JPH03250425A - Method for manufacturing magnetic recording media - Google Patents

Method for manufacturing magnetic recording media

Info

Publication number
JPH03250425A
JPH03250425A JP2047606A JP4760690A JPH03250425A JP H03250425 A JPH03250425 A JP H03250425A JP 2047606 A JP2047606 A JP 2047606A JP 4760690 A JP4760690 A JP 4760690A JP H03250425 A JPH03250425 A JP H03250425A
Authority
JP
Japan
Prior art keywords
film
electron beam
perpendicular magnetization
polymer film
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2047606A
Other languages
Japanese (ja)
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2047606A priority Critical patent/JPH03250425A/en
Publication of JPH03250425A publication Critical patent/JPH03250425A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain a Co-Cr perpendicular magnetization film at <=100 deg.C film heating temp. by specifying the gas emission amt. from a traveling polymer film during the process of electron beam vapor deposition of the Co-Cr perpendicular magnetization film on the polymer film. CONSTITUTION:The polymer film 5 is released from a roll 6 in a vacuum chamber, introduced along a heater roller 7 to a deposition can 8. A Co-Cr perpendicular magnetization film is formed on the deposition can 8 with a vapor flow from a vapor source 10 heated by an accelerated electron beam 9 and partly shielded with a mask 11 which is provided to limit the incident angle range of the beam. Then the film is rolled up by a roller 12. In this process, traveling direction of the film can be controlled to both directions along the heater roller 7 to degas the film. The amt. of gas emitted from the film repeatedly traveled is specified to 3X10<-4> (Torr.l/sec). Thereby, high-performance perpendicular magnetization film can be obtained by electron beam vapor deposition even at low temp.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は高密度磁気記録に適する垂直磁気記録用の磁気
記録媒体の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing a magnetic recording medium for perpendicular magnetic recording suitable for high-density magnetic recording.

従来の技術 基板面に垂直方向の反平行残留磁化を利用する垂直記録
は、高密度記録に於て高出力が期待されている。この方
式には、Co−Cr膜に代表される垂直磁化可能な膿を
磁気記録層とした磁気記録媒体と、垂直磁界の強い垂直
ヘッドや、従来より広く用いられているリングタイプの
磁気ヘッドとが組み合わせられ、最近では、初期に必要
とされていたμmオーダーのパーマロイ薄膜の代りに、
1oo入程度のパーマロイ膜によってもリングタイプの
磁気ヘッドで高密度記録が達成されることが示され〔例
えばジャーナル オブ ザ マグネティクス ソサエテ
ィ オプ ジャパン(Journalof ths M
agnetics 5ociety of Japan
) Vo113、Supplement ASl、21
〜28(1989)参照〕、実用化に近すいてきている
。媒体を製造する立場でみると、高分子フィルムに直接
C。
Conventional technology Perpendicular recording, which utilizes antiparallel residual magnetization perpendicular to the substrate surface, is expected to produce high output in high-density recording. This system uses a magnetic recording medium with a magnetic recording layer made of perpendicularly magnetizable material such as a Co-Cr film, a perpendicular head with a strong perpendicular magnetic field, and a ring-type magnetic head that has been widely used. have been combined, and recently, instead of the micrometer-order permalloy thin film that was needed in the early days,
It has been shown that high-density recording can be achieved with a ring-type magnetic head even with a permalloy film of about 100 ml (for example, Journal of the Magnetics Society Op Japan).
agnetics 5ociety of Japan
) Vo113, Supplement ASl, 21
28 (1989)], it is getting closer to practical application. From the perspective of a media manufacturer, C is applied directly to the polymer film.

Cr薄膜等の垂直磁化膜を形成したもので実用化できる
のが最も望ましい。又製膜速度も電子ビーム蒸着法かそ
れに近い高速製膜法が最も好ましい。
It is most desirable to be able to put it into practical use by forming a perpendicularly magnetized film such as a Cr thin film. Further, regarding the film forming speed, electron beam evaporation method or a high speed film forming method similar thereto is most preferable.

