JPH032380A - Separation agent at annealing - Google Patents

Separation agent at annealing

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Publication number
JPH032380A
JPH032380A JP13255989A JP13255989A JPH032380A JP H032380 A JPH032380 A JP H032380A JP 13255989 A JP13255989 A JP 13255989A JP 13255989 A JP13255989 A JP 13255989A JP H032380 A JPH032380 A JP H032380A
Authority
JP
Japan
Prior art keywords
annealing
compound
oxide
powder
steel sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13255989A
Other languages
Japanese (ja)
Inventor
Hirotake Ishitobi
石飛 宏威
Yasuo Yokoyama
横山 靖雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP13255989A priority Critical patent/JPH032380A/en
Publication of JPH032380A publication Critical patent/JPH032380A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a separation agent at annealing free from film formation after final box annealing and capably of attaining a high level of magnetic properties of a grain-oriented silicon steel sheet by preparing the above agent by using, as principal component, a mixture composition in which respectively prescribed weight ratios of MgO powder and V compound are incorporated to Al2O3 powder. CONSTITUTION:The above separation agent at annealing is used for the final box annealing for a grain-oriented silicon steel sheet and is constituted by using, as principal component, a mixture composition prepared by incorporating 10-80 pts.wt. of MgO powder and 0.1-5 pts.wt. of V compound expressed in terms of V to 100 pts.wt. of Al2O3 powder. At this time, it is advantageous to regulate the average grain size of the above Al2O3 powder to <=1mum, and further, besides V oxide, V hydroxide, and V compound forming into oxide on heating, sulfide, etc., of V can be applied as the above V compound. By using this separation agent at annealing, the formation or remaining of oxide at the steel sheet surface can be effectively prevented, and a surface having attractive metallic luster can be obtained. Accordingly, the load at the time of succeeding surface smoothing treatment can be remarkably reduced, and further, the purification of S and Se can be satisfactorily attained and electric properties can be markedly improved.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は方向性けい素鋼板の最終箱焼鈍において用い
る焼鈍分離剤に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) This invention relates to an annealing separator used in final box annealing of grain-oriented silicon steel sheets.

方向性けい素鋼板はSi:4wt%(以下単に%と示す
)以下と少量のMnS、 MnSe或はAfNなどの2
次再結晶インヒビターとを含有するけい素鋼素材を熱間
圧延し、焼鈍と1回または2回の冷間圧延工程により最
終製品厚の冷延板とし、次に脱炭を兼ねた1次再結晶焼
鈍を施して、5i02を主成分とするサブスケールを生
成させた後、MgOを主成分とする焼鈍分離剤を水スラ
リーの形で塗布して乾燥させ、ついでコイル状に巻取っ
てから最終箱焼鈍を施しく110) (001)方位の
2次再結晶粒を発達させ、同時に再結晶インヒビターと
しての役割を終えた鋼中のS、 Seなどの有害不純物
を除去するとともに、上記SiO□とMgOを反応させ
て2〜5μm厚のフォルステライト(MgzS+04)
被膜を形成し、ときにはさらにリン酸塩系処理剤の上塗
りによって絶縁コーティングを焼付は形成する、一連の
製造工程を経て製品にされるのが通例である。
The grain-oriented silicon steel sheet contains Si: 4wt% or less (hereinafter simply referred to as %) and a small amount of 2 such as MnS, MnSe or AfN.
A silicon steel material containing a secondary recrystallization inhibitor is hot-rolled, subjected to annealing and one or two cold rolling processes to form a cold-rolled sheet with the final product thickness, and then subjected to a primary re-rolling process that also serves as decarburization. After crystal annealing to produce subscales mainly composed of 5i02, an annealing separator mainly composed of MgO is applied in the form of a water slurry, dried, and then wound into a coil before final production. Box annealing is performed to develop secondary recrystallized grains with 110) (001) orientation, and at the same time remove harmful impurities such as S and Se in the steel that have finished their role as recrystallization inhibitors, and at the same time remove the 2-5μm thick forsterite (MgzS+04) by reacting MgO
The product is typically manufactured through a series of manufacturing steps, including forming a film and sometimes baking an insulating coating with a topcoat of a phosphate-based treatment agent.

このようにして得られた方向性けい素鋼板は、主として
変圧器その他の電気機器の鉄芯として使用し、磁気特性
として磁束密度(Bl。値で代表される)が高く、鉄損
(Lt/s。値で代表される)が低いことが要求される
。とくに省エネルギーの見地から鉄芯内部で電力が熱と
なって無駄なエネルギーとして消費されることを極力避
けるために、鉄損の低減がより重要視されてきている。
The grain-oriented silicon steel sheet obtained in this way is mainly used as the iron core of transformers and other electrical equipment, and has a high magnetic flux density (represented by the Bl value) and iron loss (Lt/ s (represented by the value) is required to be low. In particular, from the standpoint of energy conservation, reducing iron loss is becoming more important in order to avoid as much as possible the electricity that turns into heat inside the iron core and is wasted as energy.

