JPH0325400Y2 - - Google Patents

Description

[Detailed description of the invention] [Industrial application field] The present invention applies photoresist to a photomask substrate in which a light-shielding film is coated on a transparent glass plate, and a semiconductor oxide film is coated on a semiconductor substrate. After coating the photoresist, the photoresist is exposed in a predetermined pattern.The spray equipment is used for the development process, etching process, etc. in the pattern forming process of these substrates, and it can be easily applied regardless of changes in the substrate size. Moreover, the ejected liquid can be uniformly spread over the entire surface of the substrate.

[Conventional technology]

Conventionally, this type of spraying device has four different sizes (e.g., 6, 5, 4, and 3 inches) of the substrate 1, as shown in FIGS. 5 to 7.
It is equipped with supports 2 that support the corners. That is,
This support 2 is the largest (6 inch square) board 1
The contact surface 3 with the end surface 1a of the board and the mounting surface 4 on which the bottom part is placed constitute a support section for a 6-inch square, and as the substrate size becomes smaller, the contact surface 5 The supporting portion, which is composed of the mounting surface 6, the contact surface 7, the mounting surface 8, and the contact surface 9 and the mounting surface 10, is formed to become deeper in a stepped manner. The support 2 is attached to the rotating shaft 11 via the coupling 12, and is rotated at a constant speed (developing,
During etching: 100 to 500 r.p.m), and in this rotating state, a jetting liquid 15 such as a developer or etching liquid is sprayed (sprayed) from a nozzle 14 installed on the ceiling of the chamber 13 toward the substrate 1. ) to be done. At this time, when the substrate 1 is stationary, the ejected liquid 15 is directed diagonally to the substrate 1 as shown by the broken line in FIG. The center of the region 16 coincides with the rotation center axis l),
By rotating the substrate 1, the ejected liquid 15 is spread uniformly over the entire surface of the substrate 1.

[Problem that the invention attempts to solve]

However, in such a conventional spray device, when the size of the substrate 1 is changed and, for example, the smallest substrate 1' is installed as shown in FIG. Since the direction is different, even if the nozzle 14 is directed to the center of the largest substrate 1, it will not be directed to the center of the small substrate 1', and the center of the ejected area 16 will be Δl away from the rotation center axis l. Because it will shift,
Even if the substrate 1' is rotated, the ejected liquid 15 cannot be spread uniformly over the entire surface of the substrate 1', and this causes a pattern with a uniform line width to be formed in the pattern forming process of the substrate 1'. It was difficult.

[Means for solving problems]

The spray device according to the present invention has been made to solve the above-mentioned problems, and includes a plurality of radially extending holders that are arranged in a chamber and rotated by a drive device. A holder mounting table that is attached to a rotating shaft and has a support part and a disc part that is provided between the holder support parts so as to protrude from the upper surface of the holder support parts, thereby forming a guide groove together with the holder support parts. , having a connecting portion and a substrate gripping portion, the substrate is slidably disposed on each of the holder support portions along the guide groove, and the substrate is held such that its geometric center coincides with the rotation center of the rotation axis. A plurality of holders to be gripped and a connecting portion of each holder have a plurality of radial curved grooves that are slidably engaged with each other, and are rotatably disposed on the disk portion, and all the holders can be held simultaneously. The cap is moved to a predetermined position from the center of rotation of the rotating shaft.

[Effect]

In the present invention, when the cap rotates, the holder slides along the guide groove due to the engagement between the radial curved groove and the connecting part, and allows the holder to hold substrates of different sizes so that their geometric centers coincide with the center of rotation of the rotating shaft. grip it.

〔Example〕

Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings.

Fig. 1 is a perspective view showing an embodiment of the support that characterizes the present invention, Fig. 2 is a partially broken exploded front view of the support, and Fig. 3 is a plan view of the holder mounting base with the cap removed. FIG. 4 is a bottom view of the cap. It should be noted that the other structure of the spray device except for the support is constructed in the same manner as the conventional device shown in FIG. 5, so the explanation thereof will be omitted.

In addition, the substrate 1 of this example has a chromium film (thickness: 800 Å) coated on a quartz glass plate with a rectangular main surface shape, and a photoresist (e.g. AZ1350 manufactured by Hoechst Co., Ltd., USA, film thickness: :4000Å) is applied, and this resist is exposed to light in a predetermined pattern, and a developer (e.g. AZ
A special developer) is sprayed by the spray device of the present invention. It goes without saying that it can be used not only for the development process but also for the etching process, cleaning process, and photoresist coating process by changing the ejected liquid.

