JPH0375346A - Production of high strength and high conductivity type metallic sheet for lead frame - Google Patents
Production of high strength and high conductivity type metallic sheet for lead frameInfo
- Publication number
- JPH0375346A JPH0375346A JP21003389A JP21003389A JPH0375346A JP H0375346 A JPH0375346 A JP H0375346A JP 21003389 A JP21003389 A JP 21003389A JP 21003389 A JP21003389 A JP 21003389A JP H0375346 A JPH0375346 A JP H0375346A
- Authority
- JP
- Japan
- Prior art keywords
- strength
- lead frame
- weight
- bonding
- conductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Continuous Casting (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、強度と熱放散性(熱放散性は導電性とほぼ等
価、従って以下導電性と略す)のバランスに優れたリー
ドフレーム用金属板、または金、銀メッキを省略して金
、銅線のワイヤーボンドを行う技術(以下ベアボンドと
略す)を可能にする低コストIC,LSI用リードフレ
ーム用金属板、その他トランジスタ、コンデンサなど高
強度・高導電型リードフレーム用金属板の製造方法に関
する。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a metal for lead frames that has an excellent balance of strength and heat dissipation (heat dissipation is almost equivalent to conductivity, therefore, hereinafter abbreviated as conductivity). Metal plates for lead frames for low-cost ICs and LSIs, other high-strength transistors, capacitors, etc. that enable wire bonding of gold and copper wires without plate or gold or silver plating (hereinafter referred to as bare bond). -Relating to a method of manufacturing a metal plate for a highly conductive lead frame.
IC,LSIなどの高強度・高導電型のリードフレーム
用金属としてはCu−0,15重量%Cr−0,35重
量%Zr系;Cu−0,60重量%Fe−0,20重量
%P−0,05重量%Mg系;Cu−0,12重量%5
n−O,SO重量%Cr系;Cu−0,12重量%5n
−0,80重量%Cr系;Cu−0,55重量%Cr−
0,25重量%Zr系;Cu−0,02重量%5n−0
,80重量%Cr系;Cu−^1□03内部酸化合金な
どが、高強度と高導電型として、なかでもCu−Cr−
Zr系ではベアボンド用としても開発されているが、合
金元素添加ならびに製造工程増などによるコスト上昇や
、溶解・精練が難しい合金元素を添加することの制約な
どの問題があり、さらに強度向上のために二次加工率を
大きくとるため異方性が大きく今日の表面実装型のQF
P (リードが四方に存在するフレーム)パッケージな
どでは使えない問題があり、価格と特性を含めて満足す
る銅き金は開発されていない。Metals for high-strength, high-conductivity type lead frames such as IC and LSI are Cu-0.15% by weight Cr-0.35% by weight Zr; Cu-0.60% by weight Fe-0.20% by weight P. -0.05% by weight Mg system; Cu-0.12% by weight5
n-O, SO wt% Cr system; Cu-0,12 wt% 5n
-0.80 wt% Cr system; Cu-0.55 wt% Cr-
0.25% by weight Zr-based; Cu-0.02% by weight 5n-0
, 80% by weight Cr system; Cu-^1□03 internal oxidation alloy etc. have high strength and high conductivity, especially Cu-Cr-
Zr-based materials have also been developed for bare bonding, but there are problems such as increased costs due to the addition of alloying elements and increased manufacturing processes, and restrictions on adding alloying elements that are difficult to melt and refine. Today's surface-mount QFs have a large anisotropy due to the high secondary processing rate.
There are problems in that it cannot be used in P (frames with leads on all sides) packages, and no copper-plated metal has been developed that satisfies both price and characteristics.
本発明はこれらの先行技術の問題点を急冷凝固鋳造法と
微量添加元素の組合せにより、優れた強度と高導電性の
バランスならびにベアボンド性に優れた信頼性と低コス
ト化を実現したCuき金リードフレーム用金属板の製造
方法を提供するものである。The present invention solves the problems of these prior art techniques by combining a rapid solidification casting method and trace additive elements to create a Cu-plated metal that achieves an excellent balance between strength and high conductivity, as well as reliability with excellent bare bonding properties and low cost. A method of manufacturing a metal plate for lead frames is provided.
