶粒の微細化および強度向上、耐熱性の向」
二に有効な元素であるが、03%を越えて含有させても
強度向上および耐熱性向」−の効果は飽和し、また鋳造
時に巨大な化合物を生成し易くなるから、Zrの添加量
は0.3%以下とした。Zr: Zr also makes recrystallized grains finer, improves strength, and improves heat resistance.
Zr is an effective element for two reasons, but even if it is contained in an amount exceeding 3%, the effects of improving strength and heat resistance will be saturated, and it will also be easier to form huge compounds during casting, so the amount of Zr added is 0. .3% or less.
■=
■も再結晶粒の微細化および強度向上、耐熱性の向」:
に有効な元素であるが、0.3%を越えて含有されても
強度向上および耐熱性向上の効果は飽和し、また鋳造時
に巨大化合物を生成し易くなるから、■の添加量は0.
3%以下とした。■= ■Also improves recrystallized grain size, improves strength, and heat resistance.
However, even if it is contained in an amount exceeding 0.3%, the effects of improving strength and heat resistance will be saturated, and giant compounds will be likely to be formed during casting, so the addition amount of (2) should be 0.
It was set to 3% or less.
Ni:
Niも再結晶粒の微細化および強度向上、耐熱性向上に
有効な元素であるが、5.7%を越えて多量に含有させ
ても強度向上および耐熱性向上の効果は飽和し、また鋳
造時に巨大な化合物を生成し易くなるから、Niの添加
量は 5.7%以下とした。Ni: Ni is also an effective element for refining recrystallized grains, improving strength, and improving heat resistance, but even if it is contained in a large amount exceeding 5.7%, the effects of improving strength and heat resistance are saturated; Furthermore, since giant compounds are likely to be formed during casting, the amount of Ni added was set at 5.7% or less.
なお芯材のA I −Cu −M g系もしくはAtZ
n−Mg系合金における不可避的不鈍物としてはFe、
Siが含有されるのが通常であるが、これらのFe量、
Si量が多くなれば晶出物サイズが大きくなって繰返し
曲げ性が低下するから、Feは0.50%程度以下、S
iは0.30%程度以下とすることが望ましく、より好
適にはFeは030%以下、Siは015%以下とする
ことが望ましい。Note that the core material is A I - Cu - M g type or AtZ
Unavoidable dull materials in n-Mg alloys include Fe,
Usually, Si is contained, but the amount of Fe in these
If the amount of Si increases, the size of crystallized substances will increase and the repeated bendability will decrease, so Fe should be about 0.50% or less, S
It is desirable for i to be approximately 0.30% or less, more preferably for Fe to be 0.30% or less, and for Si to be 0.15% or less.
そのほか、アルミニウム合金鋳塊の製造においては、一
般に鋳塊結晶粒の微細化のためにTi1またはTiおよ
びBを添加することが多いが、この発明の板材の芯材と
して用いるアルミニウム合金の場合もTi1またはTi
およびBが添加されていても特にリードフレーム材等の
電子電気機器導電部品材料として支障はない。但しその
添加量は、Ti 0.296以下、B 0.N 9
6以下が望ましい。In addition, in the production of aluminum alloy ingots, generally Ti1 or Ti and B are often added to refine the ingot crystal grains, but in the case of the aluminum alloy used as the core material of the plate material of this invention, Ti1 or Ti
Even if B and B are added, there is no particular problem as a material for electrically conductive parts of electronic and electrical equipment such as lead frame materials. However, the amount of addition is as follows: Ti: 0.296 or less, B: 0. N9
6 or less is desirable.
またAl−Cu−Mg系もしくはAl−ZnMg系合金
のようにMgを含有するA1合金の鋳造にあたっては、
溶湯の酸化を防止したりあるいは圧延性を改善する目的
でBeを必要に応じて添加することがあるが、この発明
の板材の芯材のアルミニウム合金の場合もReを必要に
応じて50ppm程度以下添加することができる。In addition, when casting A1 alloys containing Mg such as Al-Cu-Mg or Al-ZnMg-based alloys,
Be may be added as necessary for the purpose of preventing oxidation of the molten metal or improving rollability, but in the case of the aluminum alloy of the core material of the plate material of this invention, Re may be added to about 50 ppm or less as necessary. Can be added.
