JPH03250677A - Laser device - Google Patents

Laser device

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Publication number
JPH03250677A
JPH03250677A JP4593490A JP4593490A JPH03250677A JP H03250677 A JPH03250677 A JP H03250677A JP 4593490 A JP4593490 A JP 4593490A JP 4593490 A JP4593490 A JP 4593490A JP H03250677 A JPH03250677 A JP H03250677A
Authority
JP
Japan
Prior art keywords
discharge
voltage electrode
potential
side electrode
voltage side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4593490A
Other languages
Japanese (ja)
Inventor
Kiyohisa Terai
清寿 寺井
Koichi Nishida
西田 公一
Eiji Kaneko
英治 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP4593490A priority Critical patent/JPH03250677A/en
Publication of JPH03250677A publication Critical patent/JPH03250677A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To realize stable and highly dense discharge between discharge electrodes even if a discharge gap is wide and laser gas pressure is high by a method wherein potential on a lower voltage electrode and on a higher voltage electrode is determined by stray capacitance based on wiring of a laser device and potential between the high voltage electrode and the low voltage electrode is set at ground potential. CONSTITUTION:Capacitors C8, C9 are inserted into a load circuit wherein potential on a higher voltage electrode 16a and on a lower voltage electrode 16b is determined by stray capacitance of a device. High frequency power generated on a high frequency oscillating part 20 is supplied via transformer coupling 22 to the higher voltage electrode 16a and the lower voltage electrode 16b of a discharge part. Since there is ground potential between potential Va, Vb of the higher voltage electrode 16a and the lower voltage electrode 16b, high frequency discharge 23 is generated between dielectric bodies 7a, 7b even if a discharge gap is wide or laser gas pressure is high. Therefore stable and highly dense discharge can be realized between the discharge electrodes.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、高電圧側及び低電圧側電極間に、高周波電源
により高周波電圧を印加し、誘電体を隔てて高周波放電
を行うレーザ装置に関するものである。
[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention applies a high-frequency voltage between high-voltage side and low-voltage side electrodes using a high-frequency power source, and generates a high-frequency discharge across a dielectric. This invention relates to a laser device that performs.

(従来の技術) 各種レーザ加工に使用される、レーザガス圧力数10t
orr〜200torr程度で高周波放電を発生させて
レーザ励起を行うレーザ装置の一例を第4図に示した。
(Conventional technology) Laser gas pressure number 10 tons used for various laser processing
FIG. 4 shows an example of a laser device that performs laser excitation by generating high-frequency discharge at about 200 torr.

なお、第4図は、高周波電源とレーザ発振部を表してい
る。即ち、高周波電源1は励振部2とパワーアンプ部3
より構成されており、励振部2で発生した周波数f(通
常13゜56 HM z±2KHz)の高周波電力は、
パワーアンプ部3により増幅され、特、性インピーダン
ス50Ωの同軸ケーブル4によりインピーダンス整合を
とるための整合器5を経てレーザ放電部の高電圧側電極
6aに供給される。一方、低電圧側電極6bは接地され
ている。
Note that FIG. 4 shows a high frequency power source and a laser oscillation section. That is, the high frequency power supply 1 has an excitation section 2 and a power amplifier section 3.
The high frequency power of the frequency f (usually 13°56 HM z±2KHz) generated in the excitation part 2 is
The signal is amplified by the power amplifier section 3, and is supplied to the high-voltage side electrode 6a of the laser discharge section through a matching box 5 for impedance matching using a coaxial cable 4 having a characteristic impedance of 50 Ω. On the other hand, the low voltage side electrode 6b is grounded.

また、高電圧側電極6aと低電圧側電極6b間に供給さ
れた高周波電圧は、各電極に隣接して配設された誘電体
7a及び7bを介してレーザガスに印加され、高周波放
電8を発生させる。なお、図には示していないが、高周
波放電8によるガス温度上昇を防ぐため、誘電体7a、
7b間にはレーザガスを流している。さらに、前記高周
波放電8を挟んで、反射鏡9と部分反射鏡10を配置し
てレーザ共振器を構成することにより、レーザ発振を行
い、レーザ光11を得るように構成されている。なお、
レーザ光11を変調する必要があるときには、励振部2
に外部よりパルス変調信号12を送ればよい。
Further, the high frequency voltage supplied between the high voltage side electrode 6a and the low voltage side electrode 6b is applied to the laser gas via dielectrics 7a and 7b arranged adjacent to each electrode, generating a high frequency discharge 8. let Although not shown in the figure, in order to prevent the gas temperature from rising due to the high frequency discharge 8, the dielectric material 7a,
Laser gas is flowing between 7b. Furthermore, by arranging a reflecting mirror 9 and a partial reflecting mirror 10 with the high-frequency discharge 8 in between to form a laser resonator, laser oscillation is performed and laser light 11 is obtained. In addition,
When it is necessary to modulate the laser beam 11, the excitation unit 2
It is sufficient to send the pulse modulation signal 12 from the outside.

