JPH03243787A - Production of metallic mold - Google Patents

Production of metallic mold

Info

Publication number
JPH03243787A
JPH03243787A JP3828190A JP3828190A JPH03243787A JP H03243787 A JPH03243787 A JP H03243787A JP 3828190 A JP3828190 A JP 3828190A JP 3828190 A JP3828190 A JP 3828190A JP H03243787 A JPH03243787 A JP H03243787A
Authority
JP
Japan
Prior art keywords
mold
plating layer
dispersed
master pattern
dispersion plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3828190A
Other languages
Japanese (ja)
Inventor
Yasuhiro Masumoto
康洋 増本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sailor Pen Co Ltd
Original Assignee
Sailor Pen Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sailor Pen Co Ltd filed Critical Sailor Pen Co Ltd
Priority to JP3828190A priority Critical patent/JPH03243787A/en
Publication of JPH03243787A publication Critical patent/JPH03243787A/en
Pending legal-status Critical Current

Links

Landscapes

  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、成形面が凹状をした金型の製造方法に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a mold having a concave molding surface.

〔従来技術とその問題点〕[Prior art and its problems]

例えば合成樹脂射出成形用金型の成形面の表面に、Ti
CやTiN、T1CN などのセラミック皮膜やこれら
のセラミックが分散した分散めっき層などの硬化層をイ
オンブレーティング法などのPVD(物理蒸着)処理や
分散めっき処理で形成すると、これらの硬化層がきわめ
て硬度が高くてその表面が平滑であるので、摩擦力と離
型力が小さくなり、離型時の成形品の損傷率が低下し、
サイクルタイムも短縮できる。また、金型内のメルトか
ら遊離した付着物の発生も少なくなり、付着物の除去作
業が不要でダウンタイムも短縮される。
For example, Ti is applied to the molding surface of a synthetic resin injection mold.
When a hardened layer such as a ceramic film such as C, TiN, or T1CN or a dispersion plating layer in which these ceramics are dispersed is formed by PVD (physical vapor deposition) treatment such as ion blasting or dispersion plating treatment, these hardened layers are extremely Since the hardness is high and the surface is smooth, the frictional force and mold release force are reduced, reducing the damage rate of molded products during mold release.
Cycle time can also be shortened. In addition, the occurrence of deposits released from the melt in the mold is reduced, and there is no need to remove deposits, reducing downtime.

更には、金型内のメルトフローが長くなるので、圧力損
失、温度分布の不均一、肉厚の不揃いなどが救済されて
成形不良が減少し、熱ガスに対する耐食性も大きく改善
される利点がある。
Furthermore, since the melt flow within the mold becomes longer, pressure loss, uneven temperature distribution, uneven wall thickness, etc. are alleviated, reducing molding defects, and corrosion resistance against hot gas is also greatly improved. .

プレス用金型に硬化層を形成した場合にも、冷間溶着が
減少し、粘着摩耗も減少するので、マイクロクラック発
生後の表面脱落が遅くなり、硬化層を形成することによ
り初めて加工が可能になった例も多い。
Even when a hardened layer is formed on the press mold, cold welding and adhesive wear are reduced, which slows down surface shedding after microcracks occur, and processing is only possible after the hardened layer is formed. There are many cases where this has happened.

