JPH03264657A - Negative pressure-type masking device for plasma spraying - Google Patents
Negative pressure-type masking device for plasma sprayingInfo
- Publication number
- JPH03264657A JPH03264657A JP2061766A JP6176690A JPH03264657A JP H03264657 A JPH03264657 A JP H03264657A JP 2061766 A JP2061766 A JP 2061766A JP 6176690 A JP6176690 A JP 6176690A JP H03264657 A JPH03264657 A JP H03264657A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- negative pressure
- plasma spraying
- gas suction
- masking element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000873 masking effect Effects 0.000 title claims abstract description 27
- 238000007750 plasma spraying Methods 0.000 title claims abstract description 11
- 238000007751 thermal spraying Methods 0.000 claims description 5
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000000919 ceramic Substances 0.000 abstract description 11
- 239000000843 powder Substances 0.000 abstract description 9
- 239000007921 spray Substances 0.000 abstract description 4
- 238000009792 diffusion process Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 44
- 239000000446 fuel Substances 0.000 description 17
- 239000007784 solid electrolyte Substances 0.000 description 14
- 210000004027 cell Anatomy 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 239000012528 membrane Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000003850 cellular structure Anatomy 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910002076 stabilized zirconia Inorganic materials 0.000 description 1
Landscapes
- Coating By Spraying Or Casting (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
この発明は、固体電解質燃料電池におけるプラズマ溶射
用負圧式マスキング装置に関するもので、特にプラズマ
溶射装置の溶射部分における粉末の回折・飛散を防ぐ機
構を備えた装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention relates to a negative pressure masking device for plasma spraying in a solid electrolyte fuel cell, and in particular to a mechanism for preventing powder diffraction and scattering in the spraying part of a plasma spraying device. The present invention relates to a device equipped with the following.
[従来の技術1
プラズマ溶射法において、減圧溶射法は、溶射を受ける
母材と装置を減圧容器内に収容し、より緻密なコーテイ
ング膜を得る方法で、近年開発されたものである。[Prior Art 1] Among the plasma spraying methods, the reduced pressure spraying method is a method developed in recent years in which the base material to be sprayed and equipment are housed in a reduced pressure container to obtain a denser coating film.
固体電解質燃料電池の電解質膜は主にイツトリア安定化
ジルコニア粉末を、直流アークプラズマ中で溶融して製
作する。The electrolyte membrane of a solid electrolyte fuel cell is mainly manufactured by melting ittria-stabilized zirconia powder in a DC arc plasma.
従来のプラズマ溶射法は、大気中あるいは特殊ガス中で
実施されていた。この装置において、1本のセラミック
支持管外周上に固体電解質燃料電池構成要素(電極膜、
電解質膜)、燃料電池素子を電気的に接続するインター
コネクタ(■・C)を製作する。Traditional plasma spraying methods are performed in the atmosphere or in special gases. In this device, solid electrolyte fuel cell components (electrode membrane,
Fabricate an interconnector (■・C) that electrically connects the electrolyte membrane) and fuel cell element.
このようにして、製作される固体電解質燃料電池の構成
は第5図に示すようになっている。この図において、1
は中空円筒のセラミック支持管で、その外周面上に燃料
電極2、固体電解質3、空気電極4が形成される。なお
、5は電流すド、10は固体電解質燃料電池全体を示し
、Gaは前記空気電極4間の間隙を示す。The structure of the solid electrolyte fuel cell manufactured in this manner is shown in FIG. In this figure, 1
is a hollow cylindrical ceramic support tube, on the outer peripheral surface of which a fuel electrode 2, a solid electrolyte 3, and an air electrode 4 are formed. Note that 5 indicates the current source, 10 indicates the entire solid electrolyte fuel cell, and Ga indicates the gap between the air electrodes 4.
この構成に於て重要な点の一つは図に示す間隙Gaを確
保することである。One of the important points in this configuration is to secure the gap Ga shown in the figure.