一方、パワーアンプ部3は、高周波信号を増幅するため
の真空管13、出力インピーダンス調整用コンデンサC
,、C2及びインダクタンスL1より構成され、前記真
空管13には、真空管13を動作させるための直流の高
電圧が印加されており、さらに、この直流分を高周波出
力側に通さないためのコンデンサC3が接続されている
。また、インピーダンス整合をとるための整合器5は逆
り形であり、可変コンデンサC4とインダクタンスL2
より構成されている。
On the other hand, the power amplifier section 3 includes a vacuum tube 13 for amplifying high frequency signals, and a capacitor C for adjusting output impedance.
, C2 and an inductance L1, a high DC voltage is applied to the vacuum tube 13 to operate the vacuum tube 13, and a capacitor C3 is further provided to prevent this DC from passing through to the high frequency output side. It is connected. Furthermore, the matching box 5 for impedance matching is of the reverse type, and has a variable capacitor C4 and an inductance L2.
It is composed of

(発明が解決しようとする課題) しかしながら、上記の様な構成を有する従来のレーザ装
置においては、以下に述べる様な解決すべき課題があっ
た。
(Problems to be Solved by the Invention) However, in the conventional laser device having the above configuration, there were problems to be solved as described below.

即ち、2つの誘電体7a、7b間の距離を延ばして放電
ギャップの間隔を広くとった場合、または、レーザガス
圧力を高くした場合に、放電部に発生する高周波放電8
が、放電部下流方向にとんでしまうといった欠点があっ
た。
That is, when the distance between the two dielectrics 7a and 7b is increased to widen the discharge gap, or when the laser gas pressure is increased, the high-frequency discharge 8 generated in the discharge section
However, there was a drawback that the discharge part was blown away in the downstream direction.

この点を詳細に説明すると、第2図に示した様に、放電
部は高電圧側電極6a、低電圧側電極6b1誘電体7a
、7bと、各誘電体7a、7bを固定するための絶縁体
17a、17bより構成されている。ここで、低電圧側
電極6bは接地されており、その電位vbはOVである
。また、この放電部は金属製のレーザ容器18の一部と
して構成され、誘電体7a、7bで挟まれた放電ギャッ
プにはレーザガス流19が供給されている。
To explain this point in detail, as shown in FIG.
, 7b, and insulators 17a, 17b for fixing the respective dielectrics 7a, 7b. Here, the low voltage side electrode 6b is grounded, and its potential vb is OV. Further, this discharge section is constructed as a part of a metal laser container 18, and a laser gas flow 19 is supplied to a discharge gap sandwiched between dielectrics 7a and 7b.

この様な従来のレーザ装置においては、高電圧側電極6
a、低電圧側電極6bに高周波電圧V。
In such a conventional laser device, the high voltage side electrode 6
a, high frequency voltage V is applied to the low voltage side electrode 6b.

を印加して高密度高周波放電8を発生させようとすると
、高周波放電8は誘電体7aとレーザ容器18間で起き
てしまう。これは、低電圧側電極6bの電位が接地電位
であるため、高周波放電が起こる際に、低電圧側の誘電
体7bの放電部側の電位が、高電圧側電極6aの電位よ
りとなるので、接地電位であるレーザ容器18の方に高
周波放電8が飛びやすくなるためである。その結果、放
電部において安定した放電が得られず、レーザ出力も低
下するといった欠点があった。
If an attempt is made to generate a high-density high-frequency discharge 8 by applying , the high-frequency discharge 8 will occur between the dielectric 7a and the laser container 18. This is because the potential of the low-voltage side electrode 6b is the ground potential, so when a high-frequency discharge occurs, the potential of the discharge part side of the low-voltage side dielectric 7b becomes higher than the potential of the high-voltage side electrode 6a. This is because the high-frequency discharge 8 is more likely to fly toward the laser container 18, which is at ground potential. As a result, there were disadvantages in that stable discharge could not be obtained in the discharge section and the laser output was also reduced.

