JPH03220281A - Base adhesive for electroless plating, printed circuit board using the adhesive, and manufacturing method thereof - Google Patents
Base adhesive for electroless plating, printed circuit board using the adhesive, and manufacturing method thereofInfo
- Publication number
- JPH03220281A JPH03220281A JP2077830A JP7783090A JPH03220281A JP H03220281 A JPH03220281 A JP H03220281A JP 2077830 A JP2077830 A JP 2077830A JP 7783090 A JP7783090 A JP 7783090A JP H03220281 A JPH03220281 A JP H03220281A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- epoxy resin
- adhesive layer
- electroless plating
- synthetic rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Adhesives Or Adhesive Processes (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はプリント回路板の無電解メツキ用下地接着剤、
該接着剤をベースフィルムにコートした接着用フィルム
、並びにこれを用いたプリント回路板に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a base adhesive for electroless plating of printed circuit boards;
The present invention relates to an adhesive film in which a base film is coated with the adhesive, and a printed circuit board using the same.
[従来の技術]
絶縁基材の表面に無電解メツキによって回路を形成した
プリント回路板は、無電解メツキ膜の接着のためにその
下地に接着層が形成されている。[Prior Art] In a printed circuit board in which a circuit is formed on the surface of an insulating base material by electroless plating, an adhesive layer is formed on the base for adhesion of the electroless plating film.
前記接着層の接着剤としては、エポキシ樹脂。The adhesive for the adhesive layer is an epoxy resin.
合成ゴムおよびフェノール樹脂を主成分とするもの(特
公昭45−9843号、特開昭58−57776号、特
開昭59−62683号、特開昭62−248291号
、特開昭63−277772号)、あるいは1合成ゴム
とフェノール樹脂を主成分とするもの(特公昭58−3
0760号。Those whose main components are synthetic rubber and phenolic resin (Japanese Patent Publication Nos. 45-9843, 58-57776, 59-62683, 62-248291, 63-277772) ), or one whose main components are synthetic rubber and phenolic resin (Special Publication Publication No. 1988-3
No. 0760.
特公昭60−5079号、特開昭63−213676号
、特開昭63−213677号)が知られている。Japanese Patent Publication Nos. 60-5079, 63-213676, and 63-213677) are known.
これらの接着剤には、エポキシ樹脂の硬化剤としてイミ
ダゾール類、アミン類、酸無水物、ノボラック型フェノ
ール樹脂等が、また、合成ゴムの加硫剤としてレゾール
型フェノール樹脂、イオウ化合物等が5また、酸化亜鉛
や酸化マグネシウム等の金属酸化物の加硫助剤を配合し
たものが用いられている。These adhesives contain imidazoles, amines, acid anhydrides, novolak-type phenolic resins, etc. as curing agents for epoxy resins, and resol-type phenolic resins, sulfur compounds, etc. as vulcanizing agents for synthetic rubber. , those containing metal oxide vulcanization aids such as zinc oxide and magnesium oxide are used.
これらの接着層は、無電解メツキ膜のビール強度の向上
、半田耐熱性の向上等を図るためにクロム硫酸混液等で
エツチングして、表面の粗化を行ないアンカー効果を付
与している。また、アンカー効果を高めるため炭酸カル
シウム、ケイ酸カルシウム、酸化ケイ素、ジルコニウム
シリケート。These adhesive layers are etched with a chromium sulfuric acid mixture to roughen the surface and provide an anchor effect in order to improve the beer strength and solder heat resistance of the electroless plating film. Also, calcium carbonate, calcium silicate, silicon oxide, zirconium silicate to enhance the anchoring effect.
酸化チタン等の無機フィラーが配合されているものもあ
る。Some contain inorganic fillers such as titanium oxide.
前記接着層は、当該接着剤に溶剤を加え、デイツプ法、
ロールコート法、カーテンコート法等により絶縁基材面
に塗布し、乾燥後、加熱硬化して形成される。The adhesive layer is formed by adding a solvent to the adhesive and applying a dip method,
It is formed by applying it to the surface of an insulating substrate by a roll coating method, curtain coating method, etc., drying it, and then heating and curing it.
[発明が解決しようとする課題]
従来、前記接着剤の硬化には、前記の特開昭62−24
8291号にも記載されている様に150〜200℃で
30〜120分の加熱が必要とされている。[Problems to be Solved by the Invention] Conventionally, the curing of the adhesive has been performed using the method disclosed in Japanese Patent Application Laid-Open No. 62-24.
As described in No. 8291, heating at 150 to 200°C for 30 to 120 minutes is required.
しかし、実際には、150℃、30分ではエポキシ樹脂
は硬化することができても、合成ゴムと、その加硫剤で
あるフェノール樹脂あるいはイオウ化合物との反応には
不十分であり、その結果接着層の絶縁抵抗が低く、また
無電解メツキ時のメツキ膜の析出応力によって接着層が
膨れたり、メツキ膜のビール強度や半田耐熱性が低いと
云う問題がある。このため、前記特開昭62−2482
91号の実施例に記載されている様に、−船釣には16
0℃以上で60分以上の硬化が行なわれているのが実状
である。However, in reality, although epoxy resin can be cured at 150°C for 30 minutes, it is insufficient for the reaction between synthetic rubber and its vulcanizing agent, phenolic resin or sulfur compound. There are problems in that the insulation resistance of the adhesive layer is low, the adhesive layer swells due to the stress deposited in the plating film during electroless plating, and the beer strength and solder heat resistance of the plating film are low. For this reason, the above-mentioned Japanese Patent Application Laid-Open No. 62-2482
As described in the example of No. 91, - 16 for boat fishing.
The reality is that curing is performed at 0° C. or higher for 60 minutes or longer.
ところで、プリント回路板は年々薄型化し、絶縁基材が
紙フエノール板の場合その厚さが0.8〜1mm、ガラ
スエポキシ板の場合では0.5〜1mmのものが要求さ
れている。また、その上に形成される導体回路幅または
導体回路の間隔も0 、1 m m以下の微細回路のも
のが要求されている。このような薄い絶縁基材上に接着
層を形成し、160℃以上で60分以上の硬化を行うと
、絶縁基材に反りやねじれが生じ、無電解メツキの前工
程であるメツキレジスト被覆工程で、レジストインクの
印刷やドライフィルム型レジストの貼付けが、基板の反
りやねじれのためにうまくできない等の問題がある。Incidentally, printed circuit boards are becoming thinner year by year, and when the insulating base material is a paper phenol board, it is required to have a thickness of 0.8 to 1 mm, and in the case of a glass epoxy board, a thickness of 0.5 to 1 mm is required. Further, there is a demand for a fine circuit with a conductor circuit width or an interval between conductor circuits formed thereon of 0.1 mm or less. If an adhesive layer is formed on such a thin insulating base material and cured at 160°C or higher for 60 minutes or more, the insulating base material will warp or twist, causing the plating resist coating process, which is a pre-process of electroless plating. However, there are problems such as printing of resist ink and pasting of dry film resist cannot be performed properly due to warping or twisting of the substrate.
また、紙フエノールを基材とするものにおいては、基材
中の紙が熱劣化し、回路形成後のプレス型抜の際、接近
しているスルーホール間や、ミシン目間にクラックが入
ったり、基板の切断端面が虫食い状になる等の問題があ
る。In addition, with paper phenol as a base material, the paper in the base material deteriorates due to heat, and cracks may appear between adjacent through holes or between perforations during press die cutting after circuit formation. However, there are problems such as the cut end surface of the substrate becomes moth-eaten.
一方、無電解メツキによって形成された導体回路間は高
い絶縁抵抗が要求されるが、従来の接着剤では硬化後の
接着層の絶縁抵抗値が1011〜1013Ω程度であり
、回路間隔が0.1mm以下と云う微細回路をその上に
設ける接着層の絶縁抵抗としては十分とは云い難い。On the other hand, high insulation resistance is required between conductor circuits formed by electroless plating, but with conventional adhesives, the insulation resistance value of the adhesive layer after curing is about 1011 to 1013 Ω, and the circuit spacing is 0.1 mm. It cannot be said that the insulation resistance of the adhesive layer on which the following microcircuits are provided is sufficient.
本発明の目的は、絶縁基材に反りやねじれを与えず、比
較的低温度(150℃付近)で、短時間(30分以内)
で硬化し、かつ、硬化後の絶縁抵抗が高い接着層を与え
る無電解メツキ用の下地接着剤、および該接着剤を用い
たプリント回路板を提供することにある。The purpose of the present invention is to prevent warping or twisting of the insulating base material, and to operate it at a relatively low temperature (around 150°C) in a short period of time (within 30 minutes).
An object of the present invention is to provide a base adhesive for electroless plating that cures with water and provides an adhesive layer with high insulation resistance after curing, and a printed circuit board using the adhesive.
また、該接着剤をベースフィルムにコートした無電解メ
ツキ用下地接着層を与える接着フィルムを提供すること
にある。Another object of the present invention is to provide an adhesive film that provides a base adhesive layer for electroless plating by coating a base film with the adhesive.
[課題を解決するための手段]
上記目的を達成する本発明の要旨は、エポキシ樹脂2金
成ゴム、フェノール樹脂を主成分とし、これに前記エポ
キシ樹脂の硬化剤と、前記合成ゴムとフェノール樹脂と
の反応促進剤として水酸基を有する無機充填材を配合し
たことを特徴とする接着剤にある。[Means for Solving the Problems] The gist of the present invention to achieve the above object is to contain an epoxy resin, a two-metal synthetic rubber, and a phenol resin as main components, a curing agent for the epoxy resin, and a combination of the synthetic rubber and the phenol resin. The adhesive is characterized by containing an inorganic filler having a hydroxyl group as a reaction accelerator.