大幅な鉄損低減を達成する方策として、特公昭52−2
4499号公報には最終箱焼鈍後、酸洗により表面生成
物(フォルステライトなどの酸化物)を除去し、次いで
化学研磨又は電解研磨により鏡面状態に仕上げ、又はそ
の鏡面仕上げ面上に金属薄メツキやさらにその上に絶縁
被膜を塗布焼付けする方法、特公昭56−4150号公
報には鏡面仕上げした後酸化物系セラミックス薄膜を蒸
着法等により被成する方法、特開昭61−201732
号公報には鏡面仕上げした後Tiを含むガス雰囲気中で
熱処理してTiNやTiCの極薄張力被膜を形成する方
法及び特開昭61−235514号公報にはさらにTi
NやTic被膜をイオンブレーティング法やイオンイン
プランテーション法で形成する方法、がそれぞれ開示さ
れている。
As a measure to achieve a significant reduction in iron loss,
Publication No. 4499 states that after the final box annealing, surface products (oxides such as forsterite) are removed by pickling, and then chemical polishing or electrolytic polishing is performed to give a mirror-like finish, or the mirror-finished surface is coated with thin metal plating. Furthermore, Japanese Patent Publication No. 56-4150 discloses a method in which an oxide-based ceramic thin film is coated by a vapor deposition method after mirror finishing, and JP-A-61-201732 discloses a method in which an insulating film is applied and baked thereon.
The publication describes a method of forming an ultra-thin tension film of TiN or TiC by performing mirror finishing and then heat treatment in a gas atmosphere containing Ti, and JP-A-61-235514 further describes a method of forming an ultra-thin tensile film of TiN or TiC after mirror finishing.
Methods for forming N and Tic films by ion blating method and ion implantation method are disclosed.

上記した各方法は地鉄表面を極力平滑化(鏡面状態)す
ることによって磁化過程における磁壁移動を容易にしヒ
ステリシス損失低減を意図したもので、通常最終焼鈍の
際に鋼板表面に生成されるフォルステライト被膜などの
酸化物は不要でこれを酸洗で除去する際、地鉄表面は必
然的に荒れるため化学研磨又は電解研磨において10数
μ111厚にも及ぶ深い研磨を施さなければ必要な平滑
面が得られず、よって鋼板の歩留り低下と薬品消耗量の
増大によって著るしいコストの上昇を招き工業化の大き
な障害となっている。
The above-mentioned methods are intended to reduce hysteresis loss by making the surface of the steel as smooth as possible (mirroring state) to facilitate domain wall movement during the magnetization process, and to reduce hysteresis loss. There is no need for oxides such as coatings, and when they are removed by pickling, the surface of the base metal inevitably becomes rough, so unless deep polishing of more than 10 μm in thickness is performed using chemical polishing or electrolytic polishing, the necessary smooth surface cannot be obtained. As a result, the yield of steel sheets decreases and the consumption of chemicals increases, leading to a significant increase in costs and becoming a major hindrance to industrialization.

従って最終箱焼鈍時にフォルステライトなどの除去が困
難な酸化物の形成を十分に抑制して平滑な金属光沢面を
容易に現出させ得るならば、平滑面化処理が始めて工業
的規模で可能となり優れた超低鉄損方向性けい素鋼板の
製造が現実のものとなるため、該要請を満足する焼鈍分
離剤を開発することの意義は大きい。
Therefore, if it is possible to sufficiently suppress the formation of oxides such as forsterite that are difficult to remove during final box annealing, and easily produce a smooth, metallic surface, then smoothing treatment will become possible on an industrial scale for the first time. Since the production of grain-oriented silicon steel sheets with excellent ultra-low core loss will become a reality, it is of great significance to develop an annealing separator that satisfies this requirement.

(従来の技術) さて最終箱焼鈍時にフォルステライト被膜を形成させな
いか或は酸洗で容易に除去できる状態にするために焼鈍
分離剤としてAfzO3粉末を用いることは例えば米国
特許第3785882号明細書等で公知であり、又磁性
にを害な鋼中不純物S、 Seなどを表面に吸い上げて
鋼の純化を強化するために、A Q zo3に蛇紋岩、
滑石などの含水珪酸塩鉱物粉末とSr又はBa化合物及
びCaO又はCa (OH) zを含有する焼鈍分離剤
を用いる方法が特公昭58−44152号公報に及びA
 ffi zosに不活性MgOを配合した焼鈍分離剤
が特開昭59−96278号公報にそれぞれ開示されて
いる。
(Prior Art) The use of AfzO3 powder as an annealing separating agent in order to prevent the formation of a forsterite film during final box annealing or to make it easily removable by pickling is described in, for example, US Pat. No. 3,785,882. In addition, in order to absorb impurities such as S and Se in steel that are harmful to magnetism to the surface and strengthen the purification of steel, serpentinite,
Japanese Patent Publication No. 58-44152 discloses a method using a hydrated silicate mineral powder such as talc, an Sr or Ba compound, and an annealing separator containing CaO or Ca(OH)z.
An annealing separator in which inert MgO is blended with ffi zos is disclosed in JP-A-59-96278.

これらの技術を仔細に検討したところ.Al2O3のみ
ではS、 Seなどの純化能力はほとんどなく、近年の
厳しい磁性改善要求に適合することは難しく、一方上記
した特公昭58−44152号公報に記載の方法では純
化性能は優れているが、最終箱焼鈍時とくにコイル状鋼
板の比較的急加熱される部分の表面には数μI11〜1
0μm程度の局部的な酸化物の焼付きがしばしば観察さ
れ軽酸洗では除去し切れないことがある。この理由は該
分離剤が含水塩やCa(OH)z (CaOも水スラリ
ー中では直ちにCa (OH) zとなる) 、5r(
OH)zなど8.0に冨んだ成分を含んでいるために、
最終箱焼鈍時におけるコイル層間の露点を上昇させ、脱
炭焼鈍時に形成された酸化物層(サブスケール)のSi
O□の浮上を妨げる結果、表面付近に多数の酸化物を残
留させることになるものと考えられる。
We have examined these technologies in detail. Al2O3 alone has almost no ability to purify S, Se, etc., and is difficult to meet the recent strict requirements for improving magnetism.On the other hand, the method described in Japanese Patent Publication No. 58-44152 mentioned above has excellent purification performance, but During final box annealing, the surface of the part of the coiled steel sheet that is heated relatively rapidly has several μI11 to 1
Localized oxide seizures of about 0 μm are often observed and may not be completely removed by light pickling. The reason for this is that the separating agent contains hydrated salts, Ca(OH)z (CaO also immediately becomes Ca(OH)z in water slurry), 5r(
Because it contains components rich in 8.0 such as OH)z,
The dew point between the coil layers during final box annealing is increased, and the Si in the oxide layer (subscale) formed during decarburization annealing is increased.
It is thought that as a result of preventing the floating of O□, a large number of oxides remain near the surface.