すなわち、本発明の特徴とするところは重量%でOを0
.005〜0.05%、Zrを0.1〜0.3%含有し
、さらにTiまたはCrの少なくとも一方を含有して、
Zr、Ti、Crの合計が0.5〜1.0%の範囲に規
制した残部がCuおよび不可避的不純物である溶融金属
を該溶融金属が完全凝固するまで100℃/秒以上の表
面冷却速度により鋳造し、次いで冷間圧延、熱処理の工
程をそれぞれ1回以上行うことによりまた、前記最終冷
間圧延または熱処理後にさらにCuメッキを施すことに
より高強度・高導電型リードフレーム用の金属板を製造
する方法にある。That is, the feature of the present invention is that O is 0% by weight.
.. 005 to 0.05%, Zr 0.1 to 0.3%, and further contains at least one of Ti or Cr,
Surface cooling rate of 100° C./second or more until the molten metal completely solidifies, with the total of Zr, Ti, and Cr being regulated to a range of 0.5 to 1.0% and the remainder being Cu and inevitable impurities. A metal plate for a high-strength, high-conductivity type lead frame can be obtained by casting, then performing the steps of cold rolling and heat treatment one or more times, and further applying Cu plating after the final cold rolling or heat treatment. It's in the manufacturing method.
以下、本発明の構成要件の限定理由を説明する。 The reasons for limiting the constituent elements of the present invention will be explained below.
合金の化学組成の限定理由は以下の通りである。The reason for limiting the chemical composition of the alloy is as follows.
本発明においては、先ず急冷凝固冷却時に最も酸化物を
形成し易いZrの微小酸化物を母相に整合歪(母相に酸
化物、析出物などが存在する場合、連続した結晶格子が
少しずれた状態のときその界面で発生する界面歪)を持
たせた状態で存在させて母相を強化し、さらにその後の
時効に相当する処理で酸素と結合して残った固溶Zr、
Ti、Crを微細に析出させて整合歪を持たせ、強化に
用いた酸化物、析出物の全体積を最小限にして強度を得
ることで高強度と高導電性を同時に可能にしている。In the present invention, first, micro oxides of Zr, which are most likely to form oxides, are subjected to matching strain to the matrix during rapid solidification and cooling (if oxides, precipitates, etc. are present in the matrix, the continuous crystal lattice is slightly shifted). The solid solution Zr that remains after bonding with oxygen in the subsequent treatment equivalent to aging is strengthened by making it exist in a state with an interfacial strain that occurs at the interface when the Zr is in a state of
Ti and Cr are finely precipitated to give consistent strain, and the total volume of oxides and precipitates used for strengthening is minimized to obtain strength, making it possible to simultaneously achieve high strength and high conductivity.
ここにおいて全0量を0.005〜0.05重量%に限
定するのは、0.005重量%未満はZr酸化物の一次
強化への効果が不十分なため下限を0.005重量%と
し、0.05重量%超ではZr酸化物が粗大化して加工
性、ベアボンド性を劣化させるため上限を0゜05重量
%とじた。The reason why the total zero content is limited to 0.005 to 0.05% by weight is that if it is less than 0.005% by weight, the effect of Zr oxide on primary strengthening is insufficient, so the lower limit is set to 0.005% by weight. If the content exceeds 0.05% by weight, the Zr oxide becomes coarse and deteriorates workability and bare bonding properties, so the upper limit was set at 0.05% by weight.
つぎに、Zr、Ti、Crのき針台有量を0.5〜1.
0重量%の範囲とするのは次の理由による。Next, adjust the amount of Zr, Ti, and Cr from 0.5 to 1.
The reason why the content is in the range of 0% by weight is as follows.
第1図はZr、Ti、Crの合計含有量と該金属板の強
度(kg/mm2)及び全伸び(%〉の関係を示すが、
図示の如く、強度と全伸びは全く逆の特性を示し、両特
性の最適範囲は上記成分合計量の0.5〜1.0重量%
の範囲内にある。Figure 1 shows the relationship between the total content of Zr, Ti, and Cr and the strength (kg/mm2) and total elongation (%) of the metal plate.