Now, as shown in FIGS. 1 and 2, the support 20 according to this embodiment includes a holder mounting base 21 that is attached to the rotating shaft 11 and rotates integrally with the shaft 11.
A total of four holders 22 (22 ~22
D, however, 22C is omitted in Fig. 2) is rotatably arranged on the holder mounting table 21, and is rotated when changing the substrate size, so that all the holders 22 are aligned with the center of the holder mounting table 21. The cap 23 is made of a material having excellent chemical resistance and corrosion resistance, such as tetrafluoroethylene, for example.

The holder mounting table 21 has a cylindrical portion 21 that is open at the bottom and is fitted and fixed to the upper end of the rotating shaft 11.
A, a disk portion 21B integrally provided at the upper end of this cylindrical portion 21A, and the cylindrical portion 21A and the disk portion 2.
Four holder support parts 26 are provided on the circumferential surface of the boundary with 1B and extend in the radial direction and are offset by 90 degrees in the circumferential direction.
26A to 26D, and as shown in FIG. 3, they are formed on the upper surface of the disk portion 21B so as to communicate with each other at the center and connect to each holder support portion 26, thereby forming a cross groove. Four guide grooves 27A to 27D are provided. Groove width W of these guide grooves 27A to 27D. (Fig. 3) is the width W ₁ of the holder support part 26.
(W ₀ =W ₁ ), and the bottom surface of the groove is coplanar with the top surface of the holder support portion 26 . The diameter D ₁ (FIG. 3) of the disk portion 21B is the diameter of the holder 22.
The holder support parts 2 are slightly smaller than the length of one side of the smallest substrate held by the holder support parts 2 and are opposite to each other.
The distance l ₁ (FIG. 3) between the tips of 6A and 26C (or 26B and 26D) is set to be slightly longer than the length of one side of the largest substrate to be held.

Each of the holders 22, 22A to 22D is inserted into each of the holder support parts 26, 26A to 2 with a part thereof inserted into each of the guide grooves 27A to 27D.
The guide grooves 6D are placed on the guide grooves 6D so as to be slidable in the longitudinal direction so as to work together to horizontally support the substrate 1, and have a width that is approximately equal to or slightly smaller than the width _W0 of the guide grooves 27A to 27D. W ₂ (Figure 1)
a cylindrical connecting portion 29 integrally protruding from one end of the plate-like base 28, that is, the upper surface of the center-side end of the support 20; Consisting of a protrusion 30 with a trapezoidal cross section that is integrally connected so as to extend vertically, and a pair of left and right cylindrical protrusions 31A and 31B protruding from the outer edge of the upper surface of this protrusion 30. The cylindrical projections 31A, 31B and the protrusion 30 form a substrate gripping portion. Further, the protruding body 30
A fitting groove 32 is provided at the center of the lower surface. This fitting groove 32 allows the holder 22 to
6 and serves as an aid for accurate movement when moving back and forth in a straight line. The fitting groove 32 also has the effect of preventing the holder 22 from shifting from the holder support portion 26 when the support 21 is rotated. Note that the groove width W ₃ (FIG. 2) of the fitting groove 32 is set to be approximately equal to or slightly larger than the width W ₁ of the holder support portion 26, and the groove bottom surface 34 is the same as the lower surface of the plate-shaped base 28. It forms a plane. When the plate-shaped base 28 is placed on the holder support 26 with the protrusion 30 on the outside and the holder support 26 is fitted into the fitting groove 32, the holder 22 is placed on the holder support 26. It is installed to be movable in the longitudinal direction, in other words, in the radial direction of the support 20. The substrate 1 has four protruding bodies 3 of holders 22 on the lower surface of the center of each side.
0, it is supported by these holders 22, and its movement in the front-rear and left-right directions is restricted and prevented by the cylindrical projections 31A, 31B protruding from each projection 30. In addition, the cylindrical projection 3
The heights of 1A and 31B are set to be approximately equal to or smaller than the minimum thickness of the substrate 1.
Further, it is desirable that the portion of the upper surface of the protrusion 30 that supports the substrate 1, that is, the portion inside the cylindrical projections 31A, 31B, be horizontal, but the portion outside the cylindrical projections 31A, 31B is on the substrate 1. It is preferable to slope the tube so that it is lower to the outside so that the injected liquid can flow easily and be blown away quickly by centrifugal force. Further, the connecting portion 29 of the holder 22
The dimension W ₅ (Fig. 2) from to the cylindrical protrusions 31A and 31B is 1/1 of the length of one side of the minimum board to be installed.
It is set slightly shorter than 2.