発明者等が先に提案した特開昭59−96278号公報
に記載の技術は上記の点の改善を意図してA 1 zo
i100重量部に対し1300°C以上で焼成された比
表面積0.5〜10m”/gの不活性MgOを15〜7
0重量部添加するものであって、このMgOは事実上水
和しないので、分離剤からの820持込みの問題は回避
される。しかしこの技術を実コイルに適用すると、コイ
ルの状態や焼鈍条件によっては鋼中のSやSeの純化が
十分に行われず磁気特性の劣化をまねき易く、一定の品
質を維持することが難しかった。さらに鋼板表面の平滑
化が不十分で、すなわちミクロ的には微細な凹凸や酸化
物のくい込みが問題となる。
The technique described in Japanese Unexamined Patent Publication No. 59-96278, which was previously proposed by the inventors, is A1 zo with the intention of improving the above points.
15 to 7% of inert MgO with a specific surface area of 0.5 to 10 m''/g fired at 1300°C or higher per 100 parts by weight of i.
With 0 parts by weight added, this MgO is virtually unhydrated, thus avoiding the problem of 820 carry-over from the separation agent. However, when this technology is applied to actual coils, depending on the condition of the coil and annealing conditions, S and Se in the steel may not be sufficiently purified, which tends to cause deterioration of magnetic properties, making it difficult to maintain a constant quality. Furthermore, the surface of the steel sheet is not sufficiently smoothed, which causes problems such as microscopic irregularities and penetration of oxides.

(発明が解決しようとする課題) この発明は、最終箱焼鈍後に被膜形成のない、さらにミ
クロ的に微細な凹凸や酸化物のくい込みのきわめて少な
い、金属光沢を有する平滑表面を容易に得ることができ
、かつ磁気特性に有害な鋼中不純物の純化能力に優れる
とともに、優れた磁気特性をも発揮させ得るところの新
規な組成からなる焼鈍分離剤を提供することが目的であ
る。
(Problems to be Solved by the Invention) The present invention makes it possible to easily obtain a smooth surface with metallic luster, which does not form a film after final box annealing, and has very little microscopic unevenness or penetration of oxides. The object of the present invention is to provide an annealing separator having a novel composition that has an excellent ability to purify impurities in steel that are harmful to magnetic properties, and also exhibits excellent magnetic properties.

(課題を解決するための手段) 発明者らは従来技術の持つ上記難点を解決するため、鋼
板と反応して被膜を形成しないこと、鋼中の不純物であ
るS、 Seなどの吸収・純化能力が優れていること、
焼鈍中に鋼板表面を荒らさないことおよび磁気特性を向
上させる作用をそなえることを必要条件とする分離剤成
分について種々検討した結果、A I!、zoi粉末と
MgOおよび■化合物とからなる混合組成物を主成分と
する焼鈍分離剤が上記条件を満足することを見出しこの
発明を導いた。
(Means for Solving the Problems) In order to solve the above-mentioned difficulties of the conventional technology, the inventors have developed a technology that does not react with the steel plate to form a film, and has the ability to absorb and purify impurities such as S and Se in steel. is excellent,
As a result of various studies on separating agent components, which require not to roughen the surface of the steel sheet during annealing and to have the effect of improving magnetic properties, we found that AI! The inventors have discovered that an annealing separator whose main component is a mixed composition consisting of .

すなわちこの発明は、方向性けい素鋼板の最終箱焼鈍に
用いる焼鈍分離剤であって、A1.t03粉末100重
量部に対して、MgO粉末10〜80重量部およびV化
合物を■換算で0.1〜5重量部含有してなる混合組成
物を主成分とする焼鈍分離剤である。
That is, the present invention provides an annealing separator for use in final box annealing of grain-oriented silicon steel sheets, which is A1. This is an annealing separator whose main component is a mixed composition containing 10 to 80 parts by weight of MgO powder and 0.1 to 5 parts by weight of a V compound, based on 100 parts by weight of t03 powder.

また実施に当り、A ffi gos粉末の平均粒径を
1μm以下にすることが有利である。
In practice, it is also advantageous for the average particle size of the A ffi gos powder to be 1 μm or less.

この発明において■化合物とは、■の酸化物、水酸化物
または加熱して酸化物となる化合物のほか、硫化物等も
適用できる。
In this invention, the (2) compound includes not only the oxide, hydroxide, or a compound that becomes an oxide when heated, but also sulfides and the like.

例えば、VzOs+VzOs ・n!IzO,V2O3
,VO2,VO,V(Oll)3゜NH4VO5,VS
、 V2S:l、 V2S5等である。
For example, VzOs+VzOs ・n! IzO, V2O3
,VO2,VO,V(Oll)3゜NH4VO5,VS
, V2S:l, V2S5, etc.

