JPH03266801A - Antireflection filter - Google Patents

Antireflection filter

Info

Publication number
JPH03266801A
JPH03266801A JP2067459A JP6745990A JPH03266801A JP H03266801 A JPH03266801 A JP H03266801A JP 2067459 A JP2067459 A JP 2067459A JP 6745990 A JP6745990 A JP 6745990A JP H03266801 A JPH03266801 A JP H03266801A
Authority
JP
Japan
Prior art keywords
film
antireflection
refractive index
finger prints
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2067459A
Other languages
Japanese (ja)
Inventor
Yasuhito Owaki
泰人 大脇
Tetsuo Yamanaka
哲夫 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2067459A priority Critical patent/JPH03266801A/en
Publication of JPH03266801A publication Critical patent/JPH03266801A/en
Pending legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE:To facilitate the complete wiping away of the traces of finger prints without application of strong force by providing the thin flm of fluoroplastic on the surface of the antireflection film of the antireflection filter. CONSTITUTION:A plastic film is stuck via a tacky adhesive layer to a transparent base material, such as glass plate or plastic plate to form the antireflection film. A material having the refractive index lower than the refractive index of the base material is used for this film. Further, the thin film of the fluoroplastic is provided on this antireflection film. Polytetrafluoroethylene, polyvinyl fluoride or the like is provided at about 3 to 100nm thickness as this thin film. The traces of finger prints are hardly stuck on the surface. In case of the trace of the finger prints sticking thereto, the coefft. of friction of the fluoroplastic surface is small and, therefore, the slipperiness and non- tackiness are high and the traces of the finger prints are completely wiped away without the application of the strong force.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、指紋跡が付着しに〈<、拭き取り易い反射
防止フィルターに関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an antireflection filter on which fingerprint marks are easily wiped off.

(従来の技術) OA種機器どのデイスプレィは、デイスプレィ表面の反
射光により表示が見にくくなるため、従来からCRT、
液晶デイスプレィ等の防眩用途として反射防止フィルタ
ーが使われてきた。このフィルターとしては、ガラス板
もしくはデヲスナック板上に反射防止層として無機多層
薄膜を設はデイスプレィ前面に設置するタイプ、プラス
チックフィルムに無機多層薄膜を設け、このフィルムを
ガラス板、プラスチック板に貼シ合わせ、それをデイス
プレィ前面に設置するタイプ、無機多層膜を設けたプラ
スチックフィルムを直接デイスプレィ表面に貼り合わせ
たタイプがある。
(Prior art) Displays for office automation equipment are difficult to see due to reflected light from the display surface, so conventionally CRT,
Anti-reflection filters have been used for anti-glare applications such as liquid crystal displays. This type of filter includes a type in which an inorganic multilayer thin film is installed as an anti-reflection layer on a glass plate or a display board, and a type in which an inorganic multilayer thin film is installed on the front of the display as an anti-reflection layer, and a type in which an inorganic multilayer thin film is provided on a plastic film and this film is attached to a glass plate or plastic plate. There are two types: one type in which it is installed in front of the display, and another type in which a plastic film coated with an inorganic multilayer film is bonded directly to the display surface.

これらのフィルターを使うことにより、デイスプレィ表
面からの反射光が減少し、眩しさが大幅に抑制される。
By using these filters, the amount of light reflected from the display surface is reduced, greatly reducing glare.

(発明が解決しようとする課M) これらの反射防止フィルターの表面は手、指によって触
れられる機会が少なくなく、指紋跡等が付着することが
多い。
(Problem M to be Solved by the Invention) The surfaces of these antireflection filters are often touched by hands and fingers, and fingerprint marks and the like are often deposited thereon.

付着した指紋跡等を布、紙等で拭き取ろうとした場合、
フィルター表面の反射防止層は、ガラス板表面などと比
較して、柔かく傷がつき易いため、強い力で拭き取るこ
とができない。このため、フィルター表面から完全に指
紋跡を消去することができず、画面が非常に見づらいと
いう問題点があった。
If you try to wipe away fingerprints etc. with cloth, paper, etc.
The antireflection layer on the filter surface is softer and more easily scratched than the surface of a glass plate, so it cannot be wiped off with strong force. For this reason, there was a problem in that fingerprint marks could not be completely removed from the filter surface, making the screen extremely difficult to see.