As shown in the figure, strength and total elongation exhibit completely opposite properties, and the optimum range for both properties is 0.5 to 1.0% by weight of the total amount of the above components.
is within the range of
又、第2図は上記成分合計量と当該金属板の導電率(%
IACS)及びベアボンド評点の関係を示し、両特性の
最適範囲は上記成分合計量の0.5〜1.0重量%の範
囲内にある。In addition, Figure 2 shows the total amount of the above components and the electrical conductivity (%) of the metal plate.
IACS) and bare bond ratings, and the optimum range for both properties is within the range of 0.5 to 1.0% by weight of the total amount of the above components.
すなわち、上記成分合計量の0.5重量%未満では当該
金属板に形成される酸化物と析出物の総体積が不十分で
必要な強度が得られず、また、1.0重量%を超えた量
では加工性、ベアボンド性および導電性を大きく劣化さ
せるからである。また上記Zrは本発明の主要構成元素
であり、その含有量が0.1重量%以下ではZr酸化物
による強化とCuとZrの化合物強化併用に対して不十
分であり、また0、3重量%超ではZrの価格からくる
コスト上昇になるので、Z「の含有成分を0.1〜0.
3重量%の範囲に限定した。That is, if the total amount of the above components is less than 0.5% by weight, the total volume of oxides and precipitates formed on the metal plate will be insufficient and the necessary strength will not be obtained, and if it exceeds 1.0% by weight. This is because if the amount is too much, workability, bare bonding properties, and electrical conductivity will be significantly deteriorated. Furthermore, the above Zr is a main constituent element of the present invention, and if its content is 0.1% by weight or less, it is insufficient for reinforcement by Zr oxide and reinforcement by a compound of Cu and Zr. If it exceeds 0.1%, the cost will increase due to the price of Zr.
It was limited to a range of 3% by weight.
それ以外は原料および溶製時に不可避的に混入される不
純物とする。The rest are raw materials and impurities that are inevitably mixed in during melting.
該溶融金属が完全凝固するまでの表面冷却速度を100
℃/秒以上とするのは、Z「酸化物が100℃/秒未満
の冷却速度では目的とする強度を得るための微細なサイ
ズと整合歪が得られないことや、酸化物の均一な分布が
得られにくくなるからである。The surface cooling rate until the molten metal completely solidifies is 100%.
The reason for setting the cooling rate to ℃/sec or higher is that if the oxide cooling rate is less than 100℃/sec, it will not be possible to obtain the fine size and consistent strain needed to obtain the desired strength, and the uniform distribution of the oxide will not be achieved. This is because it becomes difficult to obtain.
本発明では双ロール法などの急冷凝固的手法によって鋳
造するものであり、か)る方法により上記効果以外に組
織の細粒化ならびZr、Ti、Crの過飽和固溶度向上
による時効後の強度への効果が得られ、また工程省略、
歩留り向上などのコストメリットも大きい。In the present invention, casting is performed by a rapid solidification method such as a twin roll method, and in addition to the above-mentioned effects, this method also improves the strength after aging by making the structure finer and improving the supersaturated solid solubility of Zr, Ti, and Cr. It is possible to obtain the effect of
There are also significant cost benefits such as improved yield.
また、鋳造後は冷間圧延、熱処理を行う、冷間圧延はリ
ードフレームに必要な板厚を得るのが主目的であるが、
−次の冷間圧延の圧延率は化学組成、鋳造厚みと二次冷
間圧延圧下率の組合わせにより、目的とする板厚、強度
・加工性が得られるように選択される。その効果的な圧
延率の範囲は30〜,95%である。In addition, after casting, cold rolling and heat treatment are performed.The main purpose of cold rolling is to obtain the necessary plate thickness for the lead frame.
- The rolling rate of the next cold rolling is selected based on the combination of chemical composition, casting thickness, and secondary cold rolling reduction rate so that the desired plate thickness, strength, and workability can be obtained. The effective rolling reduction range is 30-95%.