一方、表層材のアルミニウム合金としては、Mg 0
.5〜5.Of1%、M n 0.I〜I、 5w1
%のうちいずれか1種または2種を含むアルミニウム合
金、すなわちAl−Mg系合金、A l−Mn系合金、
もしくはAl、−Mg−Mn系合金を用いる。On the other hand, as the aluminum alloy for the surface layer material, Mg 0
.. 5-5. Of1%, M n 0. I~I, 5w1
Aluminum alloy containing any one or two of %, i.e. Al-Mg alloy, Al-Mn alloy,
Alternatively, an Al or -Mg-Mn alloy is used.
ここでMg、Mnはいずれも強度向上に寄与する元素で
あり、Mg添加の場合Mg@が0.5w1%未満では強
度向上への寄与が少なく、またMn添加の場合Mn量が
0.1w1%未満では強度向−1−への寄与が少ない。Here, Mg and Mn are both elements that contribute to strength improvement, and in the case of Mg addition, if Mg@ is less than 0.5w1%, the contribution to strength improvement is small, and in the case of Mn addition, the Mn amount is 0.1w1%. If it is less than that, there is little contribution to the strength direction -1-.
一方Mg量が5.0wt%を越えれば芯材とのクラッド
が困難となるとともに、繰返し曲げ性が低下する。また
M n Itが1.5wt96を越えれば強度向上の効
果が飽和するばかりでなく、繰返し曲げ性が低下する。On the other hand, if the Mg content exceeds 5.0 wt%, cladding with the core material becomes difficult and the repeatability of bending decreases. Moreover, if M n It exceeds 1.5wt96, not only the effect of improving strength is saturated, but also the repeated bendability decreases.
したがってMg量は0.5〜5,9w1%、Mn量は0
.1〜1.5w1%の範囲内とした。なおMgとMnの
両者を含む場合、Mglが0.5〜5.Ov1%の範囲
内であればMntは0wt%未満でも支障なく、またM
n量が0.1〜1.5v1%の範囲内であればMg量は
0.5wt96未満でも支障はない。Therefore, the Mg amount is 0.5-5.9w1%, and the Mn amount is 0.
.. It was set within the range of 1 to 1.5w1%. In addition, when both Mg and Mn are included, Mgl is 0.5 to 5. As long as it is within the Ov1% range, there is no problem even if Mnt is less than 0wt%, and Mnt
If the n amount is within the range of 0.1 to 1.5v1%, there is no problem even if the Mg amount is less than 0.5wt96.
表層材のアルミニウム合金における上記のMg。The above Mg in the aluminum alloy of the surface layer material.
Mnのほかは基本的にはAlおよび不可避的不純物とす
れば良いが、そのほか強度向上や繰返し曲げ性向上のた
めに必要に応じてCrLGO5〜0.25196を添加
しても良く、その場合でもボンディング性等の特性は特
に損なわれるものではない。また不可避的不純物として
はFe、Si、Cu。In addition to Mn, basically Al and other unavoidable impurities may be used, but CrLGO5 to 0.25196 may be added as necessary to improve strength and repeat bendability. Characteristics such as gender are not particularly impaired. In addition, unavoidable impurities include Fe, Si, and Cu.