前記接着剤の主成分であるエポキシ樹脂/合成ゴム/フ
ェノール樹脂の好ましい配合量は、重量比テ(15〜4
0)/(40−60)/(20−40)であり、エポキ
シ樹脂の硬化剤の必要量、とくに光感知性芳香族オニウ
ム塩は前記樹脂成分の合計100重量部に対して0.2
〜5重量部を配合するのがよい。また、水酸基を有する
無機充填材は3〜20重量部配置部るのがよい。The preferred blending amount of the epoxy resin/synthetic rubber/phenol resin, which is the main component of the adhesive, is based on a weight ratio of 15 to 4.
0)/(40-60)/(20-40), and the required amount of the curing agent for the epoxy resin, especially the photosensitive aromatic onium salt, is 0.2 parts by weight per 100 parts by weight of the resin components.
It is preferable to mix up to 5 parts by weight. Further, the amount of the inorganic filler having a hydroxyl group is preferably 3 to 20 parts by weight.
上記本発明の接着剤は、絶縁基材の表面に塗布等によっ
て形成した後、加熱硬化するものであるが、エポキシ樹
脂の硬化剤として光感知性芳香族オニウム塩を用いたも
のは、紫外線照射後加熱することによって硬化させる。The adhesive of the present invention is formed by coating on the surface of an insulating base material and then cured by heating. However, the adhesive using a photosensitive aromatic onium salt as a curing agent for an epoxy resin can be cured by ultraviolet irradiation. It is hardened by post-heating.
上記紫外線の照射量は、波長365nm O,5〜3J
/cm”で十分である。紫外線の照射によって、光感知
性芳香族オニウム塩が分解し、エポキシ樹脂の硬化種で
あるルイス酸を放出し、比較的低温である程度の硬化を
行うことができる。従って、一般の硬化剤よりも硬化時
の熱変形が少なく、接着層形成時の基板等の変形が少な
いと云う効果がある。しかし、紫外線照射だけではエポ
キシ樹脂を完全硬化することはできない。エポキシ樹脂
の完全硬化には熱エネルギーも必要である。The irradiation amount of the above ultraviolet rays is 365 nm wavelength O, 5 to 3 J.
/cm" is sufficient. Upon irradiation with ultraviolet rays, the photosensitive aromatic onium salt decomposes and releases a Lewis acid, which is a curing species of the epoxy resin, and a certain degree of curing can be performed at a relatively low temperature. Therefore, it has the effect of less thermal deformation during curing than general curing agents, and less deformation of the substrate etc. when forming the adhesive layer.However, epoxy resin cannot be completely cured by UV irradiation alone.Epoxy Thermal energy is also required for complete curing of the resin.
紫外線照射装置が赤外線を同時に放出し、該接着層の温
度を135〜150℃に加熱することができるものであ
ればエポキシ樹脂を完全硬化させることができる。なお
、加熱源は赤外線ランプでも、また、通常の加熱炉でも
よい。The epoxy resin can be completely cured if the ultraviolet irradiation device can simultaneously emit infrared rays and heat the adhesive layer to a temperature of 135 to 150°C. Note that the heat source may be an infrared lamp or a normal heating furnace.
前記エポキシ樹脂としては、公知のエポキシ樹脂が用い
られるが、エポキシ当量が450〜2100 g /
a qのビスフェノールA型エポキシ樹脂が好ましい。As the epoxy resin, a known epoxy resin is used, and the epoxy equivalent is 450 to 2100 g /
A q bisphenol A type epoxy resin is preferred.
水酸基を有する無機充填材は、合成ゴムとフェノール樹
脂の反応を促進して、135〜150℃。The inorganic filler having hydroxyl groups promotes the reaction between the synthetic rubber and the phenolic resin at 135-150°C.
20〜30分の加熱で十分に硬化し、絶縁抵抗の高い接
着層が得られる。もし、水酸基を有する無機充填材を配
合しないと160℃以上で60分以上の加熱を要する。It is sufficiently cured by heating for 20 to 30 minutes, and an adhesive layer with high insulation resistance can be obtained. If an inorganic filler having a hydroxyl group is not blended, heating at 160° C. or higher for 60 minutes or longer is required.
前記合成ゴムとしては、アクリロニトリルブタジェンゴ
ム、イソプレン含有アクリロニトリルブタジェンゴム、
カルボキシル含有アクリロニトリルブタジェンゴム、ス
チレンブタジェンゴム等が使用できる6
また、フェノール樹脂としては、レゾール型フェノール
樹脂が合成ゴムとの反応性がよく、該レゾール型フェノ
ール樹脂はアルキル変性またはカシュー変性のフェノー
ル樹脂等が反応性が優れているので特に好ましい。The synthetic rubber includes acrylonitrile butadiene rubber, isoprene-containing acrylonitrile butadiene rubber,
Carboxyl-containing acrylonitrile butadiene rubber, styrene butadiene rubber, etc. can be used.6 In addition, as a phenol resin, resol type phenol resin has good reactivity with synthetic rubber, and the resol type phenol resin is alkyl-modified or cashew-modified phenol. Resins and the like are particularly preferred since they have excellent reactivity.
エポキシ樹脂/合成ゴム/フェノール樹脂の配合比を、
重量比で(15−40)/(40〜60)/(20〜4
0)としたのは、エポキシ樹脂が15重量部未満では硬
化後の接着層のa縁抵抗が1013Ω以下になり、40
重量部を超えると後述の化学粗化かしにく)なり、無電
解メツキ時にメツキ膜に膨れを発生したり、ビール強度
が 1.3kg/Qm以下となる。The blending ratio of epoxy resin/synthetic rubber/phenolic resin is
Weight ratio: (15-40)/(40-60)/(20-4
0) is because if the epoxy resin is less than 15 parts by weight, the a-edge resistance of the adhesive layer after curing will be 1013Ω or less, and 40
If it exceeds 1 part by weight, it will be difficult to cause chemical roughening (described later), and the plating film may swell during electroless plating, and the beer strength may become 1.3 kg/Qm or less.
合成ゴムが40重量部未満では、化学粗化がしにくさな
り5メツキ膜の膨れ、ビール強度低下の原因となる。6
0重量部を超えると、特にアクリロニトリルを含有する
合成ゴムでは硬化した接着層の絶縁抵抗が10”iΩよ
りも低くなる傾向がある。If the amount of synthetic rubber is less than 40 parts by weight, chemical roughening becomes difficult, causing swelling of the 5-plated film and a decrease in beer strength. 6
If the amount exceeds 0 parts by weight, the insulation resistance of the cured adhesive layer tends to be lower than 10''iΩ, especially in the case of synthetic rubber containing acrylonitrile.
また、フェノール樹脂が20重量部未満では、合成ゴム
との反応性が不十分となり、無電解メツキ時に接着層に
膨れを生じ易くなる。40重量部を超えると合成ゴムと
の反応が進行し過ぎて、化学粗化がしにく)なる。Furthermore, if the phenol resin is less than 20 parts by weight, the reactivity with the synthetic rubber will be insufficient, and the adhesive layer will likely swell during electroless plating. If it exceeds 40 parts by weight, the reaction with the synthetic rubber will proceed too much, making it difficult to chemically roughen it.
前記光感知性芳香族オニウム塩としては、特公昭52−
14277号記載の第■a族元素の芳香族オニウム塩、
特公昭52−14278号記載のVla族元素の芳香族
オニウム塩、特公昭52−14279号記載のVa族元
素の芳香族オニウム塩が知られており、これらのいずれ
も使用することができる。具体的にはテトラフルオロホ
ウ酸トリフェニルフェナシルホスニウム、ヘキサフルオ
ロアンチモン酸トリフェニルスルホニウム、テトラフル
オロホウ酸ジフェニルヨードニウム等が使用できる。こ
れら光感知性芳香族オニウム塩の1種以上を前記樹脂成
分の合計100重量部に対して 0.2〜5重量部配合
するのがよい。As the photosensitive aromatic onium salt,
Aromatic onium salt of group ■a element described in No. 14277,
Aromatic onium salts of Vla group elements described in Japanese Patent Publication No. 52-14278 and aromatic onium salts of Va group elements described in Japanese Patent Publication No. 52-14279 are known, and any of these can be used. Specifically, triphenylphenacylphosnium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, etc. can be used. It is preferable that one or more of these photosensitive aromatic onium salts be blended in an amount of 0.2 to 5 parts by weight based on a total of 100 parts by weight of the resin component.
0.2 重量部未満ではエポキシ樹脂の硬化が不十分と
なり、接着層の絶縁抵抗が1011Ωよりも低くなり、
5重量部より多くしてもそれ以上の効果は得らない。If it is less than 0.2 parts by weight, the epoxy resin will not be sufficiently cured, and the insulation resistance of the adhesive layer will be lower than 1011Ω.
Even if the amount is more than 5 parts by weight, no further effect will be obtained.
水酸基を有する無機充填材としては、水酸化亜鉛、水酸
化アルミニウム、水酸化アンチモン、水酸化カドミニウ
ム、水酸化カルシウム、水酸化クロム、水酸化コバルト
、水酸化スズ、水酸化ストロンチウム、水酸化鉄、水酸
化銅、水酸化鉛、水酸化ニッケル、水酸化バリウム、水
酸化ビスマス。Inorganic fillers with hydroxyl groups include zinc hydroxide, aluminum hydroxide, antimony hydroxide, cadmium hydroxide, calcium hydroxide, chromium hydroxide, cobalt hydroxide, tin hydroxide, strontium hydroxide, iron hydroxide, water Copper oxide, lead hydroxide, nickel hydroxide, barium hydroxide, bismuth hydroxide.
水酸化ヒ素、水酸化マグネシウム、水酸化マンガン、水
酸化ランタン等がある。Examples include arsenic hydroxide, magnesium hydroxide, manganese hydroxide, and lanthanum hydroxide.