焼鈍を目的とした熱処理は加工性を向上させることを目
的とするが、必要によって焼鈍検定後室温近傍までの冷
却を制御することで時効を目的とした熱処理も兼ねるこ
とが可能である。またこの時の熱処理温度は回復型また
は再結晶型焼鈍により区別されるが両方含む温度範囲と
して300〜700℃が適正である。さらに熱・電気伝
導性を一段と向上させるために時効処理を行う場合もあ
り、その条件は化学組成と前工程条件により適性な処理
温度を選定すべきである。すなわち、上記温度が低温過
ぎると析出物の周りに大きな歪を生じて導電性を劣下さ
せ、また加熱時間が長くなるため設備・製造能率に対す
る制約になる。また高温過ぎると析出量が少なくなって
良好な導電性が得られず、析出物が粗大化して強度確保
上不利になる。The purpose of heat treatment for annealing is to improve workability, but if necessary, it can also serve as heat treatment for aging by controlling cooling to near room temperature after annealing test. Further, the heat treatment temperature at this time is classified into recovery type annealing and recrystallization type annealing, and a temperature range of 300 to 700°C is appropriate as a temperature range that includes both. Furthermore, aging treatment may be performed to further improve thermal and electrical conductivity, and the appropriate treatment temperature should be selected depending on the chemical composition and pre-process conditions. That is, if the above-mentioned temperature is too low, a large strain is generated around the precipitate, deteriorating the conductivity, and the heating time becomes longer, which limits the equipment and manufacturing efficiency. On the other hand, if the temperature is too high, the amount of precipitates decreases and good conductivity cannot be obtained, and the precipitates become coarse, which is disadvantageous in terms of ensuring strength.
従って時効処理は350〜650℃の温度範囲が適正条
件となる。また、必要に応じて二次冷間圧延を行うこと
は板の形状、表面粗度、および強度確保などに有効であ
り、パッケージの要求特性に合わせて付加する。Therefore, the temperature range of 350 to 650°C is the appropriate condition for aging treatment. Further, performing secondary cold rolling as necessary is effective for ensuring the shape, surface roughness, and strength of the plate, and is added in accordance with the required characteristics of the package.
またベアボンドを行う場合、最終冷延または熱処理後に
Cuメッキを施すことにより、Cuメッキ表面をメッキ
直後のままで維持して、純Cu表面を付与することでワ
イヤーボンディングの信頼性を一層高めるものである。In addition, when performing bare bonding, by applying Cu plating after the final cold rolling or heat treatment, the Cu plating surface is maintained as it was immediately after plating, and by providing a pure Cu surface, the reliability of wire bonding is further improved. be.
実施例1゜
第1表に本発明の成分範囲の合金A〜E、比較の成分範
囲の比較材F−Jの化学組成を示す。Example 1 Table 1 shows the chemical compositions of alloys A to E in the composition range of the present invention and comparative materials F-J in the comparative composition range.
第1表(重量%)
(1*Epli$発明の成分範囲外を示す第2表には得
られた合金の材質特性示す。ここで試料番号1〜10は
双ロール鋳造機を用いて、2.8X 102℃/秒の表
面冷却速度で板厚2.On+輪に、試料番号11は本発
明外の10℃/秒の冷却速度で板厚10.5mmに薄ス
ラブ連続鋳造機により鋳造したものである。Table 1 (wt%) (1*Epli$ Table 2, which shows components outside the invention range, shows the material properties of the obtained alloys. Here, sample numbers 1 to 10 are .8X A plate thickness of 2.On+ ring was cast with a surface cooling rate of 102°C/sec, and sample number 11 was cast with a thin slab continuous casting machine to a plate thickness of 10.5mm at a cooling rate of 10°C/sec, which is outside the present invention. It is.
酸洗後−次冷間圧延として板厚1.0問まで圧延し、5
00℃で1時間の中間焼鈍を行い、さらに板厚0.25
+^晴まで圧延した。次に、加工性付与のため最終焼鈍
を550℃で3時間行い、該温度より100℃まで、5
0℃/時間の冷却速度で冷却したのち、二次冷間圧延を
30%施した。After pickling, the plate was rolled to a thickness of 1.0 mm as the next cold rolling.
Intermediate annealing was performed at 00℃ for 1 hour, and the plate thickness was further reduced to 0.25℃.
