JPH03220719A - Jig for diffusion furnace - Google Patents
Jig for diffusion furnaceInfo
- Publication number
- JPH03220719A JPH03220719A JP1685290A JP1685290A JPH03220719A JP H03220719 A JPH03220719 A JP H03220719A JP 1685290 A JP1685290 A JP 1685290A JP 1685290 A JP1685290 A JP 1685290A JP H03220719 A JPH03220719 A JP H03220719A
- Authority
- JP
- Japan
- Prior art keywords
- jig
- assembled
- silicon
- boat
- silane gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 title claims description 13
- 229910000077 silane Inorganic materials 0.000 claims abstract description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920001296 polysiloxane Polymers 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000005507 spraying Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052710 silicon Inorganic materials 0.000 abstract description 10
- 239000010703 silicon Substances 0.000 abstract description 10
- 239000007789 gas Substances 0.000 abstract description 8
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 3
- 229910001882 dioxygen Inorganic materials 0.000 abstract description 3
- 239000002210 silicon-based material Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体製造工程のうち、熱拡散、熱酸化に使
用される拡散炉用治具に関し、特にその治具のうち、シ
リコンを原料として製作される拡散炉用治具に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a jig for a diffusion furnace used for thermal diffusion and thermal oxidation in the semiconductor manufacturing process, and in particular, to a jig for use in a diffusion furnace that uses silicon as a raw material. This invention relates to a jig for a diffusion furnace manufactured as a jig.
従来、半導体デバイスの製造工程において、素子を半導
体ウェーハに形成するのに際して、例えば、半導体ウェ
ーハを高温（約８００〜１２００℃）の雰囲気中の拡散
炉の中に入れ、ウェーハ表面に熱拡散、熱酸化による層
を形成する工程がある。また、この熱拡散酸化工程に用
いられる治具としては、例えば炉芯管、半導体ウェハを
載せるボート、ボートを出入れする引出し棒等がある。Conventionally, in the manufacturing process of semiconductor devices, when forming elements on a semiconductor wafer, for example, the semiconductor wafer is placed in a diffusion furnace in a high temperature (approximately 800 to 1200 degrees Celsius) atmosphere, and heat diffusion and heat are applied to the wafer surface. There is a step of forming a layer by oxidation. Further, as jigs used in this thermal diffusion oxidation process, there are, for example, a furnace core tube, a boat for mounting semiconductor wafers, a drawer rod for loading and unloading the boat, and the like.
通常、これらの治具の材質として次に延べる材料が使用
されてきた。Generally, the following materials have been used for these jigs.
■水晶を原料とする石英ガラス
■炭化珪素とシリコンを原料としたシリコンカーバイト
■シリコンを原料としたもの
の以上３種類が一般的であり、そのうち加工が容易、高
純度、安価なことにより、石英ガラスが多く用いられて
いた。しかし、石英ガラスの耐熱温度は１０５０℃と低
く１０５０℃以上の高温処理にはシリコンカーバイト、
シリコンを原料としたものが、使用されていた。また、
シリコンを原料とした治具は従来、組立式のものが使用
されていた。■Quartz glass made from crystal ■Silicon carbide made from silicon carbide and silicon ■The above three types made from silicon are common, among which quartz is easy to process, has high purity, and is inexpensive. Glass was often used. However, the heat resistance temperature of quartz glass is as low as 1050°C, and silicon carbide is used for high-temperature processing of 1050°C or higher.
Silicon-based materials were used. Also,
Jigs made from silicone have traditionally been assembled.
次に、従来の組立式の治具のうち、半導体ウェハーを治
具上に並べ熱拡散、熱酸化炉内に挿入するボートについ
て図を用いて説明する。Next, among conventional assembly-type jigs, a boat for arranging semiconductor wafers on a jig and inserting them into a thermal diffusion and thermal oxidation furnace will be described with reference to the drawings.