この発明に従う焼鈍分離剤は、とくに最終板厚に圧延さ
れた方向性けい素鋼板に脱炭焼鈍を施し、ついで焼鈍分
離剤を塗布した後、2次再結晶焼鈍および純化焼鈍を含
む最終箱焼鈍を施し、その後研磨により鋼板表面を平滑
面化し、該平滑面上にCVD法、イオンブレーティング
法又はイオンインプランテーション法によりTi、 5
4等の窒化物および/または炭化物やA!等の酸化物な
どからなる極薄張力被膜を被成する一連の工程に有利に
適合する。
The annealing separator according to the present invention is particularly suitable for decarburizing a grain-oriented silicon steel sheet rolled to the final thickness, then applying the annealing separator, and then performing final box annealing including secondary recrystallization annealing and purification annealing. After that, the surface of the steel plate is made smooth by polishing, and Ti, 5.
4 grade nitride and/or carbide or A! It is advantageously suited to a series of processes for forming ultra-thin tensile coatings made of oxides such as

すなわちこの発明に従う焼鈍分離剤を用いることにより
、鋼板表面での酸化物の生成または残留が効果的に防止
され美麗な金属光沢面が得られるので、引続く平滑面化
処理の負荷が大幅に軽減されるとともに、SやSeの純
化が十分に達成され、磁気特性は大幅に向上する。
In other words, by using the annealing separator according to the present invention, the generation or residue of oxides on the steel plate surface can be effectively prevented and a beautiful metallic shiny surface can be obtained, which greatly reduces the burden of subsequent smoothing treatment. At the same time, S and Se are sufficiently purified, and the magnetic properties are greatly improved.

又他の利用分野においても、この発明の焼鈍分離剤を用
いると最終箱焼鈍後の表面に被膜や酸化物がほとんど生
成していないので、得られた鋼板をそのまま或はクロム
酸塩系、クロム酸塩+有機樹脂系及びリン酸塩系などの
コーティングを施した後打抜加工して用いる場合に打抜
工具の摩耗が大幅に軽減されること、及び最終箱焼鈍後
に更に圧延して高周波用変圧器などの用途に適合する極
薄方向性けい素鋼板を製造する場合にも表面性状の優れ
た製品が得られることなどの利点がある。
In addition, in other fields of application, when the annealing separator of the present invention is used, almost no film or oxide is formed on the surface after final box annealing, so the obtained steel plate can be used as is or with chromate-based or chromium Wear of the punching tool is greatly reduced when punching is performed after applying a coating such as an acid salt + organic resin type or phosphate type, and further rolling is performed after the final box annealing. When producing ultra-thin grain-oriented silicon steel sheets suitable for uses such as transformers, there are advantages such as the ability to obtain products with excellent surface properties.

以下この発明を由来するに至った実験結果につき説明す
る。
The experimental results that led to this invention will be explained below.

C: 0.044%、 Si : 3.32%、 Mn
 : 0.06%、S;0.004%、 Se : 0
.020%及びSb : 0.02%を含有する熱延板
を900°Cで3分間の均一化焼鈍後、950°Cの中
間焼鈍をはさんで2回の冷間圧延を行って最終板厚0.
23mmの冷延板とし、次いで、湿水素雰囲気中で82
0℃2分間の脱炭焼鈍を施した。この鋼板から試片を多
数枚切出し、A l zo:+ : 100重量部に対
して、第1図に示す割合のMgOおよびv20.を配合
した焼鈍分離剤をそれぞれ塗布し、最終箱焼鈍に供した
。焼鈍条件はN2中850’C150時間の2次再結晶
過程とそれに続<(I2中1180°C15時間の純化
過程とした。そして焼鈍後の試片の外観、残留酸化物量
(酸素目付量で表わす)および残留Se量につき調べた
結果を、第1図に示す。
C: 0.044%, Si: 3.32%, Mn
: 0.06%, S; 0.004%, Se: 0
.. A hot rolled plate containing 0.020% and Sb: 0.02% was uniformly annealed at 900°C for 3 minutes, then cold rolled twice with an intermediate annealing at 950°C to obtain the final thickness. 0.
A cold-rolled sheet of 23 mm was then rolled at 82 mm in a wet hydrogen atmosphere.
Decarburization annealing was performed at 0°C for 2 minutes. A large number of specimens were cut from this steel plate, and MgO and v20. An annealing separator containing the following was applied to each box and subjected to final box annealing. The annealing conditions were a secondary recrystallization process at 850°C in N2 for 150 hours, followed by a purification process at 1180°C in I2 for 15 hours. ) and the amount of residual Se are shown in FIG.

同図から、v20.はわずかな添加量で強い純化促進力
を示すこと、その作用はMgOの添加とともに増加する
が、MgOが多くなると酸素目付量も増加し表面酸化物
量が増えることがわかる。
From the same figure, v20. It can be seen that a small amount of addition shows a strong ability to promote purification, and that this effect increases with the addition of MgO, but as MgO increases, the oxygen basis weight also increases and the surface oxide amount increases.

また表1に、同様にして得られた試片の磁気特性、地鉄
分析値およびSEM による表面観察結果について示す
Table 1 also shows the magnetic properties, base metal analysis values, and surface observation results by SEM of the specimens obtained in the same manner.

同表から、純化促進剤としてv20.を添加したNO1
2〜6はSeが完全に純化され、また磁気特性が向上す
ることがわかる。すなわちB、。値が向上することから
、v20.は2次再結晶におけるゴス方位の集積度を高
める作用を有することも確かめられた。
From the same table, v20. NO1 with added
It can be seen that in samples Nos. 2 to 6, Se is completely purified and the magnetic properties are improved. That is, B. Since the value improves, v20. It was also confirmed that this has the effect of increasing the degree of accumulation of Goss orientation in secondary recrystallization.

一方純化促進剤としてCa5iOzを添加したNo、 
7は、Seの純化が完全であるにもかかわらず、v20
5添加剤に比し磁気特性が劣っている。そして両者のS
EHによる表面観察結果を比較すると、ミクロ的な凹凸
やピンホール状欠陥はV、OS添加剤が格段に少なく平
滑であった。なおり20.添加剤のうち■が5重量部と
比較的多いNα6は、鋼中のVが増加し磁性かや々劣化
し、表面の点状付着物も若干多めであった。
On the other hand, No. to which Ca5iOz was added as a purification accelerator,
7, although the purification of Se is complete, v20
Magnetic properties are inferior to that of additive No. 5. And both S
Comparing the surface observation results by EH, it was found that microscopic irregularities and pinhole-like defects were smooth with significantly less V and OS additives. Naori 20. Among the additives, Nα6, which had a relatively large amount of ■ at 5 parts by weight, had an increased V in the steel, slightly deteriorated its magnetism, and had slightly more dot-like deposits on the surface.