しかし、硬化後の接着層の絶縁特性および粗化の容易性
、メツキ膜のビール強度および半田耐熱性を考慮し、ま
た、取扱う上で公害等の心配がないものとして、水酸化
亜鉛、水酸化アンチモン。However, considering the insulation properties and ease of roughening of the adhesive layer after curing, the beer strength of the plating film, and the solder heat resistance, zinc hydroxide, hydroxide Antimony.
水酸化カルシウム、水酸化コバルト、水酸化バリウム、
水酸化マグネシウム、水酸化マンガンが好ましい。これ
らの1種以上を前記樹脂成分の合計100重量部に対し
て3〜20重量部配置部る。Calcium hydroxide, cobalt hydroxide, barium hydroxide,
Magnesium hydroxide and manganese hydroxide are preferred. One or more of these is used in an amount of 3 to 20 parts by weight based on a total of 100 parts by weight of the resin components.
3重量部未満では、合成ゴムとフェノール樹脂との低温
(135〜150℃)硬化を十分促進することができな
い。また、20重量部を超えてもそれ以上の硬化を促進
しない。If it is less than 3 parts by weight, low temperature (135 to 150°C) curing of the synthetic rubber and phenolic resin cannot be sufficiently promoted. Further, even if the amount exceeds 20 parts by weight, further curing will not be promoted.
本発明では更に1合成ゴムの加硫助剤として酸化亜鉛、
酸化マグネシウム、酸化コバルト等が使用できる。また
、塗工時の流出防止のための揺変剤として表面積の大き
い酸化ケイ素粉末、あるいは化学粗化を容易にする効果
のある炭酸カルシウム、ケイ酸カルシウム、ジルコニウ
ムシリケート等の微粉末充填剤を併用することができる
。In the present invention, zinc oxide is further used as a vulcanization aid for synthetic rubber.
Magnesium oxide, cobalt oxide, etc. can be used. In addition, silicon oxide powder with a large surface area is used as a thixotropic agent to prevent spillage during coating, or fine powder fillers such as calcium carbonate, calcium silicate, and zirconium silicate are used to facilitate chemical roughening. can do.
本発明の接着剤は、公知の2本ロール、3本ロール、ニ
ーダ、ボールミル、サンドミル等を使用して混練するこ
とにより調製される。The adhesive of the present invention is prepared by kneading using a known two-roll, three-roll, kneader, ball mill, sand mill, or the like.
ロール混線の場合は、先ず合成ゴムと水酸基を有する無
機充填材、加硫助剤、その他の添加物をロールで混練し
、これを適当な溶剤で希釈し、次に、前記のエポキシ樹
脂、該エポキシ樹脂の硬化剤例えば光感知性芳香族オニ
ウム塩、フェノール樹脂を配合することによって得られ
る。ニーダ混練の場合も上記ロール混練と同様にして製
造できる。In the case of roll-mixing, first the synthetic rubber, an inorganic filler having a hydroxyl group, a vulcanization aid, and other additives are kneaded with a roll, and this is diluted with an appropriate solvent. It can be obtained by blending an epoxy resin curing agent such as a photosensitive aromatic onium salt and a phenol resin. In the case of kneading with a kneader, it can be produced in the same manner as the above-mentioned roll kneading.
ボールミル、サンドミル混練の場合は、予め溶剤にエポ
キシ樹脂、合成ゴム、フェノール樹脂。When kneading in a ball mill or sand mill, add epoxy resin, synthetic rubber, or phenol resin to the solvent in advance.
光感知性芳香族オニウム塩を溶解しておき、これに水酸
基を有する無機充填材、加硫助剤、その他の添加物を加
えて混練する。A photosensitive aromatic onium salt is dissolved, and an inorganic filler having a hydroxyl group, a vulcanization aid, and other additives are added and kneaded.
前記溶剤としては、ケトン類、セロソルブ類、その他目
的に応じて選択することができ、固形分が10〜50重
量%に調製することが好ましい。The solvent may be selected from ketones, cellosolves, and others depending on the purpose, and is preferably adjusted to have a solid content of 10 to 50% by weight.
該接着剤を絶縁基板表面へ塗布する方法としては、ロー
ル印刷法、カーテンコート法、デイツプ法、スクリーン
印刷法等の公知の方法が用いられる。この時、塗布厚さ
は接着剤溶液濃度と塗布方法とで調節することができる
が、乾燥後の接着剤層として10〜1100ALの厚さ
が好ましい。As a method for applying the adhesive to the surface of the insulating substrate, known methods such as a roll printing method, a curtain coating method, a dip method, and a screen printing method can be used. At this time, the coating thickness can be adjusted by adjusting the concentration of the adhesive solution and the coating method, but the thickness of the adhesive layer after drying is preferably 10 to 1100 AL.
10ILmより薄いとその上に形成される無電解メツキ
膜のビール強度、半田耐熱性が不十分となり、100μ
mより厚いと照射した紫外線が接着剤層の下層部まで十
分透過しない恐れがある。If it is thinner than 10ILm, the beer strength and soldering heat resistance of the electroless plating film formed thereon will be insufficient.
If the adhesive layer is thicker than m, the irradiated ultraviolet rays may not be sufficiently transmitted to the lower layer of the adhesive layer.
前記接着剤を離型処理したベースフィルム上に塗布した
無電解メツキ用下地接着層形成用の接着フィルム(以下
、接着用フィルムと云う)を作成することができる。該
接着用フィルムは、接着剤が形成されている面をベース
フィルムごと絶縁基板上に貼付け、硬化処理を行なった
後にベースフィルムを剥離するもので、プリント回路板
を工場で量産する際に優れた作業性を発揮する。この接
着用フィルムは下記の様にして作成することができる。An adhesive film for forming a base adhesive layer for electroless plating (hereinafter referred to as an adhesive film) can be prepared by applying the adhesive onto a base film that has been subjected to a mold release treatment. This adhesive film is used to attach the adhesive-coated side to an insulating substrate along with the base film, and then peel off the base film after a curing process. Demonstrates workability. This adhesive film can be created as follows.
前記樹脂成分を十分に混練した後、有機溶剤に光感知性
芳香族オニウム塩を加えながら溶解分散し、ろ過して固
形分10〜40重量%の接着剤を調製する。これを表面
を離型処理した透明なベースフィルム(膜厚10〜10
0μm)上にナイフコート法あるいはアプリケータ法に
より乾燥後の塗膜の厚さが目的の厚さとなるように塗布
し、これを60〜110℃、5〜20分乾燥することに
より接着用フィルムを作成することができる。なお、該
接着用フィルムの接着剤層には、前記有機溶剤を0.0
01〜0.5重量%残存させておくのがよい。該有機溶
剤を残存させる理由は、絶縁基板上へ該接着用フィルム
を自動接着する際の仮付は工程に必要である。なお、該
溶剤の含有量が少ないと仮付は性が悪くなり、また、多
過ぎると接着層の発泡等の原因となるので前記範囲内が
好ましい。After thoroughly kneading the resin components, the photosensitive aromatic onium salt is dissolved and dispersed in an organic solvent while being added, and filtered to prepare an adhesive having a solid content of 10 to 40% by weight. A transparent base film (thickness 10 to 10
0μm) using the knife coating method or applicator method so that the dried coating film has the desired thickness, and then drying it at 60 to 110°C for 5 to 20 minutes to form an adhesive film. can be created. The adhesive layer of the adhesive film contains 0.0 of the organic solvent.
It is preferable that 01 to 0.5% by weight remain. The reason why the organic solvent is left behind is that tacking is necessary in the process of automatically bonding the adhesive film onto the insulating substrate. Note that if the content of the solvent is too small, the temporary adhesion will be poor, and if it is too large, it will cause foaming of the adhesive layer, so it is preferably within the above range.
前記接着用フィルムのベースフィルムとしては、公知の
透明なフィルムを用いることができる。特にポリエステ
ルフィルムは透明度、平滑度が優れており、絶縁基板上
に接着層を形成した後に不要となったベースフィルムの
剥離を容易にするための離型剤処理を効果的に行うこと
ができる。また、耐熱性が優れているので接着剤塗工の
作業性が優れている。なお、該ポリエステルフィルムは
、塗工作業時のフィルムテンション、前記接着剤硬化の
ための紫外線照射効率等からその膜厚は10〜100μ
mが好ましい。As the base film of the adhesive film, a known transparent film can be used. In particular, polyester films have excellent transparency and smoothness, and can be effectively treated with a mold release agent to facilitate peeling off of unnecessary base films after forming an adhesive layer on an insulating substrate. In addition, since it has excellent heat resistance, it has excellent workability in adhesive coating. Note that the thickness of the polyester film is 10 to 100 μm depending on the film tension during coating work, the efficiency of ultraviolet ray irradiation for curing the adhesive, etc.
m is preferred.
前記ベースフィルムの離型処理用の離型剤としては公知
の離型剤が用いられる。但し、照射した紫外線が干渉縞
を生じないものを用いることが重要である。離型剤とし
ては一般にシリコーン系離型剤がよく知られているが、
これは干渉縞を生じ易く、干渉縞が生ずると接着層の硬
化の程度が異なる部分を生じ、接着層の品質が不均一と
なるので望ましくない。A known mold release agent is used for the mold release treatment of the base film. However, it is important to use UV light that does not cause interference fringes. Silicone mold release agents are generally well known as mold release agents.
This is undesirable because it tends to cause interference fringes, and when interference fringes occur, parts of the adhesive layer are cured to different degrees, resulting in non-uniform quality of the adhesive layer.