従って、この発明は指紋付着防止効果があシ、しかも指
紋拭き取りの容易な反射防止フィyターを提供すること
を目的としている。
Accordingly, an object of the present invention is to provide an antireflection filter that has a good effect of preventing fingerprints from being attached and which can be easily wiped off.

(課題を解決する丸めの手段) 発明者は、上記目的を達成するため鋭意検討した結果、
反射防止フィルターの最外表面を摩擦係数が小さく、滑
り性、非粘着性の高いふっ素樹脂の薄層によって形成す
れば、反射防止効果を損なわずに、指紋跡が付着しにく
くなり、また、仮に指紋跡が付着した場合も、小さな力
で拭き取シ易いものであることを知り、この発明を完成
するに至った。
(Means of rounding to solve the problem) As a result of intensive study to achieve the above object, the inventor has found that
If the outermost surface of the anti-reflection filter is made of a thin layer of fluororesin, which has a low coefficient of friction and is highly slippery and non-adhesive, fingerprint marks will be less likely to adhere without impairing the anti-reflection effect. This invention was completed after learning that even if fingerprint marks were left on the body, they could be easily wiped off with a small amount of force.

すなわち、この発明は、透明基材の表面に単層もしくは
多層の無機誘電体薄膜から成る反射防止層が形成され、
5更にこの上にふっ素樹脂薄膜が形成されて成る反射防
止フィルターに係るものである。
That is, in this invention, an antireflection layer consisting of a single layer or multilayer inorganic dielectric thin film is formed on the surface of a transparent base material,
5 further relates to an antireflection filter comprising a fluororesin thin film formed thereon.

この発明における基材の例としては、ガラス板単体、プ
ラスチック板単体、ガラス板にプラスチックフィルムを
粘着層を介して貼り合わせたもの、プラスチック板にプ
ラスチックフィルムを粘着層を介して貼シ合わせたもの
などが挙げられる。各々の材料としては、いずれも透明
性を有するものであればよく、プラスチック板の場合、
具体的にハホリエステル樹脂、トリアセチルセルロース
樹脂(TAC)、ポリカーボスート樹脂、ポリアミド樹
脂、アクリル樹脂、ポリイミド樹脂などが挙げられる。
Examples of the base material in this invention include a single glass plate, a single plastic plate, a glass plate with a plastic film pasted through an adhesive layer, and a plastic plate with a plastic film pasted through an adhesive layer. Examples include. Any material may be used as long as it has transparency; in the case of a plastic plate,
Specific examples include haphoryester resin, triacetyl cellulose resin (TAC), polycarbosoot resin, polyamide resin, acrylic resin, and polyimide resin.

これらの材料からなるプラスチック板の厚みとしては、
特に限定されないが、一般的に0.5111〜20m1
程度であるのがよい。
The thickness of plastic plates made of these materials is:
Although not particularly limited, generally 0.5111~20m1
It is better to be at a certain level.

ガラス板の場合、ソーダライムガラス、カリ・クラウン
ガラス、ホウケイ酸ガラス、アルミケイ酸ガラス、石英
ガラスなどが挙げられる。これらの材料からなるガラス
板の厚みとしては、上記プラスチック板と同様である。
In the case of glass plates, examples include soda lime glass, potash crown glass, borosilicate glass, aluminum silicate glass, and quartz glass. The thickness of the glass plate made of these materials is the same as that of the plastic plate described above.

また、プヲスナックフィIレムの場合、材料の具体例は
プラスチック板と同様であシ、厚みとしては、特に限定
されないが、一般的に25〜200μm程度であるのが
よい。
Further, in the case of the Puwo Snack Film, the specific example of the material is the same as that of the plastic plate, and the thickness is not particularly limited, but it is generally good to be about 25 to 200 μm.

これら基材の表面に設けられる反射防止膜は、単層本し
くけ多層の無機誘電体薄膜から成り、多層の場合は一弊
約42〜3層が一般的である。単層の場合は基材の屈折
率よりも低屈折″4(通常、屈折重重)が1.3〜1.
5)の材料で形成される。 2層の場合は基材側から高
屈折率材料(通常、φが1.9〜2.4)/低屈折率材
料の順に、′!た3層の場合は基材側から中屈折率材料
(通常、mが1.5〜1.9/高屈折率材料/低屈折率
材料の順に形成される。
The antireflection coating provided on the surface of these substrates is composed of a single layer or multiple layers of inorganic dielectric thin films, and in the case of multilayers, the number of layers is generally about 42 to 3 per layer. In the case of a single layer, the refractive index "4" (usually refractive index) is 1.3 to 1.
5). In the case of two layers, from the base material side, in the order of high refractive index material (usually φ is 1.9 to 2.4)/low refractive index material, '! In the case of three layers, from the base material side, medium refractive index materials (usually m is 1.5 to 1.9/high refractive index material/low refractive index material are formed in this order).