+^Rolled until clear skies. Next, final annealing was performed at 550°C for 3 hours to impart workability, and from this temperature to 100°C, 5
After cooling at a cooling rate of 0° C./hour, secondary cold rolling was performed by 30%.
特性評価として、引張強さ・全伸びはJIS 13号B
試験片により、導電率は4端子法で評価された。As for property evaluation, tensile strength and total elongation are JIS No. 13 B.
The electrical conductivity of the test piece was evaluated using the four-terminal method.
また価格指標は代表的高強度・高導電型材料の価格に対
して60%以下を本発明の目的を達成したこととして○
印として、それ以上を×印として示した。In addition, the price index is 60% or less of the price of typical high-strength, high-conductivity materials.
The values above are shown as x marks.
ここで試料番号6はO含有量、試料番号8はZr、Ti
、Crの総合有量が成分限定以下の場合で有り、強度が
低い、また試料番号7は0含有量、試料番号9はZr、
Ti、Crの総合有量が成分限定範囲以上の場合であり
全卵びおよび導電率が低い、試料番号10はZrが成分
限定範囲以上で価格が高い。また試料番号11は前述の
如く、表面冷却速度が本発明の範囲外の場合で強度が低
く、本発明の特性が優れていることは明らがである。Here, sample number 6 is O content, sample number 8 is Zr, Ti
, the total amount of Cr is below the component limit, and the strength is low. Also, sample number 7 has 0 content, sample number 9 has Zr,
Sample No. 10, in which the total amount of Ti and Cr is above the component limited range and has low overall density and conductivity, has Zr above the component limited range and is expensive. Further, as mentioned above, sample No. 11 has a surface cooling rate outside the range of the present invention and has low strength, so it is clear that the properties of the present invention are excellent.
第2表
実施例2゜
第3表には、実施例1で加工・熱処理した第1表のA、
C,E、Gおよび■の試料を用いてベアボンド性を評価
した。その条件は上記コイルを25.64mmの幅にス
リットしてDIP−16Pin用に、パンチングして試
料によってはCuメッキを3μm、Agメッキ5μmを
施してS1チツプをダイボンディングした後に25μm
の金線を用いて雰囲気超音波熱圧着法によりワイヤーボ
ンドを行った。ボンディング条件は雰囲気10μm2
N2リードフレーム温度195℃、ファーストボンデ
ィング圧50B、セカンドボンディング圧90gで実施
した。Table 2 Example 2゜Table 3 shows A of Table 1 processed and heat treated in Example 1,
Bare bond properties were evaluated using samples C, E, G and ■. The conditions were to slit the above coil to a width of 25.64 mm, punch it for DIP-16Pin, apply Cu plating to 3 μm depending on the sample, apply 5 μm Ag plating, and die bond the S1 chip to 25 μm.
Wire bonding was performed using atmospheric ultrasonic thermocompression bonding using gold wire. Bonding conditions are atmosphere 10μm2
The N2 lead frame temperature was 195°C, the first bonding pressure was 50B, and the second bonding pressure was 90g.
接合性の評価はプルテスターにてボンディング強度を測
定し、さらにボンディングしたリードフレームをエポキ
シ樹脂でモールドして、130℃でプレッシャークツカ
ーに200時間、12V印加で保定して断線および短絡
の確立を測定した。この結果より本発明の材料でメッキ
を施さない場合でも、リードフレームの接合性はAgメ
ッキを施した場合に比較しても何ら遜色がなかった。Bonding strength was evaluated by measuring the bonding strength with a pull tester, and then molding the bonded lead frame with epoxy resin and holding it in a pressure cooker at 130°C for 200 hours with 12V applied to check for disconnections and short circuits. It was measured. From this result, even when the material of the present invention was not plated, the bondability of the lead frame was comparable to that when Ag plating was applied.
第3表
実施例3゜
第4表には、実施例2と同様に実施例1で加工・熱処理
した第1表のA、C,E、Gおよび■の試料を用いてベ
アボンド性を評価した。その条件は上記コイルを25.
