JPH03219064A - Electronic equipment parts - Google Patents
Electronic equipment partsInfo
- Publication number
- JPH03219064A JPH03219064A JP1399690A JP1399690A JPH03219064A JP H03219064 A JPH03219064 A JP H03219064A JP 1399690 A JP1399690 A JP 1399690A JP 1399690 A JP1399690 A JP 1399690A JP H03219064 A JPH03219064 A JP H03219064A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- nickel
- phosphor bronze
- tin
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電気及び電子機器に使用される表面に錫及び
錫合金めっきなどの金属層を形成した銅合金を基板とす
る電子機器用部品に関するものである。Detailed Description of the Invention [Industrial Field of Application] The present invention relates to parts for electronic devices, which are used in electrical and electronic devices, and which have a copper alloy substrate on which a metal layer such as tin and tin alloy plating is formed on the surface. It is related to.
(従来の技術)
従来より電子機器部品として、導電性及びはんだ付は性
の良い金または錫合金など各種めっき付き鋼合金が使用
されてきたが、電気及び電子機器部品の高密度化並びに
品質の向上から接点としての信頼性に優れた材料が求め
られている。(Prior art) Various plated steel alloys such as gold or tin alloys, which have good conductivity and solderability, have been used as electronic device parts for a long time, but as electric and electronic device parts become denser and quality increases, There is a need for materials with excellent reliability as contacts.
さらに、近年強くなっている低コスト化要求から、高4
:、頼性n、つ低コストの電気及び電子機器部すJ川の
材料が求められている。このため、めっき付き鋼合金に
対しても従来以上の高信頼性及び低コスト化か要求され
ている。Furthermore, due to the demand for lower costs that has become stronger in recent years,
There is a need for materials for electrical and electronic equipment that are reliable, reliable, and low cost. For this reason, galvanized steel alloys are required to have higher reliability and lower cost than ever before.
現在、これらの要求に対応する電子機器用部品としてめ
っき付き鋼合金、中でもつん青銅(Sn3−10.Po
、01−0.5及び残部鋼の外電−I%よりなる合金)
が使用されてきたが、特に近年では様々な諸性質の改善
を目的としてりん青銅中にFe、Cr、Zr、Co、Z
n。Currently, plated steel alloys are used as parts for electronic equipment to meet these demands, especially bronze (Sn3-10.Po).
, 01-0.5 and the balance steel Gaiden-I%)
In particular, in recent years, Fe, Cr, Zr, Co, and Z have been added to phosphor bronze for the purpose of improving various properties.
n.
Si、Mn等を微量添加したりん青銅も広く使用されて
きている。Phosphor bronze to which trace amounts of Si, Mn, etc. are added has also been widely used.
これら鋼合金の接点金属として、利用されている一例を
あげると、産業用コネクタ等では金めつきが主流である
が、民生用コネクタ等では低コスト化の要求から、高価
な金めつきの代りに安価な錫めっきか使用されている。To give an example of how these steel alloys are used as contact metals, gold plating is the mainstream in industrial connectors, etc., but due to the demand for lower costs in consumer connectors, gold plating is used instead of expensive gold plating. Cheap tin plating is used.
錫めっきは金めつきに比較すると信頼性で劣るが、接触
圧を太きくすることにより、安定した接触を得ることが
できる。錫めっきの信頼性を向上させるために、例えば
特開平1−134957号公報に開示されているように
、銅合金の表面に亜鉛を拡散被覆してはんだ付は性を向
トさせている。Although tin plating is less reliable than gold plating, stable contact can be obtained by increasing the contact pressure. In order to improve the reliability of tin plating, as disclosed in, for example, Japanese Unexamined Patent Publication No. 1-134957, zinc is diffused and coated on the surface of a copper alloy to improve solderability.
しかしながら、電気及び電子機器部品へのさらに厳しく
なる高信頼性且つ低コスト化の要求に答えるには、従来
の銅合金では対応できない問題点があった。However, in order to meet the increasingly strict demands for high reliability and low cost for electric and electronic equipment parts, there have been problems that conventional copper alloys cannot meet.
近年、自動車等高温下で使用される場合を想定して、コ
ネクタを始めとする電子機器用部品の信頼性評価の項目
として、耐熱信頼性の重要性が高まっている。In recent years, heat resistance reliability has become increasingly important as an item for reliability evaluation of parts for electronic devices such as connectors, assuming that they will be used under high temperatures such as in automobiles.
