JPH0323211A - Production of silica gel having large pore diameter - Google Patents
Production of silica gel having large pore diameterInfo
- Publication number
- JPH0323211A JPH0323211A JP15486589A JP15486589A JPH0323211A JP H0323211 A JPH0323211 A JP H0323211A JP 15486589 A JP15486589 A JP 15486589A JP 15486589 A JP15486589 A JP 15486589A JP H0323211 A JPH0323211 A JP H0323211A
- Authority
- JP
- Japan
- Prior art keywords
- silica gel
- silica
- phosphoric acid
- pore
- washed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 239000011148 porous material Substances 0.000 title claims abstract description 52
- 239000000741 silica gel Substances 0.000 title claims abstract description 39
- 229910002027 silica gel Inorganic materials 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 16
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000005406 washing Methods 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims description 17
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 7
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 150000007530 organic bases Chemical class 0.000 claims description 6
- 238000009826 distribution Methods 0.000 abstract description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 8
- 229910021529 ammonia Inorganic materials 0.000 abstract 3
- 238000000034 method Methods 0.000 description 14
- 230000000704 physical effect Effects 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000002994 raw material Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
- 239000011574 phosphorus Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- XLUBVTJUEUUZMR-UHFFFAOYSA-B silicon(4+);tetraphosphate Chemical compound [Si+4].[Si+4].[Si+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XLUBVTJUEUUZMR-UHFFFAOYSA-B 0.000 description 4
- 239000006228 supernatant Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 3
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 3
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- -1 silica hydride Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VYDNCCLNAHRIST-UHFFFAOYSA-N 13827-38-8 Chemical compound O1P(=O)(O2)O[Si]31OP2(=O)O3 VYDNCCLNAHRIST-UHFFFAOYSA-N 0.000 description 1
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229960004198 guanidine Drugs 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000010335 hydrothermal treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- LZUYAGGHRNOWRY-UHFFFAOYSA-J phosphonato phosphate;silicon(4+) Chemical class [Si+4].[O-]P([O-])(=O)OP([O-])([O-])=O LZUYAGGHRNOWRY-UHFFFAOYSA-J 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は大細孔径のシリカゲルの製法に関するものであ
り、詳しくは強度の高い,細孔分布のシャープな大細孔
径シリカゲルを調製する方法に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a method for producing a large pore size silica gel, and more particularly, to a method for preparing a large pore size silica gel with high strength and a sharp pore distribution. It is something.
(従来の技術)
50nm ( 500A ’)以上の大細孔径シリカゲ
ルの必要分野は近年著しく広がってきており、触媒担体
,液体クロマトグラフイー(特に生命化学の分野),そ
の他の用途に広範囲に使用ざれている。(Prior art) The field in which silica gel with a large pore size of 50 nm (500 A') or more is required has expanded significantly in recent years, and it is widely used as a catalyst support, liquid chromatography (particularly in the field of biochemistry), and other applications. ing.
その製法も、無機物質を添加して高温熱処理する方法(
西ドイツ特許2, 042, 910号,特開昭47−
5811号),水熱処理による方法(1例として西ドイ
ツ特許2,225,452号,特公昭61− 2048
7号),有機物添加シリカコアセルベート焼成法(米国
特許3,855,172号,特公昭54−9588号,
特公昭617858号),極性有′/a溶媒中、コロイ
ド状シリカ(又はポリテトラエトキシシラン等〉を界面
活性剤と分敗しゲル化する方法(特開昭58−1040
17号,西ドイツ特許2,155,281号),又はオ
レフインの水添触媒の改良にリン酸を含浸させ、スチー
ムを通すことによって強度の改質改善を行っているもの
(米国特許2,960,477号,同3,917,72
1号)等が従来知られている。The manufacturing method is also a method of adding inorganic substances and high-temperature heat treatment (
West German Patent No. 2,042,910, Japanese Unexamined Patent Publication No. 1973-
5811), hydrothermal treatment method (one example is West German Patent No. 2,225,452, Japanese Patent Publication No. 61-2048)
7), organic matter-added silica coacervate calcination method (U.S. Patent No. 3,855,172, Japanese Patent Publication No. 54-9588,
Japanese Patent Publication No. 617858), a method of gelling colloidal silica (or polytetraethoxysilane, etc.) with a surfactant in a polar solvent (Japanese Patent Publication No. 58-1040)
No. 17, West German Patent No. 2,155,281), or an improved olefin hydrogenation catalyst impregnated with phosphoric acid and passed through steam to improve its strength (US Pat. No. 2,960, No. 477, 3,917,72
No. 1) etc. are conventionally known.