さらに同表におけるNα2(純化促進剤:VzOs)お
よびNα7(純化促進剤: Ca5iO,)の試片に、
800°Cでの歪取り焼鈍を施し、次いで10%の塩酸
にて室温で15秒の軽酸洗を行ってから、85%H3P
O411+Cr05250gの浴中で70^/dm”の
電流密度で電解研磨を施した後の鉄損について、電解研
磨中に間けつ的に試片を引き出して鉄損を測定した結果
を、研磨深さと対応させて、第2図に示す。また同図に
は、それぞれの測定時の表面観察結果についても併記し
た。
Furthermore, in the specimens of Nα2 (purification accelerator: VzOs) and Nα7 (purification accelerator: Ca5iO,) in the same table,
Strain relief annealing was performed at 800°C, followed by light pickling with 10% hydrochloric acid at room temperature for 15 seconds, followed by 85% H3P.
Regarding the iron loss after electrolytic polishing in a bath of O411 + Cr05250g at a current density of 70^/dm'', we measured the iron loss by pulling out specimens intermittently during electrolytic polishing, and compared the results with the polishing depth. This is shown in Figure 2. Also shown in the figure are the surface observation results during each measurement.

同図から、純化促進剤としてVzOsを添加した焼鈍分
離剤を用いた試片は、同様にCa5iO,を添加した焼
鈍分離剤を用いた試片に比べ、少ない研磨量で平滑化が
達成され、容易に大幅な鉄損低減が実現することがわか
る。
From the same figure, the specimen using the annealing separator containing VzOs as a purification accelerator achieves smoothing with a smaller amount of polishing than the specimen using the annealing separator containing Ca5iO. It can be seen that a significant reduction in iron loss can be easily achieved.

以上の実験結果から、A l zoi  MgOV2O
5の組成になる焼鈍分離剤は純化能力が高く、酸化物の
少ない平滑面が得られ、磁気特性は向上し、したがって
電解研磨や化学研磨による鉄損低減効果を期待できる材
料を得る上で好適な焼鈍分離剤であることがわかる。
From the above experimental results, A l zoi MgOV2O
The annealing separator having the composition No. 5 has high purification ability, provides a smooth surface with less oxides, and improves magnetic properties, and is therefore suitable for obtaining materials that can be expected to have iron loss reduction effects through electrolytic polishing and chemical polishing. It can be seen that it is a good annealing separator.

(作 用) 次にこの発明に従う焼鈍分離剤における各成分の役割り
とその配合割合の限定理由について説明する。
(Function) Next, the role of each component in the annealing separator according to the present invention and the reason for limiting the mixing ratio thereof will be explained.

AfzOsは被膜形成を阻止する主成分で、平均粒径が
10μm以下の粉末として用いるが、とくに1μm以下
の微粒を用いれば酸化物形成の抑制および表面平滑化に
有利である。なぜなら最終箱焼鈍において鋼板表面の被
覆効率が高(表面の酸化が抑えられ、さらにへ2□03
粒子が鋼板表面に押しつけられて生じる表面の凹凸が小
さくなるためである。
AfzOs is a main component that inhibits film formation, and is used as a powder with an average particle size of 10 μm or less, but it is particularly advantageous to suppress oxide formation and smooth the surface if fine particles of 1 μm or less are used. This is because the coating efficiency of the steel plate surface is high in the final box annealing (surface oxidation is suppressed, and
This is because the surface irregularities caused by the particles being pressed against the steel plate surface become smaller.

またMgOはSやSeの純化に必要で、A l 203
100重量部に対して10重量部未満であると純化が不
十分になるたや■化合物の添加量を多くしなくてはなら
ず、すると鋼中への■侵入量が増加し磁気特性および表
面性状の劣化をまねくことから、10重量部以上は必要
である。一方80重量部をこえると表面の酸化物やフォ
ルステライト被膜の形成が無視出来なくなり、この発明
の目的を達しない。使用するMgOの性質としては高温
焼成で製造された不活性MgOでかつ水スラリー中で事
実上水和しないものが、鋼板表面の酸化物や被膜の形成
を防止する上で望ましい。
In addition, MgO is necessary for purifying S and Se, and Al 203
If the amount is less than 10 parts by weight per 100 parts by weight, the purification will be insufficient and the amount of the compound must be increased, which will increase the amount of the compound that penetrates into the steel and affect the magnetic properties and the surface. It is necessary to use 10 parts by weight or more since it causes deterioration of properties. On the other hand, if it exceeds 80 parts by weight, the formation of oxides and forsterite films on the surface cannot be ignored, and the object of the present invention cannot be achieved. Regarding the properties of the MgO used, it is desirable to use inert MgO produced by high-temperature firing and that is virtually not hydrated in the water slurry in order to prevent the formation of oxides or films on the surface of the steel sheet.

■化合物は上述のとおり、SやSeの純化促進剤として
添加するもので、その働きは現在のところ不明であるが
、鋼板と焼鈍分離剤との界面において何らかの触媒作用
を発揮するものと考えられる。
■As mentioned above, the compound is added as a purification accelerator for S and Se, and its function is currently unknown, but it is thought to exert some kind of catalytic action at the interface between the steel sheet and the annealing separator. .