第２図は従来の組立式のボート−例を示す分解斜視図で
ある。このボートは、同図に示すように、２つの板部材
１及び２と、−面にウェーハが挿入される溝が多数形成
された３本の支柱部３゜４．５とをはめ込みによって組
立てられていた。FIG. 2 is an exploded perspective view showing an example of a conventional assembled boat. As shown in the figure, this boat is assembled by fitting together two plate members 1 and 2 and three support columns 3°4.5 each having a number of grooves formed on the negative side into which wafers are inserted. was.
また、これらの部品はそれぞれを成形するか、ブランク
より切削加工等により形成されてきた。Further, these parts have been formed by molding each part or by cutting a blank.
しかし、上述した従来のシリコンを原料とした治具は、
母材を切削研削加工することは可能であるが、互いの部
分を溶接することが不可能であるとされていたため、組
立には、はめ込みを基本とした組立式となっているので
、以下の欠点があった。However, the conventional silicon-based jigs mentioned above,
Although it is possible to cut and grind the base material, it was considered impossible to weld the parts together, so the assembly method is based on fitting, so the following method is used: There were drawbacks.
■組立て後のガタがでやすく、組立後の精度維持が困難
である。- Easy to loose after assembly, making it difficult to maintain accuracy after assembly.
■持運びのときに、不要な力により分解してしまう。■When carrying it around, unnecessary force causes it to disintegrate.
■洗浄、水洗、乾燥時では、差し込み部に滴水残りがお
きないよう、その都度、分解して行なう必要がある。■When cleaning, rinsing, and drying, it is necessary to disassemble the product each time to prevent dripping water from remaining on the insertion part.
本発明の目的は、かかる欠点を解消し、不要な力で分解
することなく、洗浄がより簡単で、かつ精度を長時間維
持出来る拡散用治具を提供することにある。An object of the present invention is to eliminate such drawbacks, to provide a diffusion jig that is easier to clean without being disassembled by unnecessary force, and that can maintain accuracy for a long time.
本発明の拡散用治具は、シリコン材料から成形される複
数の構成部品で組立てられてなる拡散炉用地具において
、前記構成部品同志の継き目がシラン系ガスを吹き付け
生成するシリコンであることを特徴としている。The diffusion jig of the present invention is a diffusion furnace jig assembled from a plurality of component parts molded from a silicone material, in which the joints between the component parts are silicone produced by spraying a silane gas. It is characterized by
次に、本発明について図面を参照して説明する。第１図
（ａ）は、本発明の一実施例を説明するためのボー１〜
の分解斜視図、第１図（ｂ）は第１図（ａ）のボートの
組立を説明するためのボートの部分を示す断面図である
。このボートは、第１図（ａ）に示すように、シリコン
原料から成形されたフランクを従来と同様に、切削加工
により、板部材１及び２と支柱部３，４及び５を製作す
る。このとき、各部品のはめ合い公差は、ゆるめのはめ
合い寸法のする。例えば、そのすき間が０．１〜Ｑ、５
ｍｍ程度のはめ合い寸法差があるように切削加工で仕上
げを行う。Next, the present invention will be explained with reference to the drawings. FIG. 1(a) is a diagram showing the lines 1 to 1 for explaining one embodiment of the present invention.
FIG. 1(b) is a sectional view showing a portion of the boat for explaining the assembly of the boat of FIG. 1(a). As shown in FIG. 1(a), for this boat, plate members 1 and 2 and support sections 3, 4, and 5 are manufactured by cutting flanks molded from silicon raw material in the same manner as in the past. At this time, the fit tolerance of each part is a loose fit dimension. For example, if the gap is 0.1~Q, 5
Finishing is done by cutting so that there is a difference in fitting dimensions of about mm.