各々の無機誘電体薄膜の厚みについては、単層の場合、
その光学的膜厚を、たとえば設計波長(λ)に対しλ/
4.2層の場合たとえば基材側の材料からλ/2、人/
4.3層の場合たとえば基材側の材料からλ/4、λ/
2、λ/4の関係を満たすようにすることが望まれる。
Regarding the thickness of each inorganic dielectric thin film, in the case of a single layer,
For example, set the optical film thickness to λ/ for the design wavelength (λ).
4. In the case of two layers, for example, λ/2 from the material on the base material side, human/
4. In the case of three layers, for example, λ/4, λ/
2. It is desirable to satisfy the relationship λ/4.

屈折重刷に無機誘電体薄膜材料を具体的に挙げると、高
屈折率材料としては、ZrO*、Ta z 0H1Ti
es 、 ZnS、 Centなどがある。中屈折率材
料としては、AムO= %Y露0− 、 Mg 01C
eF、などがある。
Specific examples of inorganic dielectric thin film materials for refractive overprinting include ZrO*, Ta z 0H1Ti, and high refractive index materials.
Examples include es, ZnS, Cent, etc. As a medium refractive index material, AmO = % Y dew 0-, Mg 01C
eF, etc.

また、低屈折率材料としては、SiO意、MgF雪、L
iF、N1M AIRs NaFなどが挙げられる。
In addition, as low refractive index materials, SiO, MgF snow, L
Examples include iF, N1M AIRs NaF, and the like.

更に、この反射防止層の上に設けられるふっ素樹脂薄膜
としては、具体的には、ポリテトラフルオロエチレン(
PTF’E)、テトラフルオロエチレン−パーフルオロ
アルキルビニルエーテル共重合体(PFA)、テトラフ
ルオロエチレン−へキサフルオロプロピレン共重合体(
FEP)、ポリクロロトリフルオロエチレン(PCTF
E) 、テトフフルオロエチレンーエチレン共重合体(
ETFE) 、クロロトリフルオロエチレン−エチレン
共重合体(ECTFE)、ポリビニリデンフルオフィド
(PVDF)、ポリビニルフルオライド(PVF)  
などが挙げられる。これらの材料からなるふっ素IR脂
薄膜の厚みとしては、反射防止膜の反射防止効果を損な
わない程度に制限され、3〜1100n程度にすること
が好ましい。
Furthermore, the fluororesin thin film provided on this antireflection layer is specifically made of polytetrafluoroethylene (
PTF'E), tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA), tetrafluoroethylene-hexafluoropropylene copolymer (
FEP), polychlorotrifluoroethylene (PCTF
E), tetoffluoroethylene-ethylene copolymer (
ETFE), chlorotrifluoroethylene-ethylene copolymer (ECTFE), polyvinylidene fluoride (PVDF), polyvinyl fluoride (PVF)
Examples include. The thickness of the fluorine IR fat film made of these materials is limited to an extent that does not impair the antireflection effect of the antireflection film, and is preferably about 3 to 1100 nm.

(発明の効果) 以上のように、この発明によれば、反射防止フィルター
の反射防止膜の表面に、ふっ素樹脂薄膜を設けることに
より、表面に指紋跡が付着しにくくなるうえに、仮に指
紋跡が付着した場合も、ふっ素樹脂表面の摩擦係数が小
さいため、滑り性、非粘着性が高く、強い力をかけずに
指絞跡を完全に拭き取ることが可能な反射防止フィルタ
ーを提供できるものである。
(Effects of the Invention) As described above, according to the present invention, by providing the fluororesin thin film on the surface of the antireflection film of the antireflection filter, it becomes difficult for fingerprint marks to adhere to the surface, and it also prevents fingerprint marks from adhering to the surface. The fluororesin surface has a small coefficient of friction, so even if it gets stuck, the anti-reflection filter is highly slippery and non-adhesive, making it possible to completely wipe away finger squeeze marks without applying strong force. be.

(実施例) 以下に、この発明の実施例を記載してより具体的に説明
する。
(Examples) Below, examples of the present invention will be described and explained more specifically.