現在、耐熱信頼性の評価基準の一つとして、100℃で
1000時間保持後のめっきの密着性を評価する方法が
あるが、従来のりん青銅に錫及び錫合金めっきを施した
基板で、この基準を満足するためには、
(1)銅F地めっきJ’^さを2μm以F施すか、ある
いは
(2)ニッケル下地めっきJ’Jさを0.5μm以]−
施すこと
が必要となる。しかし、前記の方法にはそれぞれ問題点
かあり、銅下地めっきを厚く付けるとめっき加[時間が
増加してコストが高くなり、また、ニッケル下地めっき
はめっき膜が素材に比較して硬いためプレス加工時の鋳
型の摩耗が増加し、鋳ヘリの寿命が短くなる。Currently, one of the evaluation standards for heat resistance reliability is to evaluate the adhesion of plating after being held at 100°C for 1000 hours. In order to satisfy the standards, (1) Copper F base plating with a thickness of 2 μm or less, or (2) Nickel base plating with a J'J thickness of 0.5 μm or less]-
It is necessary to apply However, each of the above methods has its own problems; applying a thick copper base plating increases the plating process time and costs, and nickel base plating has a hard plating film compared to the material, so it is difficult to press. The wear of the mold during machining will increase, and the life of the casting edge will be shortened.
本発明は、館記のような電子機器用部品における接点金
属としての錫及び錫合金めっき付き銅合金の問題点を解
消するために、銅合金基板表面にニッケルを0.01μ
m以−にめっきし、さらにこのニッケルをtす材中に拡
散させることにより、錫めっきの高信頼性■つ低コスト
の電子機器用部品を提供することを目的としている。In order to solve the problems of copper alloys with tin and tin alloy plating as contact metals in electronic equipment parts such as electronic equipment parts, the present invention has developed a method of applying 0.01 μm of nickel to the surface of a copper alloy substrate.
The object of the present invention is to provide low-cost parts for electronic devices with high reliability of tin plating by plating the nickel on the tin material and further diffusing the nickel into the material.
(課題を解決するための手段)
この発明は、りん青銅基板表面に厚さ0.01μm以]
二のニッケルをめっきし、このニッケルをりん青銅基板
中に拡散させたニッケル拡散層、及びこのニッケル拡散
層上に形成した金属層を有することを特徴とする電子機
器用部品に係るものである。(Means for Solving the Problems) This invention provides a method for forming a phosphor bronze substrate with a thickness of 0.01 μm or more on the surface.
The present invention relates to an electronic device component characterized by having a nickel diffusion layer plated with nickel and diffusing the nickel into a phosphor bronze substrate, and a metal layer formed on the nickel diffusion layer.
(作用)
りん青銅基板中にニッケルを拡散させて合金化したので
錫めっきの耐熱信頼性が向上するが、その理由を以下に
説明する。(Function) Since nickel is diffused into the phosphor bronze substrate and alloyed, the heat resistance reliability of tin plating is improved, and the reason for this is explained below.
ニッケルは錫及び錫合金などの金属層の下地めっきとし
て行われた場合、銅合金母材からの元素の錫及び錫合金
中への拡散を防ぐ効果があることが知られているが、ニ
ッケルには、下地めっきのように単独層をつくらなくて
も銅合金中にある濃度以−ト含有されていれば、銅合金
中の添加元素の拡散を抑制する効果を持つ。It is known that when nickel is used as a base plating for metal layers such as tin and tin alloys, it has the effect of preventing elements from diffusing from the copper alloy base material into tin and tin alloys. Even without forming a single layer like base plating, if it is contained in a copper alloy at a certain concentration, it has the effect of suppressing the diffusion of additive elements in the copper alloy.
錫及び錫合金めっき付きりん青銅の耐熱信頼性を阻害す
る要因としては、りん青銅中のP。P in phosphor bronze is a factor that inhibits the heat resistance reliability of phosphor bronze with tin and tin alloy plating.
Fe、Siなどの微量添加元素がめつき層に拡散し、母
材とめつき層の界面に偏析しあるいは、脆弱な化合物を
生成して、lす材とめっき層との剥離を引きおこすため
である。This is because trace amounts of added elements such as Fe and Si diffuse into the plating layer and segregate at the interface between the base material and the plating layer, or form brittle compounds, causing peeling between the lubricant and the plating layer.
Il材の表面にニッケルをめっきし、さらにこのニッケ
ルを)JJ封材中拡散させることにより、Fu材表面の
数ミクロンにニッケルを含有する層か生成され、Iす材
中のP、Fe、Siなどの拡散はこの層により抑制され
、母材とめワき膜界面での偏析及び脆弱な化合物の生成
を防ぎ母材とめっき層の剥離を防ぐ。ニッケルめっき層
は、厚すぎるとめっき層全部を拡散させるのに時間が掛
り、薄すぎると抑制効果がでないため、めっき層はO,
0f−1,0μmの厚さが適している。By plating nickel on the surface of the Il material and further diffusing this nickel into the JJ sealing material, a nickel-containing layer is formed in several microns on the surface of the Fu material, and the P, Fe, and Si in the Il material are This layer suppresses the diffusion of such substances, prevents segregation and the formation of brittle compounds at the interface between the base material and the plating film, and prevents the base material and the plating layer from peeling off. If the nickel plating layer is too thick, it will take time to diffuse the entire plating layer, and if it is too thin, there will be no suppressing effect.