Zn等が含まれるが、F e 0.5Qv1%以下、S
i0.30W1%以下、Cu 0.30v1%以下、Z
n 0.30W1%以下であれば特にボンディング性
や繰返し曲げ性に悪影響を及ぼすことはない。さらに、
芯材に関して既に述べたように、Mgを含有するアルミ
ニウム合金の鋳造にあたっては溶湯の酸化防止や圧延性
の改善を目的として微量のBeを添加することがあるが
、この発明で用いている表層材のアルミニウム合金にお
いても、Mgを含有する系の場合は、Beを必要に応じ
て50p、■以下添加しても良い。さらに、表層材のア
ルミニウム合金についても、芯材と同様に鋳塊結晶粒微
細化のために0.2%以下のT1を添加したり、あるい
は02%以下のT1と0.04%以下のBとを添加した
りしても良い。Contains Zn, etc., but F e 0.5Qv1% or less, S
i0.30W1% or less, Cu 0.30v1% or less, Z
If n is 0.30W1% or less, there will be no particular adverse effect on bonding properties or repeated bending properties. moreover,
As already mentioned regarding the core material, when casting Mg-containing aluminum alloys, a small amount of Be is sometimes added for the purpose of preventing oxidation of the molten metal and improving rollability, but the surface material used in this invention In the case of an Mg-containing aluminum alloy, Be may be added in an amount of 50p or less if necessary. Furthermore, for the aluminum alloy of the surface layer material, as with the core material, 0.2% or less T1 is added to refine the ingot crystal grains, or 0.2% or less T1 and 0.04% or less B You may also add.
次にこの発明の電子電気機器導電部品用板材の好ましい
製造方法について説明する。Next, a preferred method of manufacturing the plate material for electrically conductive parts of electronic and electrical equipment of the present invention will be described.
この発明の電子電気機器導電部品用板材を製造するにあ
たっては、基本的には前述の芯材の両面に前述の表層材
が接合されてなる複合材の圧延板を、440〜530℃
で溶体化処理して、冷却速度℃/ sec以上で冷却し
、その後の冷間加工の加工率を0〜50%として片面当
り 8μm以上の厚さの表層材を有する最終板厚の板材
を得るか、あるいはその最終板厚の板材に対して、さら
に100〜220℃で最終熱処理を施すことが望ましい
。In manufacturing the plate material for electrically conductive parts of electronic and electrical equipment of the present invention, basically, a rolled plate of a composite material made of the above-mentioned core material and the above-mentioned surface layer material bonded to both sides is heated to 440 to 530°C.
Solution treatment is performed at a cooling rate of ℃/sec or higher, and the processing rate of the subsequent cold working is set to 0 to 50% to obtain a plate material with a final thickness having a surface layer material with a thickness of 8 μm or more per side. It is desirable to further perform a final heat treatment at 100 to 220° C. to the plate material having the final thickness.
以下にさらに具体的な製造方法を説明する。A more specific manufacturing method will be explained below.
芯材と表層材の接合は一般の方法によって行なえば良く
、特に限定されるものではないが、通常は熱間圧延また
は温間圧延あるいは冷間圧延によってクラッドすれば良
い。クラッドした複合材に対しては必要に応じてさらに
圧延を行なって圧延板中間体とした後、溶体化処理−焼
入れを行なう。The core material and the surface material may be joined by a general method, and is not particularly limited, but cladding may normally be performed by hot rolling, warm rolling, or cold rolling. The clad composite material is further rolled as necessary to form a rolled plate intermediate, and then subjected to solution treatment and quenching.
この溶体化処理−焼入れは強度を増すために必要な工程
である。このように溶体化処理−焼入れを行なった後、
θ〜5096の冷間加工率で所定の製品板厚の圧延板と
する。すなわち冷間加工を施さないか、また施しても5
0%以下の小さい加工率とする。なお一般的には板厚O
1〜 1.2箭程変で製品板厚となる。This solution treatment and quenching is a necessary step to increase strength. After solution treatment and quenching in this way,
A rolled plate having a predetermined product thickness is obtained at a cold working rate of θ to 5096. In other words, whether cold working is not performed or even if cold working is performed, 5
The processing rate should be small, below 0%. In general, the plate thickness O
Product board thickness varies by 1 to 1.2 degrees.