従来のプラズマ溶射法では、溶射銃40とセラミック支
持管1の間に第6図、第7図に示すようにスリット41
を設けた遮蔽板42を置いて、これを軸方向にずらすこ
とによって、第5図の構造の固体電解質燃料電池10を
作成している。なお、第7図の6は前述した燃料電極2
.固体電解質3.空気電極4を総称して示す膜である。In the conventional plasma spraying method, a slit 41 is formed between the spray gun 40 and the ceramic support tube 1 as shown in FIGS. 6 and 7.
The solid electrolyte fuel cell 10 having the structure shown in FIG. 5 is created by placing the shielding plate 42 provided with the solid electrolyte fuel cell 10 and shifting it in the axial direction. In addition, 6 in FIG. 7 is the fuel electrode 2 mentioned above.
.. Solid electrolyte 3. This membrane collectively refers to the air electrode 4.
[発明が解決しようとする課題]
しかし、従来のスリット法では、溶射銃40からセラミ
ック支持管1に吹き付けられる溶融粉末がスリット41
を通り抜けた後、回折し、第5図に示す間隙Ga、Gb
を被覆してしまうという重大な問題を有していた。[Problems to be Solved by the Invention] However, in the conventional slit method, the molten powder sprayed from the thermal spray gun 40 onto the ceramic support tube 1 passes through the slit 41.
After passing through the gap, it is diffracted and forms the gaps Ga and Gb shown in
This had the serious problem of covering the surface.
また、減圧溶射法では、溶射に使用するアークプラズマ
ジェットが拡大するため、溶融粉末はこのジェット中で
流れ方向に対して拡散し、上記の回折現象は一層顕著に
なるという問題点があった。Further, in the reduced pressure thermal spraying method, since the arc plasma jet used for thermal spraying is enlarged, the molten powder is diffused in the jet in the flow direction, and the above-mentioned diffraction phenomenon becomes more pronounced.
この発明は、従来のプラズマ溶射法では避けられない上
記の問題を解決したプラズマ溶射用負圧式マスキング装
置を提供することを目的とするものである。SUMMARY OF THE INVENTION An object of the present invention is to provide a negative pressure masking device for plasma spraying that solves the above-mentioned problems that cannot be avoided with conventional plasma spraying methods.
[課題を解決するための手段]
この発明に係る請求項 (1)に記載の発明は、内部に
ガス吸引路を持ち、内面に沿ってガス吸込口またはガス
吸込溝を有する半円形、馬蹄形あるいは矩形のガスマス
キング要素と、このガスマスキング要素のガス通路に連
通し負圧を供給する負圧ガス供給機構とからなるもので
ある。[Means for Solving the Problems] The invention according to claim (1) relates to a semicircular, horseshoe-shaped, or It consists of a rectangular gas masking element and a negative pressure gas supply mechanism that communicates with the gas passage of this gas masking element and supplies negative pressure.
また、請求項 (2)に記載の発明はガスマスキング要
素に整流風機構を備えたものである。Furthermore, the invention as set forth in claim (2) is one in which the gas masking element is provided with a rectifying air mechanism.
[作用1
この発明の請求項(1)記載の発明においては、ガス吸
引機構から供給される負圧が、セラミック支持管に溶射
され回折しようとする粉末をガスマスキング要素から吸
い込み、これにより溶射によって形成された膜の両側に
おける拡散が防止され、明瞭な境界が形成される。[Operation 1] In the invention described in claim (1) of the present invention, the negative pressure supplied from the gas suction mechanism sucks the powder that is thermally sprayed onto the ceramic support tube and is about to be diffracted from the gas masking element, thereby preventing the thermal spraying from occurring. Diffusion on both sides of the formed film is prevented and a clear boundary is formed.
また、請求項 (2)に記載の発明においては、整流風
機構によりプラズマガスの流れが整えられる。Moreover, in the invention described in claim (2), the flow of the plasma gas is adjusted by the rectifying air mechanism.