本発明者らの検討によれば、こうした干渉縞が発生しに
くい離型剤としては、シリルイソシアネート系の離型剤
が好ましい。これらが干渉縞を発生しない理由は、前記
ベースフィルム表面との馴染みがよく、光学的に均一な
薄膜の離型剤層を形成するためと考える。According to studies by the present inventors, a silyl isocyanate-based mold release agent is preferable as a mold release agent that is less likely to cause such interference fringes. The reason why these do not generate interference fringes is thought to be that they blend well with the surface of the base film and form an optically uniform thin mold release agent layer.
また、離型剤が接着剤へ転写または移行して、接着層の
特性に及ぼす影響を極力避けるためには、離型剤層の厚
さは0.1μm以下とするのが望ましい。Further, in order to avoid as much as possible the transfer or migration of the release agent to the adhesive and the effects on the properties of the adhesive layer, the thickness of the release agent layer is desirably 0.1 μm or less.
前記により得られた接着用フィルムは、巻取られること
によるベースフィルム裏面への二次貼着の防止、あるい
は接着層面への塵埃等の付着、汚染の防止のため、適用
時に容易に剥離することができる薄く剥離性のよい保護
被覆を接着剤面に設けたものが好ましい。The adhesive film obtained as described above must be easily peeled off at the time of application in order to prevent secondary adhesion to the back surface of the base film due to winding, or to prevent dust, etc. from adhering to the adhesive layer surface and preventing contamination. Preferably, the adhesive surface is provided with a thin protective coating with good releasability.
絶縁基材上に塗布または貼付けられた前記接着剤は、加
熱または紫外線照射を行うことにより、135〜150
℃、20〜30分で硬化する。なお、接着用フィルムを
用いる方法では、前記紫外線照射を行った後に、該ベー
スフィルムを剥がしてから加熱硬化を行うのがよい。ベ
ースフィルムを付けたままで加熱すると、合成ゴムとフ
ェノール樹脂の反応生成物(水分等)によって、接着層
の発泡を招くおそれがある。The adhesive coated or pasted on the insulating base material can be heated or irradiated with ultraviolet rays to give a 135 to 150
Cure in 20-30 minutes. In addition, in the method using an adhesive film, it is preferable to peel off the base film after the ultraviolet irradiation and then perform heat curing. If the base film is heated with the base film attached, there is a risk that the adhesive layer will foam due to reaction products (moisture, etc.) between the synthetic rubber and the phenolic resin.
硬化した接着層は公知の例えばクロム酸混液等を用いて
その表面を粗化し、次いで、無電解メツキ反応の触媒を
付着し、活性化処理を行い、回路パターン部以外をメツ
キレジストで被覆して、無電解メツキにより回路パター
ン部にメツキを析出させ、導体回路を形成する。The surface of the hardened adhesive layer is roughened using a well-known mixture of chromic acid, etc., and then a catalyst for electroless plating reaction is applied and activated, and areas other than the circuit pattern are covered with a plating resist. , plating is deposited on the circuit pattern portion by electroless plating to form a conductor circuit.
[作用]
本発明の接着剤が、135〜150℃と云う比較的低温
で硬化できるのは、水酸基を有する無機充填材にある。[Function] The reason why the adhesive of the present invention can be cured at a relatively low temperature of 135 to 150°C is due to the inorganic filler having a hydroxyl group.
該無機充填材が比較的低温度(150℃以下)で水酸基
を放出し、該水酸基が合成ゴムの二重結合部に隣接する
α炭素と、フェノール樹脂のメチロール基との架橋反応
を促進する作用によるものと考える。The inorganic filler releases hydroxyl groups at relatively low temperatures (below 150°C), and the hydroxyl groups promote a crosslinking reaction between the α carbon adjacent to the double bond of the synthetic rubber and the methylol group of the phenolic resin. I think this is due to
また、エポキシ樹脂の硬化剤として光感知性芳香族オニ
ウム塩を用いると、紫外線照射によっである程度硬化を
進行させることができるので、該接着剤の硬化時の寸法
変化を抑えることができ、絶縁基材として厚さ1mm以
下のものでも反りやねじれ等が起こりにくいものと考え
る。In addition, when a photosensitive aromatic onium salt is used as a curing agent for epoxy resin, curing can proceed to some extent by UV irradiation, so dimensional changes during curing of the adhesive can be suppressed, and insulation It is considered that even a base material with a thickness of 1 mm or less is unlikely to warp or twist.
硬化温度が低いと云うことは、紙フエノール基材を用い
ても熱劣化が少なく、プレス型抜きによるスルーホール
間やミシン目間のクラックおよび切断端面の虫食い状欠
陥が発生しにくい。The low curing temperature means that there is little thermal deterioration even when a paper phenol base material is used, and cracks between through holes and perforations caused by press die cutting and moth-eaten defects on the cut end surface are less likely to occur.
[実施例] 以下、本発明の詳細な説明する。[Example] The present invention will be explained in detail below.
〔実施例1〜8〕 実施例で用いた接着剤の組成を第1表に示す。[Examples 1 to 8] Table 1 shows the composition of the adhesive used in the examples.
接着剤は2本ロールで混練し、溶剤を加えて固形分が約
30重量%になる様調製した。The adhesive was kneaded using two rolls, and a solvent was added to adjust the solid content to about 30% by weight.
これらの各接着剤を500mmX 500mmX厚さ0
、8 m m の紙フエノール基材(日立化成工業製
LP−461F)と、厚さ0.5mm の紫外線不透過
性ガラスエポキシ基材(住人ベークライト製EL−37
62)の表面に、乾燥後の接着層の厚さが約30μmと
なる様ロールコート法で塗布し80℃、20分乾燥した
。Each of these adhesives is 500mm x 500mm x thickness 0
, 8 mm paper phenol base material (LP-461F manufactured by Hitachi Chemical Co., Ltd.) and a 0.5 mm thick ultraviolet opaque glass epoxy base material (EL-37 manufactured by Juju Bakelite Co., Ltd.).
62) by a roll coating method so that the thickness of the adhesive layer after drying was about 30 μm, and dried at 80° C. for 20 minutes.
次に、紫外線と赤外線を同時に放射できる平行光照射型
反射板を有する80W/cmの高圧水銀灯2本を備えた
紫外線照射器(オーク製作所要HMW−514型)を用
い、365nmセンサで1.27J/cm2の紫外線を
照射した。この時の接着剤層の表面温度は135℃であ
った。Next, we used an ultraviolet irradiator (HMW-514 model manufactured by Oak Manufacturing Co., Ltd.) equipped with two 80 W/cm high-pressure mercury lamps with parallel light irradiation type reflectors that can emit ultraviolet and infrared rays simultaneously, and used a 365 nm sensor to generate 1.27 J. /cm2 of ultraviolet light was irradiated. The surface temperature of the adhesive layer at this time was 135°C.
次に、所定の温度で熱硬化し、室温に冷却した後、各基
材の反り、ねじれ量およびメツキ終了後の紙フエノール
基材のプレス型抜きによる切断端面の虫食い状欠陥の発
生況状を評価した。結果を第2表に示す。Next, after thermosetting at a predetermined temperature and cooling to room temperature, we examined the amount of warpage and twist of each base material, and the occurrence of moth-eaten defects on the cut end surface due to press die cutting of the paper phenol base material after plating. evaluated. The results are shown in Table 2.
ねじれ量は500mmX500mmの基材の一方の端面
を鏡板に密接したときの他の端面の浮き上がり寸法を鏡
板面からの距離(’mm)で示す。The amount of twist is the amount of lift of the other end surface when one end surface of a 500 mm x 500 mm base material is brought into close contact with the end surface, expressed as the distance ('mm) from the end surface of the end surface.
接着剤の絶縁抵抗は、JISZ3197の第2図に基づ
き、厚さ35μmの銅箔貼リガラスエポキシ基板を用い
銅箔をエツチングしてクシ型電極を作成し、該基板のク
シ型電極形成面上に各実施例の接着剤を塗布し、前記と
同様に乾燥、紫外線および赤外線の照射、加熱硬化を行
った。これらのDC500V、1分の絶縁抵抗の初期値
および吸湿(40℃、95%RH,240時間)後の値
を第3表に示した。The insulation resistance of the adhesive is determined based on Figure 2 of JIS Z3197. A 35 μm thick copper foil-coated glass epoxy board is used, the copper foil is etched to create a comb-shaped electrode, and the comb-shaped electrode is formed on the surface of the board. The adhesive of each example was applied to the adhesive, and dried, irradiated with ultraviolet rays and infrared rays, and cured by heating in the same manner as described above. Table 3 shows the initial value of the insulation resistance at 500 VDC for 1 minute and the value after moisture absorption (40° C., 95% RH, 240 hours).
一方、前記反り、ねじれの評価に用いた各試片を、無水
クロム酸65gと濃硫酸250m12とを水を加えてI
Qとした化学粗化液中で50℃、7分間粗化し、水洗後
、50℃の湯洗処理を10分間行った。次いで、N a
OH6g / Q水溶液中で50℃、約10分間処理
して1表面の粗化残留物を除去した。水洗後、無電解メ
ツキ反応の触媒であるパラジウムを含む触媒液(日立化
成工業製H5/l0IB)に約2分間浸漬して、メツキ
触媒を付与し、水洗後、修酸1gと36%塩酸10mQ
とを、水を加えてIQとした活性化液中に約2分間浸漬
後水洗した。この様にしてメツキ前処理を行った各試片
は120℃、10分間乾燥した。On the other hand, each test piece used for the evaluation of warping and twisting was mixed with 65 g of chromic anhydride and 250 ml of concentrated sulfuric acid and added with water.