ここで、複合材圧延板中間体に対する溶体化処理−焼入
れにおける条件としては、溶体化温度と焼入れ時の冷却
速度が重要である。すなわち、溶体化処理−焼入れは、
芯材のアルミニウム合金に対して時効硬化性を与えるべ
く、芯材合金のMgCu、Zn等の元素を予め固溶させ
ておくためのものであり、溶体化処理温度はA7!−C
u−Mg系、Al−Zn−Mg系のいずれにおいても
440〜530℃の範囲内の温度とする必要がある。溶
体化処理温度が440℃未満では、その後の時効硬化性
、加工硬化性が低下して充分な強度が得られなくなる。Here, as conditions for the solution treatment and quenching of the composite rolled plate intermediate, the solution temperature and the cooling rate during quenching are important. In other words, solution treatment-quenching is
In order to give age hardenability to the aluminum alloy of the core material, elements such as MgCu and Zn of the core material alloy are dissolved in solid solution in advance, and the solution treatment temperature is A7! -C
In both u-Mg system and Al-Zn-Mg system
It is necessary to set the temperature within the range of 440 to 530°C. If the solution treatment temperature is less than 440° C., the subsequent age hardenability and work hardenability will deteriorate, making it impossible to obtain sufficient strength.
一方溶体化処理温度が530℃を越えれば、共晶溶融が
発生して好ましくない。なおAlCu−Mg系合金では
4!10〜530℃、Al−ZnMg系合金では 4
40〜500℃が好ましい。また溶体化処理温度での保
持時間は板1’Fによって異なるが、1鴫以下の板厚で
あれば、40分以内の保持で充分である。溶体化処理温
度で保持後の冷却(焼入れ)は、 1℃/see以上の
冷却速度とする。On the other hand, if the solution treatment temperature exceeds 530°C, eutectic melting will occur, which is undesirable. For AlCu-Mg alloy, the temperature is 4!10~530℃, and for Al-ZnMg alloy, it is 4.
40-500°C is preferred. Further, the holding time at the solution treatment temperature varies depending on the plate 1'F, but if the plate thickness is 1 mm or less, holding for 40 minutes or less is sufficient. Cooling (quenching) after holding at the solution treatment temperature is performed at a cooling rate of 1°C/see or higher.
冷却速度が1℃/sec未満では時効硬化が少なく、ま
た同時に加工硬化性も低くなって、充分な強度が得られ
なくなるから、 1℃/see以上の冷却速度とする必
要がある。なおコイル状の複合材圧延板中間体に対して
この溶体化処理を行なう場合は連続焼鈍炉を用いるのが
通常であるが、連続焼鈍の場合は保持時間が短かくても
冷却速度が1℃/式以上であれば、その後の時効硬化性
、加工硬化性が著しく損なわれることはない。If the cooling rate is less than 1°C/sec, age hardening will be low and work hardening will also be low, making it impossible to obtain sufficient strength, so it is necessary to set the cooling rate to 1°C/see or higher. Note that when performing this solution treatment on a coil-shaped composite rolled plate intermediate, a continuous annealing furnace is normally used, but in the case of continuous annealing, the cooling rate is 1°C even if the holding time is short. / or more, the subsequent age hardenability and work hardenability will not be significantly impaired.
このように溶体化処理、焼入れを行なった後には、その
まま製品板としても良いが、必要に応じて、強度を増す
ためあるいは焼入れ時の歪を矯正するため、冷間圧延や
レベリング等の冷間加工を行なうことができる。但し、
冷間加工を過剰に行なえば曲げ性が低下するから、溶体
化処理、焼入れ後の冷間加工率は0〜50%の範囲内と
する必要がある。After solution treatment and quenching, it may be used as a product sheet as is, but if necessary, cold rolling or leveling may be applied to increase the strength or correct distortion during quenching. Can be processed. however,
Excessive cold working will reduce bendability, so the cold working ratio after solution treatment and quenching must be within the range of 0 to 50%.