[実施例1
第1図はこの発明の一実施例を示す斜視図で、1はセラ
ミック支持管、11a、Ilb、11c、11d(以下
、区別する必要のないときは単に11を用いる。他の符
号についても同じとする。)はそれぞれガスマスキング
要素を示すもので、中空耐熱構造材より製作される。こ
れらは、ガスマニホールド13に連結された負圧供給支
持体+2a、12b、12c、12dによってそれぞれ
支持され、ここから負圧供給を受ける。また、14は前
記セラミック支持管1の支持体、15は回転軸である。[Embodiment 1] Fig. 1 is a perspective view showing an embodiment of the present invention, in which 1 is a ceramic support tube, 11a, Ilb, 11c, 11d (hereinafter, 11 will be simply used when there is no need to distinguish. The symbols are the same.) indicate gas masking elements, which are made of hollow heat-resistant structural material. These are supported by negative pressure supply supports +2a, 12b, 12c, and 12d connected to the gas manifold 13, respectively, and receive negative pressure from there. Further, 14 is a support for the ceramic support tube 1, and 15 is a rotation shaft.
16は微調整装置で、調整ねじ16aを回動することで
軸方向に移動できるもので、これにより所要の長さの成
膜を形成できる。なお、17は移動用レール、18はガ
ス供給口、19は基台である。Reference numeral 16 denotes a fine adjustment device, which can be moved in the axial direction by rotating an adjustment screw 16a, thereby making it possible to form a film of a desired length. Note that 17 is a moving rail, 18 is a gas supply port, and 19 is a base.
第2図(a)、(b)、(c)は第1図のガスマスキン
グ要素11の各種実施例の詳細を示す斜視図である。ガ
スマスキング要素11の内部は第2図(a)のようにガ
ス通路21が形成され、ガス吸込口22をその内面に沿
って2列に設けである。2(a), (b) and (c) are perspective views showing details of various embodiments of the gas masking element 11 of FIG. 1. FIG. Inside the gas masking element 11, a gas passage 21 is formed as shown in FIG. 2(a), and gas suction ports 22 are provided in two rows along the inner surface thereof.
あるいは、第2図(b)のようにガス吸込溝23を内面
に沿って2列に設けてもよい。Alternatively, the gas suction grooves 23 may be provided in two rows along the inner surface as shown in FIG. 2(b).
第2図(C)は負圧供給支持体12a を下部に設け
た例である。負圧供給支持体12aから供給された負圧
は、このガスマスキング要素11を流れるガスにより冷
却すると共にガス吸込口22、あるいは、ガス吸込溝2
3から粉末を吸い込み、粉末の回折を防止する。ガスマ
スキング要素11の開口部24の広さは、セラミック支
持管1の外径に応じた大きさとすることができる。FIG. 2(C) is an example in which the negative pressure supply support 12a is provided at the bottom. The negative pressure supplied from the negative pressure supply support 12a is cooled by the gas flowing through the gas masking element 11, and is also cooled by the gas suction port 22 or the gas suction groove 2.
3 to prevent powder diffraction. The width of the opening 24 of the gas masking element 11 can be sized according to the outer diameter of the ceramic support tube 1.
なお、上記の各実施例ではガス吸込口22、ガス吸込溝
23を2列に設けたが、これは1列でも2列でもよい。In each of the above embodiments, the gas suction ports 22 and the gas suction grooves 23 are provided in two rows, but they may be provided in one or two rows.
第3図は第2図(a)の実施例の断面略図で、ガス吸込
口22の外側に整流風機構としての整流板25を設けた
ものである。FIG. 3 is a schematic cross-sectional view of the embodiment shown in FIG. 2(a), in which a rectifying plate 25 as a rectifying air mechanism is provided outside the gas suction port 22.