It was roughened in a chemical roughening solution designated as Q at 50°C for 7 minutes, washed with water, and then washed with hot water at 50°C for 10 minutes. Then, N a
The roughened residue on one surface was removed by treatment in an OH6g/Q aqueous solution at 50°C for about 10 minutes. After washing with water, immerse for about 2 minutes in a catalyst solution containing palladium (H5/10IB manufactured by Hitachi Chemical Co., Ltd.), which is a catalyst for electroless plating reaction, to apply a plating catalyst, and after washing with water, add 1 g of oxalic acid and 10 mQ of 36% hydrochloric acid.
and was immersed in an activation solution prepared as IQ by adding water for about 2 minutes, and then washed with water. Each specimen subjected to plating pretreatment in this manner was dried at 120° C. for 10 minutes.
上記試片の表面に、@1 c m X長さ10cmのビ
ール強度測定用パターンと、幅2 、5 c m X長
さ2.5cmの260℃半田耐熱性測定用パターンと、
幅0.2 mm X間隔0 、2 m m X対向長さ
1mのクシ型回路パターン(A)および幅0 、1 m
m×間隔0.1mmX対向長さ1mのクシ型回路パタ
ーン(B)を有する回路量絶縁抵抗測定用パターンを形
成するため、それぞれパターン部を残してスクリーン印
刷法および写真法によってメツキレジストにより被覆し
た。On the surface of the specimen, a pattern for measuring beer strength of @1 cm x 10 cm in length, and a pattern for measuring 260°C soldering heat resistance of 2.5 cm wide x 2.5 cm in length,
Comb-shaped circuit pattern (A) with a width of 0.2 mm, a spacing of 0, 2 mm, and a facing length of 1 m, and a width of 0, 1 m.
In order to form a pattern for measuring circuit insulation resistance having a comb-shaped circuit pattern (B) of m x interval 0.1 mm x opposing length 1 m, each pattern was covered with a plating resist by screen printing method and photographic method, leaving the pattern part. .
スクリーン印刷法では、紫外線硬化型メツキレジストイ
ンク(日本曹達製RI−510) をパターン形成部以
外にスクリーン印刷し、1.5J/am”の紫外線を照
射して硬化した。また写真法ではドライフィルム型メツ
キレジスト(日立化成工業製5R3200)を貼付け、
300mJ/Qm”でパターン形成部以外を露光し、未
露光部分(パターン形成部分)のメツキレジストを現像
。In the screen printing method, an ultraviolet curing resist ink (RI-510 manufactured by Nippon Soda) was screen printed on areas other than the pattern forming area, and was cured by irradiating it with 1.5 J/am'' ultraviolet rays. Paste a molded resist (5R3200 manufactured by Hitachi Chemical Co., Ltd.),
300 mJ/Qm'' except the pattern forming area, and developing the plating resist in the unexposed area (pattern forming area).
除去した。Removed.
次に、下記組成の無電解銅メツキ液で70℃。Next, it was heated to 70°C using an electroless copper plating solution with the following composition.
約5時間メツキし、各パターン形成部に厚さ30μmの
銅メツキ膜を形成した。メツキ終了後水洗し、150℃
で30分間乾燥した。Plating was carried out for about 5 hours, and a copper plating film with a thickness of 30 μm was formed on each pattern forming portion. After plating, wash with water at 150℃
and dried for 30 minutes.
メツキを行った各試片は、JISC6481に基づきビ
ール強度、半田耐熱性を測定した。The beer strength and solder heat resistance of each plated specimen were measured based on JISC6481.
また、絶縁抵抗は初期値と吸湿後の値(40℃。In addition, the insulation resistance is the initial value and the value after moisture absorption (40℃).
95%RH,240時間後)を測定した。これらの測定
結果を第4表および第5表に示す。95%RH, after 240 hours) was measured. The results of these measurements are shown in Tables 4 and 5.
第2表に示す様に、実施例1〜8の接着剤では絶縁基材
の種類に関係なく、いずれも反り、ねじれ共に1mm以
下である。また、紙フエノール基材を用いた場合につい
て、メツキ後にプレス型抜きを行った結果、切断端面の
虫食い状欠陥の発生やスルーホール間およびミシン目間
のクラック発生は認められなかった。また、第3表に示
す様に、実施例1〜8の接着剤の硬化皮膜は初期値で1
014Ω以上を有し、吸湿値でも1013〜1014Ω
を示した。As shown in Table 2, the adhesives of Examples 1 to 8 had both warp and twist of 1 mm or less, regardless of the type of insulating base material. Further, in the case of using a paper phenol base material, press die cutting was performed after plating, and as a result, no moth-eaten defects were observed on the cut end surface, and no cracks were observed between through-holes or between perforations. In addition, as shown in Table 3, the cured film of the adhesives of Examples 1 to 8 had an initial value of 1
014Ω or more, and the moisture absorption value is 1013 to 1014Ω
showed that.
更に第4表、第5表に示す様に、ビール強度はいずれも
2 k g f /c m以上を示し、260℃半田耐
熱性も紙フエノール基材を用いた場合で20秒以上(基
材の膨れが発生するまでの時間)を示し、ガラスエポキ
シ基材では180秒以上を示した。Furthermore, as shown in Tables 4 and 5, the beer strength is 2 kg f / cm or more, and the soldering heat resistance at 260°C is also 20 seconds or more when using a paper phenol base material (base material The time required for blistering to occur) was 180 seconds or more for the glass epoxy base material.
前記スクリーン印刷法により形成したクシ型回路パター
ン(A)、および写真法により形成したクシ型回路パタ
ーン(B)の回路量絶縁抵抗は、絶縁基材の種類によら
ず初期値はいずれも1012Ωを示した。また吸湿値は
紙フエノール基材を用いた場合いずれも1010Ω以上
、ガラスエポキシ基材を用いた場合は1011〜101
2Ωを示した。The circuit insulation resistance of the comb-shaped circuit pattern (A) formed by the screen printing method and the comb-shaped circuit pattern (B) formed by the photographic method has an initial value of 1012 Ω regardless of the type of insulating base material. Indicated. In addition, the moisture absorption value is 1010Ω or more when using a paper phenol base material, and 1011 to 101Ω when using a glass epoxy base material.
It showed 2Ω.
〔比較例1〜8〕
実施例1〜8に示した第1表の接着剤の光感知性芳香族
オニウム塩の代りに三フッ化ホウ素モノメチルアミンを
用いた点、および、水酸基を有する無機充填材を配合し
なかった意思外は、同じ原料を用いて接着剤を調製した
。これを前記絶縁基材に塗布して乾燥後、160℃で6
0分硬化した。[Comparative Examples 1 to 8] Boron trifluoride monomethylamine was used instead of the photosensitive aromatic onium salt of the adhesive in Table 1 shown in Examples 1 to 8, and an inorganic filler having a hydroxyl group Adhesives were prepared using the same raw materials, except that no materials were blended. After applying this to the insulating base material and drying it,
It was cured for 0 minutes.
その結果、絶縁基材には2.1〜3.8mmの反りまた
はねじれを発生した。このため、スクリーン印刷、およ
びドライフィルムレジストの貼付けに支障をきたし、微
細回路を形成することができないため回路量絶縁抵抗の
評価はできなかった。As a result, the insulating base material was warped or twisted by 2.1 to 3.8 mm. This hindered screen printing and application of dry film resist, making it impossible to form a fine circuit, making it impossible to evaluate circuit insulation resistance.
なお、接着剤の硬化皮膜の絶縁抵抗は、初期値で101
3Ωであった。Note that the initial value of the insulation resistance of the cured adhesive film is 101
It was 3Ω.
また、基板に全面メツキした試片を用いて測定したビー
ル強度および半田耐熱性は実施例1〜8とほぼ同じ値を
示した。また、紙フエノール基材を用いた場合のメツキ
後のプレス型抜きでは、端面に虫食い状欠陥が発生し、
スルーホール間およびミシン目間にクラックが生じた。In addition, the beer strength and solder heat resistance measured using a sample plated entirely on a substrate showed almost the same values as Examples 1 to 8. In addition, when press die cutting after plating when using paper phenol base material, moth-eaten defects occur on the end surface.
Cracks occurred between through holes and perforations.
〔実施例9〕
実施例3のへキサフルオロアンチモン酸トリフェニルス
ルホニウムの代わりに、2−エチル−4−メチルイミダ
ゾール(四国化成)を1.5重量部配合した接着剤を用
いて、紙フエノール基材とガラスエポキシ基材の表面に
乾燥後の厚さが約30μmとなる様にロールコートして
80’C,20分乾燥後、140℃、20分と150℃
、30分の加熱硬化を行なった。[Example 9] Using an adhesive containing 1.5 parts by weight of 2-ethyl-4-methylimidazole (Shikoku Kasei) instead of triphenylsulfonium hexafluoroantimonate in Example 3, paper phenol base The surface of the material and glass epoxy base material was roll coated to a dry thickness of approximately 30 μm, dried at 80'C for 20 minutes, then coated at 140°C for 20 minutes and then at 150°C.
, heat curing was performed for 30 minutes.
室温に冷却後の反り、ねじれ量を測定した。結果を第6
表に示す。なお、無電解メツキ後の紙フエノール基材の
プレス型抜きによる切断端面の虫食い状欠陥の発生は認
められなかった。The amount of warpage and twist after cooling to room temperature was measured. 6th result
Shown in the table. Incidentally, no moth-eaten defects were observed on the cut end surface due to press die cutting of the paper phenol base material after electroless plating.
また、実施例1と同様にクシ形電極による接着剤層の絶
縁抵抗、ビール強度、半田耐熱性および回路量絶縁抵抗
の測定結果を第7表、第8表および第9表に示す。Further, as in Example 1, the results of measuring the insulation resistance, beer strength, solder heat resistance, and circuit insulation resistance of the adhesive layer using comb-shaped electrodes are shown in Tables 7, 8, and 9.