(発明が解決しようとする課題)
しかし上記何れの方法においても、良好な物性で強度の
あるものを調製することはかなり難しいのが現状である
。すなわち細孔分布が悪かったり、細孔径がioonm
程度かそれ以上で細孔構造が極端に変化したり強度が低
下してしまう。更に西ドイツ特許2, 042, 91
0号の場合のように、高温処理のためや生或雰囲気のた
め、生成シリカゲルが結晶化したものを含んだり、強度
の弱いものになったり、更にまた高温酸化性雰囲気のた
め、使用装置の損傷が大きかったりするという問題点を
含むものである。(Problem to be Solved by the Invention) However, in any of the above methods, it is currently quite difficult to prepare a material with good physical properties and strength. In other words, the pore distribution is poor or the pore diameter is ionm.
At a certain level or more, the pore structure changes drastically and the strength decreases. Furthermore, West German Patent No. 2,042,91
As in the case of No. 0, the silica gel produced may contain crystallized material or be weak due to the high temperature treatment or the atmosphere, and furthermore, due to the high temperature oxidizing atmosphere, the equipment used may This includes the problem that the damage may be large.
細孔を有する固体シリカ(主に固体シリカはアモルファ
ス状態である)である多孔性シリカを原料として、高温
処理法では結晶性シリカに変化してしまうことがあり、
非品質(アモルファス)シリカのまま良好なクロマトグ
ラフィー用充填剤を調製するためには低温処理法による
ことが望ましい。Porous silica, which is solid silica with pores (mainly solid silica is in an amorphous state), is used as a raw material, but it may change to crystalline silica in high-temperature treatment methods.
In order to prepare a good chromatographic packing material from non-quality (amorphous) silica, it is desirable to use a low temperature treatment method.
本発明の目的は簡単なプロセスで、出来上ったシリカゲ
ルの細孔分布が良好な大細孔径シリカゲルの調製法を提
供することにある。An object of the present invention is to provide a method for preparing large pore size silica gel with a good pore distribution using a simple process.
(課題を解決するための手段)
本発明では上記の目的を達成するため最適の添加物を選
定し更に良好な表面及び細孔分布の製品とするための、
また強度向上のための仕上げ処理を施すものである。(Means for Solving the Problems) In order to achieve the above objectives, the present invention selects optimal additives and further improves the surface and pore distribution of the product.
It also undergoes finishing treatment to improve strength.
すなわち本発明は、多孔性シリカにリン酸を含浸し、加
熱521理後、アンモニア水,強有機塩基水溶液又は希
薄塩酸にて洗浄処理することを特徴とし、更に上記アン
モニア水又は強有機塩基水溶液で洗浄処理したシリカゲ
ルを、次いで希薄塩酸により洗浄処理することを特徴と
する大細孔径シリカゲルの製造法である。That is, the present invention is characterized in that porous silica is impregnated with phosphoric acid, heated for 521 days, and then washed with aqueous ammonia, a strong organic base aqueous solution, or dilute hydrochloric acid, and further treated with aqueous ammonia or a strong organic base aqueous solution. This is a method for producing large pore size silica gel, which is characterized in that the washed silica gel is then washed with dilute hydrochloric acid.