次に、このボートを組立治具で、その外形及び所要寸法
を確保するように仮組みを行う。次に、この組立治具で
仮組みされたボート、を治具と一緒に真空チャンバに挿
入し、所定の真空度に真空チャンバを排気する。次に、
第１図（ｂ）に示すように、例えは、板部材１と支柱部
３の嵌合部を接続する際は、シラン系ガスノズル６及び
酸素ガスノズルより、シラン系ガスと酸素ガスを吹き付
けることにより、嵌合部のすき間にシリコン生成部８を
形成することにより溶接し、組立を完了する。Next, this boat is temporarily assembled using an assembly jig so as to ensure its outer shape and required dimensions. Next, the boat temporarily assembled using this assembly jig is inserted into a vacuum chamber together with the jig, and the vacuum chamber is evacuated to a predetermined degree of vacuum. next,
As shown in FIG. 1(b), for example, when connecting the fitting portion of the plate member 1 and the support column 3, by spraying silane gas and oxygen gas from the silane gas nozzle 6 and the oxygen gas nozzle. , welding is completed by forming a silicon generating part 8 in the gap between the fitting parts, and completing the assembly.
以上説明したように本発明は、シリコン材より製作され
た治具部品の組立では、そのはめ込み部にシリコン生成
物を肉盛りし、溶接構造にすることにより以下の効果が
ある。As explained above, the present invention has the following effects when assembling jig parts made of silicone material by overlaying a silicone product on the fitting part and creating a welded structure.
■ガタをなくし、高精度を保持することが出来る。■ Eliminates looseness and maintains high accuracy.
■持運び時に分解する恐れはない。■There is no risk of disassembling it when carrying it.
■洗浄、水洗１、乾燥時に、すき間はないので、すき間
に滴水が残ることがないため分解する必要がない。■There are no gaps during washing, rinsing with water, and drying, so there is no need to disassemble as there is no dripping water left in the gaps.
■シリコン治具の基準となる溝加工を溶解後行なえるた
め、より溝精度の高い治具が得られる。■ Grooving, which is the standard for silicon jigs, can be done after melting, so jigs with higher groove accuracy can be obtained.
第１図（ａ）は本発明の一実施例を説明するためのボー
トの分解斜視図、第１図（ｂ）は第１図（ａ）のボー１
〜の組立を説明するためのボード部分を示す断面図、第
２図は従来の組立式のボートの一例を示す部分斜視図で
ある。
１−１７・・液部材、３，４．５・・・支柱部、６・・
・シラン系ガスノズル、
７・・・ガスノズル、
８・・・シリコ
ン生戒物。FIG. 1(a) is an exploded perspective view of a boat for explaining one embodiment of the present invention, and FIG. 1(b) is a boat 1 of FIG. 1(a).
FIG. 2 is a partial perspective view showing an example of a conventional assembly type boat. 1-17...Liquid member, 3,4.5...Strut part, 6...
- Silane gas nozzle, 7...Gas nozzle, 8...Silicon raw material.
Claims (1)
れてなる拡散炉用地具において、前記構成部品同志の継
き目がシラン系ガスを吹き付け生成するシリコンである
ことを特徴とする拡散炉用治具。A diffusion furnace jig assembled from a plurality of component parts molded from silicone material, characterized in that the joints between the component parts are made of silicone produced by spraying a silane gas. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1685290A JPH03220719A (en) | 1990-01-25 | 1990-01-25 | Jig for diffusion furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1685290A JPH03220719A (en) | 1990-01-25 | 1990-01-25 | Jig for diffusion furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03220719A true JPH03220719A (en) | 1991-09-27 |
Family
ID=11927747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1685290A Pending JPH03220719A (en) | 1990-01-25 | 1990-01-25 | Jig for diffusion furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03220719A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04188617A (en) * | 1990-11-19 | 1992-07-07 | Toshiba Ceramics Co Ltd | Wafer supporting boat |
-
1990
- 1990-01-25 JP JP1685290A patent/JPH03220719A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04188617A (en) * | 1990-11-19 | 1992-07-07 | Toshiba Ceramics Co Ltd | Wafer supporting boat |
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