第6表
第8表
第9表
〔実施例10〜13〕
第10表に示す4種の接着剤を作成した。合成ゴム、加
硫助剤および水酸基含有無機充填剤を加圧ニーダで予備
混練した後、二本ロールで混練してメチルエチルケトン
(MEK)で希釈した。Table 6 Table 8 Table 9 [Examples 10 to 13] Four types of adhesives shown in Table 10 were prepared. The synthetic rubber, vulcanization aid, and hydroxyl group-containing inorganic filler were preliminarily kneaded using a pressure kneader, then kneaded using two rolls, and diluted with methyl ethyl ketone (MEK).
一方、エポキシ樹脂、レゾール型フェノール樹脂および
光感知性芳香族オニウム塩をMEKに溶解した。上記両
者を混合してボアーサイズ25μmのフィルタでろ過し
、固形分30重量%の接着剤を調製した。Meanwhile, an epoxy resin, a resol type phenolic resin, and a photosensitive aromatic onium salt were dissolved in MEK. Both of the above were mixed and filtered through a filter with a bore size of 25 μm to prepare an adhesive having a solid content of 30% by weight.
前記接着剤を、ベースフィルムとしてシリルイソシアネ
ート系離型剤で処理した厚さ38μmのポリエステルフ
ィルム(帝人製テトロンフィルム38−D)を用い、そ
の離型処理面に乾燥後の塗膜厚さが30μmになるよう
アプリケータで塗布し、第10表に示す乾燥条件で乾燥
後、冷風を吹付けて冷却しながら厚さ30μmのポリエ
チレン製保護フィルムを接着剤塗布面に被覆しながら巻
取り、接着用フィルムを作成した。なお、該接着用フィ
ルムの接着剤層に残存するMEK量をガスクロマトグラ
フにより分析した結果を第10表に示す。A 38 μm thick polyester film (Teitoron Film 38-D manufactured by Teijin) treated with a silyl isocyanate mold release agent was used as the base film for the adhesive, and the coating film thickness after drying was 30 μm on the release treated surface. After drying under the drying conditions shown in Table 10, cool it down by blowing cold air and roll it up while covering the adhesive coated surface with a 30 μm thick polyethylene protective film. created a film. Table 10 shows the results of gas chromatograph analysis of the amount of MEK remaining in the adhesive layer of the adhesive film.
次に、厚さ1mmの紙フエノール基材(日立化成工業層
LP−461F)と、厚さ1mmのガラスエポキシ基材
(日立化成工業層、紫外線不透過性、LE67N−W)
からなる基板の接着層形成面を火山灰50重量%を分散
させた研摩液を圧力4kg/cm”で吹き付け、水洗、
乾燥(80℃)して平均粗さ3μmの凹凸を形成した。Next, a 1 mm thick paper phenol base material (Hitachi Chemical Layer LP-461F) and a 1 mm thick glass epoxy base material (Hitachi Chemical Layer, UV opaque, LE67N-W)
A polishing solution in which 50% by weight of volcanic ash was dispersed was sprayed at a pressure of 4 kg/cm on the adhesive layer forming surface of the substrate, washed with water,
It was dried (80° C.) to form irregularities with an average roughness of 3 μm.
第1図に示すように、上記基板1の表面に、ホットロー
ルラミネータ(日立化成工業製HLM−1500型)を
用いて前記接着用フィルムの接着剤3の面に設けた保護
フィルム4を剥離し、該剥離した保護フィルム4を巻取
ロール5に巻取りながら接着剤面を仮付けした。なお、
仮付は時の第1段ホットロール2は、表面温度130℃
、ロール圧力4kg/cm2.速度1.5m/分である
。As shown in FIG. 1, the protective film 4 provided on the surface of the adhesive 3 of the adhesive film is peeled off on the surface of the substrate 1 using a hot roll laminator (model HLM-1500 manufactured by Hitachi Chemical). While the peeled protective film 4 was being wound up on a winding roll 5, the adhesive surface was temporarily attached. In addition,
During tacking, the first stage hot roll 2 has a surface temperature of 130°C.
, roll pressure 4kg/cm2. The speed is 1.5 m/min.
接着用フィルムを仮付けした前記基材は、3対の第2段
ホットロール6の間を順次通して接着を行った。このと
きのホットロール6は、表面温度150℃、ロール圧力
4kg/cm2.速度1.5m/分である。The base material to which the adhesive film was temporarily attached was sequentially passed between three pairs of second-stage hot rolls 6 to perform adhesion. At this time, the hot roll 6 had a surface temperature of 150°C and a roll pressure of 4kg/cm2. The speed is 1.5 m/min.
次に、ベースフィルム上から紫外線と赤外線とが同時照
射できる平行光照射型反射板を有する80W/cmの高
圧水銀灯2本を備えた紫外線照射器(HMW−514型
:オーク製作新製HMW514型)7を用い、接着層の
表面温度135’1:、365nmセンサで1.27J
/cm”の紫外線を照射した。いずれも接着層に膨れ、
m等の発生は認められなかった。Next, we used an ultraviolet irradiator (HMW-514 model: New Oak Manufactured HMW514 model) equipped with two 80W/cm high-pressure mercury lamps with a parallel light irradiation reflector that can simultaneously irradiate ultraviolet rays and infrared rays from above the base film. 7, and the surface temperature of the adhesive layer was 135'1:, 1.27 J with a 365 nm sensor.
/cm" of ultraviolet rays. In both cases, the adhesive layer swelled,
No occurrence of M, etc. was observed.
次いで、基板1上の接着用フィルムのベースフィルム8
をオートピーラで取除き、コンベア式トンネル炉中を通
過させて145℃、20分間接着層を加熱硬化した。Next, the base film 8 of the adhesive film on the substrate 1 is
was removed using an auto peeler, and passed through a conveyor tunnel furnace to heat and harden the adhesive layer at 145° C. for 20 minutes.
なお、上記の基板表面に形成された接着層には、気泡、
膨れ、皺等は見受けられず、また、含有MEKの有無を
ガスクロマトグラフにより分析したが検出されなかった
。Note that the adhesive layer formed on the surface of the above substrate contains air bubbles,
No blisters, wrinkles, etc. were observed, and the presence or absence of MEK contained was analyzed by gas chromatography, but it was not detected.
前記接着層を形成した基材を用いて、前記実施例1と同
様に、化学粗化し、メツキ触媒の付与等を行い、120
℃、20分間乾燥した。Using the base material on which the adhesive layer was formed, chemical roughening was performed in the same manner as in Example 1, a plating catalyst was applied, etc.
℃ for 20 minutes.
次に、無電解メツキ用のドライフィルム型メツキレジス
ト(日立化成工業製5R3200)を貼付け1回路パタ
ーン部以外に紫外線を照射し、現像することにより紫外
線未露光部を除去した。Next, a dry film type plating resist for electroless plating (5R3200 manufactured by Hitachi Chemical Co., Ltd.) was pasted, UV rays were irradiated to areas other than the 1 circuit pattern area, and the unexposed areas were removed by development.
上記回路パターンとしては、実施例1と同じく@1 c
m x長さ10cmのビール強度測定用パターン、幅
2.5cmX長さ2.5cmの260℃半田耐熱性測定
用パターンy@0.1mmX間隔0 、1 m m X
対向長さ1mのクシ型回路パターン(B)を有する回路
量絶縁抵抗測定用パターンを形成した。As for the above circuit pattern, as in Example 1, @1 c
m x length 10 cm pattern for measuring beer strength, width 2.5 cm x length 2.5 cm pattern for measuring 260℃ solder heat resistance y @ 0.1 mm x spacing 0, 1 mm x
A circuit insulation resistance measurement pattern having a comb-shaped circuit pattern (B) having a facing length of 1 m was formed.
次に、実施例1と同じ組成の無電解銅メツキ液で70℃
、約5時間メツキし、各パターン形成部に約30μm厚
の銅メツキ膜を形成し、水洗した後、乾燥した。各メツ
キを行った試片は、ビール強度、半田耐熱性を測定した
。Next, an electroless copper plating solution having the same composition as in Example 1 was used at 70°C.
The copper plating film was plated for about 5 hours to form a copper plating film with a thickness of about 30 μm on each pattern forming part, washed with water, and then dried. The beer strength and solder heat resistance of each plated specimen were measured.
また、回路間の絶縁抵抗はDC100Vx1分の初期値
と吸湿(40℃、95%RH,240時間)後の値を測
定した。これらの測定結果を、第11表および第12表
にに示す。In addition, the insulation resistance between the circuits was measured at an initial value of DC 100 V x 1 minute and a value after moisture absorption (40° C., 95% RH, 240 hours). The results of these measurements are shown in Tables 11 and 12.
ビール強度は、第11.12表に示す様にメツキ後の乾
燥条件の違いによる差は認められないが2 、5 k
g / c m以上の強度を示し、基材との界面で剥離
したものはなかった。なお、半田耐熱性および回路量絶
縁抵抗は乾燥により向上する。As for beer strength, as shown in Table 11.12, no difference was observed due to differences in drying conditions after plating, but 2.5 k
g/cm or more, and none of them peeled off at the interface with the base material. Note that soldering heat resistance and circuit insulation resistance are improved by drying.
次に、実施例10の接着剤を用い、ベースフィルムに塗
布後の接着剤中に残存する溶剤の影響を見るため、乾燥
条件を変えてMEKの含有量が0.00.04,0.0
012,0.04,0.5および0.7重量%の5種の
試料を作成し、前記ホットロールラミネータを用いて前
記と同様にして第1段の仮付けを行った。Next, using the adhesive of Example 10, in order to examine the effect of the solvent remaining in the adhesive after coating on the base film, the drying conditions were changed and the MEK content was 0.00.04, 0.0.