本発明の原料となる多孔性シリカは、例えばアルカリ金
属けい酸塩水溶液と鉱酸の水溶液とを反応させて生或す
るシリカヒド口ゲルを洗浄し、さらに加熱乾燥して得ら
れる粒子径3μ〜数百μ.細孔容積0.3〜1.5d/
g,比表面積300〜500rtt/Q ,細孔径20
〜500A程度の球状シリカゲルが挙げられる。Porous silica, which is the raw material of the present invention, can be obtained by, for example, reacting an aqueous alkali metal silicate solution with an aqueous mineral acid solution, washing a silica hydride gel, and then drying it by heating. 100μ. Pore volume 0.3-1.5d/
g, specific surface area 300-500rtt/Q, pore diameter 20
Examples include spherical silica gel of about 500A.
含浸するリン酸の1度はP2 05換算で2〜50重量
%,好ましくは5〜25重量%である。リン酸を含浸さ
せた多孔性シリカは、次いであまり反応しない程度の温
度(約90℃)で予備乾燥しフルイで分散することによ
って、より良好な細孔分布品を得ることができる。その
後の加熱処理は100〜700℃,好ましくは150へ
600℃で3〜50時間行うことにより大細孔径のシリ
カゲルが得られる。The degree of phosphoric acid used for impregnation is 2 to 50% by weight, preferably 5 to 25% by weight, calculated as P205. The porous silica impregnated with phosphoric acid can then be pre-dried at a temperature that does not cause much reaction (approximately 90° C.) and dispersed in a sieve to obtain a product with better pore distribution. The subsequent heat treatment is carried out at 100 to 700°C, preferably 150 to 600°C, for 3 to 50 hours to obtain a silica gel with large pores.
また更に大きな細孔径のを得たいときには上記の含浸,
加熱処理を繰り返し行えばよく、このようにして本発明
の目的である平均細孔径が50nm( 500A >よ
り数μmの大細孔径シリカゲルを得ることができる。In addition, when it is desired to obtain an even larger pore size, the above-mentioned impregnation,
The heat treatment may be repeated, and in this way, it is possible to obtain a large pore size silica gel having an average pore size of 50 nm (500A > several μm), which is the object of the present invention.
リン酸濃度が2重量%未満,又は加熱処理温度が100
℃未満の場合は、加熱による蒸発乾燥程度が小さく、細
孔径の増大効果が小さい。またリン1m濃度が50重量
%を超える場合は過剰の溶解反応が起こり適当でない。Phosphoric acid concentration is less than 2% by weight or heat treatment temperature is 100%
When the temperature is less than 0.degree. C., the degree of evaporation drying due to heating is small, and the effect of increasing the pore diameter is small. Further, if the phosphorus 1m concentration exceeds 50% by weight, excessive dissolution reaction occurs, which is not appropriate.
また加熱処理温度がγOO℃を超える場合は結晶化が起
こり始める。ところでこの加熱処理反応によりシリカゲ
ルの細孔表面に、リン酸けい素及びピロリン酸けい素等
の付着物がつき、そのために褐色に着色する場合がある
。さらにクロマトグラフ的特性にも影響を及ぼす。この
リン酸けい素又は種々の組戒のピロリン酸けい素化合物
を洗い去り活性なシラノール表面とするために希薄塩酸
で洗浄してもよいが、20〜70℃で5〜30重量%の
アンモニア水中、又は5〜20重量%の水酸化フエニル
トリメチルアンモニウム,水酸化ペンジルトリメチルア
ンモニウム,水酸化テトラエチルアンモニウム,水酸化
テトラエタノニルアンモニウム,グアニジン等の強有機
塩基水溶液中で5〜10時間程度撹拌洗浄することによ
り良好な細孔分布の大細孔径シリカゲルを得ることがで
きる。アンモニア水又は強有機塩基水溶液で洗浄処理し
たシリカゲルは、更に2〜5NmM中約90℃で加熱洗
浄することにより細孔分布はよりシャープなものとなり
、シリカゲル自体の強度も大幅に向上しまた不純物量も
大幅に減少する。その他水蒸気による洗浄等も効果があ
りこれらの洗浄法により更に良好物性のものを作ること