このように、第2図(a)、(b)、(c)に示したガ
スマスキング要素11により、1つには、溶射微粒子の
流れが流れ方向に壁に沿って整流され、拡散が低下する
。さらに、負圧供給により拡散しようとする溶射微粒子
が吸い込まれ、拡散が防止される。また、ガスマスキン
グ要素11は内部にガスを通すことによって冷却され、
変形、破壊から防止される。このような効果により、第
4図に示すように境界の明瞭な膜31が形成でき、膜3
1と膜31との間隔Gaも0.5mmと1桁精度を向上
することができる。Thus, the gas masking elements 11 shown in FIGS. 2(a), (b), and (c), on the one hand, rectify the flow of sprayed particles along the wall in the flow direction, reducing diffusion. do. Further, by supplying a negative pressure, thermal spray particles that are about to spread are sucked in, thereby preventing them from spreading. The gas masking element 11 is also cooled by passing gas thereinto,
Prevented from deformation and destruction. Due to this effect, a film 31 with clear boundaries can be formed as shown in FIG.
The distance Ga between the film 1 and the film 31 is also 0.5 mm, which can improve the accuracy by one order of magnitude.
なお、ガスマスキング要素11は第2図(a)〜(c)
に示す馬蹄形の他、半円形、矩形あるいはこれに近似し
た形でもよい。The gas masking element 11 is shown in FIGS. 2(a) to 2(c).
In addition to the horseshoe shape shown in the figure, a semicircular shape, a rectangular shape, or a shape similar to this may also be used.
[発明の効果1
以上説明したように、請求項 (11に記載の発明は、
内部にガス吸引路を持ち、内面に沿ってガス吸込口また
はガス吸込溝を有する半円形、馬蹄形あるいは矩形のガ
スマスキング要素と、このガスマスキング要素のガス通
路に連通し負圧を供給する負圧ガス供給機構とからなる
ので、隣同士の膜間隔が小さく形成されるため、セラミ
ック支持管上製作できる固体電解質燃料電池の数を増す
ことができ、セラミック支持管の表面の使用率を高める
ことができる。[Effect of the invention 1 As explained above, the invention described in claim (11)
A semicircular, horseshoe-shaped, or rectangular gas masking element that has a gas suction passage inside and a gas suction port or gas suction groove along the inner surface, and a negative pressure that communicates with the gas passage of this gas masking element to supply negative pressure. Since it consists of a gas supply mechanism and the gap between adjacent membranes is small, it is possible to increase the number of solid electrolyte fuel cells that can be manufactured on a ceramic support tube and increase the utilization rate of the surface of the ceramic support tube. can.
また固体電解質燃料電池素子を直列接続する部分が短く
てすみ、発電電力をより多(得ることができる。In addition, the part where the solid electrolyte fuel cell elements are connected in series can be shortened, and more power can be generated.
さらに、この接続部分からのガスの相互拡散を減らすこ
とができ、燃料の利用率を向上させるこたができ、また
、燃料電池スタックの連続製作が可能となり、生産性が
大幅に向上する。Furthermore, interdiffusion of gases from this connection can be reduced, improving fuel utilization efficiency, and continuous production of fuel cell stacks becomes possible, greatly improving productivity.
また、請求項(2)に記載の発明は、整流風機構により
プラズマガスの流れが整えられるため精度の高い成膜を
行うことができる利点がある。Further, the invention as set forth in claim (2) has the advantage that highly accurate film formation can be performed because the flow of the plasma gas is adjusted by the rectified air mechanism.
第1図はこの発明の一実施例を示す斜視図、第2図(a
)、(b)、(c)はいずれも第1図のガスマスキング
要素の概略の形状を示す斜視図、第3図は、第2図(a
)のガス吸込口に整流板を設けた場合の正面図、第4図
はこの発明の溶射用ガスマスキング装置によって形成さ
れた膜の形状を示す説明図、第5図は固体電解質燃料電
池の概略を示す側断面図、第6図は従来のスリット方式
による電池スタック製作手段の概略を示す斜視図、第7
図は第6図のスリット方式により形成された膜の形状を
示す部分断面図である。
図中、1はセラミック支持管、2は燃料電極、3は固体
電解質、4は空気電極、5は電流リード、6は膜、10
は固体電解質燃料電池、11a〜lidはガスマスキン
グ要素、12a〜12dは負圧供給支持体、13はガス
マニホールド、14は支持体、15は回転軸、16は微
調整装置、22はガス吸込口、23はガス吸込溝、24
は開口部である。FIG. 1 is a perspective view showing an embodiment of the present invention, and FIG.