Five samples of 0.012, 0.04, 0.5 and 0.7% by weight were prepared, and the first stage tack bonding was performed in the same manner as above using the hot roll laminator.
その結果、溶剤含有量0.0004重量%のもは、仮付
けを行うことができず、基材のみがロールで送り出され
てしまい、こうした自動ラミネータ用の接着用フィルム
としては好ましくないことが分かった。また、 0.7
重量%のものは、前記仮付は性には優れているが、その
後の接着層硬化工程で接着層が発泡した。As a result, it was found that a film with a solvent content of 0.0004% by weight was not suitable for use as an adhesive film for automatic laminators, as it could not be tacked and only the base material was sent out on a roll. Ta. Also, 0.7
% by weight, the tacking properties were excellent, but the adhesive layer foamed in the subsequent adhesive layer curing process.
上記に対して、溶剤含有量が0.0012゜0.04お
よび0.5重量%のものは発泡等は起こらず、仮付は性
がよいことが分がった。In contrast to the above, it was found that when the solvent content was 0.0012°, 0.04% and 0.5% by weight, no foaming occurred and the tacking properties were good.
第2図は、本発明により作成した無電解メツキのプリン
ト回路板を用いたカメラ一体型ビデオテープレコーダ(
VTR)の一部分解斜視図である。Figure 2 shows a camera-integrated videotape recorder (
FIG. 2 is a partially exploded perspective view of the VTR.
レンズ11によって撮像管に結ばれた画像は光電変換さ
れ、映像信号として増幅装置に送られる。The image focused on the image pickup tube by the lens 11 is photoelectrically converted and sent to an amplifier as a video signal.
増幅装置によって増幅、変換された映像信号はマイク1
4で集音さ、れた音声信号と一緒に記録用ヘッドを介し
て、記録用媒体に記録される。The video signal amplified and converted by the amplifier is sent to microphone 1.
It is recorded on a recording medium together with the audio signal collected in step 4 via a recording head.
こうしたカメラ一体型ビデオテープレコーダ(VTR)
においては、前記増幅装置の電子部品搭載用プリント回
路板12.13がその小型化を阻むもの)一つでもあっ
た。These camera-integrated video tape recorders (VTRs)
In this case, the printed circuit boards 12 and 13 for mounting electronic components of the amplifier device were one of the obstacles to miniaturization.
該プリント回路板を本発明のものに置き換えることによ
って、厚さおよび面積を約172とすることができ、こ
れによって従来のVTRに比べその大きさを約374に
することができる。By replacing the printed circuit board with the one of the present invention, the thickness and area can be reduced to about 172 cm, thereby reducing the size to about 374 cm compared to conventional VTRs.
[発明の効果]
本発明の無電解メツキ下地用接着剤は、それを塗布形成
した絶縁基材に反り、ねじれを発生させないので、無電
解メツキのレジストインクの印刷や、ドライフィルム型
レジストの貼付けが容易となり、微細な導体回路を形成
することができる。[Effects of the Invention] The adhesive for electroless plating base of the present invention does not cause warping or twisting on the insulating base material on which it is applied, so it is suitable for printing resist ink for electroless plating or pasting dry film type resist. This makes it easy to form fine conductor circuits.
特に基板に紙フエノール基材を用いても、接着剤の硬化
温度が低いので熱劣化が少なく、回路形成後のプレス型
抜きによるスルーホール間やミシン目間のクラック等の
発生、または、基板の切断端面の虫食い状欠陥の発生が
少ない。In particular, even if a paper phenol base material is used for the board, the curing temperature of the adhesive is low, so there is little thermal deterioration, and cracks between through holes or perforations due to press die cutting after circuit formation, or cracks in the board. Less occurrence of moth-eaten defects on the cut end surface.
また、硬化後の接着層の絶縁抵抗が1014Ω以上を示
し、メツキ膜のビール強度2 k g f / c m
以上有し、260℃半田耐熱性も紙フエノール基材で1
0秒以上、ガラスエポキシ基材では180秒以上を示す
。また、回路量絶縁抵抗も優れており、極めて高品質の
プリント回路板を得ることができる。In addition, the insulation resistance of the adhesive layer after curing is 1014Ω or more, and the beer strength of the plating film is 2 kg f / cm
The paper phenol base material also has a soldering heat resistance of 260°C.
0 seconds or more, and 180 seconds or more for glass epoxy base materials. Furthermore, the circuit insulation resistance is excellent, and an extremely high quality printed circuit board can be obtained.
従って、薄い基材(厚さ0.1mm)の使用が可能とな
り、多層プリント回路板の高密度化を図ることができる
。さらにまた、反り、ねじれの発生がないので、チップ
部品等の搭載精度が向上し、搭載部品の修正工程を短縮
することができる。Therefore, it is possible to use a thin base material (thickness: 0.1 mm), and it is possible to increase the density of the multilayer printed circuit board. Furthermore, since no warping or twisting occurs, the mounting accuracy of chip components and the like can be improved, and the process of correcting the mounted components can be shortened.
また、本発明の接着剤は低温、短時間で硬化できるので
、フレキシブルプリント回路板の接着剤としても有効で
ある。Furthermore, since the adhesive of the present invention can be cured at low temperatures and in a short time, it is also effective as an adhesive for flexible printed circuit boards.
第1図は接着フィルムを用いて無電解メツキ用下地接着
層を設ける場合の製造工程を示すフロー図、第2図は本
発明のプリント回路板を用いたカメラ一体型ビデオテー
プレコーダの一部分解斜視図である。
1・・・基板、2・・・第1段ホットロール、3・・・
接着剤、4・・・保護フィルム、5・・・巻取ロール、
6・・・第2段ホットロール、7・・・紫外線照射器、
8・・・ベースフィルム、11・・・レンズ、 12.
13・・・プリント回路板、14・・・マイク。
□+嶋
J、’+’74
・−1
1、ぢ−
レノ
第1図Fig. 1 is a flow diagram showing the manufacturing process when an adhesive film is used to provide a base adhesive layer for electroless plating, and Fig. 2 is a partially exploded perspective view of a camera-integrated video tape recorder using the printed circuit board of the present invention. It is a diagram. 1...Substrate, 2...1st stage hot roll, 3...
Adhesive, 4... Protective film, 5... Winding roll,
6... Second stage hot roll, 7... Ultraviolet irradiator,
8... Base film, 11... Lens, 12.
13...Printed circuit board, 14...Microphone. □+Shima J, '+'74 ・-1 1, ぢ- Reno Figure 1
Claims (17)
分とし、エポキシ樹脂の硬化剤、水酸基を有する無機充
填材および溶剤を含むことを特徴とする無電解メッキ用
下地接着剤。1. A base adhesive for electroless plating, which is mainly composed of epoxy resin, synthetic rubber, and phenol resin, and contains a curing agent for the epoxy resin, an inorganic filler having a hydroxyl group, and a solvent.
分とし、光感知性芳香族オニウム塩、水酸基を有する無
機充填材および溶剤を含むことを特徴とする無電解メッ
キ用下地接着剤。2. A base adhesive for electroless plating, which is mainly composed of epoxy resin, synthetic rubber, and phenolic resin, and further contains a photosensitive aromatic onium salt, an inorganic filler having a hydroxyl group, and a solvent.
比が重量比で(15〜40)/(40〜60)/(20
〜40)であり、その合計100重量部に対して、水酸
基を有する無機充填材を3重量部以上含むことを特徴と
する請求項第1項または第2項記載の無電解メッキ用下
地接着剤。3. The weight ratio of epoxy resin/synthetic rubber/phenol resin is (15-40)/(40-60)/(20)
~40) and contains at least 3 parts by weight of an inorganic filler having a hydroxyl group based on a total of 100 parts by weight of the base adhesive for electroless plating according to claim 1 or 2. .
分とし、エポキシ樹脂の硬化剤および水酸基を有する無
機充填材を含む接着剤が、表面が離型処理されたベース
フィルム上に塗布されていることを特徴とする無電解メ
ッキ用下地接着層形成用の接着フィルム。4. The adhesive is mainly composed of epoxy resin, synthetic rubber, and phenolic resin, and contains an epoxy resin curing agent and an inorganic filler having a hydroxyl group, and is coated on a base film whose surface has been subjected to mold release treatment. Adhesive film for forming a base adhesive layer for electroless plating.
分とし、光感知性芳香族オニウム塩および水酸基を有す
る無機充填材を含む接着剤が、表面が離型処理されたベ
ースフィルム上に塗布されていることを特徴とする無電
解メッキ用下地接着層形成用の接着フィルム。5. An adhesive whose main components are epoxy resin, synthetic rubber, and phenolic resin, and which also contains a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group, is coated on a base film whose surface has been subjected to mold release treatment. Adhesive film for forming a base adhesive layer for electroless plating.
膜の離型剤層を有し、その上に前記接着剤が塗布されて
いることを特徴とする請求項第4項または第5項記載の
接着フィルム。6. The adhesive according to claim 4 or 5, wherein the base film has an optically uniform thin film release agent layer on the surface, and the adhesive is applied thereon. film.
、少量の溶剤を含んでいることを特徴とする請求項第4
項、第5項または第6項のいずれかに記載の接着フィル
ム。7. Claim 4, wherein the adhesive formed on the base film contains a small amount of solvent.
5. The adhesive film according to any one of Items 5 and 6.
分とし、エポキシ樹脂の硬化剤および水酸基を有する無
機充填材を含む組成物の硬化物からなる接着層が回路形
成面に設けられていることを特徴とするプリント回路板
用基板。8. It is characterized in that an adhesive layer made of a cured product of a composition mainly composed of epoxy resin, synthetic rubber, and phenol resin, and containing a curing agent for the epoxy resin and an inorganic filler having a hydroxyl group is provided on the circuit forming surface. Substrate for printed circuit boards.