A thickness of 0f-1.0 μm is suitable.
また、tす材表面のニッケル含有層は、ニッケルめワき
層に比較して軟らかく、母材と同程度の硬さなので、プ
レス加工時に鋳型の摩耗を減少させ寿命を長くする。In addition, the nickel-containing layer on the surface of the t-metal material is softer than the nickel plating layer and has a hardness comparable to that of the base material, thereby reducing wear on the mold during press working and extending its life.
りん青銅にNi、Fe、Cr、Zr、Co。Ni, Fe, Cr, Zr, Co on phosphor bronze.
Zn、Si、Mnの内1種以上を0.05〜0.8fi
i%含有させることにより、りん青銅の機械的性質やめ
っき付は性などの諸性質が改善されるので、多くの場合
前記のような徴■元素が添加される。0.05 to 0.8fi of one or more of Zn, Si, and Mn
By adding i%, various properties such as mechanical properties and plating properties of phosphor bronze are improved, so in many cases, the above-mentioned characteristic elements are added.
りん青銅基板ははんだ付は性を良くするため表面に錫及
び錫合金めっきなどの金属層を形成して使用されるが、
錫及び錫合金のめっき層をリフロー処理することにより
めっき層の性質を改善することができる。Phosphor bronze boards are used with a metal layer such as tin or tin alloy plating formed on the surface to improve solderability.
The properties of the plating layer can be improved by subjecting the tin and tin alloy plating layer to reflow treatment.
以下にこの発明を実施例に基づいて説明する。 The present invention will be explained below based on examples.
本発明に係る電子R器用部品は、Sn0.5〜10、P
o、01〜0.5及び残部鋼の各重量%の組成よりなる
りん青銅基板及び航記り/、ff銅基板にNi、Fe、
Cr、Zr、Co、Zn。The electronic R equipment component according to the present invention has Sn0.5 to 10, P
o, a phosphor bronze substrate consisting of a composition of each weight% of 01 to 0.5 and the balance steel /, ff a copper substrate with Ni, Fe,
Cr, Zr, Co, Zn.
Si、Mnの内1種以上を0.05〜0.8重量%含有
させた特殊りん青銅基板の最終焼鈍航にニッケルめっき
を施し、母材の最終焼鈍とニッケルめっきの拡散をかね
て500℃で5時間の加熱処理を施し、さらに仕上圧延
を行し\、最終の錫及び錫合金めフきを施して供試した
。Nickel plating is applied to the final annealing of a special phosphor bronze substrate containing 0.05 to 0.8% by weight of one or more of Si and Mn, and the final annealing of the base material and diffusion of the nickel plating are performed at 500°C. After heat treatment for 5 hours, finish rolling was performed, and the final tin and tin alloy plating was applied.
また、比較用として従来の錫めっき付きりん、+1銅も
合せて供試し、耐熱信頼性試験を実施した。For comparison, conventional tin-plated phosphorus and +1 copper were also tested, and a heat resistance reliability test was conducted.
特殊添加成分及びめっき厚さを変化させた場合の本発明
に係わる実施例に基づいた電子機器用部品と従来の比較
部品について次のような試験条件で試験を実施した。Tests were conducted under the following test conditions on electronic device parts based on examples of the present invention and conventional comparative parts in which special additive components and plating thickness were varied.
(1)耐熱温度:100℃
(2)耐熱時間7500時間及び1000時間(3)剥
離試験=180°密着曲げ
第1表は本発明による電子機器用部品と比較部11′1
との耐熱信頼性を測定した表であり、実施例2〜13ま
でが本発明に係わる電子機器用部品である。(1) Heat resistance temperature: 100°C (2) Heat resistance time 7500 hours and 1000 hours (3) Peel test = 180° close bending Table 1 shows electronic device parts according to the present invention and comparison part 11'1
This is a table in which heat resistance reliability was measured, and Examples 2 to 13 are parts for electronic devices according to the present invention.
実施例2は、りんh銅基板にニッケル0.01μmめっ
き後熱処理した部品であり1000時間の耐熱試験後で
もめっき層の剥離はなかった。Example 2 is a part in which a phosphorous copper substrate was plated with 0.01 μm of nickel and then heat treated, and there was no peeling of the plating layer even after a 1000 hour heat resistance test.
実施例3はZrO,15,1jjt%、実施例5はCr
0916重量%、実施例6はNi0.2重fi%、実施
例7はFed、5重量%、実施例8はSiO,2+’1
lrJ%、実施例9はMnO,3及びC。Example 3 contains ZrO, 15.1jjt%, and Example 5 contains Cr.