最終圧延板の強度については、従来の42合金やCu系
合金のリードフレーム等の電子電気機器導電部品用板材
と同等以上の性能を得るためには引張強さで35kgf
/−以上、繰返し曲げ3回置]二が必要であるが、以上
のような方法によるアルミニウム基合金複合板の場合、
強度および繰返し曲げ性ともに充分にその値を満足する
ことができ、また充分な耐食性、ボンディング性を得る
ことができる。Regarding the strength of the final rolled plate, the tensile strength is 35kgf in order to obtain performance equivalent to or higher than that of conventional 42 alloy or Cu-based alloy plate materials for electrically conductive parts of electronic and electrical equipment such as lead frames.
/- or more, repeated bending 3 times] 2 is required, but in the case of an aluminum-based alloy composite plate made by the above method,
It is possible to sufficiently satisfy the values for both strength and repeated bending property, and also to obtain sufficient corrosion resistance and bonding properties.
なお繰返し曲げ性をさらに向上させるために、」二連の
ような 0〜50%の冷間加工率で最終板厚とした後に
100〜220℃で最終焼鈍を行なってら良い。最終
焼鈍温度が100℃未満では、延性の向上が少ないから
、繰返し曲げ性が余り向上せず、方220℃を越える温
度では、延性は向上して繰返し曲げ性も向上するが、強
度は低下してしまい、また温度によっては過時効となっ
て繰返し曲げ性が逆に低下してしまうこともある。した
がって最終焼鈍は 100〜220℃の範囲内で行なう
必要がある。In order to further improve the repeat bendability, it is preferable to perform final annealing at 100 to 220° C. after the final plate thickness is achieved with a cold working rate of 0 to 50%, such as in a double series. If the final annealing temperature is less than 100°C, the improvement in ductility is small, and the repeat bendability is not improved much. If the final annealing temperature is over 220°C, the ductility and repeat bendability are improved, but the strength is decreased. Moreover, depending on the temperature, over-aging may occur and the repeated bendability may deteriorate. Therefore, the final annealing must be performed within the range of 100 to 220°C.
実 施 例
第1表に示す成分組成の合金NQI〜Na9を第3表中
の複合材符号a−wに示すように種々組合せて熱間圧延
によりクラッドし、板厚3 m (7) W合材熱間圧
延板を得た。なお表層材は芯材の両面に同じ厚さでクラ
ッドした。3?j(合材熱間圧延板について、−次冷間
圧延を施して0.30〜0.75+s厚の圧延板中間体
とし、さらに溶体化処理、焼入れを行なった後、冷間加
工を行ない(一部は冷間加工せず)、その後一部につい
ては最終焼鈍を行ない、最終的に0.3θ間厚の複合材
圧延板とした。熱間圧延後の詳細な製造条件を第2表に
示す。Examples Alloys NQI to Na9 having the compositions shown in Table 1 were clad in various combinations by hot rolling as shown in the composite material codes aw in Table 3, and the plate thickness was 3 m (7) W composite. A hot rolled sheet was obtained. The surface material was clad with the same thickness on both sides of the core material. 3? j (A hot rolled composite plate is subjected to -second cold rolling to obtain a rolled plate intermediate with a thickness of 0.30 to 0.75+s, and then subjected to solution treatment and quenching, and then cold worked ( Some parts were not cold worked), and then some were subjected to final annealing, resulting in a composite rolled plate with a thickness of 0.3θ.Detailed manufacturing conditions after hot rolling are shown in Table 2. show.
得られた各複合材圧延板について、引張り強さ、繰返し
曲げ性、ボンディング性、耐食性を調べた結果を第3表
に示す。また第3表中には表層材の厚さ(片面)も示す
。Table 3 shows the results of examining the tensile strength, repeated bending properties, bonding properties, and corrosion resistance of each composite rolled plate obtained. Table 3 also shows the thickness of the surface layer material (one side).