電子ビーム蒸着法でCo−Cr膜を垂直磁化膜として性
能を高めるには、基板温度を20Q℃以上にすることに
加えて、イオンガンで照射すること等が工夫され〔アイ
イーイーイー トランザクションズ オンマグネティク
7、 (IEEE Transactionson M
agnetics)Vol 、MAG−25、A5.4
183〜4185 (1989) )  ヌパソタリン
グ法で知られる特性に近いものが得られるようになって
きている。
In order to improve the performance of a Co-Cr film using the electron beam evaporation method as a perpendicularly magnetized film, in addition to raising the substrate temperature to 20Q°C or higher, irradiation with an ion gun has been devised. 7, (IEEE Transactionson M
agnetics) Vol, MAG-25, A5.4
183-4185 (1989)) It has become possible to obtain properties close to those known by the Nupa Sotaring method.

発明が解決しようとする課題 しかしながら、電子ビーム蒸着法によシ垂直磁化膜を形
成する方法で良好な特性を得るには、高温に基板をさら
す必要があシ、ポリイミドのような耐熱性の高い高分子
フィルムを使用しなければならない。最近Co−0系垂
直磁化膜による低温化が報告され注目されているが、C
o−Cr垂直磁化膜の高密度記録特性には及ばないこと
から、c。
Problems to be Solved by the Invention However, in order to obtain good characteristics with the method of forming a perpendicularly magnetized film using electron beam evaporation, it is necessary to expose the substrate to high temperatures. Polymer film must be used. Recently, lowering the temperature using Co-0 based perpendicular magnetization film has been reported and attracting attention, but C
c. since it does not match the high-density recording characteristics of the o-Cr perpendicularly magnetized film.

−Cr垂直磁化膜の低温化が要望されている。There is a demand for lowering the temperature of -Cr perpendicularly magnetized films.

本発明は上記した事情に鑑みなされたもので、Co−C
r系垂直磁化膜を100℃以下のフィルム加熱で得られ
るようにした製造方法を提供するものである。
The present invention was made in view of the above circumstances, and
The present invention provides a manufacturing method in which an r-based perpendicular magnetization film can be obtained by heating the film at 100° C. or less.

課題を解決するだめの手段 上記した課題を解決するための手段は、移動する高分子
フィルム上にCo−Cr系垂直磁化膜を電子ビーム蒸着
法で形成する際、高分子フィルムよりのガス放出量を3
 x 1o  −4〔Torr−e滲〕 としたことで
ある。
Means for solving the problem The means for solving the above problem is to reduce the amount of gas released from the polymer film when forming a Co-Cr perpendicularly magnetized film on a moving polymer film by electron beam evaporation. 3
x 1o −4 [Torr-e leakage].

作   用 本発明の磁気記録媒体の製造方法は上記した構成により
、Co−Cr系の結晶成長の初期層が面内磁化となり、
リングヘッドでの記録性能を低下させることを防ぐこと
ができる。即ち、初期に於ても結晶成長に於て重要なC
軸の基板面に対しての垂直配向を乱すガス分子の介在が
無視できるようになるからである。
Function: The method for manufacturing a magnetic recording medium of the present invention has the above-described configuration, so that the initial layer of Co-Cr crystal growth becomes in-plane magnetized.
This can prevent the recording performance of the ring head from deteriorating. In other words, C, which is important in crystal growth even in the initial stage,
This is because the presence of gas molecules that disturb the vertical alignment of the axis with respect to the substrate surface can be ignored.

実施例 以下、図面を参照しながら本発明の実施例について詳し
く説明する。第1図は本発明の製造方法により製造され
る磁気記録媒体の拡大断面図である。第1図で、1はポ
リエチレンテレフタレート。
EXAMPLES Hereinafter, examples of the present invention will be described in detail with reference to the drawings. FIG. 1 is an enlarged sectional view of a magnetic recording medium manufactured by the manufacturing method of the present invention. In Figure 1, 1 is polyethylene terephthalate.

ポリエチレンナフタレート等の高分子フィルムで、耐熱
性ではなくて、機械強度の要請からアラミドフィルムや
ポリイミドフィルムを用いても良い。
A polymer film such as polyethylene naphthalate may be used, but an aramid film or a polyimide film may be used for mechanical strength rather than heat resistance.

2は耐久性を改善する目的で配される微粒子塗布層で、
クレームの高分子フィルムはこの層が配されている時は
、勿論この層を含めてのガス放出量を対象としている。
2 is a fine particle coating layer placed for the purpose of improving durability.
When the polymer film of the claim is provided with this layer, it is of course aimed at the amount of gas released including this layer.

3はCo−Cr 、 Co−Ni−Cr 。3 is Co-Cr, Co-Ni-Cr.