実施例1 基材の構成をプラスチック板に粘着層を介してプラスチ
ックフィルムを貼り合わせたものにするため、プラスチ
ック板として厚さ8111J1の透明アクリル樹脂板、
プラスチックフィルムとしテ厚す1004mの透明なポ
リエチレンテレフタレート(PET)フィルムを用い之
Example 1 In order to configure the base material by laminating a plastic film to a plastic plate via an adhesive layer, a transparent acrylic resin plate with a thickness of 8111J1 was used as the plastic plate.
A transparent polyethylene terephthalate (PET) film with a thickness of 1004 m was used as the plastic film.

このPETフィ〜ムの片面に反射防止膜として、電子銃
式真空蒸着法により、厚さ124fPのZr0t膜およ
び厚さ87nmの5ins膜を順次形成した。
A Zr0t film with a thickness of 124 fP and a 5ins film with a thickness of 87 nm were successively formed on one side of this PET film as an antireflection film by electron gun vacuum evaporation.

つぎに、このStow膜上に抵抗加熱式真空蒸着法によ
り膜厚5nmのPFA薄膜を形成した。この反射防止フ
ィルターを得た。
Next, a PFA thin film with a thickness of 5 nm was formed on this Stow film by a resistance heating vacuum evaporation method. This antireflection filter was obtained.

この反射防止フィルターは、波長400〜700 nm
の可視光の平均反射率が、約1.0%とPFA  薄膜
を設けていない反射防止フィルター(可視光線平均反射
率約09%)と比較しても反射防止効果は損なわれてお
らず、指紋跡のガーセによる拭き取りでも容易に指紋跡
を消去することができた。
This anti-reflection filter has a wavelength of 400 to 700 nm.
The average reflectance of visible light is approximately 1.0%, which means that the anti-reflection effect is not impaired even when compared to an anti-reflection filter that does not have a PFA thin film (average visible light reflectance of approximately 09%). Fingerprint marks could be easily erased by wiping them with gauze.

実施例2 厚さ100μmの透明TACフィルムの片面に、実施例
1と同様にして膜厚75 nmのY、 0.膜、膜厚1
10nmの’pio雪膜および膜厚g7nmの5ins
膜を順次形成し、次いで、5ins膜上に膜厚tonm
のPTFEを形成し、更にこのTACフィルムの他面に
透明粘着剤により、厚さ3Uの透明なアクリル樹脂板を
貼り合わせることにより、この発明の反射防止フィルタ
ーを得九。このフィルターの可視光平均反射率は約0.
6%で、指絞跡付着防止層のPTFE薄膜のない反射防
止フィルター(可視光線平均反射率約0.58%)と比
較しても、大きく劣らず、指紋跡の付着が起こシづらく
なった。
Example 2 On one side of a 100 μm thick transparent TAC film, in the same manner as in Example 1, Y with a film thickness of 75 nm, 0. Film, film thickness 1
10nm 'pio snow film and film thickness g7nm 5ins
The films were sequentially formed, and then a film thickness of tonm was formed on the 5-ins film.
The anti-reflection filter of the present invention was obtained by forming a PTFE film and further laminating a 3U thick transparent acrylic resin plate to the other surface of this TAC film using a transparent adhesive. The average visible light reflectance of this filter is approximately 0.
At 6%, it was not significantly inferior to an anti-reflection filter without a PTFE thin film (visible light average reflectance of approximately 0.58%) as a finger squeeze prevention layer, and it was less likely to attract fingerprint marks. .

Claims (1)

【特許請求の範囲】[Claims] 透明基材の表面に無機誘電体薄膜から成る反射防止膜が
形成され、更にこの上にふっ素樹脂薄膜が形成されて成
る反射防止フィルター。
An anti-reflection filter comprising an anti-reflection film made of an inorganic dielectric thin film formed on the surface of a transparent base material, and a fluororesin thin film further formed on this anti-reflection film.
JP2067459A 1990-03-16 1990-03-16 Antireflection filter Pending JPH03266801A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2067459A JPH03266801A (en) 1990-03-16 1990-03-16 Antireflection filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2067459A JPH03266801A (en) 1990-03-16 1990-03-16 Antireflection filter

Publications (1)

Publication Number Publication Date
JPH03266801A true JPH03266801A (en) 1991-11-27

Family

ID=13345551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2067459A Pending JPH03266801A (en) 1990-03-16 1990-03-16 Antireflection filter

Country Status (1)