ここで引張り試験は溶体化処理後室温で7回間放置して
から行なった。なお最終焼鈍がある場合は、溶体化処理
後室温で7日間放置してから最終焼鈍を行なって引張り
試験を実施した。Here, the tensile test was conducted after being left at room temperature for 7 times after solution treatment. In addition, when there was a final annealing, the final annealing was performed after being left at room temperature for 7 days after the solution treatment, and the tensile test was performed.
また繰返し曲げ性は906曲げの回数で評価した。Moreover, the repeated bendability was evaluated by the number of times of 906 bends.
但し 08〜90°に曲げた時に1回とし、90°から
08に戻した時も1回と数えた。この繰返し曲げ回数は
3回以上あれば実用上充分である。However, bending from 08° to 90° was counted as one time, and bending from 90° to 08° was also counted as one time. It is practically sufficient if the number of times of repeated bending is three or more times.
さらにボンディング性は市販のボンダーを用い、銀メツ
キなしでアルミニウム表面に超音波併用熱圧着方式によ
り 200℃でボンディングさせ、ボンディング強度で
評価した。すなわちボンディング強度8g以上を○とし
、5g以上8g未満を△、5g未満を×とした。Furthermore, bonding properties were evaluated by bonding to an aluminum surface without silver plating at 200° C. using a thermocompression bonding method combined with ultrasonic waves using a commercially available bonder, and the bonding strength was evaluated. That is, bonding strength of 8 g or more was rated as ○, bonding strength of 5 g or more and less than 8 g was rated as Δ, and bonding strength of less than 5 g was rated as ×.
また耐食性は塩水噴霧試験を行なって評価した。Corrosion resistance was also evaluated by conducting a salt spray test.
発明の効果
この発明の電子電気機器導電部品用板材は、高い強度を
膏するとともに繰返し曲げ性に優れ、しかも良好な耐食
性、良好なボンディング性を備えている。したがってこ
れらの特性が要求されるICS′l!、導体のリードフ
レーム材やスイッチ、コネクタ等の電子電気機器導電部
品用の板材として最適である。なお特にリードフレーム
においてワイヤボンディングをAl線で行なう場合にこ
の発明の板材をリードフレームとして使用すれば、半導
体素子取付部およびワイヤ接続部に金メツキや銀メツキ
等を施す必要がなく、そのままでワイヤボンディングが
可能となり、半導体素子!2造のコス1−をさらに下げ
るこ吉ができるというメリットもある。ADVANTAGEOUS EFFECTS OF THE INVENTION The plate material for electrically conductive parts of electronic and electrical equipment of the present invention has high strength and excellent repeat bendability, as well as good corrosion resistance and bonding properties. Therefore, these characteristics are required for ICS′l! It is ideal as a lead frame material for conductors and a plate material for electrically conductive parts of electronic and electrical equipment such as switches and connectors. In particular, if the plate material of the present invention is used as a lead frame when wire bonding is performed using Al wire in a lead frame, there is no need to apply gold plating, silver plating, etc. to the semiconductor element mounting part and the wire connection part, and the wire can be bonded as is. Bonding is now possible for semiconductor devices! There is also the benefit of being able to make Kokichi, which further lowers the cost of 2-zo.
Claims (5)
ルミニウム合金板を芯材とし、その芯材の両面に、Mg
0.5〜5.0wt%とMn0.1〜1.5wt%のう
ち1種または2種を含むアルミニウム合金からなる表層
材を片面当り8μm以上の厚さで接合したことを特徴と
する電子電気機器導電部品用板材。(1) An aluminum alloy plate with a tensile strength of 40 kgf/mm^2 or more is used as a core material, and both sides of the core material are coated with Mg
An electronic device characterized by having a surface layer material made of an aluminum alloy containing one or two of 0.5 to 5.0 wt% Mn and 0.1 to 1.5 wt% Mn bonded to a thickness of 8 μm or more per side. Board material for equipment conductive parts.