Co−Cr −Nb 、 Co−Cr−Ta 、 Co
−P t−Cr 、 C。
Co-Cr-Nb, Co-Cr-Ta, Co
-Pt-Cr,C.

Cr−Rh等のCo−Cr系垂直磁化膜で、4は保護潤
滑層で、6はバックコート層である。
It is a Co--Cr based perpendicular magnetization film such as Cr--Rh, 4 is a protective lubricating layer, and 6 is a back coat layer.

第2図は、本発明の製造方法を実施するのに用いた蒸着
装置の要部構成図である。第2図で、高分子フィルム6
は巻取軸6(加熱機構をもっている)から送り出され加
熱ローラ了を経由して、蒸着キャン8へと導かれ、加速
電子ビーム9により加熱された蒸発源1oより放射され
る蒸気流の一部の入射角範囲を限定するマスク11を通
過した蒸気流でCo −Cr糸の垂直磁化膜が形成され
その後巻取軸12にて巻き上げられるよう構成される。
FIG. 2 is a block diagram of the main parts of a vapor deposition apparatus used to carry out the manufacturing method of the present invention. In FIG. 2, the polymer film 6
is a part of the vapor flow emitted from the evaporation source 1o, which is sent out from the take-up shaft 6 (which has a heating mechanism), is guided to the evaporation can 8 via the heating roller, and is heated by the accelerated electron beam 9. The structure is such that a perpendicularly magnetized film of Co--Cr yarn is formed by the vapor flow passing through a mask 11 that limits the incident angle range of the yarn, and is then wound up on a winding shaft 12.

第2図で13は真空容器、14は上室で脱ガスと巻取り
を包含し、15の下室は蒸着を行う空間を占めるもので
、16.17は夫々真空排完系、18は電子ビーム発生
器、19はフリーローラーである。
In Figure 2, 13 is a vacuum container, 14 is an upper chamber that includes degassing and winding, 15 is a lower chamber that occupies a space for vapor deposition, 16 and 17 are vacuum exhaust systems, and 18 is an electron The beam generator 19 is a free roller.

第2図で那熱ローラの直径を300とし、抱き角i 3
000  とし蒸着キャンは直径50αとし、直下26
1に蒸発面を配し、以下にのべる実施例と比較例の比較
評価を行った。脱ガスのために加熱ローラに沿ってくり
返し移動できるように巻取り制御は双方向可能とした。
In Figure 2, the diameter of the Nather roller is 300, and the holding angle is i3.
000 The vapor deposition can has a diameter of 50α, and the diameter is 26
The evaporation surface was placed on 1, and comparative evaluations were made between the examples and comparative examples described below. Winding control was made bidirectional so that it could be moved repeatedly along the heating roller for degassing.

蒸着キャン温度は30℃一定とし、加勢ローラを70℃
〜290 ’Cの範囲でコントロールできるようにし、
くり返し走行でガス放出量を可変し、異なるガス放出条
件で、実際にCo−Cr(Cr20.5 wt%)を入
射角10度以内の成分で0.2μm電子ビーム蒸着しく
3800人/5ec)、その上にパーフロロポリエテル
として市販のフオンブリンZ−25Cモンテジソン■製
〕を約60人塗布し、リングヘッド(キャップ長0.1
5μm、i層アモルファヌ型)でビット長0.2μmを
記録し、再生感度を比較した。
The deposition can temperature is kept constant at 30°C, and the auxiliary roller is set at 70°C.
It can be controlled in the range of ~290'C,
The amount of gas released was varied by repeated running, and under different gas release conditions, Co-Cr (Cr20.5 wt%) was actually deposited with a 0.2 μm electron beam with components within an incident angle of 10 degrees (3800 people/5ec). Approximately 60 people applied a commercially available perfluoropolyether (Fuonblin Z-25C made by Montageson) on top of the ring head (cap length 0.1
5 μm, i-layer amorphanu type) with a bit length of 0.2 μm, and the reproduction sensitivity was compared.

高分子フィルムはポリエチレンテレフタレート。The polymer film is polyethylene terephthalate.