), (b), and (c) are all perspective views showing the general shape of the gas masking element in FIG.
), FIG. 4 is an explanatory diagram showing the shape of the film formed by the gas masking device for thermal spraying of the present invention, and FIG. 5 is a schematic diagram of a solid electrolyte fuel cell. FIG. 6 is a perspective view schematically showing a means for manufacturing a battery stack using a conventional slit method, and FIG.
This figure is a partial cross-sectional view showing the shape of a film formed by the slit method of FIG. 6. In the figure, 1 is a ceramic support tube, 2 is a fuel electrode, 3 is a solid electrolyte, 4 is an air electrode, 5 is a current lead, 6 is a membrane, 10
11a to 12d are solid electrolyte fuel cells, 11a to lid are gas masking elements, 12a to 12d are negative pressure supply supports, 13 is a gas manifold, 14 is a support, 15 is a rotating shaft, 16 is a fine adjustment device, and 22 is a gas inlet , 23 is a gas suction groove, 24
is the opening.
Claims (2)
口またはガス吸込溝を有する半円形,馬蹄形あるいは矩
形のガスマスキング要素と、このガスマスキング要素の
ガス通路に連通し負圧ガスを供給する負圧ガス供給機構
を具備したことを特徴とするプラズマ溶射用負圧式マス
キング装置。(1) A semicircular, horseshoe-shaped, or rectangular gas masking element that has a gas suction passage inside and a gas suction port or gas suction groove along the inner surface, and communicates with the gas passage of this gas masking element to supply negative pressure gas. A negative pressure masking device for plasma spraying, characterized in that it is equipped with a negative pressure gas supply mechanism.
る整流風機構をもつことを特徴とする請求項(1)記載
のプラズマ溶射用負圧式マスキング装置。(2) The negative pressure masking device for plasma thermal spraying according to claim (1), wherein the gas masking element has a rectifying air mechanism for regulating the flow of plasma gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2061766A JPH03264657A (en) | 1990-03-13 | 1990-03-13 | Negative pressure-type masking device for plasma spraying |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2061766A JPH03264657A (en) | 1990-03-13 | 1990-03-13 | Negative pressure-type masking device for plasma spraying |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03264657A true JPH03264657A (en) | 1991-11-25 |
Family
ID=13180574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2061766A Pending JPH03264657A (en) | 1990-03-13 | 1990-03-13 | Negative pressure-type masking device for plasma spraying |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03264657A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322129A (en) * | 1976-08-12 | 1978-03-01 | Masuzou Hamamura | Nonndiffusing metallization method using plural divergent nozzle sprays and metallizing gun for said method |
| JPS5547377A (en) * | 1978-09-29 | 1980-04-03 | Seiya Adachi | Plating method |
| JPS6263665A (en) * | 1985-09-17 | 1987-03-20 | Agency Of Ind Science & Technol | Gas masking equipment for thermal spraying |
-
1990
- 1990-03-13 JP JP2061766A patent/JPH03264657A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322129A (en) * | 1976-08-12 | 1978-03-01 | Masuzou Hamamura | Nonndiffusing metallization method using plural divergent nozzle sprays and metallizing gun for said method |
| JPS5547377A (en) * | 1978-09-29 | 1980-04-03 | Seiya Adachi | Plating method |
| JPS6263665A (en) * | 1985-09-17 | 1987-03-20 | Agency Of Ind Science & Technol | Gas masking equipment for thermal spraying |
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