64mn+幅にスリットしてDIP−16P i n用
に、パンチングして試料によってはCu、メッキを3μ
+a 、Agメッキ5μ悄を施してSiチップをダイボ
ンディングした後に25μm(F)銅線を用いて雰囲気
超音波熱圧着法によりワイヤーボンドを行った。ボンデ
ィング条件は雰囲気10%H2N2 リードフレーム温
度195℃、ファーストボンディング圧50g、セカン
ドボンディング圧90gで実施した。接合性の評価条件
も実施gA2同様に行った。その結果は銅線においても
本発明の範囲の成分系は通常Agメッキ処理材、無酸素
鋼などと同じようなベアボンド性を有することは明らか
である。Table 3 Example 3 In Table 4, bare bond properties were evaluated using samples A, C, E, G, and ■ in Table 1, which were processed and heat treated in Example 1 in the same manner as Example 2. . The conditions are that the above coil is 25.
Slit to 64mm+width and punched for DIP-16P in. Depending on the sample, Cu and plating may be 3μ.
+a, Ag plating was applied to 5 μm and the Si chip was die-bonded, and then wire bonding was performed using a 25 μm (F) copper wire by an atmospheric ultrasonic thermocompression method. The bonding conditions were an atmosphere of 10% H2N2, a lead frame temperature of 195° C., a first bonding pressure of 50 g, and a second bonding pressure of 90 g. The bondability evaluation conditions were also the same as in Example gA2. The results show that even in copper wire, the component system within the scope of the present invention has bare bonding properties similar to those of ordinary Ag-plated materials, oxygen-free steel, etc.
第4表
〔発明の効果〕
本発明は、従来よりIC,LSI、トランジスタおよび
コンデンサーに用いられてきたリードフレーム用金属板
の強化法に代わり、酸化物・析出物の母相中での全体積
を最小限にして強度向上を図っているため、従来材を上
回る強度と導電性バランスを得ることができ、また母相
が純Cuに近いためベアボンド時に優れた接合信頼性を
有しており、かくて本発明は高強度・高導電型リードフ
レーム用金属板を安価に提供することができる。Table 4 [Effects of the Invention] The present invention replaces the method of strengthening metal plates for lead frames conventionally used in ICs, LSIs, transistors, and capacitors by As we aim to improve strength by minimizing this, we are able to obtain a better balance of strength and conductivity than conventional materials, and since the matrix is close to pure Cu, it has excellent bonding reliability during bare bonding. Thus, the present invention can provide a high-strength, high-conductivity metal plate for lead frames at low cost.
第1図はZr、Ti、Crの合計含有量と強度、加工性
(全伸び)の関係を示す図であり、第2図はZr、Ti
、Crの合計含有量とベアボンド性、導電性の関係を示
す図である。Figure 1 shows the relationship between the total content of Zr, Ti, and Cr, strength, and workability (total elongation), and Figure 2 shows the relationship between the total content of Zr, Ti, and Cr.
, is a diagram showing the relationship between the total content of Cr, bare bonding property, and conductivity.
Claims (1)
1〜0.3%含有し、さらにTiまたはCrの少なくと
も一方を含有して、Zr、Ti、Crの合計が0.5〜
1.0%の範囲に規制した残部がCuおよび不可避的不
純物である溶融金属を該溶融金属が完全凝固するまで1
00℃/秒以上の表面冷却速度により鋳造し、次いで冷
間圧延、熱処理の工程をそれぞれ1回以上行うことを特
徴とする高強度・高導電型リードフレーム用金属板の製
造方法。 2、最終冷間圧延または熱処理後にCuメッキを施すこ
とを特徴とする請求項1記載の高強度・高導電型リード
フレーム用金属板の製造方法。[Claims] 1.0.005 to 0.05% by weight of O and 0.05% by weight of Zr.
1 to 0.3%, further contains at least one of Ti or Cr, and the total of Zr, Ti, and Cr is 0.5 to 0.3%.
The molten metal, the balance of which is regulated to a range of 1.0%, is Cu and inevitable impurities, is heated at 1.0% until the molten metal completely solidifies.