ポリフェニレンサルファイド、ポリエチレンナフタレー
ト、ポリエーテルエーテルケトン、アラミド、ポリイミ
ドのフィルムを厚み11μm、平均表面粗さ40人〜4
6人とした。0(dB)は、ポリイミドフィルム上に、
高周波スパッタリング法で100人バーマロン膜薄を配
した後に、同じく高周波スパッタリング法で0.2μm
Co−Cr(Cr20.4wt%)垂直磁化膜を配し、
フオンブリンZ−25を6o入配したテープの再生出力
の値である。第3図に、ガス放出量をパラメータにして
再生出力分布をプロットした結果を示した。
Films of polyphenylene sulfide, polyethylene naphthalate, polyether ether ketone, aramid, and polyimide with a thickness of 11 μm and an average surface roughness of 40 to 4
There were 6 people. 0 (dB) on polyimide film,
After depositing a 100-layer Vermalon film thin film using high-frequency sputtering method, a 0.2-μm thick film was deposited using high-frequency sputtering method.
A Co-Cr (Cr20.4wt%) perpendicular magnetization film is arranged,
This is the value of the playback output of a tape with 6o of Fonblin Z-25 inserted. FIG. 3 shows the results of plotting the reproduction output distribution using the amount of gas released as a parameter.

第3図より3 X 10−’−4〔Torr−1/5e
c)以下ニオさえれば、1(dB)以内に制御できるこ
とがわかる。尚蒸着速度がこの例では3800(八/5
ec)であるが、当然予想されるように1oo入/東〜
500人/要と低速度に移行するに従って、ガス放出の
影響が厳しくなっていき、3X10’−4〔Torr−
l /sec )でも再生出力にバラツキがでてくる。
From Figure 3, 3 X 10-'-4 [Torr-1/5e
c) It can be seen that it can be controlled within 1 (dB) as long as the following values are maintained. Note that the deposition rate is 3800 (8/5) in this example.
ec), but as expected, 1oo entered/East~
As the speed decreases to 500 people/required, the effect of gas release becomes severe, and the speed decreases to 3X10'-4 [Torr-
l/sec), there will be variations in the playback output.

本発明は量産規模を前提としていることから3000(
人/5ec)は下限とみている。その範囲であれば、3
×10 −4〔Torr−l /5ec)に磁界をオイ
ていいといえる。第3図には微粒子塗布層を配したもの
を含んでいないが、それらについても同じ扱いでよい。
Since the present invention is premised on mass production scale, 3000 (
(person/5ec) is considered to be the lower limit. If it is within that range, 3
It can be said that a magnetic field of ×10 −4 [Torr−1 /5 ec) can be applied. Although FIG. 3 does not include those provided with a fine particle coating layer, they may be treated in the same manner.

課題を解決するための別の手段は、電子ビーム蒸着を開
始する側の蒸着速度が300(入/5ec)以下である
ようにしたものである。本発明の磁気記録媒体の製造方
法は、上記した構成によシ初期の結晶性が改良され、ト
ータルで電子ビーム蒸着の高速性を維持しながら垂直磁
化膜の高性能化を図ることができる。第4図は本発明を
実施するのに用いた蒸着開始側の第1次マスクで、入射
角規制の為のキャンに近い位置に設けるマスクとは別に
蒸発源に近い側に設けて、実効的な蒸着速度を図中のP
とdを調整することで可変し、トータルとしてみての平
均蒸着速度が13000 (A/5ec)〜3000 
(人/sec )の範囲で実施し、臨界の300(入/
5ec)  以下になるようにするものである。蒸着開
始側としては、全膜厚の1/1o〜1/30でよい。キ
ャン温度は0℃〜45℃の範囲で、ガヌ放呂量は5x1
o  −4〔Torr−d/5ec) 〜7X10  
’−4〔TorrJ /5ec)の範囲で実施した。C
o−Cr(Cr20.7 wt%)を入射角6度以内で
電子ビーム蒸着し、初期成長層の形成速度をパラメータ
にしてテープの再生出力を第3図と同じ基準で比較した
結果を第5図に示した。Co−、−Cr以外でも同様の
結果であったのと、入射角についても40度以内であれ
ば、本発明の作用効果は維持できることを別に確認した
Another means for solving the problem is to set the evaporation rate on the side where electron beam evaporation is started to be 300 (input/5 ec) or less. In the method for manufacturing a magnetic recording medium of the present invention, the initial crystallinity is improved by the above-described structure, and it is possible to improve the performance of the perpendicularly magnetized film while maintaining the high speed of electron beam evaporation in total. Figure 4 shows the primary mask on the evaporation start side used to carry out the present invention.In addition to the mask provided near the can for regulating the incident angle, it is provided on the side near the evaporation source to effectively The deposition rate is P in the figure.
It can be varied by adjusting
(person/sec), and the critical 300 (person/sec)
5ec) The following shall be achieved. The deposition starting side may be 1/10 to 1/30 of the total film thickness. The can temperature ranges from 0℃ to 45℃, and the amount of Ganu bath is 5x1
o -4 [Torr-d/5ec) ~7X10
'-4 [TorrJ/5ec). C
o-Cr (Cr20.7 wt%) was deposited with an electron beam at an incident angle of 6 degrees or less, and the playback output of the tape was compared using the same criteria as in Figure 3, using the formation rate of the initial growth layer as a parameter. Figure 5 shows the results. Shown in the figure. It was separately confirmed that similar results were obtained with materials other than Co- and -Cr, and that the effects of the present invention could be maintained as long as the incident angle was within 40 degrees.