ところで、イオンブレーティング法などのPvD処理は
、処理品の深い溝や孔内面ないしその孔底面などには磁
場が十分に形成されないので、イオンがこれらの部位に
到達しにくく、所要膜厚の確保が困難であり、@着性も
十分でない不具合がある。また、分散めっき処理、こと
に電解めっきによる処理は、同じく処理品の深い溝や孔
内面ないしその孔底面などにはセラミックを均一に分散
させるのが困難である。従って、成形面が凹状をした金
型(母型)の成形面に分散めっき層などの硬化層を形成
するとき、深い構や孔内面などに十分にコーティングで
きず、前記の利点を十分に得ることができない、このた
め、金型を割り型にし、深い溝や孔などを解消して形成
したり、CVD(化学蒸着)処理で蒸着しているが1割
り型にすると金型コストが高くなり、またCVD処理は
処理品を高温に加熱する必要があり、特殊な場合しか行
われていない。
By the way, in PvD processing such as the ion blating method, a sufficient magnetic field is not formed in the deep grooves of the processed product, the inner surface of the hole, or the bottom surface of the hole, so it is difficult for ions to reach these parts, making it difficult to secure the required film thickness. There are problems in that it is difficult to adhere and the adhesion is not sufficient. Furthermore, in dispersion plating treatment, especially electrolytic plating treatment, it is difficult to uniformly disperse ceramics in deep grooves, inner surfaces of holes, or bottom surfaces of holes in the treated product. Therefore, when forming a hardened layer such as a dispersed plating layer on the molding surface of a mold (mother mold) with a concave molding surface, it is not possible to sufficiently coat deep structures or the inner surfaces of holes, so that the above-mentioned advantages cannot be fully obtained. For this reason, the mold is made into a split mold to eliminate deep grooves and holes, or vapor deposition is performed using CVD (chemical vapor deposition) processing, but if the mold is made into a split mold, the cost of the mold increases. Furthermore, CVD treatment requires heating the treated product to a high temperature and is only carried out in special cases.

〔発明の目的〕[Purpose of the invention]

そこで本発明は、成形面が凹状をした金型の深い溝や孔
内面などにもセラミックが均一に分散した分散めっき層
を形成することができる金型の製造方法を提供すること
を目的とする。
Therefore, an object of the present invention is to provide a mold manufacturing method that can form a dispersed plating layer in which ceramic is uniformly dispersed even in deep grooves and hole inner surfaces of a mold with a concave molding surface. .

〔発明の構成とその作用〕[Structure of the invention and its effects]

本発明の金型の製造方法は、凸状のマスターパターンの
表面にセラミック粒子が分散した分散めっき層を形成す
る工程と、分散めっき層の上に電鋳法などでバックアッ
プシェルを形成する工程と、バックアップシェルが密着
した分散めっき層からマスターパターンを除去する工程
と、バックアップシェルを金型本体の凹部に組み込む工
程を含むことを特徴とするものである。
The mold manufacturing method of the present invention includes a step of forming a dispersed plating layer in which ceramic particles are dispersed on the surface of a convex master pattern, and a step of forming a backup shell on the dispersed plating layer by electroforming or the like. This method is characterized by including the steps of removing the master pattern from the dispersion plating layer to which the backup shell is in close contact, and incorporating the backup shell into the recess of the mold body.

すなわち、成形面が凹状をした金型用のマスターパター
ンは凸状であり、金型の深い溝や孔に対応する部位は突
条や突起になる。このため、電解めっきによる分散めっ
き処理でセラミックが均一に分散した分散めっき層を深
い溝や孔に対応する部位は突条や突起にもコーティング
できる。そして、この分散めっき層にバックアップシェ
ルを密着させ、マスターパターンを除去した後、バック
アップシェルを金型本体の凹部に組み込むので、完成し
た金型の深い溝や孔内面などにもセラミックが均一に分
散した分散めっき層がコーティングされている。
That is, a master pattern for a mold with a concave molding surface is convex, and the portions corresponding to the deep grooves and holes of the mold become ridges and protrusions. For this reason, portions corresponding to deep grooves and holes can also be coated with a dispersion plating layer in which ceramic is uniformly dispersed through dispersion plating treatment using electrolytic plating. Then, after the backup shell is brought into close contact with this dispersion plating layer and the master pattern is removed, the backup shell is incorporated into the recess of the mold body, so the ceramic is evenly distributed even in the deep grooves and inner surfaces of the holes of the completed mold. coated with a dispersed plating layer.

〔実施例〕〔Example〕

以下に図面に示す実施例に基いて本発明を具体的に説明
する。
The present invention will be specifically described below based on embodiments shown in the drawings.