ができる。Further, when the heat treatment temperature exceeds γOO°C, crystallization begins to occur. By the way, as a result of this heat treatment reaction, deposits such as silicon phosphate and silicon pyrophosphate adhere to the pore surfaces of the silica gel, which may cause the gel to be colored brown. It also affects the chromatographic properties. In order to wash away this silicon phosphate or various types of silicon pyrophosphate compounds and create an active silanol surface, washing with dilute hydrochloric acid may be used. , or washing with stirring for about 5 to 10 hours in an aqueous solution of a strong organic base such as 5 to 20% by weight of phenyltrimethylammonium hydroxide, penzyltrimethylammonium hydroxide, tetraethylammonium hydroxide, tetraethylammonium hydroxide, guanidine, etc. By doing so, a large pore size silica gel with a good pore distribution can be obtained. Silica gel that has been washed with ammonia water or a strong organic base aqueous solution is further heated and washed at about 90°C in 2 to 5 NmM, so that the pore distribution becomes sharper, the strength of the silica gel itself is greatly improved, and the amount of impurities increases. will also decrease significantly. Other methods such as cleaning with water vapor are also effective, and products with even better physical properties can be produced using these cleaning methods.
以下実施例,比較例により本発明を説明する。The present invention will be explained below with reference to Examples and Comparative Examples.
例中組或%はいずれも重量基準である。All percentages in the examples are based on weight.
実施例1
シリカゲル100(It (平均粒子径7μ(5〜10
μ),細孔容積1.02d/O ,比表面積423Td
/(J .細孔径69A)を15%リン酸溶液200(
Jと混合する。その後残りの上澄は除去し約90℃で1
0時間予備乾燥し、フルイで分散後、300℃で10時
間加熱処理した。Example 1 Silica gel 100 (It) (average particle size 7μ (5-10
μ), pore volume 1.02 d/O, specific surface area 423 Td
/ (J. Pore size 69A) in 15% phosphoric acid solution 200 (
Mix with J. After that, remove the remaining supernatant and heat at about 90℃ for 1
After pre-drying for 0 hours and dispersing with a sieve, the mixture was heat-treated at 300°C for 10 hours.
加熱処理後のシリカゲルを28%N日40口溶液41中
に入れ、約50℃に加温し5時間撹拌し、リン酸けい素
等の反応生成化合物がなくなるまで十分洗浄した。その
後水洗し、更に5N一目α溶液41中で約90℃に加温
し5時間撹拌洗浄した。水洗後120℃で20時間乾燥
し、シリカゲル85gが得られた。その物性は次のごと
くである。The silica gel after the heat treatment was placed in a 28% N solution 41 for 40 days, heated to about 50° C., stirred for 5 hours, and thoroughly washed until reaction products such as silicon phosphate were removed. Thereafter, it was washed with water, and further heated to about 90° C. in 5N Ichimoku α Solution 41 and washed with stirring for 5 hours. After washing with water, it was dried at 120° C. for 20 hours to obtain 85 g of silica gel. Its physical properties are as follows.
〈物性〉
細孔容積 0. 72d/(It比表面積
37尻/g
細孔径 2239A
細孔分布を第1図に示す。原料と比べ非常にシャープと
なる。<Physical properties> Pore volume 0. 72d/(It specific surface area
37 butt/g Pore diameter 2239A The pore distribution is shown in FIG. It becomes very sharp compared to the raw material.
尚これらの測定は水銀ボロシメータにより行った。Note that these measurements were performed using a mercury borosimeter.
〈圧縮破砕強度の測定,リン分の分析〉内径54cm,
高ざ10Cmのステンレス容器に試験シリカゲルを入れ
、圧縮試験機で荷重をかけていき10〜20%破砕し始
める圧力を測定した。シリカゲル中のリン含量とともに
第1表に示す。<Measurement of compressive crushing strength, analysis of phosphorus content> Inner diameter 54cm,
A test silica gel was placed in a stainless steel container with a height of 10 cm, and a load was applied using a compression tester, and the pressure at which it began to fracture by 10 to 20% was measured. Table 1 shows the phosphorus content in the silica gel.