本発明は、上記の様な従来技術の欠点を解消するために
提案されたもので、その目的は、広い放電ギャップをと
ったり、高いレーザガス圧力においても、放電電極間で
安定した高密度放電が実現でき、且つ、高効率でコンパ
クトなレーザ装置を提供することにある。
The present invention was proposed to eliminate the above-mentioned drawbacks of the conventional technology, and its purpose is to realize stable high-density discharge between discharge electrodes even with a wide discharge gap and high laser gas pressure. The object of the present invention is to provide a highly efficient and compact laser device.

[発明の構成コ (課題を解決するための手段) 本発明は、高電圧側電極と低電圧側電極間に高周波電源
によって高周波電圧を印加し、誘電体を隔てて高周波放
電を発生するレーザ装置において、低電圧側電極の電位
と高電圧側電極の電位が、レーザ装置の配線に基づく浮
遊容量によって決まるように構成し、高電圧側電極と低
電圧側電極の間が接地電位となるようにしたことを特徴
とするものである。
[Structure of the Invention (Means for Solving the Problems) The present invention provides a laser device that applies a high-frequency voltage between a high-voltage side electrode and a low-voltage side electrode using a high-frequency power supply, and generates a high-frequency discharge across a dielectric. In this case, the potential of the low-voltage side electrode and the potential of the high-voltage side electrode are determined by the stray capacitance based on the wiring of the laser device, and the potential between the high-voltage side electrode and the low-voltage side electrode is set to the ground potential. It is characterized by the fact that

(作用) 本発明のレーザ装置によれば、高電圧側電極と低電圧側
電極の間が接地電位となるので、両電極間に発生する高
周波放電が、放電電極から接地電位であるレーザ容器側
へ飛ぶことを防止でき、誘電体間で安定した高密度の放
電を発生することができる。
(Function) According to the laser device of the present invention, the ground potential is set between the high voltage side electrode and the low voltage side electrode, so that the high frequency discharge generated between the two electrodes is transferred from the discharge electrode to the laser container side which is at the ground potential. It is possible to prevent the discharge from flying to the surface, and to generate a stable, high-density discharge between the dielectric materials.

(実施例) 以下、本発明の一実施例を第1図に基づいて具体的に説
明する。なお、第4図に示した従来形と同一の部材には
同一の符号を付して、説明は省略する。
(Example) Hereinafter, an example of the present invention will be specifically described based on FIG. Incidentally, the same members as those of the conventional type shown in FIG. 4 are given the same reference numerals, and explanations thereof will be omitted.

本実施例のレーザ装置は、第1図に示した様に、自励式
高周波電源とレーザ発振部とから構成されている。即ち
、高周波電源の高周波発振部20は、高周波をトランス
結合により放電負荷側に取出しやすいコルピッツ回路で
構成され、高周波を発振するための真空管(三極管)2
1、発振周波数fを決めるコンデンサC5,C6及び負
荷との結合トランスを兼ねたインダクタンスL3より構
成されている。また、真空管21には、真空管を動作さ
せるための直流の高電圧が印加されており、さらに、こ
の直流分を高周波出力側に通さないためのコンデンサC
7が取付けられている。
As shown in FIG. 1, the laser device of this embodiment is composed of a self-excited high frequency power source and a laser oscillation section. That is, the high-frequency oscillation section 20 of the high-frequency power supply is composed of a Colpitts circuit that easily extracts high frequencies to the discharge load side by transformer coupling, and includes a vacuum tube (triode) 2 for oscillating high frequencies.
1. It is composed of capacitors C5 and C6 that determine the oscillation frequency f, and an inductance L3 that also serves as a coupling transformer with the load. Further, a high DC voltage is applied to the vacuum tube 21 to operate the vacuum tube, and a capacitor C is also applied to prevent this DC component from passing through to the high frequency output side.
7 is installed.

なお、このとき、高周波発振部20で発生する発振周波
数fは、 f=1/2πJ]/L3・(1/C+、 + 1 /C
2)・・・(1)であり、放電負荷の変動に伴って発振
周波数が変化して、不整合状態による反射電力を和らげ
る働きがある。また、本実施例の場合、レーザ光11を
パルス変調するときには、真空管21のグリッドに外部
よりパルス変調信号12を送れば良い。
In addition, at this time, the oscillation frequency f generated in the high frequency oscillator 20 is f=1/2πJ]/L3・(1/C+, + 1/C
2)...(1), the oscillation frequency changes with fluctuations in the discharge load, and has the effect of softening the reflected power due to the mismatch state. Further, in the case of this embodiment, when pulse modulating the laser beam 11, it is sufficient to send the pulse modulation signal 12 to the grid of the vacuum tube 21 from the outside.