Country Link
JP (1) JPH03266801A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5622784A (en) * 1986-01-21 1997-04-22 Seiko Epson Corporation Synthetic resin ophthalmic lens having an inorganic coating
US5759643A (en) * 1987-01-16 1998-06-02 Seiko Epson Corporation Polarizing plate and method of production
US5783299A (en) * 1986-01-21 1998-07-21 Seiko Epson Corporation Polarizer plate with anti-stain layer
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
JPH11258405A (en) * 1998-03-12 1999-09-24 Toppan Printing Co Ltd Anti-reflection film
WO2000069785A1 (en) * 1999-05-15 2000-11-23 Merck Patent Gmbh Method and agent for producing hydrophobic layers on fluoride layers
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
JP2002523796A (en) * 1998-08-18 2002-07-30 ゴア エンタープライズ ホールディングス,インコーポレイティド Lightweight reflective surface that is dirt resistant and can be cleaned
US6942924B2 (en) 2001-10-31 2005-09-13 Chemat Technology, Inc. Radiation-curable anti-reflective coating system
US8445097B2 (en) 2008-12-22 2013-05-21 E I Du Pont De Nemours And Company Multi-layer fluoropolymeric film and articles incorporating such films

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5622784A (en) * 1986-01-21 1997-04-22 Seiko Epson Corporation Synthetic resin ophthalmic lens having an inorganic coating
US5783299A (en) * 1986-01-21 1998-07-21 Seiko Epson Corporation Polarizer plate with anti-stain layer
US5759643A (en) * 1987-01-16 1998-06-02 Seiko Epson Corporation Polarizing plate and method of production
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
JPH11258405A (en) * 1998-03-12 1999-09-24 Toppan Printing Co Ltd Anti-reflection film
JP2002523796A (en) * 1998-08-18 2002-07-30 ゴア エンタープライズ ホールディングス,インコーポレイティド Lightweight reflective surface that is dirt resistant and can be cleaned
WO2000069785A1 (en) * 1999-05-15 2000-11-23 Merck Patent Gmbh Method and agent for producing hydrophobic layers on fluoride layers
US6783704B1 (en) 1999-05-15 2004-08-31 Merck Patent Gmbh Method and agent for producing hydrophobic layers on fluoride layers
KR100648780B1 (en) * 1999-05-15 2006-11-23 메르크 파텐트 게엠베하 A method of producing a hydrophobic layer on a fluoride layer and a composition therefor, and an optical substrate having a hydrophobic layer using the composition
US6942924B2 (en) 2001-10-31 2005-09-13 Chemat Technology, Inc. Radiation-curable anti-reflective coating system
US8445097B2 (en) 2008-12-22 2013-05-21 E I Du Pont De Nemours And Company Multi-layer fluoropolymeric film and articles incorporating such films

Similar Documents

Publication Publication Date Title
JP4419146B2 (en) Transparent conductive laminate
CN101226450B (en) Transparent conductive film, method for producing same, and touch panel comprising the transparent conductive film
RU2518101C2 (en) Electroconductive optical device, method for manufacture thereof, touch panel, display and liquid crystal display device
JP6279280B2 (en) Transparent conductive film and use thereof
TWI530839B (en) Sided transparent conductive film and touch panel
JP2763472B2 (en) Transparent conductive laminate and touch panel
US20080096013A1 (en) Transparent Electrically-Conductive Film And Touch Panel
JP2005524113A (en) Removable anti-reflection film
JPH03266801A (en) Antireflection filter
JP2023105806A (en) Transparent substrate with antireflection film and image display device
JP2023027141A (en) Transparent substrate with antireflection film and image display device
JP2023105806A5 (en)
WO2023162999A1 (en) Self-luminous display device
JP4826007B2 (en) Touch panel
JP7359162B2 (en) Functional film and functional laminated glass
JPH07296672A (en) Touch panel
JP2008032845A (en) Optical laminate, method for producing the same, polarizing plate, and image display
JP2004094798A (en) Touch panel
JP2004258209A (en) Antireflection film
JP2000052492A (en) Antireflection laminate, optical functional laminate, and display device
JPH10170707A (en) Reflection sheet for polarizing plate
JP2003098339A (en) Method for manufacturing filter for display
TWI904282B (en) Transparent substrate with anti-reflective film and image display device
US20230229037A1 (en) Anti-reflective film-attached transparent substrate and image display device
JP3541606B2 (en) Low reflection resin substrate