The cap 23 is formed into a disc shape having a diameter approximately equal to that of the disc part 21B of the holder mounting base 21, and has an involute curve (one end of a thread wound around a circle) on the bottom surface as shown in FIG. Four curved grooves 40, 40A~ consisting of a curve that one end draws when unraveling so that there is no slack at all times.
40D are equally spaced in the circumferential direction and formed radially, and the connecting portions 29 of the respective holders 22A to 22D are slidably inserted into and engaged with these curved grooves 40, respectively. An insertion hole 41 is provided in the center of the cap 23, and a flanged bag nut 42 made of tetrafluoroethylene is fitted into the insertion hole 41 from above. On the other hand, a cylindrical portion 43 is integrally protruded from the center of the upper surface of the disc portion 21B of the holder mounting base 21 (at the intersection of the guide grooves 27A to 27D), and the nut 42 is mounted on the upper surface of this cylindrical portion 43. It is in contact. Further, the inner hole of the cylindrical portion 43 communicates with the inner chamber of the cylindrical portion 21A,
A set screw 45 is screwed into the screw hole of the nut 42 from below the cylindrical portion 21A, so that the cap 23 is rotatably disposed on the disc portion 21B. In this state, the connecting portions 29 of each holder 22A to 22D are inserted into the curved grooves 40A to 40D of the cap 23, respectively.
The rotation of the cap 23 causes the cap 23 to move linearly in the radial direction at the same speed. That is, for example, when the cap 23 is rotated clockwise (counterclockwise in FIG. 4) when viewed from above,
Since each connecting portion 29 moves linearly at the same time toward the center of the cap 23, the holders 2 facing each other
2A and 22C and 22B and 22D slide on the holder support parts 26A to 26D so that they approach each other, and rotate counterclockwise in the opposite direction, so that each connecting part 29 simultaneously moves outward from the center of the cap 23. Holders 2 facing each other to move in a straight line
2A and 22C and 22A and 22C slide on the holder supports 26A to 26D so as to be separated from each other, thereby adjusting the position of the holder 22 as the substrate size changes.

Note that the cap 23 is usually fixed by an appropriate means at a position rotated by a predetermined angle depending on the size of the various substrates, but in this embodiment, a pin 50 is used as the fixing means, and a pin 50 corresponding to the pin 50 is used as the fixing means. For example, three pin insertion holes 51a, 51b, and 51c are provided on the peripheral edge of the cap 3 at predetermined intervals in the circumferential direction, and correspondingly, one pin hole is provided on the upper surface of the disk portion 21B. 52 (Figure 3)
is provided. Therefore, any one of the three pin insertion holes 51a, 51b, 51c
For example, by aligning the pin insertion hole 51a and the pin hole 52 and inserting the pin 50 into these holes 51a and 52, the cap 23 is fixed at its rotational position.

In this case, in this embodiment, since three pin insertion holes 51a, 51b, and 51c are provided, three types of boards with different dimensions (for example, 4, 5, 6
This method can only be applied to 4.5-inch and 5.5-inch boards by forming similar pin insertion holes within the range from the maximum board size to the minimum board size. .

Thus, in the support 20 having such a configuration, by simply removing the pin 50 and rotating the cap 23, all the holders 22 move linearly at the same time over the guide grooves 27A to 27D and the holder support part 26, so that they do not touch each other. Since the opposing objects approach or separate from each other and grip the substrate 1 so that its geometric center substantially coincides with the rotation center of the rotating shaft 11, the holder 22 moves as the dimensions of the substrate 1 change. Adjustment work is extremely simple and can be done in a short time, improving workability of adjustment and operating rate of the device.

In addition, each holder 22, 22A to 22D does not support the four corners of the board 1, but supports the center of each side, so when a board of the minimum board size is installed,
Even when the support 20 is rotated, there is little turbulence in the air within the chamber (because the protrusion dimension of the holder support part 26 from below the substrate can be reduced);
Furthermore, if there is less turbulence in this air, there will be less disturbance of the flow of the ejected liquid sprayed onto the substrate surface, and therefore the ejected liquid can be uniformly spread over the entire surface of the substrate.

Furthermore, in the structure of this embodiment, even if the substrates have different sizes, they can be installed on the same plane as long as they have the same thickness.

Furthermore, in this embodiment, the cylindrical projection 31
Since the heights of A and 31B are set to be approximately equal to or less than the minimum thickness of the substrate 1, the ejected liquid on the surface of each end surface of the substrate is transferred to the cylindrical protrusion 31.
It is not blocked by A and 31B, and can be successfully blown away by centrifugal force. That is,
If the protrusions 31A and 31B are larger than the minimum board thickness and protrude above the substrate, the ejected liquid will hit these protrusions and stay there, and will not be blown away by centrifugal force. However, in this embodiment, since the above-mentioned dimensional relationship is set, such a problem can be prevented.
is in line contact with each end surface of the substrate 1, which further prevents the ejected liquid from stagnation.