第1表
く圧縮破砕強度の測定,リン分の分析〉第2表
実施例2
実施例1と同じ原料を使用しアンモニア水の代りに10
%水酸化テトラエチルアンモニウム水溶液41を使用し
た以外は全く実施例1と同様にして下記の物性を有する
シリカゲル85gが1qられた。Table 1: Measurement of compressive crushing strength, analysis of phosphorus content〉Table 2: Example 2 Using the same raw materials as Example 1, replacing the ammonia water with 10
1 q of 85 g of silica gel having the following physical properties was prepared in the same manner as in Example 1 except that 41% aqueous solution of tetraethylammonium hydroxide was used.
測定方法は前例と同様である。The measurement method is the same as the previous example.
く物性〉 細孔容積 0. 76dlg 比表面積 397Ff/g 細孔径 2400ム 細孔分布は実施例ノと略同様である。physical properties〉 Pore volume 0. 76dlg Specific surface area 397Ff/g Pore diameter 2400mm The pore distribution is approximately the same as in Example No.
比較例1
シリカゲル100g(平均粒子径15μ(13〜18μ
),細孔容積0.96d/g,比表面積374Trt/
0 ,細孔径103A )を15%リン酸溶液200g
と混合する。その後残りの上澄は除去し、約90℃で1
0時間予備乾燥し、フルイで分故後、150℃で10時
間加熱処理した。次に水41中で約90℃に加温し5時
間洗浄後120℃で20時間乾燥した。得られたシリカ
ゲルは次の様な物性を有するものであった。測定方法は
前例と同様である。Comparative Example 1 100g of silica gel (average particle size 15μ (13-18μ
), pore volume 0.96 d/g, specific surface area 374 Trt/
0, pore size 103A) with 200g of 15% phosphoric acid solution.
Mix with. After that, the remaining supernatant was removed and heated to about 90℃ for 1 hour.
After pre-drying for 0 hours, fractionating with a sieve, heat treatment was performed at 150° C. for 10 hours. Next, it was heated to about 90°C in water 41, washed for 5 hours, and then dried at 120°C for 20 hours. The obtained silica gel had the following physical properties. The measurement method is the same as the previous example.
く物性〉
細孔容積
比表面積
細孔径
〈リン分の分析〉
加熱処理後未洗浄品 P;7.8%
同処理後水洗浄品 p;0.328%水洗のみではリ
ン酸けい素等の洗浄除去できない部分がかなり多く残り
液体クロマトグラフイー用充填剤として使用し難い。Physical properties〉 Pore volume ratio surface area Pore diameter <Analysis of phosphorus content> Unwashed product after heat treatment P: 7.8% Product washed with water after same treatment P: 0.328% Water washing alone does not clean silicon phosphate, etc. It is difficult to use it as a packing material for liquid chromatography because a considerable amount of part remains that cannot be removed.
実施例3
シリカゲル100g(平均粒子径5μ(4〜1μ),細
孔容積0.97rfJ1/U ,比表面積420Td/
g,細孔径68A)を5%リン酸溶液200Qと混合す
る。その後残りの上澄は除去し、約90℃で10時間予
備乾燥し、フルイで分散後、150℃で10時間加熱処
理した。水洗後120℃で20時間乾燥し、得られたシ
リカゲル90gを再度10%リン酸溶液200gと混合
する。Example 3 100 g of silica gel (average particle size 5μ (4-1μ), pore volume 0.97rfJ1/U, specific surface area 420Td/
g, pore size 68A) is mixed with 5% phosphoric acid solution 200Q. Thereafter, the remaining supernatant was removed, pre-dried at about 90°C for 10 hours, dispersed in a sieve, and then heat-treated at 150°C for 10 hours. After washing with water and drying at 120° C. for 20 hours, 90 g of the obtained silica gel is mixed again with 200 g of a 10% phosphoric acid solution.