分とし、光感知性芳香族オニウム塩および水酸基を有す
る無機充填材を含む組成物の硬化物からなる接着層が回
路形成面に設けられていることを特徴とするプリント回
路板用基板。9. An adhesive layer made of a cured product of a composition mainly composed of epoxy resin, synthetic rubber, and phenol resin, and containing a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group is provided on the circuit forming surface. Substrate for printed circuit boards.
成分とし、エポキシ樹脂の硬化剤および水酸基を有する
無機充填材を含む接着剤を、表面が離型処理されたベー
スフィルム上に塗布した無電解メツキ用下地接着層形成
用の接着フィルムが、絶縁基材の回路形成面に貼着され
ていることを特徴とするプリント回路板用基板。10. Base adhesive for electroless plating, in which an adhesive whose main components are epoxy resin, synthetic rubber, and phenolic resin, and which contains an epoxy resin curing agent and an inorganic filler with hydroxyl groups, is applied onto a base film whose surface has been subjected to mold release treatment. A substrate for a printed circuit board, characterized in that an adhesive film for layer formation is adhered to a circuit forming surface of an insulating base material.
成分とし、光感知性芳香族オニウム塩および水酸基を有
する無機充填材を含む接着剤を、表面が離型処理された
ベースフィルム上に塗布した無電解メツキ用下地接着層
形成用の接着フィルムが、絶縁基材の回路形成面に貼着
されていることを特徴とするプリント回路板用基板。11. For electroless plating, an adhesive whose main components are epoxy resin, synthetic rubber, and phenolic resin, and which contains a photosensitive aromatic onium salt and an inorganic filler with hydroxyl groups, is applied onto a base film whose surface has been subjected to mold release treatment. A substrate for a printed circuit board, characterized in that an adhesive film for forming a base adhesive layer is adhered to a circuit forming surface of an insulating base material.
成分とし、エポキシ樹脂の硬化剤および水酸基を有する
無機充填材を含む組成物の硬化物からなる接着層が回路
形成面に設けられ、 前記接着層の上に無電解メツキにより形成された回路パ
ターンを有することを特徴とするプリント回路板。12. An adhesive layer made of a cured product of a composition mainly composed of epoxy resin, synthetic rubber, and phenol resin and containing a curing agent for the epoxy resin and an inorganic filler having a hydroxyl group is provided on the circuit forming surface, and on the adhesive layer. A printed circuit board characterized by having a circuit pattern formed by electroless plating.
成分とし、光感知性芳香族オニウム塩および水酸基を有
する無機充填材を含む組成物の硬化物からなる接着層が
回路形成面に設けられ、前記接着層の上に無電解メツキ
により形成された回路パターンを有することを特徴とす
るプリント回路板。13. An adhesive layer made of a cured product of a composition mainly composed of epoxy resin, synthetic rubber, and phenolic resin and containing a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group is provided on the circuit forming surface, and the adhesive layer is A printed circuit board having a circuit pattern formed thereon by electroless plating.
成分とし、光感知性芳香族オニウム塩および水酸基を有
する無機充填材を含む無電解メツキ用下地接着剤を絶縁
基材の表面に形成した後、紫外線を照射し加熱すること
により前記接着剤を硬化することを特徴とするプリント
回路板用基板の製法。14. After forming the base adhesive for electroless plating, which is mainly composed of epoxy resin, synthetic rubber, and phenolic resin, and also contains a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group, on the surface of the insulating base material, it is irradiated with ultraviolet rays. A method for manufacturing a printed circuit board substrate, characterized in that the adhesive is cured by heating.
成分とし、光感知性芳香族オニウム塩および水酸基を有
する無機充填材を含む接着層を絶縁基材の回路形成面に
形成する工程、 前記接着層に紫外線を照射し加熱することにより前記接
着剤を硬化する工程、 前記接着層の表面を化学粗化し、無電解メツキ触媒を付
着させ、回路形成部以外をメツキレジストで被覆し、無
電解メツキで回路を形成する工程を含むプリント回路板
の製法。15. A step of forming an adhesive layer mainly composed of epoxy resin, synthetic rubber, and phenolic resin and containing a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group on the circuit forming surface of the insulating base material, and irradiating the adhesive layer with ultraviolet rays. curing the adhesive by irradiating and heating, chemically roughening the surface of the adhesive layer, attaching an electroless plating catalyst, covering areas other than the circuit forming part with a plating resist, and forming a circuit by electroless plating. A method of manufacturing printed circuit boards that includes the process of
成分とし、光感知性芳香族オニウム塩、水酸基を有する
無機充填材および少量の溶剤を含む接着剤を、表面が離
型処理されたベースフィルム上に塗布した無電解メツキ
用下地接着層形成用の接着フィルムを絶縁基材の回路形
成面に貼付ける工程、 前記接着層に紫外線を照射する工程、 前記接着フィルムのベースフィルムを剥離する工程、 加熱することにより前記接着層を硬化する工程、 前記接着層の表面を化学粗化し、無電解メツキ触媒を付
着させ、回路形成部以外をメツキレジストで被覆し、無
電解メツキにより回路を形成する工程を含むプリント回
路板の製法。16. An adhesive whose main components are epoxy resin, synthetic rubber, and phenolic resin, and which also contains a photosensitive aromatic onium salt, an inorganic filler with a hydroxyl group, and a small amount of solvent, is applied onto a base film whose surface has been subjected to mold release treatment. A step of attaching an adhesive film for forming a base adhesive layer for electroless plating to the circuit forming surface of an insulating base material, A step of irradiating the adhesive layer with ultraviolet rays, A step of peeling off the base film of the adhesive film, By heating. A printed circuit comprising the steps of curing the adhesive layer, chemically roughening the surface of the adhesive layer, adhering an electroless plating catalyst, covering areas other than the circuit forming portion with a plating resist, and forming a circuit by electroless plating. The manufacturing method of the board.
光電変換する撮像管、該撮像管からの映像信号を増幅す
る増幅装置、該増幅装置によって増幅、変換された映像
信号を記録媒体に記録する記録用ヘツド、および該ヘツ
ドにより前記映像信号を記録する記録用媒体を有するカ
メラ一体型ビデオレコーダにおいて、 前記増幅装置を構成する電子部品のプリント回路板が、
エポキシ樹脂、合成ゴム、フェノール樹脂を主成分とし
、光感知性芳香族オニウム塩および水酸基を有する無機
充填材を含む組成物の硬化物からなる接着層を回路形成
面に有し、前記接着層の上に無電解メッキにより形成さ
れた回路パターンを有することを特徴とするカメラ一体
型ビデオレコーダ。17. An optical lens, an image pickup tube that photoelectrically converts the image formed by the lens, an amplifier that amplifies the video signal from the image pickup tube, and a recording head that records the video signal amplified and converted by the amplifier on a recording medium. , and a recording medium for recording the video signal by the head, wherein a printed circuit board of electronic components constituting the amplifier device includes:
The circuit forming surface has an adhesive layer made of a cured product of a composition mainly composed of epoxy resin, synthetic rubber, and phenolic resin and containing a photosensitive aromatic onium salt and an inorganic filler having a hydroxyl group. A camera-integrated video recorder having a circuit pattern formed thereon by electroless plating.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2077830A JPH0739569B2 (en) | 1989-10-30 | 1990-03-27 | Base adhesive for electroless plating, printed circuit board using the adhesive and method for producing the same |
| KR1019910004779A KR960000980B1 (en) | 1990-03-27 | 1991-03-27 | Adhesive agent for substrate of electroless plating printed |
| US08/000,705 US5356698A (en) | 1990-03-27 | 1993-01-05 | Adhesive agent for substrate of electroless plating, printed circuit board using same, and method of producing same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1-282565 | 1989-10-30 | ||
| JP28256589 | 1989-10-30 | ||
| JP2077830A JPH0739569B2 (en) | 1989-10-30 | 1990-03-27 | Base adhesive for electroless plating, printed circuit board using the adhesive and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03220281A true JPH03220281A (en) | 1991-09-27 |
| JPH0739569B2 JPH0739569B2 (en) | 1995-05-01 |
Family
ID=26418885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2077830A Expired - Lifetime JPH0739569B2 (en) | 1989-10-30 | 1990-03-27 | Base adhesive for electroless plating, printed circuit board using the adhesive and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0739569B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4600640B2 (en) * | 2003-11-10 | 2010-12-15 | 信越化学工業株式会社 | Acrylic adhesive sheet |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61213277A (en) * | 1985-03-20 | 1986-09-22 | Sumitomo Bakelite Co Ltd | Adhesive and flexible printed circuit board |
| JPS6260290A (en) * | 1985-09-10 | 1987-03-16 | 日立化成工業株式会社 | Substrate for flexible printed circuit board |
| JPH02180977A (en) * | 1989-01-04 | 1990-07-13 | Toshiba Chem Corp | Adhesive composition for flexible printed circuit board |
| JPH02180978A (en) * | 1989-01-04 | 1990-07-13 | Toshiba Chem Corp | Adhesive composition for flexible printed circuit board |
-
1990
- 1990-03-27 JP JP2077830A patent/JPH0739569B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61213277A (en) * | 1985-03-20 | 1986-09-22 | Sumitomo Bakelite Co Ltd | Adhesive and flexible printed circuit board |
| JPS6260290A (en) * | 1985-09-10 | 1987-03-16 | 日立化成工業株式会社 | Substrate for flexible printed circuit board |
| JPH02180977A (en) * | 1989-01-04 | 1990-07-13 | Toshiba Chem Corp | Adhesive composition for flexible printed circuit board |
| JPH02180978A (en) * | 1989-01-04 | 1990-07-13 | Toshiba Chem Corp | Adhesive composition for flexible printed circuit board |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0739569B2 (en) | 1995-05-01 |
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