(1)マスターパターン アルミからなるマスターパターンlは、第1図(A)に
示すように、成形面が凹状をした金型の深い孔に対応す
る突起11と金型の溝に対応する環状突起12が形成さ
れており、全体的に凸状をしている。
(1) Master pattern The master pattern l made of aluminum has a protrusion 11 corresponding to a deep hole in a mold having a concave molding surface and an annular protrusion corresponding to a groove in the mold, as shown in FIG. 1(A). 12 is formed and has a convex shape as a whole.

(2)分散めっき層の形成 このマスターパターンlの表面に、第1図CB)に示す
ように1次の条件で分散めっき層2を形成した。
(2) Formation of a dispersion plating layer A dispersion plating layer 2 was formed on the surface of this master pattern 1 under the primary conditions as shown in FIG. 1 (CB).

スラリー スルファミン酸ニッケル 300 g / Q 塩化ニッケル   10 g / Q ホウ酸     40 g / Q エチレングリコール 100w1Q/ff1SiC(1
〜3μm)   1gIQ 浴条件 スラリー    100 g / Q p H4,0 温度       50℃ かかる条件下で20園in、処理すると、膜厚が約20
μ璽の分散めっき層2が形成され、マスターパターンl
の全表面にSiCが均一に分散している。セラミックは
SiCに限られず、TiC,TiN、WC,B4C,M
o、C,Cr5Cxなどいろいろのものを使用できる。
Slurry nickel sulfamate 300 g / Q Nickel chloride 10 g / Q Boric acid 40 g / Q Ethylene glycol 100w1Q/ff1SiC (1
~3μm) 1gIQ Bath condition Slurry 100g/Q pH4.0 Temperature 50°C When treated under these conditions for 20 in., the film thickness was approx.
A μ-shaped dispersion plating layer 2 is formed, and a master pattern l
SiC is uniformly dispersed over the entire surface. Ceramics are not limited to SiC, but include TiC, TiN, WC, B4C, M
Various materials such as o, C, Cr5Cx can be used.

(3)バックアップシェルの形成 次の条件で240時間電鋳すると、第1図(C)に示す
ように、膜厚が約12園園のNiからなるバックアップ
シェル3が形成され、分散めっき層2に密着する。
(3) Formation of backup shell When electroforming is performed for 240 hours under the following conditions, a backup shell 3 made of Ni with a film thickness of about 12 mm is formed as shown in Figure 1 (C), and the dispersion plating layer 2 closely adhere to.

スルファミン酸ニッケル 300 g / Q 塩酸ニッケル  30 g / Q ホウ酸     40 g / Q pH4,0 浴温度     50℃ 電流密度     8A/dボ バックアップシェル3を形成するのは、電鋳法に限られ
ず、溶射法、HIPやSIPなどのプレス法、硬質樹脂
などで行うことができる。
Nickel sulfamate 300 g / Q Nickel hydrochloride 30 g / Q Boric acid 40 g / Q pH 4,0 Bath temperature 50°C Current density 8 A/d The method for forming the back-up shell 3 is not limited to electroforming, but also thermal spraying. , a pressing method such as HIP or SIP, or a hard resin.

(4)マスターパターンの除去と組立 水に、水酸化ナトリウム(30g/Q)に浸漬すると、
アルミからなるマスターパターンlが溶解して除去され
、分散めっき層2が密着したバックアップシェル3が残
る。そして、その外周を所定の寸法に削除して第1図C
D)に示す状態にし、これを、第1図(E)に示すよう
に、金型本体4の凹部に組み込むと金型が完成する。な
お、バックアップシェル3の外周を所定の寸法に削除し
てからマスターパターン1を除去し、しかる後、金型本
体4の凹部に組み込んでもよい。
(4) Removal and assembly of master pattern When immersed in water and sodium hydroxide (30g/Q),
The master pattern l made of aluminum is dissolved and removed, leaving a backup shell 3 to which the dispersion plating layer 2 is adhered. Then, the outer periphery is removed to the specified dimensions and shown in Figure 1C.
D), and the mold is assembled into the recess of the mold body 4, as shown in FIG. 1(E), to complete the mold. Note that the outer periphery of the backup shell 3 may be removed to a predetermined size, the master pattern 1 may be removed, and then the back-up shell 3 may be incorporated into the recessed portion of the mold body 4.