さらに■は、高温においても鋼板に対する腐食因子とな
らないことおよび純化が表面での被膜形成を介すること
なく発揮されること等から、平滑な表面が実現される。
Furthermore, (2) does not become a corrosion factor for steel sheets even at high temperatures, and purification is achieved without forming a film on the surface, so that a smooth surface can be achieved.

またCa化合物などの従来の純化促進剤を用いた場合よ
りも磁気特性が向上するのは、欠陥の少ない平滑面が得
られ、さらに■が2次再結晶においてゴス方位の集積度
を上げる作用を発揮するためと考えられる。
In addition, the magnetic properties are improved compared to the case of using conventional purification promoters such as Ca compounds because a smooth surface with fewer defects is obtained, and (1) also has the effect of increasing the concentration of Goss orientation in secondary recrystallization. This is thought to be for the purpose of demonstrating.

そして■がA f zo3too重量部に対して0.1
重量部未満であると純化が不十分になって良好な磁気特
性が得られず、一方5重量部をこえると鋼中への■侵入
量が多くなって磁気特性が低下する傾向があられれる上
、表面付着物が増加して表面性状が劣化する。したがっ
てV化合物は■換算で、0.1〜5重量部に限定する。
And ■ is 0.1 to A f zo3too parts by weight
If it is less than 5 parts by weight, purification will be insufficient and good magnetic properties will not be obtained, while if it exceeds 5 parts by weight, the amount of penetration into the steel will increase and the magnetic properties will tend to deteriorate. , surface deposits increase and surface quality deteriorates. Therefore, the amount of the V compound is limited to 0.1 to 5 parts by weight in terms of ■.

ここでこの発明の焼鈍分離剤を塗布する脱炭焼鈍後の鋼
板の表面におけるサブスケール量は、最終箱焼鈍後に酸
化物の残留や焼付きを極力残さず優れた金属光沢面を得
るために、脱炭を阻害しない範囲においてできるだけ少
なくすることが好ましい。
Here, the amount of subscale on the surface of the steel sheet after decarburization annealing to which the annealing separator of the present invention is applied is determined by: It is preferable to reduce the amount as much as possible without inhibiting decarburization.

また最終箱焼鈍時の2次再結晶をより完全に行なわしめ
磁気特性を改善するために必要に応じ、焼鈍分離剤にS
、 Se、 Sb、  Vなどの単体またはそれらの化
合物を添加することはこの発明の焼鈍分剤剤に対しても
応用可能である。
In addition, in order to more completely perform secondary recrystallization during final box annealing and improve magnetic properties, S
, Se, Sb, V, etc., or their compounds can be added to the annealing agent of the present invention.

なおこの発明を適用して得られたTi、 Si等の窒化
物および/または炭化物やへ!等の酸化物などからなる
極薄張力被膜を被成した鋼板に、その商品化に際し、表
面に公知の絶縁コーティング、例えばリン酸塩とコロイ
ダルシリカを主成分とするものなどを塗布・焼付けして
電気絶縁性を付与することは勿論可能である。
Furthermore, nitrides and/or carbides of Ti, Si, etc. obtained by applying this invention! When commercializing a steel plate coated with an ultra-thin tensile coating made of oxides such as It is of course possible to provide electrical insulation.

なお方向性けい素鋼板の焼鈍分離剤において■化合物を
添加する例が、例えば特開昭48−8611号および特
公昭49−3740号各公報に記載されている。
Examples of adding a compound (1) to an annealing separator for grain-oriented silicon steel sheets are described in, for example, JP-A-48-8611 and JP-B-Sho 49-3740.

しかしながらいずれも酸化物被膜を有する鋼板を対象と
し、Seの純化、表面平滑化およびゴス方位の集積化に
ついて触れるところはない。
However, all of these target steel sheets with oxide films, and do not mention Se purification, surface smoothing, and Goss orientation integration.

(実施例) 裏立旌上 C: 0.041%、 Si : 3.34%、 Mn
 : 0.07%1MO:0.012%、  S : 
0.003%、 Se : 0.020%及びSb:0
.026%を含有する熱延板を900°C3分間の均−
化焼鈍後、950°Cの中間焼鈍をはさむ2回の冷間圧
延により最終板厚0.23mmの冷延板とした後コイル
に巻き取ることによって、計4つのコイルを作成した0
次いで湿水素雰囲気中で820°C2分間の脱炭焼鈍を
施し、それぞれのコイルに表2に示す配合割合から成る
焼鈍分離剤を水スラリーの状態で塗布し乾燥させた。な
お乾燥後の塗布量は片面当り8g/s+”であった。
(Example) C: 0.041%, Si: 3.34%, Mn
: 0.07% 1MO: 0.012%, S:
0.003%, Se: 0.020% and Sb: 0
.. A hot rolled sheet containing 026% was homogenized at 900°C for 3 minutes.
After chemical annealing, a cold-rolled sheet with a final thickness of 0.23 mm was obtained by cold rolling twice with intermediate annealing at 950°C, and then wound into a coil to create a total of four coils.
Next, decarburization annealing was performed at 820° C. for 2 minutes in a wet hydrogen atmosphere, and each coil was coated with an annealing separator in the form of a water slurry having the proportions shown in Table 2 and dried. The coating amount after drying was 8 g/s+'' per side.