In addition, a holder 22 provided on the cap 23
The curved grooves 40, 40A to 0D, which reciprocate linearly along the guide grooves 27A to 27D and the holder support parts 26A to 26D, respectively, are formed by involute curves, so that the pressure angles with the connecting part 29 are always equal. Therefore, the cap 23 can always be rotated with the same operating force. However, this curved groove 40 is not necessarily limited to an involute curve, and in short, the holder 2
Since it is only necessary to smoothly reciprocate the groove 2, the groove may be formed of an appropriate curve such as a cycloid curve or a curve approximating an involute curve.

Although the above embodiment is configured to support the substrate 1 by four holders 22, the present invention is not limited to this in any way, but can be supported by at least two holders 22 depending on the substrate size, substrate shape, etc. All you have to do is increase or decrease the number of holders. For example, for a circular or polygonal substrate, it is desirable that there be at least three, and in the case of a polygon, it is even more desirable that there be as many as the number of sides. In that case, it goes without saying that the groove formed by the involute curve of the cap 23 may also be increased or decreased depending on the number of holders.

Further, in the above embodiment, the fitting grooves 27, 27A to 27D were provided on the lower center surface of the holder 22, but a recess was provided on the upper surface of the holder support portion 26 in the longitudinal direction, and a convex portion was provided on the lower surface of the holder 22. Even if they are fitted together, the same effect as in the above embodiment can be obtained.

In addition, in the above embodiment, four holders 2
Since the cap 23 is configured to support a square substrate 1, the curved groove 40 of the cap 23 is provided at an equal distance from the center of the cap. It is preferable to provide a groove for moving the long side of the cap 23, which is shifted toward the center of the cap 23, than a groove for moving the short side of the cap (in the case of an ellipse, the side parallel to the short axis).

Further, in the above embodiment, the holder support part 26 is provided protruding from the circumferential surface of the disc part 21B, but the present invention is not limited to this, and if the protruding dimension from the disc part 21B is made zero, the support 2
Since the air around the zero is less turbulent while it is rotating, the ejected liquid can be ejected onto the substrate well.

[Effect of idea]

As described above, the spray device according to the present invention is configured such that the plurality of holders supporting the substrates are moved all at once by the rotation of the cap, so that various substrates of different sizes can be can be gripped so that it always substantially coincides with the rotation center of the rotation axis, and as a result, even if the substrates have different sizes, the ejected liquid can always be uniformly applied to the entire substrate surface. In addition, it is possible to quickly and easily respond to changes in substrate size, and the handleability and operating rate of the support can be improved. In addition, regardless of the substrate size, as long as the substrates have the same thickness, they can be installed on the same plane, so the ejected liquid can be uniformly applied to the entire surface of the substrate, especially for developing, etching, and etching after resist exposure. When used in each series of cleaning steps,
A pattern with uniform line width can be formed, and its practical effects are very large.

[Brief explanation of the drawing]

Fig. 1 is a perspective view showing a support for a spray device according to the present invention, Fig. 2 is a partially broken exploded front view of the support, Fig. 3 is a plan view of the holder mounting base with the cap removed, and Fig. 4 Figure 5 is a bottom view of the cap, Figures 5 to 7 show a conventional spray device, Figure 5 is an overall configuration diagram, Figure 6 is a plan view of the substrate installed on the support, and Figure 7 is a FIG. 3 is a plan view of the support. 1, 1'...Substrate, 11...Rotating shaft, 13...
Chamber, 14... Nozzle, 15... Ejected liquid,
20...Support, 21...Holder mounting table, 21
A... Cylindrical part, 21B... Disc part, 22... Holder, 23... Cap, 26... Holder support part, 29... Connecting part, 40... Curved groove consisting of an involute curve.

Claims (1)

[Claims for Utility Model Registration] (1) A substrate is placed on a support provided in a chamber and rotated by a drive device, and a liquid is ejected from a nozzle provided in the chamber toward the substrate. In the spray device, the ejected liquid is ejected and the ejected liquid is spread substantially uniformly over the entire surface of the substrate by rotating the support, wherein the support includes a plurality of holder support parts extending in a radial direction. A holder mounting table attached to the rotating shaft and having a disc part protruding from the upper surface of the holder support part and forming a guide groove together with the holder support part between these holder support parts, and a connecting part. and a substrate gripping part, which are disposed on each of the holder support parts so as to be slidable along the guide groove, and grip the substrate so that its geometric center coincides with the rotation center of the rotation axis. holders and connecting portions of each holder have a plurality of radial curved grooves that are slidably engaged with each other, and are rotatably disposed on the disk portion, and all the holders are simultaneously connected to the rotation axis. A spray device comprising: a cap that is moved to a predetermined position from the center of rotation of the spray device. (2) The spray device according to claim 1, wherein the radial curved groove is formed of an involute curved groove.