さらに、負荷側回路中には、コンデンサC8,C9が挿
入されており、これらのコンデンサC8゜C9により、
高電圧側電極16a及び低電圧側電極16bの電位が、
装置の浮遊容量によって決まるように構成されている。
Furthermore, capacitors C8 and C9 are inserted in the load side circuit, and these capacitors C8°C9
The potential of the high voltage side electrode 16a and the low voltage side electrode 16b is
The configuration is determined by the stray capacitance of the device.

また、前記高周波発振部20で発生した周波数f(周波
数変動幅的±10%)の高周波電力は、トランス結合2
2を介してレーザ放電部の高電圧側電極16aと低電圧
側電極16bに供給されるように構成されている。ここ
で、トランス結合22は、ある放電入力条件において(
例えば、最大放電入力)、高周波発振部20の出力イン
ピーダンスとレーザ放電部のインピーダンスとの整合を
とることができるように、1次側と2次側の巻数比を調
整している。
Further, the high frequency power of the frequency f (±10% in terms of frequency fluctuation range) generated in the high frequency oscillator 20 is transmitted to the transformer coupling 2
2 to the high voltage side electrode 16a and low voltage side electrode 16b of the laser discharge section. Here, under a certain discharge input condition, the transformer coupling 22 (
For example, the turn ratio of the primary side and the secondary side is adjusted so that the output impedance of the high frequency oscillation section 20 and the impedance of the laser discharge section can be matched.

この様な構成を有する本実施例のレーザ装置における作
用について以下に述べる。
The operation of the laser device of this embodiment having such a configuration will be described below.

即ち、本実施例のレーザ装置においては、高電圧側電極
16a、低電圧側電極1.6 bの電位Va。
That is, in the laser device of this embodiment, the potential Va of the high voltage side electrode 16a and the low voltage side electrode 1.6b.

vb(va−vb−Vo)の間に接地電位があるため、
従来よりも放電ギャップの広い場合、もしくはレーザガ
ス圧力が高い場合でも、高周波放電23は、第3図に示
した様に、誘電体7a、7bの間で発生する。これは、
第2図に示した従来型の場合に、高周波放電が接地電位
であるレーザ容器18の方に飛びやすかったのと異なり
、電位的に誘電体7a、7b間に起こりやすくなってい
るからである。
Since there is a ground potential between vb (va-vb-Vo),
Even when the discharge gap is wider than before or when the laser gas pressure is higher, the high frequency discharge 23 is generated between the dielectrics 7a and 7b as shown in FIG. 3. this is,
This is because, unlike in the case of the conventional type shown in FIG. 2, where the high-frequency discharge was more likely to fly toward the laser container 18, which is at ground potential, it is more likely to occur between the dielectrics 7a and 7b due to the potential. .

この様に、本実施例によれば、高電圧側電極と低電圧側
電極の間を接地電位となるようにすることによって、広
い放電ギャップ間隔や、高いレーザガス圧力となる条件
下においても、放電電極間で安定した高密度放電が実現
でき、且つ高効率でコンパクトなレーザ装置を得ること
ができる。
In this way, according to this embodiment, by setting the ground potential between the high-voltage side electrode and the low-voltage side electrode, the discharge can be maintained even under conditions of a wide discharge gap interval and high laser gas pressure. A stable high-density discharge can be realized between the electrodes, and a highly efficient and compact laser device can be obtained.

なお、本発明は上述した実施例に限定されるものではな
く、レーザ発振部に配設するコンデンサC8,C7とし
て固定式のコンデンサを用いたが、少なくともどちらか
一方を可変式コンデンサとしてもよい。また、コンデン
サC8,C9を用いずに、第1図に示したトランス結合
22の位置で、−次側に対して二次側を浮かしても良い
Note that the present invention is not limited to the embodiments described above, and although fixed capacitors are used as the capacitors C8 and C7 disposed in the laser oscillation section, at least one of them may be a variable capacitor. Alternatively, the secondary side may be floated relative to the negative side at the position of the transformer coupling 22 shown in FIG. 1 without using the capacitors C8 and C9.

