JPH0322578A - gas laser oscillation device - Google Patents
gas laser oscillation deviceInfo
- Publication number
- JPH0322578A JPH0322578A JP1157746A JP15774689A JPH0322578A JP H0322578 A JPH0322578 A JP H0322578A JP 1157746 A JP1157746 A JP 1157746A JP 15774689 A JP15774689 A JP 15774689A JP H0322578 A JPH0322578 A JP H0322578A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- metal electrode
- oscillation device
- nickel
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は放電管の軸方向と光軸方向が一致したガヌレー
ザ発振装置に関するものであり、特に最も安定なレーザ
ビームを得られるようにしたガスレーザ発振装置に関す
るものである。[Detailed Description of the Invention] Industrial Application Field The present invention relates to a Gannulas laser oscillation device in which the axial direction of a discharge tube and the optical axis direction are aligned, and in particular to a gas laser oscillation device that can obtain the most stable laser beam. It is related to.
従来の技術
従来のガスレーザ発振装置は、第2図aに示すものであ
った。この図に於で、1はガラヌなどの誘電体よりなる
放電管であシ、2,3は前記放電管1の内部に設けられ
た金属電極である。4は前記電極2,3に接続された高
電圧電源であシ、たとえばsoKVの電圧を両電極2,
3間に印加している。5は前記電極2.3間にはさ1れ
た放電管1内の放電空間である。6は全反射鏡、7は部
分反射鏡であシ、この全反射鏡6,部分反射鏡7は前記
放電空間6の両端に固定配置され、光共振器を形威して
いる。8は前記部分反射鏡7よシ出力されるレーザビー
ムである。矢印9はレーザガスの流れる方向を示してお
シ、軸流型レーザ装置の中を循環している。10は送気
管であシ、11.12は前記放電空間6にて放電及び送
風機によシ温度上昇したレーザガスの温度を下げるため
の熱交換器、13はレーザガヌを循環させる/こめの送
3 ・\−7
風機である。2. Description of the Related Art A conventional gas laser oscillation device is shown in FIG. 2a. In this figure, 1 is a discharge tube made of a dielectric material such as galanium, and 2 and 3 are metal electrodes provided inside the discharge tube 1. 4 is a high voltage power supply connected to the electrodes 2, 3, for example, soKV voltage is applied to both the electrodes 2, 3.
It is applied for 3 hours. Reference numeral 5 denotes a discharge space within the discharge tube 1 which is sandwiched between the electrodes 2 and 3. 6 is a total reflection mirror, and 7 is a partial reflection mirror.The total reflection mirror 6 and the partial reflection mirror 7 are fixedly arranged at both ends of the discharge space 6, and form an optical resonator. Reference numeral 8 denotes a laser beam outputted from the partial reflecting mirror 7. Arrow 9 indicates the direction in which the laser gas flows and circulates within the axial flow laser device. 10 is an air pipe, 11.12 is a heat exchanger for lowering the temperature of the laser gas whose temperature has risen due to the discharge and blower in the discharge space 6, and 13 is a gas supply for circulating the laser gas. \-7 It's a wind machine.
なか、送風機13によシ放電区間5にて約100m/S
eC程度のガス流を得る必要がある。Approximately 100 m/s in the discharge section 5 due to the blower 13
It is necessary to obtain a gas flow of about eC.
以上が従来の軸流型レーザ装置の構成であシ、次にその
動作について説明する。The above is the configuration of the conventional axial flow type laser device, and its operation will be explained next.
1ず一対の金属電極2,3に高電圧電源4から高電圧を
印加し、放電空間5にグロー状の放電を発生させる。放
電空間5を通過するレーザガスは、この放電エネルギー
を得て励起され、その励起されたレーザガスは全反射鏡
6釦よび部分反射鏡7によシ形戒された光共振器で共振
状態となシ、部分反射鏡7からレーザビーム8が出力さ
れる。このレーザビーム8がレーザ加工等の用途に用い
られる。第2図bは、金属電極部表面の詳細図である。First, a high voltage is applied from a high voltage power source 4 to the pair of metal electrodes 2 and 3 to generate a glow-like discharge in the discharge space 5. The laser gas passing through the discharge space 5 is excited by obtaining this discharge energy, and the excited laser gas enters a resonant state in an optical resonator formed by a total reflection mirror 6 button and a partial reflection mirror 7. , a laser beam 8 is output from the partially reflecting mirror 7. This laser beam 8 is used for purposes such as laser processing. FIG. 2b is a detailed view of the surface of the metal electrode section.