発明の効果 以上のように本発明によれば、低温であっても電子ビー
ム蒸着法にて高性能な垂直磁化膜を得ることができると
いったすぐれた効果がある。
Effects of the Invention As described above, the present invention has the excellent effect that a high-performance perpendicular magnetization film can be obtained by electron beam evaporation even at low temperatures.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例により得られる磁気記録媒体の
拡大断面図、第2図は本発明の製造方法を実施するのに
用いた蒸着装置の要部構成図、第3図はガス放出量と相
対出力の相関図、第4図は本発明の別の実施例を実施す
るのに用いた装置の要部説明図、第5図は初期形成速度
と相対出力の相関図である。 1.6・・・・・・高分子フィルム、2・・目・・微粒
子塗布層、3・・・・・・Co−0r垂直磁化膜、4・
旧・・保護潤滑層、7・・・・・・加熱ローラ、8・・
口・・蒸着キャン、1゜・・・・・・蒸発源、21・・
山第1次マスク。
FIG. 1 is an enlarged cross-sectional view of a magnetic recording medium obtained by an example of the present invention, FIG. 2 is a diagram showing the main part of a vapor deposition apparatus used to carry out the manufacturing method of the present invention, and FIG. 3 is a gas release FIG. 4 is a diagram showing the main parts of the apparatus used to carry out another embodiment of the present invention, and FIG. 5 is a diagram showing the correlation between initial formation speed and relative output. 1.6... Polymer film, 2... Fine particle coating layer, 3... Co-0r perpendicular magnetization film, 4...
Old...Protective lubricant layer, 7...Heating roller, 8...
Mouth... Evaporation can, 1°... Evaporation source, 21...
Mountain first mask.

Claims (2)

【特許請求の範囲】[Claims] (1)移動する高分子フィルム上にCo−Cr系垂直磁
化膜を電子ビーム蒸着法で形成する際、高分子フィルム
によりのガス放出量を3×10^−^4〔Torr・l
/sec〕とすることを特徴とする磁気記録媒体の製造
方法。
(1) When forming a Co-Cr-based perpendicularly magnetized film on a moving polymer film by electron beam evaporation, the amount of gas released by the polymer film is 3×10^-^4 [Torr・l
/sec].
(2)移動する高分子フィルム上にCo−Cr系垂直磁
化膜を形成する際、電子ビーム蒸着を開始する側の蒸着
速度が300(Å/sec)以下であることを特徴とす
る磁気記録媒体の製造方法。
(2) A magnetic recording medium characterized in that when forming a Co-Cr-based perpendicularly magnetized film on a moving polymer film, the evaporation rate on the side where electron beam evaporation is started is 300 (Å/sec) or less manufacturing method.
JP2047606A 1990-02-28 1990-02-28 Method for manufacturing magnetic recording media Pending JPH03250425A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2047606A JPH03250425A (en) 1990-02-28 1990-02-28 Method for manufacturing magnetic recording media

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2047606A JPH03250425A (en) 1990-02-28 1990-02-28 Method for manufacturing magnetic recording media

Publications (1)

Publication Number Publication Date
JPH03250425A true JPH03250425A (en) 1991-11-08

Family

ID=12779897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2047606A Pending JPH03250425A (en) 1990-02-28 1990-02-28 Method for manufacturing magnetic recording media

Country Status (1)

Country Link
JP (1) JPH03250425A (en)

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