表2 次いでN2中860″C50時間の2次再結晶過程とそ
れに続<H2中1180″CIO時間の純化過程とを含
む最終箱焼鈍を施した。焼鈍後に焼鈍分離剤を水洗除去
し、さらにN、+H,中820°C1分間の連続平坦化
焼鈍(コイルの巻きぐせ除去)を施し、その後コイルの
外巻き、中巻きおよび内巻きの各3箇所から試料を切り
出し、5%HCj2浴40°C15秒の軽酸洗を施した
のち、リン酸にCr03を250g/41!添加した電
解研磨浴中で70°C1100A/dm”の条件で電解
研磨による平滑面化処理を行った。研磨程度は片面当り
3μ醜と一定にした。
Table 2 A final box anneal was then applied which included a secondary recrystallization step of 860''C50 hours in N2 followed by a purification step of <1180''CIO hours in H2. After annealing, the annealing separator was removed by washing with water, and continuous flattening annealing (removal of winding curls in the coil) was performed for 1 minute at 820°C in N, +H, and then three locations each on the outer winding, middle winding, and inner winding of the coil. A sample was cut out from and lightly pickled in a 5% HCj2 bath at 40°C for 15 seconds, and then 250g of Cr03/41! The surface was smoothed by electrolytic polishing at 70° C. and 1100 A/dm in an electrolytic polishing bath containing additives.The degree of polishing was kept constant at 3μ ugliness per side.

ついでこの平滑面化された鋼板をイオンブレーティング
装面にセットし、l0KVのイオン化電圧で3分間のイ
オンブレーティング処理を施し、膜厚0.5μmのTi
Nからなる張力被膜を被成した。
Next, this smoothed steel plate was set on an ion brating surface and subjected to ion blating treatment for 3 minutes at an ionization voltage of 10 KV, and a Ti film with a thickness of 0.5 μm was applied.
A tension coating consisting of N was applied.

各段階、即ち平坦化焼鈍後、電解研磨処理後及びイオン
ブレーティング後に採取した試料につき行った、磁気特
性及び他の調査結果を表3にまとめて示す。
Table 3 summarizes the magnetic properties and other investigation results conducted on samples taken at each stage, ie, after planarization annealing, after electrolytic polishing, and after ion blating.

平坦化焼鈍後の特性に見られるように、この発明に従う
焼鈍分離剤を用いて得られた2コイルは、いずれも全長
にわたり残留酸化物(酸素目付量で表わす)は極めて少
なく均一な金属光沢を示し、純化も完全で、磁気特性も
良好であった。すなわち上記の処理のまま、またはさら
に任意の絶縁コーティングを施せば、打ち抜き加工性お
よび磁気特性の優れた方向性けい素鋼板が得られるわけ
である。
As seen in the characteristics after flattening annealing, both coils obtained using the annealing separator according to the present invention have very little residual oxide (expressed in terms of oxygen basis weight) over the entire length and have a uniform metallic luster. It was completely purified and had good magnetic properties. In other words, a grain-oriented silicon steel sheet with excellent punching workability and magnetic properties can be obtained by carrying out the above treatment or by further applying an optional insulating coating.

とくに粒径が0゜4μIと微粒のA j2 zo*を用
いたコイルNα2は、酸素目付量がより少なく、磁気特
性も良好で、電解研磨処理後には研磨量が片面当り3μ
mと従来に比し大幅に少ないにもかかわらず、0.17
〜0.20W/kgの大きな鉄損低減が達成され、さら
にTiNのイオンブレーティングを施すと、極薄張力被
膜を被成した場合に期待される、極低鉄損領域であるM
1ff/S。値が0.714/kg以下に到達する。
In particular, the coil Nα2, which uses fine particles of A j2 zo* with a particle size of 0°4μI, has a lower oxygen basis weight and good magnetic properties, and after electrolytic polishing, the amount of polishing is 3μ per side.
0.17 m, which is significantly less than the conventional model.
A large reduction in iron loss of ~0.20 W/kg was achieved, and when TiN ion blating was applied, the M
1ff/S. The value reaches 0.714/kg or less.

一方線化促進剤を添加しない、コイル阻3は地鉄中のS
やSeの残留量が多いため磁気特性は低く、酸素目付量
も多かった。また純化促進剤として蛇紋岩およびSr 
(OH) z 、Ca (Oll) 2を添加したコイ
ルNα4は純化は完全であったが、表面酸化物が多いた
め3μm深さの電解研磨では平滑面かえられず、したが
ってイオンブレーティングにて均一な被膜が形成されな
いことから、磁気特性の改善は不十分であった。
On the other hand, the coil suspension 3 without adding a wire forming accelerator is S in the base steel.
The magnetic properties were low due to the large residual amounts of Se and Se, and the oxygen basis weight was also high. Also, serpentine and Sr are used as purification accelerators.
Although the coil Nα4 containing (OH) z and Ca (Oll) 2 was completely purified, it was not possible to obtain a smooth surface by electrolytic polishing to a depth of 3 μm due to the large amount of surface oxide, and therefore it was not possible to obtain a uniform surface by ion blating. Since no film was formed, the improvement in magnetic properties was insufficient.

尖詣尉主 C: 0.063%、 Si : 3.35%、 Mn
 : 0.078%、S: 0.018  %、Se 
: 0.0020%、sol、  八ffi  : 0
.026  %及びN : 0.0072%を含有する
熱延板に1100″Cで3分間の均−化焼鈍後急冷処理
を施し、その後、1回の冷間圧延で0.23++on厚
の冷延板とした後コイルに巻き取ることによって、計3
つのコイルを作成した。次いで湿水素雰囲気中で840
°c2分間の脱炭焼鈍を施し、それぞれのコイルに表4
に示す配合割合から成る焼鈍分離剤を水スラリーの状態
で塗布し乾燥させた。なお乾燥後の塗布量は片面当り9
g/m”であった。
C: 0.063%, Si: 3.35%, Mn
: 0.078%, S: 0.018%, Se
: 0.0020%, sol, 8ffi : 0
.. A hot rolled sheet containing 0.026% and N: 0.0072% was uniformly annealed at 1100''C for 3 minutes and then rapidly cooled, and then cold rolled once to form a cold rolled sheet with a thickness of 0.23++on. After that, by winding it into a coil, a total of 3
Two coils were created. Then, in a wet hydrogen atmosphere, 840
Decarburization annealing was performed for 2 minutes at °C, and each coil was
An annealing separator having the blending ratio shown below was applied in the form of a water slurry and dried. The amount of coating after drying is 9 per side.
g/m”.