その後残りの上澄は除去し、約90℃で10時間予備0
.8γml/Ill
209Td/g
456A
乾燥し、フルイで分散後、150℃で10時間加熱処理
した。加熱処理後のシリカゲルを約90℃の52の2N
一日α溶液中で5時間洗浄し、続いて水洗後、120℃
で20時間乾燥し、シリカゲル83gが得られた。その
物性は次の如くである。その測定方法は前例と同様であ
る。Afterwards, remove the remaining supernatant and preheat at approximately 90°C for 10 hours.
.. 8γml/Ill 209Td/g 456A After drying and dispersing in a sieve, it was heat-treated at 150°C for 10 hours. The silica gel after heat treatment is heated to 52 2N at about 90℃.
Washed in α solution for 5 hours, then washed with water, then heated to 120°C.
After drying for 20 hours, 83 g of silica gel was obtained. Its physical properties are as follows. The measurement method is the same as the previous example.
く物性〉
細孔容積 O、63d/g
比表面積 32尻/g
細孔径 1118A
細孔分布を第2図に示す。原料と比べ非常にシャープと
なる。Physical properties> Pore volume O, 63 d/g Specific surface area 32 d/g Pore diameter 1118 A The pore distribution is shown in FIG. It becomes very sharp compared to the raw material.
くリン分の分析,圧縮破砕強度の測定〉加熱処理後未洗
浄品 p:8.8%
同 2N−H(1’溶液で洗浄後
P : 250ppm
圧縮破砕強度の測定値は原料シリカゲルが約500kM
cd,塩酸洗浄後で約800k!II/cIiである。Analysis of silica content, measurement of compressive crushing strength〉 Unwashed product after heat treatment P: 8.8% P: 250 ppm after washing with 2N-H (1' solution) The measured value of compressive crushing strength is that the raw material silica gel is approximately 500 km
cd, about 800k after hydrochloric acid cleaning! II/cIi.
(発明の作用,効果)
以上の説明から明らかなように、本発明法によれば、ご
く低温で且つ簡単なプロセスにより、大細孔径(約50
0人より数μmまでの細孔径)で細孔分布のシャープな
且つ強度の大きなシリカゲルを得ることができる。なお
本発明において使用されるリン酸の代りに他の酸、例え
ば塩m,(iiWl等を使用しても大細孔径のシリカゲ
ルを得ることができない。また一般にシリカゲルの高温
処理において添加物により異なってくるが600〜70
0℃前後以上で結晶化シリカゲルを含むようになり強度
及びクロマトグラフ特性に影響がでてくるようになるた
め、カロ熱処理温度は低温においても十分効果のある本
発明法は極めて有用である。(Operations and Effects of the Invention) As is clear from the above explanation, according to the method of the present invention, large pore diameters (approximately 50
Silica gel with a sharp pore distribution and high strength can be obtained. Note that even if other acids such as salts m, (iiWl, etc.) are used in place of the phosphoric acid used in the present invention, it is not possible to obtain silica gel with a large pore size. Coming is 600-70
The method of the present invention is extremely useful as it is sufficiently effective even at low Calo heat treatment temperatures, as it begins to contain crystallized silica gel at temperatures above about 0°C, which affects its strength and chromatographic properties.
図面はポロシメータで測定した実施例にあけるシリカゲ
ルの細孔分布曲線を示すグラフであり、第1図(A)は
実施例1の原料シリカゲル,第1図(B)は実施例1の
本発明法によるシリカゲル,第2図(A>は実施例3の
原料シリカゲル,第2図(8)は実施例3の本発明によ
るシリカゲルのそれぞれ細孔分布曲線を示す。横軸は細
孔半径,縦軸は容積基準の細孔分布を表わす。The drawings are graphs showing the pore distribution curve of the silica gel in the example measured with a porosimeter, and FIG. 1 (A) is the raw material silica gel of Example 1, and FIG. Figure 2 (A> is the raw material silica gel of Example 3, and Figure 2 (8) is the pore distribution curve of the silica gel according to the present invention in Example 3. The horizontal axis is the pore radius, and the vertical axis is the silica gel according to the present invention. represents the volume-based pore distribution.