.0wt%、Mg0.2〜2.0wt%を含有し、残部
がAlおよび不可避的不純物よりなる請求項1記載の電
子電気機器導電部品用板材。(2) The aluminum alloy of the core material is Cu0.5-5
.. 2. The plate material for electrically conductive parts of electronic and electrical equipment according to claim 1, which contains 0 wt% of Mg and 0.2 to 2.0 wt% of Mg, with the remainder consisting of Al and unavoidable impurities.
.0wt%、Mg0.2〜2.0wt%を含有し、さら
にMn1.0wt%以下、Cr0.3wt%以下、Zr
0.3wt%以下、V0.3wt%以下、Ni5.7w
t%以下のうちの1種または2種以上を含有し、残部が
Alおよび不可避的不純物よりなる請求項1記載の電子
電気機器導電部品用板材。(3) The aluminum alloy of the core material is Cu0.5-5
.. 0 wt%, Mg 0.2 to 2.0 wt%, and further contains Mn 1.0 wt% or less, Cr 0.3 wt% or less, Zr
0.3wt% or less, V0.3wt% or less, Ni5.7w
2. The plate material for electrically conductive parts of electronic and electrical equipment according to claim 1, which contains one or more of t% or less, with the remainder consisting of Al and unavoidable impurities.
.0wt%、Mg1.0〜3.5wt%を含有し、残部
がAlおよび不可避的不純物よりなる請求項1記載の電
子電気機器導電部品用板材。(4) The aluminum alloy of the core material is Zn2.0-7
.. 2. The plate material for electrically conductive parts of electronic and electrical equipment according to claim 1, which contains 0 wt% and 1.0 to 3.5 wt% of Mg, with the remainder consisting of Al and unavoidable impurities.
.0wt%、Mg1.0〜3.5wt%を含有し、さら
にCu2.5wt%以下、Mn1.0wt%以下、Cr
0.3wt%以下、Zr0.3wt%以下、V0.3w
t%以下、Ni5.7wt%以下のうちの1種または2
種以上を含有し、残部がAlおよび不可避的不純物より
なる請求項1記載の電子電気機器導電部品用板材。(5) The aluminum alloy of the core material has Zn2.0 to 7
.. 0wt%, Mg1.0 to 3.5wt%, and further contains Cu2.5wt% or less, Mn1.0wt% or less, Cr
0.3wt% or less, Zr0.3wt% or less, V0.3w
t% or less, one or two of Ni5.7wt% or less
2. The plate material for electrically conductive parts of electronic and electrical equipment according to claim 1, wherein the plate material contains Al or more and the remainder consists of Al and unavoidable impurities.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1171690A JPH0788552B2 (en) | 1990-01-23 | 1990-01-23 | Plate material for conductive parts of electronic and electrical equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1171690A JPH0788552B2 (en) | 1990-01-23 | 1990-01-23 | Plate material for conductive parts of electronic and electrical equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03219038A true JPH03219038A (en) | 1991-09-26 |
| JPH0788552B2 JPH0788552B2 (en) | 1995-09-27 |
Family
ID=11785768
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1171690A Expired - Lifetime JPH0788552B2 (en) | 1990-01-23 | 1990-01-23 | Plate material for conductive parts of electronic and electrical equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0788552B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015166407A1 (en) * | 2014-04-28 | 2015-11-05 | Ennio Corrado | Electrical connector comprising a contact element of an aluminium based alloy |
| CN118979180A (en) * | 2024-10-16 | 2024-11-19 | 中铝材料应用研究院有限公司 | Aluminum alloy bar and its preparation method and application |
-
1990
- 1990-01-23 JP JP1171690A patent/JPH0788552B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015166407A1 (en) * | 2014-04-28 | 2015-11-05 | Ennio Corrado | Electrical connector comprising a contact element of an aluminium based alloy |
| CN118979180A (en) * | 2024-10-16 | 2024-11-19 | 中铝材料应用研究院有限公司 | Aluminum alloy bar and its preparation method and application |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0788552B2 (en) | 1995-09-27 |
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