金属電極2の材料としては、タングステンと銅などの焼
結合金が用いられている。この焼結合金を用いる理由は
、タングステンと銅の酸化皮膜の厚さの違いによシ均一
かつ選択的に放電が分散されるので放電エネルギーを増
加した時でも放電がアークに移行せず安定したグロー放
電が得られるためである。As a material for the metal electrode 2, a sintered alloy such as tungsten and copper is used. The reason for using this sintered alloy is that the discharge is uniformly and selectively dispersed due to the difference in the thickness of the tungsten and copper oxide films, so even when the discharge energy is increased, the discharge does not shift to an arc and is stable. This is because glow discharge can be obtained.
発明が解決しようとする課題
上記の構或では、長時間、電極2を使用するとタングス
テンの酸化物が戒長し積κリすることによって銅表面を
覆い放電が困難になシ、かつ酸化物が飛散し放電管内を
汚染したりすることによシ安定したグロー放電が得られ
ないという問題点があった。Problems to be Solved by the Invention In the above structure, if the electrode 2 is used for a long time, the tungsten oxide will grow and accumulate, covering the copper surface and making it difficult to discharge. There was a problem in that stable glow discharge could not be obtained due to scattering and contaminating the inside of the discharge tube.
この発明は、かかる開題点を解決するためになされたも
ので、放電管内のグロー放電を長期に渡シ均一に広げる
ことにより安定したレーザピームが得られるガスレーザ
発振装置を提供することを目的とする。The present invention was made to solve this problem, and an object of the present invention is to provide a gas laser oscillation device that can obtain a stable laser beam by uniformly spreading glow discharge within a discharge tube over a long period of time.
課題を解決するための手段
本発明は、上記課題を解決するために放電管内の金属電
極を銅とニッケルとタングステンから戒る焼結合金とし
、前記金属電極表面にクロムを拡散処理したガヌレーザ
発振装置としたものである。Means for Solving the Problems In order to solve the above problems, the present invention provides a Gannu laser oscillation device in which the metal electrodes in the discharge tube are made of a sintered alloy made from copper, nickel, and tungsten, and chromium is diffused on the surface of the metal electrodes. That is.
作 用
この発明にかける金属電極によシ長時間に渡り5へ−7
均一なグロー放電が得られ安定したレーザビームをつく
9出すことが可能となる。Function: The metal electrode used in the present invention allows a uniform glow discharge to be obtained over a long period of time, making it possible to produce a stable laser beam.
実施例
第1図aは、本発明の実施例である金属電極表面の詳細
図である。タングステン粒子をニッケルで包みかつクロ
ムを拡散してある。二,ノケルでタングステン粒子を包
むことによシタングステン粒子の酸化進行を抑制してい
る。さらにクロムを拡散することによシ、銅釦よびニッ
ケルの酸化も抑制できる。またクロム拡散処理によシ金
属電極表面が硬化しスパッタされにくくなる。従って放
電を長時間続けても金属電極表面はほとんど劣化せず放
電は極めて安定する。Embodiment FIG. 1a is a detailed view of the surface of a metal electrode according to an embodiment of the present invention. Tungsten particles are wrapped in nickel and diffused with chromium. Second, by wrapping the tungsten particles in Nokel, the progress of oxidation of the tungsten particles is suppressed. Furthermore, by diffusing chromium, oxidation of copper buttons and nickel can also be suppressed. Furthermore, the chromium diffusion treatment hardens the metal electrode surface, making it less likely to be sputtered. Therefore, even if the discharge continues for a long time, the surface of the metal electrode hardly deteriorates and the discharge is extremely stable.