[発明の効果] 以上述べた様に、本発明によれば、低電圧側電極の電位
と高電圧側電極の電位が、レーザ装置の配線に基づく浮
遊容量によって決まるように構成し、高電圧側電極と低
電圧側電極の間が接地電位となるようにすることによっ
て、広い放電ギャップをとったり、高いレーザガス圧力
においても、放電電極間で安定した高密度放電が実現で
き、且つ、高効率でコンパクトなレーザ装置を提供する
ことができる。
[Effects of the Invention] As described above, according to the present invention, the potential of the low-voltage side electrode and the potential of the high-voltage side electrode are determined by the stray capacitance based on the wiring of the laser device, and the high-voltage side By setting the ground potential between the electrode and the low-voltage side electrode, stable high-density discharge can be achieved between the discharge electrodes even with a wide discharge gap or high laser gas pressure, and it is highly efficient and compact. It is possible to provide a laser device with a wide range of functions.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のレーザ装置の一実施例を示す回路図、
第2図は従来例の放電部付近の放電状態を示す拡大断面
図、第3図は本実施例の放電部付近の放電状態を示す拡
大断面図、第4図は従来のレーザ装置の一例を示す回路
図である。 1・・・高周波電源、2・・・励振部、3・・・パワー
アンプ部、4・・・同軸ケーブル、5・・・整合器、6
a・・・高電圧側電極、6b・・・低電圧側電極、7a
、7b・・・誘電体、8・・・高周波放電、9・・・反
射鏡、10・・・部分反射鏡、11・・・レーザ光、1
2・・・パルス変調信号、13・・・真空管、16a・
・・高電圧側電極、16b・・・低電圧側電極、20・
・・高周波発振部、21・・・真空管、22・・・トラ
ンス結合、23・・・高周波放電。 第 2 図 第 図
FIG. 1 is a circuit diagram showing an embodiment of the laser device of the present invention;
FIG. 2 is an enlarged sectional view showing the discharge state near the discharge section of the conventional example, FIG. 3 is an enlarged sectional view showing the discharge state near the discharge section of this embodiment, and FIG. 4 is an example of the conventional laser device. FIG. DESCRIPTION OF SYMBOLS 1... High frequency power supply, 2... Excitation part, 3... Power amplifier part, 4... Coaxial cable, 5... Matching box, 6
a...High voltage side electrode, 6b...Low voltage side electrode, 7a
, 7b... dielectric, 8... high frequency discharge, 9... reflecting mirror, 10... partial reflecting mirror, 11... laser light, 1
2...Pulse modulation signal, 13...Vacuum tube, 16a.
...High voltage side electrode, 16b...Low voltage side electrode, 20.
...High frequency oscillation section, 21... Vacuum tube, 22... Transformer coupling, 23... High frequency discharge. Figure 2

Claims (1)

【特許請求の範囲】 高電圧側電極と低電圧側電極間に高周波電源によって高
周波電圧を印加し、誘電体を隔てて高周波放電を発生す
るレーザ装置において、 前記低電圧側電極の電位と高電圧側電極の電位が、レー
ザ装置の配線に基づく浮遊容量によって決まるように構
成し、前記高電圧側電極と低電圧側電極の間が接地電位
となるようにしたことを特徴とするレーザ装置。
[Scope of Claims] A laser device in which a high frequency voltage is applied between a high voltage side electrode and a low voltage side electrode by a high frequency power supply to generate a high frequency discharge across a dielectric, the potential of the low voltage side electrode and the high voltage A laser device characterized in that the potential of the side electrode is determined by a stray capacitance based on wiring of the laser device, and the potential between the high voltage side electrode and the low voltage side electrode is set to a ground potential.
JP4593490A 1990-02-28 1990-02-28 Laser device Pending JPH03250677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4593490A JPH03250677A (en) 1990-02-28 1990-02-28 Laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4593490A JPH03250677A (en) 1990-02-28 1990-02-28 Laser device

Publications (1)

Publication Number Publication Date
JPH03250677A true JPH03250677A (en) 1991-11-08

Family

ID=12733097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4593490A Pending JPH03250677A (en) 1990-02-28 1990-02-28 Laser device

Country Status (1)

Country Link
JP (1) JPH03250677A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177692A (en) * 1984-02-24 1985-09-11 Mitsubishi Electric Corp Laser oscillator
JPS6422082A (en) * 1987-07-17 1989-01-25 Fanuc Ltd High frequency discharge excitation laser equipment
JPS6422081A (en) * 1987-07-17 1989-01-25 Fanuc Ltd High frequency discharge excitation laser equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60177692A (en) * 1984-02-24 1985-09-11 Mitsubishi Electric Corp Laser oscillator
JPS6422082A (en) * 1987-07-17 1989-01-25 Fanuc Ltd High frequency discharge excitation laser equipment
JPS6422081A (en) * 1987-07-17 1989-01-25 Fanuc Ltd High frequency discharge excitation laser equipment

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