A method for manufacturing a metal plate for a high-strength, high-conductivity lead frame, which comprises casting at a surface cooling rate of 00° C./second or more, followed by cold rolling and heat treatment at least once each. 2. The method of manufacturing a metal plate for a high-strength, high-conductivity lead frame according to claim 1, wherein Cu plating is applied after final cold rolling or heat treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21003389A JPH0699791B2 (en) | 1989-08-16 | 1989-08-16 | Manufacturing method of metal plate for high strength and high conductivity type lead frame |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21003389A JPH0699791B2 (en) | 1989-08-16 | 1989-08-16 | Manufacturing method of metal plate for high strength and high conductivity type lead frame |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0375346A true JPH0375346A (en) | 1991-03-29 |
| JPH0699791B2 JPH0699791B2 (en) | 1994-12-07 |
Family
ID=16582697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21003389A Expired - Lifetime JPH0699791B2 (en) | 1989-08-16 | 1989-08-16 | Manufacturing method of metal plate for high strength and high conductivity type lead frame |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0699791B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010202907A (en) * | 2009-03-02 | 2010-09-16 | Tohoku Univ | Method for manufacturing crystal metal-alloy product using metallic glass or metallic amorphous, and crystal metal-alloy product |
| JP2012162776A (en) * | 2011-02-08 | 2012-08-30 | Dowa Metaltech Kk | Copper alloy plate and method for manufacturing the same |
| KR20170000236U (en) * | 2015-07-08 | 2017-01-18 | (주)상도가구 | Angle shelf frame |
-
1989
- 1989-08-16 JP JP21003389A patent/JPH0699791B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010202907A (en) * | 2009-03-02 | 2010-09-16 | Tohoku Univ | Method for manufacturing crystal metal-alloy product using metallic glass or metallic amorphous, and crystal metal-alloy product |
| JP2012162776A (en) * | 2011-02-08 | 2012-08-30 | Dowa Metaltech Kk | Copper alloy plate and method for manufacturing the same |
| KR20170000236U (en) * | 2015-07-08 | 2017-01-18 | (주)상도가구 | Angle shelf frame |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0699791B2 (en) | 1994-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4567906B2 (en) | Copper alloy plate or strip for electronic and electrical parts and method for producing the same | |
| KR950013290B1 (en) | Materials for Electronic Components | |
| JPS63143230A (en) | Precipitation strengthening high tensile copper alloy having high electrical conductivity | |
| KR950013291B1 (en) | Materials for Electronic Components | |
| JPS61287156A (en) | Blank for lead frame | |
| JP3772319B2 (en) | Copper alloy for lead frame and manufacturing method thereof | |
| JPH0375346A (en) | Production of high strength and high conductivity type metallic sheet for lead frame | |
| JPH0788549B2 (en) | Copper alloy for semiconductor equipment and its manufacturing method | |
| JPS6396239A (en) | Material for electrically conductive parts of electronic and electrical appliance | |
| JPS6320906B2 (en) | ||
| JPH0518892B2 (en) | ||
| JP2673781B2 (en) | Method for producing high strength and high conductivity copper alloy material for electronic equipment | |
| JPH0739623B2 (en) | Method for manufacturing metal plate for high strength lead frame | |
| JPH0696757B2 (en) | Method for producing high-strength, high-conductivity copper alloy with excellent heat resistance and bendability | |
| JP2662209B2 (en) | Copper alloy for electronic equipment with excellent plating adhesion and solder bondability and its manufacturing method | |
| JP2597773B2 (en) | Method for producing high-strength copper alloy with low anisotropy | |
| JPH02129349A (en) | Manufacture of conductive parts material for electronic and electrical equipment | |
| JPH0524216B2 (en) | ||
| JPH0575812B2 (en) | ||
| JPH0572455B2 (en) | ||
| JP2001279348A (en) | Copper alloys for electronic and electrical parts and their strips, profiled strips, and lead frames formed from the plate or profiled strips | |
| JPS63192835A (en) | Lead material for ceramic package | |
| JPH03219038A (en) | Plate material for electrical conducting parts of electronic and electrical equipment | |
| JP3117852B2 (en) | Fe-Cu alloy IC lead frame and method of manufacturing the same | |
| JPS64458B2 (en) |