0916% by weight, Example 6 is Ni0.2% by weight, Example 7 is Fed, 5% by weight, Example 8 is SiO,2+'1
lrJ%, Example 9 is MnO, 3 and C.
O,2各重量%、実施例12はZn0.25重看%、そ
れぞれ添加した部品であり、すへての部品が1000時
間耐熱試験後もめっき層の剥離はなかった。実施例5及
び実施例11は下地めっきが施されていない部品である
が1000時間耐熱試験後もめっき層の剥離はなかった
。実施例4はニッケル0.5μmめっき後熱処理した部
品であり、実施例10は錫合金を2.0μmはんだ付け
した部品であり、実施例13は錫合金を1、Ol、1m
はんだ付けした後リフロー処理した部品であり、いずれ
の部品も1000時間耐熱試験後もめっき層の剥離はな
かった。In Example 12, 0.25% by weight of Zn was added, respectively, and the plated layer did not peel off even after the 1000-hour heat resistance test. In Examples 5 and 11, the parts were not plated with a base plate, but the plated layer did not peel off even after the 1000-hour heat resistance test. Example 4 is a part heat-treated after plating with 0.5 μm nickel, Example 10 is a part soldered with 2.0 μm tin alloy, and Example 13 is a part soldered with 2.0 μm tin alloy.
These parts were soldered and then reflow-treated, and there was no peeling of the plating layer in any of the parts even after the 1000-hour heat resistance test.
実施例はすべて1000時間耐熱試験後でもR)材とめ
っき層の剥離は発生しなかった。しかし、従来の比較部
品は、銅下地めワき2μm(比較例14)及びニッケル
下地めっき0.5μm(比較例18)を施したものでは
、t ooo時間耐熱試験後でも剥離しなかったが、下
地めっき厚さが前記以下である比較部品はすべて100
0時間耐熱試験後には剥離が発生した。また、ニッケル
めっき後熱処理を行なった部品でもニッケルめっき厚が
0.005μm(比較例1)と薄い場合は、1000時
間耐熱試験後に剥離が発生したので、ニッケル拡散層の
抑制効果を得るためにはニッケルめっき厚が0.01μ
m以上必要である。In all Examples, no peeling occurred between the R) material and the plating layer even after the 1000 hour heat resistance test. However, the conventional comparative parts with a copper undercoating of 2 μm (Comparative Example 14) and a nickel undercoating of 0.5 μm (Comparative Example 18) did not peel off even after the heat resistance test for too many hours. All comparative parts whose base plating thickness is less than the above are 100
Peeling occurred after the 0 hour heat resistance test. In addition, even on parts that were heat-treated after nickel plating, when the nickel plating thickness was as thin as 0.005 μm (Comparative Example 1), peeling occurred after the 1000-hour heat resistance test, so in order to obtain the effect of suppressing the nickel diffusion layer, Nickel plating thickness is 0.01μ
m or more is required.
(発明の効果)
本発明に係わる電子機器用部品は、りん青銅基板表面に
ニッケルをめっきし、さらにこのニッケルを母材中に拡
散させてニッケル拡散層を形成しであるので錫めっきな
どの金属層の耐熱イ3頼性が向上し、自動車部品など高
温下で使用される電子機器用部品にきわめて有効に使用
できる。(Effects of the Invention) The parts for electronic devices according to the present invention are made by plating nickel on the surface of a phosphor bronze substrate and further diffusing this nickel into the base material to form a nickel diffusion layer. The heat resistance and reliability of the layer are improved, making it extremely effective for use in electronic device parts used at high temperatures, such as automobile parts.
Claims (1)
をめっきし、このニッケルをりん青銅基板中に拡散させ
たニッケル拡散層、及びこのニッケル拡散層上に形成し
た金属層を有することを特徴とする電子機器用部品。It is characterized by having a nickel diffusion layer in which the surface of a phosphor bronze substrate is plated with nickel with a thickness of 0.01 μm or more and the nickel is diffused into the phosphor bronze substrate, and a metal layer formed on the nickel diffusion layer. Parts for electronic equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1399690A JPH03219064A (en) | 1990-01-24 | 1990-01-24 | Electronic equipment parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1399690A JPH03219064A (en) | 1990-01-24 | 1990-01-24 | Electronic equipment parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03219064A true JPH03219064A (en) | 1991-09-26 |
Family
ID=11848843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1399690A Pending JPH03219064A (en) | 1990-01-24 | 1990-01-24 | Electronic equipment parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03219064A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6480056A (en) * | 1987-09-21 | 1989-03-24 | Dainippon Printing Co Ltd | Manufacture of conductive material for electronic component |
-
1990
- 1990-01-24 JP JP1399690A patent/JPH03219064A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6480056A (en) * | 1987-09-21 | 1989-03-24 | Dainippon Printing Co Ltd | Manufacture of conductive material for electronic component |
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