このように、セラミックが均一に分散した分散めっき層
2がマスターパターン1上に形成されるので、完成した
金型の深い孔51や溝52の表面にもセラミックが均一
に分散した分散めっき層2が形成され、成形面の硬度が
きわめて大きい金型にすることができる。
In this way, the dispersion plating layer 2 in which ceramic is uniformly dispersed is formed on the master pattern 1, so that the dispersion plating layer 2 in which ceramic is uniformly dispersed is also formed on the surfaces of the deep holes 51 and grooves 52 of the completed mold. is formed, making it possible to create a mold with an extremely hard molding surface.

〔発明の効果〕〔Effect of the invention〕

以上説明したように1本発明の金型の製造方法は、凸状
のマスターパターンの表面にセラミックが分散した分散
めっき層を形成し、この分散めっき層にバックアップシ
ェルを密着させ、マスターパターンを除去した後、バッ
クアップシェルを金型本体の凹部に組み込むようにした
ので、成形面が凹状をした金型の深い溝や孔内面などに
もセラミックが均一に分散した分散めっき層を形成する
ことができる。
As explained above, the mold manufacturing method of the present invention involves forming a dispersion plating layer in which ceramic is dispersed on the surface of a convex master pattern, bringing a backup shell into close contact with this dispersion plating layer, and removing the master pattern. After that, the backup shell is incorporated into the concave part of the mold body, so it is possible to form a dispersed plating layer in which the ceramic is evenly dispersed even in deep grooves and inside holes of the mold with a concave molding surface. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図(A)〜(E)は本発明実施例の工程説明図であ
る。
FIGS. 1(A) to 1(E) are process explanatory diagrams of an embodiment of the present invention.

Claims (1)

【特許請求の範囲】  凸状のマスターパターンの表面にセラミック粒子が分
散した分散めっき層を形成する工程と、分散めっき層の
上に電鋳法などでバックアップシェルを形成する工程と
、 バックアップシェルが密着したセラミック皮膜からマス
ターパターンを除去する工程と、バックアップシェルを
金型本体の凹部に組み込む工程と、 を含むことを特徴とする金型の製造方法。
[Claims] A step of forming a dispersed plating layer in which ceramic particles are dispersed on the surface of a convex master pattern, a step of forming a backup shell on the dispersed plating layer by an electroforming method, etc. A method for manufacturing a mold, comprising the steps of: removing a master pattern from an adherent ceramic film; and incorporating a backup shell into a recess of a mold body.
JP3828190A 1990-02-21 1990-02-21 Production of metallic mold Pending JPH03243787A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3828190A JPH03243787A (en) 1990-02-21 1990-02-21 Production of metallic mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3828190A JPH03243787A (en) 1990-02-21 1990-02-21 Production of metallic mold

Publications (1)

Publication Number Publication Date
JPH03243787A true JPH03243787A (en) 1991-10-30

Family

ID=12520934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3828190A Pending JPH03243787A (en) 1990-02-21 1990-02-21 Production of metallic mold

Country Status (1)

Country Link
JP (1) JPH03243787A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001020055A1 (en) * 1999-09-10 2001-03-22 Åmic AB A method for the manufacturing of a matrix and a matrix manufactured according to the method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001020055A1 (en) * 1999-09-10 2001-03-22 Åmic AB A method for the manufacturing of a matrix and a matrix manufactured according to the method
US6733682B1 (en) 1999-09-10 2004-05-11 Amic Ab Method for the manufacturing of a matrix and a matrix manufactured according to the method

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