第1図bは、従来例と本発明の実施例の違いによるレー
ザ出力の長時間安定性を示したものである。この図から
明らかなように本発明の実施例では、クロム拡散の深さ
を5ミクロン以上にすれば長時間にわたってまったく出
力の低下がみられない。FIG. 1b shows the long-term stability of the laser output due to the difference between the conventional example and the embodiment of the present invention. As is clear from this figure, in the embodiment of the present invention, if the depth of chromium diffusion is set to 5 microns or more, no reduction in output is observed over a long period of time.
発明の効果
以上のように、この発明によれば金属電極を銅とニソケ
ルとタングステンの焼鮎合金としかつ金属表面をクロム
拡散処理することによシ長時問にわたって金属電極の劣
化がないことによシ安定したレーザビームを出すガスレ
ーザ発振装置を提供でき、信頼性向上に優れた効果を発
揮する。Effects of the Invention As described above, according to the present invention, the metal electrode is made of a sintered alloy of copper, nitrogen, and tungsten, and the metal surface is subjected to chromium diffusion treatment, so that there is no deterioration of the metal electrode over a long period of time. It is possible to provide a gas laser oscillation device that emits a highly stable laser beam, which has an excellent effect on improving reliability.
第1図aは、本発明の一実施例を示すガヌレザ発振装置
の電極表面を示す模式断面図、第1図bは同ガスレーザ
発振装置および従来例のレーザ出力の時間特性図、第2
図aは一般的なガスレーザ発振装置の回路図、第2図b
は従来例の電極表面を示す模式断面図である。FIG. 1a is a schematic cross-sectional view showing the electrode surface of a Gunnery laser oscillation device showing an embodiment of the present invention, FIG. 1b is a time characteristic diagram of the laser output of the same gas laser oscillation device and a conventional example,
Figure a is a circuit diagram of a typical gas laser oscillation device, Figure 2 b
FIG. 2 is a schematic cross-sectional view showing the surface of a conventional electrode.
Claims (2)
りレーザガスを流し、前記放電管内の両端に設けられた
金属電極間に高電圧を印加し、前記放電管内に放電を発
生させ、この放電をレーザ励起源として前記放電管の軸
方向にレーザビームを発するガスレーザ発振装置におい
て、前記金属電極を、銅とニッケルとタングステンから
成る焼結合金とし、かつ前記金属電極の表面にクロムを
拡散処理したことを特徴とするガスレーザ発振装置。(1) Laser gas is caused to flow through a discharge tube made of an insulator in the optical axis direction using a blower, a high voltage is applied between metal electrodes provided at both ends of the discharge tube, and a discharge is generated within the discharge tube. In a gas laser oscillation device that emits a laser beam in the axial direction of the discharge tube as a laser excitation source, the metal electrode is a sintered alloy made of copper, nickel, and tungsten, and the surface of the metal electrode is treated with diffusion treatment of chromium. A gas laser oscillation device characterized by:
5ミクロン以上とした特許請求の範囲第1項記載のガス
レーザ発振装置。(2) The gas laser oscillation device according to claim 1, wherein the diffusion depth from the surface of the metal electrode in the chromium diffusion treatment is 5 microns or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1157746A JPH0322578A (en) | 1989-06-20 | 1989-06-20 | gas laser oscillation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1157746A JPH0322578A (en) | 1989-06-20 | 1989-06-20 | gas laser oscillation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0322578A true JPH0322578A (en) | 1991-01-30 |
Family
ID=15656444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1157746A Pending JPH0322578A (en) | 1989-06-20 | 1989-06-20 | gas laser oscillation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322578A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1174965A1 (en) * | 2000-05-04 | 2002-01-23 | TuiLaser AG | An electrode material for a gas discharge laser |
-
1989
- 1989-06-20 JP JP1157746A patent/JPH0322578A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1174965A1 (en) * | 2000-05-04 | 2002-01-23 | TuiLaser AG | An electrode material for a gas discharge laser |
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