表4 次いで、112中20°C/hの速度で1180”Cま
で昇温し10時間保持する最終箱焼鈍を行った。
Table 4 Next, final box annealing was performed in which the temperature was raised to 1180''C at a rate of 20°C/h in 112C and held for 10 hours.

焼鈍後コイルをほどいて焼鈍分解剤を水洗除去し、その
後実施例1と同様の処理を施し、得られ。
After annealing, the coil was unwound and the annealing decomposer was washed away with water, and then the same treatment as in Example 1 was performed to obtain a coil.

た製品について実施例1と同様の評価を行った。The same evaluation as in Example 1 was performed on the product.

各段階のサンプルにつき調査結果を表5に示す。Table 5 shows the survey results for the samples at each stage.

同表から、この発明に従う焼鈍分離剤を用いて得られた
2コイルは、いずれも全長にわたり残留酸化物(酸素目
付量で表わす)は極めて少なく均一な金属光沢を示し、
純化も完全で、磁気特性も良好であった。
From the same table, the two coils obtained using the annealing separator according to the present invention both exhibited uniform metallic luster with very little residual oxide (expressed in oxygen basis weight) over the entire length,
It was completely purified and had good magnetic properties.

一方純化促進剤として蛇紋岩およびSr (OH) !
、 Ca(Oll)2を添加したコイルNα3は純化は
完全であったが、表面酸化物が多く磁気特性も相対的に
劣り、そして平滑面かえられずにイオンブレーティング
にて均一な被膜が形成されないことから、磁気特性の改
善は不十分であった。
On the other hand, serpentine and Sr(OH) as purification accelerators!
Although the coil Nα3 doped with Ca(Oll)2 was completely purified, there were many surface oxides, and the magnetic properties were relatively poor, and the surface could not be smoothed and a uniform film could not be formed by ion blating. Therefore, the improvement in magnetic properties was insufficient.

(発明の効果) この発明の焼鈍分離剤を用いれば、最終箱焼鈍後に被膜
形成のない、すなわち酸化物の少ない清浄かつ平滑な表
面を得ることができ、さらに鋼中不純物の純化能力に優
れているため、最終箱焼鈍後の方向性けい素鋼板の磁気
特性を高水準に到達させることが可能で、後工程の処理
によって超低鉄損の方向性けい素鋼板を提供することが
できる。
(Effects of the Invention) By using the annealing separator of the present invention, it is possible to obtain a clean and smooth surface with no film formation after final box annealing, that is, with less oxides, and it also has an excellent ability to purify impurities in steel. Therefore, the magnetic properties of the grain-oriented silicon steel sheet after the final box annealing can reach a high level, and the grain-oriented silicon steel sheet with ultra-low core loss can be provided by post-processing.

また、表面酸化物が少ないため、打抜き加工用の方向性
けい素鋼板の製造を容易にすることも可能である。
Furthermore, since there are few surface oxides, it is possible to easily manufacture grain-oriented silicon steel sheets for punching.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は焼鈍分離剤におけるv20.およびMgOの添
加量と鋼中Se分析値との関係および、鋼板表面外観に
ついて示したグラフ、 第2図は電解研磨による研磨深さと鉄損−1,7,。 との関係及び、各研磨段階での外観をこの発明を用いた
場合と従来の例とについて示したグラフ、である。 Vと(Taヲ寸ト力ロ!(11@巨) 第2図
Figure 1 shows the annealing separator v20. and a graph showing the relationship between the amount of MgO added and the analysis value of Se in steel, and the appearance of the steel plate surface. Figure 2 shows the polishing depth by electrolytic polishing and the iron loss -1.7. 2 is a graph showing the relationship between the two and the appearance at each polishing stage for a case using the present invention and a conventional example. V and (Tawo size toriro! (11 @ giant) Figure 2

Claims (2)

【特許請求の範囲】[Claims] 1.方向性けい素鋼板の最終箱焼鈍に用いる焼鈍分離剤
であって、Al_2O_3粉末100重量部に対して、
MgO粉末10〜80重量部およびV化合物をV換算で
0.1〜5重量部含有してなる混合組成物を主成分とす
る焼鈍分離剤。
1. An annealing separator used for final box annealing of grain-oriented silicon steel sheets, based on 100 parts by weight of Al_2O_3 powder,
An annealing separator whose main component is a mixed composition containing 10 to 80 parts by weight of MgO powder and 0.1 to 5 parts by weight of a V compound in terms of V.
2.Al_2O_3粉末は平均粒径が1μm以下である
請求項1に記載の焼鈍分離剤。
2. The annealing separator according to claim 1, wherein the Al_2O_3 powder has an average particle size of 1 μm or less.
JP13255989A 1989-05-29 1989-05-29 Separation agent at annealing Pending JPH032380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13255989A JPH032380A (en) 1989-05-29 1989-05-29 Separation agent at annealing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13255989A JPH032380A (en) 1989-05-29 1989-05-29 Separation agent at annealing

Publications (1)

Publication Number Publication Date
JPH032380A true JPH032380A (en) 1991-01-08

Family

ID=15084127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13255989A Pending JPH032380A (en) 1989-05-29 1989-05-29 Separation agent at annealing

Country Status (1)

Country Link
JP (1) JPH032380A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051314A (en) * 2005-08-16 2007-03-01 Nippon Steel Corp Oriented electrical steel sheet with excellent film adhesion and method for producing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007051314A (en) * 2005-08-16 2007-03-01 Nippon Steel Corp Oriented electrical steel sheet with excellent film adhesion and method for producing the same

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