Claims (5)
ンモニア水、強有機塩基水溶液又は希薄塩酸にて洗浄処
理することを特徴とする大細孔径シリカゲルの製造法。(1) A method for producing large pore size silica gel, which comprises impregnating porous silica with phosphoric acid, heating it, and then washing it with ammonia water, a strong organic base aqueous solution, or dilute hydrochloric acid.
ンモニア水又は強有機塩基水溶液にて洗浄処理し、次い
で希薄塩酸により洗浄処理することを特徴とする大細孔
径シリカゲルの製造法。(2) A method for producing large pore size silica gel, which comprises impregnating porous silica with phosphoric acid, heating it, washing it with ammonia water or a strong organic base aqueous solution, and then washing it with dilute hydrochloric acid.
又は2に記載の製造法。(3) Claim 1 wherein the heat treatment temperature is 100 to 700°C.
Or the manufacturing method described in 2.
ある請求項1又は2に記載の製造法。(4) The manufacturing method according to claim 1 or 2, wherein the phosphoric acid concentration (P_2O_5) is 2 to 50% by weight.
項1又は2に記載の製造法。(5) The manufacturing method according to claim 1 or 2, wherein the concentration of ammonia water is 5 to 30% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1154865A JPH0699132B2 (en) | 1989-06-16 | 1989-06-16 | Large pore size silica gel manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1154865A JPH0699132B2 (en) | 1989-06-16 | 1989-06-16 | Large pore size silica gel manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0323211A true JPH0323211A (en) | 1991-01-31 |
| JPH0699132B2 JPH0699132B2 (en) | 1994-12-07 |
Family
ID=15593610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1154865A Expired - Fee Related JPH0699132B2 (en) | 1989-06-16 | 1989-06-16 | Large pore size silica gel manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0699132B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5500402A (en) * | 1991-11-08 | 1996-03-19 | Ab Carl Munters | Method for the manufacture of a contact body for the exchange of moisture or heat |
| EP1048615A1 (en) * | 1996-12-30 | 2000-11-02 | Uop Llc | Unimodal, large pore silicas prepared by hydrothermal treatment of silica powders |
| JP2007238426A (en) * | 2006-02-13 | 2007-09-20 | Asahi Glass Si-Tech Co Ltd | Method for adjusting pore properties of porous silica gel with large pore diameter and obtained porous silica gel with large pore diameter |
| WO2013062105A1 (en) | 2011-10-28 | 2013-05-02 | Agcエスアイテック株式会社 | Silica spherical body and affinity carrier |
| JPWO2020202950A1 (en) * | 2019-03-29 | 2020-10-08 |
-
1989
- 1989-06-16 JP JP1154865A patent/JPH0699132B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5500402A (en) * | 1991-11-08 | 1996-03-19 | Ab Carl Munters | Method for the manufacture of a contact body for the exchange of moisture or heat |
| EP1048615A1 (en) * | 1996-12-30 | 2000-11-02 | Uop Llc | Unimodal, large pore silicas prepared by hydrothermal treatment of silica powders |
| JP2007238426A (en) * | 2006-02-13 | 2007-09-20 | Asahi Glass Si-Tech Co Ltd | Method for adjusting pore properties of porous silica gel with large pore diameter and obtained porous silica gel with large pore diameter |
| WO2013062105A1 (en) | 2011-10-28 | 2013-05-02 | Agcエスアイテック株式会社 | Silica spherical body and affinity carrier |
| JPWO2020202950A1 (en) * | 2019-03-29 | 2020-10-08 | ||
| US12371451B2 (en) | 2019-03-29 | 2025-07-29 | Sumitomo Chemical Company, Limited | Inorganic porous carrier and method for producing nucleic acids using same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0699132B2 (en) | 1994-12-07 |
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